JPS49125285A - - Google Patents
Info
- Publication number
- JPS49125285A JPS49125285A JP3876773A JP3876773A JPS49125285A JP S49125285 A JPS49125285 A JP S49125285A JP 3876773 A JP3876773 A JP 3876773A JP 3876773 A JP3876773 A JP 3876773A JP S49125285 A JPS49125285 A JP S49125285A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3876773A JPS49125285A (en) | 1973-04-06 | 1973-04-06 | |
| US408822A US3897325A (en) | 1972-10-20 | 1973-10-23 | Low temperature sputtering device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3876773A JPS49125285A (en) | 1973-04-06 | 1973-04-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS49125285A true JPS49125285A (en) | 1974-11-30 |
Family
ID=12534427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3876773A Pending JPS49125285A (en) | 1972-10-20 | 1973-04-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS49125285A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52150790A (en) * | 1976-06-10 | 1977-12-14 | Univ Sydney | Process and apparatus for reactionary vacuum evaporation |
| JPS5594479A (en) * | 1979-01-06 | 1980-07-17 | Coulter Systems Corp | Spattering method and apparatus |
| JPS55145172A (en) * | 1979-04-26 | 1980-11-12 | Hitachi Ltd | Forming apparatus for film |
| JPS59179785A (en) * | 1983-03-21 | 1984-10-12 | ザ・ビーオーシー・グループ・パブリック・リミテッド・カンパニー | Magnetron cathode sputtering device |
-
1973
- 1973-04-06 JP JP3876773A patent/JPS49125285A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52150790A (en) * | 1976-06-10 | 1977-12-14 | Univ Sydney | Process and apparatus for reactionary vacuum evaporation |
| JPS572272B2 (en) * | 1976-06-10 | 1982-01-14 | ||
| JPS5594479A (en) * | 1979-01-06 | 1980-07-17 | Coulter Systems Corp | Spattering method and apparatus |
| JPS55145172A (en) * | 1979-04-26 | 1980-11-12 | Hitachi Ltd | Forming apparatus for film |
| JPS59179785A (en) * | 1983-03-21 | 1984-10-12 | ザ・ビーオーシー・グループ・パブリック・リミテッド・カンパニー | Magnetron cathode sputtering device |