JPS4953639A - - Google Patents
Info
- Publication number
- JPS4953639A JPS4953639A JP9519572A JP9519572A JPS4953639A JP S4953639 A JPS4953639 A JP S4953639A JP 9519572 A JP9519572 A JP 9519572A JP 9519572 A JP9519572 A JP 9519572A JP S4953639 A JPS4953639 A JP S4953639A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9519572A JPS5225856B2 (Sortimente) | 1972-09-25 | 1972-09-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9519572A JPS5225856B2 (Sortimente) | 1972-09-25 | 1972-09-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4953639A true JPS4953639A (Sortimente) | 1974-05-24 |
| JPS5225856B2 JPS5225856B2 (Sortimente) | 1977-07-11 |
Family
ID=14130956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9519572A Expired JPS5225856B2 (Sortimente) | 1972-09-25 | 1972-09-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5225856B2 (Sortimente) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61284483A (ja) * | 1985-06-11 | 1986-12-15 | Dainippon Ink & Chem Inc | 感熱記録体 |
| JPH05285537A (ja) * | 1992-04-10 | 1993-11-02 | Kawasaki Steel Corp | 鋼帯巻き取り装置 |
| US7405028B2 (en) * | 2004-01-30 | 2008-07-29 | Infineon Technologies, Ag | Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography |
-
1972
- 1972-09-25 JP JP9519572A patent/JPS5225856B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61284483A (ja) * | 1985-06-11 | 1986-12-15 | Dainippon Ink & Chem Inc | 感熱記録体 |
| JPH05285537A (ja) * | 1992-04-10 | 1993-11-02 | Kawasaki Steel Corp | 鋼帯巻き取り装置 |
| US7405028B2 (en) * | 2004-01-30 | 2008-07-29 | Infineon Technologies, Ag | Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5225856B2 (Sortimente) | 1977-07-11 |