JPH1164595A - X-ray spectral element - Google Patents

X-ray spectral element

Info

Publication number
JPH1164595A
JPH1164595A JP23087597A JP23087597A JPH1164595A JP H1164595 A JPH1164595 A JP H1164595A JP 23087597 A JP23087597 A JP 23087597A JP 23087597 A JP23087597 A JP 23087597A JP H1164595 A JPH1164595 A JP H1164595A
Authority
JP
Japan
Prior art keywords
ray
multilayer film
diffracted
rays
focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23087597A
Other languages
Japanese (ja)
Inventor
Tomoya Arai
智也 新井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Corp
Original Assignee
Rigaku Industrial Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku Industrial Corp filed Critical Rigaku Industrial Corp
Priority to JP23087597A priority Critical patent/JPH1164595A/en
Publication of JPH1164595A publication Critical patent/JPH1164595A/en
Pending legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PROBLEM TO BE SOLVED: To generate an X-ray converged with sufficient intensity and little background by converging the X-ray emitted vertically to z-direction from one focus of two focuses on an elliptic columnar surface to the other focus. SOLUTION: In an X-ray spectral element 1 having a multilayer film 3 accumulated on a base 2, a part of the focus F1 , F2 side of an elliptic cylindrical surface E1 extending in paper surface vertical direction represented by x<2> /a<2> +y<2> /b<2> =1 in respect to orthogonal coordinate xyz (z-axis passes the origin O and extends on this side vertical to the paper surface) is taken as a diffracting surface 1a. The periodic length d0 of the multilayer film 3 is set so that X-rays 4A, 4b having a wavelength to be diffracted which are emitted vertically to z-direction from one focus F1 of the two linear focuses F1 , F2 extended in z-direction of the elliptic cylindrical surface E1 is diffracted in an optional point on the diffracting surface 1a by the diffracting surface 1a and converged to the other focus F2 vertically to z-direction.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、強度が十分でバッ
クグラウンドも少なく収斂するX線を生成できるX線分
光素子に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray spectroscopy element capable of generating convergent X-rays with sufficient intensity and low background.

【0002】[0002]

【従来の技術】従来より、例えばいわゆる全反射蛍光X
線分析においては、図2に示すように、線状のX線源
(X線管のターゲット上の線状焦点で紙面に垂直に延び
ている)20から広がって出射されるX線を、発散スリ
ット22を用いて発散角ψに絞って分光素子23に照射
し、分光素子23で分光、単色化し、その分光されたX
線24を1次X線として試料台25に固定された試料2
6の表面に微小な入射角αで入射させ、全反射したX線
27を検出器28に入射させないように図面右方向へ逃
がしつつ、試料26から発生した蛍光X線28を検出器
29に入射させ、分析を行っている。ここで、全反射を
起こすため、入射角αは、通常例えば0.05度ないし
0.1度程度の微小な角度に設定される。そのため、線
状のX線源20から広がって出射されるX線を、発散ス
リット22を用いて、0.05度程度の微小な発散角ψ
に絞る必要がある。
2. Description of the Related Art Conventionally, for example, so-called total reflection fluorescent X
In the X-ray analysis, as shown in FIG. 2, X-rays spread and emitted from a linear X-ray source (a linear focus on a target of an X-ray tube and extending perpendicular to the paper) 20 are diverged. The light is radiated to the spectroscopic element 23 by narrowing the divergence angle ψ using the slit 22, and the spectroscopic element 23 separates the light into monochromatic light.
Sample 2 fixed to a sample table 25 using the line 24 as a primary X-ray
The fluorescent X-rays 28 generated from the sample 26 are incident on the detector 29 while escaping to the right side in the drawing so that the totally reflected X-rays 27 are not incident on the detector 28. And analyze it. Here, in order to cause total reflection, the incident angle α is usually set to a small angle of, for example, about 0.05 to 0.1 degrees. Therefore, the X-rays that are spread and emitted from the linear X-ray source 20 are converted into small divergence angles 0.05 of about 0.05 degrees by using the divergence slits 22.
Need to be squeezed.

【0003】[0003]

【発明が解決しようとする課題】したがって、X線源2
0から出射されるX線のごく一部21しか利用しないの
で、試料面26aに照射される1次X線24の強度が、
正確な分析にはいまひとつ不十分となる場合がある。ま
た、分光素子23が、ログスパイラル型やヨハン型であ
る場合には、X線源20側か試料26側の少なくとも一
方で光学系が焦点を結ばず、収差が生じるので、1次X
線24においてバックグラウンドを十分に減少させるこ
とができず、やはり、いまひとつ十分に正確な分析がで
きない。
Therefore, the X-ray source 2
Since only a small part 21 of the X-rays emitted from 0 is used, the intensity of the primary X-rays 24 applied to the sample surface 26a is
Sometimes accurate analysis is not enough. When the spectroscopic element 23 is of a log spiral type or a Johan type, the optical system does not focus on at least one of the X-ray source 20 side and the sample 26 side, and aberration occurs.
At line 24, the background cannot be reduced sufficiently and, again, the analysis cannot be sufficiently accurate.

【0004】本発明は前記従来の問題に鑑みてなされた
もので、強度が十分でバックグラウンドも少なく収斂
(集光)するX線を生成できるX線分光素子を提供する
ことを目的とする。
[0004] The present invention has been made in view of the above-mentioned conventional problems, and has as its object to provide an X-ray spectroscopy element capable of generating X-rays having sufficient intensity and a small background and converging (focusing).

【0005】[0005]

【課題を解決するための手段】前記目的を達成するため
に、請求項1のX線分光素子は、基板上に多層膜を堆積
させたX線分光素子において、まず、直交座標xyzに
ついて、x2 /a2 +y2 /b2 =1で表される楕円柱
面の焦点側の一部を回折面とする。そして、多層膜の周
期長が、回折面上の任意の点において、前記楕円柱面の
z方向に延びる線状の2焦点のうち一方の焦点からz方
向に垂直に出射した回折すべき波長のX線を、回折面で
回折して、他方の焦点にz方向に垂直に集光させるよう
に設定されていることを特徴とする。
In order to achieve the above object, an X-ray spectroscopic element according to claim 1 is an X-ray spectroscopic element having a multilayer film deposited on a substrate. A part on the focal side of the elliptical cylinder surface represented by 2 / a 2 + y 2 / b 2 = 1 is defined as a diffraction surface. The periodic length of the multilayer film is, at an arbitrary point on the diffraction surface, the wavelength to be diffracted perpendicularly to the z direction from one of two linear focal points extending in the z direction of the elliptic cylinder surface. X-rays are set to be diffracted on a diffraction surface and condensed at the other focal point in a direction perpendicular to the z direction.

【0006】請求項1のX線分光素子によれば、一方の
焦点に置かれた線状のX線源から出射し例えば0.1度
程度の発散角に絞られたX線を受けて回折し、他方の焦
点に0.05度程度の収斂角で線状に集光させ得るの
で、強度が十分でバックグラウンドも少なく収斂するX
線を生成できる。
According to the X-ray spectroscopy device of the present invention, the X-rays are emitted from a linear X-ray source placed at one focal point and received, for example, an X-ray having a divergence angle of about 0.1 degree, and are diffracted. However, since the light can be condensed linearly at the other focal point with a convergence angle of about 0.05 degree, the intensity is sufficient, the background is small, and X
Lines can be generated.

【0007】請求項2のX線分光素子は、基板上に多層
膜を堆積させたX線分光素子において、まず、直交座標
xyzについて、x2 /a2 +y2 /b2 +z2 /b2
=1で表される回転楕円面の焦点側の一部を回折面とす
る。そして、多層膜の周期長が、回折面上の任意の点に
おいて、前記回転楕円面の点状の2焦点のうち一方の焦
点から出射した回折すべき波長のX線を、回折面で回折
して、他方の焦点に集光させるように設定されているこ
とを特徴とする。
According to a second aspect of the present invention, there is provided an X-ray spectroscopic element in which a multilayer film is deposited on a substrate. First, regarding the orthogonal coordinates xyz, x 2 / a 2 + y 2 / b 2 + z 2 / b 2
A part on the focal side of the spheroidal surface represented by = 1 is defined as a diffraction surface. Then, at an arbitrary point on the diffraction plane, the X-ray having a wavelength to be diffracted from one of the two focal points of the spheroid is diffracted by the diffraction plane. Is set so that light is condensed at the other focal point.

【0008】請求項2のX線分光素子によれば、一方の
焦点に置かれた点状のX線源から出射し例えば0.1度
程度の発散角に絞られたX線を受けて回折し、他方の焦
点に0.05度程度の収斂角で点状に集光させ得るの
で、強度が十分でバックグラウンドも少なく収斂するX
線を生成できる。
According to the X-ray spectroscopy element of the present invention, the light is emitted from a point-like X-ray source placed at one focal point, and received, for example, an X-ray having a divergence angle of about 0.1 degree, and diffracted. However, since the light can be condensed at the other focal point in a point-like manner at a convergence angle of about 0.05 degree, the intensity is sufficient and the background is small and X
Lines can be generated.

【0009】[0009]

【発明の実施の形態】以下、本発明の第1実施形態であ
るX線分光素子を説明する。図1に示すように、このX
線分光素子1は、基板2上に多層膜3を堆積させたX線
分光素子1において、まず、直交座標xyz(z軸は原
点Oを通り、紙面に垂直で手前向き)について、x2
2 +y2 /b2 =1で表される紙面垂直方向に延びる
楕円柱面E1 の焦点F1 ,F2 側の一部を回折面1aと
する。そして、多層膜3の周期長d0 が、回折面1a上
の任意の点において、前記楕円柱面E1 のz方向に延び
る線状の2焦点F1 ,F2 のうち一方の焦点F1 からz
方向に垂直に(z軸に垂直な面、例えば紙面に沿って)
出射した回折すべき波長のX線4A,4Bを、回折面1
aで回折して、他方の焦点F2 にz方向に垂直に(前記
z軸に垂直な面に沿って)集光させるように設定されて
いる。このような人工多層膜3は、たとえばタングステ
ン層とシリコン層とを交互に蒸着することにより、形成
でき、1組のタングステン層およびシリコン層の厚さの
和が、多層膜3の周期長d0 となる。なお、図1におい
ては、図示の容易のため、多層膜3のうち3組の層のみ
示している。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an X-ray spectroscopy device according to a first embodiment of the present invention will be described. As shown in FIG.
Ray monochromator 1 is the X-ray monochromator 1 deposited multilayer film 3 on the substrate 2, first, the rectangular coordinates xyz (z-axis passes the origin O, the front-facing perpendicular to the paper surface), x 2 /
a part of a 2 + y 2 / b 2 = focal F 1 of the ellipsoidal cylinder plane E 1 extending in the direction perpendicular to the plane represented by 1, F 2 side is the diffractive surface 1a. Then, at any point on the diffraction surface 1a, the periodic length d 0 of the multilayer film 3 is one of the two linear focal points F 1 and F 2 extending in the z direction of the elliptic cylindrical surface E 1. To z
Perpendicular to the direction (along the plane perpendicular to the z-axis, for example along the plane of the paper)
The emitted X-rays 4A and 4B having a wavelength to be diffracted are diffracted by the diffraction surface 1
and diffracted by a, perpendicular to the z-direction at the other focal point F 2 (along a plane perpendicular to the z-axis) is set so as to condense. Such an artificial multilayer film 3 can be formed, for example, by alternately depositing a tungsten layer and a silicon layer, and the sum of the thicknesses of one set of the tungsten layer and the silicon layer is equal to the period length d 0 of the multilayer film 3. Becomes In FIG. 1, only three sets of layers of the multilayer film 3 are shown for ease of illustration.

【0010】すなわち、多層膜3は、楕円柱面E1 の一
部をなす回折面1a上の任意の点において、一方の焦点
1 に置かれた線状のX線源から出射した波長λのX線
4を、入射角θで受けて同じ角度の反射角θで回折、反
射するよう設定されている。ここで、回折面1aの形
状、焦点F1 の位置は既知であるから、回折面1a上の
任意の点それぞれにおいて入射角(反射角)θは幾何学
的に一義的に決まり、また、回折すべきX線4の波長λ
も既知であるから、多層膜3の周期長を特徴付けるいわ
ゆるd値は、次式(1)のブラッグの条件を満たす。
That is, the multilayer film 3 has a wavelength λ emitted from a linear X-ray source placed at one focal point F 1 at an arbitrary point on the diffraction surface 1 a forming a part of the elliptic cylindrical surface E 1. X-rays 4 are received at an incident angle θ, and are diffracted and reflected at a reflection angle θ of the same angle. Here, the shape of the diffraction surface 1a, since the position of the focal point F 1 is known, the incident angle (reflection angle) at each arbitrary point on the diffraction surface 1a theta geometrically unambiguously determined, The diffraction Wavelength λ of X-ray 4 to be
Is also known, the so-called d value characterizing the period length of the multilayer film 3 satisfies the Bragg condition of the following equation (1).

【0011】 2d sinθ=nλ (nは回折次数で正整数) …(1)2d sin θ = nλ (n is a diffraction order and a positive integer) (1)

【0012】式(1)中の sinθは、回折面1aの形状
を示す前記楕円柱面の式から導出され、これを式(1)
に代入してn=1とすると、d値は、回折面上の任意の
点P(x1 ,y1 ,z1 )において、次式(2)で表さ
れる。
The sin θ in the expression (1) is derived from the expression of the elliptic cylinder surface indicating the shape of the diffraction surface 1a.
, And n = 1, the d value is expressed by the following equation (2) at an arbitrary point P (x 1 , y 1 , z 1 ) on the diffraction surface.

【0013】 d=λ(a2 +b2 −x1 2−y1 21/2 /2b …(2)[0013] d = λ (a 2 + b 2 -x 1 2 -y 1 2) 1/2 / 2b ... (2)

【0014】d値は、基板2上に多層膜3を形成する際
の蒸着時間やマスキング等の条件を変えて制御すること
ができるので、第1実施形態のX線分光素子1は、前述
した焦点F1 から出射した波長λのX線4を回折すると
いう回折現象を起こすような多層膜3の形成条件を見出
して調整することにより、作製することができる。
Since the d value can be controlled by changing conditions such as the deposition time and masking when forming the multilayer film 3 on the substrate 2, the X-ray spectroscopy device 1 of the first embodiment can be controlled as described above. The multilayer film 3 can be manufactured by finding and adjusting the conditions for forming the multilayer film 3 that cause a diffraction phenomenon of diffracting the X-ray 4 of wavelength λ emitted from the focal point F 1 .

【0015】ただし、このd値は、X線の屈折現象によ
り、厳密には多層膜3の実際の周期長d0 とは一致せ
ず、次式(3)の関係があることが知られている。
However, it is known that this d value does not exactly match the actual period length d 0 of the multilayer film 3 due to the refraction phenomenon of X-rays, and has the relationship of the following equation (3). I have.

【0016】 d=d0 [1−(2δ−δ2 )/ sin2 θ]1/2 …(3)D = d 0 [1− (2δ−δ 2 ) / sin 2 θ] 1/2 (3)

【0017】すなわち、前述したように所望の回折現象
を起こすように多層膜3の形成条件を調整して、第1実
施形態のX線分光素子1を作製すれば、その実際の多層
膜3の周期長d0 は、式(3)を満たすものとなる。な
お、式(3)中のδは、多層膜3の組成等から決まる屈
折率である。
That is, as described above, if the conditions for forming the multilayer film 3 are adjusted so as to cause a desired diffraction phenomenon, and the X-ray spectroscopy device 1 of the first embodiment is manufactured, The cycle length d 0 satisfies Expression (3). In the expression (3), δ is a refractive index determined by the composition of the multilayer film 3 and the like.

【0018】第1実施形態のX線分光素子1によれば、
図1に示すように、一方の焦点F1に置かれた線状のX
線源から出射し例えば0.1度程度の発散角ψに絞られ
たX線4を受けて回折し、他方の焦点F2 に0.05度
程度の収斂角γで線状に集光させることができる。すな
わち、例えば0.05度程度の収斂角γのX線を試料に
照射するのに、X線源から出射したX線を絞る角度は、
0.05度でなく例えば0.1度程度でよく、X線源か
ら出射したX線を、従来の例えば2倍程度の効率で利用
できる。したがって、強度が十分でバックグラウンドも
少なく収斂するX線5を生成できる。
According to the X-ray spectroscopy device 1 of the first embodiment,
As shown in FIG. 1, a linear X placed at one focal point F1
An X-ray 4 emitted from the source and narrowed to, for example, a divergence angle の of about 0.1 ° is diffracted and condensed linearly at the other focal point F 2 at a convergence angle γ of about 0.05 °. be able to. That is, for example, when irradiating a sample with X-rays having a convergence angle γ of about 0.05 degree, the angle at which the X-rays emitted from the X-ray source are reduced is as follows:
The angle may be, for example, about 0.1 degree instead of 0.05 degree, and X-rays emitted from the X-ray source can be used with, for example, about twice the efficiency of the related art. Therefore, it is possible to generate the X-rays 5 having sufficient intensity and converging with little background.

【0019】次に、本発明の第2実施形態のX線分光素
子を説明する。図1に示すように、このX線分光素子1
1は、基板12上に多層膜13を堆積させたX線分光素
子11において、まず、直交座標xyzについて、x2
/a2 +y2 /b2 +z2 /b2 =1で表される回転楕
円面E2 の焦点F3 ,F4 側の一部を回折面11aとす
る。すなわち、第2実施形態のX線分光素子11におい
ては、図1に2点鎖線で示された楕円を、x軸を中心と
して回転させた回転楕円面E2 の一部を回折面11aと
し、図1は断面図となる。そして、多層膜13の周期長
0 が、回折面11a上の任意の点において、前記回転
楕円面E2 の点状の2焦点F3 ,F4 のうち一方の焦点
3 から出射した回折すべき波長のX線14A,14B
を、回折面11aで回折して、他方の焦点F4 に集光さ
せるように設定されている。
Next, an X-ray spectroscopy device according to a second embodiment of the present invention will be described. As shown in FIG.
1, in the X-ray monochromator 11 depositing a multilayer film 13 on the substrate 12, first, the rectangular coordinates xyz, x 2
/ A 2 + y 2 / b 2 + z 2 / b 2 = 1 at the focal point F 3 of the spheroid E 2 represented, F 4 side of the part and the diffractive surface 11a. That is, in the X-ray monochromator 11 of the second embodiment, an ellipse indicated by a two-dot chain line in FIG. 1, a part of spheroid E 2 is rotated about the x-axis and the diffraction surface 11a, FIG. 1 is a sectional view. The period length d 0 of the multilayer film 13, at any point on the diffraction surface 11a, and emitted from the focal point F 3 of one of said spheroidal punctate bifocal F 3 of E 2, F 4 diffraction X-rays 14A and 14B of desired wavelength
Was converted, diffracted by the diffraction surface 11a, it is set so as to condense the other focal point F 4.

【0020】すなわち、多層膜13は、回転楕円面E2
の一部をなす回折面11a上の任意の点において、一方
の焦点F3 に置かれた点状のX線源から出射した波長λ
のX線14を、入射角θで受けて同じ角度の反射角θで
回折、反射するよう設定されている。ここで、回折面1
1aの形状、焦点F3 の位置は既知であるから、回折面
11a上の任意の点それぞれにおいて入射角(反射角)
θは幾何学的に一義的に決まり、また、回折すべきX線
14の波長λも既知であるから、多層膜13の周期長を
特徴付けるいわゆるd値は、第1実施形態のX線分光素
子1と同様に、前式(1)のブラッグの条件を満たす。
That is, the multilayer film 13 has a spheroidal surface E 2
At an arbitrary point on the diffraction surface 11a forming part of the wavelength λ emitted from the point-like X-ray source placed at one focal point F 3.
X-rays 14 are received at an incident angle θ, and are diffracted and reflected at a reflection angle θ of the same angle. Here, diffraction surface 1
The shape of 1a, since the position of the focal point F 3 is known, the angle of incidence at each arbitrary point on the diffraction surface 11a (reflection angle)
θ is uniquely determined geometrically, and the wavelength λ of the X-ray 14 to be diffracted is also known. Therefore, the so-called d value that characterizes the period length of the multilayer film 13 is determined by the X-ray spectroscopic element of the first embodiment. As in the case of 1, the Bragg condition of the above equation (1) is satisfied.

【0021】式(1)中の sinθは、回折面11aの形
状を示す前記回転楕円面の式から導出され、これを式
(1)に代入してn=1とすると、d値は、回折面上の
任意の点P(x1 ,y1 ,z1 )において、次式(4)
で表される。
The sin θ in the equation (1) is derived from the spheroidal equation representing the shape of the diffraction surface 11a. If this is substituted into the equation (1) and n = 1, the d value is At an arbitrary point P (x 1 , y 1 , z 1 ) on the surface, the following equation (4)
It is represented by

【0022】 d=λ(a2 +b2 −x1 2−y1 2−z1 21/2 /2b …(4)[0022] d = λ (a 2 + b 2 -x 1 2 -y 1 2 -z 1 2) 1/2 / 2b ... (4)

【0023】第2実施形態のX線分光素子11も、焦点
3 から出射した波長λのX線14を回折するという回
折現象を起こすような多層膜13の形成条件を見出して
調整することにより、作製することができる。ただし、
第1実施形態のX線分光素子1と同様に、d値は、X線
の屈折現象により、厳密には多層膜13の実際の周期長
0 とは一致せず、前式(3)の関係がある。すなわ
ち、所望の回折現象を起こすように多層膜13の形成条
件を調整して、第2実施形態のX線分光素子11を作製
すれば、その実際の多層膜13の周期長d0 は、式
(3)を満たすものとなる。
The X-ray spectroscopy element 11 of the second embodiment also finds and adjusts the conditions for forming the multilayer film 13 that causes the diffraction phenomenon of diffracting the X-ray 14 having the wavelength λ emitted from the focal point F 3. Can be manufactured. However,
Similarly to the X-ray spectroscopy element 1 of the first embodiment, the d value does not exactly match the actual period length d 0 of the multilayer film 13 due to the refraction of X-rays. Have a relationship. That is, if the X-ray spectroscopy element 11 of the second embodiment is manufactured by adjusting the formation conditions of the multilayer film 13 so as to cause a desired diffraction phenomenon, the actual period length d 0 of the multilayer film 13 is expressed by the following equation. (3) is satisfied.

【0024】第2実施形態のX線分光素子11によれ
ば、一方の焦点F3 に置かれた点状のX線源から出射し
例えば0.1度程度の発散角ψに絞られたX線14を受
けて回折し、他方の焦点F4 に0.05度程度の収斂角
γで点状に集光させることができる。すなわち、例えば
0.05度程度の発散角γのX線を試料に照射するの
に、X線源から出射したX線を絞る角度は、0.05度
でなく例えば0.1度程度でよく、X線源から出射した
X線を、従来の例えば4倍程度の効率で利用できる。し
たがって、強度が十分でバックグラウンドも少なく収斂
するX線15を生成できる。
According to the X-ray spectroscopy element 11 of the second embodiment, X-rays emitted from a point-like X-ray source placed at one focal point F 3 and reduced to a divergence angle の of, for example, about 0.1 ° diffracted receiving line 14, the other focal point F 4 can be condensed to a spot-like in γ converging angle of about 0.05 degrees. That is, for example, when irradiating the sample with X-rays having a divergence angle γ of about 0.05 degrees, the angle at which the X-rays emitted from the X-ray source are narrowed may be about 0.1 degrees instead of 0.05 degrees. X-rays emitted from the X-ray source can be used with, for example, about four times the efficiency of the conventional one. Therefore, it is possible to generate the X-rays 15 having sufficient intensity and converging with little background.

【0025】[0025]

【発明の効果】以上に説明したように、本発明によれ
ば、強度が十分でバックグラウンドも少なく収斂するX
線を生成できる。
As described above, according to the present invention, X having a sufficient intensity and a small background is converged.
Lines can be generated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1または第2実施形態であるX線分
光素子を示す正面図または断面図である。
FIG. 1 is a front view or a sectional view showing an X-ray spectroscopy element according to a first or second embodiment of the present invention.

【図2】従来の全反射蛍光X線分析装置を示す斜視図で
ある。
FIG. 2 is a perspective view showing a conventional total reflection X-ray fluorescence spectrometer.

【符号の説明】[Explanation of symbols]

1,11…X線分光素子、1a,11a…回折面、2,
12…基板、3,13…多層膜、4,14…一方の焦点
から出射した回折すべき波長のX線、d0 …多層膜の周
期長、F1 ,F2 …線状の焦点、F3 ,F4 …点状の焦
点、E1 …楕円柱面、E2 …回転楕円面。
1,11 ... X-ray spectroscopy element, 1a, 11a ... Diffraction surface, 2,
12 ... substrate, 3,13 ... multilayer, 4, 14 ... X-ray wavelength to be diffracted emitted from one focal point, the cycle length of d 0 ... multilayer, F 1, F 2 ... linear focus, F 3 , F 4 : point-like focal point, E 1 : elliptical cylindrical surface, E 2 : spheroidal surface.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板上に多層膜を堆積させたX線分光素
子において、 直交座標xyzについて、x2 /a2 +y2 /b2 =1
で表される楕円柱面の焦点側の一部を回折面とし、 多層膜の周期長が、回折面上の任意の点において、前記
楕円柱面のz方向に延びる線状の2焦点のうち一方の焦
点からz方向に垂直に出射した回折すべき波長のX線
を、回折面で回折して、他方の焦点にz方向に垂直に集
光させるように設定されていることを特徴とするX線分
光素子。
1. An X-ray spectroscopy device having a multilayer film deposited on a substrate, wherein x 2 / a 2 + y 2 / b 2 = 1 for orthogonal coordinates xyz.
A part on the focal side of the elliptical cylinder surface represented by the following expression is a diffraction surface, and the periodic length of the multilayer film is, at an arbitrary point on the diffraction surface, of two linear focal points extending in the z direction of the elliptic cylinder surface. X-rays having a wavelength to be diffracted and emitted perpendicularly to the z direction from one focal point are diffracted by the diffractive surface, and are set so as to be condensed to the other focal point perpendicularly to the z direction. X-ray spectroscopy element.
【請求項2】 基板上に多層膜を堆積させたX線分光素
子において、 直交座標xyzについて、x2 /a2 +y2 /b2 +z
2 /b2 =1で表される回転楕円面の焦点側の一部を回
折面とし、 多層膜の周期長が、回折面上の任意の点において、前記
回転楕円面の点状の2焦点のうち一方の焦点から出射し
た回折すべき波長のX線を、回折面で回折して、他方の
焦点に集光させるように設定されていることを特徴とす
るX線分光素子。
2. An X-ray spectroscopy device having a multilayer film deposited on a substrate, wherein x 2 / a 2 + y 2 / b 2 + z
A part on the focal point side of the spheroid represented by 2 / b 2 = 1 is defined as a diffraction surface, and the periodic length of the multilayer film is a point-like bifocal of the spheroid at an arbitrary point on the diffraction surface. An X-ray spectroscopy element characterized in that X-rays having a wavelength to be diffracted and emitted from one of the focal points are diffracted on a diffraction surface and condensed on the other focal point.
JP23087597A 1997-08-27 1997-08-27 X-ray spectral element Pending JPH1164595A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23087597A JPH1164595A (en) 1997-08-27 1997-08-27 X-ray spectral element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23087597A JPH1164595A (en) 1997-08-27 1997-08-27 X-ray spectral element

Publications (1)

Publication Number Publication Date
JPH1164595A true JPH1164595A (en) 1999-03-05

Family

ID=16914685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23087597A Pending JPH1164595A (en) 1997-08-27 1997-08-27 X-ray spectral element

Country Status (1)

Country Link
JP (1) JPH1164595A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005078738A1 (en) * 2004-02-12 2005-08-25 Japan Science And Technology Agency Soft x-ray processing device and soft x-ray processing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005078738A1 (en) * 2004-02-12 2005-08-25 Japan Science And Technology Agency Soft x-ray processing device and soft x-ray processing method

Similar Documents

Publication Publication Date Title
US5406609A (en) X-ray analysis apparatus
US6421417B1 (en) Multilayer optics with adjustable working wavelength
US8422633B2 (en) X-ray beam device
JP3734366B2 (en) X-ray analyzer
US7003075B2 (en) Optical measuring device
JP4971383B2 (en) X-ray diffraction method and X-ray diffraction apparatus
Joensen et al. Multilayered supermirror structures for hard x-ray synchrotron and astrophysics instrumentation
US7072442B1 (en) X-ray metrology using a transmissive x-ray optical element
Garakhin et al. High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength ranges
Chapman et al. Analysis of X-ray multilayer Laue lenses made by masked deposition
US6863409B2 (en) Apparatus for generating parallel beam with high flux
US6704390B2 (en) X-ray analysis apparatus provided with a multilayer mirror and an exit collimator
JPH1164595A (en) X-ray spectral element
JPH0682398A (en) X-ray diffraction analyser
JP2007515689A (en) Two-dimensional grating network with alternating multi-layer stacks, its production and spectroscope equipped with these networks
JP2004333131A (en) Total reflection fluorescence xafs measuring apparatus
JP4160124B2 (en) X-ray spectrometer having an analyzer crystal having a partially varying and partially constant radius of curvature
JP2000155102A (en) X-ray measuring apparatus and method therefor
JP3593605B2 (en) X-ray spectroscopy element
WO2010097968A1 (en) Method and apparatus of precisely measuring intensity profile of x-ray nanobeam
JPH0772298A (en) X-ray spectroscope and x-ray spectroscopic element
JP2009085669A (en) X-ray diffraction device and x-ray diffraction method
JP3217871B2 (en) X-ray analyzer and total reflection X-ray fluorescence analyzer
JP2001201599A (en) Apparatus for guiding x-ray
JP2666871B2 (en) X-ray monochromator