JPS4939376A - - Google Patents
Info
- Publication number
- JPS4939376A JPS4939376A JP8076772A JP8076772A JPS4939376A JP S4939376 A JPS4939376 A JP S4939376A JP 8076772 A JP8076772 A JP 8076772A JP 8076772 A JP8076772 A JP 8076772A JP S4939376 A JPS4939376 A JP S4939376A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Led Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8076772A JPS4939376A (ja) | 1972-08-14 | 1972-08-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8076772A JPS4939376A (ja) | 1972-08-14 | 1972-08-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4939376A true JPS4939376A (ja) | 1974-04-12 |
Family
ID=13727561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8076772A Pending JPS4939376A (ja) | 1972-08-14 | 1972-08-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4939376A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5271388A (en) * | 1975-12-11 | 1977-06-14 | Mitsubishi Electric Corp | Liquid phase epitaxial gorwth method |
| JPS5853136U (ja) * | 1981-10-06 | 1983-04-11 | 株式会社東芝 | 液相エピタキシヤル成長装置 |
| KR20180021153A (ko) | 2015-08-25 | 2018-02-28 | 가부시키가이샤 스크린 홀딩스 | 기판 처리 방법 및 기판 처리 장치 |
-
1972
- 1972-08-14 JP JP8076772A patent/JPS4939376A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5271388A (en) * | 1975-12-11 | 1977-06-14 | Mitsubishi Electric Corp | Liquid phase epitaxial gorwth method |
| JPS5919917B2 (ja) * | 1975-12-11 | 1984-05-09 | 三菱電機株式会社 | エキソウエピタキシヤルセイチヨウホウ |
| JPS5853136U (ja) * | 1981-10-06 | 1983-04-11 | 株式会社東芝 | 液相エピタキシヤル成長装置 |
| JPH023620Y2 (ja) * | 1981-10-06 | 1990-01-29 | ||
| KR20180021153A (ko) | 2015-08-25 | 2018-02-28 | 가부시키가이샤 스크린 홀딩스 | 기판 처리 방법 및 기판 처리 장치 |