JPH11333443A - Recycling method for rinse wastewater - Google Patents

Recycling method for rinse wastewater

Info

Publication number
JPH11333443A
JPH11333443A JP14451998A JP14451998A JPH11333443A JP H11333443 A JPH11333443 A JP H11333443A JP 14451998 A JP14451998 A JP 14451998A JP 14451998 A JP14451998 A JP 14451998A JP H11333443 A JPH11333443 A JP H11333443A
Authority
JP
Japan
Prior art keywords
pure water
wastewater
water
distillation
recovered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP14451998A
Other languages
Japanese (ja)
Inventor
Kazunori Koba
和則 木場
Masahiro Kurokawa
昌洋 黒河
Kazuo Yoshida
和男 吉田
Shiro Inoue
司朗 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Zosen Corp
Original Assignee
Hitachi Zosen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Zosen Corp filed Critical Hitachi Zosen Corp
Priority to JP14451998A priority Critical patent/JPH11333443A/en
Publication of JPH11333443A publication Critical patent/JPH11333443A/en
Withdrawn legal-status Critical Current

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  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a recycling method for rinse wastewater whereby rinse wastewater contg. a high-boiling component is recovered from the step of wafer cleaning in a semiconductor production factory and is sent to a distillation-type pure water production apparatus to be used as feed water for the pure water production by distillation. SOLUTION: A pure water production/waste water recycling system for glass substrates or liq. crystals in a liq. crystal production process is provided. Pure water used at a use point 4 is recovered separately according to chemicals used. Rinse wastewater contg. TMAH is adjusted to a neutral pH at a pH- adjusting vessel 5 and then is recovered into a raw water vessel 1 or the wastewater is directly recovered into a raw water vessel 1 and then is adjusted to a desired pH (weakyl acidic, i.e., a pH of 4.2-6.5) at the upstream side of a vacuum deaerator 2, a pretreatment apparatus. A pure water production apparatus 3 used is a distillation apparatus. The concentrating ratio of the pure water production apparatus, though determined by the properties of feed water, is set at 4-5, and the blowdown is joined with other waste water and, if necessary, is subjected to a wastewater treatment to a degree suitable for discharge.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、半導体工業等の
電子工業で使用された純水の回収方法に関し、より詳し
くは、半導体製造工場でのウエハ洗浄工程において生じ
る、高沸点成分を含むリンス排水を、同工程から回収し
て蒸溜法純水製造装置へ送って蒸溜法純水製造の供給水
として再使用するリンス排水のリサイクル法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for recovering pure water used in the electronics industry such as the semiconductor industry, and more particularly, to rinse water containing high-boiling components generated in a wafer cleaning process in a semiconductor manufacturing plant. Rinsing wastewater collected from the same process, sent to a distillation pure water production apparatus, and reused as supply water for the distillation pure water production.

【0002】[0002]

【従来の技術】従来は、TMAHリンス排水および有機
系リンス排水は、純水製造装置の供給水としては回収さ
れておらず、有機系リンス排水は、pH調整、生物処
理、凝集沈殿などの排水処理を施して放流されている。
2. Description of the Related Art Conventionally, TMAH rinsing wastewater and organic rinsing wastewater have not been recovered as feed water for a pure water production system, and organic rinsing wastewater is a wastewater for pH adjustment, biological treatment, coagulation sedimentation and the like. It has been treated and released.

【0003】[0003]

【発明が解決しようとする課題】近年、環境問題への関
心の高まりから、大量に超純水を使用する半導体製造過
程でも、使用した超純水のリンス排水を回収、再使用す
ることが検討されている。
In recent years, due to the growing interest in environmental issues, it has been studied to recover and reuse rinse water used in ultra-pure water even in a semiconductor manufacturing process using a large amount of ultra-pure water. Have been.

【0004】無機系のリンス排水は、活性炭濾過、イオ
ン交換装置を通して回収されている。
[0004] Inorganic rinse wastewater is recovered through activated carbon filtration and ion exchange equipment.

【0005】有機系のリンス排水は、紫外線酸化、生物
処理および膜分離を組み合わせた処理を施して、雑用水
として回収することが試みられている。
[0005] Attempts have been made to recover organic rinsing wastewater by performing a treatment combining ultraviolet oxidation, biological treatment and membrane separation, and collecting the wastewater.

【0006】しかし、従来法の超純水の製造プロセス
は、主にイオン交換技術と膜分離技術を組み合わせたシ
ステムからなるので、これらにバクテリアやバクテリア
の餌となる有機物が入り込むとイオン交換樹脂や膜でバ
クテリアスライムが発生し、流路閉塞などのトラブルを
発生するおそれがある。そのため、有機系のリンス排水
は、純水製造の供給水として回収されていないのが現状
である。
However, since the conventional ultrapure water production process mainly comprises a system combining ion exchange technology and membrane separation technology, when bacteria or organic substances serving as bait for bacteria enter the system, ion exchange resin or Bacterial slime may be generated on the membrane, which may cause troubles such as blockage of the flow path. For this reason, at present, organic rinse wastewater is not recovered as supply water for pure water production.

【0007】この発明は、高沸点成分を含むリンス排水
を、半導体製造工場でのウエハ洗浄工程から回収して蒸
溜法純水製造装置へ送って蒸溜法純水製造の供給水とし
て再使用するリンス排水のリサイクル法を提供すること
を目的とする。
According to the present invention, a rinsing wastewater containing a high boiling point component is recovered from a wafer cleaning process in a semiconductor manufacturing plant, sent to a distillation pure water production apparatus, and reused as supply water for the distillation pure water production. It aims to provide a wastewater recycling law.

【0008】[0008]

【課題を解決するための手段】この発明によるリンス排
水のリサイクル法は、水の蒸留温度より高い沸点を有す
る物質を含むリンス排水を回収し蒸溜法純水製造法の供
給水として再使用する方法である。
SUMMARY OF THE INVENTION A method of recycling rinse water according to the present invention is a method of recovering rinse water containing a substance having a boiling point higher than the distillation temperature of water and reusing it as feed water in a distillation pure water production method. It is.

【0009】上記物質は例えば水酸化テトラメチルアン
モニウム(Tetramethyl ammonium hydroxide、以下TM
AHと略記する、130℃で分解)、N−メチル−2−
ピロリドン(沸点204℃)である。
The above substances are, for example, tetramethyl ammonium hydroxide (hereinafter referred to as TM).
AH, decomposed at 130 ° C.), N-methyl-2-
Pyrrolidone (boiling point 204 ° C.).

【0010】上記リンス排水をpH調整した後、回収し
蒸溜法純水製造法の供給水として再使用することが好ま
しい。
After the pH of the above rinse water is adjusted, it is preferable to recover the rinse water and reuse it as feed water for the distillation pure water production method.

【0011】[0011]

【発明の実施の形態】蒸溜法純水製造装置は、減圧条件
で供給水を蒸発させ、その発生した蒸気に同伴するミス
トを除去してピュア蒸気を得、そのピュア蒸気を凝縮し
純水を得るものである。
BEST MODE FOR CARRYING OUT THE INVENTION A distillation pure water production apparatus evaporates supply water under reduced pressure, removes mist accompanying the generated steam, obtains pure steam, condenses the pure steam, and converts the pure water to pure water. What you get.

【0012】従って、水の蒸発温度よりも高い沸点を有
する物質は蒸発せず、純水側には含まれない。逆に、水
の蒸発温度よりも低い沸点を有する物質は水と共に蒸発
し、純水側に含まれる。
Accordingly, substances having a boiling point higher than the evaporation temperature of water do not evaporate and are not included in the pure water side. Conversely, a substance having a boiling point lower than the evaporation temperature of water evaporates with water and is included in the pure water side.

【0013】供給水に有機物やバクテリアが含まれてい
ても、蒸留法純水製造装置の第一効用工程で供給水は約
90℃に加温されるので、熱殺菌されたバクテリアは死
滅し、純水製造装置でバクテリア起因のトラブルは発生
しない。
[0013] Even if the feed water contains organic matter and bacteria, the feed water is heated to about 90 ° C in the first effect step of the distillation pure water production apparatus, so that the heat-sterilized bacteria die, No trouble caused by bacteria occurs in the pure water production equipment.

【0014】このことから、簡単な蒸留テストを行うこ
とで、対象物質が蒸留液側に混入しないことを確認すれ
ば、同物質を含むリンス排水を回収し蒸留法純水製造法
の原水として再使用することができる。
[0014] Based on this, if a simple distillation test is performed to confirm that the target substance does not enter the distillate side, rinse water containing the substance is recovered and reused as raw water for the distillation pure water production method. Can be used.

【0015】次に50ppmのTMAHを蒸留テストし
た結果を示す。
Next, the results of a distillation test of 50 ppm of TMAH are shown.

【0016】[0016]

【表1】 この結果より、TMAH希薄溶液(54ppm)を蒸留
しても、蒸留液側にはTOC成分およびアンモア成分と
も含まれないことが確認できた。
[Table 1] From these results, it was confirmed that even when the dilute TMAH solution (54 ppm) was distilled, neither the TOC component nor the unmore component was contained on the distillate side.

【0017】蒸溜法純水製造装置にはミスト分離器があ
るので、蒸留テスト器よりミスト分離効果は良くなる。
Since the apparatus for producing pure water by the distillation method has a mist separator, the mist separation effect is better than that of a distillation tester.

【0018】上記テストは、TMAHリンス排水のpH
を調整せずアルカル溶液のままで実施したが、リンス排
水のpHを調整して中性あるいは弱酸性側で同排水を供
給水として再使用すれば、TMAHは更に揮発しにくく
なる。
The above test was conducted to determine the pH of the TMAH rinse wastewater.
However, TMAH is more difficult to volatilize if the pH of the rinsing wastewater is adjusted and the wastewater is reused as feed water on the neutral or weakly acidic side.

【0019】以上のことより、TMAHリンス排水はp
H調整を実施するだけで蒸留法純水製造装置の供給水と
して回収できることが判る。
From the above, the TMAH rinse drainage is p
It can be seen that the water can be recovered as feed water for the distillation pure water production apparatus only by performing H adjustment.

【0020】また、高沸点成分の有機アルカリもTMA
H同様に回収できる。
The organic alkali having a high boiling point is also TMA.
H can be recovered.

【0021】実施例1 図1は、液晶製造過程におけるガラス基板や液晶などの
純水製造/排水回収システムを示すものである。
Embodiment 1 FIG. 1 shows a pure water production / drainage recovery system for a glass substrate, a liquid crystal and the like in a liquid crystal production process.

【0022】ユースポイント(4) で使用された純水は、
使用薬品系統別に分別回収される。TMAHを含むリン
ス排水(例えばTMAH濃度54ppmでpH9.7)
は、pH調整槽(5) で中性にpH調整されて原水槽(1)
に回収されるか、原水槽(1) に直接回収され前処理の真
空脱気器(2) 上流で所定のpH(弱酸性側pH4.2〜
6.5)に調整される。
The pure water used at the use point (4) is
Collected separately for each chemical system used. Rinse wastewater containing TMAH (eg, TMAH concentration of 54 ppm and pH 9.7)
Is adjusted to neutral pH in the pH adjusting tank (5) and the raw water tank (1)
Or a predetermined pH (weakly acidic pH 4.2-
Adjusted to 6.5).

【0023】純水製造装置(3) は蒸溜法の装置である。
純水製造装置(3) の濃縮倍率は供給水の性状によって決
まるが、濃縮倍率は4〜5倍の範囲とし、ブローダウン
は他の排水と合流させ、必要ならば放流に適するまでの
排水処理を実施して放流する。
The pure water producing apparatus (3) is an apparatus of a distillation method.
The concentration ratio of the pure water production equipment (3) is determined by the properties of the feed water, but the concentration ratio should be in the range of 4 to 5 times. Blowdown should be combined with other wastewater, and if necessary, wastewater treatment until suitable for discharge. And discharge.

【0024】実施例2 図2は、半導体製造過程での超純水製造/排水回収シス
テムを示すものである。
Embodiment 2 FIG. 2 shows an ultrapure water production / drainage recovery system in a semiconductor production process.

【0025】ユースポイント(4) で使用された超純水
は、使用薬品系統別に分別回収される。
The ultrapure water used at the use point (4) is separated and collected for each chemical system used.

【0026】TMAHを含むリンス排水(例えばTMA
H濃度54ppmでpH9.7)は、pH調整槽(5) で
中性にpH調整されて原水槽(1) に回収されるか、原水
槽(1) に直接回収され前処理の真空脱気器(2) 上流で所
定のpH(弱酸性側pH4.2〜6.5)に調整され
る。
Rinse drainage containing TMAH (eg, TMA
The H concentration of 54 ppm and pH of 9.7) is adjusted to neutral pH in the pH adjusting tank (5) and collected in the raw water tank (1), or collected directly in the raw water tank (1) and vacuum degassed for pretreatment. It is adjusted to a predetermined pH (weakly acidic pH 4.2 to 6.5) upstream of the vessel (2).

【0027】一次純水系の純水製造装置は、蒸留法の装
置である。純水製造装置(3) の濃縮倍率は供給水の性状
によって決まるが、濃縮倍率は4〜5倍の範囲とし、ブ
ローダウンは他の排水と合流させ、必要ならば放流に適
するまでの排水処理を実施して放流する。
The primary pure water-based pure water producing apparatus is an apparatus of a distillation method. The concentration ratio of the pure water production equipment (3) is determined by the properties of the feed water, but the concentration ratio should be in the range of 4 to 5 times. Blowdown should be combined with other wastewater, and if necessary, wastewater treatment until suitable for discharge. And discharge.

【0028】サブシステムは従来法のものと同じにす
る。すなわち、サブシステムは、TOC成分を1ppb
以下にする紫外線酸化装置(6) 、微量金属イオンを除去
するカートリッジ・ポリッシャー(7) 、および微粒子除
去の限外濾過装置(8) から構成されている。カートリッ
ジ・ポリッシャー(7) は非再生のイオン交換樹脂を内蔵
したものである。
The subsystem is the same as that of the conventional method. That is, the subsystem sets the TOC component to 1 ppb
The apparatus comprises an ultraviolet oxidation device (6), a cartridge polisher (7) for removing trace metal ions, and an ultrafiltration device (8) for removing fine particles. The cartridge polisher (7) contains a non-regenerated ion exchange resin.

【0029】[0029]

【発明の効果】この発明方法によれば、高沸点成分を含
むリンス排水を、半導体製造工場でのウエハ洗浄工程か
ら回収して蒸溜法純水製造装置へ送って蒸溜法純水製造
の供給水として再使用することができる。
According to the method of the present invention, rinse water containing high-boiling components is recovered from a wafer cleaning step in a semiconductor manufacturing plant and sent to a distillation-method pure water producing apparatus to supply water for distillation-method pure water production. As can be reused.

【0030】これに伴って、原水としての工水や市水の
使用量を低減することができ、これにより純水製造コス
トの低減を達成することができる。
Accordingly, it is possible to reduce the amount of industrial water and city water used as raw water, thereby achieving a reduction in pure water production cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は、液晶製造過程におけるガラス基板や液
晶などの純水製造/排水回収システムを示すフローシー
トである。
FIG. 1 is a flow sheet showing a pure water production / drainage recovery system for a glass substrate, a liquid crystal and the like in a liquid crystal production process.

【図2】図2は、半導体製造過程での超純水製造/排水
回収システムを示すフローシートである。
FIG. 2 is a flow sheet showing an ultrapure water production / drainage recovery system in a semiconductor production process.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 吉田 和男 大阪市住之江区南港北1丁目7番89号 日 立造船株式会社内 (72)発明者 井上 司朗 大阪市住之江区南港北1丁目7番89号 日 立造船株式会社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Kazuo Yoshida 1-7-89 Minami Kohoku, Suminoe-ku, Osaka-shi Inside Tachibana Shipbuilding Co., Ltd. (72) Inventor Shiro Inoue 1-7-89 Minami Kohoku, Suminoe-ku, Osaka-shi No.Tachi Shipbuilding Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 水の蒸留温度より高い沸点を有する物質
を含むリンス排水を回収し蒸溜法純水製造法の供給水と
して再使用するリンス排水のリサイクル法。
1. A method of recycling rinsing wastewater in which rinsing wastewater containing a substance having a boiling point higher than the distillation temperature of water is collected and reused as feed water in a distillation pure water production method.
【請求項2】 上記物質が水酸化テトラメチルアンモニ
ウムまたはN−メチル−2−ピロリドンである、請求項
1記載のリサイクル法。
2. The method according to claim 1, wherein said substance is tetramethylammonium hydroxide or N-methyl-2-pyrrolidone.
【請求項3】 上記リンス排水をpH調整した後、回収
し蒸溜法純水製造法の供給水として再使用する、請求項
1または2記載のリサイクル法。
3. The recycling method according to claim 1, wherein after the pH of the rinse wastewater is adjusted, the rinse wastewater is recovered and reused as feed water in a distillation pure water production method.
JP14451998A 1998-05-26 1998-05-26 Recycling method for rinse wastewater Withdrawn JPH11333443A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14451998A JPH11333443A (en) 1998-05-26 1998-05-26 Recycling method for rinse wastewater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14451998A JPH11333443A (en) 1998-05-26 1998-05-26 Recycling method for rinse wastewater

Publications (1)

Publication Number Publication Date
JPH11333443A true JPH11333443A (en) 1999-12-07

Family

ID=15364235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14451998A Withdrawn JPH11333443A (en) 1998-05-26 1998-05-26 Recycling method for rinse wastewater

Country Status (1)

Country Link
JP (1) JPH11333443A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098272A (en) * 2005-10-04 2007-04-19 Kobelco Eco-Solutions Co Ltd Ammonia-containing water treatment method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098272A (en) * 2005-10-04 2007-04-19 Kobelco Eco-Solutions Co Ltd Ammonia-containing water treatment method and apparatus

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