JPH11344734A - Optical axis position corrector and second harmonic generator - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an external resonator type second harmonic generator capable of carrying out optical axis correction work of a basis wave laser beam without accompanied with human aid. SOLUTION: This second harmonic generator has parallel plane substrates 24, 25 which are arranged in an optical waveguide route of the basic wave laser beam ω1 to a ring resonator 1, angle regulating means 26, 27 which turn these parallel plane substrates 24, 25, an optical axis position detector 20 which detects the optical axis position of the basic wave laser beam ω1 and an angle controller 28 which operates these angle regulating means 26, 27 in accordance with a signal 20s from the optical axis position detector. The angles of the parallel plane substrates 24, 25 are finely adjusted according to the optical axis position of the basic wave laser beam ω1 and the optical axis position of the basic wave laser beam ω1 with respect to the ring resonator 1 is corrected without entailing the human aid, to secure the output of the second harmonic ω2 generated by a nonlinear optical crystal 2.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical axis position correcting device and a second harmonic generator.

[0002]

2. Description of the Related Art FIG. 6 shows an example of a conventional external resonator type second harmonic generation device. This second harmonic generation device includes a ring resonator ₁ for resonating a fundamental laser beam ω1 and a basic resonator. BBO from wave laser beam omega ₁ to generate a second harmonic omega ₂ (beta
-BaB ₂ O ₄ ) crystal and the like.

The ring resonator 1 includes an input coupler (partially transmitting plane mirror) 3, a tweeter mirror (total reflection concave mirror) 4, an output coupler (dichroic concave mirror) 5, and a total reflection plane mirror 6. have.

The tweeter mirror 4 is configured so that the distance between the input coupler 3 and the output coupler 5 can be finely adjusted by a piezo element.

The input coupler 3 receives a fundamental laser beam ω ₁ having a wavelength of 550 nm continuously oscillated from a ring dye laser device 7 excited by an argon ion laser.
Total reflection mirror 8, second total reflection mirror 9, broadband λ /
The light enters through two plates 10, a mode matching lens 11, a third total reflection mirror 12, and a fourth total reflection mirror 13.

The wavelength 2 generated by the nonlinear optical crystal 2
The second harmonic ω ₂ (ultraviolet laser light) of 75 nm is emitted from the output coupler 5 to the outside of the ring resonator 1.

[0007]

In the external resonator type second harmonic generator shown in FIG. 6, a relative optical axis shift of the fundamental laser light ω ₁ with respect to the ring resonator 1 occurs for some reason. may not reproduce the second output harmonic omega ₂ is the next day, the output of the second harmonic omega ₂ may be reduced during operation.

[0008] When such an event occurs, appropriate manually angle of the total reflection mirror 8,9,12,13 arranged on fundamental laser beam omega ₁ of the light path to the ring resonator 1 in which adjusting time consuming to the optical axis position correcting work of the fundamental laser omega _1, it was difficult to put to practical use of an external resonance type second harmonic generator.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and requires a human operator to correct the optical axis position of a light beam such as a laser beam for a laser light utilization device such as an external resonator type second harmonic generation device. The aim is to be able to do without intervention.

[0010]

According to a first aspect of the present invention, there is provided an optical axis position correcting apparatus, comprising: a first reflecting mirror for sequentially reflecting a light beam;
A first reflecting mirror, a first angle adjusting means for rotating the first reflecting mirror in a horizontal plane and a vertical plane, and a second reflecting mirror for rotating the second reflecting mirror in a horizontal plane and a vertical plane. 2
Angle adjusting means, an optical axis position detector for detecting the optical axis position of the light beam emitted from the second reflecting mirror to the light beam utilization device, and a first optical axis position detector based on a signal from the optical axis position detector.
And an angle controller for operating the second angle adjusting means.

In the optical axis position correcting apparatus according to a second aspect of the present invention, the first optical substrate and the second optical substrate disposed in the light guide path of the light beam, and the first optical substrate are horizontally aligned. A first angle adjusting means capable of rotating the second optical substrate in a vertical plane, and a second angle adjusting means capable of rotating the second optical substrate in a vertical plane.
An optical axis position detector for detecting an optical axis position of a light beam emitted from the second optical substrate to the light beam utilization device; a first angle adjusting means based on a signal from the optical axis position detector; And an angle controller for operating the angle adjusting means.

In the optical axis position correcting device according to a third aspect of the present invention, the optical substrate disposed in the light guide path of the light beam, and the angle at which the optical substrate can be rotated in a horizontal plane and a vertical plane. Adjusting means, an optical axis position detector for detecting the optical axis position of the light beam emitted from the optical substrate to the light beam utilization device, and operating the angle adjusting means based on a signal from the optical axis position detector And an angle controller.

In a second high-long-wave generator according to a fourth aspect of the present invention, a ring resonator for resonating a fundamental wave laser beam having a continuous oscillation single frequency and a second harmonic is generated from the fundamental wave laser beam. In a second harmonic generation device having a non-linear optical crystal, a first reflection mirror and a second reflection mirror for sequentially reflecting a fundamental laser beam and guiding the laser light to a ring resonator, and a first reflection mirror in a horizontal plane and A first angle adjusting means capable of rotating in a vertical plane, a second angle adjusting means capable of rotating the second reflecting mirror in a horizontal plane and in a vertical plane, and a ring from the second reflecting mirror An optical axis position detector for detecting an optical axis position of the fundamental laser light emitted to the resonator, and a first angle adjusting means and a second angle adjusting means operated based on a signal from the optical axis position detector Angle controller.

In a second high-long-wave generator according to a fifth aspect of the present invention, a ring resonator for resonating a continuous wave single-frequency fundamental wave laser beam, and a second harmonic is generated from the fundamental wave laser beam. In a second harmonic generation device having a non-linear optical crystal, a first reflection mirror and a second reflection mirror for sequentially reflecting a fundamental laser beam and guiding the laser light to a ring resonator, and a first reflection mirror in a horizontal plane and A first angle adjusting means capable of rotating in a vertical plane, a second angle adjusting means capable of rotating the second reflecting mirror in a horizontal plane and in a vertical plane, and a ring from the second reflecting mirror An optical axis position detector for detecting the optical axis position of the fundamental laser light emitted to the resonator; a light intensity detector for detecting the light intensity of the fundamental laser light in the ring resonator; and the optical axis position Based on the signals from the detector and the light intensity detector. And a angle controller for actuating the first angle adjusting means and the second angle adjusting means.

In a second high-long-wave generator according to a sixth aspect of the present invention, a ring resonator for resonating a continuous wave single-frequency fundamental wave laser beam, and a second harmonic is generated from the fundamental wave laser beam. In a second harmonic generation device having a non-linear optical crystal, a first reflection mirror and a second reflection mirror for sequentially reflecting a fundamental laser beam and guiding the laser light to a ring resonator, and a first reflection mirror in a horizontal plane and A first angle adjusting means capable of rotating in a vertical plane, a second angle adjusting means capable of rotating the second reflecting mirror in a horizontal plane and in a vertical plane, and a ring from the second reflecting mirror An optical axis position detector for detecting an optical axis position of the fundamental laser light emitted to the resonator; an output intensity detector for detecting an output intensity of a second harmonic generated by the nonlinear optical crystal; Position detector and output intensity detector? And a angle controller for actuating the first angle adjusting means and the second angle adjusting means based on the signal.

In a second high-long-wave generator according to a seventh aspect of the present invention, a ring resonator that resonates a continuous-wave single-frequency fundamental laser beam, and a second harmonic is generated from the fundamental laser beam. In a second harmonic generation device having a non-linear optical crystal, a first reflection mirror and a second reflection mirror for sequentially reflecting a fundamental laser beam and guiding the laser light to a ring resonator, and a first reflection mirror in a horizontal plane and A first angle adjusting means capable of rotating in a vertical plane, a second angle adjusting means capable of rotating the second reflecting mirror in a horizontal plane and in a vertical plane, and a ring from the second reflecting mirror An optical axis position detector that detects the optical axis position of the fundamental laser light emitted to the resonator, a light intensity detector that detects the light intensity of the fundamental laser light in the ring resonator, and a nonlinear optical crystal Second
An output intensity detector for detecting an output intensity of a harmonic, and first and second angle adjustment units based on signals from the optical axis position detector, the light intensity detector, and the output intensity detector. An actuating angle controller.

Further, in the second high-long-wave generator according to claim 8 of the present invention, a ring resonator for resonating a continuous wave single-frequency fundamental wave laser beam, and a second harmonic from the fundamental wave laser beam are generated. A first optical substrate and a second optical substrate disposed on a light guide path of a fundamental laser beam to a ring resonator; A first angle adjusting means for rotating the substrate on a horizontal inner surface, a second angle adjusting means for rotating the second optical substrate in a vertical plane, and a ring resonator from the second optical substrate. An optical axis position detector for detecting the optical axis position of the fundamental wave laser light emitted to the light source, and an angle for operating the first angle adjusting means and the second angle adjusting means based on a signal from the optical axis position detector And a controller.

In a second high-long-wave generator according to a ninth aspect of the present invention, a ring resonator that resonates a continuous-wave single-frequency fundamental-wave laser beam, and a second harmonic is generated from the fundamental-wave laser beam. In a second harmonic generation device having a nonlinear optical crystal, a first optical substrate and a second optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and a first optical substrate First angle adjusting means capable of rotating in a horizontal plane, second angle adjusting means capable of rotating the second optical substrate in a vertical plane, and emission from the second optical substrate to the ring resonator An optical axis position detector for detecting the optical axis position of the fundamental wave laser light to be detected, a light intensity detector for detecting the light intensity of the fundamental wave laser light in the ring resonator, the optical axis position detector and the light First angle adjusting means and second angle adjusting means based on a signal from the intensity detector; And a angle controller for operating the angle adjusting means.

In the second high-long-wave generator according to a tenth aspect of the present invention, a ring resonator for resonating a fundamental wave laser beam having a continuous oscillation single frequency, and a second harmonic is generated from the fundamental wave laser beam. In a second harmonic generation device having a nonlinear optical crystal, a first optical substrate and a second optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and a first optical substrate First that can be rotated in the horizontal plane
Angle adjusting means, second angle adjusting means capable of rotating the second optical substrate in a vertical plane, and optical axis position of the fundamental laser light emitted from the second optical substrate to the ring resonator An optical axis position detector for detecting an output intensity, an output intensity detector for detecting an output intensity of a second harmonic generated by the nonlinear optical crystal,
An angle controller for operating the first angle adjusting means and the second angle adjusting means based on signals from the optical axis position detector and the output intensity detector.

In a second high-long-wave generator according to a eleventh aspect of the present invention, a ring resonator for resonating a fundamental wave laser beam having a continuous oscillation single frequency and a second harmonic is generated from the fundamental wave laser beam. In a second harmonic generation device having a nonlinear optical crystal, a first optical substrate and a second optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and a first optical substrate First that can be rotated in the horizontal plane
Angle adjusting means, second angle adjusting means capable of rotating the second optical substrate in a vertical plane, and optical axis position of the fundamental laser light emitted from the second optical substrate to the ring resonator , A light intensity detector for detecting the light intensity of the fundamental laser light in the ring resonator, and an output intensity detection for detecting the output intensity of the second harmonic generated by the nonlinear optical crystal And an angle controller for operating the first angle adjusting means and the second angle adjusting means based on signals from the optical axis position detector, the light intensity detector and the output intensity detector.

Further, in the second harmonic generation device according to the present invention, a ring resonator for resonating a continuous wave single frequency fundamental laser beam, and a second harmonic wave from the fundamental wave laser beam are provided. A second harmonic generation device having a nonlinear optical crystal for generating an optical substrate, an optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is disposed in a horizontal plane and a vertical plane. Angle adjusting means that can be rotated, an optical axis position detector that detects the optical axis position of the fundamental laser light emitted from the optical substrate to the ring resonator,
An angle controller for operating an angle adjusting means based on a signal from the optical axis position detector.

According to the second harmonic generation device of the present invention, a ring resonator for resonating a continuous wave single frequency fundamental wave laser beam, and a second harmonic is generated from the fundamental wave laser beam. In a second harmonic generation device having a nonlinear optical crystal, an optical substrate arranged in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is rotated in a horizontal plane and a vertical plane. Angle adjusting means for obtaining, an optical axis position detector for detecting the optical axis position of the fundamental laser light emitted from the optical substrate to the ring resonator, and detecting the light intensity of the fundamental laser light in the ring resonator A light intensity detector that performs the operation, and an angle controller that operates an angle adjusting unit based on signals from the optical axis position detector and the light intensity detector.

According to a second harmonic generation device of the present invention, a ring resonator for resonating a fundamental wave laser beam having a continuous oscillation single frequency, and a second harmonic is generated from the fundamental wave laser beam. In a second harmonic generation device having a nonlinear optical crystal, an optical substrate arranged in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is rotated in a horizontal plane and a vertical plane. Angle adjusting means for obtaining, an optical axis position detector for detecting an optical axis position of a fundamental laser beam emitted from the optical substrate to the ring resonator, and an output intensity of a second harmonic generated by the nonlinear optical crystal. An output intensity detector to be detected is provided, and an angle controller that operates angle adjusting means based on signals from the optical axis position detector and the output intensity detector.

According to the second harmonic generation device of the present invention, a ring resonator for resonating a continuous wave single frequency fundamental wave laser beam, and a second harmonic wave is generated from the fundamental wave laser beam. In a second harmonic generation device having a nonlinear optical crystal, an optical substrate arranged in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is rotated in a horizontal plane and a vertical plane. Angle adjusting means for obtaining, an optical axis position detector for detecting the optical axis position of the fundamental laser light emitted from the optical substrate to the ring resonator, and detecting the light intensity of the fundamental laser light in the ring resonator Light intensity detector, an output intensity detector for detecting the output intensity of the second harmonic generated by the nonlinear optical crystal, and an optical axis position detector, a light intensity detector, and a signal from the output intensity detector. Create angle adjustment means based on And a angle controller to.

In the optical axis position correcting device according to the first aspect of the present invention, the angle controllers actuate the respective angle adjusting means based on the optical axis position of the light beam detected by the optical axis position detector. , The angles of the first reflection mirror and the second reflection mirror are finely adjusted, and the optical axis position of the light beam with respect to the light beam utilization device is corrected.

In the optical axis position correcting device according to a second aspect of the present invention, the angle controllers actuate the respective angle adjusting means based on the optical axis position of the light beam detected by the optical axis position detector. The angles of the first optical substrate and the second optical substrate are finely adjusted to correct the optical axis position of the light beam with respect to the light beam utilizing device.

In the optical axis position correcting device according to the third aspect of the present invention, the angle controller operates the angle adjusting means based on the optical axis position of the light beam detected by the optical axis position detector, and The angle of the substrate is finely adjusted to correct the optical axis position of the light beam with respect to the light beam utilizing device.

In the second harmonic generation device according to a fourth aspect of the present invention, the angle controller controls each angle adjusting means based on the optical axis position of the fundamental laser beam detected by the optical axis position detector. When activated, the angles of the first reflection mirror and the second reflection mirror are finely adjusted to correct the optical axis position of the fundamental laser light with respect to the ring resonator.

According to the second harmonic generation device of the present invention, the optical axis position of the fundamental wave laser light detected by the optical axis position detector and the fundamental wave laser light detected by the light intensity detector are determined. On the basis of the light intensity, the angle controllers actuate the respective angle adjusting means to finely adjust the angles of the first reflection mirror and the second reflection mirror, and the optical axis position of the fundamental laser light with respect to the ring resonator Is corrected.

In the second harmonic generator according to the sixth aspect of the present invention, the position of the optical axis of the fundamental laser beam detected by the optical axis position detector and the position of the second harmonic detected by the output intensity detector are determined. Based on the output intensity, the angle controller operates the respective angle adjusting means to finely adjust the angles of the first reflection mirror and the second reflection mirror, and the optical axis position of the fundamental laser light with respect to the ring resonator Is corrected.

In the second harmonic generation device according to the present invention, the optical axis position of the fundamental laser light detected by the optical axis position detector and the optical axis position of the fundamental wave laser light detected by the light intensity detector are determined. Based on the light intensity and the output intensity of the second harmonic detected by the output intensity detector, the angle controller operates the respective angle adjusting means to finely adjust the angles of the first and second reflecting mirrors. Then, the optical axis position of the fundamental laser light with respect to the ring resonator is corrected.

In the second harmonic generation apparatus according to the present invention, the angle controller controls each angle adjusting means based on the optical axis position of the fundamental laser beam detected by the optical axis position detector. When activated, the angles of the first optical substrate and the second optical substrate are finely adjusted, and the optical axis position of the fundamental laser light with respect to the ring resonator is corrected.

In the second harmonic generation device according to the ninth aspect of the present invention, the position of the fundamental axis laser beam detected by the optical axis position detector and the position of the fundamental wave laser beam detected by the light intensity detector are determined. Based on the light intensity, the angle controllers actuate the respective angle adjusting means to finely adjust the angles of the first optical substrate and the second optical substrate, and the optical axis position of the fundamental laser light with respect to the ring resonator Is corrected.

In the second harmonic generator according to the tenth aspect of the present invention, the position of the optical axis of the fundamental wave laser beam detected by the optical axis position detector and the second harmonic wave detected by the output intensity detector are determined. On the basis of the output intensity, the angle controller operates the respective angle adjusting means to finely adjust the angles of the first optical substrate and the second optical substrate, and the optical axis position of the fundamental laser light with respect to the ring resonator Is corrected.

In the second harmonic generation device according to the present invention, the optical axis position of the fundamental wave laser beam detected by the optical axis position detector and the fundamental wave laser beam detected by the light intensity detector are detected. Based on the light intensity and the output intensity of the second harmonic detected by the output intensity detector, the angle controller operates the respective angle adjusting means to finely adjust the angles of the first optical substrate and the second optical substrate. It adjusts and corrects the optical axis position of the fundamental laser light with respect to the ring resonator.

In the second harmonic generation device according to the twelfth aspect of the present invention, the angle controller activates the angle adjusting means based on the optical axis position of the fundamental laser beam detected by the optical axis position detector. Then, the angle of the optical substrate is finely adjusted to correct the optical axis position of the fundamental laser light with respect to the ring resonator.

In the second harmonic generation device according to the thirteenth aspect of the present invention, the optical axis position of the fundamental laser beam detected by the optical axis position detector and the fundamental axis laser beam detected by the light intensity detector are determined. On the basis of the light intensity, the angle controller operates the angle adjusting means to finely adjust the angle of the optical substrate, and corrects the optical axis position of the fundamental laser light with respect to the ring resonator.

In the second harmonic generator according to claim 14 of the present invention, the position of the optical axis of the fundamental laser beam detected by the optical axis position detector and the position of the second harmonic detected by the output intensity detector are determined. Based on the output intensity, the angle controller operates the degree adjusting means to finely adjust the angle of the optical substrate and correct the optical axis position of the fundamental laser light with respect to the ring resonator.

According to the second harmonic generation device of the present invention, the optical axis position of the fundamental wave laser beam detected by the optical axis position detector and the fundamental wave laser beam detected by the light intensity detector are detected. Based on the light intensity and the output intensity of the second harmonic detected by the output intensity detector, the angle controller activates the angle adjusting means to finely adjust the angle of the optical substrate, and the fundamental laser light to the ring resonator Is corrected.

[0040]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows a first example of an embodiment of a second harmonic generation device according to the present invention. In the drawing, portions denoted by the same reference numerals as those in FIG. 6 represent the same components. .

The second harmonic generation device comprises a ring resonator ₁ for resonating a continuous wave single frequency fundamental laser beam ω ₁ , and a non-linear resonator for generating a second harmonic ω ₂ from the fundamental laser beam ω ₁ . An optical axis position correcting device is provided in addition to the optical crystal 2.

The optical axis position correcting device includes a first total reflection mirror 8, a second total reflection mirror 9, a third total reflection mirror 12,
First light detector 14, beam splitter 15, second light detector 16, first angle adjusting means 17, second angle adjusting means 18, third angle adjusting means 19, optical axis position detector 2
0 and an angle controller 21 are provided.

The photodetector 14 is disposed on the back surface (non-total reflection surface) side of the total reflection plane mirror 6, and the total reflection plane mirror 6
The intensity of the leakage light (fundamental laser light ω ₁ ) is detected to output a resonance light intensity signal 14s.

The beam splitter 15 transmits most of the second harmonic ω ₂ emitted from the output coupler 5 and reflects only a part of the second harmonic ω ₂ on the emission side of the output coupler 5. It is arranged to be.

[0046] The second optical detector 16 is disposed on the exit side of the beam splitter 15, to output the second harmonic omega ₂ of the output intensity is detected and an output intensity signal 16s reflected by the beam splitter 15 It has become.

The first angle adjusting means 17, the second angle adjusting means 18, and the third angle adjusting means 19 sequentially reflect the fundamental laser light ω ₁ emitted from the ring dye laser device 7. A total reflection mirror 8, a second total reflection mirror 9, and a third total reflection mirror 12 are supported.

The above angle adjusting means 17, 18, 19
It has a stepping motor for rotating the total reflection mirrors 8, 9, 12 in a horizontal plane and a vertical plane.

As the optical axis position detector 20, a semiconductor two-dimensional position detector is used.

The optical axis position detector 20 has a fourth
Is disposed on the back surface (non-total reflection surface) side of the fourth total reflection mirror 13 so that the leakage light (fundamental wave laser light ω ₁ ) of the total reflection mirror 13 can enter through the neutral density filter 22. is configured to output an optical axis position signal 20s corresponding to the incident position of the fundamental wave laser beam omega ₁ of the detection surface.

The angle controller 21 includes a resonance light intensity signal 14s from the first light detector 14, an output intensity signal 16s from the second light detector 16, and the optical axis position detector 20 amplified by the amplifier 23. The fundamental laser light ω on the detection surface of the optical axis position detector 20 at which the resonance light intensity of the fundamental laser light ω ₁ and the output of the second harmonic ω ₂ are maximized based on the optical axis position signal 20 s ₁ is stored, and when the resonance light intensity of the fundamental laser light ω ₁ and the output intensity of the second harmonic ω ₂ decrease, the total reflection mirror 8,
Angle adjustment signals 17s, 18 for adjusting the angles of 9, 12
s and 19s.

When the incident position of the fundamental laser light ω _{1 on} the detection surface of the optical axis position detector 20 deviates from the optimum state in the second harmonic generator having the above-described configuration, as shown in FIG. with the shift amount of the increase, the resonant optical intensity of the fundamental wave laser beam omega _1, and a second absolute value of the output of the harmonic omega ₂ decreases.

At this time, the resonance light intensity signal 14s from the first light detector 14, the output intensity signal 16s from the second light detector 16, and the optical axis position signal 20s from the optical axis position detector 20 The angle controller 21 outputs angle adjustment signals 17 s and 18 s to the angle adjustment means 17 and 18 based on the above, and the angle of the first total reflection mirror 8 is finely adjusted in the horizontal plane, and the first angle in the vertical plane. Fine adjustment of the angle of the total reflection mirror 8
Fine angle adjustment of the second total reflection mirror 9 in the horizontal plane and fine angle adjustment of the second total reflection mirror 9 in the vertical plane are sequentially performed.

Thus, the incident position of the fundamental wave laser light ω _{1 on} the detection surface of the optical axis position detector 20 is corrected to an optimum state, and the fundamental wave laser light ω detected by the first light detector 14 is corrected. ₁ of the relative value of the resonance light intensity, and the absolute value of the second harmonic omega ₂ output is restored detected by the second photodetector 16.

When the resonance light intensity of the fundamental laser light ω ₁ and the output intensity of the second harmonic ω ₂ are not sufficiently recovered only by the fine adjustment of the angles of the total reflection mirrors 8 and 9, An angle adjusting signal 19s is output from the angle controller 21 to the angle adjusting means 19, and the angle of the third total reflection mirror 12 is finely adjusted in a horizontal plane, and the third total reflection mirror 1 in a vertical plane.
2 of fine angle adjustment is performed in order, the resonance light intensity of the fundamental wave laser beam omega _1, and the second harmonic omega ₂ output intensity recovery is achieved.

As described above, in the second harmonic generator shown in FIG. 1, the optical axis position of the fundamental wave laser beam ω ₁ detected by the optical axis position detector 20 and the optical axis position detected by the first optical detector 14 are detected. Based on the resonance light intensity of the fundamental laser light ω ₁ and the output intensity of the second harmonic ω ₂ detected by the second photodetector, the angle controller 21 operates the angle adjusting means 17, 18, 19. Te, to fine-tune the angle of the total reflection mirror 8, 9, 12, to correct the relative position of the optical axis of the fundamental wave laser beam omega ₁ for ring resonator 1.

Therefore, the operation of correcting the optical axis position of the fundamental laser beam ω ₁ for maintaining the output of the second harmonic ω ₂ generated by the nonlinear optical crystal 2 can be performed without human intervention.

FIGS. 2 and 3 show a second embodiment of the second harmonic generator according to the present invention. In the drawings, the same reference numerals as those in FIGS. 1 and 6 denote the same parts. It represents the same thing.

This second harmonic generator includes a first photodetector 1 in addition to a ring resonator 1 and a nonlinear optical crystal 2.
4, beam splitter 15, second photodetector 16, first
A parallel plane substrate (one type of optical substrate) 24, a second parallel plane substrate (one type of optical substrate) 25, and the first angle adjusting means 2
6, an optical axis position correcting device including the second angle adjusting means 27, the optical axis position detector 20, and the angle controller 28.

The first parallel flat substrate 24 and the second parallel flat substrate
The surface substrate 25 has flat surfaces on the incident side and the outgoing side and alternate with each other.
Anti-reflective coating on a parallel synthetic quartz plate
A first total reflection mirror 8 and a second total reflection mirror
9 fundamental wave laser light ω ₁Located in the light guide path
I have.

The first angle adjusting means 26 has a stepping motor for rotating the first parallel flat substrate 24 in a horizontal plane.

The second angle adjusting means 27 has a stepping motor for rotating the second plane-parallel substrate 25 in a vertical plane.

The angle controller 28 includes a resonance light intensity signal 14 s from the first light detector 14, an output intensity signal 16 s from the second light detector 16, and the optical axis position detector 20 amplified by the amplifier 23. The fundamental laser light ω on the detection surface of the optical axis position detector 20 at which the resonance light intensity of the fundamental laser light ω ₁ and the output of the second harmonic ω ₂ are maximized based on the optical axis position signal 20 s ₁ is stored, and when the resonance light intensity of the fundamental laser light ω ₁ and the output intensity of the second harmonic ω ₂ decrease, the parallel plane substrates 24, 25 are adjusted with respect to the angle adjusting means 26, 27.
It is configured to output angle adjustment signals 26s and 27s for adjusting the angle of.

The relationship between the fundamental laser light ω ₁ and the parallel plane substrates 24 and 25 shown in FIG. 3 is as follows.

A) According to Snell's law,

N ₁ · sin θ = n ₂ · sin φ n ₁ : Refractive index of the incident side medium n ₂ : Refractive index of the refraction side medium θ: Incident angle of fundamental wave laser light incident on the parallel plane substrate φ: Parallel plane Since the refraction angle of the fundamental laser light incident on the substrate can be set to n ₁ ≒ 1, the refraction angle φ of the fundamental laser light ω ₁
Is

## EQU2 ## From the relation between φ = sin ⁻¹ (sin θ / n ₂ ) B) and the apex angle,

X = θ-φ x: deflection angle of fundamental laser light C) From the thickness of the parallel plane substrate,

T = L · cos φ t: Substrate thickness L: Distance of light guide path of fundamental laser light in parallel plane substrate D) Optical axis deviation of fundamental laser light by parallel plane substrate is

D = L · sinx = (t / cosφ) · sin (θ−φ) = [t · sin {θ−sin ⁻¹ (sin θ / n ₂ )}]
/ [Cos {sin ^-1 (sin θ / n ₂ )}] d: optical axis deviation of the fundamental laser light.

That is, the wavelength of the fundamental laser light ω ₁ is set to 5
Assuming that the refractive index n ₂ of the parallel plane substrates 24 and 25 is 1.460 and the substrate thickness t is 5 mm, the incident angle θ, the refraction angle φ, and the optical axis deviation d are as follows.

[0067]

[Table 1]

When the incident position of the fundamental laser light ω _{1 on} the detection surface of the optical axis position detector 20 deviates from the optimum state in the second harmonic generator having the above-described configuration, as shown in FIG. with the shift amount of the increase, the relative value of the resonance light intensity of the fundamental wave laser beam omega _1, and a second absolute value of the output of the harmonic omega ₂ decreases.

At this time, the resonance light intensity signal 14s from the first light detector 14, the output intensity signal 16s from the second light detector 16, and the optical axis position signal 20s from the optical axis position detector 20 The angle controller 28 outputs angle adjustment signals 26 s and 27 s to the angle adjusting means 26 and 27 based on the angle fine adjustment of the parallel plane substrate 24 in the horizontal plane and the parallel plane substrate 25 in the vertical plane. Angle fine adjustment is performed in order.

Thus, the incident position of the fundamental wave laser light ω _{1 on} the detection surface of the optical axis position detector 20 is corrected to an optimum state, and the fundamental wave laser light ω detected by the first light detector 14 is adjusted. ₁ of the resonant light intensity, and the second harmonic omega ₂ of the output intensity detected by the second photodetector 16 is restored.

As described above, in the second harmonic generator shown in FIGS. 2 and 3, the optical axis position of the fundamental laser beam ω ₁ detected by the optical axis position detector 20 and the first optical detector 14 a resonant optical intensity of the fundamental wave laser beam omega ₁ tHAT detected, based on the second harmonic omega ₂ output intensity detected by the second photodetector 16, an angle controller 28 and the angle adjusting means 26, 27 By operating, the angles of the parallel plane substrates 24 and 25 are finely adjusted, and the relative optical axis position of the fundamental laser light ω ₁ with respect to the ring resonator 1 is corrected.

Accordingly, the operation of correcting the optical axis position of the fundamental laser beam ω ₁ for maintaining the output of the second harmonic ω ₂ generated by the nonlinear optical crystal 2 can be performed without human intervention.

FIG. 5 shows a third embodiment of the second harmonic generator according to the present invention. In FIG. 5, the same reference numerals as those in FIG. 2 denote the same parts. .

In this second harmonic generator, the first parallel flat substrate 24, the second parallel variable surface substrate 25, and the second parallel flat substrate 25 shown in FIG.
Instead of the first angle adjusting unit 26, the second angle adjusting unit 27, and the angle controller 28, a parallel plane substrate (one type of optical substrate) 29 equivalent to the parallel plane substrates 24 and 25, an angle adjusting unit 30, An optical axis position correcting device using the angle controller 31 is provided.

The parallel plane substrate 29 is provided with a fundamental laser light ω ₁ between the first total reflection mirror 8 and the second total reflection mirror 9.
In the light guide path.

The angle adjusting means 30 has a stepping motor for rotating the parallel plane substrate 29 in a horizontal plane and a stepping motor for rotating the parallel plane substrate 29 in a vertical plane.

The angle controller 31 includes a resonance light intensity signal 14 s from the first light detector 14, an output intensity signal 16 s from the second light detector 16, and the optical axis position detector 20 amplified by the amplifier 23. The fundamental laser light ω on the detection surface of the optical axis position detector 20 at which the resonance light intensity of the fundamental laser light ω ₁ and the output of the second harmonic ω ₂ are maximized based on the optical axis position signal 20 s stores _one of the incident positions, when the fundamental wave laser beam omega ₁ of the resonant light intensity and the second harmonic omega ₂ of the output intensity is lowered, to adjust the angle of the plane-parallel board 29 with respect to the angle adjusting means 30 It is configured to output an angle adjustment signal 29s.

When the incident position of the fundamental laser light ω ₁ with respect to the detection surface of the optical axis position detector 20 deviates from the optimum state in the second harmonic generator having the above configuration, as shown in FIG. with the shift amount of the increase, the relative value of the resonance light intensity of the fundamental wave laser beam omega _1, and a second absolute value of the output of the harmonic omega ₂ decreases.

At this time, the resonance light intensity signal 14s from the first light detector 14, the output intensity signal 16s from the second light detector 16, and the optical axis position signal 20s from the optical axis position detector 20 The angle controller 31 outputs an angle adjustment signal 30 s to the angle adjustment means 30 based on the above, and the angle fine adjustment of the parallel plane substrate 29 in the horizontal plane and the angle fine adjustment of the parallel plane substrate 29 in the vertical plane are performed. It is performed in order.

Thus, the incident position of the fundamental wave laser light ω _{1 on} the detection surface of the optical axis position detector 20 is corrected to an optimum state, and the fundamental wave laser light ω detected by the first light detector 14 is corrected. ₁ of the resonant light intensity, and the second harmonic omega ₂ of the output intensity detected by the second photodetector 16 is restored.

As described above, in the second harmonic generator shown in FIG. 5, the optical axis position of the fundamental laser light ω ₁ detected by the optical axis position detector 20 and the optical axis position detected by the first optical detector 14 are detected. Based on the resonance light intensity of the fundamental laser light ω ₁ and the output intensity of the second harmonic ω ₂ detected by the second photodetector 16, the angle controller 31 operates the angle adjustment mechanism 30 to adjust the parallel the angle of the plane substrate 29 is finely adjusted to correct the position of the optical axis of the fundamental wave laser beam omega ₁ for ring resonator 1.

Therefore, the operation of correcting the optical axis position of the fundamental laser beam ω ₁ for maintaining the output of the second harmonic ω ₂ generated by the nonlinear optical crystal 2 can be performed without human intervention.

The optical axis position correcting device of the present invention and the second
The harmonic generation device is not limited to the above-described embodiment, and the optical axis position detector may be used for a light beam utilization device other than the second harmonic generation device. Of course, changes can be made without departing from the scope.

[0084]

As described above, the optical axis position correcting device and the second harmonic generator according to the present invention can provide various excellent effects as described below.

(1) In the optical axis position correcting device according to the first aspect of the present invention, the angle controller operates each angle adjusting means based on the optical axis position of the light beam detected by the optical axis position detector. Since the angles of the first reflecting mirror and the second reflecting mirror are finely adjusted, the operation of correcting the optical axis position of the light beam for the light beam utilization device can be performed without human intervention.

(2) In the optical axis position correcting device according to the second aspect of the present invention, the angle controller operates each angle adjusting means based on the optical axis position of the light beam detected by the optical axis position detector. Since the angles of the first optical substrate and the second optical substrate are finely adjusted, the operation of correcting the optical axis position of the light beam for the light beam utilizing device can be performed without human intervention.

(3) In the optical axis position correcting device according to the third aspect of the present invention, the angle controller operates the angle adjusting means based on the optical axis position of the light beam detected by the optical axis position detector. Since the angle of the optical substrate is finely adjusted, the operation of correcting the optical axis position of the light beam for the light beam utilizing device can be performed without human intervention.

(4) In the second harmonic generator according to claim 4 of the present invention, the angle controllers adjust the respective angles based on the optical axis position of the fundamental laser beam detected by the optical axis position detector. Since the means is operated to finely adjust the angles of the first and second reflection mirrors, the operation of correcting the optical axis position of the fundamental laser light with respect to the ring resonator can be performed without human intervention, and The resonator-type second harmonic generator can be put to practical use.

(5) In the second harmonic generator according to the fifth aspect of the present invention, the optical axis position of the fundamental wave laser light detected by the optical axis position detector and the fundamental wave laser detected by the light intensity detector The angle controller operates the respective angle adjusting means based on the resonance light intensity of the light, and the first reflection mirror and the second reflection mirror are actuated.
Finely adjusts the angle of the reflection mirror, so that the work of correcting the optical axis position of the fundamental laser light to the ring resonator can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use. become.

(6) In the second harmonic generation device according to the sixth aspect of the present invention, the optical axis position of the fundamental wave laser light detected by the optical axis position detector and the second harmonic wave detected by the output intensity detector. Based on the output intensity of the wave, the angle controller operates the respective angle adjusting means to finely adjust the angles of the first reflecting mirror and the second reflecting mirror. The optical axis position correction work can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use.

(7) In the second harmonic generator according to claim 7 of the present invention, the optical axis position of the fundamental wave laser light detected by the optical axis position detector and the fundamental wave laser detected by the light intensity detector The angle controller operates the respective angle adjusting means based on the resonance light intensity of the light and the output intensity of the second harmonic detected by the output intensity detector, and the angle of the first reflection mirror and the second reflection mirror is adjusted. Is finely adjusted, the operation of correcting the optical axis position of the fundamental laser light with respect to the ring resonator can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use.

(8) In the second harmonic generation device according to claim 8 of the present invention, the angle controllers adjust the respective angles based on the optical axis position of the fundamental laser beam detected by the optical axis position detector. By operating the means to finely adjust the angles of the first optical substrate and the second optical substrate, the operation of correcting the optical axis position of the fundamental laser light with respect to the ring resonator can be performed without human intervention, and The resonator-type second harmonic generator can be put to practical use.

(9) In the second harmonic generator according to claim 9 of the present invention, the optical axis position of the fundamental wave laser light detected by the optical axis position detector and the fundamental wave laser detected by the light intensity detector The angle controller operates the respective angle adjusting means based on the resonance light intensity of the light to finely adjust the angles of the first optical substrate and the second optical substrate. Can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use.

(10) In the second harmonic generator according to claim 10 of the present invention, the optical axis position of the fundamental laser light detected by the optical axis position detector and the second harmonic wave detected by the output intensity detector.
Based on the output intensity of the harmonic, the angle controller operates the respective angle adjusting means to finely adjust the angles of the first optical substrate and the second optical substrate. Can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use.

(11) In the second harmonic generation apparatus according to the eleventh aspect of the present invention, the optical axis position of the fundamental laser light detected by the optical axis position detector and the fundamental wave laser detected by the light intensity detector 2nd light detected by the resonant light intensity of the light and the output intensity detector
Based on the output intensity of the harmonic, the angle controller operates the respective angle adjusting means to finely adjust the angles of the first optical substrate and the second optical substrate. Can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use.

(12) In the second harmonic generator according to claim 12 of the present invention, the angle controller controls the angle adjusting means based on the optical axis position of the fundamental laser beam detected by the optical axis position detector. Activate to fine-tune the angle of the optical board,
The operation of correcting the optical axis position of the fundamental laser beam with respect to the ring resonator can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use.

(13) In the second harmonic generator according to claim 13 of the present invention, the optical axis position of the fundamental wave laser beam detected by the optical axis position detector and the fundamental wave laser beam detected by the light intensity detector Based on the light intensity of the light, the angle controller operates the angle adjusting means to finely adjust the angle of the optical substrate. The second harmonic generation device of the external resonator type can be put to practical use.

(14) In the second harmonic generator according to claim 14 of the present invention, the optical axis position of the fundamental laser light detected by the optical axis position detector and the second harmonic wave detected by the output intensity detector.
Based on the output intensity of the harmonic, the angle controller operates the angle adjusting means to finely adjust the angle of the optical substrate, so that the optical axis position correction work of the fundamental laser light to the ring resonator requires human intervention. This can be performed without accompanying, and the external resonator type second harmonic generator can be put to practical use.

(15) In the second harmonic generation device according to claim 15 of the present invention, the optical axis position of the fundamental wave laser light detected by the optical axis position detector and the fundamental wave laser detected by the light intensity detector Based on the light intensity of the light and the output intensity of the second harmonic detected by the output intensity detector, the angle controller operates the angle adjusting means to finely adjust the optical angle. The optical axis position correction operation of light can be performed without human intervention, and the external resonator type second harmonic generator can be put to practical use.

[Brief description of the drawings]

FIG. 1 is a conceptual diagram showing a first example of an embodiment of a second harmonic generation device according to the present invention.

FIG. 2 is a conceptual diagram showing a second example of an embodiment of the second harmonic generation device of the present invention.

FIG. 3 is a conceptual diagram showing a relationship between a parallel plane substrate and a fundamental laser beam in FIG.

FIG. 4 is measured data (graph) showing the relationship between the output of the second harmonic and the intensity of the resonance light of the fundamental laser light with respect to the incident position shift amount of the fundamental laser light (wavelength 55 / nm).

FIG. 5 is a conceptual diagram showing a third example of the embodiment of the second harmonic generation device according to the present invention.

FIG. 6 is a conceptual diagram showing an example of a conventional second harmonic generator.

[Explanation of symbols]

REFERENCE SIGNS LIST 1 ring external resonator (ring resonator, light beam utilization device) 2 nonlinear optical crystal 8 first total reflection mirror (first reflection mirror) 9 second total reflection mirror (second reflection mirror) 14 th 1 light detector (light intensity detector) 14s resonance light intensity signal (signal) 16 second light detector (output intensity detector) 16s output intensity signal (signal) 17, 26 first angle adjusting means 18, 27 the second angle adjusting means 20 an optical axis position detector 20s optical axis position signal (signal) 21 and 28 angle controller 24 first parallel plane substrate 25 a second plane parallel substrate omega ₁ fundamental laser beam (light beam ) ω ₂ the second harmonic

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Takashi Shimazu 1 Kawasaki Harima Heavy Industries Co., Ltd. Yokohama Engineering Center Ishinakahara-cho, Isogo-ku, Yokohama-shi, Kanagawa

Claims (15)

[Claims] A first reflecting mirror and a second reflecting mirror for sequentially reflecting a light beam; a first angle adjusting means for rotating the first reflecting mirror in a horizontal plane and a vertical plane; Second angle adjusting means for rotating the second reflection mirror in a horizontal plane and a vertical plane, and light for detecting the optical axis position of the light beam emitted from the second reflection mirror to the light beam utilization device An optical axis position correcting device comprising: an axis position detector; and an angle controller that operates a first angle adjusting unit and a second angle adjusting unit based on a signal from the optical axis position detector. . 2. A first optical substrate and a second optical substrate arranged in a light guide path of a light beam, a first angle adjusting means capable of rotating the first optical substrate in a horizontal plane, Second angle adjusting means for rotating the second optical substrate in a vertical plane, and optical axis position detection for detecting the optical axis position of the light beam emitted from the second optical substrate to the light beam utilization device An optical axis position correcting device, comprising: an optical axis controller; and an angle controller for operating a first angle adjusting unit and a second angle adjusting unit based on a signal from the optical axis position detector. 3. An optical substrate disposed in a light beam guide path, an angle adjusting means capable of rotating the optical substrate in a horizontal plane and a vertical plane, and from the optical substrate to a light beam utilization device. A light comprising: an optical axis position detector for detecting an optical axis position of an emitted light beam; and an angle controller for operating angle adjusting means based on a signal from the optical axis position detector. Axis position correction device. 4. A second harmonic generation device comprising a ring resonator for resonating a continuous wave single frequency fundamental laser beam and a nonlinear optical crystal for generating a second harmonic from the fundamental laser beam. Reflection mirror and second reflection mirror for sequentially reflecting the wave laser light to the ring resonator, and first angle adjusting means for rotating the first reflection mirror in a horizontal plane and a vertical plane A second angle adjusting means for rotating the second reflection mirror in a horizontal plane and a vertical plane; and an optical axis position of the fundamental laser light emitted from the second reflection mirror to the ring resonator. An optical axis position detector for detecting, and an angle controller for operating the first angle adjusting means and the second angle adjusting means based on a signal from the optical axis position detector. Harmonic generator. 5. A second harmonic generator comprising a ring resonator for resonating a continuous wave single frequency fundamental laser beam and a nonlinear optical crystal for generating a second harmonic from the fundamental laser beam. Reflection mirror and second reflection mirror for sequentially reflecting the wave laser light to the ring resonator, and first angle adjusting means for rotating the first reflection mirror in a horizontal plane and a vertical plane A second angle adjusting means for rotating the second reflection mirror in a horizontal plane and a vertical plane; and an optical axis position of the fundamental laser light emitted from the second reflection mirror to the ring resonator. An optical axis position detector for detecting, a light intensity detector for detecting the light intensity of the fundamental laser light in the ring resonator, and a first based on signals from the optical axis position detector and the light intensity detector. Activating the angle adjusting means and the second angle adjusting means A second harmonic generation device, comprising: 6. A second harmonic generator including a ring resonator for resonating a continuous wave single frequency fundamental laser beam and a nonlinear optical crystal for generating a second harmonic from the fundamental laser beam. Reflection mirror and second reflection mirror for sequentially reflecting the wave laser light to the ring resonator, and first angle adjusting means for rotating the first reflection mirror in a horizontal plane and a vertical plane A second angle adjusting means for rotating the second reflection mirror in a horizontal plane and a vertical plane; and an optical axis position of the fundamental laser light emitted from the second reflection mirror to the ring resonator. An optical axis position detector for detecting, an output intensity detector for detecting an output intensity of a second harmonic generated by the nonlinear optical crystal, and a first signal based on signals from the optical axis position detector and the output intensity detector. Angle adjustment means and second angle adjustment A second harmonic generation device, comprising: an angle controller for operating the adjustment means. 7. A second harmonic generation device comprising a ring resonator for resonating a continuous wave single frequency fundamental laser beam and a nonlinear optical crystal for generating a second harmonic from the fundamental laser beam. Reflection mirror and second reflection mirror for sequentially reflecting the wave laser light to the ring resonator, and first angle adjusting means for rotating the first reflection mirror in a horizontal plane and a vertical plane A second angle adjusting means for rotating the second reflection mirror in a horizontal plane and a vertical plane; and an optical axis position of the fundamental laser light emitted from the second reflection mirror to the ring resonator. An optical axis position detector for detecting, a light intensity detector for detecting the light intensity of the fundamental laser light in the ring resonator, and a second optical crystal generated by the nonlinear optical crystal.
An output intensity detector for detecting an output intensity of a harmonic, and first and second angle adjustment units based on signals from the optical axis position detector, the light intensity detector, and the output intensity detector. A second harmonic generation device, comprising: an angle controller to be operated. 8. A second harmonic generation device having a ring resonator for resonating a continuous wave single frequency fundamental wave laser beam and a nonlinear optical crystal for generating a second harmonic from the fundamental wave laser beam. A first optical substrate and a second optical substrate arranged in a light guide path of the fundamental laser light to the resonator, and a first optical substrate capable of rotating the first optical substrate in a horizontal plane
Angle adjusting means, second angle adjusting means capable of rotating the second optical substrate in a vertical plane, and optical axis position of the fundamental laser light emitted from the second optical substrate to the ring resonator And an angle controller for operating the first angle adjusting means and the second angle adjusting means based on a signal from the optical axis position detector. Second harmonic generator. 9. A second harmonic generation device comprising: a ring resonator for resonating a continuous wave single frequency fundamental laser beam; and a nonlinear optical crystal for generating a second harmonic from the fundamental laser beam. A first optical substrate and a second optical substrate arranged in a light guide path of the fundamental laser light to the resonator, and a first optical substrate capable of rotating the first optical substrate in a horizontal plane
Angle adjusting means, second angle adjusting means capable of rotating the second optical substrate in a vertical plane, and optical axis position of the fundamental laser light emitted from the second optical substrate to the ring resonator , A light intensity detector for detecting the light intensity of the fundamental laser light in the ring resonator, and a first light intensity detector based on signals from the light axis position detector and the light intensity detector. A second harmonic generator comprising: an angle controller for operating the angle adjuster and an angle controller for operating the second angle adjuster. 10. A ring resonator for resonating a continuous wave single frequency fundamental wave laser beam, and a second resonator from the fundamental wave laser beam.
In a second harmonic generation device having a nonlinear optical crystal for generating a harmonic, a first optical substrate and a second optical substrate arranged in a light guide path of a fundamental laser beam to a ring resonator; A first angle adjusting means for rotating the first optical substrate in a horizontal plane, a second angle adjusting means for rotating the second optical substrate in a vertical plane, and a second optical substrate. An optical axis position detector for detecting an optical axis position of the fundamental laser light emitted to the ring resonator; an output intensity detector for detecting an output intensity of a second harmonic generated by the nonlinear optical crystal; A second harmonic generation device comprising: an angle controller that operates first angle adjustment means and second angle adjustment means based on signals from a shaft position detector and an output intensity detector. 11. A ring resonator for resonating a continuous wave single frequency fundamental wave laser beam, and a second resonator from the fundamental wave laser beam.
In a second harmonic generation device having a nonlinear optical crystal for generating a harmonic, a first optical substrate and a second optical substrate arranged in a light guide path of a fundamental laser beam to a ring resonator; A first angle adjusting means for rotating the first optical substrate in a horizontal plane, a second angle adjusting means for rotating the second optical substrate in a vertical plane, and a second optical substrate. An optical axis position detector that detects the optical axis position of the fundamental laser light emitted to the ring resonator, a light intensity detector that detects the light intensity of the fundamental laser light in the ring resonator, and a nonlinear optical crystal An output intensity detector for detecting an output intensity of the generated second harmonic; a first angle adjusting means and a second angle adjusting device based on signals from the optical axis position detector, the light intensity detector, and the output intensity detector. An angle controller for operating the angle adjusting means. The second harmonic generator according to claim. 12. A ring resonator for resonating a continuous wave single frequency fundamental wave laser beam, and a second resonator from the fundamental wave laser beam.
In a second harmonic generation device having a nonlinear optical crystal for generating a harmonic, an optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is disposed in a horizontal plane and a vertical plane. Angle adjusting means that can be rotated by an optical axis position detector that detects the optical axis position of the fundamental laser light emitted from the optical substrate to the ring resonator, and a signal from the optical axis position detector A second harmonic generation device, comprising: an angle controller for operating an angle adjusting means based on the control signal. 13. A ring resonator for resonating a continuous wave single frequency fundamental wave laser beam, and a second resonator from the fundamental wave laser beam.
In a second harmonic generation device having a nonlinear optical crystal for generating a harmonic, an optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is disposed in a horizontal plane and a vertical plane. Angle adjusting means that can be rotated by an optical substrate; an optical axis position detector that detects an optical axis position of a fundamental wave laser beam emitted from the optical substrate to the ring resonator; and a fundamental wave laser beam in the ring resonator. A light intensity detector for detecting the light intensity of the optical axis, and an angle controller for operating angle adjusting means based on signals from the optical axis position detector and the light intensity detector. Harmonic generator. 14. A ring resonator for resonating a continuous wave single frequency fundamental wave laser beam, and a second resonator from the fundamental wave laser beam.
In a second harmonic generation device having a nonlinear optical crystal for generating a harmonic, an optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is disposed in a horizontal plane and a vertical plane. Angle adjusting means which can be rotated by an optical substrate, an optical axis position detector which detects the optical axis position of the fundamental laser light emitted from the optical substrate to the ring resonator, and a second harmonic generated by the nonlinear optical crystal An output intensity detector for detecting an output intensity of a wave, and an angle controller for operating an angle adjusting unit based on signals from the optical axis position detector and the output intensity detector. 2 harmonic generator. 15. A ring resonator for resonating a continuous wave single frequency fundamental laser beam, and a second resonator from the fundamental laser beam.
In a second harmonic generation device having a nonlinear optical crystal for generating a harmonic, an optical substrate disposed in a light guide path of a fundamental laser beam to a ring resonator, and the optical substrate is disposed in a horizontal plane and a vertical plane. Angle adjusting means that can be rotated by an optical substrate; an optical axis position detector that detects an optical axis position of a fundamental wave laser beam emitted from the optical substrate to the ring resonator; and a fundamental wave laser beam in the ring resonator. A light intensity detector for detecting the light intensity of the light, an output intensity detector for detecting the output intensity of the second harmonic generated by the nonlinear optical crystal, the optical axis position detector, the light intensity detector, and the output intensity detection. An angle controller for operating the angle adjusting means based on a signal from the device.