JPS49390A - - Google Patents
Info
- Publication number
- JPS49390A JPS49390A JP47037988A JP3798872A JPS49390A JP S49390 A JPS49390 A JP S49390A JP 47037988 A JP47037988 A JP 47037988A JP 3798872 A JP3798872 A JP 3798872A JP S49390 A JPS49390 A JP S49390A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47037988A JPS5021503B2 (en) | 1972-04-15 | 1972-04-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47037988A JPS5021503B2 (en) | 1972-04-15 | 1972-04-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49390A true JPS49390A (en) | 1974-01-05 |
| JPS5021503B2 JPS5021503B2 (en) | 1975-07-23 |
Family
ID=12512934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47037988A Expired JPS5021503B2 (en) | 1972-04-15 | 1972-04-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5021503B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5521292A (en) * | 1978-07-28 | 1980-02-15 | Jonasson Vollmar | Thermal hardening resin pipe |
| JPS5643719A (en) * | 1979-09-18 | 1981-04-22 | Fujitsu Ltd | Vapor-phase epitaxial growth |
| JPS5898929A (en) * | 1981-12-09 | 1983-06-13 | Seiko Epson Corp | Atomic layer etching method |
| JPS6066823A (en) * | 1983-09-22 | 1985-04-17 | Semiconductor Energy Lab Co Ltd | Etching method of semiconductor |
| JPS6242530A (en) * | 1985-08-20 | 1987-02-24 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS6479388A (en) * | 1987-09-18 | 1989-03-24 | Tanaka Precious Metal Ind | Method for removing coating metal from metal oxide base material |
| JPH03241830A (en) * | 1990-02-20 | 1991-10-29 | Mitsubishi Electric Corp | Plasma etching process |
| JPH0626206B2 (en) * | 1985-08-28 | 1994-04-06 | エフエスアイ コ−ポレイシヨン | Method and apparatus for removing film from substrate by vapor phase method |
-
1972
- 1972-04-15 JP JP47037988A patent/JPS5021503B2/ja not_active Expired
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5521292A (en) * | 1978-07-28 | 1980-02-15 | Jonasson Vollmar | Thermal hardening resin pipe |
| JPH0115374B2 (en) * | 1978-07-28 | 1989-03-16 | Inpaipu Ab | |
| JPS5643719A (en) * | 1979-09-18 | 1981-04-22 | Fujitsu Ltd | Vapor-phase epitaxial growth |
| JPS5898929A (en) * | 1981-12-09 | 1983-06-13 | Seiko Epson Corp | Atomic layer etching method |
| JPH0379862B2 (en) * | 1981-12-09 | 1991-12-20 | Seiko Epson Corp | |
| JPS6066823A (en) * | 1983-09-22 | 1985-04-17 | Semiconductor Energy Lab Co Ltd | Etching method of semiconductor |
| JPH0464177B2 (en) * | 1983-09-22 | 1992-10-14 | Handotai Energy Kenkyusho | |
| JPS6242530A (en) * | 1985-08-20 | 1987-02-24 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPH0626206B2 (en) * | 1985-08-28 | 1994-04-06 | エフエスアイ コ−ポレイシヨン | Method and apparatus for removing film from substrate by vapor phase method |
| JPS6479388A (en) * | 1987-09-18 | 1989-03-24 | Tanaka Precious Metal Ind | Method for removing coating metal from metal oxide base material |
| JPH03241830A (en) * | 1990-02-20 | 1991-10-29 | Mitsubishi Electric Corp | Plasma etching process |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5021503B2 (en) | 1975-07-23 |