JPS4872971A - - Google Patents
Info
- Publication number
- JPS4872971A JPS4872971A JP234572A JP234572A JPS4872971A JP S4872971 A JPS4872971 A JP S4872971A JP 234572 A JP234572 A JP 234572A JP 234572 A JP234572 A JP 234572A JP S4872971 A JPS4872971 A JP S4872971A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP234572A JPS5547952B2 (cg-RX-API-DMAC7.html) | 1971-12-29 | 1971-12-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP234572A JPS5547952B2 (cg-RX-API-DMAC7.html) | 1971-12-29 | 1971-12-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4872971A true JPS4872971A (cg-RX-API-DMAC7.html) | 1973-10-02 |
| JPS5547952B2 JPS5547952B2 (cg-RX-API-DMAC7.html) | 1980-12-03 |
Family
ID=11526681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP234572A Expired JPS5547952B2 (cg-RX-API-DMAC7.html) | 1971-12-29 | 1971-12-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5547952B2 (cg-RX-API-DMAC7.html) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52139366A (en) * | 1976-05-14 | 1977-11-21 | Deetaa Gen Corp | Method of forming interface between metal and semiconductor |
| JPS5459081A (en) * | 1977-10-20 | 1979-05-12 | Toshiba Corp | Surface treatment method for semiconductor element |
| JPS61284925A (ja) * | 1985-06-10 | 1986-12-15 | Sony Corp | 半導体装置の製造方法 |
| WO2002047142A1 (en) * | 2000-12-05 | 2002-06-13 | Tokyo Electron Limited | Method and apparatus for treating article to be treated |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6355113B1 (en) | 1991-12-02 | 2002-03-12 | 3M Innovative Properties Company | Multiple solvent cleaning system |
-
1971
- 1971-12-29 JP JP234572A patent/JPS5547952B2/ja not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52139366A (en) * | 1976-05-14 | 1977-11-21 | Deetaa Gen Corp | Method of forming interface between metal and semiconductor |
| JPS5459081A (en) * | 1977-10-20 | 1979-05-12 | Toshiba Corp | Surface treatment method for semiconductor element |
| JPS61284925A (ja) * | 1985-06-10 | 1986-12-15 | Sony Corp | 半導体装置の製造方法 |
| WO2002047142A1 (en) * | 2000-12-05 | 2002-06-13 | Tokyo Electron Limited | Method and apparatus for treating article to be treated |
| US7208428B2 (en) | 2000-12-05 | 2007-04-24 | Tokyo Electron Limited | Method and apparatus for treating article to be treated |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5547952B2 (cg-RX-API-DMAC7.html) | 1980-12-03 |