JPH119943A - Pulse electric source and pulse charging gas treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a pulse electric source in which a stable gas treating capacity can be maintained regardless of variations in concentration of harmful gas component in a gas to be treated and further energy saving can be achieved. SOLUTION: A pulse electric source device 2 includes a pulse electric source unit 5 to impress high voltage pulse to a gas treatment unit 1 for removing dust and harmful gas in a gas by generating plasma by charging high voltage pulses, an injection energy arithmetic unit 6 which receives the concentration of a specific gas component of a gas to be treated as an input signal Io to calculate a required injection energy per unit gas volume in high voltage pulses, and a high voltage pulse control unit 7 to control the output power and pulse frequency of the unit 5, and the unit 7 receives required injection energy per unit gas value calculated by the unit 6 and flow rate Q of the gas to be treated in the unit 1, as input signals to control an output power and pulse frequency.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pulse charged gas processing apparatus for generating plasma by high voltage pulse charging to remove dust, harmful gas and the like in a gas, and a pulse charged gas processing apparatus. The present invention relates to a pulse power supply that generates a high-voltage pulse.

[0002]

2. Description of the Related Art A conventional pulse-charged gas processing apparatus of this type includes a gas processing section for generating plasma by high-voltage pulse charging to remove dust, harmful gas, and the like in a gas, and a high-pressure gas processing section. And a pulse power supply device for applying a voltage pulse. For example, as a device used in a garbage incineration facility, high levels of dioxins, nitrogen oxides, sulfur oxides, and the like, which are harmful gas components in the gas to be treated, are high. Some are made harmless by oxidation or decomposition by corona discharge due to voltage pulse charging. On the other hand, the removal rate of the harmful gas components as the components to be treated depends on the concentration of the components to be treated before the treatment. Therefore, in order to achieve a certain removal rate, it is necessary to inject larger energy from a high voltage pulse as the concentration is higher. In addition, as an example, the concentrations of the components to be processed rapidly change with time, as shown in FIG.
There is no conventional pulse power supply of this type that can adjust the output condition of the high-voltage pulse according to such a rapid change in the concentration of the component to be processed in order to appropriately supply the energy required for gas processing. For this reason, the conventional pulse charged gas processing apparatus sets in advance the injection energy required to process the expected maximum concentration of the gas component to be processed, and sets a constant injection energy set value for the maximum concentration in the gas processing. The pulse power supply device was controlled so as to supply the power to the unit.

[0003]

However, in the conventional pulse-charged gas processing apparatus using the above-described conventional pulse power supply apparatus, when the gas component to be processed has a low concentration, unnecessary excessive energy is generated in the gas to be processed. Supplied to
Unnecessary energy consumption was performed. Further, as described above, the temporal fluctuation of the concentration of the component to be processed is so rapid that the conventional pulse power supply cannot be manually controlled in accordance with the change in the concentration of the component to be processed.

An object of the present invention is to solve the above-mentioned problems,
An object of the present invention is to provide a pulse power supply device and a pulse charged gas treatment device which can maintain a stable gas treatment ability irrespective of a concentration change of a harmful gas component in a gas to be treated and can save energy.

[0005]

A first feature of the pulse power supply according to the present invention for achieving this object is to provide a high-voltage pulse charging as described in claim 1 of the claims. Dust in gas by generating plasma,
A pulse power supply unit that applies a high-voltage pulse to a gas processing unit that removes harmful gas and the like, and receives a specific gas component concentration of the gas to be processed as an input signal and receives the high-voltage pulse per unit gas volume. An injection energy calculation unit that calculates injection energy, and a high-voltage pulse control unit that controls the output power and pulse frequency of the pulse power supply unit,
The high-voltage pulse control unit receives the required injection energy per unit gas volume calculated by the injection energy calculation unit and the flow rate of the gas to be processed in the gas processing unit as input signals, and calculates the output power and the pulse frequency. The point is to control.

According to a second feature of the present invention, as described in claim 2 of the claims, in addition to the first feature of the present invention, the injection energy calculation unit performs processing of the gas to be processed. A first receiving unit that receives a pre- or post-processed component concentration as an input signal; and a pre- or post-processed component concentration received by the first receiving unit and a required injection energy per unit gas volume. A first storage unit for storing a first empirical formula indicating a relationship in advance; and a first empirical formula calculation unit for calculating a required injection energy per unit gas volume based on the first empirical formula. On the point.

According to a third feature of the present invention, as described in claim 3 of the claims, in the pulse power supply device having the second feature described above, instead of the concentration of the component to be processed, The point is that a specific gas component concentration having a certain correlation with the concentration of the component to be processed is used as an input signal of the injection energy calculation unit.

According to a fourth feature of the invention, as described in claim 4 of the claims, in addition to the first feature of the invention, the injection energy calculating unit includes a plurality of the processing target gases. A second receiving unit for receiving the gas component concentration as an input signal, and a second storing in advance a plurality of empirical formulas separately indicating a relationship between the plurality of gas component concentrations and the required injection energy per unit gas volume. A storage unit, a second empirical formula calculating unit for individually calculating the required injection energy per unit gas volume based on the plurality of empirical formulas, and a plurality of unit gas capacities calculated by the second empirical formula calculating unit And a selector for selecting the maximum value of the required implantation energy per unit.

According to a fifth aspect, as described in claim 5 of the claims, in addition to the fourth aspect, the input signal received by the second receiving section may include a plurality of input signals. Is the gas component concentration of different gas components.

[0010] The sixth characteristic configuration is, as described in claim 6 of the claims section, the above-described first, second, third, and third features.
In addition to the fourth or fifth characteristic configuration, a current-voltage detector capable of detecting an instantaneous voltage value and an instantaneous current value of the high-voltage pulse applied to the gas processing unit, and the current-voltage detector detects the instantaneous voltage value and the instantaneous current value. A first pulse energy calculator for calculating a time power product per pulse from the instantaneous voltage value and the instantaneous current value, wherein the high-voltage pulse controller controls one pulse calculated by the first pulse energy calculator. The injection energy per unit gas volume calculated by the product of the time power product per unit, the pulse frequency, and the reciprocal of the gas flow rate received as the input signal, and the injection energy per unit gas volume calculated by the injection energy calculation unit. In order to maintain the required implantation energy or more, the output voltage and the pulse frequency of the pulse power supply unit are controlled while being related to each other so as to be within a predetermined range.

[0011] The seventh characteristic configuration is, as described in claim 7 of the claims section, the above-mentioned first, second, third, and third features.
In addition to the fourth or fifth characteristic configuration, the relationship between the output voltage value of the high-voltage pulse applied to the gas processing unit and the time power product per pulse is determined for each moisture concentration or oxygen concentration of the gas to be treated. An output characteristic storage unit that stores in advance, and a water concentration or an oxygen concentration of the gas to be processed is received as an input signal, and the output voltage value stored in the output characteristic storage unit and a time power product per pulse are calculated. A second pulse energy calculation unit that calculates a time power product per pulse based on the relationship, wherein the high-voltage pulse control unit calculates the time power product per pulse calculated by the second pulse energy calculation unit. And the injection energy per unit gas volume calculated by the product of the pulse frequency and the reciprocal of the gas flow rate detected by the gas flow meter. To maintain unnecessarily injection energy per gas volume, in terms of control with each other in conjunction so as to fall within respective predetermined ranges the output voltage and the pulse frequency of the pulsed power supply unit.

A first characteristic configuration of the pulse charged gas processing apparatus according to the present invention for achieving this object is to generate plasma by high voltage pulse charging as described in claim 8 of the claims. A gas processing unit for removing dust in the gas, harmful gas, etc., and a pulse power supply device according to claim 1, 2, 3, 4, 5, or 6 for applying a high-voltage pulse to the gas processing unit; A gas concentration meter for detecting a specific gas component concentration of the gas to be treated at a predetermined location, and a gas flow meter for detecting a gas flow rate of the gas to be treated in the gas treatment section, wherein the pulse power supply device comprises: The configuration is such that the gas component concentration detected by the meter and the gas flow rate to be processed detected by the gas flow meter can be received as input signals.

The second feature of the present invention is a gas treatment for generating plasma by high-voltage pulse charging to remove dust, harmful gas and the like in a gas, as described in claim 11 of the claims. Unit, a pulse power supply device according to claim 7, which applies a high-voltage pulse to the gas processing unit, a gas concentration meter that detects a specific gas component concentration of the gas to be processed at a predetermined location, and a gas concentration meter inside the gas processing unit. A gas flow meter for detecting the flow rate of the gas to be treated, and at least one of a moisture concentration meter for detecting the moisture concentration of the gas to be treated and an oxygen concentration meter for detecting the oxygen concentration of the gas to be treated. The pulse power supply, the gas component concentration detected by the gas concentration meter, the gas flow rate to be processed detected by the gas flow meter and the moisture concentration detected by the moisture concentration meter or the oxygen concentration or In that it configured to be capable of receiving oxygen concentration as an input signal.

The operation and effect will be described below. According to the first characteristic configuration of the pulse power supply device according to the present invention, the injection energy calculation unit inputs a specific gas component concentration of the gas to be processed detected by the gas processing unit of the pulse charged gas processing device into an input signal. As the received gas component concentration, based on the received gas component concentration, the injection energy per unit gas volume required to remove the gas component to be processed to a predetermined concentration or less by oxidation or decomposition or the like is calculated, and the high energy is calculated. The voltage pulse control unit receives, as input signals, the required injection energy per unit gas volume calculated by the injection energy calculation unit and the flow rate of the gas to be processed in the gas processing unit detected at a predetermined location in the pulse charged gas processing apparatus. The output power and the pulse frequency to be output by the pulse power supply unit are determined by the injection energy per unit gas volume to be output by the pulse power supply unit. Serial than it can be controlled so as to maintain a constant relationship to the implantation energy required implant energy per unit gas volume calculation unit has calculated. That is, the pulse power supply unit can automatically inject energy required to remove the target component to a predetermined concentration or less into the target gas in the gas processing unit regardless of the fluctuation of the target component concentration. As a result, it is possible to stably maintain the gas processing capacity of the pulse charged gas processing apparatus using the pulse power supply apparatus according to the present invention and save energy.

The gas component having the gas component concentration received by the injection energy calculating unit as an input signal does not necessarily have to match the gas component to be processed. The injection energy calculation unit previously stores the relationship between the received gas component concentration and the required injection energy per unit gas volume required to remove the gas component to be processed to a predetermined concentration or less in the form of a relational expression or the like. It is enough. This is applied, for example, to the case where a gas component such as dioxin which cannot be measured by a continuous analyzer is detected by detecting the carbon monoxide concentration with a certain correlation with the dioxin concentration to remove dioxin.

According to the second characteristic configuration, the above-mentioned relationship that the removal rate of the component to be treated in the gas to be treated depends on the concentration of the component to be treated before or after the treatment and the implantation energy is directly used. Thus, the required injection energy per unit gas volume to be injected into the gas to be processed can be calculated with high accuracy. Specifically, by applying the unprocessed component concentration received by the first receiving unit to the first empirical formula stored in the first storage unit, the unprocessed component concentration before the processing is calculated. As a result, the relationship between the required injection energy per unit gas volume and the required injection energy per unit gas volume for reducing the component to be processed to a predetermined concentration or less is directly used. It can be calculated with precision. When detecting the post-processing concentration, the injection energy can be adjusted while checking the gas processing result.

Here, the relation that the removal rate of the component to be treated in the gas to be treated depends on the concentration of the component to be treated before the treatment and the implantation energy is, that is, the concentration before the treatment for the specific component to be treated and the concentration after the treatment. Since the density is equal to the relationship between the concentration and the implantation energy, the post-processing concentration actually detected for the implantation energy set to remove a specific component to be processed up to the predetermined concentration is determined by the predetermined processing. The result is that the energy actually injected can be corrected as compared with the post-concentration. In other words, this is equivalent to calculating the first empirical formula, which is the relationship between the post-processing concentration and the required injection energy per unit gas volume. Generally, feedback control for detecting the density after processing, comparing the density with the reference value, and adjusting the injection energy so that the density after processing falls within a predetermined range with respect to the reference value is considered as a usual means. However, it should be noted that the response of the control system is actually slow because the object to be handled is a high-voltage pulse, and that stable control itself is difficult.

According to the third characteristic configuration, gas components which cannot be measured in real time by a continuous analyzer or the like even though the concentration of the component to be processed changes rapidly, as in the second characteristic configuration. , It can be removed to below a certain gas component concentration. In this case, the injection energy calculation unit previously determines the relationship between the received gas component concentration and the required injection energy per unit gas volume required to remove the gas component to be processed to a predetermined concentration or less by using a relational expression or the like. It suffices to store them in the form or to prepare a relational expression between the concentration of the gas component to be received and the concentration of the component to be processed separately from the first empirical formula. As a result, for example, for gas components that cannot be measured by a continuous analyzer such as dioxin,
A certain correlation with the dioxin concentration can be applied to the case where the carbon monoxide concentration is detected and the dioxin is removed.

According to the fourth characteristic configuration, when the processing target covers a plurality of gas components, or even when the same gas component is used, the gas component needs to be calculated in order to improve the accuracy of calculating the required injection energy per unit gas volume. It can easily cope with the case where the number of concentration detection points is increased.

According to the fifth characteristic configuration, it is possible to cope with a case where the processing target covers a plurality of gas components. For example, dioxins, nitrogen oxides, sulfur oxides, etc. can be treated simultaneously. Specifically, the required injection energy per unit gas volume is calculated for each of the components to be processed, and the maximum value of the required injection energy for each of the components to be processed is injected into the gas to be processed. It can be made harmless. In practice, the required injection energy per unit gas volume determined for each component to be processed is not completely injected into each component to be processed and works 100% effectively, but electrons are directly generated by corona discharge. When the injection energy is constant, such as when it is decomposed by colliding with nitrogen molecules or oxygen molecules, when active oxygen is generated and the oxidation of the component to be processed is activated, or when nitrogen radicals are generated and a reduction action occurs. Acting on each component to be processed with probability,
The remainder of the implant energy acting on a particular component to be processed also affects other components to be processed. For this reason,
The maximum value of the required injection energy per unit gas volume determined for each component to be processed may be selected.

According to the sixth characteristic configuration, the time power product per one pulse calculated by the first pulse energy calculation unit and the required injection energy per unit gas volume calculated by the injection energy calculation unit are calculated. Since a constant relationship between the output power per pulse of the high-voltage pulse control unit and the pulse frequency can be determined from the flow rate of the gas to be processed in the gas processing unit detected at a predetermined location of the pulse charged gas processing device. Based on the fixed relationship, by controlling the output voltage and the pulse frequency of the pulse power supply unit while correlating each other so as to be within a predetermined range determined from the limit performance of the device, the pulse power supply unit The required injection energy per unit gas volume calculated by the injection energy calculation unit from the injection energy per unit gas volume actually injected into the gas to be processed. It can be maintained above, as a result, it is the attained stable maintenance of energy saving of the pulse charged gas processing apparatus and a gas processing capacity. As specific control of the output voltage and the pulse frequency, for example, while adjusting the output voltage so that each high-voltage pulse does not deviate from the corona discharge region, the time power product per pulse determined by the output voltage is calculated. Detecting the instantaneous voltage value and the instantaneous current value of the high voltage pulse by the current / voltage detection unit, calculating the first pulse energy calculation unit based on the detection result, and determining the pulse frequency based on the fixed relationship. You do it.
If the pulse frequency does not fall within the predetermined range, the output voltage is adjusted.

According to the seventh characteristic configuration, the functions of the current / voltage detecting section and the first pulse energy calculating section in the sixth characteristic configuration are replaced by a water concentration provided at a predetermined location of the pulse charged gas processing apparatus. Instead of a meter or an oximeter, the output characteristic storage unit, and the second pulse energy calculation unit,
The same operation and effect as the sixth characteristic configuration can be expected. In particular, when the moisture concentration meter or the oxygen concentration meter is provided in the pulsed charged gas treatment device, the current / voltage detection unit constituted by the current / voltage probe for the high voltage from the pulse power supply device becomes unnecessary, so that it is effective. It is. Also,
The first pulse energy calculator in the sixth characteristic configuration calculates the time power product per pulse from the instantaneous voltage value and the instantaneous current value of the high-voltage pulse actually detected by the current-voltage detector. The second pulse energy calculation unit of this characteristic configuration directly calculates the one-pulse energy from the relationship between the output voltage value of the high-voltage pulse for each moisture concentration or oxygen concentration and the time power product per pulse simply obtained by experiments or the like. It is configured to calculate the time power product per pulse. As shown in FIG. 3, as an example, if the moisture concentration of the gas to be processed changes, the load characteristic of the gas to be processed during corona discharge changes, and the instantaneous voltage value and instantaneous current value of the high-voltage pulse are changed. The IV characteristic also changes, and the time power product per pulse also changes uniquely for a fixed output voltage value. Further, the oxygen concentration and the water concentration have a certain correlation, and the oxygen concentration can be used instead of the water concentration.

According to the first characteristic configuration of the pulse charged gas processing apparatus according to the present invention, the pulse power supply apparatus can exhibit the functions and effects of the above-described first to sixth characteristic configurations of the pulse power supply apparatus according to the present invention. The gas component concentration of the gas to be processed and the flow rate of the gas to be processed can be detected by the gas concentration meter and the gas flow meter and used as an input signal, and the same effect as a pulse charged gas processing device is expected. Because

According to a second characteristic configuration of the pulse charged gas processing apparatus according to the present invention, the pulse power supply apparatus receives the pulse power supply apparatus in order to exhibit the effect of the seventh characteristic configuration of the pulse power supply apparatus according to the present invention. The gas component concentration of the gas to be processed, the flow rate of the gas to be processed, the moisture concentration or the oxygen concentration can be detected by the gas concentration meter, the gas flow meter and the moisture concentration or the oxygen concentration meter, and used as an input signal, The same effect can be expected as a pulse charged gas processing apparatus.

[0025]

Embodiments of the present invention will be described below with reference to the drawings. As shown in FIG. 1, a pulse-charged gas processing apparatus according to the present invention includes a gas processing section 1 for generating plasma by high-voltage pulse charging to remove nitrogen oxides and dioxins in a gas; A pulse power supply device 2 according to the present invention for applying a high-voltage pulse to a gas treatment device 1; and a gas concentration meter capable of separately measuring a nitrogen oxide concentration and a carbon monoxide concentration of a gas to be treated processed in the gas treatment unit 1. 3 and a gas flow meter 4 for measuring the flow rate Q of the gas to be treated. Further, the pulse power supply device 2 includes a pulse power supply unit 5 that generates a high-voltage pulse whose output voltage V and a pulse frequency f (the number of pulses per second) are variable based on an external input, and the gas concentration meter 3. implantation energy calculation section 6 which receives the detected NOx concentration and carbon monoxide concentration in the treated gas was as an input signal I ₀ calculates the required implant energy W ₀ per unit gas volume of the high-voltage pulse A high-voltage pulse control unit 7 for controlling the output power P and pulse frequency f of the pulse power supply unit 5; and an instantaneous voltage value and an instantaneous current value of the high-voltage pulse applied to the gas processing unit 1 can be detected. A first pulse energy calculator 9 for calculating a time power product E per one pulse of the high voltage pulse from the instantaneous voltage value and the instantaneous current value detected by the current / voltage detector 8. Be prepared This is the configuration.

The specific configuration of the current / voltage detector 8, the first pulse energy calculator 9, the injection energy calculator 6, and the high voltage pulse controller 7 will be described. The output terminal 10 of the pulse power supply unit 5 and the input terminal 11 of the gas processing unit 1 are subjected to necessary insulation treatment and are electrically connected by a cable 12, and the cable 12 is provided with a voltage / current probe 13. The current / voltage detector 8 is configured.

The instantaneous voltage value and instantaneous current value detected by the voltage / current probe 13 are calculated by a digital oscilloscope 14.
The instantaneous voltage value and instantaneous current value data amplified and signal-processed by the digital oscilloscope 14 are input to a computer 15, and a predetermined built-in program is executed by the computer to execute a time power product E per pulse. Is calculated. The digital oscilloscope 14 and a part of the computer 15 constitute the first pulse energy calculator 9.

The injection energy calculating section 6 performs the gas concentration calculation.
Oxide Concentration and Monoacid Concentration of Gas to be Treated
Input signal I of carbonized carbon concentration₀The predetermined signal format
After the conversion by the first signal converter 16
Each of the 15 first receiving units 17 is a predetermined input terminal.
A predetermined built-in program is executed by the computer 15.
The required injection energy per unit gas volume to be executed
W₀The first signal converter 16 and the previous signal converter 16 are operated so that
It is composed of a part of the computer 15. Each input signal
Issue I₀The second receiving unit 18 is configured by another first receiving unit 17
Have been. More specifically, specific treatments in the gas to be treated
Gas component concentration before treatment and gas composition after treatment
Partial concentration and actual injection energy W per unit gas volume₁Noseki
As shown in FIG. 2, the
And based on the relationship, the gas flow meter 4
If it is installed at the entrance 19 of the processing unit 1,
Gas component concentration and required injection energy per unit gas volume
W₀The first empirical formula, which is the relational expression of
Stored in a predetermined storage area in the computer 15
ing. If the object to be treated is a nitrogen oxide,
Concentration W and required injection energy W per unit gas volume₀
Can be measured directly, but the target is dioxin
If the dioxin concentration is
Measurement, the correlation between dioxin concentration and
Dioxin is determined using the relevant carbon monoxide concentration.
Per unit gas volume required to remove below the concentration
Required injection energy W ₀Is the same as in the case of nitrogen oxides.
The same relational expression can be obtained. In this way,
Per two unit gas volumes from the two relational equations provided
Required implantation energy W₀Is calculated, the size of which is
Is programmed to select whichever value you want.

The output voltage of the high voltage pulse control unit 7
Specifically, the control of the force P and the pulse frequency f
The pressure pulse control unit 7 operates as the first pulse energy calculation unit 9
Time power product per pulse E (Wh / P
And the pulse frequency f (pulses / second) and the gas
The gas flow rate Q (Nm^Three/ H)
To the unit gas capacity calculated by the following equation 1.
Actual injection energy W ₁(Wh / Nm^Three), The injection
The energy calculator 6 calculates the input signal I₀Calculated based on
Injection energy W per unit gas volume₀(Wh /
Nm^Three) In order to maintain the above, the output of the pulse power supply unit 5
So that the voltage V and the pulse frequency f fall within predetermined ranges, respectively.
It is executed by controlling while relating to each other.

[0030]

## EQU1 ## W ₁ = E × f ÷ Q

The control related to the output voltage V and the pulse frequency f is such that the output voltage V does not reach the arc discharge region from the corona discharge region starting at around 50 kV to the high voltage side. The pulse frequency f is adjusted based on the instantaneous voltage value and instantaneous current value of the high-voltage pulse detected by the current-voltage detection unit 8, and the pulse frequency f determined by the output voltage V is the performance limit of the pulse power supply unit 5. If it does not fall within the limited range, the pulse frequency f
Is adjusted so that the output voltage V falls within the predetermined range. More specifically, an output voltage control signal C _V for adjusting the output voltage _V and a pulse frequency control signal C _f for adjusting the pulse frequency f are output from the second signal converter 20.
The signal is converted into a predetermined signal format via the signal generator and output to the pulse power supply unit 5. Therefore, the high-voltage pulse control unit 7 converts a part of the computer 15, the second signal converter 20, and the gas flow rate Q detected by the gas flow meter 4 into a predetermined signal format. It is composed of a part of the first signal converter 16.

Hereinafter, another embodiment will be described. (1) In the present embodiment, the gas concentration meter 3 is installed at the inlet 19 of the gas processing unit 1, but may be installed at the outlet 21. In that case, the specific relationship of the actual implantation energy W ₁ of the gas component concentration and per unit gas volume after treatment with the gas component density before processing for each subject gas components in the gas to be treated shown in FIG. 2, the As a first empirical formula, the gas component concentration after processing and the required injection energy W ₀ per unit gas volume are as follows.
Is preferably derived and stored in a predetermined storage area in the computer 15. Further, when the processed gas component concentration detected by the gas concentration meter 3 installed at the outlet 21 and converted into a signal format is input to the first receiving unit 17, the gas component concentration after the processing and the gas component concentration before the processing are distinguished. It is also preferable to perform arithmetic processing. Further, the input terminal of the first receiving unit 17 may be the same as or different from the gas component concentration before and after the processing. Furthermore, if the output signal format of the gas concentration meter 3 is a signal format that can be received by the injection energy calculation unit 6, the first signal converter 16 is necessarily included in the injection energy calculation unit 6. Also, the first signal converter 16 may be a component of an independent pulsed charged gas processing device.

Further, the gas concentration meter 3 may be installed at both the inlet 19 and the outlet 21 of the gas processing section 1.
In this case, the relationship between the nitrogen oxide concentration and the required injection energy W ₀ per unit gas volume, the carbon monoxide concentration, and the required injection per unit gas volume required to remove dioxin to a predetermined concentration or less using the same. Energy W ₀ relation 2
The two types of first empirical formulas for the gas component concentrations before and after the type relationship, ie, a total of four types of relational expressions, are stored in a predetermined storage area in the computer 15, and the injection energy calculation unit 6 is also a preferred embodiment of the is configured to select a maximum value among the required implant energy W ₀ per unit gas volume calculated by the equation.

When the gas concentration meter 3 is installed at both the inlet 19 and the outlet 21 of the gas treatment section 1, the gas component concentration before the treatment and the gas concentration per unit gas volume calculated by the first empirical formula are used. The required injection energy can follow a rapid change in the concentration of the component to be processed, and the required component energy per unit gas volume calculated from the gas component concentration after the processing and the first empirical formula is equal to the component to be processed after the processing. Since the change in the concentration is reduced as compared with that before the process, the trend of the concentration of the component to be processed can be grasped, the necessary implantation energy is controlled based on the trend change, and the component to be processed after the process is processed. Thus, the control of the necessary implantation energy can be performed with high performance and high reliability, which can be performed together with the concentration confirmation.

(2) In the above embodiment, instead of providing the current / voltage detecting section 8 and the first pulse energy calculating section 9 in the pulse power supply device 2, as shown in FIG. An output characteristic storage unit 8a for storing in advance the relationship between the output voltage value V of the high-voltage pulse applied to and the time power product E per pulse for each moisture concentration of the gas to be treated, and a moisture concentration of the gas to be treated. To the input signal I ₁
And the time power product E per pulse is calculated based on the relationship between the output voltage value V and the time power product E per pulse, which is stored in the output characteristic storage unit 8a and derived in advance by an experiment. And a second pulse energy calculating unit 9a for measuring the water concentration of the gas to be processed in the gas processing unit 1 and outputting the input signal I ₁ to the pulse charged gas processing apparatus. It is also a preferred embodiment to install a total 29. The second pulse energy calculating section 9a is specifically configured so that a predetermined built-in program is executed in the computer 15 to calculate the time power product E per pulse. Further, in this alternative embodiment, the same configuration and effect can be expected even if the oxygen concentration is used instead of the water concentration.

(3) In each of the above-described embodiments, the gas processing unit 1 having a large maximum gas processing amount is assumed. The specifications can be changed as appropriate, and are not limited to the above embodiments, and may be constituted by a plurality of pulse power supply units 5. When configuring a plurality of pulse power supply units, the pulse power supply units 5 have the same pulse frequency as each other, and
Control is performed so that the generation of the pulses is synchronized. That is, the same output voltage control signal C _V and the same pulse frequency control signal C _f are input to each pulse power supply unit 5. Although the actual pulse waveform of the pulse power supply unit 5 causes overshoot or ringing due to stray inductance components of the cable 12 or the like, the type of the pulse power supply unit 5 is unified, It is preferable that the output terminals 10 are connected in parallel, and the output pulses are synchronized at the same frequency as described above, so that a voltage having the same pulse waveform is applied to each of the discharge electrodes 23.

[0037]

As described above, according to the present invention,
Since the pulse power supply can automatically apply a high-voltage pulse equal to or higher than the required injection energy per unit gas volume to the gas to be processed, following the concentration fluctuation of the harmful gas component in the gas to be processed. In addition, a pulse power supply device and a pulse charged gas treatment device capable of maintaining a stable gas treatment capacity irrespective of a concentration change of a harmful gas component and achieving energy saving can be provided.

[Brief description of the drawings]

FIG. 1 is a block diagram showing an embodiment of a pulse charged gas processing apparatus and a pulse power supply apparatus according to the present invention.

FIG. 2 is a characteristic diagram showing an example of a relationship between a gas component concentration before processing, a gas component concentration after processing, and an actual injection energy per unit gas volume.

FIG. 3 is a block diagram showing another embodiment of the pulse charged gas processing apparatus and the pulse power supply apparatus according to the present invention.

FIG. 4 is a characteristic diagram showing an example of a temporal change in the concentration of a component to be treated.

FIG. 5 is a characteristic diagram showing an example of the relationship between the moisture concentration of the gas to be processed and the IV characteristics of the instantaneous voltage value and instantaneous current value of the high-voltage pulse.

[Explanation of symbols]

REFERENCE SIGNS LIST 1 gas processing unit 2 pulse power supply device 3 gas concentration meter 4 gas flow meter 5 pulse power supply unit 6 injection energy calculation unit 7 high voltage pulse control unit 8 current / voltage detection unit 8a output characteristic storage unit 9 first pulse energy calculation unit 9a first 2 pulse energy calculation unit 10 output terminal 11 input terminal 12 cable 13 voltage / current probe 14 digital oscilloscope 15 computer 16 first signal converter 17 first receiving unit 18 second receiving unit 19 entrance 20 second signal converter 21 exit I ₀ Input signal Q Gas flow rate

Claims (9)

[Claims] 1. A pulse power supply section for applying a high voltage pulse to a gas processing section for generating plasma by high voltage pulse charging to remove dust, harmful gas and the like in a gas, and a specific gas component of a gas to be processed. An injection energy calculation unit that receives a concentration as an input signal and calculates a required injection energy per unit gas volume of the high voltage pulse, and a high voltage pulse control unit that controls output power and a pulse frequency of the pulse power supply unit. The high voltage pulse control unit receives the required injection energy per unit gas volume calculated by the injection energy calculation unit and the flow rate of the gas to be processed in the gas processing unit as input signals, and the output power and A pulse power supply device controlling the pulse frequency. 2. A first receiving section for receiving, as an input signal, a concentration of a component to be processed before or after processing the gas to be processed, and a processing section for performing a process before or after receiving the concentration by the first receiving section. A first storage unit for storing in advance a first empirical formula indicating the relationship between the concentration of the component to be processed and the required injection energy per unit gas volume after the process, and a first empirical formula per unit gas volume based on the first empirical formula. 2. The pulse power supply device according to claim 1, further comprising: a first empirical formula calculation unit for calculating a required injection energy of the pulse. 3. The pulse power supply device according to claim 2, wherein a specific gas component concentration having a predetermined correlation with the concentration of the component to be processed is input to the injection energy calculation unit instead of the concentration of the component to be processed. Pulse power supply device. 4. An injection energy calculating unit for receiving, as an input signal, a plurality of gas component concentrations of the gas to be processed, a required injection energy per unit gas volume and the plurality of gas component concentrations. And a second empirical formula calculation unit for calculating the required injection energy per unit gas volume separately based on the plurality of empirical formulas. 2. The pulse power supply device according to claim 1, further comprising: a selection unit that selects a maximum value of required injection energy per unit gas volume calculated by the second empirical formula calculation unit. 3. 5. An input signal received by the second receiving unit,
5. The pulse power supply device according to claim 4, wherein the gas component concentrations are a plurality of different gas components. 6. A current-voltage detecting section capable of detecting an instantaneous voltage value and an instantaneous current value of the high-voltage pulse applied to the gas processing section, and an instantaneous voltage value and an instantaneous current detected by the current-voltage detecting section. A first pulse energy calculation unit for calculating a time power product per pulse from a value, wherein the high-voltage pulse control unit calculates the time power product per pulse calculated by the first pulse energy calculation unit, and The injection energy per unit gas volume calculated by the product of the pulse frequency and the reciprocal of the flow rate of the gas to be processed received as an input signal is maintained at or above the required injection energy per unit gas volume calculated by the injection energy calculation unit. 6. The control device according to claim 1, wherein the output voltage and the pulse frequency of the pulse power supply unit are controlled while relating each other so as to be within a predetermined range. Scan power supply. 7. An output characteristic storage unit for storing in advance a relationship between an output voltage value of the high-voltage pulse applied to the gas processing unit and a time power product per pulse for each moisture concentration or oxygen concentration of the gas to be treated. Receiving the moisture concentration or oxygen concentration of the gas to be processed as an input signal, and determining the output power value per pulse based on the relationship between the output voltage value stored in the output characteristic storage unit and the time power product per pulse. A high-voltage pulse control unit, wherein the high-voltage pulse control unit calculates a time power product per pulse, a time power product per pulse calculated by the second pulse energy calculation unit, the pulse frequency, and the gas. The injection energy per unit gas volume calculated by the product of the reciprocal of the flow rate of the gas to be processed detected by the flow meter is calculated as the required energy per unit gas volume calculated by the injection energy calculation unit. 6. The pulse power supply device according to claim 1, wherein the output voltage and the pulse frequency of the pulse power supply unit are controlled while being related to each other so as to be within a predetermined range so as to maintain the injection energy or more. . 8. A gas processing section for generating plasma by high-voltage pulse charging to remove dust, harmful gas and the like in a gas, and applying a high-voltage pulse to the gas processing section. 7. A pulse power supply device according to claim 4, wherein the gas power meter detects a specific gas component concentration of the gas to be processed at a predetermined location, and a gas flow meter which detects a flow rate of the gas to be processed in the gas processing unit. Wherein the pulse power supply device is configured to be able to receive a gas component concentration detected by the gas concentration meter and a gas flow rate to be processed detected by the gas flow meter as input signals. apparatus. 9. The pulse power supply according to claim 7, wherein a plasma is generated by high-voltage pulse charging to remove dust and harmful gas in the gas, and a high-voltage pulse is applied to the gas processing unit. An apparatus, a gas concentration meter that detects a specific gas component concentration of the gas to be processed at a predetermined location, a gas flow meter that detects a flow rate of the gas to be processed in the gas processing unit, and a moisture concentration of the gas to be processed. And at least one of an oxygen concentration meter for detecting the oxygen concentration of the gas to be processed, wherein the pulse power supply device detects the gas component concentration detected by the gas concentration meter and the gas concentration concentration. A pulse charged gas configured to be able to receive as an input signal the flow rate of the gas to be processed detected by the gas flow meter and the moisture concentration or oxygen concentration detected by the moisture concentration meter or the oximeter. Management apparatus.