JPH11340713A - Dielectric resonance member - Google Patents

Dielectric resonance member

Info

Publication number
JPH11340713A
JPH11340713A JP14728398A JP14728398A JPH11340713A JP H11340713 A JPH11340713 A JP H11340713A JP 14728398 A JP14728398 A JP 14728398A JP 14728398 A JP14728398 A JP 14728398A JP H11340713 A JPH11340713 A JP H11340713A
Authority
JP
Japan
Prior art keywords
conductor
dielectric
face
short
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14728398A
Other languages
Japanese (ja)
Inventor
Hiroshi Kuroki
博 黒木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP14728398A priority Critical patent/JPH11340713A/en
Publication of JPH11340713A publication Critical patent/JPH11340713A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a dielectric resonance member of a high Q value and excellent handleability by changing the structure of an outer conductor (short- circuit conductor) formed on a short-circuit end face. SOLUTION: In this dielectric resonance member 10, a through-hole 2 passed through from the open end face of a columnar dielectric block 1 to the short- circuit end face is formed at the block 1, an inner conductor 3 composed of a conductor film is formed on the inner wall surface of the through-hole 2 and an outer conductor 4 composed of the conductor film is formed on the short-circuit end face and respective side faces of the dielectric block 1 respectively. Then, in the outer conductor (short-circuit conductor 40) on the short- circuit end face, a thick film metal conductor film 42 is put on a thin film metal base conductor layer 41.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、複数で誘電体フィ
ルタを構成する誘電体共振部材、または単体で誘電体誘
電体共振器となる誘電体共振部材に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dielectric resonance member comprising a plurality of dielectric filters or a dielectric resonance member which forms a dielectric dielectric resonator by itself.

【0002】[0002]

【従来の技術】誘電体フィルタは、複数の誘電体共振部
材が接合しあって、所定周波数通過帯域を形成する部品
であり、通信機器の高周波用バンドパスフィルタ、アン
テナフィルタなどのフィルタとして誘電体フィルタが多
用されている。
2. Description of the Related Art A dielectric filter is a component in which a plurality of dielectric resonance members are joined to form a predetermined frequency pass band, and is used as a filter for a high-frequency band-pass filter or an antenna filter of a communication device. Many filters are used.

【0003】また、誘電体共振器は、単体の誘電体共振
部材を用いて、共振回路の共振手段となる部品であり、
通信機器の高周波発振回路の共振回路部に多用されてい
る。
[0003] A dielectric resonator is a component that serves as resonance means of a resonance circuit using a single dielectric resonance member.
It is frequently used in the resonance circuit of a high-frequency oscillation circuit of a communication device.

【0004】このような誘電体共振部材は、図1の外観
斜視図に示すように、例えば、誘電体共振器10は、一
方端面(開放端面)から他方端面(短絡端面)に貫通す
る貫通孔2を形成した柱状誘電体ブロック1と、柱状誘
電体ブロック1の貫通孔2の内壁面に形成した導体膜で
ある内導体4と、柱状誘電体ブロック1の他方端面(短
絡端面)及び4つの側面に形成した導体膜である外導体
4(特に、短絡面に形成された外導体を4と付す)とか
ら構成されている。
As shown in the external perspective view of FIG. 1, such a dielectric resonance member has, for example, a through-hole penetrating from one end face (open end face) to the other end face (short-circuit end face). 2, an inner conductor 4 which is a conductor film formed on the inner wall surface of the through hole 2 of the columnar dielectric block 1, the other end face (short-circuit end face) of the columnar dielectric block 1 and four The outer conductor 4 is a conductor film formed on the side surface (especially, the outer conductor formed on the short-circuit surface is denoted by 4).

【0005】尚、誘電体フィルタを構成する場合には、
上述の構造の誘電体共振部材の側面の外導体どうしを互
いに接合し、且つ接合しあった誘電体共振器部材の内導
体どうしが互いに容量結合させていた。例えば、誘電体
共振器の一方端面側の外部で、結合用容量成分を有する
誘電体基板を配置して結合する構造、また、接合しあう
2つの誘電体共振器の接合側面に、誘電体ブロックが露
出する接合窓を形成し、この結合窓が互いに合致するよ
うにして接合させ、2つの誘電体共振器の内導体を結合
窓を介して互いに結合するものであった。
When a dielectric filter is formed,
The outer conductors on the side surfaces of the dielectric resonator member having the above-described structure are joined to each other, and the inner conductors of the joined dielectric resonator members are capacitively coupled to each other. For example, a structure in which a dielectric substrate having a coupling capacitance component is arranged and coupled outside one end face side of a dielectric resonator, and a dielectric block is provided on a joint side surface of two dielectric resonators that are joined to each other. Are formed so that the coupling windows coincide with each other, and the inner conductors of the two dielectric resonators are coupled to each other through the coupling window.

【0006】このような誘電体共振部材である誘電体共
振器10の製造方法は、所定誘電体材料のプレス形成な
どによって、所定形状の誘電体ブロック原型を成型し、
この後、焼結処理によって、貫通孔が形成された誘電体
ブロック1を形成する。次に、内導体3及び外導体4を
形成する。その後、誘電体ブロック1の一方端面の厚膜
導体膜や誘電体フィルタの誘電体共振部材においては、
側面の外導体4の一部に所定結合窓となるように不要な
導体膜を研磨・除去していた。
In a method of manufacturing the dielectric resonator 10 as such a dielectric resonance member, a dielectric block prototype having a predetermined shape is formed by press-forming a predetermined dielectric material.
Thereafter, the dielectric block 1 in which the through holes are formed is formed by a sintering process. Next, the inner conductor 3 and the outer conductor 4 are formed. Thereafter, in the thick conductive film on one end face of the dielectric block 1 and the dielectric resonance member of the dielectric filter,
Unnecessary conductor films have been polished and removed from a part of the outer conductor 4 on the side surface so as to form a predetermined coupling window.

【0007】上述の内導体3及び外導体4を厚膜手法で
形成する場合には、ガラスフリットが含有した銀を主成
分とする導電性ペーストへの誘電体ブロックを浸漬し、
遠心分離処理を繰り返して、誘電体ブロックの全表面
に、均一な厚みの厚膜塗布膜を被着して、この厚膜塗布
膜を800〜900℃で焼きつける。これにより、誘電
体ブロックの全表面(貫通孔2の内壁面も含む)には、
焼きつけられた厚膜導体膜が被着されることになる。
When the above-mentioned inner conductor 3 and outer conductor 4 are formed by a thick film technique, a dielectric block is immersed in a conductive paste containing silver as a main component and containing glass frit.
The centrifugal separation process is repeated, and a thick coating film having a uniform thickness is applied to the entire surface of the dielectric block, and the thick coating film is baked at 800 to 900 ° C. As a result, the entire surface of the dielectric block (including the inner wall surface of the through hole 2)
The baked thick conductor film is deposited.

【0008】また、別の方法として、メッキにより外導
体4及び内導体3を形成する場合には、誘電体ブロック
1の全表面をエッチング処理して粗面化を施して、Pd
等の触媒をコーティングした後、無電解銅メッキ液に浸
漬して、銅を所定膜厚で鍍着させていた。
As another method, when the outer conductor 4 and the inner conductor 3 are formed by plating, the entire surface of the dielectric block 1 is roughened by etching to obtain a Pd
After coating with a catalyst such as this, it was immersed in an electroless copper plating solution to plate copper to a predetermined thickness.

【0009】[0009]

【発明が解決しようとする課題】図4は、厚膜手法で内
導体3及び外導体4を形成した場合の外導体4の一部を
示す。外導体4となる導体には、誘電体ブロック1と密
着を図るために、導電性ペーストにガラスフリットを含
有させている。このため、図4に示すように、焼き付け
られた外導体4において、溶融したガラス成分Gが誘電
体ブロック1側に引き寄せられ強固な密着性が得られ
る。
FIG. 4 shows a part of the outer conductor 4 when the inner conductor 3 and the outer conductor 4 are formed by a thick film technique. The conductor serving as the outer conductor 4 contains glass frit in the conductive paste in order to achieve close contact with the dielectric block 1. For this reason, as shown in FIG. 4, in the baked outer conductor 4, the molten glass component G is attracted to the dielectric block 1 side, and strong adhesion is obtained.

【0010】しかし、その反面、外導体4との界面部分
にガラス成分Gがリッチな層が形成されることになる。
従って、誘電体ブロック1界面側の外導体4の表面部分
の導電率は、金属(ここでは銀)単体の導電率よりもか
なり低くなり、その結果、誘電体共振器のQ特性を劣化
させてしまう。
However, on the other hand, a layer rich in the glass component G is formed at the interface with the outer conductor 4.
Therefore, the conductivity of the surface portion of the outer conductor 4 on the interface side of the dielectric block 1 becomes considerably lower than the conductivity of a single metal (here, silver), and as a result, the Q characteristic of the dielectric resonator deteriorates. I will.

【0011】特に、外導体4や内導体3の高周波電流の
流れを見ると、誘電体ブロック1との界面の表面(内部
の面)の表面部分に集中する。具体的には、表面から深
さ2〜3μm程度に集中して流れている(電流の表皮効
果)。しかも、上述の構造の誘電体共振器10で最も電
流が集中する部分は、短絡導体44部分である。この短
絡導体45部分で特に、電流の表皮効果を充分に発揮で
きないため、充分なQ値を得ることができないという問
題があった。例えば、銀を主成分とする内導体、外導体
を形成した誘電体共振器(外形2mm角で共振周波数9
00MHzとなる高さ)では、理論上Q値が320程度
となるものの、実際には200程度に留まってしまう。
In particular, when the flow of the high-frequency current in the outer conductor 4 and the inner conductor 3 is viewed, the flow concentrates on the surface (inner surface) of the interface with the dielectric block 1. Specifically, it flows intensively from the surface to a depth of about 2 to 3 μm (skin effect of current). In addition, the most concentrated portion of the dielectric resonator 10 having the above-described structure is the short-circuit conductor 44 portion. In particular, since the skin effect of the current cannot be sufficiently exerted at the short-circuit conductor 45, a sufficient Q value cannot be obtained. For example, a dielectric resonator having an inner conductor and an outer conductor mainly composed of silver (having an outer shape of 2 mm square and a resonance frequency of 9 mm).
At a height of 00 MHz), the Q value is theoretically about 320, but actually remains at about 200.

【0012】また、図5では、メッキ手法で外導体4を
形成した場合の外導体4の一部を示す。このメッキ手法
を用いるには、上述したように、誘電体ブロック1と内
導体3、外導体4との密着性を向上させるため、誘電体
ブロック1の表面を粗面Sとする必要がある。これに
は、製造工程上非常に多大な時間を要することになる。
FIG. 5 shows a part of the outer conductor 4 when the outer conductor 4 is formed by a plating technique. In order to use this plating technique, the surface of the dielectric block 1 needs to be roughened S in order to improve the adhesion between the dielectric block 1 and the inner conductor 3 and the outer conductor 4 as described above. This requires a very large amount of time in the manufacturing process.

【0013】また、誘電体共振器10に流れる電流は、
誘電体ブロック1と内導体3、外導体45と界面部分の
表皮に集中して流れるため、この誘電体ブロック1の表
面の粗さに起因して、大きく誘電体共振器のQ特性を劣
化させていた。しかも、無電解銅メッキ自体も、完全・
緻密な金属の銅ではないため、導電率が低く、これによ
って、Q値が劣化してしまう。具体的には、前述の誘電
体共振器で、180程度のQ値しか得られなかった。
The current flowing through the dielectric resonator 10 is:
Since the flow concentrates on the surface of the interface between the dielectric block 1 and the inner conductor 3 and the outer conductor 45, the Q characteristic of the dielectric resonator is greatly deteriorated due to the surface roughness of the dielectric block 1. I was Moreover, the electroless copper plating itself is completely
Since it is not a dense metal of copper, the conductivity is low, and the Q value is thereby deteriorated. Specifically, only a Q value of about 180 was obtained with the above-described dielectric resonator.

【0014】本発明は、上述の問題点に鑑みて案出され
たものであり、その目的は、短絡端面に形成した外導体
の構造の変更して、Q値の高く、取り扱いに優れた誘電
体共振部材を提供するものである。
The present invention has been devised in view of the above-mentioned problems, and has as its object to change the structure of an outer conductor formed on a short-circuit end face to obtain a dielectric material having a high Q value and excellent handling. A body resonance member is provided.

【0015】[0015]

【課題を解決するための手段】本発明は、開放端面及び
短絡端面を有する柱状誘電体ブロックに、前記開放端面
から短絡端面に通じる貫通孔を形成するとともに、該貫
通孔の内壁面に導体膜からなる内導体を、前記誘電体ブ
ロックの短絡端面及び側面に導体膜からなる外導体を夫
々形成して成る誘電体共振部材において前記短絡端面の
外導体は、下地層としての金属薄膜層上に厚膜金属導体
膜を被着して形成されていることを特徴とする誘電体共
振部材である。
According to the present invention, there is provided a columnar dielectric block having an open end face and a short-circuit end face, wherein a through-hole is formed from the open end face to the short-circuit end face, and a conductive film is formed on an inner wall surface of the through-hole. In a dielectric resonance member formed by forming an outer conductor made of a conductive film on the short-circuited end face and the side face of the dielectric block, the outer conductor of the short-circuited end face is formed on a metal thin film layer as a base layer. A dielectric resonance member formed by applying a thick metal conductor film.

【0016】[0016]

【作用】本発明は、誘電体ブロックの短絡端面に、薄膜
技法でもって形成した下地の金属薄膜層を形成し、該薄
膜金属下地導体層上に厚膜金属導体膜を被着している。
According to the present invention, an underlying metal thin film layer formed by a thin film technique is formed on the short-circuit end face of a dielectric block, and a thick metal conductor film is deposited on the thin metal underlying conductor layer.

【0017】即ち、従来のように、メッキ手法を用いる
必要ないため、誘電体ブロックの表面を粗面化処理を施
す必要がないため、製造工程上比較的短時間で形成する
事ができる。
That is, unlike the prior art, there is no need to use a plating technique, and it is not necessary to perform a roughening treatment on the surface of the dielectric block. Therefore, the dielectric block can be formed in a relatively short time in the manufacturing process.

【0018】また、構造的に電流分布密度の高い短絡端
面の外導体(短絡導体)において、誘電体ブロックの表
面を粗面化していないこと、誘電体ブロックとの界面部
分の短絡導体が、完全な金属導体で形成できることか
ら、電流の表皮効果を充分に応え、導電率を高めること
ができる。よって、Q値の向上が達成できる。 しか
も、薄膜金属下地導体層上に厚膜金属導体膜を被着して
いるため、充分な厚みの外導体となり、例えば、外部回
路との接続においても、非常に安定した接続が達成でき
る。
Further, in the outer conductor (short-circuit conductor) of the short-circuit end face having a high current distribution density, the surface of the dielectric block is not roughened, and the short-circuit conductor at the interface with the dielectric block is completely Since it can be formed of a simple metal conductor, it can sufficiently respond to the skin effect of the current and increase the conductivity. Therefore, an improvement in the Q value can be achieved. In addition, since the thick metal conductor film is applied on the thin metal base conductor layer, the outer conductor has a sufficient thickness, and, for example, very stable connection can be achieved even in connection with an external circuit.

【0019】誘電体磁器の短絡端になる方に、銀等の金
属を蒸着または、スッパッタ法によって薄膜形成した後
に、銀ペーストを印刷または浸せき法によって塗布し焼
き付け電極を構成する。
A metal such as silver is vapor-deposited on the short-circuit end of the dielectric ceramic or a thin film is formed by a sputtering method, and then a silver paste is applied by printing or dipping to form a baked electrode.

【0020】[0020]

【発明の実施の形態】以下、本発明の誘電体共振部材を
図面に基づいて説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A dielectric resonance member according to the present invention will be described below with reference to the drawings.

【0021】図1は、誘電体共振部材の一例である誘電
体共振器の外観斜視図であり、図2はその縦断面図であ
り、図3は短絡導体の構成を説明する拡大断面図であ
る。
FIG. 1 is an external perspective view of a dielectric resonator which is an example of a dielectric resonance member, FIG. 2 is a longitudinal sectional view thereof, and FIG. 3 is an enlarged sectional view illustrating the configuration of a short-circuit conductor. is there.

【0022】図において、10は誘電体共振器、1は誘
電体ブロック、2は貫通孔、3は内導体、4は外導体で
ある。尚、外導体4のうち、特に符号40は誘電体ブロ
ック1の短絡端面に形成した短絡導体である。
In the figure, 10 is a dielectric resonator, 1 is a dielectric block, 2 is a through hole, 3 is an inner conductor, and 4 is an outer conductor. In addition, among the outer conductors 4, reference numeral 40 is a short-circuit conductor formed on the short-circuit end face of the dielectric block 1.

【0023】誘電体共振器10を構成する誘電体ブロッ
ク1は、端面寸法、例えば2mm×2mm、長さ(高
さ)、例えば4.6mmの概略直方体形状の誘電体セラ
ミックからなるブロック体1からなり、誘電体ブロック
1の長手方向には、この誘電体ブロック1の一方の端面
(以下、開放端面という)と他方の端面(以下、短絡端
面という)を貫通する貫通孔2が形成されている。尚、
図では、開放端面側の開口付近で2段ステップとなって
いる。
The dielectric block 1 constituting the dielectric resonator 10 is made of a block 1 made of a substantially rectangular parallelepiped dielectric ceramic having an end face size of, for example, 2 mm × 2 mm and a length (height) of, for example, 4.6 mm. In the longitudinal direction of the dielectric block 1, a through hole 2 is formed that penetrates one end face (hereinafter, referred to as an open end face) and the other end face (hereinafter, referred to as a short-circuit end face) of the dielectric block 1. . still,
In the figure, there are two steps near the opening on the open end face side.

【0024】開放端面の貫通孔2の開口径は、例えば
1.2mmであり、短絡端面の開口径は、例えば0.6
mmとなっている。
The opening diameter of the through hole 2 on the open end face is, for example, 1.2 mm, and the opening diameter on the short-circuit end face is, for example, 0.6 mm.
mm.

【0025】このような誘電体ブロック1の貫通孔2の
内壁面には厚膜手法によって形成された厚さ約10μm
の銀を主成分とする導体膜(以下、内導体3)が被着形
成されている。また、誘電体ブロック1の開放端面を除
く5つの外面には、外導体4が被着形成されている。
The inner wall surface of the through hole 2 of the dielectric block 1 has a thickness of about 10 μm formed by a thick film method.
(Hereinafter referred to as inner conductor 3) is formed by deposition. Outer conductors 4 are formed on five outer surfaces of the dielectric block 1 except for the open end surfaces.

【0026】ここで、誘電体ブロック1の4つの側面の
外導体4は、厚膜手法によって形成された厚さ約10μ
mの銀を主成分とする導体膜である。また、誘電体ブロ
ック1の短絡端面の外導体(特に、短絡導体40とい
う)は、誘電体ブロック1側から、薄膜技法によって形
成された厚さ2〜3μmの薄膜金属下地導体層41、厚
膜技法によって形成された厚さ約10μmの厚膜金属導
体膜42の2層構造の導体膜となっている。
The outer conductors 4 on the four side surfaces of the dielectric block 1 have a thickness of about 10 μm formed by a thick film method.
m is a conductor film containing silver as a main component. The outer conductor (especially, short-circuit conductor 40) on the short-circuit end face of the dielectric block 1 is formed from the dielectric block 1 side by a thin-film metal base conductor layer 41 having a thickness of 2 to 3 μm and a thick film formed by a thin-film technique. The conductor film has a two-layer structure of a thick metal conductor film 42 having a thickness of about 10 μm formed by the technique.

【0027】このような構造の誘電体共振器10は、内
導体2の開放端面側が信号側となり、内導体3に入力さ
れた信号は、誘電体共振器10の長さ寸法を、約1/4
波長となる周波数で共振することになり、これによっ
て、共振回路部品として用いられる。
In the dielectric resonator 10 having such a structure, the open end face side of the inner conductor 2 serves as the signal side, and the signal input to the inner conductor 3 reduces the length of the dielectric resonator 10 by about 1 /. 4
It resonates at a frequency that is a wavelength, and is thus used as a resonance circuit component.

【0028】また、上述の誘電体共振器10は、複数の
誘電体共振器どうしを容量接合して、誘電体フィルタと
して用いることもできる。例えば、接合しあう2つの誘
電体共振器の1つの側面(接合側面)に容量結合させる
ための結合窓を形成し、この結合窓を介して、接合した
誘電体共振器の内導体どうしを容量結合させたりする。
The above-described dielectric resonator 10 can also be used as a dielectric filter by capacitively joining a plurality of dielectric resonators. For example, a coupling window for capacitively coupling to one side surface (joining side surface) of two dielectric resonators joined to each other is formed, and the inner conductors of the joined dielectric resonators are connected to each other through the coupling window. Or combine them.

【0029】本発明の特徴的な点は、電流分布密度が最
も高い、誘電体ブロック1の短絡端面部分の外導体4
(短絡導体40)が多層構造となっていることである。
A characteristic of the present invention is that the outer conductor 4 at the short-circuit end face portion of the dielectric block 1 having the highest current distribution density is provided.
(Short-circuit conductor 40) has a multilayer structure.

【0030】即ち、誘電体ブロック1側から、薄膜技法
によって形成された下地層としての金属薄膜層(以下、
薄膜金属下地導体層という)41、厚膜技法によって形
成された厚さ約10μmの厚膜金属導体膜40の2層構
造の導体膜となっている。
That is, from the dielectric block 1 side, a metal thin film layer (hereinafter, referred to as a base layer) formed by a thin film technique.
This is a conductor film having a two-layer structure of a thick metal conductor film 40 having a thickness of about 10 μm formed by a thick film technique.

【0031】従って、電流の表皮効果(導体の表面から
2〜3μmの範囲にほとんどの高周波電流が流れる)に
より、高周波電流の流れやすい短絡導体40の誘電体ブ
ロック1の界面側の表面側が薄膜金属下地導体層41と
なっている。この薄膜金属下地導体層41の厚みは、
0.5〜1.0μm程度となっている。これより、電流
の表皮効果が最も顕著となる誘電体ブロック1との接合
界面部分が、純粋な金属材料で構成できるため、この部
分の導電率を非常に高めることができるため、誘電体共
振器10のQ値が非常に向上させることができる。
Therefore, due to the skin effect of the current (most of the high-frequency current flows in a range of 2 to 3 μm from the surface of the conductor), the surface of the short-circuit conductor 40 on the interface side of the dielectric block 1 where the high-frequency current easily flows is thin film metal. The base conductor layer 41 is provided. The thickness of the thin-film metal base conductor layer 41 is
It is about 0.5 to 1.0 μm. As a result, since the junction interface with the dielectric block 1 where the skin effect of the current is most remarkable can be made of a pure metal material, the conductivity of this portion can be greatly increased, and the dielectric resonator A Q factor of 10 can be greatly improved.

【0032】また、薄膜金属層のみでは、外部回路との
接合信頼性が大きく低下してしまい、実用に適させない
が、本発明では、この薄膜金属下地導体層41上に、厚
膜技法によって形成された焼きつけ厚膜金属導体膜42
が形成されている。これより、外部回路との接合にあっ
たも、何らの支障が発生することがなく、取り扱いが非
常に容易な誘電体共振器となる。
Further, if the thin film metal layer alone is used, the reliability of bonding to an external circuit is greatly reduced, which is not suitable for practical use. However, in the present invention, the thin film metal underlying conductor layer 41 is formed by a thick film technique. Baked thick metal conductor film 42
Are formed. As a result, the dielectric resonator is very easy to handle without any trouble even if it is connected to an external circuit.

【0033】特に、表皮効果の向上に関して、外導体に
銀を主成分とする厚膜金属導体膜42のみで形成した従
来の誘電体共振器(図4)では、密着性を向上させるた
めに、ガラスフリットを含有する銀を主成分とする導体
ペーストを用いており、焼きつけた場合、誘電体ブロッ
ク1と外導体2中のガラス成分が強固に結合しあってい
た。この誘電体ブロック1の界面部分に析出されたガラ
ス成分Gが多くなり、導電率を下げてしまい、表皮抵抗
が大きくなっていたが、本発明の電流分布密度が高い短
絡導体40では、下地に純粋な金属の層である薄膜金属
下地導体層41が存在しているため、この部分の表皮低
下が小さく成る。
In particular, regarding the improvement of the skin effect, in the conventional dielectric resonator (FIG. 4) in which the outer conductor is formed only of the thick metal conductor film 42 containing silver as a main component, in order to improve the adhesion, A conductor paste containing silver as a main component containing glass frit was used, and when baked, the glass components in the dielectric block 1 and the outer conductor 2 were strongly bonded to each other. Although the glass component G precipitated at the interface portion of the dielectric block 1 increased, the conductivity decreased, and the skin resistance increased. However, in the short-circuit conductor 40 having a high current distribution density of the present invention, Since the thin metal base conductor layer 41, which is a pure metal layer, is present, skin reduction in this portion is reduced.

【0034】また、外導体を銅メッキ層で形成した従来
の誘電体共振器(図5)では、メッキ層の密着性を向上
させるため、誘電体ブロック1の表面を粗面S化しなく
てはならなかった。表皮効果を考慮した場合、短絡導体
の誘電体ブロックの界面側の表面が凹凸となり、導電率
を下げる方向に働いてしまう。また、メッキ層では、緻
密な銅金属で構成することができず、これによっても、
導電率の低下が発生してしまっていた。本発明では、電
流分布密度が最も高い外導体4の短絡導体40を薄膜金
属下地導体層41、厚膜金属導体膜42で構成している
ため、両問題を一挙に解決できることになる。
In the conventional dielectric resonator in which the outer conductor is formed by a copper plating layer (FIG. 5), the surface of the dielectric block 1 must be roughened to improve the adhesion of the plating layer. did not become. When the skin effect is taken into consideration, the surface of the short-circuit conductor on the interface side of the dielectric block becomes uneven, which acts in a direction to lower the conductivity. Also, the plating layer cannot be made of dense copper metal,
The conductivity has been reduced. In the present invention, since the short-circuit conductor 40 of the outer conductor 4 having the highest current distribution density is composed of the thin metal base conductor layer 41 and the thick metal conductor film 42, both problems can be solved at once.

【0035】上述の誘電体共振器10は、以下のような
製造方法によって形成される。
The above-described dielectric resonator 10 is formed by the following manufacturing method.

【0036】まず、例えば、BaO−TiO2 系、Zr
2 −SnO2 −TiO2 系、BaO−Sm2 3 −T
iO2 系、BaO−Nd2 3 −TiO2 系またはCa
O−TiO2 −SiO2 系などの所定誘電体材料をプレ
ス形成し、焼成処理して上述したように、貫通孔2が形
成された誘電体ブロック1を成型する。
First, for example, a BaO—TiO 2 system, Zr
O 2 —SnO 2 —TiO 2 , BaO—Sm 2 O 3 —T
iO 2 system, BaO-Nd 2 O 3 -TiO 2 system or Ca
A predetermined dielectric material such as an O—TiO 2 —SiO 2 system is press-formed and fired to mold the dielectric block 1 in which the through holes 2 are formed as described above.

【0037】次に、誘電体ブロックの短絡端面となる端
面に、薄膜金属下地導体層41を形成する。具体的に
は、スパッタリングなどの薄膜技法によって形成する。
スパッタ装置に、誘電体ブロックの短絡端面を銀ターゲ
ットに向かって配置し、装置内を10-5Torrの真空
にし、誘電体ブロックの配置した部分にヒーターで40
0℃に温度をあげる。そして、アルゴンガスを供給し、
装置内を10-2Torrの真空に維持して、その後、銀
ターゲットに電荷を加え(100W)、スパッタする。
時間は1時間程度で、薄膜金属下地導体層41である銀
層の厚みは、約0.8μmとなる。
Next, a thin-film metal base conductor layer 41 is formed on the end face of the dielectric block that will be the short-circuit end face. Specifically, it is formed by a thin film technique such as sputtering.
In the sputtering apparatus, the short-circuited end face of the dielectric block is arranged toward the silver target, the inside of the apparatus is evacuated to 10 -5 Torr, and a heater is applied to the portion where the dielectric block is arranged using a heater.
Increase temperature to 0 ° C. And supply argon gas,
The inside of the apparatus is maintained at a vacuum of 10 -2 Torr, and thereafter, a charge is applied to the silver target (100 W) to perform sputtering.
The time is about one hour, and the thickness of the silver layer as the thin-film metal underlying conductor layer 41 is about 0.8 μm.

【0038】この時、誘電体ブロック1にマスクを施し
ていないため、銀の薄膜金属下地導体層41が被着され
る領域は、短絡端面のみでなく短絡端面近傍の貫通孔2
の内壁や誘電体ブロック1の側面部分にも及ぶものの、
短絡端面を中心としたこの部分に電流が最も集中するた
め、Q特性を上げる効果がある。
At this time, since the dielectric block 1 is not masked, the area where the silver thin-film metal base conductor layer 41 is deposited is not limited to the short-circuit end face but also to the through hole 2 near the short-circuit end face.
Of the inner wall and the side surface of the dielectric block 1,
Since the current is concentrated most on this portion centered on the short-circuit end face, there is an effect of improving the Q characteristic.

【0039】次に、誘電体ブロック1の貫通孔2の内壁
面及び開放端面を除く外周面に厚膜金属導体膜42を形
成する。即ち、誘電体ブロック1の貫通孔2の内壁面に
被着された導体膜が内導体3となり、誘電体ブロック1
の外周面に被着された導体膜が外導体4となる。尚、誘
電体ブロック1の短絡端面では、薄膜金属下地導体層4
1上に、厚膜金属導体膜42が形成されることになり、
特に、短絡導体40となる。
Next, a thick metal conductor film 42 is formed on the outer peripheral surface excluding the inner wall surface and the open end surface of the through hole 2 of the dielectric block 1. That is, the conductor film adhered to the inner wall surface of the through hole 2 of the dielectric block 1 becomes the inner conductor 3, and the dielectric block 1
The conductor film adhered to the outer peripheral surface of the outer conductor 4 becomes the outer conductor 4. The short-circuited end face of the dielectric block 1 has
1, a thick metal conductor film 42 is formed,
In particular, it becomes the short-circuit conductor 40.

【0040】具体的には、ガラスフリットを含有した銀
を主成分とする導電性ペーストに、薄膜金属下地導体層
41を形成した誘電体ブロック1を浸漬し、次いで、余
分なペーストを遠心力により振り切り、乾燥する。これ
を所定膜厚(表皮厚みの2〜3倍、約6〜10μm)に
なるよう繰り返し、最後に900℃にて焼き付ける。
More specifically, the dielectric block 1 on which the thin-film metal base conductor layer 41 is formed is immersed in a conductive paste containing silver as a main component and containing glass frit. Shake off and dry. This is repeated to a predetermined film thickness (2 to 3 times the skin thickness, about 6 to 10 μm), and finally baking at 900 ° C.

【0041】その後、誘電体共振器10の開放端面とな
る一方の端面を研磨処理して、厚膜金属導体膜42を除
去して1/4波長型の誘電体共振器となる。
Thereafter, one end face of the dielectric resonator 10, which is to be an open end face, is polished to remove the thick metal conductor film 42, thereby obtaining a quarter-wavelength type dielectric resonator.

【0042】本発明の誘電体共振器(共振周波数900
MHzとなる高さ)では、Q値が230も得られ、例え
ば、薄膜金属下地導体層41の形成を行っていない従来
の誘電体共振器のQ値(200程度)、外導体及び内導
体をメッキで形成した従来の誘電体共振器のQ値(18
0程度)に比較して、大幅にQ値を向上させることがで
きる。
The dielectric resonator of the present invention (resonant frequency 900
(Height at which the frequency becomes MHz), a Q value of 230 is also obtained. For example, the Q value (about 200) of the conventional dielectric resonator in which the thin-film metal underlying conductor layer 41 is not formed, the outer conductor and the inner conductor The Q value of a conventional dielectric resonator formed by plating (18
(About 0), the Q value can be greatly improved.

【0043】このような誘電体共振部材を、誘電体フィ
ルタに用いることにより、挿入損失が非常に小さい特性
に優れた誘電体フィルタとなる。
By using such a dielectric resonance member for a dielectric filter, a dielectric filter having very small insertion loss and excellent characteristics can be obtained.

【0044】尚、上述の実施例では、誘電体ブロック1
の形状が角柱状となっているが、例えば、円柱状として
もよい。また、電流密度分布が最も高い短絡端面に形成
された短絡導体40を中心に説明したが、外導体4の全
て、または内導体3も、上述したように、薄膜技法によ
る薄膜金属下地導体層41、厚膜技法による厚膜金属導
体膜42の多層構造にしても構わない。また、薄膜金属
下地導体層41の厚みを表皮効果の効率が充分に発揮で
きるよう2〜3μmの厚みと厚くしても構わない。
In the above embodiment, the dielectric block 1
Has a prismatic shape, but may be, for example, a columnar shape. Although the description has been made centering on the short-circuit conductor 40 formed on the short-circuit end face having the highest current density distribution, as described above, all of the outer conductors 4 or the inner conductor 3 may be formed by the thin-film metal base conductor layer 41 by the thin-film technique. Alternatively, a multilayer structure of the thick metal conductor film 42 by a thick film technique may be used. Further, the thickness of the thin-film metal underlying conductor layer 41 may be increased to a thickness of 2 to 3 μm so that the efficiency of the skin effect can be sufficiently exhibited.

【0045】また、誘電体フィルタの説明してと、誘電
体共振部材を複数接合したフィルタ構造で説明している
が、複数の共振部が形成できるように誘電体ブロックを
形成し、この誘電体ブロックに複数の貫通孔を形成した
複数の共振部一体型のフィルタ構成であっても構わな
い。この場合には、複数の貫通孔が開口する他方端面に
上述の薄膜技法による薄膜金属下地導体層41、厚膜技
法による厚膜金属導体膜42の多層構造としても構わな
い。
In the description of the dielectric filter, a filter structure in which a plurality of dielectric resonance members are joined has been described. However, a dielectric block is formed so that a plurality of resonance units can be formed, and the dielectric block is formed. A filter configuration in which a plurality of through-holes are formed in the block and a plurality of resonating sections are integrated may be used. In this case, a multi-layer structure of the thin metal base conductor layer 41 by the thin film technique described above and the thick metal conductor film 42 by the thick film technique on the other end face where the plurality of through holes are opened may be used.

【0046】[0046]

【発明の効果】本発明によれば、電流密度分布の高い誘
電体共振部材の短絡導体が、高周波電流が流れ易い誘電
体ブロックとの界面部分が、薄膜技法で形成された薄膜
金属下地導体層と、厚膜金属導体膜との多層構造となっ
ている。このため、この部分の導電率を非常に向上させ
ることができ、これにより、高いQ値の誘電体共振部材
となる。
According to the present invention, a short-circuit conductor of a dielectric resonance member having a high current density distribution has a thin-film metal base conductor layer in which an interface portion with a dielectric block through which a high-frequency current easily flows is formed by a thin-film technique. And a thick metal conductor film. For this reason, the conductivity of this portion can be greatly improved, and as a result, a dielectric resonator member having a high Q value can be obtained.

【0047】また、薄膜技法による膜厚の薄さを、厚膜
金属導体膜で補充して、充分な厚みの外導体としている
ため、高周波電流の表皮効果(表面から2〜3μmの表
面に流れる)を充分発揮できる。また、外部回路との接
合にするにあたっても、従来どおりの信頼性が維持でき
る。
Further, since the outer conductor having a sufficient thickness is supplemented with the thin metal film by the thin film technique to provide a sufficient thickness of the outer conductor, the skin effect of the high-frequency current (flows from the surface to a surface of 2 to 3 μm from the surface). ) Can be fully demonstrated. In addition, the reliability as before can be maintained even when the connection with the external circuit is made.

【0048】よって、Q値の高く、取り扱いに優れた誘
電体共振部材となる。
Thus, a dielectric resonance member having a high Q value and excellent handling can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】誘電体共振部材である誘電体共振器の外観斜視
図である。
FIG. 1 is an external perspective view of a dielectric resonator that is a dielectric resonance member.

【図2】図1のX−X線断面に相当する本発明の誘電体
共振部材である誘電体共振器の断面図である。
FIG. 2 is a cross-sectional view of a dielectric resonator which is a dielectric resonance member of the present invention and corresponds to a cross section taken along line XX of FIG.

【図3】図2の丸部分の拡大した外導体の部分断面図で
ある。
FIG. 3 is a partial cross-sectional view of an outer conductor in which a circle portion in FIG. 2 is enlarged.

【図4】従来の誘電体共振器の外導体の部分断面図であ
る。
FIG. 4 is a partial sectional view of an outer conductor of a conventional dielectric resonator.

【図5】従来の別の誘電体共振器の外導体の部分断面図
である。
FIG. 5 is a partial cross-sectional view of an outer conductor of another conventional dielectric resonator.

【符号の説明】[Explanation of symbols]

10・・・誘電体共振器 1・・・・・・・誘電体ブロック 2・・・・・・・貫通孔 3・・・・・・・内導体 4・・・・・・・外導体 40・・・・・・短絡導体 41・・・・・薄膜金属下地導体層 42・・・・・厚膜金属導体膜 10 Dielectric resonator 1 Dielectric block 2 Through hole 3 Inner conductor 4 Outer conductor 40 ················································ Thick metal conductor film

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 開放端面及び短絡端面を有する柱状誘電
体ブロックに、前記開放端面から短絡端面に通じる貫通
孔を形成するとともに、該貫通孔の内壁面に導体膜から
なる内導体を、前記誘電体ブロックの短絡端面及び側面
に導体膜からなる外導体を夫々形成して成る誘電体共振
部材において、 前記短絡端面の外導体は、下地層としての金属薄膜層上
に厚膜金属導体膜を被着して形成されていることを特徴
とする誘電体共振部材。
1. A columnar dielectric block having an open end face and a short-circuit end face, a through-hole extending from the open end face to the short-circuit end face is formed, and an inner conductor made of a conductive film is formed on an inner wall surface of the through-hole by the dielectric. In a dielectric resonance member in which an outer conductor made of a conductive film is formed on each of a short-circuit end face and a side face of a body block, the outer conductor on the short-circuit end face is covered with a thick metal conductor film on a metal thin film layer as a base layer. A dielectric resonance member formed by wearing.
JP14728398A 1998-05-28 1998-05-28 Dielectric resonance member Pending JPH11340713A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14728398A JPH11340713A (en) 1998-05-28 1998-05-28 Dielectric resonance member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14728398A JPH11340713A (en) 1998-05-28 1998-05-28 Dielectric resonance member

Publications (1)

Publication Number Publication Date
JPH11340713A true JPH11340713A (en) 1999-12-10

Family

ID=15426713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14728398A Pending JPH11340713A (en) 1998-05-28 1998-05-28 Dielectric resonance member

Country Status (1)

Country Link
JP (1) JPH11340713A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9799939B2 (en) 2014-07-07 2017-10-24 Murata Manufacturing Co., Ltd. Filtering device and method for adjusting filter characteristic
CN107706488A (en) * 2017-09-30 2018-02-16 厦门松元电子有限公司 A kind of multistage resonance bandpass filter of structural type
CN111490328A (en) * 2020-06-03 2020-08-04 安徽浩源恒方通信技术有限公司 Metallization process of dielectric waveguide filter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9799939B2 (en) 2014-07-07 2017-10-24 Murata Manufacturing Co., Ltd. Filtering device and method for adjusting filter characteristic
CN107706488A (en) * 2017-09-30 2018-02-16 厦门松元电子有限公司 A kind of multistage resonance bandpass filter of structural type
CN111490328A (en) * 2020-06-03 2020-08-04 安徽浩源恒方通信技术有限公司 Metallization process of dielectric waveguide filter

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