JPS4858066U - - Google Patents

Info

Publication number
JPS4858066U
JPS4858066U JP1971103255U JP10325571U JPS4858066U JP S4858066 U JPS4858066 U JP S4858066U JP 1971103255 U JP1971103255 U JP 1971103255U JP 10325571 U JP10325571 U JP 10325571U JP S4858066 U JPS4858066 U JP S4858066U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1971103255U
Other languages
Japanese (ja)
Other versions
JPS5435653Y2 (cg-RX-API-DMAC7.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1971103255U priority Critical patent/JPS5435653Y2/ja
Priority to US00304211A priority patent/US3830592A/en
Priority to DE2254665A priority patent/DE2254665B2/de
Publication of JPS4858066U publication Critical patent/JPS4858066U/ja
Application granted granted Critical
Publication of JPS5435653Y2 publication Critical patent/JPS5435653Y2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1971103255U 1971-11-08 1971-11-08 Expired JPS5435653Y2 (cg-RX-API-DMAC7.html)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1971103255U JPS5435653Y2 (cg-RX-API-DMAC7.html) 1971-11-08 1971-11-08
US00304211A US3830592A (en) 1971-11-08 1972-11-06 Semiconductor wafer positioning device
DE2254665A DE2254665B2 (en) 1971-11-08 1972-11-08 Alignment rig for projection photolithography - includes self centering subject table plus fine alignment controls

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1971103255U JPS5435653Y2 (cg-RX-API-DMAC7.html) 1971-11-08 1971-11-08

Publications (2)

Publication Number Publication Date
JPS4858066U true JPS4858066U (cg-RX-API-DMAC7.html) 1973-07-24
JPS5435653Y2 JPS5435653Y2 (cg-RX-API-DMAC7.html) 1979-10-29

Family

ID=14349320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1971103255U Expired JPS5435653Y2 (cg-RX-API-DMAC7.html) 1971-11-08 1971-11-08

Country Status (2)

Country Link
US (1) US3830592A (cg-RX-API-DMAC7.html)
JP (1) JPS5435653Y2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5566584A (en) * 1995-08-31 1996-10-22 Beta Squared, Inc. Flexure support for a fixture positioning device
EP1084001B1 (en) * 1998-02-14 2003-06-04 Lam Research Corporation Wafer loading apparatus
US6364386B1 (en) * 1999-10-27 2002-04-02 Agilent Technologies, Inc. Apparatus and method for handling an integrated circuit

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3521953A (en) * 1968-03-13 1970-07-28 Kulicke & Soffa Ind Inc Adjustable separation wafer clamp
US3645622A (en) * 1970-03-31 1972-02-29 Ibm Method and apparatus for aligning a photomask
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
US3705769A (en) * 1970-11-12 1972-12-12 Johannsmeier Karl Heinz Optical alignment and contact printing system with improved chuck assembly

Also Published As

Publication number Publication date
JPS5435653Y2 (cg-RX-API-DMAC7.html) 1979-10-29
US3830592A (en) 1974-08-20

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