JPH1180314A - Photosetting resin composition - Google Patents

Photosetting resin composition

Info

Publication number
JPH1180314A
JPH1180314A JP23604297A JP23604297A JPH1180314A JP H1180314 A JPH1180314 A JP H1180314A JP 23604297 A JP23604297 A JP 23604297A JP 23604297 A JP23604297 A JP 23604297A JP H1180314 A JPH1180314 A JP H1180314A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
weight
parts
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23604297A
Other languages
Japanese (ja)
Other versions
JP3435316B2 (en
Inventor
Shuji Hayase
修二 早瀬
Rikako Kani
利佳子 可児
Yoshihiko Nakano
義彦 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP23604297A priority Critical patent/JP3435316B2/en
Publication of JPH1180314A publication Critical patent/JPH1180314A/en
Application granted granted Critical
Publication of JP3435316B2 publication Critical patent/JP3435316B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a photosetting resin composition curable even in a thick form using light having longer wavelength compared with conventional resin composition and giving a cured product having excellent adhesivity by including an epoxy resin, a specific silicon compound and an onium salt. SOLUTION: This composition contains (A) an epoxy resin (bisphenol A epoxy resin, etc.), (B) a silicon compound having Si-Si bond [containing the recurring unit expressed by the formula I (R is H, an alkyl or an aryl), e.g. a polysilane expressed by the formula II ((n) is >=10)] and (C) an onium salt selected from sulfonium salts expressed by the formula III, iodonium salts expressed by the formula IV and diazonium salts expressed by the formula Ar-N2 <+> X<-> (Ar is an alkyl or an ary; X is a component exhibiting acidity by photodecomposition and is a halide or sulfolate of B, P, Sb or As).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は光硬化性樹脂組成物
に関する。
[0001] The present invention relates to a photocurable resin composition.

【0002】[0002]

【従来の技術】近年、省エネルギーや作業性が優れてい
るなどの理由で、光硬化性の樹脂組成物に関心が持たれ
ている。従来、一般的にはアクリル樹脂を含有する光硬
化性樹脂組成物が用いられている。しかし、アクリル樹
脂は、耐熱性および耐湿性が十分でないという問題を有
する。
2. Description of the Related Art In recent years, there has been an interest in photocurable resin compositions because of their excellent energy saving and workability. Conventionally, a photocurable resin composition containing an acrylic resin has been generally used. However, acrylic resins have a problem that heat resistance and moisture resistance are not sufficient.

【0003】このため、耐熱性、機械的特性、耐湿性に
優れたエポキシ樹脂を含有する光硬化性樹脂組成物が検
討されている。この場合、エポキシ樹脂自体は光反応を
起こさないので、光硬化性を与えるために下記のような
方法が用いられている。
For this reason, photocurable resin compositions containing epoxy resins having excellent heat resistance, mechanical properties and moisture resistance have been studied. In this case, since the epoxy resin itself does not cause a photoreaction, the following method is used to provide photocurability.

【0004】(1)エポキシ樹脂を、光官能性基たとえ
ばアクリル基で変性する。しかし、エポキシ樹脂を変性
すると、エポキシ樹脂本来の性能が失われるという欠点
がある。
(1) An epoxy resin is modified with a photofunctional group such as an acrylic group. However, when the epoxy resin is modified, there is a disadvantage that the original performance of the epoxy resin is lost.

【0005】(2)エポキシ樹脂に、光分解により酸を
発生するオニウム塩(たとえばスルホニウム塩、ヨード
ニウム塩またはジアゾニウム塩)を添加する。しかし、
これらのオニウム塩は300nm以下に吸収を持ち、光
源として通常用いられる水銀ランプの輝線のうち最も強
い365nmの光を有効に吸収できない。また、オニウ
ム塩は254nmの光で分解することができるが、エポ
キシ樹脂自体のベンゼン環に由来する吸収も300nm
以下に存在するため、エポキシ樹脂に添加されたオニウ
ム塩を有効に分解することは困難である。さらに、この
ようなエポキシ樹脂組成物を透明基板の接着に使用する
場合にも、透明基板自体が300nm以下に吸収を持っ
ていることが多いため、光硬化によって十分な接着力を
得ることは困難である。なお、アントラセンやペリレン
などの芳香族化合物は増感剤として作用することが報告
されているが、オニウム塩の光分解を促進する効果は不
十分である。
(2) An onium salt (for example, a sulfonium salt, an iodonium salt or a diazonium salt) which generates an acid by photolysis is added to an epoxy resin. But,
These onium salts have an absorption below 300 nm and cannot effectively absorb the strongest light of 365 nm among the bright lines of a mercury lamp usually used as a light source. The onium salt can be decomposed by 254 nm light, but the absorption derived from the benzene ring of the epoxy resin itself is also 300 nm.
Due to the following, it is difficult to effectively decompose the onium salt added to the epoxy resin. Furthermore, even when such an epoxy resin composition is used for bonding a transparent substrate, it is difficult to obtain sufficient adhesive strength by photocuring because the transparent substrate itself often has an absorption of 300 nm or less. It is. It has been reported that aromatic compounds such as anthracene and perylene act as sensitizers, but the effect of promoting photodecomposition of onium salts is insufficient.

【0006】[0006]

【発明が解決しようとする課題】本発明の目的は、従来
よりも長波長の光を用いて厚膜でも光硬化することがで
き、しかも接着性に優れた硬化物を与える光硬化性樹脂
組成物を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a photocurable resin composition which can be photocured even with a thick film using light having a longer wavelength than conventional ones, and which gives a cured product having excellent adhesion. To provide things.

【0007】[0007]

【課題を解決するための手段】本発明の光硬化性樹脂組
成物は、(a)エポキシ樹脂、(b)Si−Si結合を
有するケイ素化合物、および(c)オニウム塩を含有す
るものである。
The photocurable resin composition of the present invention comprises (a) an epoxy resin, (b) a silicon compound having a Si--Si bond, and (c) an onium salt. .

【0008】[0008]

【発明の実施の形態】以下、本発明をさらに詳細に説明
する。本発明の光硬化性樹脂組成物の主成分((a)成
分)であるエポキシ樹脂は特に限定されない。例えば、
ビスフェノールA型エポキシ樹脂、ビスフェノールF型
エポキシ樹脂、フェノールノボラック型エポキシ樹脂、
脂環式エポキシ樹脂、トリグリシジルイソシアネートや
ヒダントインエポキシのような含複素環エポキシ樹脂、
水添ビスフェノールA型エポキシ樹脂、プロピレングリ
コール−ジグリシジルエーテルやペンタエリスリトール
−ポリグリシジルエーテルなどの脂肪族系エポキシ樹
脂、芳香族、脂肪族もしくは脂環式のカルボン酸とエピ
クロルヒドリンとの反応によって得られるエポキシ樹
脂、スピロ環含有エポキシ樹脂、オルソ−アリルフェノ
ールノボラック化合物とエピクロルヒドリンとの反応生
成物であるジグリシジルエーテル型エポキシ樹脂、ビス
フェノールAのそれぞれの水酸基のオルソ位にアリル基
を有するジアリルビスフェノール化合物とエピクロルヒ
ドリンとの反応生成物であるグリシジルエーテル型エポ
キシ樹脂などを用いることができる。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail. The epoxy resin that is the main component (component (a)) of the photocurable resin composition of the present invention is not particularly limited. For example,
Bisphenol A epoxy resin, bisphenol F epoxy resin, phenol novolak epoxy resin,
Alicyclic epoxy resin, heterocyclic epoxy resin such as triglycidyl isocyanate and hydantoin epoxy,
Hydrogenated bisphenol A type epoxy resin, aliphatic epoxy resin such as propylene glycol-diglycidyl ether and pentaerythritol-polyglycidyl ether, epoxy obtained by reacting aromatic, aliphatic or alicyclic carboxylic acid with epichlorohydrin Resin, a spiro ring-containing epoxy resin, a diglycidyl ether type epoxy resin which is a reaction product of an ortho-allylphenol novolak compound and epichlorohydrin, a diallyl bisphenol compound having an allyl group at the ortho position of each hydroxyl group of bisphenol A and epichlorohydrin, and A glycidyl ether type epoxy resin which is a reaction product of the above can be used.

【0009】本発明において、(b)成分のSi−Si
結合を有するケイ素化合物としては、たとえば下記一般
式(I)で表される繰り返し単位を有するポリシランが
挙げられる。
In the present invention, the component (b) Si—Si
Examples of the silicon compound having a bond include a polysilane having a repeating unit represented by the following general formula (I).

【0010】[0010]

【化1】 (ただし、Rは水素または置換もしくは非置換のアルキ
ル基もしくはアリール基を示し、同一でも異なっていて
もよい。アルキル基またはアリール基は酸素、窒素、イ
オウ、ハロゲンなどの元素を含んでいてもよい。) 一般式(I)に含まれるポリシランの具体例を以下に示
す。なお、各化学式におけるnおよびmは10以上の整
数である。ただし、n+mが10000を超えると溶解
性が悪くなるため、n+mは10000以下であること
が好ましい。
Embedded image (However, R represents hydrogen or a substituted or unsubstituted alkyl group or aryl group, which may be the same or different. The alkyl group or aryl group may contain an element such as oxygen, nitrogen, sulfur, and halogen. .) Specific examples of the polysilane contained in the general formula (I) are shown below. Note that n and m in each chemical formula are integers of 10 or more. However, if n + m exceeds 10,000, the solubility deteriorates. Therefore, n + m is preferably 10,000 or less.

【0011】[0011]

【化2】 Embedded image

【0012】[0012]

【化3】 Embedded image

【0013】[0013]

【化4】 Embedded image

【0014】[0014]

【化5】 Embedded image

【0015】[0015]

【化6】 Embedded image

【0016】本発明において、(c)成分のオニウム塩
は、下記一般式(IIA)で表されるスルホニウム塩、
(IIB)で表されるヨードニウム塩、および(IIC)で
表されるジアゾニウム塩からなる群より選択される。
In the present invention, the onium salt of the component (c) is a sulfonium salt represented by the following general formula (IIA):
It is selected from the group consisting of an iodonium salt represented by (IIB) and a diazonium salt represented by (IIC).

【0017】[0017]

【化7】 (ただし、Arは置換または非置換のアルキル基または
アリール基を示し、同一でも異なっていてもよい。アル
キル基またはアリール基は酸素、窒素、イオウ、ハロゲ
ンなどの元素を含んでいてもよい。Xは光分解により酸
性を示す成分であり、B、P、SbまたはAsのハロゲ
ン化物またはスルホレートを示す。) オニウム塩の具体例を以下に示す。
Embedded image (However, Ar represents a substituted or unsubstituted alkyl group or aryl group, which may be the same or different. The alkyl group or the aryl group may contain an element such as oxygen, nitrogen, sulfur, and halogen. X Is a component showing acidity by photolysis, and represents a halide or sulfolate of B, P, Sb or As.) Specific examples of onium salts are shown below.

【0018】[0018]

【化8】 Embedded image

【0019】[0019]

【化9】 Embedded image

【0020】[0020]

【化10】 Embedded image

【0021】[0021]

【化11】 Embedded image

【0022】本発明の光硬化性樹脂組成物に含まれる成
分は以下のような作用を示す。(b)成分のケイ素化合
物は300〜400nmに吸収を示し、水銀ランプの輝
線のうち最も強い365nmの光を有効に吸収して励起
する。励起したケイ素化合物は光励起電子移動によって
(c)成分のオニウム塩の分解を促進する。オニウム塩
の分解により生じた酸はエポキシ樹脂の硬化触媒として
作用する。したがって、本発明の光硬化性樹脂組成物は
従来よりも長波長の光を用いて厚膜でも光硬化すること
ができる。しかも、光硬化により得られる硬化物は機械
的特性に優れている。なお、本発明の樹脂組成物は光硬
化後に加熱硬化してもよい。
The components contained in the photocurable resin composition of the present invention have the following effects. The silicon compound (b) absorbs at 300 to 400 nm, and effectively absorbs and excites the strongest light of 365 nm among the emission lines of a mercury lamp. The excited silicon compound accelerates the decomposition of the onium salt of the component (c) by photoexcited electron transfer. The acid generated by the decomposition of the onium salt acts as a curing catalyst for the epoxy resin. Therefore, the photocurable resin composition of the present invention can be photocured even with a thick film using light having a longer wavelength than before. In addition, the cured product obtained by light curing has excellent mechanical properties. Incidentally, the resin composition of the present invention may be cured by heating after photocuring.

【0023】(b)成分のケイ素化合物はエポキシ樹脂
100重量部に対して0.001〜50重量部、さらに
0.1〜5重量部の範囲で用いることが好ましい。0.
001重量部未満ではエポキシ樹脂の光硬化が不十分と
なる。50重量部を超えると硬化物の機械的強度が低下
するという問題が生じる。
The silicon compound (b) is preferably used in an amount of 0.001 to 50 parts by weight, more preferably 0.1 to 5 parts by weight, based on 100 parts by weight of the epoxy resin. 0.
If the amount is less than 001 parts by weight, photocuring of the epoxy resin becomes insufficient. If the amount exceeds 50 parts by weight, there arises a problem that the mechanical strength of the cured product decreases.

【0024】(c)成分のオニウム塩はエポキシ樹脂1
00重量部に対して0.001〜20重量部、さらに
0.1〜5重量部の範囲で用いることが好ましい。0.
001重量部未満ではエポキシ樹脂の光硬化が不十分と
なる。20重量部を超えると硬化物の機械的強度の低下
や着色の問題が生じる。
The onium salt of the component (c) is an epoxy resin 1
It is preferably used in the range of 0.001 to 20 parts by weight, more preferably 0.1 to 5 parts by weight, based on 00 parts by weight. 0.
If the amount is less than 001 parts by weight, photocuring of the epoxy resin becomes insufficient. If the amount exceeds 20 parts by weight, problems such as a decrease in mechanical strength and coloring of the cured product occur.

【0025】本発明の光硬化性樹脂組成物には、特性を
改質するために他の有機成分を添加してもよい。また、
目的に応じて、ラクトン、環状イミン、環状イミドなど
のカチオン重合性置換基を有する化合物、またはアクリ
ル、メタクリル、ビニル基などの重合性不飽和基を有す
る化合物を添加してもよい。さらに、光硬化性樹脂組成
物は、シリカなどの無機充填剤と混合して使用していて
もよい。
The photocurable resin composition of the present invention may contain other organic components for improving properties. Also,
Depending on the purpose, a compound having a cationic polymerizable substituent such as lactone, cyclic imine, or cyclic imide, or a compound having a polymerizable unsaturated group such as acryl, methacryl, or vinyl group may be added. Further, the photocurable resin composition may be used by being mixed with an inorganic filler such as silica.

【0026】[0026]

【実施例】【Example】

実施例1 エピコート828(シェル化学社製、エピビスタイプエ
ポキシ樹脂)100重量部、ポリシラン[1−34]3
重量部、およびスルホニウム塩[2−3]2重量部を混
合して樹脂組成物を調製し、これをガラス基板上にバー
コーターで塗布し厚さ200μmの膜を形成した。この
膜の上方5cmの位置に500Wの高圧水銀ランプを設
置し、紫外線を照射して光硬化した。この場合、30秒
で硬化膜を得ることができた。
Example 1 100 parts by weight of Epicoat 828 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.), polysilane [1-34] 3
A resin composition was prepared by mixing parts by weight and 2 parts by weight of a sulfonium salt [2-3], and this was coated on a glass substrate by a bar coater to form a 200 μm thick film. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays. In this case, a cured film could be obtained in 30 seconds.

【0027】また、ホウケイ酸クラウンガラスBK7
(ショット社製)上に、上記の樹脂組成物を塗布し、1
00μmのスペーサーを介して別のホウケイ酸クラウン
ガラスで挟んだ。これに高圧水銀ランプから紫外線を1
分間照射した。その結果、十分な接着力で2枚のガラス
を接着することができた。
Further, borosilicate crown glass BK7
(Manufactured by Shot Co., Ltd.) and applying the above resin composition
It was sandwiched between another borosilicate crown glass via a 00 μm spacer. UV light from a high-pressure mercury lamp
Irradiated for minutes. As a result, the two glasses could be bonded with a sufficient bonding strength.

【0028】比較例1 エピコート828(シェル化学社製、エピビスタイプエ
ポキシ樹脂)100重量部、およびスルホニウム塩[2
−3]2重量部を混合して樹脂組成物を調製し、これを
ガラス基板上にバーコーターで塗布し厚さ200μmの
膜を形成した。この膜の上方5cmの位置に500Wの
高圧水銀ランプを設置し、紫外線を照射して光硬化し
た。この場合、硬化膜を得るには180秒を要した。
Comparative Example 1 100 parts by weight of Epikote 828 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.) and a sulfonium salt [2
-3] 2 parts by weight were mixed to prepare a resin composition, which was applied on a glass substrate with a bar coater to form a 200 μm thick film. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays. In this case, it took 180 seconds to obtain a cured film.

【0029】また、ホウケイ酸クラウンガラスBK7
(ショット社製)上に、上記の樹脂組成物を塗布し、1
00μmのスペーサーを介して別のホウケイ酸クラウン
ガラスで挟んだ。これに高圧水銀ランプから紫外線を1
0分間照射したが、接着力は不十分であり、2枚のガラ
スは容易に剥離した。
In addition, borosilicate crown glass BK7
(Manufactured by Shot Co., Ltd.) and applying the above resin composition
It was sandwiched between another borosilicate crown glass via a 00 μm spacer. UV light from a high-pressure mercury lamp
Irradiation was performed for 0 minutes, but the adhesion was insufficient and the two glasses were easily peeled off.

【0030】実施例2 エピコート828(シェル化学社製、エピビスタイプエ
ポキシ樹脂)100重量部、ポリシラン[1−30]4
重量部、およびスルホニウム塩[2−23]3重量部を
混合して樹脂組成物を調製し、これをガラス基板上にバ
ーコーターで塗布し厚さ200μmの膜を形成した。こ
の膜の上方5cmの位置に500Wの高圧水銀ランプを
設置し、紫外線を照射して光硬化した。この場合、30
秒で硬化膜を得ることができた。
Example 2 100 parts by weight of Epicoat 828 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.), polysilane [1-30] 4
A resin composition was prepared by mixing parts by weight and 3 parts by weight of a sulfonium salt [2-23], and this was coated on a glass substrate by a bar coater to form a film having a thickness of 200 μm. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays. In this case, 30
A cured film could be obtained in seconds.

【0031】実施例3 エピコート828(シェル化学社製、エピビスタイプエ
ポキシ樹脂)100重量部、ポリシラン[1−30]4
重量部、およびヨードニウム塩[2−29]2重量部を
混合して樹脂組成物を調製し、これをガラス基板上にバ
ーコーターで塗布し厚さ200μmの膜を形成した。こ
の膜の上方5cmの位置に500Wの高圧水銀ランプを
設置し、紫外線を照射して光硬化した。この場合、20
秒で硬化膜を得ることができた。さらに、この硬化膜を
100℃で10分間、加熱硬化した。表面硬度を測定し
たところ、5Hであった。
Example 3 100 parts by weight of Epicoat 828 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.) and polysilane [1-30] 4
A resin composition was prepared by mixing parts by weight and 2 parts by weight of an iodonium salt [2-29], and this was coated on a glass substrate with a bar coater to form a 200 μm thick film. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays. In this case, 20
A cured film could be obtained in seconds. Further, the cured film was cured by heating at 100 ° C. for 10 minutes. The measured surface hardness was 5H.

【0032】また、ガラス基板上に上記の樹脂組成物を
バーコーターで塗布し厚さ200μmの膜を形成した。
この膜の一部に選択的に、窒素レーザー光(50mW、
334nm)を照射して光硬化した。この場合、30秒
で硬化膜を得ることができた。これをエタノールで洗い
流したところ、露光部のみが残り、パターニングが可能
であった。
The above resin composition was applied on a glass substrate with a bar coater to form a film having a thickness of 200 μm.
Selective nitrogen laser light (50 mW,
334 nm) for photocuring. In this case, a cured film could be obtained in 30 seconds. When this was washed away with ethanol, only the exposed portions remained, and patterning was possible.

【0033】実施例4 セロキサイド2021(ダイセル化学社製、脂環式エポ
キシ樹脂)100重量部、ポリシラン[1−34]3重
量部、およびスルホニウム塩[2−3]2重量部を混合
して樹脂組成物を調製し、これをガラス基板上にバーコ
ーターで塗布し厚さ100μmの膜を形成した。この膜
の上方5cmの位置に500Wの高圧水銀ランプを設置
し、紫外線を照射して光硬化した。この場合、10秒で
硬化膜を得ることができた。
Example 4 Resin was prepared by mixing 100 parts by weight of celloxide 2021 (manufactured by Daicel Chemical Industries, alicyclic epoxy resin), 3 parts by weight of polysilane [1-34], and 2 parts by weight of sulfonium salt [2-3]. A composition was prepared and applied to a glass substrate with a bar coater to form a film having a thickness of 100 μm. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays. In this case, a cured film could be obtained in 10 seconds.

【0034】実施例5 エピコート828(シェル化学社製、エピビスタイプエ
ポキシ樹脂)100重量部、ポリシラン[1−35]4
重量部、およびスルホニウム塩[2−24]2重量部を
混合して樹脂組成物を調製し、これをガラス基板上にバ
ーコーターで塗布し厚さ200μmの膜を形成した。こ
の膜の上方5cmの位置に500Wの高圧水銀ランプを
設置し、紫外線を照射して光硬化した。この場合、20
秒で硬化膜を得ることができた。
Example 5 100 parts by weight of Epicoat 828 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.) and polysilane [1-35] 4
A resin composition was prepared by mixing parts by weight and 2 parts by weight of a sulfonium salt [2-24], and this was coated on a glass substrate by a bar coater to form a film having a thickness of 200 μm. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays. In this case, 20
A cured film could be obtained in seconds.

【0035】実施例6 エピコート828(シェル化学社製、エピビスタイプエ
ポキシ樹脂)エピビスタイプエポキシ樹脂(シェル化学
社製、エピコート828)100重量部、ポリシラン
[1−30]4重量部、およびヨードニウム塩[2−3
5]2重量部を混合して樹脂組成物を調製し、これをガ
ラス基板上にバーコーターで塗布し厚さ200μmの膜
を形成した。この膜の上方5cmの位置に500Wの高
圧水銀ランプを設置し、紫外線を照射して光硬化した。
この場合、20秒で硬化膜を得ることができた。
Example 6 Epicoat 828 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.) 100 parts by weight of epibis type epoxy resin (Epicoat 828 manufactured by Shell Chemical Co., Ltd.), 4 parts by weight of polysilane [1-30], and iodonium Salt [2-3
5] A resin composition was prepared by mixing 2 parts by weight, and this was applied on a glass substrate with a bar coater to form a 200 μm thick film. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays.
In this case, a cured film could be obtained in 20 seconds.

【0036】実施例7 セロキサイド2021(ダイセル化学社製、脂環式エポ
キシ樹脂)100重量部、ポリシラン[1−34]3重
量部、およびスルホニウム塩[2−12]2重量部を混
合して樹脂組成物を調製し、これをガラス基板上にバー
コーターで塗布し厚さ100μmの膜を形成した。この
膜の上方5cmの位置に500Wの高圧水銀ランプを設
置し、紫外線を照射して光硬化した。この場合、30秒
で硬化膜を得ることができた。
Example 7 A resin was prepared by mixing 100 parts by weight of celloxide 2021 (manufactured by Daicel Chemical Industries, alicyclic epoxy resin), 3 parts by weight of polysilane [1-34], and 2 parts by weight of sulfonium salt [2-12]. A composition was prepared and applied to a glass substrate with a bar coater to form a film having a thickness of 100 μm. A high-pressure mercury lamp of 500 W was set at a position 5 cm above the film, and the film was cured by irradiating ultraviolet rays. In this case, a cured film could be obtained in 30 seconds.

【0037】実施例8 エピコート828(シェル化学社製、エピビスタイプエ
ポキシ樹脂)70重量部、エピコート1001(シェル
化学社製、エピビスタイプエポキシ樹脂)30重量部、
ポリシラン[1−30]4重量部、およびヨードニウム
塩[2−29]2重量部を混合して樹脂組成物を調製
し、これをホウケイ酸クラウンガラスBK7(ショット
社製)上に塗布し、100μmのスペーサーを介して別
のホウケイ酸クラウンガラスで挟んだ。これに高圧水銀
ランプから紫外線を1分間照射して光硬化し、さらに1
00℃で30分間加熱硬化した。その結果、十分な接着
力で2枚のガラスを接着することができた。また、硬化
物には収縮によるクラックがなく、透明性に優れてい
た。
Example 8 70 parts by weight of Epikote 828 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.), 30 parts by weight of Epicoat 1001 (Epibis type epoxy resin manufactured by Shell Chemical Co., Ltd.)
A resin composition was prepared by mixing 4 parts by weight of polysilane [1-30] and 2 parts by weight of iodonium salt [2-29], and the resin composition was applied on borosilicate crown glass BK7 (manufactured by Schott) and 100 μm in thickness. And another borosilicate crown glass. This was irradiated with ultraviolet light from a high-pressure mercury lamp for 1 minute to photo-cur, and
It was cured by heating at 00 ° C for 30 minutes. As a result, the two glasses could be bonded with a sufficient bonding strength. The cured product did not have cracks due to shrinkage and was excellent in transparency.

【0038】[0038]

【発明の効果】以上詳述したように本発明の光硬化性樹
脂組成物は、従来よりも長波長の光を用いて厚膜でも光
硬化することができ、しかも接着性に優れた硬化物が得
られる。
As described in detail above, the photocurable resin composition of the present invention can be photocured even in a thick film using light having a longer wavelength than in the past, and has a superior adhesive property. Is obtained.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 (a)エポキシ樹脂、(b)Si−Si
結合を有するケイ素化合物、および(c)オニウム塩を
含有することを特徴とする光硬化性樹脂組成物。
1. An epoxy resin, (b) Si-Si
A photocurable resin composition comprising a silicon compound having a bond and (c) an onium salt.
JP23604297A 1997-09-01 1997-09-01 Photocurable resin composition Expired - Fee Related JP3435316B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23604297A JP3435316B2 (en) 1997-09-01 1997-09-01 Photocurable resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23604297A JP3435316B2 (en) 1997-09-01 1997-09-01 Photocurable resin composition

Publications (2)

Publication Number Publication Date
JPH1180314A true JPH1180314A (en) 1999-03-26
JP3435316B2 JP3435316B2 (en) 2003-08-11

Family

ID=16994907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23604297A Expired - Fee Related JP3435316B2 (en) 1997-09-01 1997-09-01 Photocurable resin composition

Country Status (1)

Country Link
JP (1) JP3435316B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002348357A (en) * 2001-05-23 2002-12-04 Osaka Gas Co Ltd Photopolymerizable resin composition, cured product thereof and manufacturing method
JP2007093856A (en) * 2005-09-28 2007-04-12 Nitto Denko Corp Photosensitive epoxy resin adhesive film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002348357A (en) * 2001-05-23 2002-12-04 Osaka Gas Co Ltd Photopolymerizable resin composition, cured product thereof and manufacturing method
JP4646439B2 (en) * 2001-05-23 2011-03-09 大阪瓦斯株式会社 Photopolymerizable resin composition, cured product thereof and production method
JP2007093856A (en) * 2005-09-28 2007-04-12 Nitto Denko Corp Photosensitive epoxy resin adhesive film
JP4511439B2 (en) * 2005-09-28 2010-07-28 日東電工株式会社 Photosensitive epoxy resin adhesive film

Also Published As

Publication number Publication date
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