JPS4977578A - - Google Patents

Info

Publication number
JPS4977578A
JPS4977578A JP11808372A JP11808372A JPS4977578A JP S4977578 A JPS4977578 A JP S4977578A JP 11808372 A JP11808372 A JP 11808372A JP 11808372 A JP11808372 A JP 11808372A JP S4977578 A JPS4977578 A JP S4977578A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11808372A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11808372A priority Critical patent/JPS4977578A/ja
Publication of JPS4977578A publication Critical patent/JPS4977578A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11808372A 1972-11-27 1972-11-27 Pending JPS4977578A (cs)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11808372A JPS4977578A (cs) 1972-11-27 1972-11-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11808372A JPS4977578A (cs) 1972-11-27 1972-11-27

Publications (1)

Publication Number Publication Date
JPS4977578A true JPS4977578A (cs) 1974-07-26

Family

ID=14727561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11808372A Pending JPS4977578A (cs) 1972-11-27 1972-11-27

Country Status (1)

Country Link
JP (1) JPS4977578A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635422A (en) * 1980-07-31 1981-04-08 Nippon Telegr & Teleph Corp <Ntt> Method of etching
JPH01187821A (ja) * 1988-01-22 1989-07-27 Sony Corp レジストパターンの形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635422A (en) * 1980-07-31 1981-04-08 Nippon Telegr & Teleph Corp <Ntt> Method of etching
JPH01187821A (ja) * 1988-01-22 1989-07-27 Sony Corp レジストパターンの形成方法

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