JPH11327155A - Exposure device and method - Google Patents
Exposure device and methodInfo
- Publication number
- JPH11327155A JPH11327155A JP11103819A JP10381999A JPH11327155A JP H11327155 A JPH11327155 A JP H11327155A JP 11103819 A JP11103819 A JP 11103819A JP 10381999 A JP10381999 A JP 10381999A JP H11327155 A JPH11327155 A JP H11327155A
- Authority
- JP
- Japan
- Prior art keywords
- light
- exposure apparatus
- vibration
- light source
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はマスク上の回路パタ
ーンを基板上に焼き付ける露光装置に関し、特にレーザ
光を露光光として用いた露光装置のレーザ光源と露光装
置本体との光学的接続部の改良に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus for printing a circuit pattern on a mask onto a substrate, and more particularly to an improvement in an optical connection between a laser light source of an exposure apparatus using laser light as exposure light and an exposure apparatus main body. It is about.
【０００２】[0002]
【従来の技術】近年、レーザを露光光源として用いた露
光装置が注目されてきている。レーザ光を用いた露光装
置においては、レーザを発振する光源が非常に大きいこ
とと、レーザ電源部において冷却用ファン等の振動が発
生することや、レーザ発振の際に光源において振動が発
生することから、露光装置本体とレーザ光源とを切り離
して設置している場合がほとんどである。更に、レーザ
発振時の振動が床面を介して露光装置本体に伝わらない
ように、露光装置本体を防振台上に設置してこの振動に
対処しているものもある。2. Description of the Related Art In recent years, an exposure apparatus using a laser as an exposure light source has attracted attention. In an exposure apparatus that uses laser light, the light source that oscillates the laser is very large, and the cooling fan and the like generate vibration in the laser power supply unit, and the light source vibrates during laser oscillation. Therefore, in most cases, the exposure apparatus main body and the laser light source are separately installed. Further, in some cases, the exposure apparatus main body is installed on a vibration isolating table to cope with this vibration so that vibration during laser oscillation is not transmitted to the exposure apparatus main body via the floor surface.
【０００３】しかし、このようなレーザを露光光光源と
して用いた露光装置においては、仮にレーザ光源と露光
装置本体の光学的接続部からレーザ光が漏れると、周辺
に配置された機器等に悪影響を及ぼすおそれがあり、一
層の安全性の向上が要望されている。これに対し、レー
ザ光源と露光装置本体との光学的接続部の光路の周囲を
遮光部材で包囲して、その接続部分からレーザ光の漏れ
を防ぐ等の処置方法が考えられる。However, in an exposure apparatus using such a laser as an exposure light source, if laser light leaks from an optical connection between the laser light source and the exposure apparatus main body, adverse effects will be exerted on peripheral devices and the like. There is a possibility that this may cause a problem, and further improvement in safety is demanded. On the other hand, a treatment method is conceivable in which the light path of the optical connection between the laser light source and the exposure apparatus body is surrounded by a light-shielding member to prevent laser light from leaking from the connection.
【０００４】[0004]
【発明が解決しようとする課題】しかし、上記のように
レーザ光源と露光装置本体とを分離して設置した装置に
おいては、光学的接続部を遮光部材で包囲する方法をと
った場合に、光学的接続部に設けられた遮光部材を介し
てレーザ光源において発生する振動が露光装置本体に伝
わってしまい、その結果露光装置における投影等の種々
のプロセスの精度が低下するという問題点がある。However, in an apparatus in which the laser light source and the exposure apparatus main body are separated from each other as described above, if the method of surrounding the optical connection portion with a light shielding member is employed, Vibration generated in the laser light source is transmitted to the main body of the exposure apparatus via a light shielding member provided at the optical connection portion, and as a result, the accuracy of various processes such as projection in the exposure apparatus is reduced.
【０００５】本発明は、かかる点に鑑みてなされたもの
であり、レーザ光による周辺機器への悪影響の除去及び
安全性の向上が図れるとともに、レーザ発振等に伴う振
動を良好に除去できる投影露光装置を得ることを目的と
するものである。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is possible to eliminate the adverse effect of laser light on peripheral devices and improve safety, and to provide a projection exposure method capable of satisfactorily removing vibrations caused by laser oscillation and the like. It is intended to obtain a device.
【０００６】[0006]
【課題を解決するための手段】本発明にかかる露光装置
は、レーザ光源と露光装置本体との光学的接続部の光路
の周囲に蛇腹状の防振遮光手段を設けたことを技術的要
点としたものである。[作用]本発明においては、レーザ
光源と露光装置本体との光学的接続部の光路の周囲に蛇
腹状の防振遮光手段を設けているため、レーザ光の完全
な遮光を行なえるとともに、レーザ光源で発生する振動
をこの蛇腹状の防振遮光手段において良好に吸収遮断で
き、振動が露光装置本体に伝わるという不都合が生じな
いこととなる。The technical point of the exposure apparatus according to the present invention is that a bellows-shaped anti-vibration light shielding means is provided around an optical path of an optical connection portion between a laser light source and an exposure apparatus main body. It was done. [Operation] In the present invention, since the bellows-shaped anti-vibration light shielding means is provided around the optical path of the optical connection portion between the laser light source and the exposure apparatus main body, the laser light can be completely shielded and the laser light can be completely blocked. Vibrations generated by the light source can be favorably absorbed and blocked by the bellows-shaped anti-vibration light-shielding means, so that there is no inconvenience that the vibrations are transmitted to the exposure apparatus body.
【０００７】[0007]
【発明の実施の形態】以下、本発明の実施例を図面を参
照しながら説明する。図１は、本発明のー実施例であ
り、全体的な構成が示されている。図において、10は床
面上に設置された基台であり、該基台10の上にレーザ光
源12が載置されている。レーザ光源12から放射出力され
たレーザ光LAは、ミラー14で反射され、フライアイ・レ
ンズ(はえの目レンズ)16に入射して照明むらが除去され
るようになっている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an embodiment of the present invention, and shows an overall configuration. In the figure, reference numeral 10 denotes a base installed on the floor, and a laser light source 12 is mounted on the base 10. The laser light LA radiated and output from the laser light source 12 is reflected by the mirror 14, enters the fly-eye lens (fly-eye lens) 16, and removes illumination unevenness.
【０００８】フライアイ・レンズ16を透過した光は、レ
ーザ発振部18と露光装置本体部20との光学的接続部22を
通過して、露光装置本体部20側に向かうように構成され
ている。光学的接続部22は、ここから漏れるレーザを遮
光するとともに、レーザ発振部18、特にレーザ光源12に
おいて発生する振動を吸収し、該振動がレーザ光の遮光
部材(図示せず)を介して露光装置本体部20側に伝わらな
いような構成となっている。光学的接続部22の構造につ
いては後述する。なお、光学的接続部22の近傍の光路
は、図示されない遮光部材で包囲されている。The light transmitted through the fly-eye lens 16 is configured to pass through an optical connection portion 22 between the laser oscillation section 18 and the exposure apparatus main body 20 and travel toward the exposure apparatus main body 20. . The optical connection unit 22 shields laser light leaking from the optical connection unit 22 and absorbs vibration generated in the laser oscillation unit 18, particularly the laser light source 12, and the vibration is exposed through a laser light shielding member (not shown). The configuration is such that it is not transmitted to the apparatus main body 20 side. The structure of the optical connection section 22 will be described later. The optical path near the optical connection section 22 is surrounded by a light shielding member (not shown).
【０００９】次に、光学的接続部22を通過した光は、レ
ンズ24及びレンズ26を透過し、ミラー28で反射されて、
メインコンデンサレンズ30に入射するようになってい
る。メインコンデンサレンズ30を透過した光は、ここで
照度がー定となるように調整されて、レチクル32を照明
することとなる。更に、レチクル32を透過した光は、投
影レンズ34を介してウェハ36上にレチクル32上の回路パ
ターンを投影するようになっている。Next, the light that has passed through the optical connection section 22 passes through the lenses 24 and 26, is reflected by the mirror 28, and
The light enters the main condenser lens 30. The light transmitted through the main condenser lens 30 is adjusted so that the illuminance becomes constant here, and illuminates the reticle 32. Further, the light transmitted through the reticle 32 projects a circuit pattern on the reticle 32 onto the wafer 36 via the projection lens 34.
【００１０】ウェハ36は、防振台38上に載置されたＸＹ
ステージ40上に真空チヤック(図示せず)によってチャッ
キングされている。なお、露光装置本体部20内の装置は
全て防振台38の上に設置されているものとする。次に、
本実施例の特徴である光学的接続部22の構造について、
図２及び図３を参照しながら説明する。図２には、光学
的接続部22の第1の態様が示されている。図において、5
0は図１には示されていないレーザ光路の遮光部材(の断
面)であり、レーザ発振部18と露光装置本体部20との光
学的接続部22の内部には、振動を吸収できるように、蛇
腹状の蛇腹接続部52が遮光部材50とー体に形成されてい
る。蛇腹接続部52は、微妙な振動をも吸収できる程度の
硬度であるとともに、レーザを完全に遮光できる材質に
よって成形されている。The wafer 36 is mounted on an XY
It is chucked on the stage 40 by a vacuum check (not shown). It is assumed that all the devices in the exposure apparatus main body 20 are installed on the vibration isolating table 38. next,
Regarding the structure of the optical connection portion 22 which is a feature of the present embodiment,
This will be described with reference to FIGS. FIG. 2 shows a first embodiment of the optical connection unit 22. In the figure, 5
Reference numeral 0 denotes a light-blocking member (cross section) of a laser light path not shown in FIG. 1, and an optical connection portion 22 between the laser oscillation section 18 and the exposure apparatus main body section 20 is provided so as to absorb vibration. A bellows-like bellows connecting portion 52 is formed on the light shielding member 50 and the body. The bellows connection portion 52 is formed of a material that has a hardness that can absorb even a delicate vibration and that can completely block laser light.
【００１１】また、右側の遮光部材50がレーザ発振部18
側のものであり、左側の遮光部材50が露光装置本体部20
側のものである。図２中、(A)はレーザ発振前の基準位
置を示したものであり、(B)はレーザ発振等に伴う振動
により基準位置からずれた時のものが示されている。次
に、上記第1の態様による実施例の動作及び作用につい
て、図１及び図２を参照しながら説明する。Also, the right light shielding member 50 is
Side, and the light shielding member 50 on the left side is
Side thing. In FIG. 2, (A) shows a reference position before laser oscillation, and (B) shows a position shifted from the reference position due to vibration accompanying laser oscillation or the like. Next, the operation and operation of the embodiment according to the first aspect will be described with reference to FIGS.
【００１２】レーザ光源12から放射出力されたレーザ光
は、ミラー14で反射されて、フライアイ・レンズ16を透
過し、レーザ発振部18と露光装置本体部20との光学的接
続部22に入射する。光学的接続部22には、レーザ光とと
もに、レーザ発振に伴いレーザ光源12において発生した
振動が伝わる。この時、レーザ発振前の光学的接続部22
の状態は、図２(A)のような基準の状態となっている
が、光学的接続部22に上記のように振動が伝わると、図
２(B)のように、レーザ発振部18側の右側の遮光部材50
がずれを生じることとなる。The laser light radiated and output from the laser light source 12 is reflected by a mirror 14, passes through a fly-eye lens 16, and enters an optical connection 22 between a laser oscillation section 18 and an exposure apparatus main body 20. I do. Vibration generated in the laser light source 12 due to laser oscillation is transmitted to the optical connection portion 22 together with the laser light. At this time, the optical connection unit 22 before laser oscillation
2A is a reference state as shown in FIG. 2A. However, when the vibration is transmitted to the optical connection unit 22 as described above, as shown in FIG. Right side light blocking member 50
Will be displaced.
【００１３】このような場合に、(B)に示すように、蛇
腹接続部52によって振動を吸収して、左側の遮光部材50
のずれを防ぎ、更に露光装置本体部20側へ振動が伝わる
ことを防ぐ。次に、光学的接続部22を通過した光は、レ
ンズ24,レンズ26,ミラー28及びメインコンデンサレンズ
30の各光学素子の各作用によって、レチクル32を照明す
る。更に、投影レンズ34を介し、レチクル32上の回路パ
ターンをウェハ36に投影露光する。このように、光学的
接続部22に蛇腹接続部52を用いているため、露光装置本
体部20側(左側)に振動が伝わることを防止できるという
効果がある。In such a case, as shown in FIG. 3B, the vibration is absorbed by the bellows connection portion 52, and the light shielding member 50 on the left side is absorbed.
And prevents vibration from being transmitted to the exposure apparatus main body 20 side. Next, the light that has passed through the optical connection unit 22 is converted into a lens 24, a lens 26, a mirror 28, and a main condenser lens.
The reticle 32 is illuminated by each action of each optical element 30. Further, the circuit pattern on the reticle 32 is projected and exposed on the wafer 36 via the projection lens 34. As described above, since the bellows connection part 52 is used for the optical connection part 22, there is an effect that vibration can be prevented from being transmitted to the exposure apparatus main body part 20 side (left side).
【００１４】図３には、光学的接続部22の第2の態様が
示されている。図において、レーザ発振部18と露光装置
本体部20との光学的接続部22は、筒状の第1遮光部材54
と、該第1遮光部材よりも径の小さな筒状の第2遮光部材
56とから構成されており、第1遮光部材54と第2遮光部材
56とは分離された状態で所定の空間的余裕をもったニ重
筒状に形成されている。FIG. 3 shows a second embodiment of the optical connection section 22. In the figure, an optical connection part 22 between the laser oscillation part 18 and the exposure apparatus main body part 20 is a cylindrical first light shielding member 54.
And a cylindrical second light shielding member having a smaller diameter than the first light shielding member.
56, the first light shielding member 54 and the second light shielding member
It is formed in a double cylinder shape having a predetermined space margin when separated from 56.
【００１５】この第1遮光部材と第2遮光部材との空間的
余裕は、レーザ発振等による振動の変位に基いて、両遮
光部材が振動により接触しない程度に設定されている。
なお、図２と同様に、図中(A)はレーザ発振前の基準位
置、(B)はレーザ発振等に伴う振動により基準位置から
ずれた時のものが示されている。次に、上記第2の実施
態様による実施例の動作及び作用について、図３を参照
しながら説明する。上述した上記第1の実施態様と同様
に、レーザ光源12から放射出力されると、光学的接続部
22には、レーザ光が入射するとともに、レーザ光源12に
おいて発生した振動が伝わる。The space between the first light-shielding member and the second light-shielding member is set to such an extent that the two light-shielding members do not come into contact with each other based on the displacement of the vibration caused by laser oscillation or the like.
2, (A) shows a reference position before laser oscillation, and (B) shows a position deviated from the reference position due to vibration accompanying laser oscillation, as in FIG. Next, the operation and operation of the example according to the second embodiment will be described with reference to FIG. As in the first embodiment described above, when radiation is output from the laser light source 12, the optical connector
The laser light is incident on 22 and the vibration generated in the laser light source 12 is transmitted.
【００１６】この時、レーザ発振前の光学的接続部22の
状態は、図３(A)のような基準の状態となっているが、
光学的接続部22に上記のように振動が伝わると、図３
(B)のように、レーザ発振部18側の第1遮光部材54がずれ
を生じることとなる。このような場合に、レーザ発振部
18側の第1遮光部材54と露光装置本体部側の第2遮光部材
56とは、上述したように分離された状態で空間的余裕を
もって設置されているため、(B)に示すように第1遮光部
材54がずれを生じても第2遮光部材56に接触することは
なく、露光装置本体部20側へ振動が伝わることを完全に
防止できる。At this time, the state of the optical connection section 22 before laser oscillation is a reference state as shown in FIG.
When the vibration is transmitted to the optical connection portion 22 as described above, FIG.
As shown in (B), the first light shielding member 54 on the side of the laser oscillation section 18 is shifted. In such a case, the laser oscillator
The first light-shielding member 54 on the 18 side and the second light-shielding member on the exposure apparatus main body side
56 is installed with a sufficient space in a separated state as described above, so that even if the first light shielding member 54 is displaced as shown in FIG. Therefore, it is possible to completely prevent the vibration from being transmitted to the exposure apparatus main body 20 side.
【００１７】次に、光学的接続部22を通過した光は、更
に上記第1の実施態様と同様な構成及び同様な作用によ
って、投影露光を行なう。このように、光学的接続部22
を第1遮光部材54との第2遮光部材56とによって、二重筒
状に分離して形成しているため、露光装置本体部20側
(左側)に振動が伝わることを防げるという効果がある。
なお、本発明は上記実施例に限定されるものではなく、
光学的接続部22は、図１に示した位置に限定されるもの
ではなく、防振台38に支えられている部分と、その他の
レーザ光源12側の部分との接続部であれば同様な効果を
得られるものである。更に、振動が伝わることにより不
都合が生じる他の装置にも充分適用可能なものである。Next, the light that has passed through the optical connection portion 22 is further subjected to projection exposure by the same configuration and operation as in the first embodiment. Thus, the optical connection 22
Are formed in a double cylindrical shape by the first light shielding member 54 and the second light shielding member 56, so that the
(Left) has the effect of preventing the transmission of vibration.
Note that the present invention is not limited to the above embodiment,
The optical connection part 22 is not limited to the position shown in FIG. 1, but may be the same as long as it is a connection part between the part supported by the vibration isolating table 38 and the other part on the laser light source 12 side. The effect can be obtained. Further, the present invention can be sufficiently applied to other devices that cause problems due to transmission of vibration.
【００１８】[0018]
【発明の効果】以上のように、本発明によれば、レーザ
光源と露光装置本体との光学的接続部の光路の周囲に蛇
腹状の防振遮光手段を設けているため、大きな防振効
果、遮光効果を得ることができ、レーザ光による周辺機
器への悪影響の除去及び安全性の向上を図れるととも
に、レーザ光源で発生する振動を露光装置本体に伝えず
に精密な投影露光を行なえるという効果がある。As described above, according to the present invention, since the bellows-like anti-vibration light shielding means is provided around the optical path of the optical connection portion between the laser light source and the exposure apparatus main body, a large anti-vibration effect is obtained. It can achieve a light-shielding effect, eliminate the adverse effects of laser light on peripheral devices and improve safety, and perform precise projection exposure without transmitting vibrations generated by the laser light source to the exposure device body. effective.
【図１】図１は、本発明のー実施例を示す構成図であ
る。FIG. 1 is a configuration diagram showing an embodiment of the present invention.
【図２】図２は本発明の実施態様を示す断面図である。FIG. 2 is a sectional view showing an embodiment of the present invention.
【図３】図３は本発明の実施態様を示す断面図である。FIG. 3 is a sectional view showing an embodiment of the present invention.
LA…レーザビーム 12…レーザ光源 18…レーザ発振部 20…露光装置本体部 22…光学的接続部 38…防振台 LA ... Laser beam 12 ... Laser light source 18 ... Laser oscillator 20 ... Exposure device body 22 ... Optical connection 38 ... Vibration isolator
Claims (5)
と露光装置本体とを分離して配置した露光システムにお
いて、前記光源システムと前記露光装置本体との光学的
接続部における前記光源システムの遮光部材と前記露光
装置本体の遮光部材とに接続され、前記レーザ光の進行
路の周囲に設けられ前記レーザ光を遮蔽するとともに、
前記光源システムの振動が前記露光装置側に伝わるのを
防止する蛇腹状の防振遮光部材を備えたことを特徴とす
る露光システム。1. An exposure system in which a light source system for illuminating a mask with a laser beam and an exposure apparatus main body are separately disposed, and a light shielding member of the light source system at an optical connection portion between the light source system and the exposure apparatus main body. And is connected to a light blocking member of the exposure apparatus main body, and is provided around a traveling path of the laser light to shield the laser light,
An exposure system comprising: a bellows-shaped anti-vibration light shielding member for preventing the vibration of the light source system from being transmitted to the exposure apparatus.
置本体の遮光部材とは、前記レーザ光の進行路に関して
空間的に分離していることを特徴とする請求項１記載の
露光システム。2. The exposure system according to claim 1, wherein a light-shielding member of the light source system and a light-shielding member of the exposure apparatus main body are spatially separated with respect to a traveling path of the laser light.
載置される床上に設けられていることを特徴とする請求
項１または請求項２記載の露光システム。3. The exposure system according to claim 1, wherein the light source system is provided on a floor on which the exposure apparatus main body is mounted.
する防振台を含むことを特徴とする請求項１から請求項
３のいずれか１項記載の露光システム。4. The exposure system according to claim 1, wherein the exposure apparatus main body includes a vibration isolating table for preventing vibration from a floor.
と露光装置本体とを分離して配置した露光システムを用
いて基板上に所定のパターンを形成する露光方法におい
て、前記光源システムと前記露光装置本体との光学的接
続部における前記光源システムの遮光部材と前記露光装
置本体の遮光部材とに接続され前記光源システムの振動
が前記露光装置側に伝わるのを防止する蛇腹状の防振遮
光部材で、前記レーザ光の進行路の周囲を覆うことによ
って、前記レーザ光を遮蔽することを特徴とする露光方
法。5. An exposure method for forming a predetermined pattern on a substrate by using an exposure system in which a light source system for illuminating a mask with a laser beam and an exposure apparatus main body are separately arranged, wherein the light source system and the exposure apparatus A bellows-shaped anti-vibration light shielding member connected to the light shielding member of the light source system and the light shielding member of the exposure apparatus main body at an optical connection portion with the main body to prevent the vibration of the light source system from being transmitted to the exposure apparatus side; An exposure method, wherein the laser light is shielded by covering a periphery of a traveling path of the laser light.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11103819A JP3039542B2 (en) | 1999-04-12 | 1999-04-12 | Exposure apparatus and exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11103819A JP3039542B2 (en) | 1999-04-12 | 1999-04-12 | Exposure apparatus and exposure method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09243249A Division JP3121567B2 (en) | 1997-09-08 | 1997-09-08 | Exposure apparatus and exposure method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11327155A true JPH11327155A (en) | 1999-11-26 |
| JP3039542B2 JP3039542B2 (en) | 2000-05-08 |
Family
ID=14364030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11103819A Expired - Lifetime JP3039542B2 (en) | 1999-04-12 | 1999-04-12 | Exposure apparatus and exposure method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3039542B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003100602A (en) * | 2001-09-25 | 2003-04-04 | Canon Inc | Aligner |
| US10645289B2 (en) | 2017-01-05 | 2020-05-05 | Lasertec Corporation | Optical apparatus and vibration removing method |
-
1999
- 1999-04-12 JP JP11103819A patent/JP3039542B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003100602A (en) * | 2001-09-25 | 2003-04-04 | Canon Inc | Aligner |
| JP4677151B2 (en) * | 2001-09-25 | 2011-04-27 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
| US10645289B2 (en) | 2017-01-05 | 2020-05-05 | Lasertec Corporation | Optical apparatus and vibration removing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3039542B2 (en) | 2000-05-08 |
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