JPS4912838B1 - - Google Patents
Info
- Publication number
- JPS4912838B1 JPS4912838B1 JP9911570A JP9911570A JPS4912838B1 JP S4912838 B1 JPS4912838 B1 JP S4912838B1 JP 9911570 A JP9911570 A JP 9911570A JP 9911570 A JP9911570 A JP 9911570A JP S4912838 B1 JPS4912838 B1 JP S4912838B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87565769A | 1969-11-12 | 1969-11-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4912838B1 true JPS4912838B1 (en) | 1974-03-27 |
Family
ID=25366150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9911570A Pending JPS4912838B1 (en) | 1969-11-12 | 1970-11-12 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS4912838B1 (en) |
| CH (1) | CH532963A (en) |
| DE (1) | DE2054161A1 (en) |
| FR (1) | FR2067256B1 (en) |
| GB (1) | GB1326570A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH664303A5 (en) * | 1985-04-03 | 1988-02-29 | Balzers Hochvakuum | HOLDING DEVICE FOR TARGETS FOR CATHODE SPRAYING. |
-
1970
- 1970-11-04 DE DE19702054161 patent/DE2054161A1/en active Pending
- 1970-11-11 CH CH1667370A patent/CH532963A/en not_active IP Right Cessation
- 1970-11-12 GB GB5396470A patent/GB1326570A/en not_active Expired
- 1970-11-12 JP JP9911570A patent/JPS4912838B1/ja active Pending
- 1970-11-13 FR FR7040802A patent/FR2067256B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CH532963A (en) | 1973-01-31 |
| DE2054161A1 (en) | 1971-05-19 |
| FR2067256A1 (en) | 1971-08-20 |
| GB1326570A (en) | 1973-08-15 |
| FR2067256B1 (en) | 1973-02-02 |