JPS4910018A - - Google Patents

Info

Publication number
JPS4910018A
JPS4910018A JP5094572A JP5094572A JPS4910018A JP S4910018 A JPS4910018 A JP S4910018A JP 5094572 A JP5094572 A JP 5094572A JP 5094572 A JP5094572 A JP 5094572A JP S4910018 A JPS4910018 A JP S4910018A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5094572A
Other languages
Japanese (ja)
Other versions
JPS5435086B2 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5094572A priority Critical patent/JPS5435086B2/ja
Publication of JPS4910018A publication Critical patent/JPS4910018A/ja
Publication of JPS5435086B2 publication Critical patent/JPS5435086B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP5094572A 1972-05-23 1972-05-23 Expired JPS5435086B2 (https=)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5094572A JPS5435086B2 (https=) 1972-05-23 1972-05-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5094572A JPS5435086B2 (https=) 1972-05-23 1972-05-23

Publications (2)

Publication Number Publication Date
JPS4910018A true JPS4910018A (https=) 1974-01-29
JPS5435086B2 JPS5435086B2 (https=) 1979-10-31

Family

ID=12872945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5094572A Expired JPS5435086B2 (https=) 1972-05-23 1972-05-23

Country Status (1)

Country Link
JP (1) JPS5435086B2 (https=)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5087573U (https=) * 1973-12-14 1975-07-25
JPS50103731A (https=) * 1974-01-22 1975-08-16
JPS51136288A (en) * 1975-05-21 1976-11-25 Nippon Telegr & Teleph Corp <Ntt> Photo etching using non-crystalline carchogenide glass thin film
JPS5495081A (en) * 1978-01-12 1979-07-27 Zuitou Sangiyou Kk Smoke discharge dust removing device
JPS5546753A (en) * 1979-07-30 1980-04-02 Nippon Telegr & Teleph Corp <Ntt> Pattern formation method using photosensitive chalcogenide layer
JPS55149941A (en) * 1979-05-04 1980-11-21 Western Electric Co Article production process
CN109188607A (zh) * 2018-10-11 2019-01-11 宁波大学 一种具有保护层的SiO2沟道型硫系波导及其制备方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5087573U (https=) * 1973-12-14 1975-07-25
JPS50103731A (https=) * 1974-01-22 1975-08-16
JPS51136288A (en) * 1975-05-21 1976-11-25 Nippon Telegr & Teleph Corp <Ntt> Photo etching using non-crystalline carchogenide glass thin film
JPS5495081A (en) * 1978-01-12 1979-07-27 Zuitou Sangiyou Kk Smoke discharge dust removing device
JPS55149941A (en) * 1979-05-04 1980-11-21 Western Electric Co Article production process
JPS5546753A (en) * 1979-07-30 1980-04-02 Nippon Telegr & Teleph Corp <Ntt> Pattern formation method using photosensitive chalcogenide layer
CN109188607A (zh) * 2018-10-11 2019-01-11 宁波大学 一种具有保护层的SiO2沟道型硫系波导及其制备方法

Also Published As

Publication number Publication date
JPS5435086B2 (https=) 1979-10-31

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