JPS497495A - - Google Patents
Info
- Publication number
- JPS497495A JPS497495A JP47051228A JP5122872A JPS497495A JP S497495 A JPS497495 A JP S497495A JP 47051228 A JP47051228 A JP 47051228A JP 5122872 A JP5122872 A JP 5122872A JP S497495 A JPS497495 A JP S497495A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparation Of Compounds By Using Micro-Organisms (AREA)
- Medicines Containing Material From Animals Or Micro-Organisms (AREA)
- Compounds Of Unknown Constitution (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5122872A JPS5529677B2 (de) | 1972-05-25 | 1972-05-25 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5122872A JPS5529677B2 (de) | 1972-05-25 | 1972-05-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS497495A true JPS497495A (de) | 1974-01-23 |
JPS5529677B2 JPS5529677B2 (de) | 1980-08-05 |
Family
ID=12881075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5122872A Expired JPS5529677B2 (de) | 1972-05-25 | 1972-05-25 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5529677B2 (de) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5299776A (en) * | 1976-02-18 | 1977-08-22 | Hitachi Ltd | Radiation sensitive high polymeric material |
JPS52149116A (en) * | 1976-06-07 | 1977-12-12 | Tokyo Ouka Kougiyou Kk | Method of forming xxray image |
JPS5427369A (en) * | 1977-08-01 | 1979-03-01 | Hitachi Ltd | Pattern formation method |
JPS56166953U (de) * | 1980-05-14 | 1981-12-10 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6334044Y2 (de) * | 1985-02-06 | 1988-09-09 |
-
1972
- 1972-05-25 JP JP5122872A patent/JPS5529677B2/ja not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5299776A (en) * | 1976-02-18 | 1977-08-22 | Hitachi Ltd | Radiation sensitive high polymeric material |
JPS5521331B2 (de) * | 1976-02-18 | 1980-06-09 | ||
JPS52149116A (en) * | 1976-06-07 | 1977-12-12 | Tokyo Ouka Kougiyou Kk | Method of forming xxray image |
JPS5721700B2 (de) * | 1976-06-07 | 1982-05-08 | ||
JPS5427369A (en) * | 1977-08-01 | 1979-03-01 | Hitachi Ltd | Pattern formation method |
JPS56166953U (de) * | 1980-05-14 | 1981-12-10 |
Also Published As
Publication number | Publication date |
---|---|
JPS5529677B2 (de) | 1980-08-05 |