JPS4943880A - - Google Patents
Info
- Publication number
- JPS4943880A JPS4943880A JP48072325A JP7232573A JPS4943880A JP S4943880 A JPS4943880 A JP S4943880A JP 48072325 A JP48072325 A JP 48072325A JP 7232573 A JP7232573 A JP 7232573A JP S4943880 A JPS4943880 A JP S4943880A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7209294A NL7209294A (it) | 1972-07-01 | 1972-07-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4943880A true JPS4943880A (it) | 1974-04-25 |
Family
ID=19816451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48072325A Pending JPS4943880A (it) | 1972-07-01 | 1973-06-28 |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS4943880A (it) |
| AU (1) | AU5740573A (it) |
| BE (1) | BE801747A (it) |
| BR (1) | BR7304772D0 (it) |
| DE (1) | DE2330720C3 (it) |
| FR (1) | FR2190946B1 (it) |
| GB (1) | GB1420526A (it) |
| IT (1) | IT990832B (it) |
| NL (1) | NL7209294A (it) |
| SE (1) | SE384537B (it) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3070578D1 (en) * | 1979-08-16 | 1985-06-05 | Ibm | Process for applying sio2 films by chemical vapour deposition |
| DE3441056A1 (de) * | 1984-11-09 | 1986-05-22 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3637423A (en) * | 1969-02-10 | 1972-01-25 | Westinghouse Electric Corp | Pyrolytic deposition of silicon nitride films |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3200015A (en) * | 1962-09-10 | 1965-08-10 | United Aircraft Corp | Process for coating high temperature alloys |
| FR1524841A (fr) * | 1966-06-01 | 1968-05-10 | Siemens Ag | Procédé pour la préparation de nitrure de silicium attaquable chimiquement sous forme de couches minces |
| DE1957952A1 (de) * | 1969-11-18 | 1971-05-27 | Siemens Ag | Siliciumnitridbeschichtung an Quarzwaenden fuer Diffusions- und Oxydationsreaktoren |
-
1972
- 1972-07-01 NL NL7209294A patent/NL7209294A/xx not_active Application Discontinuation
-
1973
- 1973-06-16 DE DE19732330720 patent/DE2330720C3/de not_active Expired
- 1973-06-27 AU AU57405/73A patent/AU5740573A/en not_active Expired
- 1973-06-28 IT IT2604673A patent/IT990832B/it active
- 1973-06-28 SE SE7309131A patent/SE384537B/xx unknown
- 1973-06-28 BR BR477273A patent/BR7304772D0/pt unknown
- 1973-06-28 GB GB3080973A patent/GB1420526A/en not_active Expired
- 1973-06-28 JP JP48072325A patent/JPS4943880A/ja active Pending
- 1973-06-28 FR FR7323681A patent/FR2190946B1/fr not_active Expired
- 1973-06-29 BE BE132987A patent/BE801747A/xx not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3637423A (en) * | 1969-02-10 | 1972-01-25 | Westinghouse Electric Corp | Pyrolytic deposition of silicon nitride films |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2330720C3 (de) | 1979-01-18 |
| IT990832B (it) | 1975-07-10 |
| DE2330720B2 (de) | 1978-05-24 |
| FR2190946B1 (it) | 1977-05-13 |
| AU5740573A (en) | 1975-01-09 |
| NL7209294A (it) | 1974-01-03 |
| BR7304772D0 (pt) | 1974-08-15 |
| DE2330720A1 (de) | 1974-01-10 |
| BE801747A (fr) | 1974-01-02 |
| FR2190946A1 (it) | 1974-02-01 |
| SE384537B (sv) | 1976-05-10 |
| GB1420526A (en) | 1976-01-07 |