JPS4922868A - - Google Patents
Info
- Publication number
- JPS4922868A JPS4922868A JP6148172A JP6148172A JPS4922868A JP S4922868 A JPS4922868 A JP S4922868A JP 6148172 A JP6148172 A JP 6148172A JP 6148172 A JP6148172 A JP 6148172A JP S4922868 A JPS4922868 A JP S4922868A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Measuring Arrangements Characterized By The Use Of Fluids (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6148172A JPS4922868A (en) | 1972-06-20 | 1972-06-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6148172A JPS4922868A (en) | 1972-06-20 | 1972-06-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS4922868A true JPS4922868A (en) | 1974-02-28 |
Family
ID=13172296
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6148172A Pending JPS4922868A (en) | 1972-06-20 | 1972-06-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS4922868A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5555529A (en) * | 1978-10-20 | 1980-04-23 | Hitachi Ltd | Method of positioning wafer |
JPS562630A (en) * | 1979-06-22 | 1981-01-12 | Hitachi Ltd | Installing of wafer position in projection aligner |
JPS5737246U (en) * | 1980-08-13 | 1982-02-27 | ||
JPS5772323A (en) * | 1980-10-23 | 1982-05-06 | Hitachi Ltd | Thin plate flattening equipment |
JPS5787129A (en) * | 1980-11-19 | 1982-05-31 | Nec Corp | Exposure device |
JPS6063929A (en) * | 1984-07-04 | 1985-04-12 | Hitachi Ltd | Optical processor for plate object |
JPS611021A (en) * | 1985-05-13 | 1986-01-07 | Hitachi Ltd | Position setting method in exposing apparatus |
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1972
- 1972-06-20 JP JP6148172A patent/JPS4922868A/ja active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5555529A (en) * | 1978-10-20 | 1980-04-23 | Hitachi Ltd | Method of positioning wafer |
JPS6259457B2 (en) * | 1978-10-20 | 1987-12-11 | Hitachi Ltd | |
JPS562630A (en) * | 1979-06-22 | 1981-01-12 | Hitachi Ltd | Installing of wafer position in projection aligner |
JPS5737246U (en) * | 1980-08-13 | 1982-02-27 | ||
JPS6144429Y2 (en) * | 1980-08-13 | 1986-12-15 | ||
JPS5772323A (en) * | 1980-10-23 | 1982-05-06 | Hitachi Ltd | Thin plate flattening equipment |
JPS5787129A (en) * | 1980-11-19 | 1982-05-31 | Nec Corp | Exposure device |
JPS6063929A (en) * | 1984-07-04 | 1985-04-12 | Hitachi Ltd | Optical processor for plate object |
JPS611021A (en) * | 1985-05-13 | 1986-01-07 | Hitachi Ltd | Position setting method in exposing apparatus |