JPH1190312A - Sensitive material liquid application and sensitive material liquid applying device as well as production of dissolved oxygen decreasing sensitive material liquid - Google Patents

Sensitive material liquid application and sensitive material liquid applying device as well as production of dissolved oxygen decreasing sensitive material liquid

Info

Publication number
JPH1190312A
JPH1190312A JP25879697A JP25879697A JPH1190312A JP H1190312 A JPH1190312 A JP H1190312A JP 25879697 A JP25879697 A JP 25879697A JP 25879697 A JP25879697 A JP 25879697A JP H1190312 A JPH1190312 A JP H1190312A
Authority
JP
Japan
Prior art keywords
sensitizer
dissolved oxygen
solution
sensitive material
material liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25879697A
Other languages
Japanese (ja)
Inventor
Motohisa Aoki
源久 青木
Tatsuo Yoshida
辰雄 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP25879697A priority Critical patent/JPH1190312A/en
Publication of JPH1190312A publication Critical patent/JPH1190312A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prevent the formation of a peroxide and the change in the properties of a sensitive material liquid arising therefrom and to prevent the change in characteristics at the time of forming a photosensitive film for an electrophotographic photoreceptor by decreasing the dissolved oxygen in the sensitive material liquid, then applying the sensitive material liquid on a base material for the electrophotographic photoreceptor. SOLUTION: A dissolved oxygen decreasing vessel 2b functions as a dissolved oxygen decreasing means for decreasing the dissolved oxygen in the sensitive material liquid by bringing gas having a decreased oxygen component from a satd. gas forming vessel 9 into contact with the sensitive material liquid. A sensitive material liquid discharge port 22 is formed at the bottom of a dissolved oxygen decreasing sensitive material liquid holding vessel 2c. This sensitive material liquid discharge port 22 is connected via a pump 4, piping 5 and a valve 6 to the sensitive material liquid introducing port 11 of a sensitive material liquid applying mechanism 1. This mechanism is so constituted that the sensitive material liquid from the dissolved oxygen decreasing sensitive material liquid holding vessel 2c is supplied to the immersion vessel 10 of the sensitive material liquid applying mechanism 1. The sensitive material liquid applying mechanism 1 functions as the sensitive material liquid applying means for applying the sensitive material liquid decreased in the dissolved oxygen supplied from the dissolved oxygen decreasing vessel 2b as the dissolved oxygen decreasing means on a substrate 8.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子写真感光体用
基材に感剤液を塗布する際に用いて好適な、感剤液塗布
方法及び装置並びに溶存酸素低減感剤液の製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for applying a sensitizer solution to a substrate for an electrophotographic photoreceptor, and a method for producing a sensitizer solution with reduced dissolved oxygen. .

【0002】[0002]

【従来の技術】従来より、電子写真感光体用基材(基
体)に感剤液(例えば電荷発生層用感剤液や電荷輸送層
用感剤液)を塗布する方法としては、浸漬塗布,ブレー
ド塗布,リング塗布,ノズル塗布,カーテン塗布等が知
られている。これらの各塗布方法においては、塗布操作
を行なった後の残存感剤液を循環して用いる場合は勿論
のこと、残存感剤液を循環することなくほぼ全量を基材
に塗布する場合であっても、意識的に温度を変化させな
い限り感剤液は空気飽和に近い状態となるため、感剤液
中に酸素が溶存するのが通常である。
2. Description of the Related Art Conventionally, as a method of applying a sensitizer solution (for example, a sensitizer solution for a charge generation layer or a sensitizer solution for a charge transport layer) to a substrate (substrate) for an electrophotographic photosensitive member, dip coating, Blade coating, ring coating, nozzle coating, curtain coating and the like are known. In each of these coating methods, not only the case where the remaining sensitizing solution after performing the coating operation is circulated and used, but also the case where almost the entire amount is coated on the substrate without circulating the remaining sensitizing solution. However, unless the temperature is intentionally changed, the sensitizer solution is in a state close to air saturation, so that oxygen is usually dissolved in the sensitizer solution.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、感剤液
を構成する溶媒が不安定な場合には、感剤液中に溶存す
る酸素により当該溶媒が酸化され、過酸化物が生成され
るという課題がある。そこで、感剤液には、通常、過酸
化物の生成を防ぐために酸化防止剤が添加されている
が、感剤液が繰返し空気と接触して感剤液中の溶存酸素
量が飽和又はそれに近い状態になり、その状態が長期に
わたると酸化防止剤が全て消費されてしまうため、その
後はやはり感剤液中の溶存酸素により過酸化物が生成さ
れるという課題がある。
However, when the solvent constituting the sensitizer solution is unstable, the solvent is oxidized by oxygen dissolved in the sensitizer solution to form a peroxide. There is. Therefore, an antioxidant is usually added to the sensitizer solution in order to prevent the generation of peroxide, but the sensitizer solution repeatedly comes into contact with air, and the dissolved oxygen amount in the sensitizer solution is saturated or the When the state is close to the above, and the state is prolonged, all the antioxidant is consumed. Therefore, there is a problem that the peroxide is generated by dissolved oxygen in the sensitizer solution thereafter.

【0004】また、過酸化物の生成速度を小さくすべ
く、意識的に温度を低下させた場合には、空気中の酸素
も溶解しやすくなるため、過酸化物の生成速度は小さい
ものの、やはり感剤液中に溶存する酸素により過酸化物
が生成されるという課題がある。ここで、過酸化物の作
用は、詳細には不明であるが、例えば長期保存する間に
過酸化物が生成した電荷発生層用感剤液では、調製後間
もない感剤液と比較して、感剤液の粘度増加,顔料成分
の凝集,電子写真用感光膜を形成した場合の特性低下が
見られる。
[0004] When the temperature is intentionally lowered in order to reduce the peroxide generation rate, oxygen in the air is also easily dissolved. There is a problem that peroxide is generated by oxygen dissolved in the sensitizer solution. Here, the action of the peroxide is not known in detail, but, for example, in the case of the charge-generating layer sensitizing solution in which the peroxide is generated during long-term storage, compared to the sensitizing solution which has just been prepared. As a result, an increase in the viscosity of the sensitizer solution, agglomeration of the pigment component, and a decrease in the characteristics when the electrophotographic photosensitive film is formed are observed.

【0005】一般に、強い酸化作用のある過酸化物ほど
不安定であり、感剤液中の酸素を受容する物質と反応し
て、過酸化物自身は酸その他の物質に分解される。従っ
て、感剤液中の過酸化物濃度は低下するが、このとき感
剤液の受けるダメージは大きい。一方、酸化作用が弱い
過酸化物は安定であり、感剤液中の酸素を受容する物質
と反応しにくく、過酸化物自身の分解も少ない。そし
て、感剤液を構成する溶媒と溶存酸素との反応により過
酸化物の生成が続けば、感剤液中の過酸化物濃度は増加
することもある。しかし、このとき感剤液の受けるダメ
ージは小さい。
Generally, a peroxide having a stronger oxidizing action is more unstable, and reacts with a substance accepting oxygen in a sensitizer solution, and the peroxide itself is decomposed into an acid and other substances. Accordingly, although the peroxide concentration in the sensitizer solution is reduced, the damage to the sensitizer solution is large at this time. On the other hand, a peroxide having a weak oxidizing action is stable, hardly reacts with a substance that accepts oxygen in a sensitizer solution, and has little decomposition of the peroxide itself. Then, if the generation of peroxide continues due to the reaction between the solvent constituting the sensitizer solution and the dissolved oxygen, the peroxide concentration in the sensitizer solution may increase. However, at this time, the damage to the sensitizer solution is small.

【0006】このように、感剤液の受けるダメージは、
生成された過酸化物の質により決まるのであり、過酸化
物濃度が高ければ感剤液のダメージが大きいというわけ
ではない。また、溶存酸素量についても同様のことが言
える。即ち、感剤液を構成する溶媒が不安定な場合に
は、酸化速度が大きいため、感剤液中の溶存酸素量は減
少する。そして、空気中の酸素の溶媒への溶解速度がそ
れほど大きくない場合には、溶存酸素量はあまり増加し
ないので、感剤液中の溶存酸素量は小さくなる。しかし
ながら、溶存酸素による酸化反応の結果、前述のごとく
過酸化物が生成されるため、感剤液の受けるダメージは
大きくなることもある。
As described above, the damage received by the sensitizer solution is as follows.
It is determined by the quality of the peroxide produced, and the higher the peroxide concentration, the greater the damage of the sensitizer solution. The same can be said for the amount of dissolved oxygen. That is, when the solvent constituting the sensitizer solution is unstable, the oxidation rate is high, and the amount of dissolved oxygen in the sensitizer solution decreases. When the rate of dissolution of oxygen in the air into the solvent is not so high, the dissolved oxygen amount does not increase so much, so that the dissolved oxygen amount in the sensitizer solution decreases. However, as a result of the oxidation reaction due to the dissolved oxygen, peroxide is generated as described above, and thus the damage to the sensitizer solution may be increased.

【0007】一方、感剤液を構成する溶媒が安定である
場合には、酸化速度が小さいため、感剤液中の溶存酸素
量は減少しにくく、その結果、酸素は飽和に近い溶解度
を示すことになる。従って、過酸化物は生成されにく
く、感剤液の受けるダメージは小さい。即ち、感剤液中
の溶存酸素量や生成する過酸化物の濃度が大きければ感
剤液のダメージが大きいとは一概には言えるものではな
い。
On the other hand, when the solvent constituting the sensitizer solution is stable, the amount of dissolved oxygen in the sensitizer solution hardly decreases due to a low oxidation rate, and as a result, the oxygen exhibits a solubility close to saturation. Will be. Therefore, peroxide is hardly generated, and the damage to the sensitizer solution is small. That is, it cannot be generally said that the greater the amount of dissolved oxygen or the concentration of generated peroxide in the sensitizer solution, the greater the damage to the sensitizer solution.

【0008】しかしながら、過酸化物の全生成量及び過
酸化物の分解により酸化される物質の全量は、感剤液へ
溶解する酸素量と密接な関係がある。即ち、感剤液へ溶
解する酸素量が少なければ過酸化物の全生成量は少な
く、過酸化物の分解により酸化される物質の全量も少な
くなると考えられる。本発明は、上述したような課題に
鑑み創案されたもので、感剤液へ溶解する酸素量を減少
させることにより、過酸化物の生成及び過酸化物による
感剤液の変質を防止して、電子写真感光体用感光膜を形
成した場合の特性の変化を防ぐようにした、感剤液塗布
方法及び装置を提供することを目的とするとともに、更
には、溶存酸素低減感剤液の製造方法を提供することを
目的とする。
[0008] However, the total amount of peroxide produced and the total amount of substances oxidized by decomposition of the peroxide are closely related to the amount of oxygen dissolved in the sensitizer solution. That is, it is considered that the smaller the amount of oxygen dissolved in the sensitizer solution, the smaller the total amount of peroxide produced and the smaller the total amount of the substance oxidized by decomposition of the peroxide. The present invention has been made in view of the above-described problems, and reduces the amount of oxygen dissolved in a sensitizer solution to prevent generation of a peroxide and deterioration of the sensitizer solution due to the peroxide. The present invention aims to provide a method and an apparatus for applying a sensitizer liquid in which a change in characteristics when a photosensitive film for an electrophotographic photoreceptor is formed is provided. The aim is to provide a method.

【0009】[0009]

【課題を解決するための手段】このため、本発明の感剤
液塗布方法は、電子写真感光体用基材に感剤液を塗布す
るに際し、まず、酸素分圧の低い気体を該感剤液と接触
させることにより、該感剤液中の溶存酸素を低減させて
おき、その後、このようにして溶存酸素を低減された感
剤液を該電子写真感光体用基材に塗布することを特徴と
している(請求項1)。
Therefore, in the method of applying a sensitizer solution of the present invention, when a sensitizer solution is applied to a substrate for an electrophotographic photosensitive member, first, a gas having a low oxygen partial pressure is applied to the sensitizer solution. The dissolved oxygen in the sensitizer solution is reduced by contact with the sensitizer solution, and then the sensitizer solution in which the dissolved oxygen is reduced in this manner is applied to the electrophotographic photoreceptor substrate. It is a feature (claim 1).

【0010】このとき、該感剤液中の溶存酸素を低減さ
せる際に使用する気体に、該感剤液を調製する際に使用
する溶媒の蒸気を包含させてもよい(請求項2)。ま
た、本発明の感剤液塗布装置は、電子写真感光体用感剤
液を調製する際に使用する溶媒の蒸気を包含し且つ酸素
分圧の低い気体を該感剤液と接触させることにより、該
感剤液中の溶存酸素を低減させる溶存酸素低減手段と、
該溶存酸素低減手段から供給される該溶存酸素を低減さ
れた感剤液を該電子写真感光体用基材に塗布する感剤液
塗布手段とをそなえて構成されたことを特徴としている
(請求項3)。
At this time, the gas used for reducing the dissolved oxygen in the sensitizer solution may include a vapor of a solvent used for preparing the sensitizer solution (claim 2). Further, the sensitizer solution coating apparatus of the present invention includes a solvent containing a vapor used in preparing a sensitizer solution for an electrophotographic photoreceptor, and bringing a gas having a low oxygen partial pressure into contact with the sensitizer solution. Dissolved oxygen reducing means for reducing the dissolved oxygen in the sensitizer solution,
And a sensitizer solution application unit for applying the sensitizer solution supplied from the dissolved oxygen reduction unit with the dissolved oxygen reduced to the electrophotographic photoreceptor substrate. Item 3).

【0011】さらに、本発明の溶存酸素低減感剤液の製
造方法は、酸素分圧の低い気体を電子写真感光体用感剤
液と接触させることにより、溶存酸素を低減させた感剤
液を製造することを特徴としている(請求項4)。この
ときも、該感剤液中の溶存酸素を低減させる際に使用す
る気体に、該感剤液を調製する際に使用する溶媒の蒸気
を包含させてもよい(請求項5)。
Further, the method for producing a dissolved oxygen-reducing sensitizer solution of the present invention comprises contacting a gas having a low oxygen partial pressure with a sensitizer solution for an electrophotographic photoreceptor to thereby reduce the dissolved oxygen-reduced sensitizer solution. It is characterized by being manufactured (claim 4). Also at this time, the gas used for reducing the dissolved oxygen in the sensitizer solution may include the vapor of the solvent used for preparing the sensitizer solution (claim 5).

【0012】[0012]

【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を説明するが、発明の主旨を越えない限り、以
下の説明に限定されるものではない。 (a)第1実施形態の説明 図1は本発明の第1実施形態にかかる感剤液塗布装置の
構成を示す模式図であり、この図1に示す感剤液塗布装
置15は、電子写真感光体用基体(電子写真感光体用基
材)8に感剤液(例えば電荷発生層用感剤液や電荷輸送
層用感剤液)を塗布するために用いられるものである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings, but are not limited to the following description without departing from the gist of the invention. (A) Description of First Embodiment FIG. 1 is a schematic diagram showing the configuration of a sensitizer application device according to a first embodiment of the present invention. The sensitizer application device 15 shown in FIG. It is used for applying a sensitizer solution (for example, a sensitizer solution for a charge generation layer or a sensitizer solution for a charge transport layer) to a photoconductor substrate (electrophotographic photoconductor substrate) 8.

【0013】本発明の第1実施形態にかかる感剤液塗布
装置15は、浸漬塗布方法が適用されるものであり、図
1に示すように、感剤液塗布機構1,感剤液貯留槽2及
び飽和気体生成槽9をそなえて構成されている。ここ
で、感剤液塗布機構1は、実際に基体8に感剤液を塗布
する部位であり、感剤液を保持する浸漬槽10,浸漬槽
10からオーバーフローした感剤液を受ける感剤液受け
樋12により構成されている。
The sensitizer application device 15 according to the first embodiment of the present invention employs a dip coating method, and as shown in FIG. 1, a sensitizer application mechanism 1, a sensitizer reservoir, 2 and a saturated gas generation tank 9. Here, the sensitizer liquid application mechanism 1 is a part for actually applying the sensitizer liquid to the base 8, and is a dipping tank 10 for holding the sensitizer liquid and a sensitizer liquid for receiving the sensitizer liquid overflowing from the immersion tank 10. It is constituted by a receiving gutter 12.

【0014】なお、浸漬槽10の底部には感剤液導入口
11が形成され、感剤液受け樋12の底部には感剤液排
出口13が形成されている。そして、感剤液排出口13
は、配管3により感剤液貯留槽2と接続されている。ま
た、感剤液貯留槽2は、感剤液塗布機構1からオーバー
フローした感剤液を保持するとともに、この感剤液中の
溶存酸素を低減させる部位であり、濃度均一化槽2a,
溶存酸素低減槽2b及び溶存酸素低減感剤液保持槽2c
から構成されている。
A sensitizing solution inlet 11 is formed at the bottom of the immersion tank 10, and a sensitizing solution outlet 13 is formed at the bottom of the sensitizing solution receiving trough 12. And the sensitizer liquid outlet 13
Is connected to the sensitizer liquid storage tank 2 by a pipe 3. The sensitizing solution storage tank 2 is a part for holding the sensitizing solution overflowing from the sensitizing solution applying mechanism 1 and reducing dissolved oxygen in the sensitizing solution.
Dissolved oxygen reduction tank 2b and dissolved oxygen reduction sensitizer liquid holding tank 2c
It is composed of

【0015】なお、符号21a,21bは、ともに各槽
を隔てる隔壁を示しているが、隔壁21bの下部には、
図1に示すようにフィルタ21cが付着され、この隔壁
21b及びフィルタ21cにより各槽を隔てるように構
成されている。なお、フィルタ21cは、溶存酸素低減
槽2bからの感剤液を透過させる一方、感剤液中の気泡
の透過を防ぐものである。
Reference numerals 21a and 21b denote partition walls for separating the respective tanks.
As shown in FIG. 1, a filter 21c is attached, and each partition is configured to be separated by the partition 21b and the filter 21c. Note that the filter 21c allows the sensitizer liquid from the dissolved oxygen reducing tank 2b to pass therethrough, while preventing the transmission of bubbles in the sensitizer liquid.

【0016】ここで、濃度均一化槽2aは、感剤液塗布
機構1の感剤液排出口13から配管3を介して流入した
感剤液を保持し、攪拌装置7にて槽内を攪拌することに
より、感剤液の濃度を均一化する部位である。また、溶
存酸素低減槽2bは、濃度均一化槽2aからオーバーフ
ローした感剤液を保持し、飽和気体生成槽9からの気体
を吹き込むことにより、感剤液中の溶存酸素を低減させ
る部位である。
Here, the concentration equalizing tank 2a holds the sensitizer liquid flowing through the sensitizer liquid outlet 13 of the sensitizer liquid application mechanism 1 via the pipe 3, and stirs the inside of the tank with a stirrer 7. By doing so, it is a site where the concentration of the sensitizer solution is made uniform. Further, the dissolved oxygen reducing tank 2b is a part that holds the sensitizer solution overflowing from the concentration equalizing tank 2a and blows gas from the saturated gas generation tank 9 to reduce dissolved oxygen in the sensitizer solution. .

【0017】即ち、溶存酸素低減槽2bは、飽和気体生
成槽9からの酸素成分の少ない気体を感剤液と接触させ
ることにより、感剤液中の溶存酸素を低減させる溶存酸
素低減手段として機能するものである。なお、溶存酸素
を低減させる原理については、後述にて詳細に説明す
る。また、溶存酸素低減感剤液保持槽2cは、溶存酸素
低減槽2bでの処理が施された後の感剤液がフィルタ2
1cを通じて流入すると、これを保持する部位である。
That is, the dissolved oxygen reducing tank 2b functions as a dissolved oxygen reducing means for reducing dissolved oxygen in the sensitizer solution by bringing the gas having a low oxygen component from the saturated gas generating tank 9 into contact with the sensitizer solution. Is what you do. The principle of reducing dissolved oxygen will be described later in detail. Further, the dissolved oxygen reducing sensitizer liquid holding tank 2c is provided with a filter 2 for filtering the sensitizer liquid after the treatment in the dissolved oxygen reducing tank 2b.
When it flows in through 1c, it is the part that holds it.

【0018】なお、溶存酸素低減感剤液保持槽2cの底
部には感剤液排出口22が形成され、感剤液排出口22
は、ポンプ4,配管5及びバルブ6を介して、感剤液塗
布機構1の感剤液導入口11と接続されている。そし
て、溶存酸素低減感剤液保持槽2cからの感剤液が、感
剤液塗布機構1の浸漬槽10に供給されるように構成さ
れている。
At the bottom of the dissolved oxygen reducing sensitizer liquid holding tank 2c, a sensitizer liquid outlet 22 is formed.
Is connected to a sensitizer liquid inlet 11 of the sensitizer liquid application mechanism 1 via a pump 4, a pipe 5, and a valve 6. Then, the sensitizer liquid from the dissolved oxygen-reducing sensitizer liquid holding tank 2 c is supplied to the immersion tank 10 of the sensitizer liquid application mechanism 1.

【0019】従って、前述した感剤液塗布機構1は、溶
存酸素低減手段としての溶存酸素低減槽2bから供給さ
れる溶存酸素を低減された感剤液を、基体8に塗布する
感剤液塗布手段として機能するのである。ところで、飽
和気体生成槽9は、酸素分圧の低い気体を感剤液を調製
する際に使用する溶媒Aの蒸気で飽和させることによ
り、前述のごとく感剤液貯留槽2にて溶存酸素を低減さ
せる際に用いる気体を生成するものである。
Therefore, the above-described sensitizer solution application mechanism 1 applies the sensitizer solution to the substrate 8 by applying the sensitizer solution with reduced dissolved oxygen supplied from the dissolved oxygen reducing tank 2b as the dissolved oxygen reducing means. It functions as a means. By the way, the saturated gas generation tank 9 saturates the gas having a low oxygen partial pressure with the vapor of the solvent A used when preparing the sensitizer liquid, thereby dissolving dissolved oxygen in the sensitizer liquid storage tank 2 as described above. This is to generate a gas used for reduction.

【0020】ここで、飽和気体生成槽9には、感剤液を
調製する際に使用する溶媒であって、感剤液の構成成分
である溶媒Aが保持され、この溶媒A中に配管27が挿
入されている。また、配管27の先端には、多孔ノズル
26が固着されており、配管27からの気体が、多孔ノ
ズル26にて分散されて、溶媒Aに吹き込まれるように
構成されている。
Here, the saturated gas generation tank 9 holds a solvent A, which is a solvent used for preparing the sensitizer solution and is a component of the sensitizer solution, and a pipe 27 is provided in the solvent A. Is inserted. Further, a perforated nozzle 26 is fixed to the tip of the pipe 27, and the gas from the pipe 27 is dispersed by the perforated nozzle 26 and blown into the solvent A.

【0021】ここで、配管27からは、酸素分圧の低い
気体、即ち、酸素を成分としてほとんど含んでいない気
体が吹き込まれる。酸素分圧の低い気体としては、例え
ば窒素ガス,炭酸ガス,アルゴン等の不活性ガスが用い
ることができるが、第1実施形態では、酸素分圧の低い
気体として、窒素ガスを用いた場合について説明する。
なお、窒素ガスは、圧力調製されて図示しないタンクか
ら配管27へ送出される。
Here, a gas having a low oxygen partial pressure, that is, a gas containing almost no oxygen as a component, is blown from the pipe 27. As the gas having a low oxygen partial pressure, for example, an inert gas such as nitrogen gas, carbon dioxide gas, or argon can be used. In the first embodiment, the case where nitrogen gas is used as the gas having a low oxygen partial pressure is used. explain.
The nitrogen gas is adjusted in pressure and sent out from a tank (not shown) to the pipe 27.

【0022】そして、配管27から吹き込まれた気体
は、溶媒Aの蒸気で飽和された後に、飽和気体生成槽9
の上部に接続された配管24を通じて放出されるように
構成されている。さらに、この配管24は、感剤液貯留
槽2の溶存酸素低減槽2bに挿入されており、配管24
の先端には、多孔ノズル23が固着されている。そし
て、配管24からの気体が、多孔ノズル23にて分散さ
れて、感剤液に吹き込まれるように構成されている。
After the gas blown from the pipe 27 is saturated with the vapor of the solvent A, the saturated gas generation tank 9
It is configured to be discharged through a pipe 24 connected to the upper part of the container. Further, this pipe 24 is inserted into the dissolved oxygen reducing tank 2b of the sensitizer liquid storage tank 2, and
A multi-hole nozzle 23 is fixed to the tip of the nozzle. Then, the gas from the pipe 24 is dispersed by the multi-hole nozzle 23 and is blown into the sensitizer liquid.

【0023】なお、感剤液塗布装置15を実際に使用す
る際には、感剤液塗布機構1の浸漬槽10に、感剤液を
オーバーフロー直前まで注入しておく。また、感剤液貯
留槽2の濃度均一化槽2aに感剤液を注入して満タンに
した後、更に感剤液を注入してオーバーフローさせ、溶
存酸素低減槽2bに感剤液を注入する。そして、溶存酸
素低減槽2bに注入された感剤液をフィルタ21cを通
じて溶存酸素低減槽2bの底部から流出させ、溶存酸素
低減感剤液保持槽2cに感剤液が半分程度溜まるように
しておく。
When the sensitizer application device 15 is actually used, the sensitizer is injected into the immersion tank 10 of the sensitizer application mechanism 1 until immediately before the overflow. After the sensitizer liquid is injected into the concentration equalizing tank 2a of the sensitizer liquid storage tank 2 to fill the tank, the sensitizer liquid is further injected to overflow, and the sensitizer liquid is injected into the dissolved oxygen reducing tank 2b. I do. Then, the sensitizer liquid injected into the dissolved oxygen reduction tank 2b flows out from the bottom of the dissolved oxygen reduction tank 2b through the filter 21c so that about half of the sensitizer liquid is stored in the dissolved oxygen reduction sensitizer liquid holding tank 2c. .

【0024】さらに、飽和気体生成槽9には、感剤液の
構成成分である溶媒Aを、飽和気体生成槽9の容積の5
0〜70%程度投入しておく。上述の構成により、本発
明の第1実施形態にかかる感剤液塗布装置15において
は、基体8に感剤液を塗布するに際し、まず、感剤液貯
留槽2の溶存酸素低減槽2bにて、飽和気体生成槽9か
らの気体を感剤液と接触させることにより、感剤液中の
溶存酸素が低減される。
Further, a solvent A, which is a constituent of the sensitizer solution, is charged into the saturated gas generating tank 9 by a volume of 5% of the saturated gas generating tank 9.
Add about 0 to 70%. With the above-described configuration, in the sensitizer liquid application device 15 according to the first embodiment of the present invention, when the sensitizer liquid is applied to the substrate 8, first, in the dissolved oxygen reducing tank 2 b of the sensitizer liquid storage tank 2. By bringing the gas from the saturated gas generation tank 9 into contact with the sensitizer solution, the dissolved oxygen in the sensitizer solution is reduced.

【0025】その後、このようにして溶存酸素を低減さ
れた感剤液(溶存酸素低減感剤液)が感剤液塗布機構1
の浸漬槽10に供給され、浸漬槽10では、この溶存酸
素低減感剤液を用いて基体8の塗布が行なわれる。この
ときの感剤液塗布装置15における動作を、更に詳細に
説明する。まず、ポンプ4を作動させると、溶存酸素低
減感剤液保持槽2c内の溶存酸素が低減された感剤液
は、配管5及びバルブ6を通じて、感剤液塗布機構1の
浸漬槽10に注入される。
Thereafter, the sensitizer solution in which dissolved oxygen has been reduced in this way (dissolved oxygen-reduced sensitizer solution) is applied to the sensitizer solution application mechanism
The immersion tank 10 is used to apply the substrate 8 using the dissolved oxygen reducing sensitizer solution. The operation of the sensitizer liquid application device 15 at this time will be described in more detail. First, when the pump 4 is operated, the sensitizer solution in which the dissolved oxygen is reduced in the dissolved oxygen-reduced sensitizer solution holding tank 2c is injected into the immersion tank 10 of the sensitizer solution application mechanism 1 through the pipe 5 and the valve 6. Is done.

【0026】そして、浸漬槽10では、ポンプ4から吐
出された感剤液により、浸漬槽10内の感剤液がオーバ
ーフローし、オーバーフローした感剤液は、配管3を通
じて感剤液貯留槽2の濃度均一化槽2aに流入する。さ
らに、濃度均一化槽2aでは、流入した感剤液により、
濃度均一化槽2a内の感剤液がオーバーフローし、オー
バーフローした感剤液は、溶存酸素低減槽2bに流入し
て、以下のようにして溶存酸素が低減される。
In the immersion tank 10, the sensitizer liquid discharged from the pump 4 overflows the sensitizer liquid in the immersion tank 10, and the overflowed sensitizer liquid passes through the pipe 3 to the sensitizer liquid storage tank 2. It flows into the concentration equalizing tank 2a. Further, in the concentration uniformizing tank 2a, the flowing sensitizer liquid causes
The sensitizer solution in the concentration uniformization tank 2a overflows, and the overflowed sensitizer solution flows into the dissolved oxygen reduction tank 2b, and the dissolved oxygen is reduced as follows.

【0027】まず、飽和気体生成槽9では、圧力調製さ
れた窒素ガスが配管27から吹き込まれると、当該窒素
ガスは、多孔ノズル26にて小さな気泡に分散された後
に、溶媒Aに吹き込まれる。そして、多孔ノズル26に
て分散された窒素ガスは、溶媒Aの蒸気で飽和され、溶
媒飽和した窒素ガス(即ち、溶媒Aの蒸気を包含した窒
素ガス)が、配管24を通じて感剤液貯留槽2の溶存酸
素低減槽2bに送出される。
First, in the saturated gas generating tank 9, when nitrogen gas whose pressure is adjusted is blown from the pipe 27, the nitrogen gas is dispersed into small bubbles by the multi-hole nozzle 26 and then blown into the solvent A. Then, the nitrogen gas dispersed in the multi-hole nozzle 26 is saturated with the vapor of the solvent A, and the nitrogen gas saturated with the solvent (that is, the nitrogen gas containing the vapor of the solvent A) is supplied through the pipe 24 to the photosensitive liquid storage tank. 2 to the dissolved oxygen reduction tank 2b.

【0028】さらに、溶存酸素低減槽2bでは、配管2
4からの溶媒飽和した窒素ガスは、多孔ノズル23にて
小さな気泡に分散された後に、溶存酸素低減槽2b中の
感剤液に吹き込まれる。当該窒素ガスが感剤液に吹き込
まれると、吹き込まれた窒素ガスは、感剤液中に溶存し
ているガス成分との間でガス交換し、酸素成分の少ない
窒素ガスとの間でほぼ溶解平衡に達した後、溶存酸素低
減槽2bから排出される。
Further, in the dissolved oxygen reducing tank 2b, the piping 2
The nitrogen gas saturated with the solvent from No. 4 is dispersed into small bubbles by the multi-aperture nozzle 23 and then blown into the sensitizer liquid in the dissolved oxygen reducing tank 2b. When the nitrogen gas is blown into the sensitizer liquid, the blown nitrogen gas exchanges gas with gas components dissolved in the sensitizer solution, and substantially dissolves with the nitrogen gas containing less oxygen component. After reaching equilibrium, it is discharged from the dissolved oxygen reduction tank 2b.

【0029】即ち、酸素分圧の低い窒素ガスが感剤液に
接触すると、溶解平衡により、感剤液中の溶存酸素が窒
素ガス中に放出されるため、感剤液中の溶存酸素量が低
減される。このとき、窒素ガスは溶媒飽和しているの
で、感剤液中の溶媒成分は窒素ガス中に放出されず、感
剤液の濃度は変化しない。なお、溶存酸素低減槽2bか
ら排出された気体(感剤液中から放出された溶存酸素を
含む窒素ガス)は、感剤液貯留槽2の外部で排ガス捕集
器で捕集され、排ガス処理塔を経て排気される(排ガス
捕集器,排ガス処理塔は、ともに図示せず)。
That is, when nitrogen gas having a low oxygen partial pressure comes into contact with the sensitizer solution, dissolved oxygen in the sensitizer solution is released into the nitrogen gas due to dissolution equilibrium, so that the amount of dissolved oxygen in the sensitizer solution is reduced. Reduced. At this time, since the nitrogen gas is solvent-saturated, the solvent component in the sensitizer solution is not released into the nitrogen gas, and the concentration of the sensitizer solution does not change. The gas discharged from the dissolved oxygen reduction tank 2b (nitrogen gas containing dissolved oxygen released from the sensitizer liquid) is collected by an exhaust gas collector outside the sensitizer liquid storage tank 2 and subjected to exhaust gas treatment. The exhaust gas is exhausted through the tower (both the exhaust gas collector and the exhaust gas treatment tower are not shown).

【0030】また、溶存酸素低減槽2bにて脱酸素され
た感剤液は、フィルタ21cを通じて溶存酸素低減感剤
液保持槽2cへ流入する。そして、上述の動作を繰り返
すことにより、溶存酸素低減感剤液保持槽2c内の脱酸
素された感剤液は、感剤液塗布装置15内を循環する。
このような状況下において、感剤液塗布機構1では、基
体8が、浸漬槽10に浸漬された後に引き上げられて、
浸漬塗布が行なわれる。
The sensitizer solution deoxygenated in the dissolved oxygen reducing tank 2b flows into the dissolved oxygen reducing sensitizer liquid holding tank 2c through the filter 21c. Then, by repeating the above-described operation, the deoxygenated sensitizer liquid in the dissolved oxygen-reducing sensitizer liquid holding tank 2c circulates in the sensitizer liquid coating device 15.
Under such circumstances, in the sensitizer liquid application mechanism 1, the base 8 is pulled up after being immersed in the immersion tank 10,
Dip coating is performed.

【0031】ここで、基体8の浸漬塗布を行なう際や感
剤液が浸漬槽10等からオーバーフローする際には、感
剤液が空気と接触するため空気中の酸素が溶解するが、
溶存酸素低減槽2bにおける脱酸素速度は空気中の酸素
の溶解速度を上回っているため、感剤液塗布機構1にて
塗布を行なう際に用いる感剤液中の溶存酸素濃度を低く
することができる。
Here, when dip coating the substrate 8 or when the sensitizer solution overflows from the immersion tank 10 or the like, oxygen in the air dissolves because the sensitizer solution comes into contact with air.
Since the deoxygenation rate in the dissolved oxygen reduction tank 2b is higher than the dissolution rate of oxygen in the air, it is necessary to lower the dissolved oxygen concentration in the sensitizer solution used when performing application by the sensitizer solution application mechanism 1. it can.

【0032】このように本発明の第1実施形態にかかる
感剤液塗布装置15によれば、酸素分圧の低い気体を感
剤液と接触させて感剤液中の溶存酸素を低減させること
により、過酸化物の生成及び過酸化物による感剤液の変
質を防止することができ、ひいては電子写真感光体用感
光膜を形成した場合の特性の変化を防ぐことができる。
As described above, according to the sensitizer solution applying apparatus 15 according to the first embodiment of the present invention, the gas having a low oxygen partial pressure is brought into contact with the sensitizer solution to reduce the dissolved oxygen in the sensitizer solution. Thereby, generation of peroxide and deterioration of the sensitizer solution due to the peroxide can be prevented, and further, change in characteristics when a photosensitive film for an electrophotographic photosensitive member is formed can be prevented.

【0033】また、感剤液中の溶存酸素を低減させる際
に使用する気体に、感剤液を調製する際に使用する溶媒
の蒸気が包含されていることにより、感剤液の濃度変化
を防ぐことができる。 (b)第2実施形態の説明 図2は本発明の第2実施形態にかかる感剤液塗布装置の
構成を示す模式図であり、この図2に示す感剤液塗布装
置30も、電子写真感光体用基体(電子写真感光体用基
材)31に感剤液(例えば電荷発生層用感剤液や電荷輸
送層用感剤液)を塗布するために用いられるものであ
る。
Further, since the gas used for reducing the dissolved oxygen in the sensitizer solution contains the vapor of the solvent used for preparing the sensitizer solution, the change in the concentration of the sensitizer solution can be reduced. Can be prevented. (B) Description of the Second Embodiment FIG. 2 is a schematic diagram showing the configuration of a sensitizer solution application device according to a second embodiment of the present invention. The sensitizer solution application device 30 shown in FIG. It is used for applying a sensitizer liquid (for example, a sensitizer liquid for a charge generation layer or a sensitizer liquid for a charge transport layer) to a photoconductor substrate (electrophotographic photoconductor substrate) 31.

【0034】本発明の第2実施形態にかかる感剤液塗布
装置30は、ブレード塗布方法が適用されるものであ
り、図2に示すように、感剤液塗布機構46,感剤液貯
留槽50及び飽和気体生成槽58をそなえて構成されて
いる。感剤液塗布機構46は、実際に基体31に感剤液
を塗布する部位であり、基体31を水平に支持して回転
させる駆動機構46aと、基体31の軸方向に移動して
基体31の表面に感剤液を供給する感剤液供給機構46
bにより構成されている。
The sensitizing solution application device 30 according to the second embodiment of the present invention employs a blade applying method. As shown in FIG. 2, a sensitizing solution application mechanism 46, a sensitizing solution storage tank, and the like. 50 and a saturated gas generation tank 58. The sensitizer liquid application mechanism 46 is a part that actually applies the sensitizer liquid to the base 31, and includes a drive mechanism 46 a that horizontally supports and rotates the base 31 and a drive mechanism 46 a that moves in the axial direction of the base 31 to rotate the base 31. Sensitive liquid supply mechanism 46 for supplying a sensitizing liquid to the surface
b.

【0035】ここで、駆動機構46aは、所定間隔を隔
てて左右に垂直に配置された一対の軸受付き支持プレー
ト32,各支持プレート32の上部にそれぞれ設けられ
た軸受を介して水平に配置された回転軸33,一方の回
転軸33に固設されたタイミングプーリー34,プーリ
ー駆動モーター35,プーリー駆動モーター35の回転
をプーリー34に伝達するタイミングベルト36から構
成されている。
Here, the drive mechanism 46a is horizontally arranged via a pair of support plates 32 with bearings vertically arranged on the left and right at predetermined intervals, and bearings provided on the upper portions of the respective support plates 32. A rotation shaft 33, a timing pulley 34 fixed to one of the rotation shafts 33, a pulley drive motor 35, and a timing belt 36 for transmitting the rotation of the pulley drive motor 35 to the pulley 34.

【0036】また、基体31には、その両端にフランジ
37が装着されている。なお、フランジ37には、その
中心部に回転軸33を嵌合固定するための嵌合孔が設け
られ、その嵌合孔が基体31の軸芯に合うように装着さ
れる。そして、基体31は、両回転軸33の間に配置さ
れて、各フランジ37の中心孔に回転軸33が嵌合固定
され、プーリー駆動用モーター35を駆動させることに
より回転するように構成されている。
The base 31 is provided with flanges 37 at both ends. In addition, a fitting hole for fitting and fixing the rotating shaft 33 is provided at the center of the flange 37, and the flange 37 is mounted so that the fitting hole matches the axis of the base 31. The base 31 is arranged between the two rotating shafts 33, the rotating shafts 33 are fitted and fixed in the central holes of the flanges 37, and are configured to rotate by driving the pulley driving motor 35. I have.

【0037】また、感剤液供給機構46bは、所定間隔
を隔てて左右に垂直に配置された一対の支持プレート3
8,一対の支持プレート38間に配置された2本の案内
ロッド39,一対の支持プレート38間且つ案内ロッド
39間に配置され一端が支持プレート38から突出する
ボールネジ40,ボールネジ40の支持プレート38か
ら突出した端部に固設されたプーリー41,プーリー駆
動用モーター42,プーリー駆動用モーター42の回転
をプーリー41に伝達するタイミングベルト43,一対
の支持プレート38間に配置された移動体44から構成
されている。
The sensitizing solution supply mechanism 46b is provided with a pair of support plates 3 vertically arranged at right and left sides at a predetermined interval.
8, two guide rods 39 disposed between the pair of support plates 38, a ball screw 40 disposed between the pair of support plates 38 and between the guide rods 39, one end of which protrudes from the support plate 38, a support plate 38 of the ball screw 40 A pulley 41 fixed to the end protruding from the pulley, a pulley driving motor 42, a timing belt 43 for transmitting the rotation of the pulley driving motor 42 to the pulley 41, and a moving body 44 disposed between the pair of support plates 38. It is configured.

【0038】また、移動体44は、案内ロッド39用嵌
合孔と当該嵌合孔の中央に設けられたボールネジ40を
嵌合するボールネジ用軸受部とを通して、一対の支持プ
レート38間に配置されており、感剤液貯留槽50から
供給される感剤液を吐出するノズル48をそなえてい
る。なお、ノズル48は、ヘッダー49に固定されてい
る。
The moving body 44 is disposed between the pair of support plates 38 through a fitting hole for the guide rod 39 and a ball screw bearing provided in the center of the fitting hole for fitting the ball screw 40. And a nozzle 48 for discharging the sensitizing liquid supplied from the sensitizing liquid storage tank 50. The nozzle 48 is fixed to a header 49.

【0039】さらに、ノズル48の基体31との接触側
端部には、平滑化部材として機能するブレード(図示せ
ず)が設けられ、ノズル48から吐出された感剤液がこ
のブレードにより均一にされて、一様な膜厚となるよう
に構成されている。ところで、感剤液貯留槽50は、感
剤液を保持するとともに、この感剤液中の溶存酸素を低
減させる部位であり、溶存酸素低減槽50b及び溶存酸
素低減感剤液保持槽50cから構成されている。なお、
符号52は蓋部材を示す。
Further, a blade (not shown) functioning as a smoothing member is provided at the end of the nozzle 48 on the contact side with the base 31, and the photosensitive liquid discharged from the nozzle 48 is uniformly distributed by the blade. Thus, it is configured to have a uniform film thickness. By the way, the sensitizer liquid storage tank 50 is a part that holds the sensitizer liquid and reduces the dissolved oxygen in the sensitizer liquid, and includes a dissolved oxygen reduction tank 50b and a dissolved oxygen reduction sensitizer liquid holding tank 50c. Have been. In addition,
Reference numeral 52 indicates a lid member.

【0040】ここで、51aは各槽を隔てる隔壁であ
り、この隔壁51aの下部には、図2に示すようにフィ
ルタ51bが付着され、この隔壁51a及びフィルタ5
1bにより各槽を隔てるように構成されている。なお、
フィルタ51bは、溶存酸素低減槽50bからの感剤液
を透過させる一方、感剤液中の気泡の透過を防ぐもので
ある。
Here, reference numeral 51a denotes a partition separating the tanks, and a filter 51b is attached below the partition 51a as shown in FIG.
1b is configured to separate each tank. In addition,
The filter 51b allows the sensitizer solution from the dissolved oxygen reducing tank 50b to pass therethrough, while preventing the transmission of bubbles in the sensitizer solution.

【0041】また、溶存酸素低減槽50bは、感剤液を
保持するとともに、飽和気体生成槽58からの気体を吹
き込むことにより、感剤液中の溶存酸素を低減させる部
位である。即ち、溶存酸素低減槽50bは、飽和気体生
成槽58からの気体を感剤液と接触させることにより、
感剤液中の溶存酸素を低減させる溶存酸素低減手段とし
て機能するものである。
The dissolved oxygen reducing tank 50b is a part for holding the sensitizing solution and blowing the gas from the saturated gas generating tank 58 to reduce the dissolved oxygen in the sensitizing solution. That is, the dissolved oxygen reduction tank 50b is configured to bring the gas from the saturated gas generation tank 58 into contact with the sensitizer liquid,
It functions as a dissolved oxygen reducing means for reducing dissolved oxygen in the sensitizer solution.

【0042】さらに、溶存酸素低減感剤液保持槽50c
は、溶存酸素低減槽50bでの処理が施された後の感剤
液がフィルタ51bを通じて流入すると、これを保持す
る部位である。なお、溶存酸素低減感剤液保持槽50c
の底部には感剤液排出口50dが形成され、感剤液排出
口50dは、配管53を介してポンプ47と接続されて
いる。
Further, the dissolved oxygen reducing sensitizer liquid holding tank 50c
Is a portion that holds the sensitizer liquid after the treatment in the dissolved oxygen reduction tank 50b flows through the filter 51b. The dissolved oxygen reducing sensitizer liquid holding tank 50c
Is formed at the bottom portion of the pump, and the liquid outlet 50d is connected to the pump 47 via a pipe 53.

【0043】そして、溶存酸素低減感剤液保持槽50c
からの感剤液が、ポンプ47及び配管45を通じて、感
剤液塗布機構46の感剤液供給機構46bに供給される
ように構成されている。従って、感剤液塗布機構46
は、溶存酸素低減手段としての溶存酸素低減槽50bか
ら供給される溶存酸素を低減された感剤液を、基体31
に塗布する感剤液塗布手段として機能するのである。
Then, the dissolved oxygen reducing sensitizer liquid holding tank 50c
Is supplied to a sensitizing liquid supply mechanism 46b of a sensitizing liquid application mechanism 46 through a pump 47 and a pipe 45. Therefore, the sensitizer liquid application mechanism 46
The sensitizer liquid with reduced dissolved oxygen supplied from the dissolved oxygen reduction tank 50b as the dissolved oxygen reduction means is used for the substrate 31.
It functions as means for applying a sensitizer liquid to the surface.

【0044】なお、ポンプ47は、ノズル48が末端に
達すると同時に停止されるが、必要であればポンプ47
と同期してON−OFFする弁を、ヘッダー49の近傍
に設けてもよい。また、飽和気体生成槽58は、酸素分
圧の低い気体を感剤液を調製する際に使用する溶媒Aの
蒸気で飽和させることにより、前述のごとく感剤液貯留
槽50にて溶存酸素を低減させる際に用いる気体を生成
するものであり、第1実施形態における飽和気体生成槽
9と同様の構成を有するものである。
The pump 47 is stopped as soon as the nozzle 48 reaches the end.
A valve that turns on and off in synchronization with the header 49 may be provided near the header 49. In addition, the saturated gas generation tank 58 saturates a gas having a low oxygen partial pressure with the vapor of the solvent A used when preparing the sensitizer liquid, thereby dissolving dissolved oxygen in the sensitizer liquid storage tank 50 as described above. It generates gas to be used for reduction, and has the same configuration as the saturated gas generation tank 9 in the first embodiment.

【0045】即ち、飽和気体生成槽58には、感剤液の
構成成分である溶媒Aが保持され、この溶媒A中に配管
57が挿入されている。また、配管57の先端には、多
孔ノズル56が固着されており、配管57から吹き込ま
れた酸素分圧の低い気体(第2実施形態でも窒素ガスを
用いた場合について説明する)が、多孔ノズル56にて
分散されて、溶媒Aに吹き込まれるように構成されてい
る。
That is, the saturated gas generation tank 58 holds a solvent A which is a component of the sensitizer solution, and a pipe 57 is inserted into the solvent A. A perforated nozzle 56 is fixed to the end of the pipe 57, and a gas having a low oxygen partial pressure blown from the pipe 57 (the case where nitrogen gas is used also in the second embodiment will be described). It is configured to be dispersed at 56 and blown into the solvent A.

【0046】そして、配管57から吹き込まれた気体
は、溶媒Aの蒸気で飽和された後に、飽和気体生成槽5
8の上部に接続された配管55を通じて放出されるよう
に構成されている。さらに、この配管55は、感剤液貯
留槽50の溶存酸素低減槽50bに挿入されており、配
管55の先端には、多孔ノズル54が固着されている。
そして、配管55からの気体が、多孔ノズル54にて分
散されて、感剤液に吹き込まれるように構成されてい
る。
After the gas blown from the pipe 57 is saturated with the vapor of the solvent A, the saturated gas generation tank 5
It is configured to be discharged through a pipe 55 connected to the upper part of the pipe 8. Further, the pipe 55 is inserted into the dissolved oxygen reducing tank 50b of the sensitizer liquid storage tank 50, and a perforated nozzle 54 is fixed to the tip of the pipe 55.
Then, the gas from the pipe 55 is dispersed by the multi-hole nozzle 54 and is blown into the sensitizer liquid.

【0047】上述の構成により、本発明の第2実施形態
にかかる感剤液塗布装置30においては、基体31に感
剤液を塗布するに際し、まず、感剤液貯留槽50の溶存
酸素低減槽50bにて、飽和気体生成槽58からの気体
を感剤液と接触させることにより、感剤液中の溶存酸素
が低減される。その後、このようにして溶存酸素を低減
された感剤液(溶存酸素低減感剤液)が感剤液塗布機構
46の感剤液供給機構46bに供給され、感剤液塗布機
構46では、この溶存酸素低減感剤液を用いて基体31
の塗布が行なわれる。
With the above-described configuration, in the sensitizer liquid application apparatus 30 according to the second embodiment of the present invention, when applying the sensitizer liquid to the substrate 31, first, the dissolved oxygen reducing tank of the sensitizer liquid storage tank 50 is used. At 50b, the gas from the saturated gas generation tank 58 is brought into contact with the sensitizer solution, whereby the dissolved oxygen in the sensitizer solution is reduced. Thereafter, the sensitizer solution in which the dissolved oxygen has been reduced in this manner (dissolved oxygen-reducing sensitizer solution) is supplied to the sensitizer solution supply mechanism 46b of the sensitizer solution application mechanism 46, and the sensitizer solution application mechanism 46 performs this process. Substrate 31 using dissolved oxygen reducing sensitizer solution
Is applied.

【0048】このときの感剤液塗布装置30における動
作を、更に詳細に説明する。まず、飽和気体生成槽58
では、圧力調製された窒素ガスが配管57から吹き込ま
れると、当該窒素ガスは、多孔ノズル56にて小さな気
泡に分散された後に、溶媒Aに吹き込まれる。そして、
多孔ノズル56にて分散された窒素ガスは、溶媒Aの蒸
気で飽和され、溶媒飽和した窒素ガス(即ち、溶媒Aの
蒸気を包含した窒素ガス)が、配管55を通じて感剤液
貯留槽50の溶存酸素低減槽50bに送出される。
The operation of the sensitizer liquid application device 30 at this time will be described in more detail. First, the saturated gas generation tank 58
Then, when the pressure adjusted nitrogen gas is blown from the pipe 57, the nitrogen gas is blown into the solvent A after being dispersed into small bubbles by the multi-hole nozzle 56. And
The nitrogen gas dispersed in the multi-hole nozzle 56 is saturated with the vapor of the solvent A, and the nitrogen gas saturated with the solvent (that is, the nitrogen gas containing the vapor of the solvent A) flows through the pipe 55 into the storage tank 50 for the sensitizer liquid. It is sent to the dissolved oxygen reduction tank 50b.

【0049】さらに、溶存酸素低減槽50bでは、配管
55からの溶媒飽和した窒素ガスは、多孔ノズル54に
て小さな気泡に分散された後に、溶存酸素低減槽50b
中の感剤液に吹き込まれる。そして、溶媒飽和した窒素
ガスが感剤液に吹き込まれると、第1実施形態にて詳述
したように、溶解平衡により感剤液中の溶存酸素が窒素
ガス中に放出されるため、感剤液中の溶存酸素量が低減
される。
Further, in the dissolved oxygen reducing tank 50b, the solvent-saturated nitrogen gas from the pipe 55 is dispersed into small bubbles by the multi-aperture nozzle 54, and then dispersed in the dissolved oxygen reducing tank 50b.
It is blown into the sensitizer solution inside. When the solvent-saturated nitrogen gas is blown into the sensitizer solution, as described in detail in the first embodiment, the dissolved oxygen in the sensitizer solution is released into the nitrogen gas due to the dissolution equilibrium. The amount of dissolved oxygen in the liquid is reduced.

【0050】さらに、溶存酸素低減槽50bにて脱酸素
された感剤液は、フィルタ51bを通じて溶存酸素低減
感剤液保持槽50cへ流入した後、感剤液塗布機構46
の感剤液供給機構46bに供給される。そして、感剤液
塗布機構46では、供給された感剤液が感剤液供給機構
46bのノズル48の開口部から基体31の表面に吐出
され、図示しないブレードにより均一にされ、一様な膜
厚となってブレードから離脱することにより、ブレード
塗布が行なわれる。
Further, the sensitizer liquid deoxygenated in the dissolved oxygen reducing tank 50b flows into the dissolved oxygen reducing sensitizer liquid holding tank 50c through the filter 51b, and then is applied to the sensitizer liquid applying mechanism 46.
Is supplied to the photosensitive solution supply mechanism 46b. In the sensitizing liquid application mechanism 46, the supplied sensitizing liquid is discharged from the opening of the nozzle 48 of the sensitizing liquid supply mechanism 46b onto the surface of the base 31, and is made uniform by a blade (not shown) to form a uniform film. The blade is applied by being separated from the blade after it becomes thick.

【0051】なお、基体31は、塗布された後しばらく
回転され、自然乾燥(風乾)した後に、駆動機構46a
から取り外される。ここで、第2実施形態にかかる感剤
液塗布装置30においても、感剤液貯留槽50の溶存酸
素低減槽50bにて感剤液中の溶存酸素を低減させてい
るので、感剤液塗布機構46にて塗布を行なう際に用い
る感剤液中の溶存酸素濃度を低くすることができる。
The base 31 is rotated for a while after being applied, and is naturally dried (air-dried).
Removed from Here, also in the sensitizer liquid application apparatus 30 according to the second embodiment, since the dissolved oxygen in the sensitizer liquid is reduced in the dissolved oxygen reduction tank 50b of the sensitizer liquid storage tank 50, the sensitizer liquid application is performed. The concentration of dissolved oxygen in the sensitizer solution used when applying by the mechanism 46 can be reduced.

【0052】このように本発明の第2実施形態にかかる
感剤液塗布装置30によっても、酸素分圧の低い気体を
感剤液と接触させて感剤液中の溶存酸素を低減させるこ
とにより、過酸化物の生成及び過酸化物による感剤液の
変質を防止して、電子写真感光体用感光膜を形成した場
合の特性の変化を防ぐことができる。また、感剤液中の
溶存酸素を低減させる際に使用する気体に、感剤液を調
製する際に使用する溶媒の蒸気が包含されていることに
より、感剤液の濃度変化を防ぐこともできる。
As described above, according to the sensitizer liquid application apparatus 30 according to the second embodiment of the present invention, the gas having a low oxygen partial pressure is brought into contact with the sensitizer liquid to reduce the dissolved oxygen in the sensitizer liquid. Further, generation of peroxide and deterioration of the sensitizer solution due to the peroxide can be prevented, so that a change in characteristics when a photosensitive film for an electrophotographic photosensitive member is formed can be prevented. Further, the gas used for reducing the dissolved oxygen in the sensitizer solution contains the vapor of the solvent used for preparing the sensitizer solution, thereby preventing a change in the concentration of the sensitizer solution. it can.

【0053】(c)第3実施形態の説明 図3は本発明の第3実施形態にかかる溶存酸素低減感剤
液の製造装置の構成を示す模式図であり、この図3に示
す製造装置70は、酸素分圧の低い気体を電子写真感光
体用感剤液(例えば電荷発生層用感剤液や電荷輸送層用
感剤液)と接触させることにより、溶存酸素を低減させ
た感剤液を製造するものであり、感剤液貯留槽60及び
飽和気体生成槽64をそなえて構成されている。
(C) Description of the Third Embodiment FIG. 3 is a schematic view showing the configuration of a device for producing a dissolved oxygen-reducing sensitizer solution according to a third embodiment of the present invention. Is a sensitizer liquid in which dissolved oxygen is reduced by bringing a gas having a low oxygen partial pressure into contact with a sensitizer liquid for an electrophotographic photoreceptor (for example, a sensitizer liquid for a charge generation layer or a sensitizer liquid for a charge transport layer). It is provided with a sensitizer liquid storage tank 60 and a saturated gas generation tank 64.

【0054】ここで、感剤液貯留槽60は、感剤液を保
持するものであり、例えば、感剤液保存用の石油缶など
が用いられる。さらに、この感剤液貯留槽60は、飽和
気体生成槽64からの気体が吹き込まれ、感剤液貯留槽
60内にて感剤液中の溶存酸素が低減されるように構成
されている。
Here, the sensitizing solution storage tank 60 holds the sensitizing solution, and for example, a petroleum can for storing the sensitizing solution is used. Further, the sensate liquid storage tank 60 is configured such that gas from the saturated gas generation tank 64 is blown therein, and the dissolved oxygen in the sensitizer liquid is reduced in the sensitizer liquid storage tank 60.

【0055】また、飽和気体生成槽64は、酸素分圧の
低い気体を感剤液を調製する際に使用する溶媒Aの蒸気
で飽和させることにより、感剤液貯留槽60にて溶存酸
素を低減させる際に用いる気体を生成するものであり、
第1実施形態における飽和気体生成槽9と同様の構成を
有するものである。即ち、飽和気体生成槽64には、感
剤液の構成成分である溶媒Aが保持され、この溶媒A中
に配管66が挿入されている。
Further, the saturated gas generation tank 64 saturates a gas having a low oxygen partial pressure with the vapor of the solvent A used for preparing the sensitizer liquid, so that the dissolved oxygen is reduced in the sensitizer liquid storage tank 60. To generate a gas to be used for reduction.
It has the same configuration as the saturated gas generation tank 9 in the first embodiment. That is, the saturated gas generation tank 64 holds the solvent A, which is a component of the sensitizer solution, and the pipe 66 is inserted into the solvent A.

【0056】また、配管66の先端には、多孔ノズル6
5が固着されており、配管66から吹き込まれた酸素分
圧の低い気体(第3実施形態でも窒素ガスを用いた場合
について説明する)が、多孔ノズル65にて分散され
て、溶媒Aに吹き込まれるように構成されている。そし
て、配管66から吹き込まれた気体は、溶媒Aの蒸気で
飽和された後に、飽和気体生成槽64の上部に接続され
た配管62を通じて放出されるように構成されている。
At the tip of the pipe 66, a multi-hole nozzle 6 is provided.
5 is fixed, and the gas with a low oxygen partial pressure blown from the pipe 66 (the case where nitrogen gas is used in the third embodiment will also be described) is dispersed by the multi-hole nozzle 65 and blown into the solvent A. It is configured to be. The gas blown from the pipe 66 is configured to be saturated with the vapor of the solvent A and then discharged through the pipe 62 connected to the upper part of the saturated gas generation tank 64.

【0057】さらに、この配管62は、感剤液貯留槽6
0に挿入されており、配管62の先端には、多孔ノズル
61が固着されている。そして、配管62からの気体
が、多孔ノズル61にて分散されて、感剤液に吹き込ま
れるように構成されている。なお、多孔ノズル61は感
剤液貯留槽60の開口部から取り出せるような形状を有
している。
Further, the piping 62 is connected to the photosensitive solution storage tank 6.
0, and a multi-hole nozzle 61 is fixed to the tip of the pipe 62. The gas from the pipe 62 is dispersed by the multi-hole nozzle 61 and is blown into the sensitizer liquid. The multi-hole nozzle 61 has such a shape that it can be taken out from the opening of the sensitizer liquid storage tank 60.

【0058】ここで、配管62及び多孔ノズル61は、
図3に示すように、固定用蓋部材63と一体に形成さ
れ、感剤液貯留槽60への挿入/取り出しが容易となる
ように構成されている。なお、感剤液貯留槽60内の感
剤液の溶存酸素量が低減した後(即ち、溶存酸素低減感
剤液の製造が終了した後)は、感剤液貯留槽60から固
定用蓋部材63が取り除かれ、ガスバリヤー性を有する
内蓋と通気性を有し内蓋を固定するための外蓋とが嵌め
られ、感剤液が溶存酸素量が低い状態で保存されるよう
になっている。
Here, the pipe 62 and the multi-hole nozzle 61 are
As shown in FIG. 3, it is formed integrally with the fixing lid member 63 so as to be easily inserted / removed into / from the photosensitive solution storage tank 60. After the dissolved oxygen amount of the sensitizer solution in the sensitizer solution storage tank 60 has been reduced (that is, after the production of the dissolved oxygen-reduced sensitizer solution has been completed), the fixing lid member is removed from the sensitizer solution storage tank 60. 63 is removed, the inner lid having a gas barrier property and the outer lid for fixing the inner lid having air permeability are fitted, and the sensitizer solution is stored in a state where the dissolved oxygen content is low. I have.

【0059】ここで、ガスバリヤー性を有する内蓋は、
通常の内蓋と同様の形状のものであるが、耐溶剤性を有
するポリエチレン(PE),ポリプロピレン(PP),
ポリテトラフルオロエチレン(PTFE)等のフィルム
と、ガスバリヤー性を有するポリエチレンテレフタレー
ト(PET),ナイロン,ポリフッ化ビニリデン等のフ
ィルムとを積層させてなる50μm程度の膜厚のシート
を、樹脂や金属等の板部材の表面に積層して、この板部
材に加熱・打抜き処理を施すことにより作製される。
Here, the inner lid having gas barrier properties is as follows:
It has the same shape as a normal inner lid, but has polyethylene (PE), polypropylene (PP),
A sheet having a thickness of about 50 μm formed by laminating a film of polytetrafluoroethylene (PTFE) or the like and a film of polyethylene terephthalate (PET) having a gas barrier property, nylon, polyvinylidene fluoride, etc., is formed of a resin, metal or the like. It is manufactured by laminating on the surface of a plate member of the above, and subjecting the plate member to a heating and punching process.

【0060】上述の構成により、本発明の第3実施形態
にかかる溶存酸素低減感剤液の製造装置70において
は、飽和気体生成槽64からの酸素分圧の低い気体を、
感剤液貯留槽60内の感剤液と接触させることにより、
溶存酸素を低減させた感剤液が製造される。即ち、圧力
調製された窒素ガスが配管66から吹き込まれると、飽
和気体生成槽64では、当該窒素ガスは、多孔ノズル6
5にて小さな気泡に分散された後に、溶媒Aに吹き込ま
れる。
With the above configuration, in the apparatus for producing a dissolved oxygen-reducing sensitizer solution 70 according to the third embodiment of the present invention, the gas having a low oxygen partial pressure from the saturated gas generation tank 64 is
By contacting with the sensitizer solution in the sensitizer solution storage tank 60,
A sensitizer solution with reduced dissolved oxygen is produced. That is, when the nitrogen gas whose pressure has been adjusted is blown from the pipe 66, the nitrogen gas in the saturated gas generation tank 64 is
After being dispersed into small bubbles at 5, it is blown into the solvent A.

【0061】そして、多孔ノズル65にて分散された窒
素ガスは、溶媒Aの蒸気で飽和され、溶媒飽和した窒素
ガス(即ち、溶媒Aの蒸気を包含した窒素ガス)が、配
管62を通じて感剤液貯留槽60に送出される。さら
に、感剤液貯留槽60では、配管62からの窒素ガス
は、多孔ノズル61にて小さな気泡に分散された後に、
感剤液貯留槽60中の感剤液に吹き込まれる。
Then, the nitrogen gas dispersed in the multi-hole nozzle 65 is saturated with the vapor of the solvent A, and the nitrogen gas saturated with the solvent (that is, the nitrogen gas containing the vapor of the solvent A) is supplied through the pipe 62 to the photosensitive agent. The liquid is sent to the liquid storage tank 60. Furthermore, in the sensitizer liquid storage tank 60, the nitrogen gas from the pipe 62 is dispersed into small bubbles by the multi-hole nozzle 61,
It is blown into the sensitizer liquid in the sensitizer liquid storage tank 60.

【0062】そして、溶媒飽和した窒素ガスが感剤液に
吹き込まれると、第1実施形態にて詳述したように、溶
解平衡により感剤液中の溶存酸素が窒素ガス中に放出さ
れるため、感剤液中の溶存酸素量が低減され、その結
果、溶存酸素を低減させた感剤液が製造される。このよ
うに本発明の第3実施形態にかかる溶存酸素低減感剤液
の製造装置70によれば、酸素分圧の低い気体を感剤液
と接触させて感剤液中の溶存酸素を低減させることによ
り、過酸化物の生成及び過酸化物による感剤液の変質を
防止して、電子写真感光体用感光膜を形成した場合の特
性の変化を防ぐことができる。
Then, when the solvent-saturated nitrogen gas is blown into the sensitizer solution, the dissolved oxygen in the sensitizer solution is released into the nitrogen gas due to the dissolution equilibrium as described in detail in the first embodiment. In addition, the amount of dissolved oxygen in the sensitizer solution is reduced, and as a result, a sensitizer solution with reduced dissolved oxygen is produced. Thus, according to the apparatus for producing a dissolved oxygen-reducing sensitizer liquid 70 according to the third embodiment of the present invention, a gas having a low oxygen partial pressure is brought into contact with the sensitizer liquid to reduce the dissolved oxygen in the sensitizer liquid. This can prevent generation of peroxides and deterioration of the sensitizer solution due to the peroxides, and prevent changes in characteristics when a photosensitive film for an electrophotographic photosensitive member is formed.

【0063】また、感剤液中の溶存酸素を低減させる際
に使用する気体に、感剤液を調製する際に使用する溶媒
の蒸気が包含されていることにより、感剤液の濃度変化
を防ぐことができる。
Further, since the gas used for reducing the dissolved oxygen in the sensitizer solution contains the vapor of the solvent used for preparing the sensitizer solution, the change in the concentration of the sensitizer solution can be reduced. Can be prevented.

【0064】[0064]

【実施例】さらに、実施例により本発明を詳細に説明す
るが、本発明はその要旨を越えない限り、以下の実施例
に限定されるものではない。 (d)実施例1 実施例1では、図3に示す溶存酸素低減感剤液の製造装
置を用いた場合について説明する。 (1)電子写真感光体用感剤液の作製 まず、下記の一般式(A)に示すオキシチタニウムフタ
ロシアニン10重量部に対して、ジメトキシエタン(D
ME)200重量部を加え、サンドグラインドミルにて
10時間粉砕・分散処理を行なった。
EXAMPLES The present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist of the invention. (D) Example 1 In Example 1, a case will be described in which the apparatus for producing a dissolved oxygen-reducing sensitizer solution shown in FIG. 3 is used. (1) Preparation of Sensitizer Solution for Electrophotographic Photoreceptor First, dimethoxyethane (D) was added to 10 parts by weight of oxytitanium phthalocyanine represented by the following general formula (A).
ME) (200 parts by weight) and pulverized and dispersed in a sand grind mill for 10 hours.

【0065】[0065]

【化1】 Embedded image

【0066】(式中、Xはハロゲン原子を表わし、nは
0から1までの数を表わす)そして、これを、ポリビニ
ルブチラール〔電気化学工業(株)製デンカブチラール
#−6000C〕5重量部の10%ジメトキシエタン溶
液と混合して、電子写真感光体用感剤液(電子写真感光
体電荷発生層用分散液)を作製した。なお、作製直後の
当該溶液の粘度は2.0cpであり、顔料成分の凝集は
観察されなかった。 (2)電子写真感光体用感剤液の溶存酸素低減処理 図3に示す飽和気体生成槽64として、直径100mm
で高さ300mmのステンレス製蓋付きシリンダーを用
い、このシリンダーに1.5リットルのジメトキシエタ
ン(感剤液の構成成分である溶媒)を投入して、この溶
液中に多孔ノズル65付き配管66を挿入した。
(Wherein, X represents a halogen atom, and n represents a number from 0 to 1) and 5 parts by weight of polyvinyl butyral [Denka Butyral # -6000C manufactured by Denki Kagaku Kogyo KK] It was mixed with a 10% dimethoxyethane solution to prepare a sensitizer solution for an electrophotographic photosensitive member (dispersion liquid for an electrophotographic photosensitive member charge generation layer). The viscosity of the solution immediately after the preparation was 2.0 cp, and no aggregation of the pigment components was observed. (2) Treatment for Reducing Dissolved Oxygen in Sensitizer Solution for Electrophotographic Photoreceptor As the saturated gas generation tank 64 shown in FIG.
Using a 300 mm high stainless steel cylinder with a lid, 1.5 liters of dimethoxyethane (a solvent that is a component of the sensitizer solution) is charged into the cylinder, and a pipe 66 with a porous nozzle 65 is inserted into the solution. Inserted.

【0067】ここで、多孔ノズル65は、内径5mmφ
(φは直径を意味する、以下同じ),外径10mmφの
ステンレスパイプを曲げて外径90mmφのリングを形
成し、リングの上曲面部に1mmφの小穴を約15mm
間隔で20個程度設けることにより構成される。また、
配管66としては、多孔ノズル65と同じサイズのステ
ンレスパイプを用い、多孔ノズル65と配管66とを溶
接により固着した。
Here, the multi-hole nozzle 65 has an inner diameter of 5 mmφ.
(Φ means diameter, the same shall apply hereinafter), a stainless pipe with an outer diameter of 10 mmφ is bent to form a ring with an outer diameter of 90 mmφ, and a small hole of 1 mmφ on the upper curved surface of the ring is about 15 mm.
It is constituted by providing about 20 at intervals. Also,
As the pipe 66, a stainless steel pipe having the same size as the multi-hole nozzle 65 was used, and the multi-hole nozzle 65 and the pipe 66 were fixed by welding.

【0068】一方、感剤液貯留槽60に挿入される多孔
ノズル61は、内径5mmφ,外径10mmφのステン
レスパイプの一方の先端を閉じ、水平部の長さが約20
0mmになるようにRを付けて曲げ、水平部の上曲面部
に1mmφの小穴を約10mm間隔で20個程度設ける
ことにより構成される。また、配管62としては、前記
ステンレス製蓋付きシリンダーのガス排出管を用い、上
記多孔ノズル61と配管62とを結合するとともに、結
合された配管62及び多孔ノズル61を固定用蓋部材6
3と一体化した(図3参照)。
On the other hand, the perforated nozzle 61 inserted into the photosensitive solution storage tank 60 closes one end of a stainless steel pipe having an inner diameter of 5 mmφ and an outer diameter of 10 mmφ, and has a horizontal portion having a length of about 20 mm.
It is formed by making a round so as to have a radius of 0 mm and providing about 20 small holes of 1 mmφ at an interval of about 10 mm in the upper curved surface portion of the horizontal portion. As the pipe 62, the gas discharge pipe of the cylinder with a stainless steel lid is used to connect the porous nozzle 61 and the pipe 62, and the coupled pipe 62 and the porous nozzle 61 are connected to the fixing lid member 6
3 (see FIG. 3).

【0069】さらに、感剤液貯留槽60として18リッ
トル石油缶を用い、この石油缶に上述の(1)にて作製
された感剤液15リットルを投入して、石油缶の開口部
に上記一体化された固定用蓋部材63を取り付けた。こ
のような状態において、飽和気体生成槽64に、多孔ノ
ズル65付き配管66から、酸素濃度約2ppmの窒素
ガスを30リットル(ノルマル)/分で吹き込んで、ジ
メトキシエタンの蒸気(感剤液の構成成分である溶媒の
蒸気)で飽和した窒素ガスを発生させ、当該窒素ガスを
感剤液貯留槽60に吹き込むことにより、感剤液貯留槽
60における感剤液の溶存酸素低減処理を行なった。
Further, an 18 liter petroleum can was used as the sensitizer liquid storage tank 60, and 15 liters of the sensitizer liquid prepared in the above (1) was charged into this petroleum can, and the above-mentioned oil was put into the opening of the petroleum can. The integrated fixing lid member 63 was attached. In such a state, nitrogen gas having an oxygen concentration of about 2 ppm is blown into the saturated gas generation tank 64 from the pipe 66 with the multi-hole nozzle 65 at a rate of 30 liter (normal) / minute, so that dimethoxyethane vapor (the composition of the sensitizer liquid) is blown. Nitrogen gas saturated with the vapor of the solvent as a component) was generated, and the nitrogen gas was blown into the sensitizing solution storage tank 60 to perform a process of reducing dissolved oxygen in the sensitizing solution in the sensitizing solution storage tank 60.

【0070】感剤液の溶存酸素低減処理は約1時間行な
い、その後、石油缶の開口部から上記固定用蓋部材63
を取り外して、ガスバリヤー性を有する内蓋と内蓋を固
定するための外蓋を嵌めて、室温で3ヵ月間保存した。
なお、ガスバリヤー性を有する内蓋は、耐溶剤性を有す
るフィルムとガスバリヤー性を有するポリエチレンテレ
フタレート(PET)フィルムとを積層させてなる膜厚
50μmのシートを、板厚1mmのポリエチレン板(板
部材)の表面に積層して、加熱・打抜き処理を施すこと
により作製した。
The dissolved oxygen reduction process of the sensitizer solution is performed for about 1 hour, and thereafter, the fixing cover member 63 is opened through the opening of the petroleum can.
Was removed, an inner lid having a gas barrier property and an outer lid for fixing the inner lid were fitted, and stored at room temperature for 3 months.
The inner lid having gas barrier properties is a 50 μm-thick sheet obtained by laminating a solvent-resistant film and a gas barrier polyethylene terephthalate (PET) film on a 1 mm-thick polyethylene plate (plate). It was produced by laminating on the surface of a member) and performing a heating and punching treatment.

【0071】3ヵ月間保存後の感剤液を石油缶から取り
出して粘度を測定したところ、作製直後の感剤液の粘度
とほとんど同じであった。また、感剤液の分散状態を観
察したが、作製直後の感剤液の場合と同様に顔料成分の
凝集は観察されなかった。 (3)比較例1 上述の(1)にて作製した感剤液を石油缶に投入し、
(2)における溶存酸素低減処理を施すことなく、その
ままガスバリヤー性を有しない通常の内蓋及び内蓋を固
定するための外蓋を嵌めて、室温で3ヵ月間保存した。
The sensitizer solution after storage for 3 months was taken out of a petroleum can and the viscosity was measured. The viscosity was almost the same as that of the sensitizer solution immediately after preparation. Further, the dispersion state of the sensitizer solution was observed, but no aggregation of the pigment component was observed as in the case of the sensitizer solution immediately after preparation. (3) Comparative Example 1 The sensitizer liquid prepared in the above (1) was charged into a petroleum can,
Without performing the dissolved oxygen reduction treatment in (2), a normal inner lid having no gas barrier properties and an outer lid for fixing the inner lid were fitted and stored at room temperature for 3 months.

【0072】3ヵ月保存後の感剤液を石油缶から取り出
して粘度を測定したところ、3cpであり、溶存酸素低
減処理を施したものより粘度が大きくなっていた。ま
た、感剤液の分散状態を観察したところ、溶存酸素低減
処理を施したものに比して幾分凝集があるように思われ
た。 (e)実施例2 実施例2では、図1に示す感剤液塗布装置を用いた場合
について説明する。
The sensitizer solution after storage for 3 months was taken out of the petroleum can and the viscosity was measured. The viscosity was 3 cp, and the viscosity was higher than that after the treatment for reducing dissolved oxygen. When the dispersion state of the sensitizer solution was observed, it seemed that there was some coagulation as compared with the case where the dissolved oxygen reduction treatment was performed. (E) Example 2 In Example 2, a case will be described in which the sensitizer liquid application device shown in FIG. 1 is used.

【0073】図1に示す浸漬槽10として、直径100
mmで高さ400mmの浸漬塗布バスを用い、溶存酸素
低減処理が施された感剤液(溶存酸素低減感剤液)を満
タンになるまで注入した。なお、当該感剤液としては、
上述した実施例1の(2)にて説明した溶存酸素低減処
理を約1時間行なった後、15日間保存したものを用い
た。
The immersion tank 10 shown in FIG.
Using a dip coating bath having a height of 400 mm and a height of 400 mm, a sensitizer solution subjected to a dissolved oxygen reduction treatment (dissolved oxygen reducing sensitizer solution) was injected until the tank became full. In addition, as the said sensitizer liquid,
After performing the dissolved oxygen reduction treatment described in (2) of Example 1 for about 1 hour, the one stored for 15 days was used.

【0074】また、感剤液貯留槽2の濃度均一化槽2
a,溶存酸素低減槽2b,溶存酸素低減感剤液保持槽2
cは、それぞれ容積を4リットル,2リットル,2リッ
トルとし、当該感剤液を、濃度均一化槽2aには4リッ
トル、溶存酸素低減槽2b及び溶存酸素低減感剤液保持
槽2cにはそれぞれ1.2リットル注入した。また、溶
存酸素低減槽2bに、多孔ノズル23付き配管24を挿
入した。なお、多孔ノズル23付き配管24としては、
上述した実施例1の(2)における多孔ノズル65付き
配管66(図3参照)と同様のものを用いた。
Further, the concentration uniforming tank 2 of the photosensitive solution storage tank 2
a, dissolved oxygen reducing tank 2b, dissolved oxygen reducing sensitizer liquid holding tank 2
c is 4 liters, 2 liters, and 2 liters, respectively, and the sensitizer liquid is stored in the concentration equalizing tank 2a in 4 liters, and in the dissolved oxygen reduction tank 2b and the dissolved oxygen reduction sensitizer liquid holding tank 2c, respectively. 1.2 liters were injected. Further, a pipe 24 with a multi-hole nozzle 23 was inserted into the dissolved oxygen reducing tank 2b. In addition, as the pipe 24 with the multi-hole nozzle 23,
The same pipe as the pipe 66 with the multi-hole nozzle 65 (see FIG. 3) in (2) of Example 1 described above was used.

【0075】さらに、飽和気体生成槽9として、上述し
た実施例1の(2)における飽和気体生成槽64(図3
参照)と同様のものを用いた。そして、感剤液塗布装置
15の各槽に導入された感剤液を、流速1.8リットル
/分で循環させた。このような状態において、感剤液塗
布装置15の感剤液塗布機構1においては、直径80m
mで高さ360mmの基体8を浸漬槽10に浸漬して、
300mm/分の速さで引き上げることにより、浸漬塗
布を行なった。
Further, as the saturated gas generation tank 9, the saturated gas generation tank 64 in FIG.
(See Reference). Then, the sensitizing solution introduced into each tank of the sensitizing solution applying device 15 was circulated at a flow rate of 1.8 liter / min. In such a state, the diameter of the photosensitive solution applying mechanism 1 of the photosensitive solution applying device 15 is 80 m.
The substrate 8 having a height of 360 mm and a height of 360 mm is immersed in the immersion tank 10,
Dip coating was performed by pulling up at a speed of 300 mm / min.

【0076】これと同時に、飽和気体生成槽9に、多孔
ノズル26付き配管27から、窒素ガスを吹き込んで、
溶媒蒸気で飽和した窒素ガスを発生させ、当該窒素ガス
を感剤液貯留槽2の溶存酸素低減槽2bに吹き込むこと
により、溶存酸素低減槽2bにおける感剤液の溶存酸素
低減処理を行なった〔上述した実施例1の(2)参
照〕。
At the same time, nitrogen gas was blown into the saturated gas generation tank 9 from the pipe 27 with the multi-hole nozzle 26,
Nitrogen gas saturated with the solvent vapor was generated, and the nitrogen gas was blown into the dissolved oxygen reduction tank 2b of the sensitizer liquid storage tank 2 to perform a dissolved oxygen reduction treatment of the sensitizer liquid in the dissolved oxygen reduction tank 2b. See (2) of the first embodiment described above).

【0077】基体8の浸漬塗布を50本分行なった後、
感剤液塗布装置15内で循環して使用された感剤液を、
図示しない抜きバルブから石油缶に抜き取り、ガスバリ
ヤー性を有する内蓋と内蓋を固定するための外蓋を嵌め
て、室温で1.5カ月間保存した。なお、石油缶,ガス
バリヤー性を有する内蓋及び内蓋を固定するための外蓋
は、上述した実施例1の(2)におけるものと同様のも
のを用いた。
After performing dip coating of the substrate 8 for 50 pieces,
The sensitizer liquid circulated and used in the sensitizer liquid application device 15 is
It was withdrawn from an unillustrated withdrawal valve into a petroleum can, fitted with an inner lid having a gas barrier property and an outer lid for fixing the inner lid, and stored at room temperature for 1.5 months. The oil can, the inner lid having gas barrier properties, and the outer lid for fixing the inner lid used were the same as those in (2) of Example 1 described above.

【0078】1.5ヵ月間保存後の感剤液を石油缶から
取り出して粘度を測定したところ、2.1cpであり、
作製直後の感剤液の粘度とほぼ同じであった。また、感
剤液の分散状態を観察したが、作製直後の感剤液の場合
と同様に顔料成分の凝集は観察されなかった。さらに、
塗布後の基体に欠陥は発生しなかった。 (1)比較例2 上述した実施例2と異なるのは、浸漬塗布を行なう際
に、溶媒蒸気で飽和した窒素ガスを溶存酸素低減槽2b
に吹き込まず、溶存酸素低減槽2bにおける感剤液の溶
存酸素低減処理を行なわなかった点のみである。
The sensitizer solution after storage for 1.5 months was taken out of a petroleum can and the viscosity was measured to be 2.1 cp.
The viscosity was almost the same as that of the sensitizer solution immediately after the preparation. Further, the dispersion state of the sensitizer solution was observed, but no aggregation of the pigment component was observed as in the case of the sensitizer solution immediately after preparation. further,
No defects occurred on the substrate after coating. (1) Comparative Example 2 A difference from Example 2 described above is that when dip coating is performed, nitrogen gas saturated with solvent vapor is dissolved in the dissolved oxygen reduction tank 2b.
The only difference is that the dissolved oxygen reduction treatment of the sensitizer solution in the dissolved oxygen reduction tank 2b was not performed.

【0079】同様の塗布操作終了後、同様に石油缶に抜
き取って、ガスバリヤー性を有する内蓋と内蓋を固定す
るための外蓋を嵌めて、室温で1.5ヵ月間保存した。
1.5ヵ月間保存後の感剤液を石油缶から取り出して粘
度を測定したところ、2.8cpであり、溶存酸素低減
処理を施したものより粘度が大きくなっていた。また、
感剤液の分散状態を観察したところ、いくらか顔料成分
の凝集も観察された。
After the same coating operation was completed, the film was similarly pulled out from a petroleum can, fitted with an inner lid having a gas barrier property and an outer lid for fixing the inner lid, and stored at room temperature for 1.5 months.
The sensitizer solution after storage for 1.5 months was taken out of the petroleum can and the viscosity was measured. As a result, the viscosity was 2.8 cp, which was higher than that of the solution subjected to the dissolved oxygen reduction treatment. Also,
When the dispersion state of the sensitizer solution was observed, some aggregation of the pigment component was also observed.

【0080】[0080]

【発明の効果】以上詳述したように、請求項1〜5記載
の本発明によれば、酸素分圧の低い気体を感剤液と接触
させて、感剤液中の溶存酸素を低減させることにより、
過酸化物の生成及び過酸化物による感剤液の変質を防止
することができ、ひいては電子写真感光体用感光膜を形
成した場合の特性の変化を防ぐことができる利点があ
る。
As described in detail above, according to the first to fifth aspects of the present invention, a gas having a low oxygen partial pressure is brought into contact with a sensitizer solution to reduce dissolved oxygen in the sensitizer solution. By doing
There is an advantage that generation of peroxide and deterioration of the sensitizer solution due to the peroxide can be prevented, and further, a change in characteristics when a photosensitive film for an electrophotographic photosensitive member is formed can be prevented.

【0081】また、請求項2,3,5記載の本発明によ
れば、感剤液中の溶存酸素を低減させる際に使用する気
体が、感剤液を調製する際に使用する溶媒の蒸気を包含
しているため、感剤液の濃度変化を防ぐことができる利
点がある。
According to the second, third, and fifth aspects of the present invention, the gas used for reducing the dissolved oxygen in the sensitizer solution is a vapor of a solvent used for preparing the sensitizer solution. , There is an advantage that a change in the concentration of the sensitizer solution can be prevented.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施形態にかかる感剤液塗布装置
の構成を示す模式図である。
FIG. 1 is a schematic diagram showing a configuration of a sensitizer liquid application device according to a first embodiment of the present invention.

【図2】本発明の第2実施形態にかかる感剤液塗布装置
の構成を示す模式図である。
FIG. 2 is a schematic diagram illustrating a configuration of a sensitizer liquid application device according to a second embodiment of the present invention.

【図3】本発明の第3実施形態にかかる溶存酸素低減感
剤液の製造装置の構成を示す模式図である。
FIG. 3 is a schematic view illustrating a configuration of a device for producing a dissolved oxygen-reducing sensitizer solution according to a third embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 感剤液塗布機構 2 感剤液貯留槽 2a 濃度均一化槽 2b 溶存酸素低減槽 2c 溶存酸素低減感剤液保持槽 3,5,24,27 配管 4 ポンプ 6 バルブ 7 攪拌装置 8 電子写真感光体用基体(電子写真感光体用基材) 9 飽和気体生成槽 10 浸漬槽 12 感剤液受け樋 15 感剤液塗布装置 23,26 多孔ノズル 30 感剤液塗布装置 31 電子写真感光体用基体(電子写真感光体用基材) 45,53,55,57 配管 46 感剤液塗布機構 46a 駆動機構 46b 感剤液供給機構 47 ポンプ 50 感剤液貯留槽 50b 溶存酸素低減槽 50c 溶存酸素低減感剤液保持槽 52 蓋部材 54,56 多孔ノズル 58 飽和気体生成槽 60 感剤液貯留槽 61,65 多孔ノズル 62,66 配管 63 固定用蓋部材 64 飽和気体生成槽 70 製造装置 DESCRIPTION OF SYMBOLS 1 Sensitive liquid application mechanism 2 Sensitive liquid reservoir 2a Concentration equalizing tank 2b Dissolved oxygen reduction tank 2c Dissolved oxygen reduced sensitizer liquid holding tank 3, 5, 24, 27 Piping 4 Pump 6 Valve 7 Stirrer 8 Electrophotography Base for body (substrate for electrophotographic photoreceptor) 9 Saturated gas generation tank 10 Immersion tank 12 Sensitive liquid receiving trough 15 Sensitive liquid applicator 23, 26 Perforated nozzle 30 Sensitive liquid applicator 31 Electrophotographic photoreceptor base (Electrophotographic photoreceptor base material) 45, 53, 55, 57 Piping 46 Sensitive liquid application mechanism 46a Drive mechanism 46b Sensitive liquid supply mechanism 47 Pump 50 Sensitive liquid storage tank 50b Dissolved oxygen reduction tank 50c Dissolved oxygen reduction sensitivity Chemical liquid holding tank 52 Lid members 54, 56 Multi-hole nozzle 58 Saturated gas generation tank 60 Sensitive liquid liquid storage tank 61, 65 Multi-hole nozzle 62, 66 Piping 63 Fixing lid member 64 Saturated gas generation tank 70 Manufacturing equipment

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 電子写真感光体用基材に感剤液を塗布す
るに際し、 まず、酸素分圧の低い気体を該感剤液と接触させること
により、該感剤液中の溶存酸素を低減させておき、 その後、このようにして溶存酸素を低減された感剤液を
該電子写真感光体用基材に塗布することを特徴とする、
感剤液塗布方法。
When applying a sensitizer solution to a substrate for an electrophotographic photoreceptor, first, a gas having a low oxygen partial pressure is brought into contact with the sensitizer solution to reduce dissolved oxygen in the sensitizer solution. And thereafter, applying the sensitizer solution in which the dissolved oxygen is reduced in this manner to the electrophotographic photoreceptor substrate,
Sensitizer liquid application method.
【請求項2】 該感剤液中の溶存酸素を低減させる際に
使用する気体に、該感剤液を調製する際に使用する溶媒
の蒸気が包含されていることを特徴とする、請求項1記
載の感剤液塗布方法。
2. The method according to claim 1, wherein the gas used for reducing the dissolved oxygen in the sensitizer solution contains a vapor of a solvent used for preparing the sensitizer solution. 2. The method for applying a sensitizer liquid according to 1.
【請求項3】 電子写真感光体用感剤液を調製する際に
使用する溶媒の蒸気を包含し且つ酸素分圧の低い気体を
該感剤液と接触させることにより、該感剤液中の溶存酸
素を低減させる溶存酸素低減手段と、 該溶存酸素低減手段から供給される該溶存酸素を低減さ
れた感剤液を該電子写真感光体用基材に塗布する感剤液
塗布手段とをそなえて構成されたことを特徴とする、感
剤液塗布装置。
3. A method for preparing a sensitizer solution for an electrophotographic photoreceptor, comprising bringing a gas containing a solvent used in preparing a sensitizer solution and having a low oxygen partial pressure into contact with the sensitizer solution. A dissolved oxygen reducing means for reducing dissolved oxygen; and a sensitizer liquid applying means for applying the sensitized liquid reduced in dissolved oxygen supplied from the dissolved oxygen reducing means to the electrophotographic photosensitive member substrate. A sensitizer liquid application device, characterized in that:
【請求項4】 酸素分圧の低い気体を電子写真感光体用
感剤液と接触させることにより、溶存酸素を低減させた
感剤液を製造することを特徴とする、溶存酸素低減感剤
液の製造方法。
4. A dissolved oxygen-reduced sensitizer solution characterized by producing a sensitizer solution with reduced dissolved oxygen by bringing a gas having a low oxygen partial pressure into contact with a sensitizer solution for an electrophotographic photoreceptor. Manufacturing method.
【請求項5】 該感剤液中の溶存酸素を低減させる際に
使用する気体に、該感剤液を調製する際に使用する溶媒
の蒸気が包含されていることを特徴とする、請求項4記
載の溶存酸素低減感剤液の製造方法。
5. The method according to claim 1, wherein the gas used for reducing the dissolved oxygen in the sensitizer solution contains a vapor of a solvent used for preparing the sensitizer solution. 5. The method for producing a dissolved oxygen-reducing sensitizer liquid according to item 4.
JP25879697A 1997-09-24 1997-09-24 Sensitive material liquid application and sensitive material liquid applying device as well as production of dissolved oxygen decreasing sensitive material liquid Pending JPH1190312A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25879697A JPH1190312A (en) 1997-09-24 1997-09-24 Sensitive material liquid application and sensitive material liquid applying device as well as production of dissolved oxygen decreasing sensitive material liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25879697A JPH1190312A (en) 1997-09-24 1997-09-24 Sensitive material liquid application and sensitive material liquid applying device as well as production of dissolved oxygen decreasing sensitive material liquid

Publications (1)

Publication Number Publication Date
JPH1190312A true JPH1190312A (en) 1999-04-06

Family

ID=17325195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25879697A Pending JPH1190312A (en) 1997-09-24 1997-09-24 Sensitive material liquid application and sensitive material liquid applying device as well as production of dissolved oxygen decreasing sensitive material liquid

Country Status (1)

Country Link
JP (1) JPH1190312A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014145631A (en) * 2013-01-28 2014-08-14 Ushio Inc Reagent solution kit for fluorometry

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014145631A (en) * 2013-01-28 2014-08-14 Ushio Inc Reagent solution kit for fluorometry

Similar Documents

Publication Publication Date Title
JP4762822B2 (en) Chemical liquid mixing method and chemical liquid mixing apparatus
JPH1190312A (en) Sensitive material liquid application and sensitive material liquid applying device as well as production of dissolved oxygen decreasing sensitive material liquid
JPH01118140A (en) Device for manufacturing electrophotographic sensitive body
JP2002339100A (en) Barrel plating apparatus
JP3147932B2 (en) Inner surface treatment device for cylindrical body
JPH1048852A (en) Device for dip-coating electrophotographic photoreceptor
JP2504784B2 (en) Method for removing coating film on the drum end
JP2008221188A (en) Coating unit
JP3497570B2 (en) Dip coating apparatus and method of manufacturing electrophotographic photoreceptor using the apparatus
JP2005177656A (en) Dip coating method, dip coating apparatus and method of manufacturing electrophotographic photoreceptor
JP4357760B2 (en) Electrophotographic photosensitive member, manufacturing method thereof, manufacturing apparatus, and image forming apparatus including the photosensitive member
JP2001162216A (en) Coating method, method of manufacturing for electrophotographic photoreceptor and electrophotographic photoreceptor
JP3485870B2 (en) Coating device
JPH04114761A (en) System for circulating coating liquid
JP2000181101A (en) Production of photoreceptor drum and treating tank
JP4162340B2 (en) Method for peeling off photosensitive layer of electrophotographic photosensitive member
JP4470516B2 (en) Immersion coating method
JP2010058001A (en) Method for coating developing roller with coating solution and coating apparatus
JP2001272803A (en) Coating applicator for electrophotographic organic photoreceptor
JPH09269604A (en) Coating device for electrophotographic photoreceptor
JPH09197690A (en) Dip-coating method and device used for it
JP2000275871A (en) Coating applicator for forming under-coating layer of electrophotographic photoreceptor
JPH10244195A (en) Immersion coating applicator
JPH05341541A (en) Manufacture of electrophotographic sensitive body and device therefor
JPS5965846A (en) Developing device

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050519

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050531

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20051129