JPH11296923A - Device and method for exposure - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposing device which suppresses the variation of laser beams of recording of optical paths that are divided into plural parts, also maintains light outputs of laser beams for recording of respective separated optical paths in their own optimum states and forms a latent image corresponding a high dense optical disk with high accuracy and to provide an exposing method. SOLUTION: This exposing device 1 consists of a beam splitter 3 which divides an optical path of laser beams emitted from a light source 2 into plural parts and plural light output controlling means 4 and 5 which separately detect a part of the laser beams of plural optical paths separated by the splitter 3 and control the light outputs of the laser beams so as to become prescribed value.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure method for irradiating a photoresist layer formed on a substrate with a laser beam, thereby forming a latent image on the photoresist layer in accordance with the trajectory of the laser beam. The present invention relates to an apparatus and an exposure method.

[0002]

2. Description of the Related Art As a recording medium, an optical disk having a pit or the like indicating an information signal formed on the surface of a disk substrate and an Al reflective film or a protective film formed on the disk substrate having the pit or the like has been widely used. I have.

The disk substrate of this optical disk is mainly formed by an injection molding method. The injection molding method
For example, in a cavity of a pair of molds, a stamper in which the pits and the like of the disk substrate are formed with a concavo-convex shape of a reversal pattern is disposed, and a disk material heated and melted is injected into the cavity of the mold, and the disk substrate is removed. It is a molding method.

[0004] A stamper used in this injection molding method is formed as follows.

[0005] First, for example, the main surface of a disk-shaped glass substrate having a diameter of about 200 mm and a thickness of several mm, which is precisely polished on the surface, is provided with an adhesion reinforcing agent or the like, and has a wavelength sufficient for a recording laser light source. Photoresist with high sensitivity has a thickness of 0.1
It is evenly applied with a thickness of about μm. Then, the organic solvent of the photoresist is volatilized, and a photoresist layer is formed on the glass substrate.

Next, the glass substrate on which the photoresist layer has been formed is set in an exposure apparatus. Then, the exposure apparatus focuses the recording laser beam on the photoresist on the glass substrate with a spot size of about 0.5 μm.

The exposure apparatus spirally irradiates the laser beam onto the resist layer of the glass substrate while modulating the intensity of the laser beam based on the input recording signal, so that the resist layer corresponds to predetermined pits and grooves. A latent image having an uneven pattern is formed.

Next, the resist layer on which the latent image is formed is developed with an alkaline developer to form a resist master having an uneven pattern corresponding to predetermined pits and grooves.

Next, a metal film such as silver or nickel is formed on the main surface of the resist master having an uneven pattern by a method such as sputtering, vapor deposition, or electroless plating.

Next, the resist master on which the metal coating is formed is set in an electroplating apparatus, and electroplating is performed using the metal coating as an electrode to form an electroplating layer on the main surface of the resist master. Is done.

Next, the resist master is peeled off from the metal film and the electroplating layer, and the excess metal film is removed by pressing to complete the stamper.

By the way, as an exposure apparatus used in the above-described stamper manufacturing process, for example, an exposure apparatus 200 as shown in FIG. 7 has been conventionally proposed. The exposure apparatus 200 shown in FIG. 7 is configured so that latent images corresponding to, for example, two types of recording patterns having different widths can be formed on a resist layer. A light source 201 that oscillates and an electro-optic modulator (EOM: Electro-optical modulator) that intensity-modulates a recording laser beam emitted from the light source 201 in accordance with an input signal electric field.
Optic Modulator) 202 and an optical path separating half that separates the optical path of the recording laser light into two by transmitting a part of the recording laser light intensity-modulated by the EOM 202 and reflecting the other part. A mirror 203 and a first acousto-optic modulator (hereinafter referred to as a first acousto-optic modulator) that intensity-modulates the recording laser light of the first optical path separated by the optical path separating half mirror 203 based on an ultrasonic wave modulated according to a recording signal. AO
M: Acousto Optic Modulator) 204 and a second AOM 205 for intensity-modulating the recording laser light of the second optical path separated by the optical path separating half mirror 203 based on an ultrasonic wave modulated according to a recording signal. And the recording laser light of the first optical path and the recording laser light of the second optical path,
By transmitting or reflecting according to its polarization state,
A polarizing beam splitter that guides light on substantially the same optical path (PBS:
PolarizationBeam Splitter) 206 and this PBS2
The objective lens 207 that condenses the recording laser light guided on substantially the same optical path by 06 and irradiates the resist layer 231 formed on the glass substrate 230 as main components.

When exposure is performed by the exposure apparatus 200 configured as described above, first, a recording laser beam is emitted from the light source 201.

The recording laser light emitted from the light source 201 is intensity-modulated by the EOM 202, passes through the analyzer 223, then partially passes through the optical path separating half mirror 203, and another part is transmitted through the optical path separating half mirror. The light is reflected by the mirror 203. The recording laser light of the first optical path that has passed through the optical path separating half mirror 203 is partially reflected by the half mirror 208 provided on the first optical path. At this time, another part of the recording laser light transmitted through the half mirror 208 enters the photodetector 209 provided on the transmitted light path.

A light output control unit (APC: Auto Power Controller) is provided between the photodetector 209 and the EOM 202.
The recording laser beam incident on the photodetector 209 is converted into an electric signal by the photodetector 209 and supplied to the APC 210.

The APC 210 generates a control signal based on the signal supplied from the photodetector 209, and supplies this control signal to the EOM 202. EOM 202 uses this AP
According to the signal electric field of the control signal supplied from C210,
The intensity of the recording laser light emitted from the light source 201 is modulated.

As described above, the exposure apparatus 200 detects a part of the recording laser beam by the photodetector 209 and performs feedback control on the EOM 202 by the APC 210 based on the detected laser beam. The light output of the recording laser light to be recorded is stabilized.

The first light reflected by the half mirror 208
The laser light for recording in the optical path is intensity-modulated by the first AOM 204 disposed on the first optical path according to the recording signal. The first AOM 204 is connected to a first driver 211 that supplies an ultrasonic wave modulated according to an input recording signal to the first AOM 204. The first AO
The M204 modulates the intensity of the recording laser light transmitted through the first AOM 204 based on the ultrasonic wave supplied from the first driver 211. Note that, on the first optical path, a condenser lens 212 is provided immediately before the first AOM 204, and the lens 2 is disposed immediately after the first AOM 204.
13 are provided. Accordingly, the recording laser light in the first optical path is incident on the first AOM 204 in a state where the laser light is condensed by the condensing lens 212, is emitted from the first AOM 204, and is converted into parallel light by the collimating lens 213. You.

The recording laser light in the first optical path, which has been made parallel by the collimator lens 213, is
4, the polarization state is changed from, for example, S-polarized light to P-polarized light, reflected by the reflection mirror 215, and
06.

On the other hand, the recording laser light of the second optical path reflected by the optical path separating half mirror 203 is intensity-modulated by a second AOM 205 disposed on the second optical path according to a recording signal. You. An ultrasonic wave modulated according to the input recording signal is input to the second AOM 205 by the second AOM 205.
A second driver 216 to be supplied to M205 is connected. The second AOM 205 is provided for the second driver 21.
6, based on the ultrasonic waves supplied from the second AOM
The intensity of the recording laser light passing through 205 is modulated. In addition, on the second optical path, like the first optical path, the second A
The condenser lens 217 is provided immediately before the OM 205, and the collimator lens 21 is disposed immediately after the second AOM 205.
8 are provided. As a result, the recording laser light in the second optical path is incident on the second AOM 205 in a state where the laser light is condensed by the condenser lens 217, is emitted from the second AOM 205, and is converted into parallel light by the collimating lens 218. You.

The recording laser light in the second optical path, which has been made parallel by the collimating lens 218, is reflected by the reflection mirror 21.
9, 220, respectively, and enter the PBS 206. At this time, the recording laser light in the second optical path has a polarization state different from that of the recording laser light in the first optical path, and is, for example, an S-polarized state.

Here, the PBS 206 transmits, for example, a P-polarized light component and reflects an S-polarized light component. Therefore, the recording laser light in the first optical path is transmitted through the PBS 206, and the recording laser light in the second optical path is reflected by the PBS 206. As a result, the recording laser light in the first optical path and the recording laser light in the second optical path are guided on substantially the same optical path.

The recording laser light of the first optical path transmitted through the PBS 206 and the recording laser light of the second optical path reflected by the PBS 206 both pass through the magnifying lens 221 so that the beam diameter is enlarged, and the reflection mirror 222
And is incident on the objective lens 207.

The first and second incident on the objective lens 207
The recording laser beam in the optical path is focused by the objective lens 207 and formed on the glass substrate 230 rotated by an air spindle (not shown).
1 is irradiated.

As described above, the exposure apparatus 200 divides the optical path of the recording laser beam into two paths and separately modulates the intensity of each path. Images can be formed simultaneously. The exposure apparatus 200 can form two types of latent images individually by using the first optical path and the second optical path as needed.

The exposure apparatus 200 includes a light source 201
EOM detects part of the recording laser light emitted from the
Since feedback control is performed on the laser beam 202, the optical output of the recording laser beam transmitted through the EOM 202 can be kept in a stable state.

[0027]

In recent years, the recording density of optical disks and the like has been improved in order to increase the recording capacity. However, the demand for exposure accuracy is becoming more severe.

However, the above-described conventional exposure apparatus 2
When the optical path of the recording laser beam is separated after controlling the optical output of the recording laser beam to be in a stable state as shown in FIG. A small amount of displacement occurs in the recording laser light of the separated optical path. Then, the laser light having this displacement is applied to the first AOM 20.
When the intensity is modulated by the fourth or second AOM 205,
A minute change in the Bragg angle may cause a change in intensity.

Further, the recording laser light of each of the separated optical paths may have an optimum optical output different depending on the pattern of the latent image to be formed.

Accordingly, the present invention suppresses the dispersion of the recording laser light in the plurality of separated optical paths and maintains the optical output of the separated recording laser light in each of the separated optical paths in an optimum state. It is an object of the present invention to provide an exposure apparatus and an exposure method capable of forming a latent image corresponding to a high-density optical disk with high accuracy.

[0031]

An exposure apparatus according to the present invention comprises an optical path separating means for separating an optical path of a laser beam emitted from a light source into a plurality of optical paths, and a laser beam on a plurality of optical paths separated by the optical path separating means. And a plurality of light output control means for controlling the light output of the laser light to a predetermined value.

According to this exposure apparatus, the optical path of the laser light emitted from the light source is separated into a plurality of paths by the optical path separating means. And the laser light of each separated optical path is
The light output is individually controlled by a plurality of output control means. Thereby, the optical output of the laser beam whose optical path has been separated can be controlled to an optimum value, respectively.
Variations in laser light in a plurality of optical paths can be suppressed.

In the exposure apparatus according to the present invention,
At least one light output control means of the plurality of light output control means adjusts the carrier intensity of the recording signal supplied to the intensity modulation means disposed on the optical path of the separated laser light. It is desirable to control the light output of the light to a predetermined value. Thus, the exposure apparatus can perform accurate exposure while simplifying the configuration.

In the exposure apparatus according to the present invention,
At least one of the plurality of light output control means adjusts the carrier intensity of the recording signal supplied to the light deflection means provided on at least one light path of the separated laser light. Therefore, it is desirable to control the light output of the laser light to be a predetermined value. Thus, the exposure apparatus can perform accurate exposure while simplifying the configuration.

Further, in the exposure method according to the present invention, the optical path of the laser light emitted from the light source is divided into a plurality of light paths, and a plurality of light output control means respectively separate a part of the laser light in the plurality of separated optical paths. Upon detection, the light output of these laser lights is controlled so as to be a predetermined value.

According to this exposure method, it is possible to control the optical output of the laser beam whose optical path has been separated to an optimum value, and to suppress variations in the laser light in a plurality of optical paths.

In the exposure method according to the present invention,
At least one light output control means of the plurality of light output control means adjusts the carrier intensity of the recording signal supplied to the intensity modulation means disposed on the optical path of the separated laser light. It is desirable to control the light output of the light to a predetermined value. Thus, accurate exposure can be easily performed.

In the exposure method according to the present invention,
At least one of the plurality of light output control means adjusts the carrier intensity of the recording signal supplied to the light deflection means provided on at least one light path of the separated laser light. Therefore, it is desirable to control the light output of the laser light to be a predetermined value. Thus, accurate exposure can be easily performed.

[0039]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An exposure apparatus according to the present invention is used for producing a stamper used for injection molding a disk substrate of a disk-shaped recording medium such as an optical disk having pits or grooves or a magneto-optical disk. This is for irradiating a laser beam onto a resist layer formed on a glass substrate to form a latent image of a predetermined pattern corresponding to pits and grooves of an optical disk on the resist layer.

An embodiment of the exposure apparatus will be described below with reference to the drawings.

(First Embodiment) The exposure apparatus 1 of the first embodiment separates the optical path of the recording laser beam into two,
The optical output is controlled for the recording laser light in each optical path. As shown in FIG. 1, as a basic configuration, a light source 2 for emitting the recording laser light, A beam splitter 3 that transmits a part of the recording laser light that has been transmitted and reflects another part to separate the optical path of the recording laser light, and a recording optical path that transmits the first optical path that has passed through the beam splitter 3. First light output control means 4 for making the light output of the laser light constant, and second light output control means 5 for making the light output of the recording laser light of the second light path reflected by the beam splitter 3 constant. And a first modulation optical system 6 for performing intensity modulation on the recording laser light of the first optical path whose light output is controlled by the first light output control means 4.
A second modulation optical system 7 for performing intensity modulation on the recording laser light in the second optical path whose light output is controlled by the second light output control means 5, and a first modulation optical system 6. The recording laser light of the first optical path whose intensity has been modulated and the recording laser light of the second optical path whose intensity has been modulated by the second modulation optical system 7 are guided on substantially the same optical path. An irradiation optical system 8 for condensing light and irradiating the resist layer 38 formed on the glass substrate 37 with light.

Glass substrate 3 on which resist layer 38 is formed
7 is chucked on an air spindle which rotates with high rotational accuracy.

In the following description, the recording laser beam on the first optical path is called a first exposure beam, and the recording laser beam on the second optical path is called a second exposure beam.

As the light source 2, a gas laser that emits laser light having a photosensitive wavelength of a resist material constituting the resist layer 38 is used. Specifically, for example, the resist layer 3
In the case where the resist material constituting No. 8 is a positive resist material, the wavelength is 45
8nm Ar laser or 442nm He-Cd
A laser, an ion laser type gas laser that emits a Kr laser having a wavelength of 413 nm, or the like is used.

The first light output control means 4 is disposed on the first optical path and adjusts the light output of the first exposure beam.
Electro Optical Modulato (EOM)
r) 10, a first analyzer 11 that transmits only the S-polarized light of the first exposure beam that has passed through the first EOM 10, and a first analyzer
The first half mirror 12 that reflects a part of the first exposure beam transmitted through the analyzer 11 and transmits the other part.
A first photodetector 13 that receives a first exposure beam transmitted through the first half mirror 12 and generates a control signal;
A first auto power controller (APC) 1 that controls the operation of the first EOM 10 based on a control signal generated by the first photodetector 13
4.

Similarly, the second light output control means 5 outputs
A second EOM 15 for adjusting the light output of the second exposure beam, and a second analyzer 16 for transmitting only the S-polarized light of the second exposure beam transmitted through the second EOM 15 A second half mirror 17 that reflects a part of the second exposure beam transmitted through the second analyzer 16 and transmits the other part, and a second half mirror 17 that transmits the second half mirror 17.
A second photodetector 18 that receives the exposure beam and generates a control signal, and a second APC 19 that controls the operation of the second EOM 15 based on the control signal generated by the second photodetector 18. It consists of.

The recording laser light emitted from the light source 2 is
The beam is split into a first exposure beam and a second exposure beam by the beam splitter 3.

The first exposure beam transmitted through the beam splitter 3 is applied to a first EPC controlled by a first APC 14.
The light enters the OM 10, and the first EOM 10 corrects the intensity so that the light output becomes constant. First EOM1
The first exposure beam having passed through the first half mirror 12 is converted into S-polarized light by the first analyzer 11 and then partially changed to the first half mirror 12.
And a part of the light is transmitted through the first half mirror 12.

The first exposure beam transmitted through the first half mirror 12 is received by the first photodetector 13. First
The photodetector 13 generates a control signal corresponding to the light intensity of the received light, and supplies the control signal to the first APC 14.

The first APC 14 is the first photodetector 13
Based on the control signal supplied from the first EOM 10
Control. Specifically, the first APC 14 controls the first EOM so that the light intensity of the first exposure beam received by the first photodetector 13 is constant at a predetermined level.
The signal electric field applied to 10 is adjusted. Thereby, automatic light amount control is performed so that the light intensity of the first exposure beam transmitted through the first EOM 10 becomes constant, and a stable exposure beam with less noise is obtained.

On the other hand, the second exposure beam reflected by the beam splitter 3 is incident on the second EOM 15 controlled by the second APC 19 after the optical path is bent by the reflection mirror 20. And this second E
The intensity is corrected by the OM 15 so that the light output becomes constant. The second exposure beam that has passed through the second EOM 15 is converted into S-polarized light by the second analyzer 16, partially reflected by the second half mirror 17, and partially reflected by the second half mirror 17. Through.

The second exposure beam transmitted through the second half mirror 17 is received by the second photodetector 18. Second
The photodetector 18 generates a control signal according to the light intensity of the received light, and supplies the control signal to the second APC 19.

The second APC 19 is the second APC 19
Based on the control signal supplied from the second EOM 15
Control. Specifically, the second APC 19 controls the second EOM so that the light intensity of the second exposure beam received by the second photodetector 18 becomes constant at a predetermined level.
15 is adjusted. Thereby, automatic light amount control is performed so that the light intensity of the second exposure beam transmitted through the second EOM 15 becomes constant, and a stable exposure beam with less noise is obtained.

The first exposure beam reflected by the first half mirror 12 is subjected to intensity modulation by the first modulation optical system 6. The second exposure beam reflected by the second half mirror 17 is subjected to intensity modulation by the second modulation optical system 7.

The first modulation optical system 6 condenses the first exposure beam reflected by the first half mirror 12 with the first condenser lens 21 and the first condenser lens 21. A first acousto-optic modulator (AOM: Acousto) for applying intensity modulation to the thus-formed first exposure beam according to a recording signal
An optical modulator 22, a first collimator lens 23 for converting a first exposure beam, which is intensity-modulated by the first AOM 22, into parallel light, and a first driver 24 for driving the first AOM 22. You. here,
As the first AOM 22, for example, tellurium oxide (Te
An acousto-optic element made of O ₂ ) is preferred.

Similarly, the second modulation optical system 7 includes a second condenser lens 25 for condensing the second exposure beam reflected by the second half mirror 17, and a second condenser lens 25.
A second AOM 26 for performing intensity modulation on the second exposure beam condensed according to the recording signal, and a second AO
A second collimating lens 27 for converting the second exposure beam intensity-modulated by M26 into parallel light, and a second AOM2
And a second driving driver 28 for driving the driving circuit 6. Here, as the second AOM 26, for example, an acousto-optic element made of tellurium oxide (TeO ₂ ) is suitable.

The first exposure beam reflected by the first half mirror 12 is incident on the first AOM 22 while being condensed by the first condenser lens 21. And
The intensity of the first exposure beam is modulated by the first AOM 22 driven by the first drive driver 24 so as to correspond to a desired exposure pattern.

A signal S1 corresponding to a desired exposure pattern is input to the first driver 24. More specifically, for example, when a latent image of a pit pattern subjected to 2-8 modulation is formed on the resist layer 38, a modulation signal corresponding to the pit pattern subjected to 2-8 modulation is a first signal. It is input to the drive driver 24. First drive driver 24
Drives the first AOM 22 based on the signal S1. Thus, the first exposure beam incident on the first AOM 22 is subjected to intensity modulation by the first AOM 22 so as to correspond to, for example, a pit pattern subjected to 2-8 modulation.

The first exposure beam intensity-modulated by the first AOM 22 is converted into parallel light by the first collimating lens 23, and then travels to the irradiation optical system 8 provided on the moving optical table.

On the other hand, the second exposure beam reflected by the second half mirror 17 is incident on the second AOM 26 while being condensed by the second condenser lens 25. The intensity of the second exposure beam is modulated by the second AOM 26 driven by the second drive driver 28 so as to correspond to a desired exposure pattern.

A signal S2 corresponding to a desired exposure pattern is input to the second driver 28. Specifically, for example, when a latent image having a groove pattern corresponding to a straight groove having a certain depth is formed on the resist layer 38, a DC signal of a certain level is input to the second driver 28. The second drive driver 28 drives the second AOM 26 based on the signal S2. As a result, the second exposure beam incident on the second AOM 26 is shifted to the second exposure beam so as to correspond to a desired groove pattern.
AOM 26 performs intensity modulation.

The second exposure beam intensity-modulated by the second AOM 26 is converted into parallel light by the second collimating lens 27, and then travels to the irradiation optical system 8 provided on the moving optical table.

The first exposure beam converted into parallel light by the first collimating lens 23 is rotated by 90 ° in the polarization direction by the half-wave plate 29, converted into P-polarized light, and then reflected by the reflection mirror 30. Is bent and guided horizontally on the moving optical table. Further, the second exposure beam converted into parallel light by the second collimating lens 27 has its optical path bent by the reflection mirrors 31 and 32 and is guided horizontally on the moving optical table.

The irradiation optical system 8 includes a polarizing beam splitter (PBS) 33 that transmits the first exposure beam and reflects the second exposure beam, and a PB (Pattern Beam Splitter) 33.
An expanding lens 34 for expanding the beam diameter of the first exposure beam transmitted through S33 and the second exposure beam reflected by the PBS 33, the beam diameter is expanded by the expanding lens 34, and the optical path is bent by the reflecting mirror 35. The objective lens 36 is configured to collect the first and second exposure beams, respectively, and to irradiate the resist layer 38 formed on the glass substrate 37. Each optical element constituting the irradiation optical system 8 is supported on a moving optical table that is moved in the radial direction of the glass substrate 37 on which the resist layer 38 is formed.

The PBS 33 transmits the P-polarized light component and reflects the S-polarized light component. The first exposure beam incident on the PBS 33 is transmitted through the PBS 33 because it is P-polarized by the half-wave plate 29 after being intensity-modulated by the first modulation optical system 6. On the other hand, the second exposure beam incident on the PBS 33 remains S-polarized, and is thus reflected by the PBS 33. Thus, the first exposure beam and the second exposure beam are guided on substantially the same optical axis.

The first exposure beam transmitted through the PBS 33 and the second exposure beam reflected by the PBS 33 are respectively transmitted through the magnifying lens 34 to expand the beam diameter, and the optical path is bent by the reflection mirror 35. Incident on the objective lens 36. The first and second exposure beams incident on the objective lens 36 are respectively condensed by the objective lens 36 and irradiated on a resist layer 38 formed on a glass substrate 37 that is rotated by an air spindle.

As a result, a latent image corresponding to the irradiation trajectories of the first and second exposure beams is formed on the resist layer 38.

As described above, this exposure apparatus 1
The optical path of the recording laser light emitted from the light source is divided into two paths, and the recording laser light of each optical path is individually controlled for automatic light intensity. The optical output of the laser beam can be controlled to an optimum value, and the variation of the laser beam can be suppressed, and a latent image with high accuracy can be formed.

In the above description, the first light output control means 4 having the first EOM 10 performs automatic light quantity control of the first exposure beam, and the second light output control means having the second EOM 15 5, the exposure apparatus 1 for performing the automatic light amount control of the second exposure beam has been described. However, the exposure apparatus according to the present invention is not limited to this example.
For example, automatic light amount control may be performed by using an AOM or the like of a modulation optical system.

Exposure device 40 which uses the second AOM 26 of the second modulation optical system 7 instead of the second EOM 15 to perform automatic light amount control on the second exposure beam.
Is shown in FIG.

The exposure apparatus 40 includes the beam splitter 3
The second exposure beam reflected by the exposure device 1 is directly guided to the second modulation optical system 7 without passing through the light output control means such as the second light output control means 5 provided in the exposure apparatus 1. . Then, instead of the reflection mirror 31 provided in the exposure apparatus 1, the second half mirror 17 is disposed at the corresponding location,
The second photodetector 1 on the transmission optical path of the half mirror 17 of FIG.
8 is arranged. Then, the exposure apparatus 4
0, the second APC 1 is connected between the second photodetector 18 and the second drive driver 28 of the second modulation optical system 7.
9, the second modulation optical system 7, the second half mirror 17, the second photodetector 18, and the second APC 19 constitute a second light output control means.

According to the exposure device 40, the second exposure beam transmitted through the second half mirror 17 is received by the second photodetector 18. The second photodetector 18 generates a control signal corresponding to the light intensity of the received light, and supplies the control signal to the second APC 19.

The second APC 19 is the second APC 19
The second driving driver 28 is controlled based on the control signal supplied from the second driving driver 28. Specifically, the second APC 19
Is a signal supplied from the second driver 28 to the second AOM 26 so that the light intensity of the second exposure beam received by the second photodetector 18 is constant at a predetermined level. The strength of the carrier in S2 is adjusted. Thereby, automatic light amount control is performed so that the light intensity of the second exposure beam transmitted through the second AOM 26 becomes constant, and a stable exposure beam with less noise is obtained.

As described above, the exposure apparatus 40 performs the automatic light amount control using the second modulation optical system 7, so that the configuration is simplified as compared with the exposure apparatus 1 described above. And for the second exposure beam,
Automatic light intensity control can be performed at a position closer to the objective lens 36, and a more accurate latent image can be formed.

Next, using the first AOM 22 of the first modulation optical system 6 instead of the first EOM 10, automatic light amount control is performed on the first exposure beam, and the second EOM 1
5, an acousto-optic deflector (AOD: Ac) of a deflection optical system 51 for performing optical deflection on the second exposure beam.
FIG. 3 shows an exposure apparatus 50 that performs automatic light intensity control on a second exposure beam using an ousto optical deflector (52).

Here, the deflecting optical system 51 performs optical deflection on the second exposure beam so that the resist layer 3
A wobbling groove is formed by meandering the irradiation trajectory of the second exposure beam irradiated on the second exposure beam 8, and the AO disposed on the optical path of the second exposure beam
D52, a pair of wedge prisms 53 and 54 arranged before and after the AOD 52, and a third drive driver 55 for driving the AOD 52.

As the acousto-optic element used for the AOD 52, for example, an acousto-optic element made of tellurium oxide (TeO ₂ ) is suitable.

Further, a pair of wedge prisms 53, 54
Is for allowing the second exposure beam to enter the AOD 52 so as to satisfy the Bragg condition with respect to the lattice plane of the AOD 52, and to maintain the horizontal height of the second exposure beam optically deflected by the AOD 52. It is.

The third drive driver 55 includes a voltage controlled oscillator (VCO).
r) 56 is connected, and a high frequency signal is supplied from the VCO 56.

The second exposure beam incident on the deflecting optical system 51 is incident on an AOD 52 driven by a third driving driver 55 via a wedge prism 53. Third
The high frequency signal from the VCO 56 is FM-modulated by the control signal S3 including the address information and supplied to the drive driver 55. The third driving driver 55 drives the AOD 52 according to this signal. Thereby, AOD5
The second exposure beam incident on 2 is optically deflected so as to correspond to a desired exposure pattern.

The exposure apparatus 50 includes a beam splitter 3
The first exposure beam that has passed through is guided directly to the first modulation optical system 6 without passing through the light output control means such as the first light output control means 4 provided in the exposure apparatus 1. Then, instead of the reflection mirror 30 provided in the exposure apparatus 1, the first half mirror 12 is arranged at the relevant position, and the first photodetector 13 is arranged on the transmission optical path of the first half mirror 12. I have to. In the exposure apparatus 50, the first APC 14 is connected between the first photodetector 13 and the first drive driver 24 of the first modulation optical system 6, and the first modulation optical system 6. First half mirror 1
2. The first light detector 13 and the first APC 14 constitute first light output control means.

The exposure apparatus 50 does not allow the second exposure beam reflected by the beam splitter 3 to pass through the light output control means such as the second light output control means 5 provided in the exposure apparatus 1, and Second modulation optical system 7 and deflection optical system 5
I try to lead directly to 1. Then, instead of the reflection mirror 32 provided in the exposure apparatus 1, the second half mirror 17 is disposed at the relevant position, and the second photodetector 18 is disposed on the transmission optical path of the second half mirror 17. I have to. In the exposure apparatus 50, the second APC 19 is connected between the second photodetector 18 and the third drive driver 55 of the deflecting optical system 51, and the deflecting optical system 5
The first, second half mirror 17, second photodetector 18, and second APC 19 constitute second light output control means.

According to the exposure apparatus 50, the first exposure beam transmitted through the first half mirror 12 is received by the first photodetector 13. The first photodetector 13 generates a control signal corresponding to the light intensity of the received light, and supplies the control signal to the first APC 14.

The first APC 14 is the first APC 14
The first driving driver 24 is controlled based on a control signal supplied from the first driver. Specifically, the first APC 14
Is a signal supplied from the first driver 24 to the first AOM 22 such that the light intensity of the first exposure beam received by the first photodetector 13 is constant at a predetermined level. The strength of the carrier of S1 is adjusted. Thereby, automatic light amount control is performed so that the light intensity of the first exposure beam transmitted through the first AOM 22 becomes constant.

Further, according to the exposure apparatus 50, the second exposure beam transmitted through the second half mirror 17 is
Are received by the photodetector 18. The second photodetector 18 is
A control signal corresponding to the light intensity of the received light is generated, and the control signal is supplied to the second APC 19.

The second APC 19 is the second APC 19
The third driving driver 55 is controlled based on a control signal supplied from the third driver 55. Specifically, the second APC 19
The carrier of the signal S3 supplied from the third driving driver 55 to the AOD 52 so that the light intensity of the second exposure beam received by the second photodetector 18 becomes constant at a predetermined level. Adjust the intensity of the. As a result, AO
Automatic light amount control is performed so that the light intensity of the second exposure beam transmitted through D52 becomes constant.

As described above, the exposure device 50 performs automatic light amount control of the first exposure beam using the first modulation optical system 6 and uses the deflection optical system 51 to control the amount of the second exposure beam. Since the automatic light amount control is performed, the configuration can be simplified as compared with the exposure apparatus 1 described above, and the first and second exposure beams can be located closer to the objective lens 36. Automatic light intensity control,
A more accurate latent image can be formed.

(Second Embodiment) An exposure apparatus according to a second embodiment is configured to form a magneto-optical disk as shown in FIGS. 4 and 5, for example. Is separated into three exposure beams.

Here, prior to the description of the exposure apparatus of the second embodiment, the magneto-optical disk 60 shown in FIGS. 4 and 5 will be described. FIG. 4 shows this magneto-optical disk 6
FIG. 5 is an enlarged cross-sectional view of a main part of the magneto-optical disk, and FIG.

The magneto-optical disk 60 is formed in a disk shape, and data is recorded using the magneto-optical effect. As shown in FIG. 4, the magneto-optical disk 60 has a recording layer 62 on which magneto-optical recording is performed on a disk substrate 61 made of polymethyl methacrylate (PMMA), polycarbonate (PC), or the like. 6
2 is formed. here,
The recording layer 62 includes, for example, a dielectric film made of SiN or the like,
A perpendicular magnetic recording film made of a TeFeCo alloy or the like;
And a reflective film made of Al or the like. The protective layer 63 is, for example, a recording layer 62
UV curable resin is spin-coated on the substrate.

As shown in FIG. 5, a part of the recording area of this magneto-optical disk 60 has a TOC (Table Of Content).
s) A read-only area B1 in which information and the like are written in advance by emboss pits 64, and the other area is an area B in which data can be written by magneto-optical recording.
It is 2.

The TOC is determined by the emboss pit 64.
The area B1 in which information and the like are written is a reproduction-only data area, and in the following description, this data area is referred to as a reproduction-only area B1. In the following description, the area B2 in which data can be written by magneto-optical recording is referred to as a writable area B2.

In the magneto-optical disk 60, the emboss pits 64 formed in the read-only area B1 have a pit pattern formed by, for example, 2-8 modulation in a single spiral shape. That is, TOC information and the like are written in the read-only area B1 by a pit row formed in a single spiral along the recording track.

On the other hand, in the writable area B2, a wobbling groove 65 and a straight groove 66 are formed in a double spiral shape, and a land portion between the wobbling groove 65 and the straight groove 66 is formed by magneto-optical recording. Data recording is performed. That is, as shown in FIG. 5, the portion between the wobbling groove 65 and the straight groove 66 and the inner circumferential side of the disk being the straight groove 66 becomes the first recording track TrackA where the information signal is recorded, Wobbling groove 65 and straight groove 6
6 and the portion where the inner circumferential side of the disc is the wobbling groove 65 is the second portion where the information signal is recorded.
Recording track TrackB.

Here, the wobbling groove 65 is ±
It is formed so as to meander at a constant cycle with an amplitude of 10 nm. That is, in the magneto-optical disk 60, one groove (ie, the wobbling groove 65) is wobbled with an amplitude of ± 10 nm,
Address information is added to the groove.

Further, in this magneto-optical disk 60,
Track pitch TPitch of read-only area B1 is 0.95μ
m, and similarly, the track pitch TPitch of the writable area B2 is set to 0.95 μm.

Here, the track pitch TPitch of the read-only area B1 corresponds to the interval between the center positions of adjacent pit rows. That is, in the magneto-optical disk 60, the interval between the center positions of adjacent pit rows is 0.95 μm. The track pitch of the writable area B2 corresponds to the interval between the center positions of the wobbling groove 65 and the straight groove 66. That is, in the magneto-optical disk 60, the interval between the center positions of the wobbling groove 65 and the straight groove 66 is 0.95.
μm.

In the following description, the interval between the center positions of the adjacent straight grooves 66 is referred to as a track period TPeriod. The track period TPeriod is equivalent to twice the track pitch TPitch, and in this magneto-optical disk 60, the track period TPeriod is used.
Is 1.90 μm.

Further, in this magneto-optical disk 60,
The area between the read-only area B1 and the writable area B2 is called a transition area B3. In the magneto-optical disk 60, the space between the read-only area B1 and the writable area B2 in the disk radial direction, that is, the transition area B
3 has a width t1 of 20 μm or less. By making the width t1 of the transition area B3 sufficiently small, the recording / reproduction position transitions from the reproduction-only area B1 to the writable area B2 during recording / reproduction, or the recording / reproduction position becomes the writable area. Even in the case of transition from B2 to the read-only area B1, it is possible to continuously perform stable recording and reproduction without losing the recording track.

The magneto-optical disk 6 constructed as described above
In the step of manufacturing the stamper of No. 0, an exposure apparatus 70 as shown in FIG. 6 is used.

The exposure apparatus 70 shown in FIG. 6 has a light source 71 for emitting a recording laser beam and a light source 7 as a basic configuration.
A first beam splitter 72 that transmits a part of the recording laser light emitted from 1 and reflects another part to separate an optical path of the recording laser light, and a first beam splitter 72. A second beam splitter 73 that transmits a part of the transmitted laser beam required for recording and reflects the other part of the laser beam to separate the light furnace of the laser beam required for recording;
First light output control means 7 for making the light output of the recording laser light of the first light path transmitted through the beam splitter 73 constant.
4, second light output control means 75 for keeping the light output of the recording laser light in the second optical path reflected by the second beam splitter 73 constant, and the second light output control means 75 reflected by the first beam splitter 72. The third light output control means 76 for making the light output of the recording laser light of the third light path constant, and the recording laser light of the first light path whose light output is controlled by the first light output control means 74. A first modulation optical system 77 that performs intensity modulation on the second laser light and a second modulation that performs intensity modulation on the recording laser light in the second optical path whose light output is controlled by the second light output control means 75. Optical system 78 and third light output control means 7
6, a third modulation optical system 79 that performs intensity modulation on the recording laser light in the third optical path whose light output is controlled, and a second optical path that is intensity-modulated by the second modulation optical system 78. Deflection optical system 80 for optically deflecting recording laser light
And an irradiation optical system 81 for guiding the laser light required for recording in the first to third optical paths on substantially the same optical path, condensing these recording laser lights, and irradiating the resist layer 38 formed on the glass substrate 37. And

The glass substrate 3 on which the resist layer 38 has been formed
7 is chucked on an air spindle which rotates with high rotational accuracy.

In the following description, the recording laser beam on the first optical path is called a first exposure beam, the recording laser beam on the second optical path is called a second exposure beam, and the third exposure beam is called a third exposure beam. The recording required laser light in the optical path is referred to as a third exposure beam.

Each optical element is the same as that described in the first embodiment, and a detailed description thereof will be omitted.

The first light output control means 74 controls the first EOM 82 for adjusting the light output of the first exposure beam, and the first EOM 82 for transmitting only the S-polarized light of the first exposure beam transmitted through the first EOM 82. The first analyzer 83, a first half mirror 84 that reflects a part of the first exposure beam transmitted through the first analyzer 83 and transmits another part, and a first half mirror 84. A first photodetector 85 that receives the transmitted first exposure beam and generates a control signal, and a first photodetector 85 that controls the operation of the first EOM 82 based on the control signal generated by the first photodetector 85. And one APC 86.

Similarly, the second light output control means 75 controls the second EOM 87 for adjusting the light output of the second exposure beam.
And S of the second exposure beam transmitted through the second EOM 87
A second analyzer 88 that transmits only polarized light, a second half mirror 89 that reflects a part of the second exposure beam transmitted through the second analyzer 88 and transmits another part, A second photodetector 90 that receives the second exposure beam reflected by the second half mirror 89 and generates a control signal;
And the second APC 91 that controls the operation of the second EOM 87 based on the control signal generated by the photodetector 90 of the second embodiment.

Similarly, the third light output control means 76 controls the third EOM 92 for adjusting the light output of the third exposure beam.
And S of the third exposure beam transmitted through the third EOM 92
A third analyzer 93 that transmits only polarized light, a third half mirror 94 that reflects a part of the third exposure beam transmitted through the third analyzer 93 and transmits another part, A third photodetector 95 that receives the third exposure beam reflected by the third half mirror 94 and generates a control signal;
And a third APC 96 for controlling the operation of the third EOM 92 based on the control signal generated by the photodetector 95 of the third embodiment.

The recording laser light emitted from the light source 2 is
The first and second beam splitters 72 and 73 provide the first beam splitter.
, A second exposure beam, and a third exposure beam.

The first exposure beam transmitted through the second beam splitter 73 is incident on the first EOM 82 controlled by the first APC 86 so that the first EOM 82 can keep the light output constant. The intensity is corrected. The first exposure beam that has passed through the first EOM 82 is converted into S-polarized light by the first analyzer 83, and then is partially reflected by the first half mirror 84, and partially reflected by the first half mirror 8.
4 is transmitted.

The first exposure beam transmitted through the first half mirror 84 is received by the first photodetector 85. First
The photodetector 85 generates a control signal corresponding to the light intensity of the received light, and supplies this control signal to the first APC 86.

The first APC 86 includes a first photodetector 85
The first EOM 82 based on the control signal supplied from the
Control. Specifically, the first APC 86 controls the first EOM so that the light intensity of the first exposure beam received by the first photodetector 85 is constant at a predetermined level.
The signal electric field applied to 82 is adjusted. Thereby, automatic light amount control is performed so that the light intensity of the first exposure beam transmitted through the first EOM 82 becomes constant, and a stable exposure beam with less noise is obtained.

On the other hand, the second exposure beam reflected by the second beam splitter 73 is incident on the second EOM 87 controlled by the second APC 91, and the second exposure beam
The intensity is corrected by the OM 87 so that the light output becomes constant. The second exposure beam transmitted through the second EOM 87 is converted into S-polarized light by the second analyzer 88, and then is partially reflected by the second half mirror 89, and partially reflected by the second half mirror 89. Through.

The second exposure beam reflected by the second half mirror 89 is received by the second photodetector 90. The second photodetector 90 generates a control signal corresponding to the light intensity of the received light, and outputs the control signal to the second APC 91.
To supply.

The second APC 91 has a second photodetector 90.
Based on the control signal supplied from the second EOM 87
Control. Specifically, the second APC 91 performs the second EOM so that the light intensity of the second exposure beam received by the second photodetector 90 becomes constant at a predetermined level.
The signal electric field applied to 87 is adjusted. As a result, automatic light amount control is performed so that the light intensity of the second exposure beam transmitted through the second EOM 87 is constant, and a stable exposure beam with less noise is obtained.

Further, the third exposure beam reflected by the first beam splitter 72 enters a third EOM 92 controlled by a third APC 94, and the third exposure beam
The intensity is corrected by the OM 92 so that the light output becomes constant. The third exposure beam that has passed through the third EOM 92 is converted into S-polarized light by the third analyzer 93, and then is partially reflected by the third half mirror 94, and partially reflected by the third half mirror 94. Through.

The third exposure beam reflected by the third half mirror 94 is received by the third photodetector 95. The third photodetector 95 generates a control signal corresponding to the light intensity of the received light, and outputs the control signal to the third APC 96.
To supply.

The third APC 96 has a third photodetector 95.
Based on the control signal supplied from the third EOM 92
Control. Specifically, the third APC 96 controls the third EOM so that the light intensity of the third exposure beam received by the third photodetector 95 becomes constant at a predetermined level.
The signal electric field to be applied to 92 is adjusted. Thereby, automatic light amount control is performed so that the light intensity of the third exposure beam transmitted through the third EOM 92 becomes constant, and a stable exposure beam with less noise is obtained.

The first exposure beam reflected by the first half mirror 84 is subjected to intensity modulation by the first modulation optical system 77. The intensity of the second exposure beam transmitted through the second half mirror 89 is modulated by the second modulation optical system 78. The third exposure beam transmitted through the third half mirror 94 is subjected to intensity modulation by the third modulation optical system 79.

The first modulation optical system 77 condenses the first exposure beam reflected by the first half mirror 84 with the first condenser lens 97 and the first condenser lens 97. A first AOM 98 for performing intensity modulation on the thus-formed first exposure beam in accordance with a recording signal, and a first AOM 98
A first collimating lens 99 that converts the first exposure beam intensity-modulated by the first collimating light into parallel light, and a first driving driver 100 that drives the first AOM 98.

Similarly, the second modulation optical system 78 includes a second condenser lens 101 for condensing the second exposure beam transmitted through the second half mirror 89, and a second condenser lens 101
A second AOM 102 that performs intensity modulation on the second exposure beam condensed according to the recording signal, and a second AOM 102
A second collimating lens 103 for converting the second exposure beam intensity-modulated by the OM 102 into parallel light, and a second A
A second driver 104 for driving the OM 102.

Similarly, the third modulation optical system 79 includes a third condenser lens 105 for condensing the third exposure beam transmitted through the third half mirror 94, and a third condenser lens 105
A third AOM 106 that performs intensity modulation on the third exposure beam condensed according to the recording signal, and a third A
A third collimating lens 107 for converting the third exposure beam intensity-modulated by the OM 106 into parallel light, and a third A
A third driver 108 for driving the OM 106.

The first exposure beam reflected by the first half mirror 84 is incident on the first AOM 98 while being condensed by the first condenser lens 97. And
The first exposure beam is intensity-modulated by the first AOM 98 driven by the first drive driver 100 so as to correspond to a desired exposure pattern.

A signal S4 corresponding to a desired exposure pattern is input to the first driver 100. Specifically, for example, when a latent image having a groove pattern corresponding to a straight groove having a certain depth is formed on the resist layer 38, a DC signal having a certain level is input to the first driver 100. The first drive driver 100 drives the first AOM 98 based on the signal S4. Thus, the second exposure beam incident on the first AOM 98 is subjected to intensity modulation by the first AOM 98 so as to correspond to a desired groove pattern.

The first exposure beam intensity-modulated by the first AOM 98 is converted into parallel light by the first collimator lens 99, and then travels to the irradiation optical system 81 provided on the moving optical table.

On the other hand, the second exposure beam transmitted through the second half mirror 89 is incident on the second AOM 102 while being condensed by the second condenser lens 101. Then, the second exposure beam is intensity-modulated by the second AOM 102 driven by the second drive driver 104 so as to correspond to a desired exposure pattern.

A signal S5 corresponding to a desired exposure pattern is input to the second drive driver 104. Specifically, for example, when a latent image having a groove pattern corresponding to a wobbling groove having a certain depth is formed on the resist layer 38, a DC signal having a certain level is input to the second driver 104. The second drive driver 104 includes:
The second AOM 102 is driven based on the signal S5. Thus, the second exposure beam incident on the second AOM 102 is subjected to intensity modulation by the second AOM 102 so as to correspond to a desired groove pattern.

The second exposure beam intensity-modulated by the second AOM 102 is converted into parallel light by the second collimating lens 103 and then travels to the deflection optical system 80.

Further, the third exposure beam reflected by the third half mirror 94 is incident on the third AOM 106 while being condensed by the third condenser lens 105. Then, the third exposure beam is emitted by the third AOM 106 driven by the third drive driver 108.
The intensity is modulated so as to correspond to a desired exposure pattern.

A signal S6 corresponding to a desired exposure pattern is input to the third driver 108. Specifically, for example, when a latent image of a pit pattern subjected to 2-8 modulation is formed on the resist layer 38, a modulation signal corresponding to the pit pattern subjected to 2-8 modulation is a third signal. The signal is input to the driving driver 108. Third drive driver 1
08 drives the third AOM 106 based on the signal S6. Thus, the third exposure beam incident on the third AOM 106 is subjected to intensity modulation by the third AOM 106 so as to correspond to, for example, a pit pattern subjected to 2-8 modulation.

The third exposure beam intensity-modulated by the third AOM 106 is converted into parallel light by the third collimator lens 107, and then travels to the irradiation optical system 81 provided on the moving optical table.

The polarization direction of the first exposure beam converted into parallel light by the first collimating lens 99 is rotated by 90 ° by the half-wave plate 109 to be P-polarized light.
The light path is bent by the reflection mirror 110 and is guided horizontally on the moving optical table, and heads for the irradiation optical system 81. The third exposure beam converted into parallel light by the third collimating lens 107 is reflected by the reflection mirrors 111 and 11.
The optical path is bent by 2, passes through the half mirror 119, is guided horizontally on the moving optical table, and goes to the irradiation optical system 81.

The light path of the second exposure beam converted into parallel light by the second collimator lens 103 is bent by the reflection mirror 113 and travels to the deflection optical system 80.

The deflection optical system 80 optically deflects the second exposure beam to meander the irradiation locus of the second exposure beam applied to the resist layer 38 to form a so-called wobbling groove. Of
The AOD 114 includes a pair of wedge prisms 115 and 116 disposed before and after the AOD 114, and a fourth driver 117 for driving the AOD 114.

The fourth drive driver 117 includes the VCO 1
The VCO 118 supplies a high-frequency signal.

The second exposure beam incident on the deflection optical system 80 is incident on the AOD 114 driven by the fourth drive driver 117 via the wedge prism 115. The high frequency signal from the VCO 118 is supplied to the fourth drive driver 117 after being FM-modulated by a control signal S7 including address information. Fourth drive driver 11
7 drives the AOD 114 according to this signal. Thereby, the second exposure beam incident on the AOD 114 is
Optical deflection is performed so as to correspond to a desired exposure pattern.

The second exposure beam optically deflected by the deflecting optical system 80 has its optical path bent by the half mirror 119 and is guided horizontally on the moving optical table.
It goes to the irradiation optical system 81.

The irradiation optical system 81 transmits the first exposure beam and reflects the second and third exposure beams.
20, a magnifying lens 121 for expanding the beam diameter of the first exposure beam transmitted through the PBS 120 and the second and third exposure beams reflected by the PBS 120, a beam diameter expanded by the magnifying lens 121, and the reflection mirror 12
The objective lens 123 focuses the first to third exposure beams, each having an optical path bent by 2, and irradiates the resist layer 38 formed on the glass substrate 37. Each of the optical elements constituting the irradiation optical system 81 corresponds to the glass substrate 3 on which the resist layer 38 is formed.
7 is supported on a moving optical table that is operated to move in the radial direction.

The PBS 120 transmits the P-polarized light component and
The polarization component is reflected. PBS120
Is transmitted to the PBS 120 because it is P-polarized by the half-wave plate 109. On the other hand, since the second and third exposure beams incident on the PBS 120 remain S-polarized,
Reflected by 120. Thus, the first exposure beam, the second exposure beam, and the third exposure beam are guided on substantially the same optical axis.

The first exposure beam transmitted through the PBS 120 and the second and third exposure beams reflected by the PBS 120 are transmitted through the magnifying lens 121 so that the beam diameter is expanded. The optical path is bent and enters the objective lens 123.
The first to third exposure beams incident on the objective lens 123 are respectively condensed by the objective lens 123 and are applied to a resist layer 38 formed on a glass substrate 37 that is rotated by an air spindle.

As a result, a latent image corresponding to the irradiation trajectories of the first to third exposure beams is formed on the resist layer 38.

By using the exposure apparatus 70 described above, the stamper for the magneto-optical disk 60 shown in FIGS. 4 and 5 can be manufactured. This exposure device 70
When a stamper for the magneto-optical disk 60 is manufactured by using the first exposure beam, a latent image corresponding to the straight groove 66 is formed by the first exposure beam, and the latent image corresponding to the wobbling groove 65 is formed by the second exposure beam. Then, a latent image corresponding to the emboss pit 64 is formed by the third exposure beam.

As described above, the magneto-optical disk 6
At 0, the embossed pit 64 is formed in the read-only area B1 on the inner peripheral side of the magneto-optical disk 60, and the wobbling groove 65 and the straight groove 66 are located on the outer peripheral side of the read-only area B1 with the transition area B3 interposed therebetween. It is formed so as to form a double spiral shape in the writable area B2. Therefore, when manufacturing a stamper for the magneto-optical disk 60 using the exposure apparatus 70, first, the third
A latent image having a pattern corresponding to the embossed pits 64 is formed on the inner peripheral side of the resist layer 38 on the glass substrate 37 by using only the exposure beam of. Then, the switching between the third exposure beam and the first and second exposure beams is performed at a location that becomes the transition region B3. Next, a double spiral wobbling groove 65 and a straight groove 66 are formed on the outer peripheral side of the resist layer 38 by using the first and second exposure beams. Thus, a latent image corresponding to the magneto-optical disk 60 can be appropriately formed on the resist layer 38.

As described above, the exposure apparatus 70
The optical path of the recording laser light emitted from the light source is divided into three, and the automatic light amount control is individually performed on the recording laser light of each optical path. The light output of the recording laser light can be controlled to an optimum value, and the dispersion of the laser light is suppressed, for example, a latent image corresponding to the embossed pit,
It is possible to accurately form three types of latent images having different shapes, such as a latent image corresponding to a wobbling groove and a latent image corresponding to a straight groove.

In the above description, the first light output control means 74 provided with the first EOM 82 performs automatic light amount control of the first exposure beam, and the second light output control means provided with the second EOM 87. The exposure apparatus 70 has been described in which the automatic light quantity control of the second exposure beam is performed by 75 and the automatic light quantity control of the third exposure beam is performed by the third light output control means 76 having the third EOM 92. However, the exposure apparatus according to the present invention is not limited to this example. For example, similarly to the first embodiment, for example, the AOM of the modulation optical system is used.
Automatic light amount control may be performed using the AOD of the deflection optical system 80 or the like.

[0145]

According to the exposure apparatus of the present invention, the optical path of the laser light emitted from the light source is separated into a plurality of parts by the optical path separating means, and the laser light of each of the separated optical paths is converted into a light beam having a constant light output. Is controlled individually by a plurality of output control means, so that the optical output of the laser beam whose optical path is separated can be controlled to an optimum value, respectively, and the laser light of the plurality of optical paths can be controlled. Light variation can be suppressed.

Further, in the exposure method according to the present invention, the optical path of the laser light emitted from the light source is divided into a plurality of light paths, and a plurality of light output control means separates a part of the laser light on the plurality of separated optical paths. Since the light output of the laser light is detected and controlled so as to be a predetermined value, the light output of the laser light whose optical path is separated can be controlled to an optimum value, respectively. Of the laser beam in the optical path can be suppressed.

[Brief description of the drawings]

FIG. 1 is a configuration diagram showing a schematic configuration of an exposure apparatus according to the present invention.

FIG. 2 is a configuration diagram showing a schematic configuration of another exposure apparatus according to the present invention.

FIG. 3 is a configuration diagram showing a schematic configuration of still another exposure apparatus according to the present invention.

FIG. 4 is a sectional view of a main part of the magneto-optical disk.

FIG. 5 is a plan view showing a recording area of the magneto-optical disk.

FIG. 6 is a configuration diagram showing a schematic configuration of still another exposure apparatus according to the present invention.

FIG. 7 is a configuration diagram showing a schematic configuration of a conventional exposure apparatus.

[Explanation of symbols]

1, 40, 50, 70 exposure apparatus, 2, 71 light source, 3
Beam splitter, 72 first beam splitter,
73 second beam splitter, 4,74 first light output control means, 5,75 second light output control means, 76
Third light output control means, 6,77 first modulation optical system,
7,78 Second modulation optical system, 79 Third modulation optical system, 51,80 Deflection optical system, 38 Resist layer

Claims (14)

[Claims] 1. An exposure apparatus for irradiating a laser beam emitted from a light source onto a photosensitive agent layer to form a latent image having a predetermined pattern on the photosensitive agent layer, wherein an optical path separating the laser beam into a plurality of optical paths. Means, and a plurality of light output control means for respectively detecting a part of the laser light in the plurality of light paths separated by the light path separating means and controlling the light output of the laser light to have a predetermined value. An exposure apparatus comprising: 2. An exposure apparatus according to claim 1, further comprising an optical path synthesizing means for guiding the laser beams of the plurality of separated optical paths onto substantially the same optical path. 3. A method according to claim 1, further comprising a plurality of intensity modulating means disposed on a plurality of optical paths of the laser light separated by the optical path separating means, respectively, for intensity modulating the laser light based on a supplied recording signal. The exposure apparatus according to claim 1, wherein 4. At least one light output control means of the plurality of light output control means adjusts a carrier intensity of a recording signal supplied to the intensity modulation means,
4. The exposure apparatus according to claim 3, wherein the light output of the laser light is controlled to have a predetermined value. 5. At least one light deflecting device disposed on at least one of a plurality of optical paths of the laser light separated by the optical path separating means and deflecting the laser light based on a supplied control signal. 2. An exposure apparatus according to claim 1, further comprising: means. 6. At least one light output control means of the plurality of light output control means adjusts a carrier intensity of a control signal supplied to the light deflecting means so that the light output of the laser light is predetermined. 6. The exposure apparatus according to claim 5, wherein the control is performed such that the value becomes: 7. An exposure apparatus according to claim 1, wherein said optical path separating means separates the optical path of said laser light into three. 8. An exposure method for irradiating a laser beam emitted from a light source to a photosensitive agent layer to form a latent image having a predetermined pattern on the photosensitive agent layer, wherein the optical path of the laser beam is divided into a plurality of light paths. A light output control means for detecting a part of the laser light in a plurality of separated optical paths and controlling the light output of the laser light to a predetermined value. 9. The exposure method according to claim 8, wherein the laser beams of the plurality of separated optical paths are guided onto substantially the same optical path by an optical path combining means. 10. A plurality of intensity modulating means for respectively modulating the intensity of the laser light based on a supplied recording signal on a plurality of optical paths of the laser light separated by the optical path separating means. 9. The exposure method according to claim 8, wherein the intensity modulating means individually modulates the intensity of the laser beams in the plurality of optical paths. 11. At least one of the plurality of light output control means adjusts a carrier intensity of a recording signal supplied to the intensity modulation means so that the light output of the laser light is predetermined. 9. The exposure method according to claim 8, wherein the control is performed so as to obtain the following value. 12. A method according to claim 1, wherein at least one of a plurality of optical paths of the laser beam separated by the optical path separating means is provided.
At least one light deflecting means for deflecting the laser light based on the supplied control signal is provided, and the light deflecting means deflects the laser light on at least one of the plurality of laser light paths. 9. The exposure method according to claim 8, wherein: 13. At least one of the plurality of light output control means adjusts a carrier intensity of a control signal supplied to the light deflecting means,
13. The exposure method according to claim 12, wherein the light output of the laser light is controlled to have a predetermined value. 14. An exposure method according to claim 8, wherein an optical path of said laser beam is divided into three.