JPS4847265A - - Google Patents
Info
- Publication number
- JPS4847265A JPS4847265A JP8088871A JP8088871A JPS4847265A JP S4847265 A JPS4847265 A JP S4847265A JP 8088871 A JP8088871 A JP 8088871A JP 8088871 A JP8088871 A JP 8088871A JP S4847265 A JPS4847265 A JP S4847265A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8088871A JPS4847265A (bg) | 1971-10-15 | 1971-10-15 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8088871A JPS4847265A (bg) | 1971-10-15 | 1971-10-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS4847265A true JPS4847265A (bg) | 1973-07-05 |
Family
ID=13730873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8088871A Pending JPS4847265A (bg) | 1971-10-15 | 1971-10-15 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS4847265A (bg) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5129939A (bg) * | 1974-05-24 | 1976-03-13 | Texas Instruments Inc | |
JPS5755043A (en) * | 1980-08-11 | 1982-04-01 | Perkin Elmer Corp | Magnetic lens |
JPS57151160A (en) * | 1981-03-16 | 1982-09-18 | Internatl Precision Inc | Electron lens |
JPS5941853U (ja) * | 1982-09-01 | 1984-03-17 | 日本電子株式会社 | 電子レンズ |
JP2005079092A (ja) * | 2003-08-29 | 2005-03-24 | Leica Microsystems Lithography Ltd | 電子ビームの磁場作用における熱補償 |
JP2006210035A (ja) * | 2005-01-26 | 2006-08-10 | Hitachi High-Technologies Corp | 電子レンズ及びこれを用いた荷電粒子線装置 |
WO2013015311A1 (ja) * | 2011-07-26 | 2013-01-31 | 株式会社日立ハイテクノロジーズ | 電磁レンズおよび荷電粒子装置 |
-
1971
- 1971-10-15 JP JP8088871A patent/JPS4847265A/ja active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5129939A (bg) * | 1974-05-24 | 1976-03-13 | Texas Instruments Inc | |
JPS5755043A (en) * | 1980-08-11 | 1982-04-01 | Perkin Elmer Corp | Magnetic lens |
JPH0419664B2 (bg) * | 1980-08-11 | 1992-03-31 | Perkin Elmer Corp | |
JPS57151160A (en) * | 1981-03-16 | 1982-09-18 | Internatl Precision Inc | Electron lens |
JPS6338825B2 (bg) * | 1981-03-16 | 1988-08-02 | Akashi Seisakusho Kk | |
JPS5941853U (ja) * | 1982-09-01 | 1984-03-17 | 日本電子株式会社 | 電子レンズ |
JP2005079092A (ja) * | 2003-08-29 | 2005-03-24 | Leica Microsystems Lithography Ltd | 電子ビームの磁場作用における熱補償 |
JP2006210035A (ja) * | 2005-01-26 | 2006-08-10 | Hitachi High-Technologies Corp | 電子レンズ及びこれを用いた荷電粒子線装置 |
JP4676209B2 (ja) * | 2005-01-26 | 2011-04-27 | 株式会社日立ハイテクノロジーズ | 電子レンズ及びこれを用いた荷電粒子線装置 |
WO2013015311A1 (ja) * | 2011-07-26 | 2013-01-31 | 株式会社日立ハイテクノロジーズ | 電磁レンズおよび荷電粒子装置 |
JP2013030276A (ja) * | 2011-07-26 | 2013-02-07 | Hitachi High-Technologies Corp | 電磁レンズおよび荷電粒子装置 |