JPH11329935A - Scanning projection aligner and optical projection system suitable therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a reflection/refraction optical projection system relatively short overall length in which the arcuate region subjected to aberration correction can be widened while enhancing the throughput and reducing the size. SOLUTION: The scanning projection aligner for projection exposing the image of a first object onto a second object at substantially unit magnification through a reflection/refraction optical projection system while moving the first and second objects comprises telecentric optical systems on both the first and second object sides, a first positive lens group GP1, a first negative lens group GN1, a first concave reflection plane CCM, a second positive lens group GP2, a convex reflector plane CVM, and a second concave reflection plane CCM. Light from the first object 10 passes sequentially through the first positive lens group, first negative lens group, first concave reflection plane, first negative lens group, second positive lens group, convex reflector plane, second positive lens group, first negative lens group, second concave reflection plane, first negative lens group, and first positive lens group before arriving at the second object 30.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning type projection exposure apparatus for performing exposure while moving a first object (a mask, a reticle, etc.) and a second object (a substrate, etc.). The present invention relates to a catadioptric projection optical system suitable for a projection exposure apparatus.

[0002]

2. Description of the Related Art A scanning type catadioptric projection optical system having a high resolution and a wide field is disclosed, for example, in Japanese Patent Laid-Open No. 7-5609. Further, a scanning reflection projection optical system having a high resolution and a wide field is disclosed in, for example,
No. 51083.

[0003]

In the scanning catadioptric projection optical system as described above, the object plane (mask, reticle, etc.)
Since the distance from the lens to the concave mirror is relatively long, the mechanism for holding the optical members is increased in size, and it is difficult to maintain the positional accuracy between the optical members. In addition, since the width of the arc-shaped region in which the aberration is corrected is relatively narrow, it is difficult to improve the scanning speed under the same exposure energy amount, which has a problem of adversely affecting the throughput of the projection exposure apparatus.

Further, in the case of a reflection projection optical system, there is a problem that an optical member constituting the projection optical system becomes large, and it is difficult to manufacture it with high precision. Accordingly, the present invention provides a catadioptric projection optical system having a relatively short overall length and capable of increasing the width of an arc-shaped region in which aberrations are corrected, and thus achieves high throughput and miniaturization. It is an object of the present invention to provide a projection exposure apparatus.

[0005]

In order to achieve the above object, a scanning projection exposure apparatus according to the present invention moves a first object and a second object as shown in FIG. 1, for example. A scanning projection exposure apparatus for projecting and exposing an image of the first object onto the second object at substantially the same magnification, wherein the image of the first object is projected on the second object. A catadioptric projection optical system, wherein the first object side and the second object side are both telecentric optical systems, and a first positive lens having a positive refractive power. Group, a first negative lens group having a negative refractive power, a first concave reflecting surface, a second positive lens group having a positive refractive power, a convex reflecting mirror, and a second concave reflecting surface The light from the first object passes through the first positive lens group and the first negative lens group in order, Reached concave reflecting surface, the light reflected by the first concave reflecting surface, reaches the first negative lens group and the second positive lens group in the convex reflector over sequentially,
The light reflected by the convex reflecting mirror reaches the second concave reflecting surface via the second positive lens group and the first negative lens group in order, and the light reflected by the second concave reflecting surface The catadioptric projection optical system is configured to reach the second object via the first negative lens group and the first positive lens group in order, and form the image on the second object. Things.

In the present invention, the focal length of the first positive lens group in the catadioptric projection optical system is f1P
When the focal length is LG and the focal length of the second positive lens group in the catadioptric projection optical system is f2PLG, it is preferable that f2PLG-f1PLG ≧ 0 (1) is satisfied.

In a preferred aspect of the present invention, the first positive lens group and the second positive lens group are formed integrally. In the present invention,
It is preferable that the first and second concave reflecting surfaces in the catadioptric projection optical system are formed on one concave reflecting mirror. When the focal length of the concave reflecting mirror in the catadioptric projection optical system is fCC, and the focal length of the convex reflecting mirror in the catadioptric projection optical system is fCV, -1.6 <fCC /FCV<−0.6 (2)

In the present invention, the focal length of the first negative lens unit is f1NLG, the focal length of the first positive lens unit is f1PLG, and the focal length of the second positive lens unit is f2PLG. -3 <f1NLG / f1PLG <-0.6 (3) It is preferable to satisfy at least one of the following conditional expressions: -2 <f1NLG / f2PLG <-0.5 (4).

Further, in the present invention, a first optical path bending mirror is disposed in an optical path between the first object and the first positive lens group, and the first positive lens group and the first positive lens group It is preferable that a second optical path bending mirror is disposed in an optical path between the second optical path and the second object. By the way, in order to achieve the above-mentioned object, the catadioptric projection optical system according to the present invention comprises:
For example, as shown in FIG. 1, a catadioptric projection optical system for forming an image of a first object on a second object, comprising: a concave reflecting mirror; and the concave reflecting mirror having a convex surface facing the concave reflecting mirror. A first positive lens group disposed between the concave reflecting mirror and the convex reflecting mirror and coaxial with the concave reflecting mirror; and a first positive lens group. A first negative lens group disposed coaxially with the concave reflecting mirror and between the first negative lens group and the convex reflecting mirror; A second positive lens group coaxial with a mirror; a first reflecting surface for guiding light from the first object to the first positive lens group; and a second reflective lens group for transmitting light from the first positive lens group to the second positive lens group. A second reflecting surface for guiding to an object.

The catadioptric projection optical system according to the above-described configuration preferably satisfies at least one of the conditional expressions (1), (2), (3) and (4). .

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention as described above, since the position of the convex reflecting mirror placed on the pupil plane of the reflection type projection optical system is not the farthest from the object plane, the entire length (most from the object plane) is reduced. The distance to the optical member placed at a distant position, in the present invention, the distance from the object surface to the concave reflecting mirror) is relatively short.

In the optical path from the first object to the concave reflecting mirror (first concave reflecting surface), a first positive lens unit and a first negative lens unit are disposed on the concave surface reflecting mirror (first concave reflecting surface). A first negative lens group, a first positive lens group, a second positive lens group, and a concave mirror (second concave reflective surface) are provided in a reciprocating optical path to the concave reflective mirror (second concave reflective surface) again via the reflective mirror. With the configuration in which the first negative lens group and the first positive lens group are arranged in the optical path from) to the second object, it is possible to relatively increase the number of parameters that can be provided for aberration correction while keeping the overall length short, As a result, the degree of freedom of design is increased, and it is possible in principle to widen a region having good optical performance.

An embodiment of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a view schematically showing a scanning projection exposure apparatus according to an embodiment of the present invention. In FIG. 1, the direction (scanning direction) in which the mask 10 on which a predetermined pattern is formed and the substrate 30 on which the resist is applied is transported is indicated by X.
Axis, the direction orthogonal to the X axis in the plane of the mask 10 is the Y axis,
The normal direction of the mask 10 is set to the Z axis.

In FIG. 1, a projection optical system PL has an optical axis Ax along the X-axis direction, and a concave reflecting mirror CCM and a convex surface directed toward the concave reflecting mirror CCM are disposed on the optical axis Ax. A first positive lens group GP1 having a meniscus positive lens L1, a biconvex positive lens L2, and a biconvex positive lens L3 having a positive refractive power as a whole, and a biconcave negative lens L4 A first negative lens group GN1 having a negative refractive power, a second positive lens group GP2 having the same positive refractive power as the first positive lens group GP1, and a concave reflecting mirror CCM. A convex reflecting mirror CVM having a convex surface facing the side is disposed.

The pattern on the mask 10 is illuminated by illumination light of an illumination optical system (not shown) with substantially uniform illuminance. In this example, the illumination optical system (not shown) illuminates the mask 10 with an arcuate illumination field. The light 11 passing through the pattern on the mask 10 travels in the direction represented by the −Z direction in FIG.
The lens is deflected and proceeds in the + X direction in the figure, and enters the first positive lens group GP1. A first positive lens group GP1;
The light 12 having passed through the negative lens group GN1 is reflected by the concave reflecting mirror CC.
After being reflected by M, it travels in the -X direction and sequentially enters the first negative lens group GN1 and the second positive lens group GP2 (same as the first positive lens group GP1 in the first embodiment). The light 13 passing through the second positive lens group GP2 reaches the convex reflecting mirror CVM adhered to the lens surface r11 on the mask side of the lens L1. The convex reflecting mirror CVM is provided with the projection optical system PL.
Are arranged substantially on the pupil plane.

Next, the light 14 reflected by the convex reflecting mirror CVM travels in the + X direction and again passes through the second positive lens group GP2 and the first negative lens group GN1 in order. The light reaches the concave reflecting mirror CCM again. The light 15 reflected by the concave reflecting mirror CCM travels in the −X direction, and sequentially travels through the first negative lens group GN1 and the first positive lens group GP1.
, The light is deflected by 90 ° by the plane reflecting mirror PM2, travels in the −Z direction in the drawing, and reaches the substrate 30. This allows
An image of the pattern (within the arcuate illumination field) on the mask 10 is formed on the substrate 30. At this time, since the lateral magnification of the image formed on the substrate 30 in the X direction is substantially +1 times, the mask 10 and the substrate 30 are moved in the same direction integrally or substantially synchronously at the same speed. You can do it. In FIG. 1, the mask stage supporting the mask 10 and the substrate 3
The substrate stage supporting 0 is not shown.

Now, let the focal length of the first positive lens group GP1 in the projection optical system PL be f1PLG,
When the focal length of P2 is f2PLG, the following (1)
It is desirable to satisfy the relationship of the expression. f2PLG−f1PLG ≧ 0 (1) The expression (1) is a condition for improving the optical performance while keeping the radial size of the concave reflecting mirror CCM as small as possible. If the value falls below the lower limit of equation (1),
It is not preferable because it becomes difficult to correct coma aberration.

Further, the concave reflecting mirror CCM of the projection optical system PL
Is fCC and the focal length of the convex reflecting mirror CVM is fCV, it is preferable to satisfy the following expression (2). -1.6 <fCC / fCV <-0.6 (2) In the above equation (2), the projection optical system PL secures a sufficient working distance while maintaining the entire length (from the first object surface to the concave reflecting mirror CCM). Is a conditional expression for satisfactorily correcting coma aberration while keeping the distance (.distance.) Short. Here, when the value is below the lower limit of the expression (2), the case where the value is above the lower limit is not preferable because large coma aberration occurs.

The first negative lens group GN1 in the projection optical system PL includes a first positive lens group GP1 and a second positive lens group G1.
It has a function of correcting spherical aberration caused by P2.
Here, when the focal length of the first negative lens group GN1 is f1NLG and the focal length of the first positive lens group GP1 is f1PLG, the projection optical system PL satisfies -3 <f1NLG / f1PLG <-0.6 (3 ) Is preferably satisfied.

In the projection optical system PL, the focal length of the first negative lens group GN1 is f1NLG, and the second positive lens group G
When the focal length of P2 is f2PLG, it is preferable to satisfy the following condition: -2 <f1NLG / f2PLG <-0.5 (4) Here, when the value deviates from the upper limit or the lower limit of the expression (3), or when the value deviates from the upper limit or the lower limit of the expression (4), the spherical aberration of the entire system is large, which is not preferable.

Table 1 below shows the values of the specifications of the projection optical system shown in FIG. Here, the numbers at the left end indicate the order from the object side to the convex reflecting mirror CVM, r is the radius of curvature of the lens surface or the reflecting surface, d is the lens surface interval, n
Denotes the refractive index of the medium (optical material) with respect to the light of the exposure wavelength (g-line: 436 nm). In Table 1,
The signs of the surface distance d and the refractive index n are inverted every time a light ray is reflected on the reflecting surface.

[0022]

Table 1 [Example 1] r dn 1 -1460.2 100 1.48088 L1 2 -1323.6 10 1.00000 3 715.910 110 1.48088 L2 4 -1503.9 10 1.0000 5 2691.2 110 1.48088 L3 6 -2718.3 239 1.000007 -4156.2 80 1.60384 L4 82054.3 90 1.00000 9 -1683.3 -90 -1.000000 CCM 10 2054 0.3-80 -1.60384 L4 11 -4156.2 -239 -1.00000 12 -2718.3 -110 -1.48888 L3 13 2691.2 -10 -1.0000014 -1503.9 -110- 1.48088 L2 15 715.9 -10 -10.0000 16 −1323.6 −100 −1.48888 L1 17 −1460.2 0 −1.000000 18 −1460.2 0 1.00000 CVM << Values corresponding to the conditions of the first embodiment >> (1) f2PLG-f1PL = 0 ≧ 0 (2) fCC / fCV = -1.15 (3) f1NLG / f1PLG = -1.78 (4) f1NLG / f2PLG = -1.78 In the first embodiment shown in Table 1, the image height is 220 mm. Where the magnification is 1 and the NA (numerical aperture) is 0.12.

Next, the projection optical system PL will be described with reference to FIG.
The second embodiment will be described. In FIG. 2, the projection optical system PL has an optical axis Ax along the X-axis direction. On this optical axis Ax, a concave reflecting mirror CCM and the concave reflecting mirror C
A first positive lens group GP1 composed of a meniscus-shaped positive lens L1 having a convex surface facing the CM side and a biconvex positive lens L2 and having a positive refractive power as a whole, and a concave reflecting mirror CCM
A first negative lens unit GN1 having a negative refractive power, composed of a meniscus negative lens L3 having a convex surface facing the side, a biconvex positive lens L2, and a meniscus positive lens having a convex surface facing the concave reflecting mirror CCM side L1, a meniscus-shaped positive lens L4 having a convex surface facing the concave reflecting mirror CCM side, and a meniscus-shaped negative lens L5 having a convex surface facing the concave reflecting mirror CCM, and having a positive refractive power as a whole. Group G
P2 and a convex reflecting mirror CVM having a convex surface facing the concave reflecting mirror CCM side are arranged.

In the projection optical system PL of FIG. 2, light from a mask (not shown) sequentially passes through the lenses L1, L2, and L3 (passes through the first positive lens group GP1, the first negative lens group GN1 in order). ) Reaches the concave reflecting mirror CCM, and the light reflected by the concave reflecting mirror CCM
3, lens L2, lens L1, lens L4 and lens L
5 (in order through the first negative lens group GN1 and the second positive lens group GP2) to reach the convex reflecting mirror CVM.
The light reflected by the convex reflecting mirror CVM passes through a lens L5,
The light passes through the lens L4, the lens L1, the lens L2, and the lens L3 in this order (passes through the second positive lens group GP2 and the first negative lens group GN1), and reaches the concave reflecting mirror CCM.
The light reflected by the concave reflecting mirror CCM passes through the lens L3, the lens L2, and the lens L1 in this order (passes in the order of the first negative lens group GN1 and the first positive lens group GP1) from the projection optical system PL. It is emitted and goes to the image plane. Note that FIG.
In the example, the optical path bending mirror disposed in the optical path between the mask and the first positive lens group GP1, the optical path bending mirror disposed in the optical path between the first positive lens group GP1 and the substrate (image) Are not shown.

Table 2 below shows the values of the specifications of the projection optical system shown in FIG. Here, the numbers at the left end indicate the order from the object side to the convex reflecting mirror CVM, r is the radius of curvature of the lens surface or the reflecting surface, d is the lens surface interval, and n is the exposure wavelength light (g line: 436 nm). It shows the refractive index of the medium (optical material). In Table 2, the sign of the surface distance d and the sign of the refractive index n are reversed every time a light ray is reflected by the reflecting surface.

[0026]

Table 2 [Example 2] r dn 1-5601.8 100 1.48088 L1 2 -671.6 10 1.0000 3 3472.4 110 1.48088 L2 4 -7006.848 1.0000 5-1058.6 80 1.60384 L3 6-13233 51 1.000007 -1210.0 -51 -1.00000 CCM 8-13233 -80 -1.60384 L39 -1058.6 -48 -1.00000 10-7006.8-110-1.48088 L2 11 3472.4-10-10.100012 12-671.6-100-1.48088 L1 13-5601.8-76-1.00000014-480.2 -50-1.48088 L4 15 -1084.0 -14 -1.00000 16 -15322 -40 -1.48888 L5 17 -661.4 -16 -1.00000 18 -791.50 1.00000 CVM << Conditional value of the second embodiment >> (1) f2PLG-f1PLG = 513.7 ≧ 0 (2) fCC / fCV = −1.53 (3) f1NLG / f1PLG = −0.69 (4) f1NLG / f2PLG = −0.59 In Table 2, the image height is 220 mm and the magnification is 1
Times, NA (numerical aperture) is 0.12.

Next, the projection optical system PL will be described with reference to FIG.
A third embodiment will be described. In FIG. 3, the projection optical system PL has an optical axis Ax along the X-axis direction. On the optical axis Ax, a concave reflecting mirror CCM and a biconvex positive lens L1 are provided. A first positive lens group GP1 having a positive refractive power, a meniscus negative lens L2 having a concave surface facing the concave reflecting mirror CCM side and having a negative refractive power, and a biconvex shape A positive lens L1 having a positive refractive power as a whole, comprising a positive lens L1, a negative meniscus lens L4 having a concave surface facing the concave reflecting mirror CCM side, and a meniscus positive lens L5 having a convex surface facing the concave reflecting mirror CCM side. 2 positive lens group GP2 and concave reflecting mirror CC
A convex reflecting mirror CVM having a convex surface facing the M side is disposed.

In the projection optical system PL of FIG. 3, light from a mask (not shown) reaches the concave reflecting mirror CCM via the lenses L1 and L2 (the first positive lens group GP1 and the first negative lens group GN1) in order. . The light reflected by the concave reflecting mirror CCM sequentially passes through the lens L2, the lens L1, the lens L4, and the lens L5 (passes through the first negative lens group GN1 and the second positive lens group GP2 in order) and is convexly reflected. Mirror C
VM. The light reflected by the convex reflecting mirror CVM sequentially passes through the lens L5, the lens L4, the lens L1, and the lens L2 (passes through the second positive lens group and the first negative lens group in that order), and the concave reflecting mirror CCM. And the concave reflector CCM
Is reflected by the lens L2 and the lens 1 sequentially (the first negative lens group GN1 and the first positive lens group GP
(In order) and exits from the projection optical system PL toward the image plane. It should be noted that also in the example of FIG.
The optical path bending mirror arranged in the optical path between the positive lens group GP1 and the optical path bending mirror arranged in the optical path between the first positive lens group GP1 and the substrate (image) are not shown.

Table 3 below shows the values of the specifications of the optical system shown in FIG. Here, the numbers at the left end indicate the order from the object side to the convex reflecting mirror, r is the radius of curvature of the lens surface or the reflecting surface, d is the distance between the lens surfaces, and n is the medium for the light of the exposure wavelength (g-line: 436 nm). It shows the refractive index of (optical material). Also in Table 3, the sign of the surface distance d and the sign of the refractive index n are reversed each time a light ray is reflected by the reflecting surface.

[0030]

[Third Example] rdn1 825.5 130 1.60384 L1 2 -1674.4 10 1.0000 3 983.3 100 1.48088 L2 4 537.0 157 1.000005- 2529.3-157-1.00000 CCM 6 537.0-100-1.48888 L27 983.3-10-10-1.00000 8-1674.4-130-1.60384 L19 825.5-113- 1.00000 10 478.8-50 -1.408088 L4 11 3017.0 -1 -1.00000 12 -493.6-40 -1.408088 L5 13 -871.5 -19 -1.000000 14 -3707 .8 1.0000 CVM << Conditional value in the third embodiment >> (1) f2PLG-f1PLG = 44 6 ≧ 0 (2) fCC / fCV = −0.682 (3) f1NLG / f1PLG = −2.8 (4) f1NLG / f2PLG = −1.9 In Table 3, the image height is 220 mm and the magnification is 1
Times, NA (numerical aperture) is 0.12.

The wavefront aberration amount is introduced as an index for evaluating the optical performance of the projection optical system PL according to each embodiment described above. In this case, when the evaluation using the RMS value of the wavefront aberration is adopted, as is well known, when the condition of Marechal is satisfied as the condition of the ideal lens, it is determined that there is no aberration. Therefore, when the RMS value of the wavefront aberration is Wrms, the conditional expression for aberration-free is given by Wrms ≦ λ / 14 = 0.07λ (5) where λ is the wavelength.

FIG. 4 shows the RMS value of wavefront aberration when the image height is plotted on the horizontal axis of the projection optical system of the first embodiment shown in Table 1 on the vertical axis. It can be seen that the image height that satisfies the conditional expression (5) is a region from 170 mm to 280 mm. That is, in the first embodiment, it can be seen that the arc region having a width of 110 mm has no aberration. FIG. 5 shows the RMS value of the wavefront aberration when the image height is set on the horizontal axis of the projection optical system of the second embodiment shown in Table 2 on the vertical axis. It can be seen that the image height that satisfies the conditional expression (5) is a region from 185 mm to 245 mm. That is, in the second embodiment,
It can be seen that an arc region having a width of 60 mm has no aberration.

FIG. 6 shows the RMS value of the wavefront aberration when the image height is shown on the horizontal axis of the projection optical system of the third embodiment shown in Table 3 on the vertical axis. The image height that satisfies the conditional expression (5) is:
It can be seen that the area is from 185 mm to 250 mm. That is, in the third embodiment, it can be seen that the arc region having a width of 65 mm has no aberration. As described above, according to each of the above-described embodiments, the arc length is 40 as the field size.
With 0 mm, the width of the circular arc can be 55 mm or more, so that the batch scanning exposure of a wide field can be performed.

In the above embodiment, the wavelength of the illumination light supplied by the illumination optical system is g-line (436 nm), but instead of (or in addition to) the h-line (40 nm).
4 nm) and i-line (365 nm) can also be used.
Furthermore, a KrF excimer laser (248 nm) or Ar
Illumination light in the deep ultraviolet region such as harmonics such as an F excimer laser (193 nm) and a YAG laser can also be used.

In the above-described embodiment, the plane reflecting mirrors PM1 and PM2 are used as the optical path bending mirrors. One of these plane reflecting mirrors is a roof mirror for inverting an image in the Y direction. (Roof mirror). Further, by using two sets of the catadioptric projection optical system according to the present invention, the intermediate image formed by the first set of the catadioptric projection optical system is reproduced on the substrate by the second set of the catadioptric projection optical system. A configuration for forming an image is also possible. With the above configuration, an erect image of the mask is formed on the substrate. In this manner, a plurality of projection optical systems for forming an erect erect image of a mask may be prepared, and these may be arranged as disclosed in, for example, JP-A-7-183204. Further, for example, a magnification adjusting mechanism as shown in FIG. 11 of JP-A-7-183212 is provided in the optical path between the first plane reflecting mirror PM1 and the mask 10 and between the second plane reflecting mirror PM2 and the substrate 30. May be arranged on at least one of the optical paths.

As described above, the present invention is not limited to the above-described embodiment, and can take various configurations without departing from the gist of the present invention.

[0037]

As described above, according to the present invention, a relatively small projection optical system having a high resolution and a wide field does not reduce the throughput even when the exposure area is large, and provides good optical performance. Thus, an exposure apparatus capable of performing projection exposure can be provided.

[Brief description of the drawings]

FIG. 1 is a lens configuration diagram showing a first embodiment according to the present invention.

FIG. 2 is a lens configuration diagram showing a second embodiment according to the present invention.

FIG. 3 is a lens configuration diagram showing a third embodiment according to the present invention.

FIG. 4 is a wavefront aberration diagram corresponding to an image height in the first embodiment according to the present invention.

FIG. 5 is a wavefront aberration diagram corresponding to an image height in the second embodiment according to the present invention.

FIG. 6 is a wavefront aberration diagram corresponding to an image height in the third embodiment according to the present invention.

[Explanation of symbols]

 PL ‥‥‥ Projection optical system GP1 ‥‥ First positive lens group GN1 ‥‥ First negative lens group GP2 ‥‥ Second positive lens group CCM ‥‥ Concave reflector CVM ‥‥ Convex reflector 10 ‥‥‥ Mask 20 ‥ ‥‥substrate

Claims (8)

[Claims] 1. A scanning projection exposure for projecting an image of the first object onto the second object at substantially the same magnification while moving a first object and a second object. An apparatus, comprising: a catadioptric projection optical system that forms an image of the first object on the second object, wherein the catadioptric projection optical system has both a first object side and a second object side. A first positive lens group having a positive refractive power, a first negative lens group having a negative refractive power, a first concave reflecting surface, and a second positive lens having a positive refractive power, which is a telecentric optical system. A first reflecting lens group, a convex reflecting mirror, and a second concave reflecting surface, wherein light from the first object passes through the first positive lens group and the first negative lens group in order, and the first concave reflecting surface And the light reflected by the first concave reflecting surface is reflected by the first concave reflecting surface.
The light reaches the convex reflecting mirror through the negative lens group and the second positive lens group in order, and the light reflected by the convex reflecting mirror passes through the second positive lens group and the first negative lens group in order. The light reaching the second concave reflecting surface, the light reflected by the second concave reflecting surface reaches the second object via the first negative lens group and the first positive lens group in order, and A scanning projection exposure apparatus, wherein the catadioptric projection optical system is configured to form the image on the object. 2. The focal length of the first positive lens group in the catadioptric projection optical system is f1PLG, and the focal length of the second positive lens group in the catadioptric projection optical system is f2P.
2. The scanning projection exposure apparatus according to claim 1, wherein when LG is set, f2PLG-f1PLG ≧ 0 is satisfied. 3. The scanning projection exposure apparatus according to claim 1, wherein said first positive lens group and said second positive lens group are formed integrally. 4. The scanning device according to claim 1, wherein said first and second concave reflecting surfaces in said catadioptric projection optical system are formed on one concave reflecting mirror. Type projection exposure equipment. 5. When the focal length of the concave reflecting mirror in the catadioptric projection optical system is fCC and the focal length of the convex reflecting mirror in the catadioptric projection optical system is fCV, -1. 5. The scanning projection exposure apparatus according to claim 4, wherein the following condition is satisfied: 6 <fCC / fCV <-0.6. 6. The focal length of said first negative lens group is f1NL.
G, the focal length of the first positive lens group is f1PLG, and the focal length of the second positive lens group is f2PLG. -3 <f1NLG / f1PLG <-0.6-2 <f1NLG / f2PLG <- The scanning projection exposure apparatus according to claim 1, wherein at least one of the following conditional expressions is satisfied: 0.5. 7. A first optical path bending mirror is arranged in an optical path between the first object and the first positive lens group, and the first positive lens group and the second object are 7. The scanning projection exposure apparatus according to claim 1, wherein a second optical path bending mirror is disposed in an optical path between the first and second optical paths. 8. A catadioptric projection optical system for forming an image of a first object on a second object, comprising: a concave reflecting mirror; a convex surface directed toward the concave reflecting mirror and coaxial with the concave reflecting mirror. A convex reflecting mirror disposed; a first positive lens group disposed between the concave reflecting mirror and the convex reflecting mirror and coaxial with the concave reflecting mirror; a first positive lens group and the concave reflecting mirror A first negative lens group disposed between the first negative lens group and the convex reflecting mirror and coaxial with the concave reflecting mirror; and a coaxial with the concave reflecting mirror disposed between the first negative lens group and the convex reflecting mirror. A second positive lens group; a first reflecting surface for guiding light from the first object to the first positive lens group; and a first reflecting surface for guiding light from the first positive lens group to the second object. A catadioptric projection optical system, comprising: