JPS4910018A - - Google Patents
Info
- Publication number
- JPS4910018A JPS4910018A JP5094572A JP5094572A JPS4910018A JP S4910018 A JPS4910018 A JP S4910018A JP 5094572 A JP5094572 A JP 5094572A JP 5094572 A JP5094572 A JP 5094572A JP S4910018 A JPS4910018 A JP S4910018A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5094572A JPS5435086B2 (cg-RX-API-DMAC10.html) | 1972-05-23 | 1972-05-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5094572A JPS5435086B2 (cg-RX-API-DMAC10.html) | 1972-05-23 | 1972-05-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4910018A true JPS4910018A (cg-RX-API-DMAC10.html) | 1974-01-29 |
| JPS5435086B2 JPS5435086B2 (cg-RX-API-DMAC10.html) | 1979-10-31 |
Family
ID=12872945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5094572A Expired JPS5435086B2 (cg-RX-API-DMAC10.html) | 1972-05-23 | 1972-05-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5435086B2 (cg-RX-API-DMAC10.html) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5087573U (cg-RX-API-DMAC10.html) * | 1973-12-14 | 1975-07-25 | ||
| JPS50103731A (cg-RX-API-DMAC10.html) * | 1974-01-22 | 1975-08-16 | ||
| JPS51136288A (en) * | 1975-05-21 | 1976-11-25 | Nippon Telegr & Teleph Corp <Ntt> | Photo etching using non-crystalline carchogenide glass thin film |
| JPS5495081A (en) * | 1978-01-12 | 1979-07-27 | Zuitou Sangiyou Kk | Smoke discharge dust removing device |
| JPS5546753A (en) * | 1979-07-30 | 1980-04-02 | Nippon Telegr & Teleph Corp <Ntt> | Pattern formation method using photosensitive chalcogenide layer |
| JPS55149941A (en) * | 1979-05-04 | 1980-11-21 | Western Electric Co | Article production process |
| CN109188607A (zh) * | 2018-10-11 | 2019-01-11 | 宁波大学 | 一种具有保护层的SiO2沟道型硫系波导及其制备方法 |
-
1972
- 1972-05-23 JP JP5094572A patent/JPS5435086B2/ja not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5087573U (cg-RX-API-DMAC10.html) * | 1973-12-14 | 1975-07-25 | ||
| JPS50103731A (cg-RX-API-DMAC10.html) * | 1974-01-22 | 1975-08-16 | ||
| JPS51136288A (en) * | 1975-05-21 | 1976-11-25 | Nippon Telegr & Teleph Corp <Ntt> | Photo etching using non-crystalline carchogenide glass thin film |
| JPS5495081A (en) * | 1978-01-12 | 1979-07-27 | Zuitou Sangiyou Kk | Smoke discharge dust removing device |
| JPS55149941A (en) * | 1979-05-04 | 1980-11-21 | Western Electric Co | Article production process |
| JPS5546753A (en) * | 1979-07-30 | 1980-04-02 | Nippon Telegr & Teleph Corp <Ntt> | Pattern formation method using photosensitive chalcogenide layer |
| CN109188607A (zh) * | 2018-10-11 | 2019-01-11 | 宁波大学 | 一种具有保护层的SiO2沟道型硫系波导及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5435086B2 (cg-RX-API-DMAC10.html) | 1979-10-31 |