JPH11317363A - Method of scanning exposure and manufacture of device using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce uneven illuminance on a substrate exposed to light, by adjusting variation in exposure beam due to change in the period of pulse oscillation of exposure beam. SOLUTION: Pulse laser light IL as exposure light projected from a beam shaping optical system 17 illuminates a reticle 12 through a mirror 18 and a condenser lens 19 with uniform illuminance. At this time, laser beam from a laser interferometer 23 secured on a guide 22 is reflected at a moving mirror 21, and the position in the z direction and amount of yawing of the reticle 12 are measured through the laser interferometer 23. These pieces of measurement data S1 are supplied to a main control system 25. The main control system 25 controls the movement of the reticle 12 through a drive 24, and controls the shape and the like of the opening in the variable visual field stop of the beam shaping optical system 17. Further, the main control system 25 controls the light emitting operation of a pulse laser light source 16 through a laser light source controller 26.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure method used, for example, when a semiconductor integrated circuit or a liquid crystal display element is manufactured by a lithography process. Scanning exposure method.

[0002]

2. Description of the Related Art When a semiconductor device or a liquid crystal display device is manufactured by a lithography process, a pattern image of a photomask or a reticle (hereinafter, collectively referred to as a "reticle") is exposed to light through exposure optical system. 2. Description of the Related Art A projection exposure apparatus that projects an image on a photosensitive substrate is used. In such a projection exposure apparatus, it is required to further improve the resolving power,
One method for improving the resolution is to shorten the wavelength of exposure light. Among light sources that are currently in practical use, those having a relatively short wavelength are ArF excimer lasers (wavelength: 193 n).
m), an excimer laser such as a KrF excimer laser (wavelength: 248 nm) and a metal vapor laser. However, since the excimer laser light source and the metal vapor laser light source are of a pulse light emission (pulse oscillation) type, it is necessary to consider differently from the case of a continuous light source such as a mercury lamp when using them.

FIG. 7 shows a projection exposure apparatus provided with a conventional pulse emission type laser light source. In FIG. 7, a laser beam LB emitted from a pulse emission type laser light source 1 is beam-expanded by a beam expander 2. The diameter is enlarged and the light enters the first fly-eye lens 3. Secondary light sources are formed on the rear focal plane of the first fly-eye lens 3 in accordance with the number of lens elements, and laser light diverging from these secondary light sources passes through the deflecting mirror 4 and the condenser lens 5 to the second fly-eye lens. The light enters the eye lens 6.
Secondary light sources are also formed on the rear focal plane of the second fly-eye lens 6 in accordance with the number of lens elements, and laser light diverging from these secondary light sources passes through the first relay lens 7 and the deflecting mirror 8, respectively. The light is focused on the field stop 9. The laser light focused on the opening of the field stop 9 is obtained by superimposing a large number of laser lights emitted from the respective lens elements of the fly-eye lens 6 and having mutually incoherent and normal illuminance distributions. It is.

The pulse laser light IL as exposure light that has passed through the opening of the field stop 9 passes through a second relay lens 10 and a condenser lens 11 and has uniform illuminance.
Illuminate 2. The arrangement surface of the field stop 9 is conjugate with the pattern formation surface of the reticle 12, and the illumination area of the reticle 12 with the pulse laser light IL is set by the shape of the opening of the field stop 9. Under pulsed laser light IL,
An image of the pattern of the reticle 12 is formed and projected on a wafer 15 on a wafer stage 14 via a projection optical system 13.

[0005]

As described above, in a projection exposure apparatus using a conventional pulsed light source, a chip pattern image on a pattern forming surface of a reticle 12 is collectively printed on a wafer 15. The one-shot exposure method for exposing was the mainstream. Therefore, the projection optical system 13 also has an exposure field that only exposes the image of the chip pattern at one time. However, in recent years, there has been an increasing demand for not only shortening the wavelength of the exposure light but also increasing the field of exposure of an image of a larger chip pattern on the reticle 12 onto the wafer 15.

In order to respond to the demand for a large field, a so-called slit scan exposure system in which the reticle 12 and the wafer 15 are scanned synchronously with, for example, a slit-shaped illumination area set by the field stop 9 is effective. . Thereby, an image of a pattern wider than the illumination area on the reticle 12 can be exposed on the wafer 15. However, if the slit scan exposure method is simply applied to a projection exposure apparatus using a pulse emission type laser light source, the number of pulsed laser beams IL to be exposed varies depending on the exposure position on the wafer 15, and illuminance unevenness occurs. There was an inconvenience of doing so.

Further, when the wavelength of the exposure light is shortened and, for example, laser light in the vacuum ultraviolet region is used, the transmittance characteristics of a normal refractive element are deteriorated. It is difficult to obtain the imaging characteristics of Therefore, when the wavelength of the exposure light is shortened, a catadioptric projection system including a reflective element having no chromatic aberration and little light absorption is advantageous. However, in the reflection element, the good image range is an arc-shaped region separated from the optical axis by a predetermined amount, so that a slit scan exposure method is particularly effective to cope with a large field. However, when the slit scan exposure method is applied to a projection exposure apparatus having a pulse emission type laser light source and a catadioptric projection system, like the projection exposure apparatus having a refraction projection system,
Irradiation unevenness of the pulse laser light occurs depending on the exposure position on the wafer due to the relationship between the scanning of the wafer and the timing of the pulse light emission of the laser light source.

In view of the foregoing, the present invention provides a scanning method capable of reducing illuminance unevenness (unified exposure amount unevenness) on a photosensitive substrate when performing exposure by a slit scan exposure method using a pulsed light source. An object of the present invention is to provide an exposure method. Another object of the present invention is to provide a device manufacturing method using such a scanning exposure method.

[0009]

A first scanning exposure method according to the present invention is directed to a scanning exposure method for moving an object to be irradiated with a pulsed exposure beam during exposure. To adjust the change of the exposure beam caused by the change of the period. A second scanning exposure method according to the present invention is a scanning exposure method for moving an irradiation object with respect to an exposure beam that is pulsed during exposure, wherein the stage for holding and moving the irradiation object is held. The position is monitored, and the timing of pulse oscillation of the exposure beam is adjusted based on the monitoring result.

According to a third scanning exposure method of the present invention, in the scanning exposure method in which the irradiation object is moved with respect to the pulse-oscillated exposure beam during the exposure, The position of the stage holding the irradiation object is monitored, and the position of the stage is corrected at the time of pulse oscillation of the exposure beam based on the result of the monitoring.

According to a fourth aspect of the present invention, there is provided a scanning exposure method for moving an irradiation object with respect to an exposure beam which is pulse-oscillated during exposure. The power of the exposure beam is adjusted when the power of the exposure beam changes. Further, a device manufacturing method according to the present invention uses the scanning exposure method of the present invention.

[0012]

According to the present invention, for example, in FIG. 4A, the width β in the relative scanning direction (DW direction) of the projection image (46P) of the illumination area on the mask on the photosensitive substrate (15).・
It is assumed that L is n times (n is an integer of 1 or more) the distance ΔL that the photosensitive substrate (15) moves in the DW direction during one cycle of the pulse light emission of the pulse light source (16). That is, the following equation holds. β · L = n · ΔL

In this case, the light source (1) is placed on the photosensitive substrate (15).
When the exposure position at the edge of the projected image (46P) at the point of time when 6) emits the pulse is defined as a point P1, the energy amount applied to each exposure position on the photosensitive substrate (15) by one pulse emission is Let ΔE. Therefore, a point at the edge of the projected image (46P) is irradiated with energy of ΔE / 2 during the pulse emission. Then, the energy amount EP1 applied to the point P1 is as follows. EP1 = 2 · ΔE / 2 + (n−1) · ΔE = n · ΔE

At point P2 slightly inside the edge of the projected image (46P) at the time of pulse emission, n times of pulse emission are performed while in the projected image (46P). The amount of energy applied to the point P2 is also n · ΔE, and the amount of energy applied to all the exposure positions on the photosensitive substrate (15) is also n · ΔE, so that illuminance unevenness is eliminated.

On the other hand, as shown in FIG.
The width β · L1 in the relative scanning direction (DW direction) of the projection image (46P) on the photosensitive substrate (15) in the illumination area is such that the photosensitive substrate (1) is generated during one cycle of pulse emission of the pulse light source (16).
5) is, for example, 3.
Assume that it is five times. In this case, when the light source (16) emits a pulse on the photosensitive substrate (15), its projected image (46) is emitted.
Assuming that the exposure position at the edge of P) is a point Q1, the point Q
The amount of energy EQ1 applied to 1 is 3.5 · ΔE.

The energy amount EQ2 applied to the point Q2 slightly inside the edge of the projected image (46P) at the time of pulse emission is 4.ΔE, and the energy of the edge of the projected image (46P) at the time of pulse emission is 4.ΔE. The energy amount EQ3 applied to the point Q3 slightly outside is 3.ΔE. Therefore, the amount of energy applied in accordance with the exposure position on the photosensitive substrate (15) varies between 3 · ΔE and 4 · ΔE, so that illuminance unevenness occurs. Similarly, even if the synchronization of the pulse oscillation is changed or an error in the position of the photosensitive substrate (irradiated object) occurs, the illuminance unevenness occurs. Therefore, the power of the exposure beam, the timing of oscillation, and the like are adjusted accordingly. As a result, illuminance unevenness can be kept low.

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a projection exposure apparatus according to the present invention will be described below with reference to FIGS. In this embodiment, the present invention is applied to a slit scan exposure type projection exposure apparatus having a pulse emission type laser light source and a catadioptric projection system. FIG. 1 shows the overall configuration of the projection exposure apparatus of the present embodiment. In FIG. 1, a laser beam LB emitted from a pulse laser light source 16 such as an excimer laser light source includes a beam expander, an optical integrator, an aperture stop, The light enters a beam shaping optical system 17 including a relay lens system and a variable field stop. Pulse laser light IL as exposure light emitted from the beam shaping optical system 17 illuminates the reticle 12 with uniform illuminance via a mirror 18 and a condenser lens 19.

The reticle 12 is held on a reticle stage 20, and a movable mirror 21 is attached to one end of the reticle stage 20 in the Z direction (the vertical direction in the plane of FIG. 1). Are supported so as to be able to move at a constant speed in the Z direction along the axis. The reticle stage 20 is connected to a driving device 24 for performing movement in the Z direction, minute rotation for yawing correction, and the like. The laser beam from the laser interferometer 23 fixed to the guide 22 is reflected by the movable mirror 21, and the laser interferometer 23 constantly measures the position and yawing amount of the reticle 12 in the Z direction. S1 is supplied to the main control system 25. The main control system 25 controls the operation of the reticle 12 via the driving device 24, controls the shape of the aperture of the variable field stop in the beam shaping optical system 17, and controls the laser light source control device 26.
The light emission operation of the pulse laser light source 16 is controlled via the.

The pulsed laser beam IL that has passed through the pattern of the reticle 12 is guided to a first concave mirror 28 via a first lens group 27, and a predetermined reduction magnification is obtained by reflection there. The pulse laser light reflected by the first concave mirror 28 passes through the second lens group 29 and is reflected by the plane reflecting mirror 3 for bending the optical path.
The light is reflected at 0 and enters the second concave mirror 32 via the negative lens 31, and the reflection there gives a magnification slightly larger than the same magnification. The pulse laser light reflected by the second concave mirror 32 passes through the negative lens 31 and is given a reduction magnification by the third lens group 33 and is incident on the wafer 15. Wafer 15
On the upper surface, the pattern of the illumination area of the reticle 12 is transferred in a reduced size of 1/4. The first to third lens groups 27 to 33 constitute a projection optical system.

The wafer 15 is held on a micro-rotatable wafer holder 34, and the wafer holder 34 is fixed on a wafer stage 35. Wafer stage 35
Are an XY stage for positioning the wafer 15 in a two-dimensional plane including an X direction which is a horizontal direction in the plane of FIG. 1 and a Y direction perpendicular to the plane of FIG. 1, and a Z stage for positioning the wafer 15 in the Z direction. And so on. A movable mirror 36 for reflecting the laser beam from the laser interferometer 37 is fixed on the wafer stage 35, and the laser interferometer 37 constantly measures the position of the wafer 15 in the XY plane and the amount of yawing. Is the main control system 25
Is supplied to The main control system 25 controls the operation of the wafer stage 35 via the driving device 38.

FIG. 2 shows components in the beam shaping optical system 17 shown in FIG.
7 is arranged at the incident portion of the laser beam LB. The ND filter plates 40A, 40B, 4 whose transmittance with respect to the laser beam LB changes stepwise are provided in the area where the laser beam LB passes on the periphery of the rotary plate 39.
0C and ‥‥ are attached, and the main control system 25 adjusts the rotation angle of the rotating plate 39 via the driving device 41, whereby FIG.
The illuminance of the pulse laser beam IL applied to the wafer 15 can be set in a desired range. Although not shown, for example, an irradiation amount monitor for monitoring the illuminance of the pulse laser beam IL is disposed on the wafer stage 35 in FIG.

In FIG. 2, two long blades 42
A, 42B and two short blades 44A, 44B constitute a variable field stop. These blades 4
An arc-shaped opening 46Q surrounded by 2A, 42B and 44A, 44B corresponds to an illumination area on the reticle 12. Further, the main control system 25 controls the blade 42 via the driving device 43.
By adjusting the interval between A and 42B and adjusting the interval between blades 44A and 44B via the driving device 45,
The size of the opening 46Q can be adjusted. The area of the projection image of the opening 46Q on the pattern forming surface of the reticle 12 is an arc-shaped illumination area on the reticle 12.

FIG. 3 shows an illuminated area 46 on the reticle 12, the illuminated area 46 being composed of two parallel circumferences having a distance L and a distance M.
Is an arc-shaped area surrounded by two parallel straight lines. That is, the width of the illumination area 46 in the longitudinal direction is M, and the width of the illumination area 46 in a narrow direction perpendicular to the longitudinal direction (DR direction) is L everywhere. By scanning the reticle 12 in the narrow DR direction, the pulse laser light in the illumination area 46 sequentially illuminates a wider pattern area on the reticle 12. The DR direction in FIG. 3 is the same as the −Z direction in FIG.

In performing slit scan exposure in this embodiment, in FIG. 1, the circular illumination area 46 on the reticle 12 is illuminated with the pulsed laser light IL through the driving device 24 and the reticle stage 20. Reticle 1
2 at a constant velocity V in the -Z direction (that is, the DR direction in FIG. 3).
Scan with. A reticle 12 in the illumination area 46 is provided on an exposure area 46P on the wafer 15 conjugate with the illumination area 46.
Is image-formed and projected. The projection magnification of the projection optical system including the first lens group 27 to the third lens group 33 from the reticle 12 to the wafer 15 is β (β = 1/4 in this example), and the driving device 38 and the wafer stage 3
5 scans the wafer 15 in the X direction at a constant speed β · V.

When scanning the reticle 12 and the wafer 15, for example, when a predetermined alignment mark on the reticle 12 and a predetermined alignment mark on the wafer 15 match, the measured value of the laser interferometer 23 and the laser interference The difference from the measured value of the total 37 is stored as a reference value,
The operation of the driving devices 24 and 38 is controlled such that the difference between the measurement value of the laser interferometer 23 and the measurement value of the laser interferometer 37 becomes the reference value stored in advance. Therefore, the reticle 12 and the wafer 15 are scanned in a narrow direction with respect to the illumination area 46 and the exposure area 46P in a state where the reticle 12 and the wafer 15 are always stationary with respect to each other.

Next, a description will be given of the condition of the width of the arc-shaped exposure area 46P in the narrower direction, that is, the relative width in the scanning direction. FIG. 4A shows an arc-shaped exposure region 46P on the wafer 15 of this embodiment. In FIG. 4A, the direction in which the wafer 15 is scanned with respect to the exposure region 46P is the DW direction (this is If the projection magnification of the projection optical system is β, the width of the exposure area 46P in the DW direction is β · L. Further, the pulse laser light source 16 of FIG.
T is the period of the pulse emission (i.e., the reciprocal of the emission frequency), and the distance that the wafer 15 is scanned in the DW direction during one period T during slit scan exposure is ΔL.
And In this case, the scanning direction of the exposure area 46P is D
The width β · L in the W direction is set to an integral multiple of the distance ΔL. Further, since the speed of the wafer 15 in the DW direction is β · V,
The distance ΔL is T · β · V. That is, the following equation is satisfied when n is an integer of 1 or more.

## EQU1 ## β · L = n · ΔL = n · T · β · V

FIG. 4A shows a case where β · L = 3 · ΔL. At this time, for example, the wafer 1 existing at the edge of the exposure region 46P at the time of pulse emission
The point P1 on 5 is sequentially scanned with the positions P1A, P1B, and P1C at the time of the subsequent pulse emission. If the exposure energy applied to the exposure point inside the exposure area 46P by one pulse emission is ΔE, the exposure point P1 has 3 ·
An exposure energy of ΔE (= ΔE / 2 + 2 · ΔE + ΔE / 2) is applied. Further, for example, the exposure point P2 on the wafer 15 existing inside the edge portion of the exposure area 46P at the time of the pulse emission is sequentially scanned with the positions P2A, P2B, P2C at the subsequent pulse emission time. And
The exposure point P2 is irradiated with exposure energy of 3 · ΔE. Therefore, according to this example, the exposure area 4 on the wafer 15
The same exposure energy of n · ΔE is applied to all the exposure points scanned by 6P. Therefore, uneven illuminance is eliminated, and the imaging characteristics on the wafer 15 are improved.
However, since the exposure energy has a variation for each pulse emission, the influence of the variation will be described later.

On the other hand, as shown in FIG. 4B, for example, the width of the exposure region 46P in the DW direction, which is the scanning direction, is β · L1, and the width β · L1 is the pulse emission of the pulse laser light source 16. During one cycle T of DW
It is assumed to be 3.5 times the distance ΔL scanned in the direction. In this case, the exposure point Q1 on the wafer 15 existing at the edge of the exposure area 46P at the time of the pulse emission is 3.5 ·
Exposure energy of ΔE is applied, and at the time of pulse emission, the exposure point Q2 on the wafer 15 existing inside the edge of the exposure area 46P is exposed to exposure energy of 4 · ΔE, and pulse emission occurs. Exposure area 46P
Exposure point Q3 on wafer 15 existing outside the edge of
Is irradiated with an exposure energy of 3 · ΔE. Therefore, it can be seen that uneven illuminance has occurred.

Next, a description will be given of the operation in the case of performing the exposure by the slit scan exposure method in this embodiment. First, in FIG. 1, the scanning speed β · V of the wafer 15 in the X direction is
The average illuminance P per pulse of the pulse laser light IL on the wafer 15, the sensitivity S of the resist applied to the wafer 15, and the illuminance variation ΔPi (i = 1, 2) for each pulse emission of the pulse laser light IL , ‥‥). Further, as described above, in this example, each exposure point on the wafer 15 is irradiated with the pulse laser beam IL n times, so that the integrated illuminance PT at each exposure point is as follows. Here, Σ means the sum of 1 to n for the subscript i.

## EQU2 ## PT = Σ (P + ΔPi)

Thus, it can be seen that the variation in the integrated illuminance PT, that is, the illuminance unevenness decreases as the number n of times of irradiation with the pulse laser beam IL increases. Therefore, depending on how much the variation of the integrated illuminance PT is suppressed, the number of times of irradiation of the pulse laser light IL (the number of pulses) n
Is determined. For example, when n is set to 20, illuminance unevenness is suppressed to about 0.05%. The wafer 12
Since the integrated illuminance PT of each of the above exposure points is approximately n · P,
From the resist sensitivity S, it is determined how much the power of the laser beam LB emitted from the pulse laser light source 16 in FIG. 1 should be set. In order to set the power of the laser beam LB of the pulse laser light source 16 to the determined level, as shown in FIG.
Is a rotating plate 3 equipped with ND filter plates of various transmittances.
9 is set to the corresponding angle.

Next, as shown in FIG. 3, the driving speed of the reticle 12 and the wafer 15 is set in accordance with the width L of the illumination area 46 on the reticle 12 in the scanning direction DR. First, in FIG. 4A, the width of the exposure area 46P on the wafer 15 in the DW direction is β · L, and the scanning speed of the wafer 15 in the DW direction is β · V. The distance that the wafer 15 moves in the direction DW during the pulse emission period T of the pulse laser light source 16 in FIG. 1 is T · β · V.
Therefore, the following relationship holds as in (Equation 1).

## EQU3 ## β · L = n · ΔL = n · T · β · V

Thus, the scanning speed V of the reticle 12 in the scanning direction is as follows. Using the scanning speed V, the scanning speed of the wafer 15 is set to β · V.

V = L / (n · T) Further, since the scanning speed V of the reticle 12 has an upper limit Vmax due to the structure of the mechanism, the reticle 12 is set to satisfy V ≦ Vmax from (Equation 4). The value of the width L of the upper illumination area 46 in the scanning direction is adjusted. For that purpose, the interval between the blades 42A and 42B in FIG. 2 may be adjusted. After that, when the image of the pattern of the reticle 12 is exposed on the wafer 15 by the slit scan exposure method, the illuminance by the pulse laser light IL becomes almost the same level in all the exposure areas on the wafer 15, and good transfer characteristics can be obtained. .

In the above description, the light emission interval (period T) of the pulse is fixed.
The cycle T may be adjusted while keeping the max and the width L at values corresponding to Vmax. This is performed by the control device 26 based on a command from the main control system 25. Also,
When the interval (L) between the blades 42A and 42B in FIG. 2 is fixed, the period T of the pulse emission of the pulse laser light source 16 in FIG. Alternatively, the scanning speed V of the reticle 12 may be adjusted. The point is that the interval L, the period T, and the scanning speed V are set so that an integer n pulses are emitted while the projection image 46P and the wafer 15 relatively move by the width (β · L) of the projection image 46P in the scanning direction. At least one of them may be adjusted. At this time, the value of n is determined uniquely according to the minimum number of pulses required to achieve the desired uniformity of illuminance required on the wafer (as described above, according to the variation in the amount of energy between the pulses). ) Is desirable.
The method of determining the required number of pulses is described in, for example,
No. 179357. Further, when the power of the laser beam changes due to the change of the pulse emission period T, it is necessary to adjust the angle of the rotating plate 39 in FIG. 2 to readjust the laser beam power.

In this embodiment, an integer n of 1 or more is set between the scanning speed V of the reticle 12, the period T of pulse emission, and the width L of the arc-shaped illumination area 46 on the reticle 12 in the scanning direction. It suffices if the relationship of (Equation 4) is used. Accordingly, within the range satisfying (Equation 4), the scanning speed V is a speed close to the optimum speed with little vibration, the pulse emission cycle T is a cycle close to the cycle in which the illuminance unevenness for each pulse is the least and the output is stable, and the illumination area. Is equal to the average of the distortion and the wafer 15
The width can be set to a width close to the optimum width in consideration of the leveling or the like. This makes it possible to maximize the performance as a projection exposure apparatus while maintaining the illuminance unevenness on the wafer 15 to a minimum. That is, in the present embodiment, the value of n is set to the number of pulses required to achieve the uniformity of the illuminance, and, for example, when importance is placed on the throughput of the apparatus, the scanning speed V is set to Vmax, the period T and the width L are set. If the focus is on the imaging characteristics (distortion etc.) of the projection optical system, the width L is set to a width at which the optimum imaging characteristics can be obtained, and the period T and the scanning speed are adjusted. At least one of V and V may be adjusted.

Incidentally, even if the method of this embodiment is applied, there is a possibility that illuminance unevenness may actually occur due to the position error of the wafer stage 35. Therefore, the position of the wafer stage 35 is monitored just before the pulse emission of the pulse laser light source 16 and the position of the wafer stage 35 is corrected at the time of the pulse emission, or the timing of the pulse emission is corrected by the position error of the stage. Thus, uneven illuminance can be reduced.

Next, another embodiment of the present invention will be described with reference to FIGS. In this embodiment, as shown in FIG. 7, the present invention is applied to a projection exposure apparatus using a refraction projection system as a projection optical system. FIG. 5 shows a configuration in the vicinity of the projection optical system 13 of the projection exposure apparatus of the present embodiment, and the pattern image of the reticle 12 is
5 is exposed. The pulse laser beam IL illuminates a rectangular illumination area on the reticle 12, and the reticle 12 is scanned at a constant speed V in the X direction, which is a direction in which the width of the illumination area is narrow. In synchronization with this, the wafer 15 is scanned in the −X direction at a speed β · V, where β is the projection magnification of the projection optical system 13.

FIG. 6 shows a rectangular exposure area 48 on the wafer 15 in FIG. 5, in which the pattern of the reticle 12 is exposed. Scanning direction of exposure area 48 (-X
Direction) is β · L2, and the width in the longitudinal direction is β · M2
(M2> L2). In this case, assuming that the circular area 49 is the maximum exposure area of the projection optical system 13 in FIG. 5, the longitudinal width β · M2 of the exposure area 48 is
9 is almost equal to the diameter. On the other hand, the exposure area 50 on the wafer 15 in the case of the ordinary batch exposure method is a substantially square area inscribed in the circular exposure area 49. Accordingly, by exposing the rectangular exposure region 48 by scanning the wafer 15 in the −X direction, it is possible to expose a wider region than in the case of the batch exposure method.

Assuming that the emission cycle of the pulsed laser light IL is T and the distance that the wafer 15 is scanned in the −X direction during the cycle T is ΔL2, in this example, the exposure region 48
The width β · L2 in the −X direction, which is the scanning direction, is set as follows using an integer n of 1 or more.

## EQU5 ## β · L2 = n · ΔL2

The other structure is the same as that of the embodiment shown in FIG. As a result, pulse laser light is irradiated n times at each exposure point on the wafer 15. Accordingly, the illuminance of all the exposure points on the wafer 15 by the pulse laser beam IL is substantially the same, and the illuminance unevenness is minimized. It should be noted that the present invention is not limited to the above-described embodiments, but can take various configurations without departing from the gist of the present invention.

[0040]

According to the present invention, when exposure is performed by a slit scan exposure method using a pulsed light source,
There is an advantage that the unevenness of the integrated exposure amount on the photosensitive substrate can be reduced.

[Brief description of the drawings]

FIG. 1 is a configuration diagram showing one embodiment of a projection exposure apparatus according to the present invention.

FIG. 2 is a perspective view showing an optical element in the beam shaping optical system 17 of FIG.

FIG. 3 is a plan view showing an arc-shaped illumination area on a reticle of the embodiment.

FIG. 4A is an enlarged plan view showing an arc-shaped exposure region on a wafer of the embodiment, and FIG. 4B is an enlarged plan view showing an arc-shaped exposure region when the present invention is not applied.

FIG. 5 is a schematic configuration diagram showing a main part of a projection exposure apparatus according to another embodiment of the present invention.

6 is an enlarged plan view showing a rectangular exposure area on the wafer of the embodiment of FIG.

FIG. 7 is a configuration diagram showing a projection exposure apparatus provided with a conventional pulse emission type laser light source.

[Explanation of symbols]

 Reference Signs List 12 reticle 15 wafer 16 pulse laser light source 17 beam shaping optical system 19 condenser lens 20 reticle stage 22 guide 23, 37 laser interferometer 24, 38 drive unit 25 main control system 28 first concave mirror 32 second concave mirror 35 wafer stage 46 on reticle Illumination area 46P, 48 Exposure area on wafer

Claims (6)

[Claims] 1. A scanning exposure method for moving an irradiation object with respect to an exposure beam that is pulse-oscillated during exposure, wherein a change in the exposure beam caused by a change in a pulse oscillation cycle of the exposure beam is adjusted. A scanning exposure method. 2. A scanning exposure method for moving an irradiation object with respect to a pulsed exposure beam during exposure, comprising: monitoring a position of a stage that holds and moves the irradiation object; Scanning exposure method, wherein the timing of pulse oscillation of the exposure beam is adjusted based on 3. A scanning exposure method for moving an irradiation object with respect to an exposure beam pulse-oscillated during exposure, wherein a position of a stage for holding the irradiation object immediately before pulse oscillation of the exposure beam is changed. A scanning exposure method, comprising: monitoring and correcting the position of the stage at the time of pulse oscillation of the exposure beam based on a result of the monitoring. 4. A scanning exposure method for moving an object to be irradiated with a pulsed exposure beam during exposure, wherein the power of the exposure beam changes due to a change in the pulse oscillation cycle of the exposure beam. Is a method for adjusting the power of the exposure beam. 5. The scanning exposure method according to claim 1, wherein an irradiation area of the exposure beam is defined in a slit shape. 6. A device manufacturing method using the scanning exposure method according to claim 1.