JPS49125380A - - Google Patents
Info
- Publication number
- JPS49125380A JPS49125380A JP3805873A JP3805873A JPS49125380A JP S49125380 A JPS49125380 A JP S49125380A JP 3805873 A JP3805873 A JP 3805873A JP 3805873 A JP3805873 A JP 3805873A JP S49125380 A JPS49125380 A JP S49125380A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48038058A JPS584027B2 (ja) | 1973-04-03 | 1973-04-03 | シアヌル環を有するポリアクリレ−ト又はポリメタクリレ−トの製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48038058A JPS584027B2 (ja) | 1973-04-03 | 1973-04-03 | シアヌル環を有するポリアクリレ−ト又はポリメタクリレ−トの製造法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20800181A Division JPS5915329B2 (ja) | 1981-12-24 | 1981-12-24 | 硬化用組成物の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49125380A true JPS49125380A (de) | 1974-11-30 |
| JPS584027B2 JPS584027B2 (ja) | 1983-01-24 |
Family
ID=12514893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48038058A Expired JPS584027B2 (ja) | 1973-04-03 | 1973-04-03 | シアヌル環を有するポリアクリレ−ト又はポリメタクリレ−トの製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS584027B2 (de) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54162784A (en) * | 1978-06-15 | 1979-12-24 | Mitsubishi Petrochem Co Ltd | Photosetting composition |
| WO1980002255A1 (en) * | 1979-04-17 | 1980-10-30 | Teijin Ltd | Abrasion-resistant laminate film |
| WO2011095441A1 (de) | 2010-02-02 | 2011-08-11 | Bayer Materialscience Ag | Photopolymer-formulierung mit triazin-basierten schreibmonomeren |
| US11267943B2 (en) | 2017-05-09 | 2022-03-08 | Covestro Deutschland Ag | Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance |
| US11640136B2 (en) | 2017-05-09 | 2023-05-02 | Covestro Deutschland Ag | System consisting of two UV-curing dry-transfer coating layers for the protection of a hologram in a photopolymer film composite |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3401909A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| KR20200005738A (ko) | 2017-05-09 | 2020-01-16 | 코베스트로 도이칠란트 아게 | 홀로그래픽 노출용 광중합체 층 및 고내성의 코팅 층을 함유하는 홀로그래픽 매체 |
| EP3401910A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3153015A (en) * | 1960-10-11 | 1964-10-13 | Dal Mon Research Co | Polymerizable triazines and products thereof |
-
1973
- 1973-04-03 JP JP48038058A patent/JPS584027B2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3153015A (en) * | 1960-10-11 | 1964-10-13 | Dal Mon Research Co | Polymerizable triazines and products thereof |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54162784A (en) * | 1978-06-15 | 1979-12-24 | Mitsubishi Petrochem Co Ltd | Photosetting composition |
| WO1980002255A1 (en) * | 1979-04-17 | 1980-10-30 | Teijin Ltd | Abrasion-resistant laminate film |
| WO2011095441A1 (de) | 2010-02-02 | 2011-08-11 | Bayer Materialscience Ag | Photopolymer-formulierung mit triazin-basierten schreibmonomeren |
| US20120321998A1 (en) * | 2010-02-02 | 2012-12-20 | Bayer Intellectual Property Gmbh | Photopolymer formulation having triazine-based writing monomers |
| US9366957B2 (en) * | 2010-02-02 | 2016-06-14 | Covestro Deutschland Ag | Photopolymer formulation having triazine-based writing monomers |
| US11267943B2 (en) | 2017-05-09 | 2022-03-08 | Covestro Deutschland Ag | Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance |
| US11640136B2 (en) | 2017-05-09 | 2023-05-02 | Covestro Deutschland Ag | System consisting of two UV-curing dry-transfer coating layers for the protection of a hologram in a photopolymer film composite |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS584027B2 (ja) | 1983-01-24 |