JPS49387B1 - - Google Patents

Info

Publication number
JPS49387B1
JPS49387B1 JP45048400A JP4840070A JPS49387B1 JP S49387 B1 JPS49387 B1 JP S49387B1 JP 45048400 A JP45048400 A JP 45048400A JP 4840070 A JP4840070 A JP 4840070A JP S49387 B1 JPS49387 B1 JP S49387B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45048400A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49387B1 publication Critical patent/JPS49387B1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/14Feed and outlet means for the gases; Modifying the flow of the reactive gases
JP45048400A 1969-06-10 1970-06-04 Pending JPS49387B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1929422A DE1929422B2 (en) 1969-06-10 1969-06-10 Device for the epitaxial deposition of semiconductor material

Publications (1)

Publication Number Publication Date
JPS49387B1 true JPS49387B1 (en) 1974-01-07

Family

ID=5736590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45048400A Pending JPS49387B1 (en) 1969-06-10 1970-06-04

Country Status (3)

Country Link
US (1) US3704987A (en)
JP (1) JPS49387B1 (en)
DE (1) DE1929422B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5962970U (en) * 1982-10-19 1984-04-25 瓜生製作株式会社 Variable pitch device for multi-axis nut runner
JPS5986928U (en) * 1982-12-01 1984-06-12 瓜生製作株式会社 Variable pitch device for multi-axis nut runner
JPS6012705U (en) * 1983-07-07 1985-01-28 株式会社神戸製鋼所 actuator
JPS61116109A (en) * 1984-11-03 1986-06-03 フエスト コマンデイト ゲゼルシヤフト Working cylinder assembled from annular member and manufacture thereof
JPH01120406A (en) * 1987-10-30 1989-05-12 Kazuharu Ueda Cylinder

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2943634C2 (en) * 1979-10-29 1983-09-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Epitaxial reactor
US4275282A (en) * 1980-03-24 1981-06-23 Rca Corporation Centering support for a rotatable wafer support susceptor
US4696833A (en) * 1982-08-27 1987-09-29 Hewlett-Packard Company Method for applying a uniform coating to integrated circuit wafers by means of chemical deposition
US4545327A (en) * 1982-08-27 1985-10-08 Anicon, Inc. Chemical vapor deposition apparatus
US4539933A (en) * 1983-08-31 1985-09-10 Anicon, Inc. Chemical vapor deposition apparatus
US4524719A (en) * 1983-09-06 1985-06-25 Anicon, Inc. Substrate loading means for a chemical vapor deposition apparatus
US4694779A (en) * 1984-10-19 1987-09-22 Tetron, Inc. Reactor apparatus for semiconductor wafer processing
US5002011A (en) * 1987-04-14 1991-03-26 Kabushiki Kaisha Toshiba Vapor deposition apparatus
US5169478A (en) * 1987-10-08 1992-12-08 Friendtech Laboratory, Ltd. Apparatus for manufacturing semiconductor devices
US4979465A (en) * 1989-04-03 1990-12-25 Daidousanso Co., Ltd. Apparatus for producing semiconductors
US5320680A (en) * 1991-04-25 1994-06-14 Silicon Valley Group, Inc. Primary flow CVD apparatus comprising gas preheater and means for substantially eddy-free gas flow

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1056449B (en) * 1954-03-12 1959-04-30 Metallgesellschaft Ag Process for the production of coatings from hard carbides
US3246627A (en) * 1962-10-05 1966-04-19 Union Carbide Corp Apparatus for vapor deposition
US3189494A (en) * 1963-08-22 1965-06-15 Texas Instruments Inc Epitaxial crystal growth onto a stabilizing layer which prevents diffusion from the substrate
US3338761A (en) * 1965-03-31 1967-08-29 Texas Instruments Inc Method and apparatus for making compound materials
US3464846A (en) * 1965-12-08 1969-09-02 Ethyl Corp Method and apparatus for centrifugally plating
US3424629A (en) * 1965-12-13 1969-01-28 Ibm High capacity epitaxial apparatus and method
US3460510A (en) * 1966-05-12 1969-08-12 Dow Corning Large volume semiconductor coating reactor
US3384049A (en) * 1966-10-27 1968-05-21 Emil R. Capita Vapor deposition apparatus including centrifugal force substrate-holding means
US3594227A (en) * 1968-07-12 1971-07-20 Bell Telephone Labor Inc Method for treating semiconductor slices with gases

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5962970U (en) * 1982-10-19 1984-04-25 瓜生製作株式会社 Variable pitch device for multi-axis nut runner
JPS5986928U (en) * 1982-12-01 1984-06-12 瓜生製作株式会社 Variable pitch device for multi-axis nut runner
JPS6012705U (en) * 1983-07-07 1985-01-28 株式会社神戸製鋼所 actuator
JPS61116109A (en) * 1984-11-03 1986-06-03 フエスト コマンデイト ゲゼルシヤフト Working cylinder assembled from annular member and manufacture thereof
JPH01120406A (en) * 1987-10-30 1989-05-12 Kazuharu Ueda Cylinder

Also Published As

Publication number Publication date
DE1929422A1 (en) 1970-12-23
DE1929422B2 (en) 1974-08-15
DE1929422C3 (en) 1975-04-03
US3704987A (en) 1972-12-05

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