JPS4943579A - - Google Patents
Info
- Publication number
- JPS4943579A JPS4943579A JP8630672A JP8630672A JPS4943579A JP S4943579 A JPS4943579 A JP S4943579A JP 8630672 A JP8630672 A JP 8630672A JP 8630672 A JP8630672 A JP 8630672A JP S4943579 A JPS4943579 A JP S4943579A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8630672A JPS5546056B2 (en:Method) | 1972-08-30 | 1972-08-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8630672A JPS5546056B2 (en:Method) | 1972-08-30 | 1972-08-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4943579A true JPS4943579A (en:Method) | 1974-04-24 |
| JPS5546056B2 JPS5546056B2 (en:Method) | 1980-11-21 |
Family
ID=13883137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8630672A Expired JPS5546056B2 (en:Method) | 1972-08-30 | 1972-08-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5546056B2 (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022133280A (ja) * | 2017-10-27 | 2022-09-13 | アプライド マテリアルズ インコーポレイテッド | 空間分離を伴う単一ウエハの処理環境 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05314540A (ja) * | 1992-05-08 | 1993-11-26 | Kuraray Co Ltd | スパッタリング装置 |
-
1972
- 1972-08-30 JP JP8630672A patent/JPS5546056B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022133280A (ja) * | 2017-10-27 | 2022-09-13 | アプライド マテリアルズ インコーポレイテッド | 空間分離を伴う単一ウエハの処理環境 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5546056B2 (en:Method) | 1980-11-21 |