JPH11295518A - Substrate for color filter and its production - Google Patents
Substrate for color filter and its productionInfo
- Publication number
- JPH11295518A JPH11295518A JP11018698A JP11018698A JPH11295518A JP H11295518 A JPH11295518 A JP H11295518A JP 11018698 A JP11018698 A JP 11018698A JP 11018698 A JP11018698 A JP 11018698A JP H11295518 A JPH11295518 A JP H11295518A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- light
- layer
- shielding layer
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、カラ−液晶などの
フラットパネルディスプレーに用いるカラ−フィルター
用の基板とその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for a color filter used for a flat panel display such as a color liquid crystal display, and a method of manufacturing the same.
【0002】[0002]
【従来の技術】図5に示すように、ガラス、プラスチッ
クなどの透明基板1上に各画素間の遮光層2を形成し、
その上にカラ−フィルターとして必要な光学特性を有す
るR、G、Bなどの各着色層3を所要パターン状に形成
する。その着色層は、顔料分散法、染色分散法、電着
法、印刷法など種々の方法によって形成されるが、その
表面の平坦、平滑法が液晶セルの表示特性に大きく影響
する。2. Description of the Related Art As shown in FIG. 5, a light shielding layer 2 between pixels is formed on a transparent substrate 1 made of glass, plastic, or the like.
On top of this, R, G, B and other colored layers 3 having the necessary optical characteristics as a color filter are formed in a required pattern. The colored layer is formed by various methods such as a pigment dispersion method, a dye dispersion method, an electrodeposition method, and a printing method, and the flatness and smoothness of the surface greatly affect the display characteristics of the liquid crystal cell.
【0003】ところが何れの方法でも各着色層R、G、
B相互の境界部で光漏れが生じる隙間がないように形成
すると、その境界接合部に盛り上がり4が生じる傾向は
避けられず、平坦性を阻害する原因となっている。特に
遮光層のコストダウンを目的として従来のクロム、クロ
ム酸化物薄膜(図5−a「2」)の代わりに黒色樹脂遮
光層(図5−b「2’」)を用いると特性上その膜厚が
1μ程度必要となる。そこで従来の約10倍厚い遮光層
となり、この盛り上がり4が一層大きくなる(図5−
b)。However, in any of the methods, each of the colored layers R, G,
If there is no gap where light leakage occurs at the boundary between B, there is a tendency for bulges 4 to occur at the boundary junction, which is a factor that impairs flatness. In particular, when a black resin light-shielding layer (FIG. 5-b "2 '") is used instead of the conventional chromium and chromium oxide thin film (FIG. 5-a "2") for the purpose of cost reduction of the light-shielding layer, the film becomes characteristically thin. A thickness of about 1 μm is required. Therefore, the light-shielding layer becomes about 10 times as thick as the conventional one, and the bulge 4 becomes even greater (FIG. 5).
b).
【0004】そこでこれを解決する手段として、遮光層
パターンの上から全面に透明樹脂を塗布して大きい段差
をなくしたり(特開平7−294723)、更にその表
面を研磨して遮光層と面一表面にする(特開平7−28
7112)など基板表面を平坦化する技術が提案されて
いる。また形成したカラ−フィルターの表面を研磨した
り、カラ−フィルター上に更に透明樹脂による平滑層5
をオーバーコートするなどの手段が用いられている。In order to solve this problem, a transparent resin is applied to the entire surface of the light-shielding layer pattern to eliminate a large step (Japanese Patent Laid-Open No. 7-294723). Surface (Japanese Unexamined Patent Publication No. 7-28
A technique for flattening the substrate surface, such as 7112), has been proposed. The surface of the formed color filter is polished, and a smooth layer 5 made of a transparent resin is further formed on the color filter.
For example, means such as overcoating is used.
【0005】[0005]
【発明が解決しようとする課題】上述したようにカーボ
ン分散による黒色樹脂層のような厚膜の遮光層を用いた
カラ−フィルターではいずれの製造法でもその遮光層上
の各着色層接合部分で盛り上がり凸部が生じる傾向が大
きく、これを解決するには課題が多く、種々の煩雑な対
策によってもその程度が低減されるだけで十分な解決は
難しい。As described above, in a color filter using a thick light-shielding layer such as a black resin layer formed by carbon dispersion as described above, in any of the manufacturing methods, each colored layer joint portion on the light-shielding layer is formed. There is a large tendency for bulging protrusions to occur, and there are many problems to solve this, and it is difficult to achieve a sufficient solution only by reducing the degree by various complicated measures.
【0006】そこで本発明は、現工法で製造上避けられ
ない盛り上がり発生を防止するための形状を有する透明
基板を用いることによって、これらの課題を抜本的に解
決する手段を提供するものである。Accordingly, the present invention provides a means for drastically solving these problems by using a transparent substrate having a shape for preventing the occurrence of bulges which cannot be avoided in the production method by the current method.
【0007】[0007]
【課題を解決するための手段】上記の目的を達成するた
めの本発明のカラ−フィルター用基板の構成は、カラ−
フィルターの各着色層相互境界部の遮光層部分が凹型に
なるように、透明基板上の遮光層パターンの間隙部に遮
光層より厚い透明層を設けることを特徴とする。また遮
光層を有する透明基板上に各着色層を形成した時に各着
色層相互の境界部に生じる盛り上がり量に相当する容
量、又はそれ以上の凹部を形成することを特徴とする。
また遮光部パターンとその間隙部に設けた透明樹脂層で
形成された凹型部分の上端面が丸味を有することを特徴
とする。In order to achieve the above object, the structure of the color filter substrate of the present invention comprises a color filter.
A transparent layer thicker than the light-shielding layer is provided in the gap between the light-shielding layer patterns on the transparent substrate so that the light-shielding layer at the boundary between the colored layers of the filter is concave. In addition, when each colored layer is formed on a transparent substrate having a light-shielding layer, a concave portion having a capacity corresponding to a bulging amount generated at a boundary portion between the colored layers or a concave portion larger than that is formed.
Further, the upper end surface of the concave portion formed by the light shielding portion pattern and the transparent resin layer provided in the gap portion is rounded.
【0008】このような形状の基板を製造する方法とし
て、硬化後の膜厚が遮光層よりも必要量だけ大きくなる
ような厚さの光硬化透明樹脂塗膜層を有する光硬化性樹
脂フィルムの塗膜層を遮光層パターンを形成した透明基
板に圧接する第1工程と、透明基板側から光照射して遮
光層間隙部の樹脂層を硬化する第2工程と、ベースフィ
ルムを剥離して未硬化部分を現像除去する第3工程と、
これを本硬化する第4工程とを含むことを特徴とするも
のである。As a method for producing a substrate having such a shape, a photocurable resin film having a photocurable transparent resin coating layer having a thickness such that the film thickness after curing becomes larger than the light-shielding layer by a required amount is used. A first step of pressing the coating film layer against the transparent substrate on which the light-shielding layer pattern is formed, a second step of irradiating light from the transparent substrate side to cure the resin layer in the gap between the light-shielding layers, and A third step of developing and removing the cured portion;
And a fourth step of fully curing this.
【0009】[0009]
【発明の実施の形態】以下本発明の実施例を示す。図1
のように300×400mm、厚さ1.1mmのガラス
基板1上に、幅20μ、厚さ0.9μの黒色樹脂遮光層
2’を90μ間隔でストライプ状に形成する。その上に
光硬化樹脂フィルム8を光硬化樹脂層6がガラス基板1
に接するように60〜80°C程度に加熱した状態でラ
ミネーターなどを用いて圧接する(図1−a)。光硬化
樹脂フィルム8はポリエステルなどのベースフィルム7
上に例えばアクリルスチレン系透明UV硬化樹脂層6を
コ−ティングした市販のものから必要な塗膜厚さのもの
を選択する。Embodiments of the present invention will be described below. FIG.
A black resin light-shielding layer 2 ′ having a width of 20 μm and a thickness of 0.9 μm is formed in stripes at intervals of 90 μm on a glass substrate 1 having a size of 300 × 400 mm and a thickness of 1.1 mm. A photocurable resin film 8 and a photocurable resin layer 6 are formed on the glass substrate 1.
Then, it is pressed by using a laminator or the like in a state where it is heated to about 60 to 80 ° C. so as to be in contact with (FIG. 1A). The photocurable resin film 8 is made of a base film 7 such as polyester.
For example, a commercially available acrylic styrene-based transparent UV-curable resin layer 6 having a required coating film thickness is selected from those coated thereon.
【0010】次に透明基板側から10〜15j/cm程
度のUV照射9により背面露光する。その結果遮光層
2’が遮光マスクとなり遮光層の間隙部の光硬化樹脂層
は硬化6’し、遮光層上の部分は未硬化6の状態で残る
(図1−b)。Next, back exposure is performed by UV irradiation 9 of about 10 to 15 j / cm from the transparent substrate side. As a result, the light-shielding layer 2 'becomes a light-shielding mask, and the photocurable resin layer in the gap between the light-shielding layers is hardened 6', and the portion on the light-shielding layer remains unhardened 6 (FIG. 1-b).
【0011】そこでベースフィルム7を剥離して、2%
程度のアルカリ溶液を用いて現像し、未硬化部分6を除
去することによって遮光層2’の間隙部分に遮光層より
も膜厚の大きい透明樹脂層6’を有する本発明の遮光層
部分が凹型になった遮光層パターン付き透明基板が得ら
れる(図1−c)。Then, the base film 7 is peeled off to remove 2%
The light-shielding layer of the present invention having a transparent resin layer 6 ′ having a larger thickness than the light-shielding layer in the gap between the light-shielding layers 2 ′ is developed by removing the uncured portions 6 by developing using an alkaline solution of about A transparent substrate with a light-shielding layer pattern is obtained (FIG. 1-c).
【0012】この場合凹型の大きさ即ち透明部分との段
差は次に示すような状態に応じて実用上の最適値を求め
ればよい。まず従来のガラス基板1上に樹脂遮光層2’
パターンを形成した基板上にR、G、B着色層を設けた
場合に、その相互の境界部に生じる盛り上がり量4の実
態を測定する(図2−a)。そこでこの量に相当する大
きさの凹部を有する基板を形成すればよい。その大きさ
が盛り上がり量より小さいと盛り上がりが残り(図2−
b)、大きいと逆にくぼみを生じる(図2−c)。そこ
で本発明の効果を発揮して平坦か、多少凹型になる形状
(図2−d)が得られる凹部の大きさを選択、実用化す
ればよい。In this case, the practical size of the concave portion, that is, the step between the transparent portion and the transparent portion may be determined according to the following conditions. First, a resin light shielding layer 2 ′ is formed on a conventional glass substrate 1.
When the R, G, and B color layers are provided on the substrate on which the pattern is formed, the actual state of the bulge amount 4 generated at the boundary between the layers is measured (FIG. 2A). Therefore, a substrate having a concave portion having a size corresponding to this amount may be formed. If the size is smaller than the swell amount, the swell remains (see FIG. 2).
b), if it is large, a dent is formed (FIG. 2-c). Therefore, the size of the concave portion that can obtain the shape (FIG. 2D) that is flat or slightly concave by exhibiting the effect of the present invention may be selected and put to practical use.
【0013】具体例として本実施例の黒色樹脂遮光層パ
ターンを設けた基板を用いてR、G、B各色を印刷法で
1.0μの厚さに形成した場合に生じる盛り上がり量の
高さは0.45μであった。そこで透明樹脂の厚さが硬
化後1.25μになる光硬化樹脂フィルムを用いて段差
が0.35μとなる本発明の形状の基板を作製し、同様
にR、G、B各色を形成したところ平坦性の優れたカラ
−フィルターが得られた。この効果を表面粗さの実測デ
ータで従来例と比較して図3に示す。従来法Aと本発明
Bにおける遮光層付きガラス基板自体aとカラ−フィル
ター形成後bの表面平坦性の向上効果が明らかである。As a specific example, when the R, G, and B colors are formed to a thickness of 1.0 μm by a printing method using the substrate provided with the black resin light-shielding layer pattern of the present embodiment, the height of the swell amount is as follows. 0.45μ. Therefore, a substrate having the shape of the present invention in which the step was 0.35 μm was prepared using a photocurable resin film in which the thickness of the transparent resin became 1.25 μm after curing, and R, G, and B colors were similarly formed. A color filter having excellent flatness was obtained. This effect is shown in FIG. 3 in comparison with a conventional example using actually measured surface roughness data. The effect of improving the surface flatness of the glass substrate with a light shielding layer itself a and the color filter after formation b in the conventional method A and the present invention B is apparent.
【0014】更に平坦性を向上すると同時に耐薬品性、
耐スパッター性などを向上するために補助手段としてこ
の上にオーバーコート層を形成する場合、多少でも突起
のあるものよりむしろ凹型のほうが平坦化が容易であ
る。そこで境界部の表面が面一か凹型になるような基板
の構成条件の選択が有効である。Furthermore, chemical resistance is improved while flatness is improved.
When an overcoat layer is formed thereon as an auxiliary means for improving the spatter resistance and the like, the flattening is easier with the concave type rather than the one with some protrusions. Therefore, it is effective to select the configuration conditions of the substrate such that the surface of the boundary portion is flush or concave.
【0015】また、これらの生産性の均一性、歩留まり
に対しては凹部の形状も影響する。これまで説明した状
態は図4−aのような一般的形状であるが、工程条件に
よっては図4−bのように上端部に角状突起が生じるこ
とがある。このような形状になるとR、G、B着色層形
成時にスムースな流れが阻害され凹型の基板を用いても
目的とする平坦性が得られない。そこで図4−cのよう
に上端面に丸味を設けて角状突起が生じないようにして
おくことが実用上有効である。これらの形状は光硬化樹
脂の形成条件、すなわちラミネート条件、UV露光条
件、環境条件などの選択組み合わせによって決めること
ができる。The shape of the concave portion also affects the uniformity and yield of the productivity. The state described so far has a general shape as shown in FIG. 4-a, but depending on the process conditions, a horn-shaped projection may be formed at the upper end as shown in FIG. 4-b. With such a shape, a smooth flow is inhibited at the time of forming the R, G, and B colored layers, and a desired flatness cannot be obtained even when a concave substrate is used. Therefore, it is practically effective to provide the upper end face with a rounded shape as shown in FIG. These shapes can be determined by a combination of conditions for forming the photocurable resin, that is, lamination conditions, UV exposure conditions, environmental conditions, and the like.
【0016】[0016]
【発明の効果】以上説明したように、本発明は各種方法
によるカラ−フィルターの製造工程において宿命的課題
であった各色相互の接合部の盛り上がりに起因する平坦
性の低下を根本的に解決するものである。その方法は従
来の単に黒色樹脂遮光層を設けた基板の代わりに、従来
法で生じる盛り量に相当する量を吸収するに十分な大き
さの凹部を各色の接合部即ち樹脂遮光層上部に設けた基
板を用いるのみの極めて簡単な手段で従来の何れの方法
にも容易に適用できるものである。ここで凹部の大き
さ、形状は、その上に形成するカラ−フィルターの種
類、形状、製造法などに応じて本発明の目的に合った平
坦面が得られる最高値を選択設計すればよい。As described above, the present invention fundamentally solves the problem of the flatness caused by the swelling of the junction of each color, which was a fatal problem in the process of manufacturing the color filter by various methods. Things. In this method, instead of a conventional substrate provided simply with a black resin light-shielding layer, a concave portion large enough to absorb an amount corresponding to the build-up amount generated by the conventional method is provided at the joint of each color, that is, the upper part of the resin light-shielding layer. It can be easily applied to any of the conventional methods by a very simple means using only a substrate. Here, the size and shape of the concave portion may be selected and designed according to the type, shape, manufacturing method, and the like of the color filter to be formed thereon, so as to obtain a flat surface suitable for the purpose of the present invention.
【0017】本発明の効果は、いずれの工法によるカラ
−フィルターでも同様に得られるものであるが、特に低
コスト生産の可能性が最も大きい印刷法カラ−フィルタ
ーの製造において顕著である。印刷法の中でも効率的な
生産を目的とする三色同時印刷法、即ちR、G、B三色
の混色を避けるために一定間隔を設けて遮光層間に各色
を印刷し、プレスして間隙を埋め合わせる方法におい
て、工法上盛り上がりが大きくなる弊害を除去するのに
特に有効である。Although the effects of the present invention can be obtained by using any of the color filters manufactured by any of the methods, it is particularly remarkable in the production of a color filter having a printing method which has the highest possibility of low-cost production. Among the printing methods, a three-color simultaneous printing method for the purpose of efficient production, that is, printing each color between light-shielding layers at a fixed interval to avoid mixing of three colors of R, G, and B, and pressing the gap. The method of compensating is particularly effective for removing the adverse effect of increasing the swelling in the construction method.
【0018】上記のように本発明は何れのカラ−フィル
ター製造法においても避けられない各色相互の接合部の
盛り上がり、突起の発生を完全に排除できるために表面
平坦性に優れたカラ−フィルターが得られる。然もこの
ような基板を用いるのみで何れのカラ−フィルター製造
法にも容易に適用できるので実用上の効果大である。As described above, according to the present invention, a color filter having excellent surface flatness can be completely eliminated since the ridges and protrusions of each color which cannot be avoided in any color filter manufacturing method can be completely eliminated. can get. Of course, only by using such a substrate, it can be easily applied to any color filter manufacturing method, so that the practical effect is large.
【図1】 本発明の製造法の実施例を示す断面図であ
る。FIG. 1 is a cross-sectional view illustrating an example of a manufacturing method according to the present invention.
【図2】 本発明の代表的条件の差による表面平坦性を
示す断面図である。FIG. 2 is a cross-sectional view showing surface flatness due to a difference in typical conditions of the present invention.
【図3】 樹脂遮光層付き基板とそれを用いたカラ−フ
ィルターの従来例と本発明における表面粗さ測定チャー
トである。FIG. 3 is a conventional example of a substrate with a resin light-shielding layer and a color filter using the same, and a surface roughness measurement chart in the present invention.
【図4】 本発明における端面形状の差を示す断面図で
ある。FIG. 4 is a cross-sectional view showing a difference between end face shapes in the present invention.
【図5】 従来例の薄膜遮光層と厚膜遮光層を用いた場
合の断面図である。FIG. 5 is a cross-sectional view when a thin film light shielding layer and a thick film light shielding layer of a conventional example are used.
1 透明基板 2、2’遮光層 3 カラ−フィルター着色層 4 盛り上がり部(突起) 5 平滑層 6、6’光硬化透明樹脂層 7 ベースフィルム 8 光硬化樹脂フィルム 9 光(UV) DESCRIPTION OF SYMBOLS 1 Transparent substrate 2, 2 'light-shielding layer 3 Color filter coloring layer 4 Rise (protrusion) 5 Smooth layer 6, 6' light-cured transparent resin layer 7 Base film 8 light-cured resin film 9 light (UV)
Claims (4)
の遮光層部分が凹型になるように、透明基板上の遮光層
パターンの間隙部に遮光層よりも厚い透明層を設けるこ
とを特徴とするカラ−フィルター用基板。1. A transparent layer thicker than a light-shielding layer is provided in a gap between light-shielding layer patterns on a transparent substrate so that a light-shielding layer portion at a boundary between respective colored layers of a color filter becomes concave. Color filter substrate.
形成したときに、各着色層相互の境界部に生じる盛り上
がり量に相当する容量の、又はそれ以上の凹部を設ける
ことを特徴とする請求項1記載のカラ−フィルター用基
板。2. The method according to claim 1, wherein when each colored layer is formed on a transparent substrate having a light-shielding layer, a concave portion having a capacity corresponding to the amount of swelling generated at the boundary between the colored layers is provided. The substrate for a color filter according to claim 1.
明樹脂層とで形成された凹型部分の上端部が丸味を有す
ることを特徴とする請求項1、2記載のカラ−フィルタ
ー用基板。3. The color filter substrate according to claim 1, wherein the upper end of the concave portion formed by the light shielding layer pattern and the transparent resin layer provided in the gap has a rounded shape.
くなるような厚さの光硬化透明樹脂塗膜層を有する光硬
化性樹脂フィルムの塗膜層を遮光層パターンを形成した
透明基板に圧接する第1工程と、透明基板側から光照射
して遮光層間隙部の樹脂層を硬化する第2工程と、ベー
スフィルムを剥離して未硬化部分を除去する第3工程
と、これを本硬化する第4工程を含むことを特徴とする
請求項1、2、3記載のカラ−フィルター用基板の製造
法。4. A photo-curable resin film having a photo-curable transparent resin film layer having a thickness such that the film thickness after curing is larger than the light-shielding layer by a required amount. A first step of pressing against the substrate, a second step of irradiating light from the transparent substrate side to cure the resin layer in the light-shielding layer gap, and a third step of removing the uncured portion by peeling the base film. 4. The method for producing a color filter substrate according to claim 1, further comprising a fourth step of fully curing the color filter substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11018698A JPH11295518A (en) | 1998-04-06 | 1998-04-06 | Substrate for color filter and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11018698A JPH11295518A (en) | 1998-04-06 | 1998-04-06 | Substrate for color filter and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11295518A true JPH11295518A (en) | 1999-10-29 |
Family
ID=14529235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11018698A Pending JPH11295518A (en) | 1998-04-06 | 1998-04-06 | Substrate for color filter and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11295518A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7227600B2 (en) | 2001-07-13 | 2007-06-05 | Seiko Epson Corporation | Color filter substrate and electro-optical device, manufacturing method for color filter substrate and manufacturing method for electro-optical device, and electronic equipment |
JP2007219565A (en) * | 2001-07-13 | 2007-08-30 | Seiko Epson Corp | Color filter substrate for liquid crystal display panel and liquid crystal display device, and electronic apparatus |
-
1998
- 1998-04-06 JP JP11018698A patent/JPH11295518A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7227600B2 (en) | 2001-07-13 | 2007-06-05 | Seiko Epson Corporation | Color filter substrate and electro-optical device, manufacturing method for color filter substrate and manufacturing method for electro-optical device, and electronic equipment |
JP2007219565A (en) * | 2001-07-13 | 2007-08-30 | Seiko Epson Corp | Color filter substrate for liquid crystal display panel and liquid crystal display device, and electronic apparatus |
US7411642B2 (en) | 2001-07-13 | 2008-08-12 | Seiko Epson Corporation | Color filter substrate and electro-optical device, manufacturing method for color filter substrate and manufacturing method for electro-optical device, and electronic equipment |
JP4618274B2 (en) * | 2001-07-13 | 2011-01-26 | セイコーエプソン株式会社 | Color filter substrate for liquid crystal display panel, liquid crystal display device, and electronic device |
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