JPH1135887A - Coating liquid for forming fouling removing film and photocatalyst-supporting substrate produced by using the same - Google Patents

Coating liquid for forming fouling removing film and photocatalyst-supporting substrate produced by using the same

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Publication number
JPH1135887A
JPH1135887A JP20549597A JP20549597A JPH1135887A JP H1135887 A JPH1135887 A JP H1135887A JP 20549597 A JP20549597 A JP 20549597A JP 20549597 A JP20549597 A JP 20549597A JP H1135887 A JPH1135887 A JP H1135887A
Authority
JP
Japan
Prior art keywords
photocatalyst
substrate
solution
polysilazane
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20549597A
Other languages
Japanese (ja)
Inventor
Makoto Nagata
誠 永田
Junji Sato
淳二 佐藤
Masaru Ito
賢 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NE Chemcat Corp
Original Assignee
NE Chemcat Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NE Chemcat Corp filed Critical NE Chemcat Corp
Priority to JP20549597A priority Critical patent/JPH1135887A/en
Publication of JPH1135887A publication Critical patent/JPH1135887A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To industrially and advantageously obtain the subject substrate useful for soundproofing walls of roads, telephone booths, etc., by coating the surface of a substrate with a solution containing fine semiconductor particles having photocatalyst actions and polysilazanes and then curing the formed coating film. SOLUTION: This substrate is obtained by mixing an organic solvent such as preferably m-xylene with a dispersing agent in an amount of 5-50 wt.% based on the weight of photocatalytic fine particles (preferably titanium oxide), mixing the resultant mixture with the photocatalytic fine particles, preparing a fine particle dispersion, then mixing the resultant dispersion with a solution of polysilazanes (a polysilazane adduct to a silicon alkoxide, etc.), suitably diluted with m-xylene, etc., and having 100-50,000, preferably 300-5,000 number- average molecular weight, preparing a solution, dipping a prewashed substrate (a metal, ceramics, a plastic, etc.), in the resultant solution or coating the substrate with the solution by brushing, etc., and drying the formed coating film at a temp. of 80-120 deg.C for 10-60 min.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、汚れ除去皮膜形成
用コーティング液および光触媒担持基板に関し、更に詳
細には、汚れを自動的に除去する光触媒を含む皮膜を形
成するための汚れ除去皮膜形成用コーティング液および
当該コーティング液を基板上に塗布した後、硬化させる
ことにより形成される光触媒担持基板並びにその製造方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating solution for forming a stain removing film and a substrate carrying a photocatalyst, and more particularly, to a stain removing film forming film for forming a film containing a photocatalyst for automatically removing stains. The present invention relates to a coating liquid, a photocatalyst-carrying substrate formed by applying the coating liquid on a substrate, and then curing the coating liquid, and a method for producing the same.

【0002】[0002]

【従来の技術】光触媒作用を有する半導体微粒子(以
下、「光触媒粒子」という)、例えば酸化チタン、酸化
鉄、酸化タングステン、酸化亜鉛、硫化亜鉛、硫化カド
ミウム、チタン酸ストロンチウム、硫化モリブデン等を
用いて殺菌、悪臭の脱臭、防汚、CO2の還元、NOX
SOXの直接分解、汚染河川や湖沼の清浄化を行うこと
はすでに知られている。
2. Description of the Related Art Semiconductor fine particles having a photocatalytic action (hereinafter referred to as "photocatalytic particles"), for example, titanium oxide, iron oxide, tungsten oxide, zinc oxide, zinc sulfide, cadmium sulfide, strontium titanate, molybdenum sulfide and the like are used. sterilization, malodor deodorizing, antifouling, reduction of CO 2, direct decomposition of the NO X and SO X, performing the cleaning of contaminated rivers and lakes are already known.

【0003】このような、光触媒を用いた汚染物の除去
の一例としては、道路の防音壁、ガードレール、標識、
信号機、建物の外壁、電話ボックス等(以下、本明細書
ではこれら構造物等を「基板」と呼称する)の表面に光
触媒を付着させ、ディーゼルエンジン排気ガス中のSO
F(有機溶媒に可溶性の有機物)等の汚れを酸化分解
し、セルフクリーニングする方法が挙げられる。
[0003] Examples of such removal of contaminants using a photocatalyst include soundproof walls of roads, guardrails, signs, and the like.
A photocatalyst is adhered to the surface of a traffic light, an outer wall of a building, a telephone box or the like (hereinafter, these structures and the like are referred to as “substrate” in the present specification), and SO in the exhaust gas of diesel engine is
A method of self-cleaning by oxidatively decomposing dirt such as F (organic substance soluble in an organic solvent) or the like.

【0004】これらの光触媒を防汚する基板表面に付着
させる方法としては、従来、(1)基板表面に光触媒の
前駆体を塗布し、600℃前後で焼き付ける方法、
(2)有機バインダを用いて光触媒を基板表面に担持さ
せる方法、(3)基板がプラスチックスの場合、光触媒
を加熱された基板表面に塗布し、金型で押圧して、光触
媒を基板表面又は表面近傍に埋設する(特開平9−16
4091号)方法等が採られている。
As a method for attaching these photocatalysts to the surface of a substrate to be stain-proofed, there have been conventionally (1) a method of applying a precursor of the photocatalyst to the surface of the substrate and baking it at about 600 ° C.
(2) a method of supporting the photocatalyst on the substrate surface using an organic binder; (3) when the substrate is plastics, apply the photocatalyst to the heated substrate surface and press with a mold to apply the photocatalyst to the substrate surface or Buried near the surface (Japanese Unexamined Patent Publication No. 9-16)
No. 4091).

【0005】しかしながら、(1)の方法は高温で処理
するため、設備や処理に費用がかかり、基板が大きくな
ると処理が困難であるという欠点があった。 また、
(2)の方法は、光触媒作用により、光触媒周辺の有機
バインダが分解し、バインダとしての機能を失い、光触
媒が基板から脱落するため光触媒として寿命が短いとい
う問題点があった。 更に(3)の方法は、金型が必要
となるため設備費が高く、基板が大きくなると処理が困
難であるという問題があった。
However, the method (1) has a drawback that since the treatment is performed at a high temperature, equipment and processing are expensive, and if the substrate is large, the treatment is difficult. Also,
The method (2) has a problem in that the organic binder around the photocatalyst is decomposed due to the photocatalysis, the function as a binder is lost, and the photocatalyst falls off the substrate, so that the life of the photocatalyst is short. Further, the method (3) has a problem that equipment cost is high because a mold is required, and processing is difficult when the substrate is large.

【0006】[0006]

【発明が解決しようとする課題】従って、より長い寿命
を有する光触媒担持基板を、従来の方法に比べ低い温度
でかつ経済的に製造する方法の提供が求められていた。
Accordingly, there is a need for a method for economically producing a photocatalyst-carrying substrate having a longer life at a lower temperature than conventional methods.

【0007】[0007]

【課題を解決するための手段】本発明者らは上記課題を
解決するため鋭意検討したところ、光触媒粒子を担持す
るためのバインダとしてポリシラザン類を用い、基板上
に塗布した後硬化させればポリシラザン類がセラミック
スに代わるため、有機バインダを利用した場合の問題点
は全て解消することを見出し、本発明を完成した。
Means for Solving the Problems The present inventors have conducted intensive studies to solve the above-mentioned problems. As a result, polysilazane is used as a binder for supporting photocatalyst particles. The present invention has been found to solve all the problems when an organic binder is used, since the ceramics replace ceramics, and completed the present invention.

【0008】すなわち本発明の目的は、光触媒粒子とポ
リシラザン類を含有する汚れ除去皮膜形成用コーティン
グ液を提供することである。また、本発明の他の目的
は、表面に光触媒粒子を分散したポリシラザン硬化被膜
を形成してなる光触媒担持基板を提供することである。
更に、本発明の別の目的は、基板の表面に、上記コーテ
ィング液を塗布し、次いでこれを硬化させる光触媒担持
基板の製造方法を提供することである。
[0008] That is, an object of the present invention is to provide a coating liquid for forming a stain removal film containing photocatalyst particles and polysilazanes. It is another object of the present invention to provide a photocatalyst-carrying substrate having a cured polysilazane film having photocatalyst particles dispersed on the surface.
Still another object of the present invention is to provide a method for producing a photocatalyst-carrying substrate in which the above-mentioned coating solution is applied to the surface of a substrate and then cured.

【0009】[0009]

【発明の実施の形態】本発明の汚れ除去皮膜形成用コー
ティング液(以下、「コーティング液」という)は、公
知方法に従い、光触媒粒子とポリシラザン類を混合する
ことにより製造される。
BEST MODE FOR CARRYING OUT THE INVENTION The coating liquid for forming a stain-removing film of the present invention (hereinafter referred to as "coating liquid") is produced by mixing photocatalyst particles and polysilazanes according to a known method.

【0010】本発明に用いられる光触媒作用を有する半
導体微粒子(光触媒粒子)としては、酸化チタン(Ti
2)、酸化鉄(Fe23)、酸化タングステン(W
2)、酸化亜鉛(ZnO)、硫化亜鉛(ZnS)、硫
化カドミウム(CdS)、チタン酸ストロンチウム(S
rTiO2)、硫化モリブデン(MoS2)等の従来知ら
れた光触媒の微粒子を用いることができる。 これらの
中では酸化チタンが好ましく用いられる。
The semiconductor fine particles (photocatalyst particles) having a photocatalytic action used in the present invention include titanium oxide (Ti).
O 2 ), iron oxide (Fe 2 O 3 ), tungsten oxide (W
O 2 ), zinc oxide (ZnO), zinc sulfide (ZnS), cadmium sulfide (CdS), strontium titanate (S
Known fine particles of a photocatalyst such as rTiO 2 ) and molybdenum sulfide (MoS 2 ) can be used. Among these, titanium oxide is preferably used.

【0011】一方、ポリシラザン類とは、次の一般式On the other hand, polysilazanes are represented by the following general formula:

【化1】 (式中、R1、R2及びR3は、それぞれ独立に水素原
子;アルキル基、アルケニル基、シクロアルキル基、ア
リール基等の珪素又は窒素と結合する基が炭素である
基;アルキルシリル基;アルキルアミノ基又はアルコキ
シ基を示す。ただし、R1、R2及びR3のうち少なくと
も1つは水素原子である)で表わされる単位からなる主
骨格を有する数平均分子量が100〜5万のポリシラザ
ンから誘導される化合物である。
Embedded image (In the formula, R 1 , R 2 and R 3 are each independently a hydrogen atom; a group in which a group bonding to silicon or nitrogen such as an alkyl group, an alkenyl group, a cycloalkyl group and an aryl group is carbon; an alkylsilyl group An alkylamino group or an alkoxy group, provided that at least one of R 1 , R 2 and R 3 is a hydrogen atom) and has a number average molecular weight of 100 to 50,000. It is a compound derived from polysilazane.

【0012】本発明において使用されるポリシラザン類
とは、例えば、上記ポリシラザンと珪素アルコキシドを
加熱反応させて得られる珪素アルコキシド付加ポリシラ
ザン(特開平5−238827号)、上記ポリシラザン
とグリシドールを加熱反応させて得られるグリシドール
付加ポリシラザン(特開平6−122852号)、上記
ポリシラザンとアルコールを加熱反応させて得られるア
ルコール付加ポリシラザン(特開平6−240208
号)、上記ポリシラザンとニッケル、チタン、白金、ロ
ジウム等を含む金属カルボン酸塩を反応させて得られる
金属カルボン酸塩/ポリシラザン(特開平6−2991
18号)、上記ポリシラザンとアセチルアセトナト錯体
(金属としてNi、Pt、Pd、Al、Rh等を含む)
を加熱反応させて得られるアセチルアセトナト錯体付加
ポリシラザン(特開平6−306329号)等の300
℃以下で焼成することができるポリシラザン誘導体を意
味する。 また、これのみに限らず、前記の温度で焼成
することができる他のポリシラザン誘導体をも含む。
The polysilazane used in the present invention is, for example, a polysilazane-added polysilazane obtained by heating and reacting the above-mentioned polysilazane and silicon alkoxide (JP-A-5-238827), and a heating reaction of the above-mentioned polysilazane and glycidol. The resulting glycidol-added polysilazane (JP-A-6-122852) and the alcohol-added polysilazane obtained by heating and reacting the above-mentioned polysilazane with an alcohol (JP-A-6-240208)
Metal carboxylate / polysilazane obtained by reacting the above polysilazane with a metal carboxylate containing nickel, titanium, platinum, rhodium or the like (Japanese Patent Laid-Open No. 6-2991)
No. 18), the above-mentioned polysilazane and acetylacetonato complex (including Ni, Pt, Pd, Al, Rh and the like as metals)
Acetylacetonate complex-added polysilazane (JP-A-6-306329) and the like obtained by reacting
It means a polysilazane derivative that can be fired at a temperature of not more than ° C. Further, the invention is not limited thereto, and includes other polysilazane derivatives that can be fired at the above-mentioned temperature.

【0013】これらのポリシラザン類の中でも数平均分
子量が300〜5000のものを用いるのが好ましく、
更に数平均分子量1000〜1400のものが好ましく
用いられる。
[0013] Among these polysilazanes, those having a number average molecular weight of 300 to 5000 are preferably used.
Further, those having a number average molecular weight of 1,000 to 1,400 are preferably used.

【0014】上記の光触媒微粒子と、ポリシラザン類を
適宜混合することにより本発明の汚れ除去皮膜形成用コ
ーティング液が製造されるが、ポリシラザン誘導体(ポ
リシラザン類)は、分子量及び分子構造に応じて異なる
粘度を有する液体ないしは固体であるため、一般にはm
−キシレン、o−キシレン等の各種有機溶剤により適当
に希釈したポリシラザン類溶液として取り扱うことが好
ましい。 もちろん、ポリシラザン類が低粘度の液体の
場合はそのままポリシラザン類溶液として取り扱うこと
ができることはいうまでもない。
The coating liquid for forming a stain-removing film of the present invention is produced by appropriately mixing the above photocatalyst fine particles and polysilazane. The polysilazane derivative (polysilazane) has a different viscosity depending on the molecular weight and molecular structure. Is a liquid or solid having the general formula
It is preferably handled as a polysilazane solution appropriately diluted with various organic solvents such as -xylene and o-xylene. Needless to say, when the polysilazane is a liquid having a low viscosity, it can be handled as a polysilazane solution as it is.

【0015】また、上記のポリシラザン類の溶液に直接
光触媒微粒子を混合することもできるが、コーティング
液中に光触媒微粒子をより均一に分散させるために、ポ
リシラザン類溶液とは別に、m−キシレン、o−キシレ
ン等の各種有機溶剤に分散剤を混合し、それに光触媒微
粒子を混合した微粒子分散液を調製し、しかる後にポリ
シラザン類溶液と微粒子分散液とを混合してコーティン
グ液とするのが好ましい。
Further, photocatalyst fine particles can be directly mixed with the above-mentioned polysilazane solution, but in order to disperse the photocatalyst fine particles more evenly in the coating solution, m-xylene, o -It is preferable to prepare a fine particle dispersion by mixing a dispersant with various organic solvents such as xylene, and photocatalytic fine particles, and then mix the polysilazane solution and the fine particle dispersion to form a coating liquid.

【0016】この微粒子分散液の調製は、有機溶剤に分
散剤及び光触媒微粒子を添加し、0.5〜10時間、好
ましくは1〜5時間混合して微粒子分散液とすることに
より行われる。 更に、微粒子分散液の調製に用いる分
散剤に特に制限はなく、用いる有機溶剤に可溶性で焼成
処理により二酸化炭素と水を生成して消散し、生成する
焼成生成物に悪影響を及ぼさない有機高分子化合物であ
ればいずれも使用することができる。 市販の商品名と
しては、例えばゼネカ社製ソルスパース#3000、#
9000、#17000が挙げられ、好ましくは#90
00及び#17000が使用される。 この分散剤の量
は、微粒子重量に対して5〜50重量%が好ましく、特
に10〜30重量%が好ましい。
The fine particle dispersion is prepared by adding a dispersant and photocatalyst fine particles to an organic solvent and mixing for 0.5 to 10 hours, preferably 1 to 5 hours, to obtain a fine particle dispersion. Furthermore, there is no particular limitation on the dispersant used for preparing the fine particle dispersion, and an organic polymer that is soluble in the organic solvent used, generates and dissipates carbon dioxide and water by the calcination treatment, and does not adversely affect the resulting calcination product. Any compound can be used. Commercially available trade names include, for example, Solsperse # 3000, #
9000 and # 17000, preferably # 90
00 and # 17000 are used. The amount of the dispersant is preferably from 5 to 50% by weight, particularly preferably from 10 to 30% by weight, based on the weight of the fine particles.

【0017】かくして得られた微粒子分散液とm−キシ
レン、o一キシレン等の有機溶剤で適当に希釈されたポ
リシラザン類溶液とを混合してコーティング液とする。
ポリシラザン類を希釈する有機溶剤の量、希釈された
ポリシラザン類溶液と微粒子分散液の混合比率は、所望
する被膜の厚さ、被膜に分散される微粒子の量、微粒子
の分散状態により適宜決めればよい。 また、微粒子分
散液中の微粒子の量、コーティング液中の微粒子の量に
も特に制限はなく、用途によって要求される光触媒能に
応じて決めればよい。
The fine particle dispersion thus obtained is mixed with a polysilazane solution appropriately diluted with an organic solvent such as m-xylene or o-xylene to prepare a coating solution.
The amount of the organic solvent for diluting the polysilazane, the mixing ratio of the diluted polysilazane solution and the fine particle dispersion may be appropriately determined depending on the desired film thickness, the amount of the fine particles dispersed in the film, and the dispersion state of the fine particles. . The amount of the fine particles in the fine particle dispersion and the amount of the fine particles in the coating liquid are not particularly limited, and may be determined according to the photocatalytic ability required depending on the application.

【0018】次に、上記コーティング液を用いた光触媒
担持基板の製造方法について説明する。まず、上記のコ
ーティング液を基板に塗布するに先立って、基板表面を
清浄にすることが好ましい。 この清浄化処理は、市販
の中性洗剤で脱脂した後、純水等で洗浄し、80〜10
0℃で20〜60分乾燥すればよい。 あるいは、アル
コール、キシレン等の有機溶剤で洗浄してもよい。
Next, a method for manufacturing a photocatalyst-carrying substrate using the above-mentioned coating solution will be described. First, it is preferable to clean the surface of the substrate before applying the coating liquid to the substrate. This cleaning treatment is performed by degreased with a commercially available neutral detergent, and then washed with pure water or the like.
What is necessary is just to dry at 0 degreeC for 20 to 60 minutes. Alternatively, it may be washed with an organic solvent such as alcohol and xylene.

【0019】光触媒担持基板の製造原料である基板の材
料には特に制約はなく、金属、ガラス、セラミックス、
プラスチックスを用途に応じて適宜選択すればよい。
この基板は、主に屋外において、汚れやすい環境下で使
用される、板、成型体、構造物等であり、その例として
は、道路の防音壁、ガードレール、道路標識、信号機、
建物の外壁、電話ボックス等が挙げられる。
There are no particular restrictions on the material of the substrate, which is the raw material for the production of the photocatalyst-carrying substrate, and metals, glass, ceramics,
What is necessary is just to select a plastics suitably according to a use.
This substrate is a board, a molded body, a structure, and the like, which are mainly used outdoors and in an environment that is easily contaminated. Examples of the board include a soundproof wall of a road, a guardrail, a road sign, a traffic light,
An outer wall of a building, a telephone booth and the like can be mentioned.

【0020】次いで、コーティング液を基板へ塗布され
るが、塗布に当たって採用される方法に特に制約はな
く、浸漬、刷毛塗り、流し塗り、スプレー塗り等従来慣
用されている方法を基板の形状、大きさに応じて適宜選
択することができる。
Next, a coating solution is applied to the substrate. There is no particular limitation on the method used for the application, and a conventionally used method such as dipping, brush coating, flow coating, or spray coating is applied to the shape and size of the substrate. It can be appropriately selected according to the situation.

【0021】このように塗布された基板は、更に乾燥
し、硬化処理される。 乾燥は80〜120℃で10〜
60分行えばよい。 硬化処理条件は、用いられる基板
材料に応じて適宜選択することができる。 例えば、空
気中室温で1〜3日放置するか空気中100〜250℃
で1〜3時間焼成すれば良く、あるいは、湿潤空気中9
0〜120℃で3〜5時間加熱してもよい。
The substrate thus applied is further dried and cured. Dry at 80-120 ° C for 10
All you have to do is 60 minutes. Curing treatment conditions can be appropriately selected according to the substrate material used. For example, leave in air at room temperature for 1 to 3 days or in air at 100 to 250 ° C.
Baking for 1 to 3 hours, or 9 in humid air.
You may heat at 0-120 degreeC for 3-5 hours.

【0022】このようにして、コーティング液中のポリ
シラザンは空気中での焼成による酸化や湿潤空気中での
加熱による加水分解、室温放置による酸化と加水分解に
より硬化し、その表面及び内部に光触媒が分散している
Si−O系又はSi−N−O系セラミックスの緻密な被
膜となる。 この被膜は耐食性、耐熱性、耐摩耗性に優
れており、基板との密着性が高い。 また、被膜がセラ
ミックスであるため光触媒によって分解され、劣化する
こともない。 従って、光触媒として永続的に使用でき
る。
In this manner, the polysilazane in the coating solution is cured by oxidation in air, hydrolysis by heating in humid air, and oxidation and hydrolysis in room temperature, and a photocatalyst is deposited on the surface and inside. It becomes a dense coating of dispersed Si-O-based or Si-NO-based ceramics. This coating has excellent corrosion resistance, heat resistance, and abrasion resistance, and has high adhesion to a substrate. Further, since the coating is made of ceramics, it is not decomposed by the photocatalyst and deteriorated. Therefore, it can be used permanently as a photocatalyst.

【0023】斯くして得られる本発明の光触媒担持基板
は、被膜自体の耐食性等が優れ、しかも被膜中に分散さ
れた光触媒粒子の触媒としての作用が長期間維持される
ため、主に屋外で汚れの付着しやすい物品、例えば道路
の防音壁、ガードレール、道路標識、信号機、建物の外
壁、電話ボックス等に有利に適用されるものである。
The photocatalyst-carrying substrate of the present invention thus obtained has excellent corrosion resistance and the like of the coating film itself, and furthermore, the photocatalyst particles dispersed in the coating film can maintain the action as a catalyst for a long period of time. The present invention is advantageously applied to articles to which dirt easily adheres, for example, soundproof walls of roads, guardrails, road signs, traffic lights, outer walls of buildings, telephone boxes, and the like.

【0024】[0024]

【実施例】以下に実施例を挙げて本発明を具体的に説明
するが、本発明はこれらに限定されるものではない。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

【0025】実 施 例 1 (1)酸化チタン分散液の調製 酸化チタン(日本アエロジル社製アエロジルP−25)
5g、分散剤(ゼネカ杜製ソルスパース#17000)
1g及びm−キシレン50gをボールミルで3時間混合
し、酸化チタン分散液を調製した。
EXAMPLE 1 (1) Preparation of Titanium Oxide Dispersion Titanium oxide (Aerosil P-25 manufactured by Nippon Aerosil Co., Ltd.)
5 g, dispersant (Zeneca Mori Solsperse # 17000)
1 g and 50 g of m-xylene were mixed in a ball mill for 3 hours to prepare a titanium oxide dispersion.

【0026】(2)光触媒担持基板の製造 20重量%のポリシラザン類(東燃製N−L114;低
温焼成タイプ;数平均分子量900)m−キシレン溶液
を調製し、この溶液と(1)の酸化チタン分散液を重量
比1:2で混合し、コーティング液とした。 次に、1
05×85×3mmのソーダライム製ガラス板を市販の
中性洗剤で脱脂し、純水で洗浄した後、80℃で1時間
乾燥した。 このガラス板に上記のコーティング液を流
し塗りで塗布し、次いで湿潤空気中、97℃で3時間加
熱し、ガラス板上に酸化チタンが分散された被膜を形成
した。 被膜のTiO2/SiO2(モル比)は0.6であ
った。
(2) Production of Photocatalyst-Supporting Substrate A 20% by weight polysilazane (N-L114 manufactured by Tonen; low-temperature firing type; number average molecular weight: 900) m-xylene solution was prepared, and this solution and the titanium oxide of (1) were prepared. The dispersion liquid was mixed at a weight ratio of 1: 2 to obtain a coating liquid. Then, 1
A 05 × 85 × 3 mm soda lime glass plate was degreased with a commercially available neutral detergent, washed with pure water, and then dried at 80 ° C. for 1 hour. The above coating solution was applied to the glass plate by flowing coating, and then heated at 97 ° C. for 3 hours in humid air to form a film in which titanium oxide was dispersed on the glass plate. The TiO 2 / SiO 2 (molar ratio) of the coating was 0.6.

【0027】実 施 例 2 実施例1(2)において、ポリシラザン溶液と酸化チタ
ン分散液を重量比1:4にした以外は実施例1と同様に
して、ガラス板上に酸化チタンが分散された被膜を形成
した。 被膜のTiO2/SiO2(モル比)は1.2であ
った。
Example 2 Titanium oxide was dispersed on a glass plate in the same manner as in Example 1 (2) except that the weight ratio of the polysilazane solution and the titanium oxide dispersion was 1: 4. A coating was formed. The TiO 2 / SiO 2 (molar ratio) of the coating was 1.2.

【0028】試 験 例 1 光触媒性試験:実施例1および2で得た被膜の光触媒能
を、硝酸銀(AgNO3)の還元性能を試験することに
より評価した。シャーレに入れた0.4重量%濃度の硝
酸銀水溶液30mlに各実施例の光触媒担持基板を浸漬
し、太陽光照射下、硝酸銀水溶液の経時変化を観察し
た。 比較例としては、無処理のソーダライム製ガラス
板を用いた。 その結果を表1に示す。
TEST EXAMPLE 1 Photocatalytic Test: The photocatalytic ability of the coatings obtained in Examples 1 and 2 was evaluated by testing the reduction performance of silver nitrate (AgNO 3 ). The photocatalyst-carrying substrate of each example was immersed in 30 ml of a 0.4% by weight silver nitrate aqueous solution placed in a petri dish, and the temporal change of the silver nitrate aqueous solution was observed under irradiation with sunlight. As a comparative example, an untreated soda lime glass plate was used. Table 1 shows the results.

【0029】[0029]

【表1】 [Table 1]

【0030】この結果より、実施例1及び2の基板は硝
酸銀を還元分解し、光触媒能を有することが示された。
The results show that the substrates of Examples 1 and 2 decompose silver nitrate reductively and have photocatalytic activity.

【0031】[0031]

【発明の効果】本発明の光触媒担持基板は、セラミック
スをバインダに用いているため、光触媒によってバイン
ダが劣化することがなく、長い期間にわたって光触媒粒
子を保持し、寿命の長い触媒として作用させることがで
きる。従って、主に屋外で汚れの付着しやすい物品の基
板、例えば道路の防音壁、ガードレール、道路標識、信
号機、建物の外壁、電話ボックス等に有利に適用される
ものである。
The photocatalyst-supporting substrate of the present invention uses ceramics for the binder, so that the binder is not deteriorated by the photocatalyst, the photocatalyst particles can be held for a long period of time, and the photocatalyst-supporting substrate can function as a long-life catalyst. it can. Therefore, the present invention is advantageously applied to a substrate of an article to which dirt easily adheres, for example, a soundproof wall of a road, a guardrail, a road sign, a traffic light, an outer wall of a building, a telephone box, and the like.

【0032】また、本発明方法によれば、300〜25
0℃以下という低温で処理できるので、対象となる基板
材料に制約がなく、プラスチックスのような耐熱性の低
い材料も使用でき、多くの基板にセルフクリーニング能
を与えることができる。 以 上
Further, according to the method of the present invention, 300 to 25
Since the treatment can be performed at a low temperature of 0 ° C. or less, there is no restriction on the material of the target substrate, a material having low heat resistance such as plastics can be used, and self-cleaning ability can be given to many substrates. that's all

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 光触媒作用を有する半導体微粒子とポ
リシラザン類を含有する汚れ除去皮膜形成用コーティン
グ液。
1. A coating liquid for forming a stain removal film, comprising semiconductor fine particles having a photocatalytic action and polysilazanes.
【請求項2】 光触媒作用を有する半導体微粒子が酸化
チタンである請求項第1項記載の汚れ除去皮膜形成用コ
ーティング液。
2. The coating liquid for forming a stain removing film according to claim 1, wherein the semiconductor fine particles having a photocatalytic action are titanium oxide.
【請求項3】 表面に光触媒を分散したポリシラザン硬
化被膜を形成してなる光触媒担持基板。
3. A photocatalyst-carrying substrate having a cured polysilazane film having a photocatalyst dispersed on its surface.
【請求項4】 光触媒が酸化チタンである請求項第1項
記載の光触媒担持基板。
4. The photocatalyst-carrying substrate according to claim 1, wherein the photocatalyst is titanium oxide.
【請求項5】 基板の表面に、光触媒作用を有する半導
体微粒子とポリシラザン類を含有する溶液を塗布し、次
いでこれを硬化させることを特徴とする光触媒担持基板
の製造方法。
5. A method for producing a photocatalyst-carrying substrate, comprising applying a solution containing semiconductor fine particles having photocatalytic activity and polysilazanes to the surface of the substrate, and then curing the solution.
【請求項6】 光触媒作用を有する半導体微粒子が酸化
チタンである請求項第5項記載の光触媒担持基板の製造
方法。
6. The method for producing a photocatalyst-carrying substrate according to claim 5, wherein the semiconductor fine particles having a photocatalytic action are titanium oxide.
JP20549597A 1997-07-16 1997-07-16 Coating liquid for forming fouling removing film and photocatalyst-supporting substrate produced by using the same Pending JPH1135887A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20549597A JPH1135887A (en) 1997-07-16 1997-07-16 Coating liquid for forming fouling removing film and photocatalyst-supporting substrate produced by using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20549597A JPH1135887A (en) 1997-07-16 1997-07-16 Coating liquid for forming fouling removing film and photocatalyst-supporting substrate produced by using the same

Publications (1)

Publication Number Publication Date
JPH1135887A true JPH1135887A (en) 1999-02-09

Family

ID=16507813

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH1135887A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11227091A (en) * 1998-02-13 1999-08-24 Ne Chemcat Corp Manufacture of photocatalyst carrying base plate
WO2005085375A1 (en) * 2004-03-04 2005-09-15 Clariant International Ltd Coating for metal surfaces, method for the production thereof and use thereof as a self-cleaning protective layer, particularly for the rims of automobiles

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11227091A (en) * 1998-02-13 1999-08-24 Ne Chemcat Corp Manufacture of photocatalyst carrying base plate
WO2005085375A1 (en) * 2004-03-04 2005-09-15 Clariant International Ltd Coating for metal surfaces, method for the production thereof and use thereof as a self-cleaning protective layer, particularly for the rims of automobiles
JP2007526378A (en) * 2004-03-04 2007-09-13 クラリアント インターナショナル リミテッド Metal surface paint, process for its production and its use as a self-cleaning protective layer, especially for automotive rims

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