JPS4959574A - - Google Patents
Info
- Publication number
- JPS4959574A JPS4959574A JP47100194A JP10019472A JPS4959574A JP S4959574 A JPS4959574 A JP S4959574A JP 47100194 A JP47100194 A JP 47100194A JP 10019472 A JP10019472 A JP 10019472A JP S4959574 A JPS4959574 A JP S4959574A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47100194A JPS4959574A (ko) | 1972-10-05 | 1972-10-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47100194A JPS4959574A (ko) | 1972-10-05 | 1972-10-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4959574A true JPS4959574A (ko) | 1974-06-10 |
Family
ID=14267480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47100194A Pending JPS4959574A (ko) | 1972-10-05 | 1972-10-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4959574A (ko) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51108577A (ko) * | 1975-03-19 | 1976-09-25 | Kogyo Gijutsuin | |
| JPS5555528A (en) * | 1978-10-20 | 1980-04-23 | Hitachi Ltd | Mask aligner |
| JPS5710232A (en) * | 1980-06-23 | 1982-01-19 | Nec Corp | Forming method for resist pattern |
| JPS5754317A (en) * | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Method and device for forming pattern |
-
1972
- 1972-10-05 JP JP47100194A patent/JPS4959574A/ja active Pending
Non-Patent Citations (1)
| Title |
|---|
| IBM TECHNICAL DISCLOSURE BULLETIN#V13#N7=1970 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51108577A (ko) * | 1975-03-19 | 1976-09-25 | Kogyo Gijutsuin | |
| JPS5555528A (en) * | 1978-10-20 | 1980-04-23 | Hitachi Ltd | Mask aligner |
| JPS5710232A (en) * | 1980-06-23 | 1982-01-19 | Nec Corp | Forming method for resist pattern |
| JPS5754317A (en) * | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Method and device for forming pattern |
| JPS6346973B2 (ko) * | 1980-09-19 | 1988-09-20 | Hitachi Ltd |