JPS4933575A - - Google Patents
Info
- Publication number
- JPS4933575A JPS4933575A JP7418972A JP7418972A JPS4933575A JP S4933575 A JPS4933575 A JP S4933575A JP 7418972 A JP7418972 A JP 7418972A JP 7418972 A JP7418972 A JP 7418972A JP S4933575 A JPS4933575 A JP S4933575A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning By Liquid Or Steam (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7418972A JPS4933575A (en) | 1972-07-26 | 1972-07-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7418972A JPS4933575A (en) | 1972-07-26 | 1972-07-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4933575A true JPS4933575A (en) | 1974-03-28 |
Family
ID=13539960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7418972A Pending JPS4933575A (en) | 1972-07-26 | 1972-07-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4933575A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS515426B1 (en) * | 1971-02-06 | 1976-02-19 | ||
| JPS5461868A (en) * | 1977-10-13 | 1979-05-18 | Fsi Corp | Ic substrate and wafer cleaning and drying device |
| JPS56115538A (en) * | 1980-02-19 | 1981-09-10 | Toshiba Corp | Treating method for semiconductor patterning wafer |
| JPS587831A (en) * | 1981-07-07 | 1983-01-17 | Sumitomo Shoji Kk | Washing method for wafer by high pressured water and device thereof |
| US5556578A (en) * | 1993-12-23 | 1996-09-17 | W. R. Grace & Co.-Conn. | Aggregate containing hydration water in spray applied fireproofing |
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1972
- 1972-07-26 JP JP7418972A patent/JPS4933575A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS515426B1 (en) * | 1971-02-06 | 1976-02-19 | ||
| JPS5461868A (en) * | 1977-10-13 | 1979-05-18 | Fsi Corp | Ic substrate and wafer cleaning and drying device |
| JPS6038021B2 (en) * | 1977-10-13 | 1985-08-29 | エフエスアイ・コ−ポレ−シヨン | Cleaning/drying equipment for integrated circuit substrates and wafers |
| JPS56115538A (en) * | 1980-02-19 | 1981-09-10 | Toshiba Corp | Treating method for semiconductor patterning wafer |
| JPS587831A (en) * | 1981-07-07 | 1983-01-17 | Sumitomo Shoji Kk | Washing method for wafer by high pressured water and device thereof |
| US5556578A (en) * | 1993-12-23 | 1996-09-17 | W. R. Grace & Co.-Conn. | Aggregate containing hydration water in spray applied fireproofing |