JPS4961793A - - Google Patents

Info

Publication number
JPS4961793A
JPS4961793A JP48049854A JP4985473A JPS4961793A JP S4961793 A JPS4961793 A JP S4961793A JP 48049854 A JP48049854 A JP 48049854A JP 4985473 A JP4985473 A JP 4985473A JP S4961793 A JPS4961793 A JP S4961793A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48049854A
Other languages
Japanese (ja)
Other versions
JPS5510664B2 (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4961793A publication Critical patent/JPS4961793A/ja
Publication of JPS5510664B2 publication Critical patent/JPS5510664B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Discharge Heating (AREA)
  • Physical Vapour Deposition (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
JP4985473A 1972-05-08 1973-05-07 Expired JPS5510664B2 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25127472A 1972-05-08 1972-05-08

Publications (2)

Publication Number Publication Date
JPS4961793A true JPS4961793A (fr) 1974-06-14
JPS5510664B2 JPS5510664B2 (fr) 1980-03-18

Family

ID=22951228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4985473A Expired JPS5510664B2 (fr) 1972-05-08 1973-05-07

Country Status (4)

Country Link
US (1) US3739220A (fr)
JP (1) JPS5510664B2 (fr)
DE (1) DE2322689A1 (fr)
GB (1) GB1399571A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0215158A (ja) * 1988-07-04 1990-01-18 Daido Steel Co Ltd プラズマ浸炭熱処理炉

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2606454C2 (de) * 1976-02-18 1978-01-12 lonit Anstalt Bernhard Berghaus, Vaduz Thermoelementeinsatz
US4328258A (en) * 1977-12-05 1982-05-04 Plasma Physics Corp. Method of forming semiconducting materials and barriers
US4226897A (en) * 1977-12-05 1980-10-07 Plasma Physics Corporation Method of forming semiconducting materials and barriers
JPH08209352A (ja) * 1995-02-06 1996-08-13 Hitachi Ltd プラズマ処理装置および方法
CN105132858B (zh) * 2015-08-06 2017-11-10 西华大学 内孔局域辉光等离子体放电装置及其使用方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0215158A (ja) * 1988-07-04 1990-01-18 Daido Steel Co Ltd プラズマ浸炭熱処理炉

Also Published As

Publication number Publication date
GB1399571A (en) 1975-07-02
JPS5510664B2 (fr) 1980-03-18
US3739220A (en) 1973-06-12
DE2322689A1 (de) 1973-11-22

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