JPH1148355A - Optical element with fine uneven pattern, its manufacture, molding die for optical element with fine uneven pattern and manufacture of molding die - Google Patents

Optical element with fine uneven pattern, its manufacture, molding die for optical element with fine uneven pattern and manufacture of molding die

Info

Publication number
JPH1148355A
JPH1148355A JP21061697A JP21061697A JPH1148355A JP H1148355 A JPH1148355 A JP H1148355A JP 21061697 A JP21061697 A JP 21061697A JP 21061697 A JP21061697 A JP 21061697A JP H1148355 A JPH1148355 A JP H1148355A
Authority
JP
Japan
Prior art keywords
pattern
protective film
optical element
uneven pattern
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21061697A
Other languages
Japanese (ja)
Inventor
Takanobu Shiokawa
孝紳 塩川
Satoshi Hiyama
聡 檜山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pentax Corp
Original Assignee
Asahi Kogaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kogaku Kogyo Co Ltd filed Critical Asahi Kogaku Kogyo Co Ltd
Priority to JP21061697A priority Critical patent/JPH1148355A/en
Publication of JPH1148355A publication Critical patent/JPH1148355A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To enable a final shape after the formation of a protecting coat to assume a fine uneven pattern intended for an objective pattern by fabricating a protecting coat into a different shape from the fine uneven pattern intended for an objective pattern so that the final uneven pattern after the formation of the protecting coat becomes the objective uneven pattern. SOLUTION: A fine uneven pattern 12 to be formed on a base material 11 is of a different shape from an ideal shape 13i so that the fine uneven pattern 12 after the formation of a protecting coat becomes an ideal shape 13i, considering the non- uniformity of the thickness of the protecting coat 13 to be formed on the fine uneven pattern 12. More precisely, the fine uneven pattern 12 has a deep root part 12c compared to the ideal shape 13i with a serrated cross section. When deciding the shape of the fine uneven pattern 12, the protecting coat is actually formed as a preliminary experiment using parameters such as the ideal shape 13i, the property of the protecting coat 13 (platinum sputtered coat, reflection preventive coat, hard coat, etc.), and coat thickness, to compare the shape before the formation of the protecting coat with the shape after the formation of the coat.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【技術分野】本発明は、回折パターンのような微細な凹
凸パターンを有する光学素子とその製造方法、さらに、
このような光学素子を成形する成形型及びその製造方法
に関する。
TECHNICAL FIELD The present invention relates to an optical element having a fine concavo-convex pattern such as a diffraction pattern, a method of manufacturing the same,
The present invention relates to a mold for molding such an optical element and a method for manufacturing the same.

【0002】[0002]

【従来技術及びその問題点】例えば回折形状のプラスチ
ックあるいはガラス製のレンズには、その微細な回折パ
ターンの上に、反射防止膜、ハードコート等の保護膜が
コーティングされる。また、このようなレンズを成形す
る成形型には、同様の微細な回折パターンの上に、例え
ば白金等からなる酸化防止用の保護膜が成膜される。と
ころがこれらの保護膜の膜厚は、回折パターンの微細な
凹凸の場所によって異なってしまい、保護膜形成前の凹
凸形状が目的とする回折パターンに加工されていても、
最終的な形状が目的とする回折パターンにならない。こ
れは、回折パターンの凹凸の深さ及びピッチ(μmオー
ダ)と、保護膜の膜厚(数十nmから数μmのオーダ)
との間に大きな差がないこと、及び鋸歯形状の凹凸の切
り立った面には保護膜が付着しにくいこと等が原因であ
る。保護膜の厚さをより薄くすれば、この問題はある程
度解決されるが、薄膜化は、レンズあるいは成形型の品
質保持上、限度がある。
2. Description of the Related Art For example, a plastic or glass lens having a diffractive shape is coated with a protective film such as an antireflection film or a hard coat on a fine diffraction pattern. In a mold for molding such a lens, a protective film made of, for example, platinum or the like for preventing oxidation is formed on a similar fine diffraction pattern. However, the thickness of these protective films will vary depending on the location of the fine irregularities in the diffraction pattern, and even if the irregularities before the protective film is formed are processed into the desired diffraction pattern,
The final shape does not become the desired diffraction pattern. This is because the depth and pitch of the unevenness of the diffraction pattern (on the order of μm) and the thickness of the protective film (on the order of several tens of nm to several μm)
This is because there is no large difference between them, and that the protective film does not easily adhere to the steep surface of the saw-toothed irregularities. This problem can be solved to some extent by making the thickness of the protective film thinner, but thinning has a limit in maintaining the quality of the lens or the mold.

【0003】[0003]

【発明の目的】本発明は、微細な凹凸パターン上に保護
膜を形成する光学素子及び成形型において、保護膜を形
成した後の最終形状が目的とする微細凹凸パターンとな
る光学素子(成形型)、及びその製造方法を得ることを
目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide an optical element and a molding die for forming a protective film on a fine uneven pattern, wherein the final shape after forming the protective film is an optical element (molding mold) having a desired fine uneven pattern. ) And a method for producing the same.

【0004】[0004]

【発明の概要】本発明は、微細な凹凸パターンの上に形
成する保護膜の膜厚は、凹凸のパターン形状、成膜条件
等で決まり、予め予測できることを利用してなされたも
ので、微細な凹凸パターンを有し、該凹凸パターン上に
保護膜を成膜する光学素子(光学素子用成形型)におい
て、凹凸パターンを、該凹凸パターン上に保護膜を成膜
したときの膜厚の不均一性を見込んで、保護膜を成膜し
た後の最終凹凸形状が目的とする凹凸パターンとなるよ
うに、該目的とする凹凸パターンとは異なる形状に加工
することを特徴としている。微細凹凸パターンは、例え
ば回折パターンであるが、他の微細凹凸パターンであっ
てもよい。勿論、同心円形状か平行形状等の平面形状は
問わない。また本発明は、微細凹凸パターンの断面形状
が鋸歯形状、矩形波形状等、垂直に近い切り立った面を
有する形状である場合に、より効果的である。
SUMMARY OF THE INVENTION The present invention is based on the fact that the thickness of a protective film formed on a fine uneven pattern is determined by the shape of the uneven pattern, the film forming conditions and the like, and can be predicted in advance. In an optical element (mold for an optical element) having a concave-convex pattern and forming a protective film on the concave-convex pattern, the concave-convex pattern is not appropriate when the protective film is formed on the concave-convex pattern. In view of the uniformity, the surface is processed into a shape different from the target concavo-convex pattern so that the final concavo-convex shape after the formation of the protective film becomes a target concavo-convex pattern. The fine uneven pattern is, for example, a diffraction pattern, but may be another fine uneven pattern. Of course, any planar shape such as concentric or parallel may be used. Further, the present invention is more effective when the cross-sectional shape of the fine concavo-convex pattern is a shape having a nearly vertical steep surface such as a sawtooth shape or a rectangular wave shape.

【0005】また本発明方法は、微細な凹凸パターンを
有し、該凹凸パターン上に保護膜を成膜する光学素子
(光学素子用成形型)の製造方法において、凹凸パター
ンを、該凹凸パターン上に保護膜を成膜したときの膜厚
の不均一性を見込んで、保護膜を成膜した後の最終凹凸
形状が目的とする凹凸パターンとなるように、該目的と
する凹凸パターンとは異なる形状に形成し、この凹凸パ
ターン上に、保護膜を成膜することを特徴としている。
Further, the method of the present invention is a method for manufacturing an optical element (mold for optical element) having a fine concavo-convex pattern and forming a protective film on the concavo-convex pattern. In consideration of the non-uniformity of the film thickness when the protective film is formed, the final concave-convex shape after forming the protective film is different from the target concave-convex pattern so as to be the target concave-convex pattern. It is characterized in that it is formed in a shape, and a protective film is formed on this uneven pattern.

【0006】保護膜の成膜条件は、少なくとも微細凹凸
パターンの形状、膜材質をパラメータとして行なう予備
実験により、保護膜を成膜した後の最終凹凸形状が目的
とする凹凸パターンとなるように定めることができる。
より具体的には、保護膜の成膜条件は、例えば、微細凹
凸パターンの段差量と、この凹凸パターン上に成膜され
る保護膜の膜厚と、保護膜を成膜した最終的な微細凹凸
パターンの段差量の拡大量との間に、 拡大率∝(膜厚/段差量) の関係があることを考慮して定めることができる。
[0006] The conditions for forming the protective film are determined so that the final concave-convex shape after forming the protective film becomes the target concave-convex pattern by a preliminary experiment in which at least the shape of the fine concave-convex pattern and the film material are used as parameters. be able to.
More specifically, the conditions for forming the protective film include, for example, the step amount of the fine uneven pattern, the thickness of the protective film formed on this uneven pattern, and the final fineness of the formed protective film. The ratio can be determined in consideration of the relationship of the enlargement ratio ∝ (film thickness / step amount) between the amount of step difference of the uneven pattern and the amount of step difference.

【0007】[0007]

【発明の実施の形態】図1は、本発明の光学素子(光学
素子用成形型)の形状例(原理)を示し、図2は、比較
のための従来の形状例を示している。図2の従来例から
説明すると、光学素子(光学素子用成形型)の基材1の
表面には、微細な凹凸パターン2が形成されている。こ
の凹凸パターン2は、目的とする理想形状である。この
凹凸パターン2の上に、保護膜3を成膜すると、該保護
膜3の膜厚の不均一性により、その最終形状は、理想形
状3iとは異なったものとなってしまう。
FIG. 1 shows an example of the shape (principle) of an optical element (mold for optical element) of the present invention, and FIG. 2 shows an example of a conventional shape for comparison. 2, the fine uneven pattern 2 is formed on the surface of the substrate 1 of the optical element (mold for optical element). The concavo-convex pattern 2 has a desired ideal shape. When the protective film 3 is formed on the concave / convex pattern 2, the final shape thereof is different from the ideal shape 3i due to the unevenness of the film thickness of the protective film 3.

【0008】これに対し、図1の例では、基材11の上
に形成する微細凹凸パターン12を、この微細凹凸パタ
ーン12上に成膜する保護膜13の膜厚の不均一性を考
慮して、保護膜13を形成した後の形状が理想形状13
iとなるように、理想形状13iとは異なる形状として
いる。具体的には、鋸歯状断面の理想形状13iに対
し、微細凹凸パターン12は、その谷部12cの深さを
深くしている。
On the other hand, in the example of FIG. 1, the fine uneven pattern 12 formed on the base material 11 is formed in consideration of the nonuniformity of the thickness of the protective film 13 formed on the fine uneven pattern 12. Thus, the shape after forming the protective film 13 is the ideal shape 13
The shape is different from the ideal shape 13i so as to be i. More specifically, in the fine concavo-convex pattern 12, the depth of the valley portion 12c is made deeper than the ideal shape 13i of the sawtooth cross section.

【0009】微細凹凸パターン12の形状の決定に当っ
ては、予備実験として、理想形状13i、保護膜13の
性質(白金スパッタ膜、反射防止膜、ハードコート膜
等)、膜厚等をパラメータとして実際に成膜し、その成
膜前と後の形状を比較して、成膜ムラを測定する。例え
ば、ガラスモールド型の回折面を切削加工するとき、予
備実験から予想した保護膜の成膜ムラ分の補正量を加味
した形状に基材を切削する。このように加工した回折面
上に成膜すれば、成膜時に生じるムラによって、成膜後
の最終形状が目的とする微細凹凸形状となる。
In determining the shape of the fine concavo-convex pattern 12, as a preliminary experiment, the ideal shape 13i, the properties of the protective film 13 (platinum sputtered film, antireflection film, hard coat film, etc.), film thickness, etc. are used as parameters. A film is actually formed, and the shape before and after the film formation is compared to measure the film formation unevenness. For example, when cutting the diffraction surface of a glass mold, the base material is cut into a shape that takes into account the correction amount for the unevenness of film formation of the protective film predicted from preliminary experiments. If a film is formed on the diffraction surface processed in this manner, the final shape after the film formation becomes the target fine unevenness due to unevenness generated during the film formation.

【0010】図3ないし図5は、成膜条件を決定するた
めの具体的な予備実験の例である。ステンレス鋼からな
る母材20を近似の非球面形状21に削り、その上に無
電解Niメッキ層22を形成した。このメッキ層22を
単結晶ダイヤモンドバイトで1μmの段差量を持った断
面平歯車状(ヘリコイド状?)の微細凹凸を持つ回折形
状面23に切削し、この回折形状面23上に、スパッタ
リングにて、耐熱性、耐酸化性、耐濡れ性の向上を目的
とする白金保護膜24を1μm形成させる条件で成膜し
た。切削後とコーティング後で形状を測定したところ、
回折形状が切削後より凸部で10%拡大し、1.1μm
となった(図4)。凹部は拡大していない。同様にし
て、保護膜24を0.3μm厚となる成膜条件で成膜し
たところ、山部は0.3%拡大された形状となった。ま
た、回折形状面23の段差量が2μmのとき、保護膜2
4を1μmの成膜条件で成膜したところ、凹部に対して
凸部は2.1μmで膜厚1.1μmと5%拡大形状とな
った。
FIGS. 3 to 5 show examples of specific preliminary experiments for determining film forming conditions. A base material 20 made of stainless steel was cut into an approximate aspherical shape 21, and an electroless Ni plating layer 22 was formed thereon. The plating layer 22 is cut with a single-crystal diamond tool into a diffraction-shaped surface 23 having fine irregularities in the shape of a cross section of a spur gear (helicoid?) Having a step amount of 1 μm. A platinum protective film 24 for improving heat resistance, oxidation resistance, and wet resistance was formed under a condition of forming a 1 μm-thick film. After measuring the shape after cutting and coating,
Diffraction shape is enlarged by 10% at the convex part after cutting to 1.1 μm
(FIG. 4). The recess is not enlarged. Similarly, when the protective film 24 was formed under a film forming condition of a thickness of 0.3 μm, the peak became a shape enlarged by 0.3%. Further, when the step amount of the diffraction shape surface 23 is 2 μm, the protective film 2
As a result, when the film No. 4 was formed under the film forming condition of 1 μm, the convex portion was 2.1 μm and the film thickness was 1.1 μm with respect to the concave portion.

【0011】これらの予備実験から、段差量の拡大率K
は、 K=(膜厚/段差量)×10 (段差量+段差量×K/100)=最終段差量 となることが分かった(図5)。
From these preliminary experiments, the enlargement ratio K of the step amount is calculated.
It was found that K = (film thickness / step amount) × 10 (step amount + step amount × K / 100) = final step amount (FIG. 5).

【0012】このことを考慮すると、最終段差量が1μ
mで凹部膜厚が1μmのとき、メッキ層22に形成する
段差量は、0.9μmとすればよいことが分かる。メッ
キ層22をこの条件で加工し、保護膜24を凹部で1μ
mとなる成膜条件で成膜したところ、目的とする最終段
差量1μmの金型を作成することができた。
Considering this, the final step amount is 1 μm.
When m and the thickness of the recess are 1 μm, it can be seen that the step formed on the plating layer 22 may be 0.9 μm. The plating layer 22 is processed under these conditions, and the protection film 24 is
When the film was formed under the film forming condition of m, a mold having a target final step amount of 1 μm could be formed.

【0013】また、別の予備実験の例として、初めに1
μmの段差量の回折形状をおおよそ縮小させた形状で、
メッキ層22を切削し、その後実際の形状を測定した。
このときの段差量は0.92μmであった。成膜後の最
終段差量が1μmとなるようにするには、上記式より、
膜厚は0.8μmとなる。そこで、凹部で0.8μm厚
となるように成膜条件(パワーと時間)を調整して保護
膜24を成膜したところ、目的とする最終段差量1μm
の金型を作成することができた。
As another example of the preliminary experiment,
It is a shape obtained by roughly reducing the diffraction shape with a step size of μm.
The plating layer 22 was cut, and then the actual shape was measured.
The step amount at this time was 0.92 μm. In order to make the final step amount after film formation 1 μm, from the above equation,
The film thickness is 0.8 μm. Then, when the film forming conditions (power and time) were adjusted so that the thickness became 0.8 μm in the concave portion, the protective film 24 was formed.
Was able to create a mold.

【0014】以上はメッキ層22に形成する回折パター
ンの断面形状が平歯車状(ヘリコイド状)の場合の予備
実験の一例であり、異なる回折パターンには、別の予備
実験をして、回折形状面23の形状と保護膜24の膜厚
との関係を見出すことができる。
The above is an example of a preliminary experiment in the case where the cross-sectional shape of the diffraction pattern formed on the plating layer 22 is a spur gear shape (helicoid shape). The relationship between the shape of the surface 23 and the thickness of the protective film 24 can be found.

【0015】[0015]

【発明の効果】本発明によれば、微細な凹凸パターン上
に保護膜を形成する光学素子及び成形型において、保護
膜を形成した後の最終形状が目的とする微細凹凸パター
ンとなる光学素子(成形型)が得られる。
According to the present invention, in an optical element and a mold for forming a protective film on a fine concave-convex pattern, an optical element having a final fine concave-convex pattern after forming the protective film ( Mold) is obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による保護膜を有する光学素子及び光学
素子用成形型の形状例(原理)を示す模式断面図であ
る。
FIG. 1 is a schematic cross-sectional view showing an example of the shape (principle) of an optical element having a protective film according to the present invention and a mold for an optical element.

【図2】比較のために示す、従来の保護膜を有する光学
素子及び光学素子用成形型の形状れいを示す模式断面図
である。
FIG. 2 is a schematic cross-sectional view showing the shape of an optical element having a conventional protective film and a molding die for an optical element, which are shown for comparison.

【図3】成形型母材に微細凹凸パターン及び保護膜を形
成する工程例を示す断面図である。
FIG. 3 is a cross-sectional view showing an example of a process of forming a fine uneven pattern and a protective film on a molding die base material.

【図4】微細凹凸パターンと、その上に成膜する保護膜
との関係を示す模式断面図である。
FIG. 4 is a schematic cross-sectional view showing a relationship between a fine uneven pattern and a protective film formed thereon.

【図5】微細凹凸パターンの段差量と、この凹凸パター
ン上に成膜される保護膜の膜厚と、保護膜を成膜した最
終的な微細凹凸パターンの段差の拡大量と関係の一例を
示すグラフで示す図である。
FIG. 5 shows an example of a relationship between a step amount of a fine concavo-convex pattern, a film thickness of a protective film formed on this concavo-convex pattern, and an enlarged amount of a step of a final fine concavo-convex pattern on which a protective film is formed. It is a figure shown by the graph shown.

【符号の説明】[Explanation of symbols]

11 基材 12 微細凹凸パターン 13 保護膜 13i 理想形状 20 母材 21 非球面形状 22 メッキ層 23 回折形状面 24 保護膜 DESCRIPTION OF SYMBOLS 11 Substrate 12 Fine uneven pattern 13 Protective film 13i Ideal shape 20 Base material 21 Aspherical shape 22 Plating layer 23 Diffractive shape surface 24 Protective film

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 微細な凹凸パターンを有し、該凹凸パタ
ーン上に保護膜を成膜する光学素子において、 上記凹凸パターンを、該凹凸パターン上に保護膜を成膜
したときの膜厚の不均一性を見込んで、保護膜を成膜し
た後の最終凹凸形状が目的とする凹凸パターンとなるよ
うに、該目的とする凹凸パターンとは異なる形状とした
ことを特徴とする微細凹凸パターンを有する光学素子。
1. An optical element having a fine concavo-convex pattern and forming a protective film on the concavo-convex pattern, wherein the concave-convex pattern has a film thickness when the protective film is formed on the concavo-convex pattern. In consideration of uniformity, a fine uneven pattern characterized by having a shape different from the target uneven pattern so that the final uneven shape after forming the protective film becomes the target uneven pattern. Optical element.
【請求項2】 請求項1記載の光学素子において、微細
凹凸パターンは回折パターンである光学素子。
2. The optical element according to claim 1, wherein the fine concavo-convex pattern is a diffraction pattern.
【請求項3】 微細な凹凸パターンを有し、該凹凸パタ
ーン上に保護膜を成膜する光学素子の製造方法におい
て、 上記凹凸パターンを、該凹凸パターン上に保護膜を成膜
したときの膜厚の不均一性を見込んで、保護膜を成膜し
た後の最終凹凸形状が目的とする凹凸パターンとなるよ
うに、該目的とする凹凸パターンとは異なる形状に形成
し、 この凹凸パターン上に、上記保護膜を成膜することを特
徴とする微細凹凸パターンを有する光学素子の製造方
法。
3. A method for manufacturing an optical element having a fine concavo-convex pattern and forming a protective film on the concavo-convex pattern, comprising: forming a film when the protective film is formed on the concavo-convex pattern. In consideration of the non-uniformity of the thickness, the final concave-convex shape after forming the protective film is formed into a shape different from the target concave-convex pattern so that the final concave-convex pattern becomes the target concave-convex pattern. And a method of manufacturing an optical element having a fine concavo-convex pattern, wherein the protective film is formed.
【請求項4】 請求項3記載の製造方法において、保護
膜の成膜条件は、少なくとも微細凹凸パターンの形状、
膜材質をパラメータとして行なう予備実験により、保護
膜を成膜した後の最終凹凸形状が目的とする凹凸パター
ンとなるように定められる光学素子の製造方法。
4. The manufacturing method according to claim 3, wherein the conditions for forming the protective film include:
A method of manufacturing an optical element in which a final unevenness after forming a protective film is determined to be a target unevenness pattern by a preliminary experiment performed using a film material as a parameter.
【請求項5】 請求項4において、保護膜の成膜条件
は、微細凹凸パターンの段差量と、この凹凸パターン上
に成膜される保護膜の膜厚と、保護膜を成膜した最終的
な微細凹凸パターンの段差の拡大量との間に、 拡大率∝(膜厚/段差量) の関係があることを考慮して定められている光学素子の
製造方法。
5. The film forming conditions of the protective film according to claim 4, wherein the step amount of the fine uneven pattern, the thickness of the protective film formed on the uneven pattern, and the final thickness of the formed protective film. A method for manufacturing an optical element, which is determined in consideration of a relationship of an enlargement ratio ∝ (film thickness / amount of a step) between a stepped amount of a fine fine uneven pattern and an amount of an enlarged step.
【請求項6】 成形光学素子に対応する微細な凹凸パタ
ーンを有し、該凹凸パターン上には保護膜が成膜されて
いる光学素子用成形型において、 上記凹凸パターンを、該凹凸パターン上に保護膜を成膜
したときの膜厚の不均一性を見込んで、保護膜を成膜し
た後の最終凹凸形状が目的とする凹凸パターンとなるよ
うに、該目的とする凹凸パターンとは異なる形状とした
ことを特徴とする微細凹凸パターンを有する光学素子用
成形型。
6. A mold for an optical element having a fine uneven pattern corresponding to a molded optical element, and a protective film formed on the uneven pattern, wherein the uneven pattern is formed on the uneven pattern. In consideration of the non-uniformity of the film thickness when the protective film is formed, a shape different from the target uneven pattern such that the final uneven shape after forming the protective film is the desired uneven pattern. A mold for an optical element having a fine concavo-convex pattern.
【請求項7】 請求項6記載の光学素子において、微細
凹凸パターンは回折パターンである光学素子用成形型。
7. An optical element molding die according to claim 6, wherein the fine uneven pattern is a diffraction pattern.
【請求項8】 成形光学素子の微細凹凸パターンに対応
する凹凸パターンを有し、該凹凸パターン上には保護膜
が成膜されている光学素子用成形型の製造方法におい
て、 上記凹凸パターンを、該凹凸パターン上に保護膜を成膜
したときの膜厚の不均一性を見込んで、保護膜を成膜し
た後の最終凹凸形状が目的とする凹凸パターンとなるよ
うに、該目的とする凹凸パターンとは異なる形状に形成
し、 この凹凸パターン上に、上記保護膜を成膜することを特
徴とする微細凹凸パターンを有する光学素子用成形型の
製造方法。
8. A method of manufacturing a mold for an optical element, comprising a concave / convex pattern corresponding to a fine concave / convex pattern of a molded optical element, and a protective film formed on the concave / convex pattern. In consideration of the non-uniformity of the film thickness when the protective film is formed on the concave / convex pattern, the target concave / convex pattern is formed so that the final concave / convex shape after forming the protective film becomes the target concave / convex pattern. A method for producing a mold for an optical element having a fine uneven pattern, wherein the mold is formed in a shape different from the pattern, and the protective film is formed on the uneven pattern.
【請求項9】 請求項8記載の製造方法において、保護
膜の成膜条件は、少なくとも微細凹凸パターンの形状、
膜材質をパラメータとして行なう予備実験により、保護
膜を成膜した後の最終凹凸形状が目的とする凹凸パター
ンとなるように定められる光学素子用成形型の製造方
法。
9. The manufacturing method according to claim 8, wherein the conditions for forming the protective film include:
A method of manufacturing a mold for an optical element, wherein a final uneven shape after forming a protective film is determined to be a target uneven pattern by a preliminary experiment in which a film material is used as a parameter.
【請求項10】 請求項9記載の製造方法において、保
護膜の成膜条件は、保護膜の成膜条件は、微細凹凸パタ
ーンの段差量と、この凹凸パターン上に成膜される保護
膜の膜厚と、保護膜を成膜した最終的な微細凹凸パター
ンの段差の拡大量との間に、 拡大率∝(膜厚/段差量) の関係があることを考慮して定められている光学素子用
成形型の製造方法。
10. The manufacturing method according to claim 9, wherein the film forming conditions of the protective film include: a film forming condition of the protective film; a step amount of the fine unevenness pattern; The optics is determined by considering that there is a relationship of magnification ∝ (film thickness / step difference) between the film thickness and the step enlargement amount of the final fine uneven pattern on which the protective film is formed. A method for manufacturing a molding die for an element.
JP21061697A 1997-08-05 1997-08-05 Optical element with fine uneven pattern, its manufacture, molding die for optical element with fine uneven pattern and manufacture of molding die Pending JPH1148355A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21061697A JPH1148355A (en) 1997-08-05 1997-08-05 Optical element with fine uneven pattern, its manufacture, molding die for optical element with fine uneven pattern and manufacture of molding die

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21061697A JPH1148355A (en) 1997-08-05 1997-08-05 Optical element with fine uneven pattern, its manufacture, molding die for optical element with fine uneven pattern and manufacture of molding die

Publications (1)

Publication Number Publication Date
JPH1148355A true JPH1148355A (en) 1999-02-23

Family

ID=16592284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21061697A Pending JPH1148355A (en) 1997-08-05 1997-08-05 Optical element with fine uneven pattern, its manufacture, molding die for optical element with fine uneven pattern and manufacture of molding die

Country Status (1)

Country Link
JP (1) JPH1148355A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9400396B2 (en) 2010-11-11 2016-07-26 Canon Kabushiki Kaisha Diffractive optical element and image pickup optical system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9400396B2 (en) 2010-11-11 2016-07-26 Canon Kabushiki Kaisha Diffractive optical element and image pickup optical system

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