JPS4954999A - - Google Patents
Info
- Publication number
- JPS4954999A JPS4954999A JP48046324A JP4632473A JPS4954999A JP S4954999 A JPS4954999 A JP S4954999A JP 48046324 A JP48046324 A JP 48046324A JP 4632473 A JP4632473 A JP 4632473A JP S4954999 A JPS4954999 A JP S4954999A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/70—Arrangements for deflecting ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/825—Apparatus per se, device per se, or process of making or operating same
- Y10S505/872—Magnetic field shield
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Particle Accelerators (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR727214639A FR2181467B1 (no) | 1972-04-25 | 1972-04-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4954999A true JPS4954999A (no) | 1974-05-28 |
| JPS5218958B2 JPS5218958B2 (no) | 1977-05-25 |
Family
ID=9097484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48046324A Expired JPS5218958B2 (no) | 1972-04-25 | 1973-04-25 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3864597A (no) |
| JP (1) | JPS5218958B2 (no) |
| DE (1) | DE2320888C3 (no) |
| FR (1) | FR2181467B1 (no) |
| GB (1) | GB1396209A (no) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5186357A (ja) * | 1975-01-27 | 1976-07-28 | Nippon Electron Optics Lab | Denshisenichisetsuteihohooyobisoreojitsushiserusochi |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL182924C (nl) * | 1978-05-12 | 1988-06-01 | Philips Nv | Inrichting voor het implanteren van ionen in een trefplaat. |
| DE2831602A1 (de) * | 1978-07-19 | 1980-02-07 | Leybold Heraeus Gmbh & Co Kg | Vorrichtung zur erfassung von strahlparametern eines periodisch ueber eine zielflaeche gefuehrten, fokussierten ladungstraegerstrahls und messverfahren unter verwendung der vorrichtung |
| JPS5548949A (en) * | 1978-10-02 | 1980-04-08 | Jones Geraint A C | Scribing device and method |
| US4243866A (en) * | 1979-01-11 | 1981-01-06 | International Business Machines Corporation | Method and apparatus for forming a variable size electron beam |
| JPS5621321A (en) * | 1979-07-27 | 1981-02-27 | Fujitsu Ltd | Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus |
| JPS5633830A (en) * | 1979-08-29 | 1981-04-04 | Fujitsu Ltd | Detecting method for mark positioning by electron beam |
| JPS6068692U (ja) * | 1983-10-14 | 1985-05-15 | 横河電機株式会社 | 回路ユニツト収納機構 |
| JPS60201626A (ja) * | 1984-03-27 | 1985-10-12 | Canon Inc | 位置合わせ装置 |
| US4677296A (en) * | 1984-09-24 | 1987-06-30 | Siemens Aktiengesellschaft | Apparatus and method for measuring lengths in a scanning particle microscope |
| US4721842A (en) * | 1986-08-29 | 1988-01-26 | Ferranti Sciaky, Inc. | Beam position correction device |
| WO1996000978A1 (en) * | 1994-06-28 | 1996-01-11 | Leica Cambridge Ltd. | Electron beam lithography machine |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1171461A (en) * | 1965-09-23 | 1969-11-19 | Ass Elect Ind | Improvements relating to the Focussing of Microscopes |
| US3547074A (en) * | 1967-04-13 | 1970-12-15 | Block Engineering | Apparatus for forming microelements |
| US3491236A (en) * | 1967-09-28 | 1970-01-20 | Gen Electric | Electron beam fabrication of microelectronic circuit patterns |
| US3699304A (en) * | 1969-12-15 | 1972-10-17 | Ibm | Electron beam deflection control method and apparatus |
-
1972
- 1972-04-25 FR FR727214639A patent/FR2181467B1/fr not_active Expired
-
1973
- 1973-04-13 US US350719A patent/US3864597A/en not_active Expired - Lifetime
- 1973-04-24 GB GB1944873A patent/GB1396209A/en not_active Expired
- 1973-04-25 JP JP48046324A patent/JPS5218958B2/ja not_active Expired
- 1973-04-25 DE DE2320888A patent/DE2320888C3/de not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5186357A (ja) * | 1975-01-27 | 1976-07-28 | Nippon Electron Optics Lab | Denshisenichisetsuteihohooyobisoreojitsushiserusochi |
Also Published As
| Publication number | Publication date |
|---|---|
| US3864597A (en) | 1975-02-04 |
| GB1396209A (en) | 1975-06-04 |
| FR2181467A1 (no) | 1973-12-07 |
| JPS5218958B2 (no) | 1977-05-25 |
| DE2320888B2 (de) | 1979-02-22 |
| DE2320888C3 (de) | 1979-10-25 |
| FR2181467B1 (no) | 1974-07-26 |
| DE2320888A1 (de) | 1973-11-08 |