JPS4943562B1 - - Google Patents

Info

Publication number
JPS4943562B1
JPS4943562B1 JP45018227A JP1822770A JPS4943562B1 JP S4943562 B1 JPS4943562 B1 JP S4943562B1 JP 45018227 A JP45018227 A JP 45018227A JP 1822770 A JP1822770 A JP 1822770A JP S4943562 B1 JPS4943562 B1 JP S4943562B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45018227A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4943562B1 publication Critical patent/JPS4943562B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP45018227A 1969-03-03 1970-03-03 Pending JPS4943562B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80398169A 1969-03-03 1969-03-03

Publications (1)

Publication Number Publication Date
JPS4943562B1 true JPS4943562B1 (enrdf_load_stackoverflow) 1974-11-21

Family

ID=25187900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45018227A Pending JPS4943562B1 (enrdf_load_stackoverflow) 1969-03-03 1970-03-03

Country Status (3)

Country Link
JP (1) JPS4943562B1 (enrdf_load_stackoverflow)
DE (1) DE2009927A1 (enrdf_load_stackoverflow)
GB (1) GB1305406A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013502463A (ja) * 2009-08-21 2013-01-24 ザ ホン コン ユニバーシティ オブ サイエンス アンド テクノロジイ 硫黄含有高分子及びその製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004104051A1 (en) * 2003-05-26 2004-12-02 Ciba Specialty Chemicals Holding Inc. Bimolecular photoinitiator systems

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013502463A (ja) * 2009-08-21 2013-01-24 ザ ホン コン ユニバーシティ オブ サイエンス アンド テクノロジイ 硫黄含有高分子及びその製造方法

Also Published As

Publication number Publication date
GB1305406A (enrdf_load_stackoverflow) 1973-01-31
DE2009927A1 (enrdf_load_stackoverflow) 1970-09-24

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