JPS4830874A - - Google Patents

Info

Publication number
JPS4830874A
JPS4830874A JP46064415A JP6441571A JPS4830874A JP S4830874 A JPS4830874 A JP S4830874A JP 46064415 A JP46064415 A JP 46064415A JP 6441571 A JP6441571 A JP 6441571A JP S4830874 A JPS4830874 A JP S4830874A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP46064415A
Other languages
Japanese (ja)
Other versions
JPS546866B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6441571A priority Critical patent/JPS546866B2/ja
Publication of JPS4830874A publication Critical patent/JPS4830874A/ja
Publication of JPS546866B2 publication Critical patent/JPS546866B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP6441571A 1971-08-25 1971-08-25 Expired JPS546866B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6441571A JPS546866B2 (en) 1971-08-25 1971-08-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6441571A JPS546866B2 (en) 1971-08-25 1971-08-25

Publications (2)

Publication Number Publication Date
JPS4830874A true JPS4830874A (en) 1973-04-23
JPS546866B2 JPS546866B2 (en) 1979-04-02

Family

ID=13257622

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6441571A Expired JPS546866B2 (en) 1971-08-25 1971-08-25

Country Status (1)

Country Link
JP (1) JPS546866B2 (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5975047A (en) * 1982-10-25 1984-04-27 アロカ株式会社 Ultrasonic diagnostic apparatus
JPS6090542A (en) * 1983-10-24 1985-05-21 株式会社日立製作所 Sensor for ultrasonic photographing apparatus
JPS61181472A (en) * 1985-02-08 1986-08-14 福留 武朗 Blood vessel puncture method and jig
JPS61226924A (en) * 1985-04-01 1986-10-08 Canon Inc Exposing device
JPS6243125A (en) * 1985-08-21 1987-02-25 Canon Inc Pattern printing machine
JPS6249843A (en) * 1985-08-29 1987-03-04 株式会社東芝 Ultrasonic stone crushing apparatus
JPS6274811U (en) * 1985-10-30 1987-05-13
JPS62183772A (en) * 1986-02-10 1987-08-12 福留 武朗 Vessel puncturing instrument
JPS6379318A (en) * 1987-09-11 1988-04-09 Hitachi Ltd Reduction projection exposure method
JPS63177866A (en) * 1986-09-18 1988-07-22 ポール ジー ヨック Apparatus used in cannulation of blood vessel
JPS63211622A (en) * 1987-02-17 1988-09-02 Yokogawa Hewlett Packard Ltd Multilevel-reticle and pattern transfer method
JPS63296219A (en) * 1986-11-05 1988-12-02 エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド Method and apparatus for replacing reticle quickly in wafer manufacture
JPH02107238A (en) * 1988-10-17 1990-04-19 Aloka Co Ltd Puncture needle type ultrasonic diagnostic apparatus
JPH02107237A (en) * 1988-10-17 1990-04-19 Aloka Co Ltd Puncture needle type ultrasonic diagnostic apparatus
JPH05206014A (en) * 1991-10-22 1993-08-13 Internatl Business Mach Corp <Ibm> Mask for lithography, designing and alignment of lithographic mask and sequential exposure system
JPH075692A (en) * 1993-06-04 1995-01-10 Canon Inc Mask exchanging device
JP2008218769A (en) * 2007-03-06 2008-09-18 Nikon Corp Mask holding device, mask adjustment method, exposure equipment, and exposure method

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5975047A (en) * 1982-10-25 1984-04-27 アロカ株式会社 Ultrasonic diagnostic apparatus
JPS6090542A (en) * 1983-10-24 1985-05-21 株式会社日立製作所 Sensor for ultrasonic photographing apparatus
JPH059097B2 (en) * 1983-10-24 1993-02-04 Hitachi Ltd
JPS61181472A (en) * 1985-02-08 1986-08-14 福留 武朗 Blood vessel puncture method and jig
JPS61226924A (en) * 1985-04-01 1986-10-08 Canon Inc Exposing device
JPS6243125A (en) * 1985-08-21 1987-02-25 Canon Inc Pattern printing machine
JPS6249843A (en) * 1985-08-29 1987-03-04 株式会社東芝 Ultrasonic stone crushing apparatus
JPH0310732Y2 (en) * 1985-10-30 1991-03-18
JPS6274811U (en) * 1985-10-30 1987-05-13
JPS62183772A (en) * 1986-02-10 1987-08-12 福留 武朗 Vessel puncturing instrument
JPS63177866A (en) * 1986-09-18 1988-07-22 ポール ジー ヨック Apparatus used in cannulation of blood vessel
JPS63296219A (en) * 1986-11-05 1988-12-02 エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド Method and apparatus for replacing reticle quickly in wafer manufacture
JPS63211622A (en) * 1987-02-17 1988-09-02 Yokogawa Hewlett Packard Ltd Multilevel-reticle and pattern transfer method
JPS6379318A (en) * 1987-09-11 1988-04-09 Hitachi Ltd Reduction projection exposure method
JPH02107237A (en) * 1988-10-17 1990-04-19 Aloka Co Ltd Puncture needle type ultrasonic diagnostic apparatus
JPH02107238A (en) * 1988-10-17 1990-04-19 Aloka Co Ltd Puncture needle type ultrasonic diagnostic apparatus
JPH0428377B2 (en) * 1988-10-17 1992-05-14 Aloka
JPH0428378B2 (en) * 1988-10-17 1992-05-14 Aloka
JPH05206014A (en) * 1991-10-22 1993-08-13 Internatl Business Mach Corp <Ibm> Mask for lithography, designing and alignment of lithographic mask and sequential exposure system
JPH075692A (en) * 1993-06-04 1995-01-10 Canon Inc Mask exchanging device
JP2008218769A (en) * 2007-03-06 2008-09-18 Nikon Corp Mask holding device, mask adjustment method, exposure equipment, and exposure method

Also Published As

Publication number Publication date
JPS546866B2 (en) 1979-04-02

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