JPS4922868A - - Google Patents

Info

Publication number
JPS4922868A
JPS4922868A JP6148172A JP6148172A JPS4922868A JP S4922868 A JPS4922868 A JP S4922868A JP 6148172 A JP6148172 A JP 6148172A JP 6148172 A JP6148172 A JP 6148172A JP S4922868 A JPS4922868 A JP S4922868A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6148172A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6148172A priority Critical patent/JPS4922868A/ja
Publication of JPS4922868A publication Critical patent/JPS4922868A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Measuring Arrangements Characterized By The Use Of Fluids (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6148172A 1972-06-20 1972-06-20 Pending JPS4922868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6148172A JPS4922868A (en) 1972-06-20 1972-06-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6148172A JPS4922868A (en) 1972-06-20 1972-06-20

Publications (1)

Publication Number Publication Date
JPS4922868A true JPS4922868A (en) 1974-02-28

Family

ID=13172296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6148172A Pending JPS4922868A (en) 1972-06-20 1972-06-20

Country Status (1)

Country Link
JP (1) JPS4922868A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5555529A (en) * 1978-10-20 1980-04-23 Hitachi Ltd Method of positioning wafer
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS5737246U (en) * 1980-08-13 1982-02-27
JPS5772323A (en) * 1980-10-23 1982-05-06 Hitachi Ltd Thin plate flattening equipment
JPS5787129A (en) * 1980-11-19 1982-05-31 Nec Corp Exposure device
JPS6063929A (en) * 1984-07-04 1985-04-12 Hitachi Ltd Optical processor for plate object
JPS611021A (en) * 1985-05-13 1986-01-07 Hitachi Ltd Position setting method in exposing apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5555529A (en) * 1978-10-20 1980-04-23 Hitachi Ltd Method of positioning wafer
JPS6259457B2 (en) * 1978-10-20 1987-12-11 Hitachi Ltd
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS5737246U (en) * 1980-08-13 1982-02-27
JPS6144429Y2 (en) * 1980-08-13 1986-12-15
JPS5772323A (en) * 1980-10-23 1982-05-06 Hitachi Ltd Thin plate flattening equipment
JPS5787129A (en) * 1980-11-19 1982-05-31 Nec Corp Exposure device
JPS6063929A (en) * 1984-07-04 1985-04-12 Hitachi Ltd Optical processor for plate object
JPS611021A (en) * 1985-05-13 1986-01-07 Hitachi Ltd Position setting method in exposing apparatus

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