JPS4954999A - - Google Patents

Info

Publication number
JPS4954999A
JPS4954999A JP48046324A JP4632473A JPS4954999A JP S4954999 A JPS4954999 A JP S4954999A JP 48046324 A JP48046324 A JP 48046324A JP 4632473 A JP4632473 A JP 4632473A JP S4954999 A JPS4954999 A JP S4954999A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48046324A
Other languages
Japanese (ja)
Other versions
JPS5218958B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4954999A publication Critical patent/JPS4954999A/ja
Publication of JPS5218958B2 publication Critical patent/JPS5218958B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70—Arrangements for deflecting ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/872—Magnetic field shield

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
JP48046324A 1972-04-25 1973-04-25 Expired JPS5218958B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR727214639A FR2181467B1 (enrdf_load_stackoverflow) 1972-04-25 1972-04-25

Publications (2)

Publication Number Publication Date
JPS4954999A true JPS4954999A (enrdf_load_stackoverflow) 1974-05-28
JPS5218958B2 JPS5218958B2 (enrdf_load_stackoverflow) 1977-05-25

Family

ID=9097484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48046324A Expired JPS5218958B2 (enrdf_load_stackoverflow) 1972-04-25 1973-04-25

Country Status (5)

Country Link
US (1) US3864597A (enrdf_load_stackoverflow)
JP (1) JPS5218958B2 (enrdf_load_stackoverflow)
DE (1) DE2320888C3 (enrdf_load_stackoverflow)
FR (1) FR2181467B1 (enrdf_load_stackoverflow)
GB (1) GB1396209A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186357A (en) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab Denshisenichisetsuteihohooyobisoreojitsushiserusochi

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL182924C (nl) * 1978-05-12 1988-06-01 Philips Nv Inrichting voor het implanteren van ionen in een trefplaat.
DE2831602A1 (de) * 1978-07-19 1980-02-07 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur erfassung von strahlparametern eines periodisch ueber eine zielflaeche gefuehrten, fokussierten ladungstraegerstrahls und messverfahren unter verwendung der vorrichtung
JPS5548949A (en) * 1978-10-02 1980-04-08 Jones Geraint A C Scribing device and method
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
JPS5633830A (en) * 1979-08-29 1981-04-04 Fujitsu Ltd Detecting method for mark positioning by electron beam
JPS6068692U (ja) * 1983-10-14 1985-05-15 横河電機株式会社 回路ユニツト収納機構
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
US4677296A (en) * 1984-09-24 1987-06-30 Siemens Aktiengesellschaft Apparatus and method for measuring lengths in a scanning particle microscope
US4721842A (en) * 1986-08-29 1988-01-26 Ferranti Sciaky, Inc. Beam position correction device
JPH10502210A (ja) * 1994-06-28 1998-02-24 ライカ リトグラフィー システムズ リミテッド 電子ビームリトグラフ機械

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1171461A (en) * 1965-09-23 1969-11-19 Ass Elect Ind Improvements relating to the Focussing of Microscopes
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns
US3699304A (en) * 1969-12-15 1972-10-17 Ibm Electron beam deflection control method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186357A (en) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab Denshisenichisetsuteihohooyobisoreojitsushiserusochi

Also Published As

Publication number Publication date
FR2181467A1 (enrdf_load_stackoverflow) 1973-12-07
JPS5218958B2 (enrdf_load_stackoverflow) 1977-05-25
GB1396209A (en) 1975-06-04
DE2320888B2 (de) 1979-02-22
DE2320888A1 (de) 1973-11-08
US3864597A (en) 1975-02-04
DE2320888C3 (de) 1979-10-25
FR2181467B1 (enrdf_load_stackoverflow) 1974-07-26

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