JPS4966067A - - Google Patents
Info
- Publication number
- JPS4966067A JPS4966067A JP10795072A JP10795072A JPS4966067A JP S4966067 A JPS4966067 A JP S4966067A JP 10795072 A JP10795072 A JP 10795072A JP 10795072 A JP10795072 A JP 10795072A JP S4966067 A JPS4966067 A JP S4966067A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10795072A JPS5311189B2 (en:Method) | 1972-10-30 | 1972-10-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10795072A JPS5311189B2 (en:Method) | 1972-10-30 | 1972-10-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4966067A true JPS4966067A (en:Method) | 1974-06-26 |
| JPS5311189B2 JPS5311189B2 (en:Method) | 1978-04-19 |
Family
ID=14472147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10795072A Expired JPS5311189B2 (en:Method) | 1972-10-30 | 1972-10-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5311189B2 (en:Method) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5458351A (en) * | 1977-09-29 | 1979-05-11 | Siemens Ag | Device for depositing semiconductor material |
| JPS5944621U (ja) * | 1982-09-10 | 1984-03-24 | 清 秀世 | プレス機械におけるワ−ク保持用シリンダ装置 |
| JPS63288041A (ja) * | 1987-05-20 | 1988-11-25 | Fujitsu Ltd | 気相成長膜表面の評価方法 |
| JPS6441212A (en) * | 1987-08-07 | 1989-02-13 | Nec Corp | Semiconductor crystal growth method |
| JPS6459808A (en) * | 1987-08-31 | 1989-03-07 | Nec Corp | Growth of semiconductor |
| JP2007155176A (ja) * | 2005-12-02 | 2007-06-21 | Showa Tansan Co Ltd | 非共沸混合物冷媒を使用するヒートポンプシステムまたは空調機若しくは冷凍機システム |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54165490U (en:Method) * | 1978-05-11 | 1979-11-20 |
-
1972
- 1972-10-30 JP JP10795072A patent/JPS5311189B2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5458351A (en) * | 1977-09-29 | 1979-05-11 | Siemens Ag | Device for depositing semiconductor material |
| JPS5944621U (ja) * | 1982-09-10 | 1984-03-24 | 清 秀世 | プレス機械におけるワ−ク保持用シリンダ装置 |
| JPS63288041A (ja) * | 1987-05-20 | 1988-11-25 | Fujitsu Ltd | 気相成長膜表面の評価方法 |
| JPS6441212A (en) * | 1987-08-07 | 1989-02-13 | Nec Corp | Semiconductor crystal growth method |
| JPS6459808A (en) * | 1987-08-31 | 1989-03-07 | Nec Corp | Growth of semiconductor |
| JP2007155176A (ja) * | 2005-12-02 | 2007-06-21 | Showa Tansan Co Ltd | 非共沸混合物冷媒を使用するヒートポンプシステムまたは空調機若しくは冷凍機システム |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5311189B2 (en:Method) | 1978-04-19 |