JPS4916460A - - Google Patents

Info

Publication number
JPS4916460A
JPS4916460A JP4991672A JP4991672A JPS4916460A JP S4916460 A JPS4916460 A JP S4916460A JP 4991672 A JP4991672 A JP 4991672A JP 4991672 A JP4991672 A JP 4991672A JP S4916460 A JPS4916460 A JP S4916460A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4991672A
Other languages
Japanese (ja)
Other versions
JPS5240953B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4991672A priority Critical patent/JPS5240953B2/ja
Priority to US362361A priority patent/US3861798A/en
Priority to DE19732326059 priority patent/DE2326059C3/de
Publication of JPS4916460A publication Critical patent/JPS4916460A/ja
Publication of JPS5240953B2 publication Critical patent/JPS5240953B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP4991672A 1972-05-22 1972-05-22 Expired JPS5240953B2 (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4991672A JPS5240953B2 (enrdf_load_stackoverflow) 1972-05-22 1972-05-22
US362361A US3861798A (en) 1972-05-22 1973-05-21 Mask for aligning patterns
DE19732326059 DE2326059C3 (de) 1972-05-22 1973-05-22 Anordnung und Verfahren zum Ausrichten von Mustern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4991672A JPS5240953B2 (enrdf_load_stackoverflow) 1972-05-22 1972-05-22

Publications (2)

Publication Number Publication Date
JPS4916460A true JPS4916460A (enrdf_load_stackoverflow) 1974-02-13
JPS5240953B2 JPS5240953B2 (enrdf_load_stackoverflow) 1977-10-15

Family

ID=12844323

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4991672A Expired JPS5240953B2 (enrdf_load_stackoverflow) 1972-05-22 1972-05-22

Country Status (1)

Country Link
JP (1) JPS5240953B2 (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5381083A (en) * 1976-12-27 1978-07-18 Fujitsu Ltd Focusing method of projection exposure apparatus
JPS5911619A (ja) * 1982-07-12 1984-01-21 Nec Corp 半導体装置の非接触試験方法
JPS60257450A (ja) * 1984-05-29 1985-12-19 エヌ・ベー・フイリツプス・フルーイランペンフアブリケン マスクパターン結像装置
JPS61187343A (ja) * 1985-02-15 1986-08-21 Nec Corp 半導体基板

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5381083A (en) * 1976-12-27 1978-07-18 Fujitsu Ltd Focusing method of projection exposure apparatus
JPS5911619A (ja) * 1982-07-12 1984-01-21 Nec Corp 半導体装置の非接触試験方法
JPS60257450A (ja) * 1984-05-29 1985-12-19 エヌ・ベー・フイリツプス・フルーイランペンフアブリケン マスクパターン結像装置
JPS61187343A (ja) * 1985-02-15 1986-08-21 Nec Corp 半導体基板

Also Published As

Publication number Publication date
JPS5240953B2 (enrdf_load_stackoverflow) 1977-10-15

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