JPH118331A - Semiconductor device and integrated semiconductor device - Google Patents

Semiconductor device and integrated semiconductor device

Info

Publication number
JPH118331A
JPH118331A JP9157189A JP15718997A JPH118331A JP H118331 A JPH118331 A JP H118331A JP 9157189 A JP9157189 A JP 9157189A JP 15718997 A JP15718997 A JP 15718997A JP H118331 A JPH118331 A JP H118331A
Authority
JP
Japan
Prior art keywords
substrate
semiconductor device
counterbore
semiconductor
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9157189A
Other languages
Japanese (ja)
Inventor
Isao Hirata
勲夫 平田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP9157189A priority Critical patent/JPH118331A/en
Publication of JPH118331A publication Critical patent/JPH118331A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/4824Connecting between the body and an opposite side of the item with respect to the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/0781Adhesive characteristics other than chemical being an ohmic electrical conductor
    • H01L2924/07811Extrinsic, i.e. with electrical conductive fillers

Abstract

PROBLEM TO BE SOLVED: To enhance reliability for connection of stacked semiconductor devices. SOLUTION: A through-hole is cut at such point as separated into almost halves, so a plurality of recessed parts 2 whose cross sections are almost semicircular are provided on a side end surface of a substrate 1, while an outer lead 3 is formed at each of the recessed parts 2. A counterbore part 4 is formed on the one side surface of the substrate 1, where an opening part 5 opened to both surfaces of the substrate 1 is provided. A circuit 6 connected to the outer lead 3 is formed on the surface of the substrate 1, on the side opposite to a surface where the counterbore part 4 is provided. A semiconductor element 7 is mounted on the counterbore part 4, and a wire 8 is bonded between the semiconductor element 7 and the circuit 6 through the opening part 5. While are semiconductor element 7 mounted in the counterbore part 4 does not protrude above the surface of the substrate 1, the connection between the outer loads 3 provided on the substrate 1, with the substrate 1 being directly jointed, allows the electrically connection of a semiconductor device which is loaded.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、QFN(quad
flat non−leaded package)
などの半導体装置及び集積半導体装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a QFN (quad
flat non-leaded package)
And the like and semiconductor devices and integrated semiconductor devices.

【0002】[0002]

【従来の技術】半導体装置Aは、電気絶縁性の基板1の
端部に沿って多数のアウターリード3を設けると共に各
アウターリード3に接続して基板1の表面に放射状の回
路6を設けることによってパッケージを作製し、そして
この基板1の表面に半導体素子7を搭載すると共に半導
体素子7と回路6との間にワイヤー8をボンディングし
て接続し、さらに必要に応じて半導体素子7やワイヤー
8を封止樹脂17で封止することによって製造されてい
る。
2. Description of the Related Art In a semiconductor device A, a large number of outer leads 3 are provided along the end of an electrically insulating substrate 1 and a radial circuit 6 is provided on the surface of the substrate 1 by being connected to each outer lead 3. A semiconductor device 7 is mounted on the surface of the substrate 1 and a wire 8 is bonded and connected between the semiconductor device 7 and the circuit 6. Is sealed with a sealing resin 17.

【0003】そしてこのような半導体装置Aをマザーボ
ード18に実装するにあたって、半導体装置Aの実装密
度を高めるために、複数の半導体装置Aを積み重ねて積
載するようにした集積半導体装置が特開平3−2952
66号公報や特開平6−140738号公報等で提供さ
れている。図9はその一例を示すものである。ここで、
半導体装置Aは上記のように基板1の表面に半導体素子
7を搭載し、さらにその上に封止樹脂17を封止して形
成されているために、基板1の表面から半導体素子7や
封止樹脂17が突出している。従って、複数の半導体装
置Aを積み重ねて積載するにあたっては、上下に隣合う
半導体装置Aの間にこの突出する半導体素子7や封止樹
脂17を納めるためのスペースを確保する必要がある。
そこで図9のものでは基板1の上面に半導体素子7を囲
むように封止枠20を設けて封止枠20内に封止樹脂1
7を充填するようにし、封止枠20を介して半導体装置
Aの基板1を上下に接合するようにしている。
[0003] In mounting such a semiconductor device A on the motherboard 18, an integrated semiconductor device in which a plurality of semiconductor devices A are stacked and mounted is proposed in order to increase the mounting density of the semiconductor device A. 2952
No. 66 and Japanese Patent Application Laid-Open No. 6-140738. FIG. 9 shows an example. here,
As described above, the semiconductor device A is formed by mounting the semiconductor element 7 on the surface of the substrate 1 and further sealing the sealing resin 17 thereon. The stop resin 17 protrudes. Therefore, when stacking a plurality of semiconductor devices A, it is necessary to secure a space for housing the protruding semiconductor element 7 and the sealing resin 17 between the vertically adjacent semiconductor devices A.
9, a sealing frame 20 is provided on the upper surface of the substrate 1 so as to surround the semiconductor element 7, and the sealing resin 1 is placed in the sealing frame 20.
7 and the substrate 1 of the semiconductor device A is vertically joined via the sealing frame 20.

【0004】[0004]

【発明が解決しようとする課題】しかし、このように封
止枠20を介して半導体装置Aの基板1を上下に接合す
るようにすると、封止枠20の箇所にも基板1から連続
するアウターリード3を設けて、積載する半導体装置A
の相互の電気的接続を行なうことができるようにする必
要があり、加工の工程が複雑になると共に、隣合う半導
体装置Aの相互の接合の納まりが悪くなって、半導体装
置Aの相互の接続信頼性が低くなるという問題があっ
た。
However, when the substrate 1 of the semiconductor device A is vertically joined through the sealing frame 20 in this manner, the outer portion continuous from the substrate 1 is also provided at the sealing frame 20. Semiconductor device A provided with leads 3 and mounted
It is necessary to enable the mutual electrical connection of the semiconductor devices A, and the processing steps become complicated, and the mutual connection of the adjacent semiconductor devices A is deteriorated. There was a problem that reliability was lowered.

【0005】本発明は上記の点に鑑みてなされたもので
あり、積み重ねる半導体装置の接続の信頼性を高く得る
ようにすることを目的とするものである。
[0005] The present invention has been made in view of the above points, and it is an object of the present invention to obtain a highly reliable connection of stacked semiconductor devices.

【0006】[0006]

【課題を解決するための手段】本発明に係る請求項1の
半導体装置は、スルーホールを略半分に切断する箇所で
裁断することによって基板1の側端面に断面略半円形の
複数の凹部2を設けると共にこの凹部2にアウターリー
ド3を形成し、基板1の片側面に座ぐり凹部4を形成す
ると共にこの座ぐり凹部4の箇所において基板1の両面
に開口する開口部5を設け、座ぐり凹部4を設けた面と
反対側の面において基板1の表面にアウターリード3と
接続される回路6を形成し、座ぐり凹部4に半導体素子
7を搭載すると共に開口部5を通して半導体素子7と回
路6との間にワイヤー8をボンディングして成ることを
特徴とするものである。
According to a first aspect of the present invention, there is provided a semiconductor device, wherein a plurality of recesses each having a substantially semicircular cross-section are formed on a side end surface of a substrate by cutting a through hole at a position where the through hole is cut in half. In addition, an outer lead 3 is formed in the concave portion 2, a counterbore concave portion 4 is formed on one side surface of the substrate 1, and an opening portion 5 which is open at both sides of the substrate 1 at the location of the counterbore concave portion 4 is provided. A circuit 6 connected to the outer lead 3 is formed on the surface of the substrate 1 on the surface opposite to the surface where the counterbore 4 is provided, and the semiconductor element 7 is mounted in the counterbore 4 and the semiconductor element 7 is passed through the opening 5. And a circuit 6 is bonded to the wire 8.

【0007】本発明に係る請求項2の集積半導体装置
は、基板1を積み重ねることによって、上記の請求項1
の半導体装置A1 を複数個積載して成ることを特徴とす
るものである。本発明に係る請求項3の半導体装置は、
スルーホールを略半分に切断する箇所で裁断することに
よって基板1の側端面に断面略半円形の凹部2を設ける
と共にこの凹部2にアウターリード3を形成し、基板1
の片側面に座ぐり凹部4を形成し、基板1の表面にアウ
ターリード3と接続される回路6を形成し、座ぐり凹部
4を形成した面と反対側の面に半導体素子7を搭載する
と共に半導体素子7と回路6とを接続して成ることを特
徴とするものである。
The integrated semiconductor device according to claim 2 of the present invention is characterized in that the substrate 1 is stacked on the integrated semiconductor device.
The semiconductor device A 1 is characterized in that comprising a plurality loading. According to a third aspect of the present invention, there is provided a semiconductor device comprising:
By cutting the through hole at a position where the through hole is cut in half, a concave portion 2 having a substantially semicircular cross section is provided on the side end surface of the substrate 1 and an outer lead 3 is formed in the concave portion 2.
A counterbore recess 4 is formed on one side of the substrate 1, a circuit 6 connected to the outer lead 3 is formed on the surface of the substrate 1, and a semiconductor element 7 is mounted on a surface opposite to the surface on which the counterbore recess 4 is formed. And the semiconductor device 7 and the circuit 6 are connected.

【0008】本発明に係る請求項4の集積半導体装置
は、基板1を積み重ねることによって、上記の請求項3
の半導体装置A2 を複数個積載して成ることを特徴とす
るものである。本発明に係る請求項5の半導体装置は、
スルーホールを略半分に切断する箇所で裁断することに
よって基板1の側端面に断面略半円形の凹部2を設ける
と共にこの凹部2にアウターリード3を形成し、基板1
の両面にそれぞれ座ぐり凹部4a.4bを形成し、基板
1の表面にアウターリード3と接続される回路6を形成
し、基板1の両面のいずれか一方の座ぐり凹部4a.4
bに半導体素子7を搭載すると共に半導体素子7と回路
6とを接続して成ることを特徴とするものである。
The integrated semiconductor device according to claim 4 of the present invention is characterized in that the substrate 1 is stacked on the integrated semiconductor device.
The semiconductor device A 2 is characterized in that comprising a plurality loading. According to a fifth aspect of the present invention, there is provided a semiconductor device comprising:
By cutting the through hole at a position where the through hole is cut in half, a concave portion 2 having a substantially semicircular cross section is provided on the side end surface of the substrate 1 and an outer lead 3 is formed in the concave portion 2.
Counterbore recesses 4a. 4b, a circuit 6 connected to the outer leads 3 is formed on the surface of the substrate 1, and either one of the counterbore recesses 4a. 4
b, the semiconductor element 7 is mounted and the semiconductor element 7 and the circuit 6 are connected.

【0009】本発明に係る請求項6の集積半導体装置
は、基板1を積み重ねることによって、上記の請求項5
の半導体装置A3 を複数個積載して成ることを特徴とす
るものである。本発明に係る請求項7の集積半導体装置
は、基板1を積み重ねることによって、請求項1に記載
の半導体装置A1 と、請求項3に記載の半導体装置A2
と、請求項5に記載の半導体装置A3 のうち2種類以上
の半導体装置を複数個積載して成ることを特徴とするも
のである。
The integrated semiconductor device according to claim 6 of the present invention is characterized in that the substrate 1 is stacked on the integrated semiconductor device.
The semiconductor device A 3 is characterized in that comprising a plurality loading. Integrated semiconductor device according to claim 7 according to the present invention, by stacking the substrate 1, the semiconductor device A 1 according to claim 1, the semiconductor device according to claim 3 A 2
When and it is characterized by comprising a plurality stacked semiconductor device of the two or more of the semiconductor device A 3 according to claim 5.

【0010】本発明に係る請求項8の集積半導体装置
は、導電性材料9を介して基板1を積み重ねることによ
って、積載した半導体装置A1 ,A2 ,A3 を接合する
と共に電気的に接続して成ることを特徴とするものであ
る。
According to the integrated semiconductor device of the present invention, the stacked semiconductor devices A 1 , A 2 and A 3 are joined and electrically connected by stacking the substrates 1 via the conductive material 9. It is characterized by comprising.

【0011】[0011]

【発明の実施の形態】以下、本発明の実施の形態を説明
する。図1は請求項1の半導体装置A1 の実施の形態の
一例を示すものである。基板1は樹脂積層板などの電気
絶縁性材料で四角形状に作製されるものであり、基板1
の片側の面には座ぐり加工を施して四角形の座ぐり凹部
4が形成してある。この座ぐり凹部4を設けた箇所にお
いて基板1の中央部には、座ぐり凹部4よりも小さい面
積で、基板1の両面に開口する四角形状の開口部5が形
成してある。また図2に示すように、基板1の各側端面
には断面形状が略半円形の凹部2が端縁に沿って多数設
けてあり、この凹部2の内周及び基板1の両面の凹部2
の開口縁にメッキを施すことによって、アウターリード
3が形成してある。このアウターリード3は凹部2の内
周の側部電極3aと、基板1の座ぐり凹部4を設けた側
の面の下部電極3cと、基板1の座ぐり凹部4を設けた
側と反対の面の上部電極3bから成るものである。さら
に、基板1の座ぐり凹部4を設けた面と反対側の面にメ
ッキを施すことによって、基板1の表面に回路6が形成
してある。回路6は一端がアウターリード3と接続さ
れ、他端が開口部5の近傍に位置するように放射状に形
成されるものであり、回路6の開口部5の近傍側の端部
がインナーリード6aとなるものである。上記のアウタ
ーリード3や回路6は例えばCu、Ni、Auの3層の
メッキ膜からなるものである。
Embodiments of the present invention will be described below. FIG. 1 shows an example of an embodiment of the semiconductor device A1 of the first aspect. The substrate 1 is made of an electrically insulating material such as a resin laminate and is formed in a square shape.
The surface on one side has a square counterbore recess 4 formed by spot facing. At the center of the substrate 1 where the counterbore recess 4 is provided, a rectangular opening 5 having an area smaller than that of the counterbore recess 4 and opening on both sides of the substrate 1 is formed. As shown in FIG. 2, a plurality of recesses 2 each having a substantially semicircular cross section are provided along the edge on each side end surface of the substrate 1, and the inner circumference of the recess 2 and the recesses 2 on both surfaces of the substrate 1 are provided.
The outer leads 3 are formed by plating the edges of the openings. The outer lead 3 has a side electrode 3a on the inner periphery of the concave portion 2, a lower electrode 3c on the side of the substrate 1 on which the counterbore recess 4 is provided, and an opposite side to the side of the substrate 1 on which the counterbore recess 4 is provided. The upper electrode 3b has a surface. Further, a circuit 6 is formed on the surface of the substrate 1 by plating the surface of the substrate 1 opposite to the surface on which the counterbore recess 4 is provided. The circuit 6 is formed radially so that one end is connected to the outer lead 3 and the other end is located near the opening 5, and the end of the circuit 6 near the opening 5 is the inner lead 6 a It is what becomes. The outer lead 3 and the circuit 6 are made of, for example, three-layer plating films of Cu, Ni, and Au.

【0012】上記のような基板1の製造は次のようにし
て行なうことができる。例えば1m×1m程度の大きさ
の母基板(図示省略)に多数のスルーホール(図示省
略)を四角枠状に並ぶ配置でドリル加工して設け、無電
解メッキや電解メッキ等を行なうことによってスルーホ
ールの内周及び基板1の表面にメッキを施して、アウタ
ーリード3や回路6を形成し、さらに座ぐり凹部4や開
口部5を加工した後に、各スルーホールを略半分に切断
する箇所に沿って母基板を金型で打ち抜いて裁断するこ
とによって、各側端面に断面形状が略半円形の凹部2が
端縁に沿って多数設けられた基板1を得ることができる
ものである。
The manufacture of the substrate 1 as described above can be performed as follows. For example, a large number of through holes (not shown) are drilled in a matrix board (not shown) having a size of about 1 m × 1 m in a rectangular frame arrangement, and the through holes are formed by performing electroless plating, electrolytic plating, or the like. After plating the inner periphery of the hole and the surface of the substrate 1 to form the outer lead 3 and the circuit 6, further processing the counterbore recess 4 and the opening 5, a portion where each through hole is cut in substantially half. By punching and cutting the mother substrate along a die along the edge, a substrate 1 having a large number of recesses 2 each having a substantially semicircular cross section along the edge can be obtained at each end surface.

【0013】そして、このように作製される基板1に
は、その座ぐり凹部4内にICメモリーなどの半導体素
子7を接着剤15で接着することによって搭載するよう
にしてある。この半導体素子7は座ぐり凹所4よりは小
さい面積であるが、開口部5よりは大きな面積に形成し
てあり、表面の中央部に電極パッド16を設けたセンタ
ーパッドの半導体素子7を用いるものである。このセン
ターパッドの半導体素子7を座ぐり凹所4に搭載する
と、半導体素子7の中央部に設けた電極パッド16は開
口部5内に位置するものであり、図1に示すように、こ
の開口部5を通して電極パッド16と基板1の表面の回
路6のインナーリード6aとの間に金線などのワイヤー
8をボンディングすることによって、半導体素子7と回
路6とを電気的に接続することができるものである。さ
らに、ワイヤー8とインナーリード6aを保護するため
に、これらを覆うように封止樹脂17で封止することに
よって、半導体装置A1 を得ることができるものであ
る。封止樹脂17によって半導体素子7は基板1にさら
に強く固定されるようになっている。
Then, the semiconductor element 7 such as an IC memory is mounted on the substrate 1 thus manufactured by bonding the semiconductor element 7 such as an IC memory into the counterbore recess 4 with an adhesive 15. The semiconductor element 7 has an area smaller than the counterbore recess 4 but larger than the opening 5, and uses a center pad semiconductor element 7 provided with an electrode pad 16 at the center of the surface. Things. When the semiconductor element 7 of the center pad is mounted in the counterbore recess 4, the electrode pad 16 provided at the center of the semiconductor element 7 is located in the opening 5, and as shown in FIG. By bonding a wire 8 such as a gold wire between the electrode pad 16 and the inner lead 6a of the circuit 6 on the surface of the substrate 1 through the portion 5, the semiconductor element 7 and the circuit 6 can be electrically connected. Things. Furthermore, in order to protect the wire 8 and the inner lead 6a, by sealing with the sealing resin 17 so as to cover, in which it is possible to obtain the semiconductor device A 1. The semiconductor element 7 is further firmly fixed to the substrate 1 by the sealing resin 17.

【0014】上記のように作製される半導体装置A1
マザーボード18に実装して用いることができる。半導
体装置A1 をマザーボード18に実装するにあたって
は、図1に示すように、アウターリード3の側部電極3
aと下部電極3cをマザーボード18に設けた回路(図
示省略)に半田19で接続すると共に固定することによ
って、行なうことができる。
[0014] The semiconductor device A 1 which is manufactured as described above can be used and mounted on the motherboard 18. When mounting the semiconductor device A 1 on the motherboard 18, as shown in FIG.
a and the lower electrode 3c are connected to a circuit (not shown) provided on the motherboard 18 by solder 19 and fixed.

【0015】図3は請求項2の集積半導体装置の実施の
形態の一例を示すものであり、上記のように作製した複
数の半導体装置A1 を積載するようにしてある。すなわ
ち、下の半導体装置A1 の基板1のアウターリード3の
上部電極3b上に、上の半導体装置A1 の基板1のアウ
ターリード3の下部電極3cを導電性材料9を介して重
ね、上下の基板1を導電性材料9で機械的に接合すると
共に上下の基板1を電気的に接続して、複数の半導体装
置A1 を積載するようにしてある。この導電性材料9と
しては、異方性導電接着剤を用いることができる。この
ように2個以上の複数の半導体装置A1 を積載した集積
半導体装置は、その下端の半導体装置A 1 を図1の場合
と同様にマザーボード18に半田19付けすることによ
って、マザーボード18に実装することができるもので
ある。
FIG. 3 shows an embodiment of the integrated semiconductor device according to claim 2.
This shows an example of the form, and is a duplicate produced as described above.
Number of semiconductor devices A1Is loaded. Sand
And the lower semiconductor device A1Of the outer leads 3 of the substrate 1
On the upper electrode 3b, the upper semiconductor device A1Substrate 1
The lower electrode 3c of the lead 3
When the upper and lower substrates 1 are mechanically joined with the conductive material 9
By electrically connecting the upper and lower substrates 1 together, a plurality of semiconductor devices are connected.
Place A1Is loaded. This conductive material 9
Then, an anisotropic conductive adhesive can be used. this
As described above, two or more semiconductor devices A1Stacking
The semiconductor device is a semiconductor device A at the lower end. 1In the case of FIG.
By soldering 19 to the motherboard 18 in the same manner as
It can be mounted on the motherboard 18
is there.

【0016】上記のように複数の半導体装置A1 を積載
して集積半導体装置にすることによって、マザーボード
18に半導体装置A1 を高密度で実装することが可能に
なるものである。また半導体装置A1 にあって、半導体
素子7は基板1の座ぐり凹部4内に搭載されているため
に、基板1の表面から突出することがなく、従って半導
体素子7を納める隙間を上下の基板1間に形成させる必
要なく、基板1を直接接合するようにして複数の半導体
装置A1 を積載することができるものであり、積み重ね
の嵩を低くすることができると共に、基板1を直接接合
することによって隣合う半導体装置A1 の接続を行なう
ことが可能になり、半導体装置A1 の相互の接続の信頼
性を高めることができるものである。ここで、封止樹脂
17が基板1の表面から突出する場合には、基板1に設
けた座ぐり凹部4の深さは、半導体素子7と接着剤15
の他に封止樹脂17を納める寸法に形成されるものであ
る。
By stacking a plurality of semiconductor devices A 1 to form an integrated semiconductor device as described above, it becomes possible to mount the semiconductor devices A 1 on the motherboard 18 at high density. Also in the semiconductor device A 1, for the semiconductor device 7 is mounted within counterbore recess 4 of the substrate 1, without projecting from the surface of the substrate 1, hence the gap top and bottom to pay semiconductor element 7 without the need to form between the substrates 1, so as to bond the substrate 1 directly are those capable of stacking a plurality of semiconductor devices a 1, it is possible to reduce the bulk of the stack, bonding the substrate 1 directly adjacent becomes possible to perform the connection of the semiconductor device a 1 by, those capable of enhancing the reliability of the interconnections of the semiconductor device a 1. Here, when the sealing resin 17 protrudes from the surface of the substrate 1, the depth of the counterbore concave portion 4 provided in the substrate 1 is determined by adjusting the depth of the semiconductor element 7 and the adhesive 15.
In addition to the above, it is formed to have a size to accommodate the sealing resin 17.

【0017】図4は請求項3の半導体装置A2 の実施の
形態の一例を示すものであり、基板1の片側の面に座ぐ
り加工を施して四角形の座ぐり凹部4を形成し、基板1
の座ぐり凹部4を設けた面と反対側の表面に回路6が形
成してある。基板1のその他の構成は開口部5を設けな
い点を除いて図1の半導体装置A1 の基板1とほぼ同じ
である。
FIG. 4 shows an example of an embodiment of the semiconductor device A 2 according to the third aspect of the present invention, in which a counterbore process is performed on one surface of the substrate 1 to form a square counterbore recess 4. 1
The circuit 6 is formed on the surface on the side opposite to the surface on which the counterbore recess 4 is provided. Other configurations of the substrate 1 is substantially the same as the substrate 1 of the semiconductor device A 1 of FIG. 1 except for the omission of the opening 5.

【0018】このものでは、半導体素子7は基板1の座
ぐり凹部4を設けた面と反対側の表面に必要に応じて接
着することによって基板1に搭載されるものであり、半
導体素子7としては表面の周縁部に電極パッド16を設
けたエッジパッドの半導体素子7を用いるものである。
そして電極パッド16と基板1の表面の回路6のインナ
ーリード6aとの間に金線などのワイヤー8をボンディ
ングすることによって、半導体素子7と回路6とを電気
的に接続することができるものであり、さらに半導体素
子7とワイヤー8を封止樹脂17で封止することによっ
て、半導体装置A2 を得ることができるものである。
In this case, the semiconductor element 7 is mounted on the substrate 1 by adhering as necessary to the surface of the substrate 1 opposite to the surface on which the counterbore recess 4 is provided. Uses a semiconductor element 7 of an edge pad provided with an electrode pad 16 on the periphery of the surface.
The semiconductor element 7 and the circuit 6 can be electrically connected by bonding a wire 8 such as a gold wire between the electrode pad 16 and the inner lead 6a of the circuit 6 on the surface of the substrate 1. There is one further semiconductor device 7 and the wire 8 by sealing with the sealing resin 17, it is possible to obtain a semiconductor device a 2.

【0019】上記のように作製される半導体装置A2
マザーボード18に実装して用いることができる。半導
体装置A2 をマザーボード18に実装するにあたって
は、図4に示すように、アウターリード3の側部電極3
aと下部電極3cをマザーボード18に設けた回路(図
示省略)に半田19で接続すると共に固定することによ
って、行なうことができる。
The semiconductor device A 2 manufactured as described above can be mounted on the motherboard 18 and used. When mounting the semiconductor device A 2 on the motherboard 18, as shown in FIG.
a and the lower electrode 3c are connected to a circuit (not shown) provided on the motherboard 18 by solder 19 and fixed.

【0020】図5は請求項4の集積半導体装置の実施の
形態の一例を示すものであり、上記のように作製した複
数の半導体装置A2 を積載するようにしてある。すなわ
ち、下の半導体装置A2 の基板1のアウターリード3の
上部電極3b上に、上の半導体装置A2 の基板1のアウ
ターリード3の下部電極3cを異方性導電接着剤などの
導電性材料9を介して重ね、上下の基板1を導電性材料
9で機械的に接合すると共に上下の基板1を電気的に接
続して、複数の半導体装置A2 を積載するようにしてあ
る。このように2個以上の複数の半導体装置A2 を積載
した集積半導体装置は、その下端の半導体装置A2 を図
4の場合と同様にマザーボード18に半田19付けする
ことによって、マザーボード18に実装することができ
るものである。
[0020] FIG. 5 shows an example of an embodiment of an integrated semiconductor device according to claim 4, are to be stacked a plurality of semiconductor devices A 2 prepared as described above. That is, on the upper electrode 3b of the outer leads 3 of the substrate 1 of the semiconductor device A 2 below, the conductivity of the lower electrode 3c of the outer leads 3 of the substrate 1 of the semiconductor device A 2 above such anisotropic conductive adhesive Again through the material 9, the upper and lower substrates 1 with a conductive material 9 electrically connects the substrate 1 and below the well as mechanically bonding, are to be stacked a plurality of semiconductor devices a 2. The integrated semiconductor device on which the two or more semiconductor devices A 2 are thus mounted is mounted on the mother board 18 by soldering the lower semiconductor device A 2 to the mother board 18 as in the case of FIG. Is what you can do.

【0021】上記のように複数の半導体装置A2 を積載
して集積半導体装置にすることによって、マザーボード
18に半導体装置A2 を高密度で実装することが可能に
なるものである。またこの半導体装置A2 にあって、半
導体素子7を搭載した面と反対側の面において基板1に
は座ぐり凹部4が形成されているために、複数の半導体
装置A2 を積載すると、隣合う半導体装置A2 におい
て、一方の半導体装置A 2 の半導体素子7は他方の半導
体装置A2 の基板1の座ぐり凹部4内に納められること
になる。従って半導体素子7を納める隙間を上下の基板
1間に形成させる必要なく、基板1を直接接合するよう
にして複数の半導体装置A2 を積載することができるも
のであり、積み重ねの嵩を低くすることができると共
に、基板1を直接接合することによって隣合う半導体装
置A2 の接続を行なうことが可能になり、半導体装置A
2 の相互の接続の信頼性を高めることができるものであ
る。ここで、封止樹脂17を設ける場合には、基板1に
設ける座ぐり凹部4の深さは、封止樹脂17を納める寸
法に形成されるものである。
As described above, a plurality of semiconductor devices ATwoLoading
Motherboard by integrating it into an integrated semiconductor device
18 to semiconductor device ATwoCan be mounted at high density
It becomes. The semiconductor device ATwoIn half
On the surface opposite to the surface on which the conductive element 7 is mounted,
Is formed with a plurality of semiconductors because the counterbore recess 4 is formed.
Device ATwoIs loaded, the adjacent semiconductor devices ATwosmell
And one of the semiconductor devices A TwoSemiconductor element 7 is the other semiconductor
Body device ATwoTo be placed in the counterbore recess 4 of the substrate 1
become. Therefore, the gap for accommodating the semiconductor element 7 is formed between the upper and lower substrates.
The substrate 1 can be directly bonded without the need to form
And a plurality of semiconductor devices ATwoCan also be loaded
And that the stacking volume can be reduced.
The substrate 1 is directly bonded to the semiconductor device.
Place ATwoOf the semiconductor device A
TwoCan increase the reliability of the interconnection between
You. Here, when the sealing resin 17 is provided,
The depth of the counterbore recess 4 to be provided is a dimension for accommodating the sealing resin 17.
It is formed by law.

【0022】図6は請求項5の半導体装置A3 の実施の
形態の一例を示すものであり、基板1の両面にそれぞれ
座ぐり加工を施して四角形の座ぐり凹部4a,4bを形
成し、基板1の片側の表面に回路6が形成してある。回
路6を形成した側の面において基板1に設けた座ぐり凹
部4aは、反対側の面において基板1に設けた座ぐり凹
部4bよりも小さい面積に形成してある。基板1のその
他の構成は、両面に座ぐり凹部4a,4bを設けた点を
除いて図4の半導体装置A2 の基板1とほぼ同じであ
る。
[0022] FIG. 6 shows an example of an embodiment of a semiconductor device A 3 according to claim 5, countersunk recess 4a of the square and 4b are formed by applying a respective pocket machining on both sides of the substrate 1, A circuit 6 is formed on one surface of the substrate 1. The counterbore recess 4a provided on the substrate 1 on the surface on which the circuit 6 is formed has a smaller area than the counterbore recess 4b provided on the substrate 1 on the opposite surface. Other configurations of the substrate 1 is substantially the same as the substrate 1 of the semiconductor device A 2 in FIG. 4 except that the counterbore recesses 4a, 4b are provided on both sides.

【0023】このものでは、半導体素子7は基板1の両
面に設けた座ぐり凹部4a,4bのうち、回路6を形成
した側に設けた座ぐり凹部4aに搭載されるものであ
る。半導体素子7としては表面の周縁部に電極パッド1
6を設けたエッジパッドの半導体素子7を用いるもので
ある。そして電極パッド16と基板1の表面の回路6の
インナーリード6aとの間に金線などのワイヤー8をボ
ンディングすることによって、半導体素子7と回路6と
を電気的に接続することができるものであり、さらに半
導体素子7とワイヤー8を封止樹脂17で封止すること
によって、半導体装置A3 を得ることができるものであ
る。
In this embodiment, the semiconductor element 7 is mounted in the counterbore recess 4a provided on the side where the circuit 6 is formed, of the counterbore recesses 4a and 4b provided on both surfaces of the substrate 1. As the semiconductor element 7, the electrode pad 1
The semiconductor device 7 of the edge pad provided with 6 is used. The semiconductor element 7 and the circuit 6 can be electrically connected by bonding a wire 8 such as a gold wire between the electrode pad 16 and the inner lead 6a of the circuit 6 on the surface of the substrate 1. There is one further semiconductor device 7 and the wire 8 by sealing with the sealing resin 17, it is possible to obtain a semiconductor device a 3.

【0024】上記のように作製される半導体装置A3
マザーボード18に実装して用いることができる。半導
体装置A3 をマザーボード18に実装するにあたって
は、図6に示すように、アウターリード3の側部電極3
aと下部電極3bをマザーボード18に設けた回路(図
示省略)に半田19で接続すると共に固定することによ
って、行なうことができる。
The semiconductor device A 3 which is prepared as described above can be used and mounted on the motherboard 18. When mounting the semiconductor device A 3 on the motherboard 18, as shown in FIG.
a and the lower electrode 3b are connected to a circuit (not shown) provided on the motherboard 18 by solder 19 and fixed.

【0025】図7は請求項6の集積半導体装置の実施の
形態の一例を示すものであり、上記のように作製した複
数の半導体装置A3 を積載するようにしてある。すなわ
ち、下の半導体装置A3 の基板1のアウターリード3の
上部電極3b上に、上の半導体装置A3 の基板1のアウ
ターリード3の下部電極3cを異方性導電接着剤などの
導電性材料9を介して重ね、上下の基板1を導電性材料
9で機械的に接合すると共に上下の基板1を電気的に接
続して、複数の半導体装置A3 を積載するようにしてあ
る。このように2個以上の複数の半導体装置A3 を積載
した集積半導体装置は、その下端の半導体装置A3 を図
6の場合と同様にマザーボード18に半田19付けする
ことによって、マザーボード18に実装することができ
るものである。
[0025] FIG. 7 shows an example of an embodiment of an integrated semiconductor device according to claim 6, are to be stacked a plurality of semiconductor devices A 3 prepared as described above. That is, on the upper electrode 3b of the outer leads 3 of the substrate 1 of the semiconductor device A 3 below, the conductivity of the lower electrode 3c of the outer leads 3 of the substrate 1 of the semiconductor device A 3 above such as anisotropic conductive adhesive Again through the material 9, the upper and lower substrates 1 with a conductive material 9 electrically connects the substrate 1 and below the well as mechanically bonding, are to be stacked a plurality of semiconductor devices a 3. Thus it is loaded with an integrated semiconductor device 2 or more the plurality of semiconductor devices A 3, by soldering 19 attached to the motherboard 18 as in FIG. 6 of the semiconductor device A 3 at the lower end, mounted on a mother board 18 Is what you can do.

【0026】上記のように複数の半導体装置A3 を積載
して集積半導体装置にすることによって、マザーボード
18に半導体装置A3 を高密度で実装することが可能に
なるものである。また半導体装置A3 にあって、半導体
素子7は基板1の片面の座ぐり凹部4aに納められてお
り、しかも基板1の他の片面にも座ぐり凹部4aが形成
されているために、複数の半導体装置A3 を積載するに
あたって、半導体素子7を納める隙間を上下の基板1間
に形成させる必要がなく、また一方の半導体装置A3
半導体素子7を封止する封止樹脂17は、他方の半導体
装置A3 の基板1の座ぐり凹部4b内に納められる。従
って、基板1を直接接合するようにして複数の半導体装
置A3 を積載することができるものであり、積み重ねの
嵩を低くすることができると共に、基板1を直接接合す
ることによって隣合う半導体装置A3 の接続を行なうこ
とが可能になり、半導体装置A3 の相互の接続の信頼性
を高めることができるものである。
As described above, by stacking a plurality of semiconductor devices A 3 to form an integrated semiconductor device, it becomes possible to mount the semiconductor devices A 3 on the motherboard 18 at high density. Also in the semiconductor device A 3, the semiconductor device 7 is housed in the counterbore recess 4a of one side of the substrate 1, moreover to counterbore recess 4a to other side of the substrate 1 are formed a plurality in carrying stacked semiconductor device a 3, the sealing resin 17 for sealing is not necessary to form between the substrates 1 of the upper and lower gaps, also the semiconductor element 7 of one of the semiconductor devices a 3 to pay semiconductor element 7, is accommodated in the other of the substrate 1 of the semiconductor device a 3 countersunk recess 4b. Therefore, so as to bond the substrate 1 directly are those capable of stacking a plurality of semiconductor devices A 3, the semiconductor device adjacent by it is possible to reduce the bulk of the stack, bonding the substrate 1 directly it is possible to perform the connection of a 3, it is capable of enhancing the reliability of the interconnections of the semiconductor device a 3.

【0027】ここで、基板1の座ぐり凹部4bは、座ぐ
り凹部4aに搭載した半導体素子7を封止した封止樹脂
17を納める必要があるので、座ぐり凹部4bは座ぐり
凹部4aよりも大きな面積で形成してある。また基板1
に設ける座ぐり凹部4a,4bの深さは、半導体素子7
や封止樹脂17を納める寸法に形成されるものである。
Here, the counterbore recess 4b of the substrate 1 needs to contain the sealing resin 17 for sealing the semiconductor element 7 mounted on the counterbore recess 4a. Are formed with a large area. Substrate 1
The depth of the counterbore recesses 4a and 4b provided in the semiconductor element 7
And a size for accommodating the sealing resin 17.

【0028】図8は請求項7の集積半導体装置の実施の
形態の一例を示すものであり、上記のように作製した半
導体装置A1 と、半導体装置A2 と、半導体装置A3
うち2種類以上の半導体装置A1 ,A2 ,A3 を複数個
積載するようにしてある。隣合う半導体装置A1
2 ,A3 の接合は、図3や図5や図7の場合と同様に
して行なうことができ、またマザーボード18への集積
半導体装置の実装も図3や図5や図7の場合と同様にし
て行なうことができる。このように、半導体装置A 1
2 ,A3 を組み合わせて積載することによって、セン
ターパッドの半導体素子7やエッジパッドの半導体素子
7を組み合わせて用いることができ、半導体素子7の実
装の自由度が高くなるものである。
FIG. 8 shows an embodiment of the integrated semiconductor device according to claim 7.
It shows an example of the form, and the half produced as above
Conductor device A1And the semiconductor device ATwoAnd the semiconductor device AThreeof
At least two types of semiconductor devices A1, ATwo, AThreeMultiple
It is designed to be loaded. Adjacent semiconductor device A1,
ATwo, AThreeBonding is performed in the same manner as in FIGS. 3, 5, and 7.
And integration on motherboard 18
The mounting of the semiconductor device is performed in the same manner as in FIGS. 3, 5, and 7.
Can be done. Thus, the semiconductor device A 1,
ATwo, AThreeBy combining and loading
Semiconductor element 7 of the touch pad and the semiconductor element of the edge pad
7 can be used in combination.
This increases the degree of freedom of dressing.

【0029】図8の例では、半導体装置A1 と半導体装
置A2 を組み合わせて集積半導体装置を形成している
が、半導体装置A1 と半導体装置A3 の組み合わせ、半
導体装置A2 と半導体装置A3 の組み合わせ、半導体装
置A1 と半導体装置A2 と半導体装置A3 の組み合わせ
で集積半導体装置を形成することもできる。さらにこれ
らに図9のような従来から使用されている半導体装置A
を組み合わせることもできるものである。
In the example of FIG. 8, the semiconductor device A 1 and the semiconductor device A 2 are combined to form an integrated semiconductor device. However, the combination of the semiconductor device A 1 and the semiconductor device A 3 , and the semiconductor device A 2 and the semiconductor device A 3 the combination of a 3, it is also possible to form an integrated semiconductor device in combination of the semiconductor device a 1 and the semiconductor device a 2 and the semiconductor device a 3. Further, a semiconductor device A conventionally used as shown in FIG.
Can be combined.

【0030】[0030]

【発明の効果】上記のように本発明の請求項1に係る半
導体装置は、スルーホールを略半分に切断する箇所で裁
断することによって基板の側端面に断面略半円形の複数
の凹部を設けると共にこの凹部にアウターリードを形成
し、基板の片側面に座ぐり凹部を形成すると共にこの座
ぐり凹部の箇所において基板の両面に開口する開口部を
設け、座ぐり凹部を設けた面と反対側の面において基板
の表面にアウターリードと接続される回路を形成し、座
ぐり凹部に半導体素子を搭載すると共に開口部を通して
半導体素子と回路との間にワイヤーをボンディングした
ので、基板の座ぐり凹部内に搭載されている半導体素子
は基板の表面から突出することがなく、半導体素子を納
める隙間を基板間に形成させる必要なく、基板を直接接
合して複数の半導体装置を積載することができるもので
あり、基板に設けたアウターリード同士の接続で積載し
た半導体装置を電気的に接続することができるものであ
って、半導体装置の相互の接続の信頼性を高めた請求項
2のような集積半導体装置を得ることができるものであ
る。また、半導体素子を座ぐり凹所に搭載すると半導体
素子の中央部を開口部内に露出させるようにすることが
でき、センターパッドの半導体素子を用いて半導体素子
と回路とをワイヤーボンディングすることが可能になる
ものである。
As described above, in the semiconductor device according to the first aspect of the present invention, a plurality of recesses having a substantially semicircular cross section are provided on the side end surface of the substrate by cutting the through hole at a position where the through hole is cut into substantially half. Also, outer leads are formed in the recesses, counterbore recesses are formed on one side of the substrate, and openings are provided on both sides of the substrate at the locations of the counterbore recesses, and the opposite side to the surface on which the counterbore recesses are provided. A circuit to be connected to the outer lead was formed on the surface of the substrate on the surface of the substrate, the semiconductor element was mounted in the counterbore recess, and a wire was bonded between the semiconductor element and the circuit through the opening. The semiconductor element mounted inside does not protrude from the surface of the substrate, and there is no need to form a gap between the substrates to accommodate the semiconductor element. The device can be mounted, and the mounted semiconductor devices can be electrically connected by connecting the outer leads provided on the substrate, and the reliability of the mutual connection of the semiconductor devices is improved. An integrated semiconductor device as claimed in claim 2 can be obtained. In addition, when the semiconductor element is mounted in the counterbore, the center of the semiconductor element can be exposed in the opening, and the semiconductor element and the circuit can be wire-bonded using the semiconductor element in the center pad. It becomes something.

【0031】また本発明の請求項3に係る半導体装置
は、スルーホールを略半分に切断する箇所で裁断するこ
とによって基板の側端面に断面略半円形の凹部を設ける
と共にこの凹部にアウターリードを形成し、基板の片側
面に座ぐり凹部を形成し、基板の表面にアウターリード
と接続される回路を形成し、座ぐり凹部を形成した面と
反対側の面に半導体素子を搭載すると共に半導体素子と
回路とを接続したので、複数の半導体装置を積載するに
あたって、隣合う半導体装置の一方の半導体装置の半導
体素子は他方の半導体装置の基板の座ぐり凹部内に納め
られ、半導体素子を納める隙間を基板間に形成させる必
要なく、基板を直接接合して複数の半導体装置を積載す
ることができるものであり、基板に設けたアウターリー
ド同士の接続で積載した半導体装置を電気的に接続する
ことができるものであって、半導体装置の相互の接続の
信頼性を高めた請求項4のような集積半導体装置を得る
ことができるものである。
In the semiconductor device according to a third aspect of the present invention, the through hole is cut at a location where the through hole is cut in substantially half, so that a recess having a substantially semicircular cross section is provided on the side end surface of the substrate, and the outer lead is provided in the recess. Forming, forming a counterbore on one side of the substrate, forming a circuit connected to the outer lead on the surface of the substrate, mounting the semiconductor element on the surface opposite to the surface on which the counterbore is formed, and mounting the semiconductor. Since the element and the circuit are connected, when loading a plurality of semiconductor devices, the semiconductor element of one of the adjacent semiconductor devices is placed in the counterbore recess of the substrate of the other semiconductor device, and the semiconductor element is placed. A plurality of semiconductor devices can be stacked by directly bonding the substrates without the need to form a gap between the substrates, and the semiconductor devices can be stacked by connecting the outer leads provided on the substrates. And it is one capable of electrically connecting a semiconductor device, in which it is possible to obtain an integrated semiconductor device as according to claim 4 that increases the reliability of mutual connection of the semiconductor device.

【0032】また本発明の請求項5に係る半導体装置
は、スルーホールを略半分に切断する箇所で裁断するこ
とによって基板の側端面に断面略半円形の凹部を設ける
と共にこの凹部にアウターリードを形成し、基板の両面
にそれぞれ座ぐり凹部を形成し、基板の表面にアウター
リードと接続される回路を形成し、基板の両面のいずれ
か一方の座ぐり凹部に半導体素子を搭載すると共に半導
体素子と回路とを接続したので、半導体素子を基板の座
ぐり凹部に納めた状態で複数の半導体装置を積載するこ
とができ、半導体素子を納める隙間を基板間に形成させ
る必要なく、基板を直接接合して複数の半導体装置を積
載することができるものであり、基板に設けたアウター
リード同士の接続で積載した半導体装置を電気的に接続
することができるものであって、半導体装置の相互の接
続の信頼性を高めた請求項6のような集積半導体装置を
得ることができるものである。
In a semiconductor device according to a fifth aspect of the present invention, a through-hole is cut at a location where the through-hole is cut in half so that a recess having a substantially semicircular cross section is provided on the side end surface of the substrate, and an outer lead is provided in the recess. Forming, forming counterbore recesses on both sides of the substrate, forming a circuit connected to outer leads on the surface of the substrate, mounting the semiconductor element in one of the counterbore recesses on both sides of the substrate, and mounting the semiconductor element And the circuit are connected, so that multiple semiconductor devices can be stacked with the semiconductor element housed in the counterbore recess of the substrate, and there is no need to form a gap between the substrates to accommodate the semiconductor element, and the substrates are directly joined. A plurality of semiconductor devices can be stacked in this manner, and the stacked semiconductor devices can be electrically connected by connecting outer leads provided on the substrate. A is one in which it is possible to obtain an integrated semiconductor device as according to claim 6 that increases the reliability of mutual connection of the semiconductor device.

【0033】また本発明の請求項7に係る集積半導体装
置は、基板を積み重ねることによって、請求項1の半導
体装置と、請求項3の半導体装置と、請求項5の半導体
装置のうち2種類以上の半導体装置を複数個積載するよ
うにしたので、各半導体装置は、半導体素子を納める隙
間を基板間に形成させる必要なく基板を直接接合して積
載することができるものであり、基板に設けたアウター
リード同士の接続で積載した半導体装置を電気的に接続
することができるものであって、半導体装置の相互の接
続の信頼性を高めた集積半導体装置を得ることができる
ものである。
According to a seventh aspect of the present invention, there is provided an integrated semiconductor device comprising two or more types of the semiconductor device according to the first aspect, the third aspect, and the fifth aspect by stacking substrates. Since a plurality of semiconductor devices are stacked, each semiconductor device can be directly bonded and stacked without needing to form a gap for accommodating a semiconductor element between the substrates. It is possible to electrically connect the stacked semiconductor devices by connecting the outer leads, and to obtain an integrated semiconductor device in which the reliability of the mutual connection of the semiconductor devices is improved.

【0034】また本発明の請求項8に係る集積半導体装
置は、導電性材料を介して基板を積み重ねることによっ
て、積載した半導体装置を接合すると共に電気的に接続
するようにしたので、導電性材料によって基板の接合と
電気的接続を同時に行なうことができ、集積半導体装置
の組み立てが容易になると共に集積半導体装置の嵩を低
く形成することができるものである。
In the integrated semiconductor device according to claim 8 of the present invention, the stacked semiconductor devices are joined and electrically connected by stacking the substrates via the conductive material. Thereby, the bonding and the electrical connection of the substrate can be performed at the same time, so that the assembly of the integrated semiconductor device is facilitated and the bulk of the integrated semiconductor device can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】請求項1の発明の実施の形態の一例を示す断面
図である。
FIG. 1 is a sectional view showing an example of an embodiment of the present invention.

【図2】同上の基板の一部の斜視図である。FIG. 2 is a perspective view of a part of the above substrate.

【図3】請求項2の発明の実施の形態の一例を示す断面
図である。
FIG. 3 is a sectional view showing an example of the embodiment of the invention according to claim 2;

【図4】請求項3の発明の実施の形態の一例を示す断面
図である。
FIG. 4 is a sectional view showing an example of the embodiment of the third invention.

【図5】請求項4の発明の実施の形態の一例を示す断面
図である。
FIG. 5 is a sectional view showing an example of the embodiment of the invention according to claim 4;

【図6】請求項5の発明の実施の形態の一例を示す断面
図である。
FIG. 6 is a sectional view showing an example of the embodiment of the invention of claim 5;

【図7】請求項6の発明の実施の形態の一例を示す断面
図である。
FIG. 7 is a sectional view showing an example of the embodiment of the invention according to claim 6;

【図8】請求項7の発明の実施の形態の一例を示す断面
図である。
FIG. 8 is a sectional view showing an example of the embodiment of the invention according to claim 7;

【図9】従来例の断面図である。FIG. 9 is a sectional view of a conventional example.

【符号の説明】[Explanation of symbols]

1 基板 2 凹部 3 アウターリード 4 座ぐり凹部 4a 座ぐり凹部 4b 座ぐり凹部 5 開口部 6 回路 7 半導体素子 8 ワイヤー 9 導電性材料 A1 半導体装置 A2 半導体装置 A3 半導体装置DESCRIPTION OF SYMBOLS 1 Substrate 2 Depression 3 Outer lead 4 Counterbore 4a Counterbore 4b Counterbore 5 Opening 6 Circuit 7 Semiconductor element 8 Wire 9 Conductive material A 1 Semiconductor device A 2 Semiconductor device A 3 Semiconductor device

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 スルーホールを略半分に切断する箇所で
裁断することによって基板の側端面に断面略半円形の複
数の凹部を設けると共にこの凹部にアウターリードを形
成し、基板の片側面に座ぐり凹部を形成すると共にこの
座ぐり凹部の箇所において基板の両面に開口する開口部
を設け、座ぐり凹部を設けた面と反対側の面において基
板の表面にアウターリードと接続される回路を形成し、
座ぐり凹部に半導体素子を搭載すると共に開口部を通し
て半導体素子と回路との間にワイヤーをボンディングし
て成ることを特徴とする半導体装置。
1. A plurality of recesses having a substantially semicircular cross section are formed in a side end surface of a substrate by cutting a through hole at a position where the through hole is cut into substantially half, and outer leads are formed in the recesses. A counterbore is formed, and an opening is formed on both sides of the substrate at the location of the counterbore. A circuit is formed on the surface of the substrate opposite to the side where the counterbore is provided, and the circuit is connected to the outer lead. And
A semiconductor device comprising a semiconductor element mounted in a spot facing recess and a wire bonded between the semiconductor element and a circuit through the opening.
【請求項2】 基板を積み重ねることによって、請求項
1に記載の半導体装置を複数個積載して成ることを特徴
とする集積半導体装置。
2. An integrated semiconductor device comprising a plurality of semiconductor devices according to claim 1, stacked on a substrate.
【請求項3】 スルーホールを略半分に切断する箇所で
裁断することによって基板の側端面に断面略半円形の凹
部を設けると共にこの凹部にアウターリードを形成し、
基板の片側面に座ぐり凹部を形成し、基板の表面にアウ
ターリードと接続される回路を形成し、座ぐり凹部を形
成した面と反対側の面に半導体素子を搭載すると共に半
導体素子と回路とを接続して成ることを特徴とする半導
体装置。
3. A through-hole is cut at a location where the through-hole is cut in half, thereby forming a recess having a substantially semicircular cross section on the side end surface of the substrate and forming an outer lead in the recess.
A counterbore is formed on one side of the substrate, a circuit connected to the outer lead is formed on the surface of the substrate, and a semiconductor element is mounted on a surface opposite to the surface on which the counterbore is formed, and the semiconductor element and the circuit are mounted. And a semiconductor device.
【請求項4】 基板を積み重ねることによって、請求項
3に記載の半導体装置を複数個積載して成ることを特徴
とする集積半導体装置。
4. An integrated semiconductor device comprising a plurality of semiconductor devices according to claim 3, stacked on a substrate.
【請求項5】 スルーホールを略半分に切断する箇所で
裁断することによって基板の側端面に断面略半円形の凹
部を設けると共にこの凹部にアウターリードを形成し、
基板の両面にそれぞれ座ぐり凹部を形成し、基板の表面
にアウターリードと接続される回路を形成し、基板の両
面のいずれか一方の座ぐり凹部に半導体素子を搭載する
と共に半導体素子と回路とを接続して成ることを特徴と
する半導体装置。
5. A recess having a substantially semicircular cross section is formed on a side end surface of the substrate by cutting the through hole at a position where the through hole is cut in substantially half, and an outer lead is formed in the recess.
A counterbore recess is formed on each side of the substrate, a circuit connected to the outer lead is formed on the surface of the substrate, and a semiconductor element is mounted on one of the counterbore recesses on both sides of the substrate, and the semiconductor element and the circuit are mounted. A semiconductor device, comprising:
【請求項6】 基板を積み重ねることによって、請求項
5に記載の半導体装置を複数個積載して成ることを特徴
とする集積半導体装置。
6. An integrated semiconductor device comprising a plurality of semiconductor devices according to claim 5, stacked on a substrate.
【請求項7】 基板を積み重ねることによって、請求項
1に記載の半導体装置と、請求項3に記載の半導体装置
と、請求項5に記載の半導体装置のうち2種類以上の半
導体装置を複数個積載して成ることを特徴とする集積半
導体装置。
7. A semiconductor device according to claim 1, a semiconductor device according to claim 3, and a plurality of semiconductor devices of at least two types among the semiconductor devices according to claim 5 by stacking substrates. An integrated semiconductor device characterized by being loaded.
【請求項8】 導電性材料を介して基板を積み重ねるこ
とによって、積載した半導体装置を接合すると共に電気
的に接続して成ることを特徴とする請求項2、請求項
4、請求項6、請求項7のいずれかに記載の集積半導体
装置。
8. The semiconductor device according to claim 2, wherein the stacked semiconductor devices are joined and electrically connected by stacking the substrates via a conductive material. Item 8. The integrated semiconductor device according to any one of Items 7.
JP9157189A 1997-06-13 1997-06-13 Semiconductor device and integrated semiconductor device Withdrawn JPH118331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9157189A JPH118331A (en) 1997-06-13 1997-06-13 Semiconductor device and integrated semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9157189A JPH118331A (en) 1997-06-13 1997-06-13 Semiconductor device and integrated semiconductor device

Publications (1)

Publication Number Publication Date
JPH118331A true JPH118331A (en) 1999-01-12

Family

ID=15644155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9157189A Withdrawn JPH118331A (en) 1997-06-13 1997-06-13 Semiconductor device and integrated semiconductor device

Country Status (1)

Country Link
JP (1) JPH118331A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002007220A1 (en) * 2000-07-19 2002-01-24 Shindo Company, Ltd. Semiconductor device
JP2012094738A (en) * 2010-10-28 2012-05-17 Denso Corp Electronic device and method of manufacturing the same
CN107564877A (en) * 2016-06-30 2018-01-09 华邦电子股份有限公司 Semiconductor component packing body and semiconductor component packing processing procedure
CN107665876A (en) * 2016-07-27 2018-02-06 华邦电子股份有限公司 Packaging body substrate, its manufacture method and packaging body

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002007220A1 (en) * 2000-07-19 2002-01-24 Shindo Company, Ltd. Semiconductor device
US6953991B2 (en) 2000-07-19 2005-10-11 Shindo Company, Ltd. Semiconductor device
CN100401517C (en) * 2000-07-19 2008-07-09 新藤电子工业株式会社 Semiconductor device
JP2012094738A (en) * 2010-10-28 2012-05-17 Denso Corp Electronic device and method of manufacturing the same
CN107564877A (en) * 2016-06-30 2018-01-09 华邦电子股份有限公司 Semiconductor component packing body and semiconductor component packing processing procedure
CN107665876A (en) * 2016-07-27 2018-02-06 华邦电子股份有限公司 Packaging body substrate, its manufacture method and packaging body

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