JPS4863046U - - Google Patents

Info

Publication number
JPS4863046U
JPS4863046U JP10715971U JP10715971U JPS4863046U JP S4863046 U JPS4863046 U JP S4863046U JP 10715971 U JP10715971 U JP 10715971U JP 10715971 U JP10715971 U JP 10715971U JP S4863046 U JPS4863046 U JP S4863046U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10715971U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10715971U priority Critical patent/JPS4863046U/ja
Publication of JPS4863046U publication Critical patent/JPS4863046U/ja
Pending legal-status Critical Current

Links

JP10715971U 1971-11-16 1971-11-16 Pending JPS4863046U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10715971U JPS4863046U (enrdf_load_stackoverflow) 1971-11-16 1971-11-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10715971U JPS4863046U (enrdf_load_stackoverflow) 1971-11-16 1971-11-16

Publications (1)

Publication Number Publication Date
JPS4863046U true JPS4863046U (enrdf_load_stackoverflow) 1973-08-10

Family

ID=28019767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10715971U Pending JPS4863046U (enrdf_load_stackoverflow) 1971-11-16 1971-11-16

Country Status (1)

Country Link
JP (1) JPS4863046U (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5645024A (en) * 1979-09-21 1981-04-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Lithography apparatus
JPS57183033A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof
JPS63288014A (ja) * 1988-04-22 1988-11-25 Canon Inc 焼付け装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2887935A (en) * 1954-02-11 1959-05-26 Perkin Elmer Corp Optical image director
US2887939A (en) * 1953-11-13 1959-05-26 Hans Deckel Photographic exposure controlling apparatus
US3422442A (en) * 1966-01-12 1969-01-14 Us Army Micro-electronic form masking system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2887939A (en) * 1953-11-13 1959-05-26 Hans Deckel Photographic exposure controlling apparatus
US2887935A (en) * 1954-02-11 1959-05-26 Perkin Elmer Corp Optical image director
US3422442A (en) * 1966-01-12 1969-01-14 Us Army Micro-electronic form masking system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5645024A (en) * 1979-09-21 1981-04-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Lithography apparatus
JPS57183033A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof
JPS63288014A (ja) * 1988-04-22 1988-11-25 Canon Inc 焼付け装置

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