JPS49126403A - - Google Patents
Info
- Publication number
- JPS49126403A JPS49126403A JP443774A JP443774A JPS49126403A JP S49126403 A JPS49126403 A JP S49126403A JP 443774 A JP443774 A JP 443774A JP 443774 A JP443774 A JP 443774A JP S49126403 A JPS49126403 A JP S49126403A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31758572A | 1972-12-22 | 1972-12-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49126403A true JPS49126403A (en:Method) | 1974-12-04 |
| JPS5630849B2 JPS5630849B2 (en:Method) | 1981-07-17 |
Family
ID=23234356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP443774A Expired JPS5630849B2 (en:Method) | 1972-12-22 | 1973-12-22 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5630849B2 (en:Method) |
| BE (1) | BE809031A (en:Method) |
| CA (1) | CA1005673A (en:Method) |
| FR (1) | FR2211677B1 (en:Method) |
| GB (1) | GB1442797A (en:Method) |
| IT (1) | IT1000552B (en:Method) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| JPS61206293A (ja) * | 1985-03-08 | 1986-09-12 | 日本ペイント株式会社 | 回路板の製造方法 |
| US4732837A (en) * | 1986-05-02 | 1988-03-22 | Hoechst Celanese Corporation | Novel mixed ester O-quinone photosensitizers |
| US5035976A (en) * | 1986-05-02 | 1991-07-30 | Hoechst Celanese Corporation | Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents |
| US4732836A (en) * | 1986-05-02 | 1988-03-22 | Hoechst Celanese Corporation | Novel mixed ester O-quinone photosensitizers |
| EP0287212B1 (en) * | 1987-03-12 | 1994-12-28 | Mitsubishi Chemical Corporation | Positive photosensitive planographic printing plate |
| DE3731439A1 (de) * | 1987-09-18 | 1989-03-30 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial |
| JPH07119374B2 (ja) * | 1987-11-06 | 1995-12-20 | 関西ペイント株式会社 | ポジ型感光性カチオン電着塗料組成物 |
-
1973
- 1973-11-16 CA CA185,999A patent/CA1005673A/en not_active Expired
- 1973-12-20 IT IT7076573A patent/IT1000552B/it active
- 1973-12-21 GB GB5941673A patent/GB1442797A/en not_active Expired
- 1973-12-21 FR FR7345904A patent/FR2211677B1/fr not_active Expired
- 1973-12-21 BE BE139217A patent/BE809031A/xx not_active IP Right Cessation
- 1973-12-22 JP JP443774A patent/JPS5630849B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2211677B1 (en:Method) | 1977-08-12 |
| DE2364178A1 (de) | 1974-07-11 |
| FR2211677A1 (en:Method) | 1974-07-19 |
| BE809031A (fr) | 1974-06-21 |
| CA1005673A (en) | 1977-02-22 |
| JPS5630849B2 (en:Method) | 1981-07-17 |
| IT1000552B (it) | 1976-04-10 |
| GB1442797A (en) | 1976-07-14 |
| DE2364178B2 (de) | 1976-01-15 |