JPS495324A - - Google Patents
Info
- Publication number
- JPS495324A JPS495324A JP47043171A JP4317172A JPS495324A JP S495324 A JPS495324 A JP S495324A JP 47043171 A JP47043171 A JP 47043171A JP 4317172 A JP4317172 A JP 4317172A JP S495324 A JPS495324 A JP S495324A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47043171A JPS495324A (enrdf_load_stackoverflow) | 1972-04-29 | 1972-04-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47043171A JPS495324A (enrdf_load_stackoverflow) | 1972-04-29 | 1972-04-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS495324A true JPS495324A (enrdf_load_stackoverflow) | 1974-01-18 |
Family
ID=12656422
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47043171A Pending JPS495324A (enrdf_load_stackoverflow) | 1972-04-29 | 1972-04-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS495324A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5360638A (en) * | 1976-11-12 | 1978-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Photosensitive material for pattern formation for accelerated particle beamexposure and pattern formation |
| JPS5929632A (ja) * | 1982-08-12 | 1984-02-16 | Sumitomo Chem Co Ltd | 芳香族カルボニル化合物の製造方法 |
| JPH01242539A (ja) * | 1988-03-22 | 1989-09-27 | Mitsubishi Petrochem Co Ltd | クミルアルコールの製造方法 |
| JP2004504633A (ja) * | 2000-07-17 | 2004-02-12 | チャップマン テクノロジーズ インコーポレイテッド | リソグラフ処理及び像形成用のドライ多層無機合金感熱レジスト |
-
1972
- 1972-04-29 JP JP47043171A patent/JPS495324A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5360638A (en) * | 1976-11-12 | 1978-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Photosensitive material for pattern formation for accelerated particle beamexposure and pattern formation |
| JPS5929632A (ja) * | 1982-08-12 | 1984-02-16 | Sumitomo Chem Co Ltd | 芳香族カルボニル化合物の製造方法 |
| JPH01242539A (ja) * | 1988-03-22 | 1989-09-27 | Mitsubishi Petrochem Co Ltd | クミルアルコールの製造方法 |
| JP2004504633A (ja) * | 2000-07-17 | 2004-02-12 | チャップマン テクノロジーズ インコーポレイテッド | リソグラフ処理及び像形成用のドライ多層無機合金感熱レジスト |
| JP2013167886A (ja) * | 2000-07-17 | 2013-08-29 | Chapman Technologies Inc | リソグラフ処理及び像形成用のドライ多層無機合金感熱レジスト |