JPS49119584A - - Google Patents
Info
- Publication number
- JPS49119584A JPS49119584A JP3022173A JP3022173A JPS49119584A JP S49119584 A JPS49119584 A JP S49119584A JP 3022173 A JP3022173 A JP 3022173A JP 3022173 A JP3022173 A JP 3022173A JP S49119584 A JPS49119584 A JP S49119584A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3022173A JPS49119584A (enrdf_load_stackoverflow) | 1973-03-15 | 1973-03-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3022173A JPS49119584A (enrdf_load_stackoverflow) | 1973-03-15 | 1973-03-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS49119584A true JPS49119584A (enrdf_load_stackoverflow) | 1974-11-15 |
Family
ID=12297649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3022173A Pending JPS49119584A (enrdf_load_stackoverflow) | 1973-03-15 | 1973-03-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS49119584A (enrdf_load_stackoverflow) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57167111A (en) * | 1981-04-06 | 1982-10-14 | Nec Corp | Production for thin film device |
| JPS6059735A (ja) * | 1983-09-13 | 1985-04-06 | Nec Corp | 目合せ補正方法 |
| JPS6077426A (ja) * | 1983-09-23 | 1985-05-02 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 整合方法 |
| JPS6095435A (ja) * | 1983-10-28 | 1985-05-28 | Nippon Kogaku Kk <Nikon> | 露光用マスク |
| JPS6078156U (ja) * | 1983-11-01 | 1985-05-31 | パイオニア株式会社 | プリント基板 |
| JPS61159653A (ja) * | 1985-01-08 | 1986-07-19 | Nec Corp | 縮小投影型露光装置のフォーカス管理方法及び縮小投影型露光装置用テストレティクル |
| JPS6232614A (ja) * | 1985-08-03 | 1987-02-12 | Nippon Kogaku Kk <Nikon> | 精度検査方法及び該検査機能を有する露光装置 |
| JPH01193743A (ja) * | 1988-01-28 | 1989-08-03 | Nec Kyushu Ltd | レチクルマスク |
-
1973
- 1973-03-15 JP JP3022173A patent/JPS49119584A/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57167111A (en) * | 1981-04-06 | 1982-10-14 | Nec Corp | Production for thin film device |
| JPS6059735A (ja) * | 1983-09-13 | 1985-04-06 | Nec Corp | 目合せ補正方法 |
| JPS6077426A (ja) * | 1983-09-23 | 1985-05-02 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 整合方法 |
| JPS6095435A (ja) * | 1983-10-28 | 1985-05-28 | Nippon Kogaku Kk <Nikon> | 露光用マスク |
| JPS6078156U (ja) * | 1983-11-01 | 1985-05-31 | パイオニア株式会社 | プリント基板 |
| JPS61159653A (ja) * | 1985-01-08 | 1986-07-19 | Nec Corp | 縮小投影型露光装置のフォーカス管理方法及び縮小投影型露光装置用テストレティクル |
| JPS6232614A (ja) * | 1985-08-03 | 1987-02-12 | Nippon Kogaku Kk <Nikon> | 精度検査方法及び該検査機能を有する露光装置 |
| JPH01193743A (ja) * | 1988-01-28 | 1989-08-03 | Nec Kyushu Ltd | レチクルマスク |