JPH11279260A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH11279260A
JPH11279260A JP9852398A JP9852398A JPH11279260A JP H11279260 A JPH11279260 A JP H11279260A JP 9852398 A JP9852398 A JP 9852398A JP 9852398 A JP9852398 A JP 9852398A JP H11279260 A JPH11279260 A JP H11279260A
Authority
JP
Japan
Prior art keywords
epoxy resin
component
parts
weight
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9852398A
Other languages
Japanese (ja)
Other versions
JP3809273B2 (en
Inventor
Masao Gunji
雅男 軍司
Chiaki Asano
千明 浅野
Hiroshi Sato
洋 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tohto Kasei Co Ltd
Original Assignee
Tohto Kasei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohto Kasei Co Ltd filed Critical Tohto Kasei Co Ltd
Priority to JP9852398A priority Critical patent/JP3809273B2/en
Publication of JPH11279260A publication Critical patent/JPH11279260A/en
Application granted granted Critical
Publication of JP3809273B2 publication Critical patent/JP3809273B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Adhesives Or Adhesive Processes (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Adhesive Tapes (AREA)
  • Epoxy Resins (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an epoxy resin composition with high heat resistance and storage stability, enabling the cost reduction and extreme thinning of multilayer printed boards, by compounding a phenoxy resin of a specific structure, an epoxy resin and a curing agent. SOLUTION: This epoxy resin composition comprises (A) a phenoxy resin of formula I [X is a group of formula II or formula III (R<1> and R<2> are each H, a 1-5C alkyl or the like; Y is SO, O or the like; (m) is 0 or 1), where the case that X is a group of formula III accounts for >=8% of the total X; (n) is >=21] with a molecular weight of 10,000-200,000, (B) an epoxy resin, and (C) a curing agent, wherein the component A accounts for 5-95 wt.% of the components A and B. The component A is prepared by direct reaction between a dihydric phenol such as bisphenol A and epichlorohydrin. The component B is pref. an aromatic epoxy resin with an epoxy equivalent of 150-2,000 g/eq. Furthermore, it is preferable to set that the respective halogen contents of the components A and B sum to 5-40 wt.%.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、内層回路への埋め込み
性に優れ、回路基板との接着性及びラミネート後の外層
回路の平滑性に優れ、かつガラスクロスをほとんど用い
ず板厚を極薄にでき、さらに耐熱性と貯蔵安定性にすぐ
れた多層プリント配線板用エポキシ樹脂組成物に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is excellent in embedding in an inner layer circuit, excellent in adhesion to a circuit board, and excellent in smoothness of an outer layer circuit after lamination, and has an extremely thin plate thickness with almost no glass cloth. The present invention relates to an epoxy resin composition for a multilayer printed wiring board which is excellent in heat resistance and storage stability.

【0002】[0002]

【従来の技術】これまで、多層プリント配線板は、回路
形成された内層回路基板上にガラスクロスまたはガラス
不織布にエポキシ樹脂を含浸させた後、Bステージ化し
たプリプレグシートを重ね、さらにその上に銅箔を重ね
加圧加熱一体成型を行うという製造方法が主として採用
されている。しかし、この方法では、通常、まずガラス
クロスまたはガラス不織布にエポキシ樹脂を含浸させB
ステージ化してプリプレグを作成するが、これに必要な
設備は高価であり、プリプレグの生産性が悪いという欠
点を有している。さらに多層化する為に銅箔を重ねて加
圧加熱一体成形する諸設備も必要であり、最終製品を得
るまでに相当の時間がかかり、プロセス経済性の観点か
ら問題がある。また、根本的な問題として、ガラスクロ
スまたはガラス不織布を用いる為に、層間厚さを極薄化
するにはこれらの材料の形状・強度保持の観点からその
厚みに物理的限界があり、この限界厚さはかなりの大き
な値であることが指摘されている。本発明はこの物理的
限界値をいかに小さくするかに対応するものであり、プ
ロセス経済性の改善に貢献するものである。
2. Description of the Related Art Hitherto, a multilayer printed wiring board has been prepared by impregnating a glass cloth or a glass nonwoven fabric with an epoxy resin on an inner circuit board on which a circuit is formed, and then stacking a B-staged prepreg sheet, and further laying thereon. A manufacturing method of stacking copper foils and performing integral molding under pressure and heat is mainly employed. However, in this method, usually, first, a glass cloth or a glass nonwoven fabric is impregnated with an epoxy resin and B
The prepreg is prepared by making the prepreg into a stage, but the equipment required for the prepreg is expensive and has the disadvantage that the productivity of the prepreg is poor. Further, various facilities are required for stacking copper foils and integrally forming them under pressure and heat for multi-layering, and it takes a considerable amount of time to obtain a final product, which is problematic from the viewpoint of process economy. In addition, as a fundamental problem, there is a physical limit to the thickness of these materials from the viewpoint of maintaining the shape and strength of these materials in order to minimize the interlayer thickness because glass cloth or glass nonwoven fabric is used. It is pointed out that the thickness is a considerable value. The present invention addresses how to reduce this physical limit and contributes to improved process economy.

【0003】特開平7−202418号には、高分子エ
ポキシ樹脂を使用した接着剤付き銅箔についての記載が
あるが、該発明で製造された多層プリント配線板は、従
来技術で製造された多層プリント配線板に比較し、耐熱
性が劣るという欠点があった。本発明では、この耐熱性
の改善にも貢献するものである。
Japanese Patent Application Laid-Open No. 7-202418 describes a copper foil with an adhesive using a high-molecular epoxy resin, and the multilayer printed wiring board manufactured by the invention is a multilayer printed wiring board manufactured by a conventional technique. There is a drawback that heat resistance is inferior to printed wiring boards. The present invention contributes to the improvement of the heat resistance.

【0004】[0004]

【発明が解決しようとする課題】本発明は、従来の技術
ではなし得なかった、多層プリント配線板の低コスト
化、および極薄化が可能で、高耐熱性でかつ貯蔵安定性
のあるエポキシ樹脂組成物を提供することを目的とす
る。
DISCLOSURE OF THE INVENTION The present invention relates to an epoxy resin which can be reduced in cost and ultra-thin, and has high heat resistance and storage stability, which could not be achieved by the prior art. An object is to provide a resin composition.

【0005】[0005]

【課題を解決する為の手段】本発明は、従来技術の問題
を解決する手段を提供するものであり、式化1で表され
、 分子量が10,000〜200,000(ゲルパー
ミエーションクロマトグラフィー(GPC)で測定し
た、標準ポリスチレン換算重量平均分子量である。以
下、分子量というのは、この測定法による重量平均分子
量をいう)のフェノキシ樹脂である(A)成分、エポキ
シ当量100g/eqから4,500g/eqの芳香族
系エポキシ樹脂である(B)成分及び硬化剤である
(C)成分から構成される組成物であって、(A)成分
の割合が(A)成分と(B)成分の総重量に対して5重
量%から95重量%である、熱硬化型絶縁層形成能を有
するエポキシ樹脂組成物であり、(B)成分のエポキシ
樹脂が100g/eqから4,500g/eqのエポキ
シ当量範囲の芳香族系エポキシ樹脂であり、(A)成分
中のハロゲン含有量と(B)成分中のハロゲン含有量の
合計が、(A)成分と(B)成分の総重量に対して5重
量%から40重量%であることを特徴とする、エポキシ
樹脂組成物であり、そして、上記エポキシ樹脂組成物を
銅箔に塗布してなることを特徴とする、プリント配線板
用接着剤付き銅箔である。この接着剤付き銅箔は、内層
回路基板にラミネート後熱硬化させることにより、極薄
で耐熱性のある多層プリント配線板とすることができ
る。
SUMMARY OF THE INVENTION The present invention provides a means for solving the problems of the prior art, which is represented by Formula 1 and has a molecular weight of 10,000 to 200,000 (gel permeation chromatography). (A weight average molecular weight in terms of standard polystyrene, measured by (GPC). Hereinafter, the molecular weight refers to the weight average molecular weight by this measurement method.) The component (A) is a phenoxy resin having an epoxy equivalent of 100 g / eq to 4 g. , 500 g / eq, comprising a component (B) which is an aromatic epoxy resin and a component (C) which is a curing agent, wherein the proportion of the component (A) is An epoxy resin composition having a thermosetting insulating layer-forming ability of 5% by weight to 95% by weight based on the total weight of the components, wherein the epoxy resin of the component (B) is from 100 g / eq. , An aromatic epoxy resin having an epoxy equivalent range of 500 g / eq, wherein the total of the halogen content in the component (A) and the halogen content in the component (B) is the same as that of the component (A) and the component (B). An epoxy resin composition characterized by being from 5% by weight to 40% by weight with respect to the total weight, and printed wiring characterized by applying the epoxy resin composition to a copper foil. It is a copper foil with a plate adhesive. This adhesive-coated copper foil is laminated on an inner circuit board and then thermally cured to form an extremely thin and heat-resistant multilayer printed wiring board.

【0006】[0006]

【化1】Embedded image

【0007】式中、Xは式化2及び式化3で表される化
合物であり、Xが式化3である割合は全Xの8%以上で
あり、nは少なくとも21以上の値である。
In the formula, X is a compound represented by Formula 2 and Formula 3, wherein the proportion of X is Formula 3 is 8% or more of the total X, and n is a value of at least 21 or more. .

【0008】[0008]

【化2】Embedded image

【0009】式中、R1、R2は水素原子、炭素数1〜5
のアルキル基、ハロゲン原子から選ばれるものであり、
Yは−SO2−、−CH2−、−C(CH32−、または
−O−のいずれかであり、mは0または1の値である。
1、R2は同一であっても良いし、異なっていても良
い。
In the formula, R 1 and R 2 each represent a hydrogen atom, having 1 to 5 carbon atoms.
Are selected from alkyl groups and halogen atoms of
Y is any of —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —O—, and m is 0 or 1.
R 1 and R 2 may be the same or different.

【0010】[0010]

【化3】Embedded image

【0011】本発明におけるエポキシ樹脂組成物は、当
然のことながら、従来技術で作製されるガラスエポキシ
回路基板と少なくとも同等の耐熱性、難燃性、電気絶縁
性等の様々な特性を満足し、且つ、銅箔に塗布した場合
は、溶剤揮発後の銅箔カールや、裁断時の粉落ちがしな
いものであり、内層回路基板にラミネートした場合、内
層回路埋め込み性を有するものである。
The epoxy resin composition of the present invention, of course, satisfies various properties such as heat resistance, flame retardancy, and electrical insulation at least equivalent to those of a glass epoxy circuit board produced by a conventional technique. In addition, when applied to a copper foil, the copper foil does not curl after solvent volatilization and does not fall off during cutting, and when laminated on an inner circuit board, it has an inner layer circuit embedding property.

【0012】(A)成分の分子量が10,000未満で
は、そのエポキシ樹脂組成物を銅箔に塗布し乾燥した後
の接着剤付き銅箔が、銅箔カールや裁断時の粉落ち等を
起こし不良品となる。また分子量が200,000を超
えると、溶剤で希釈溶解しても、一般に工業的に利用さ
れている40重量%から70重量%の濃度では、溶液粘
度が高過ぎ、銅箔に塗布することが困難である。銅箔に
塗布可能な溶液粘度にするために好ましくない溶剤を多
量に加えなければならず、不経済であり、環境に対して
もVOC(揮発性有機化合物)を可能なかぎり低減する
方向にある現状では好ましいとは言い難い。こうしたこ
とから、(A)成分の分子量は好ましくは11,000
〜100,000、より好ましくは、15,000〜6
5,000である。
When the molecular weight of the component (A) is less than 10,000, the copper foil with the adhesive after the epoxy resin composition is applied to the copper foil and dried, causes curling of the copper foil and powder dropping during cutting. It becomes defective. When the molecular weight exceeds 200,000, the solution viscosity is too high at a concentration of 40% by weight to 70% by weight, which is generally used industrially, and even when diluted and dissolved with a solvent, the solution may be applied to a copper foil. Have difficulty. A large amount of an undesired solvent must be added in order to obtain a solution viscosity that can be applied to a copper foil, which is uneconomical and tends to reduce VOCs (volatile organic compounds) to the environment as much as possible. At present it is hard to say that it is preferable. Therefore, the molecular weight of the component (A) is preferably 11,000.
~ 100,000, more preferably 15,000 ~ 6
5,000.

【0013】次に、(A)成分と(B)成分の総量に占
めるハロゲン含有量の適用濃度範囲について言及する。
ハロゲンは、(A)成分のフェノキシ樹脂と(B)成分
のエポキシ樹脂の少なくともどちらか一方に含有されて
いれば良いが、(A)成分と(B)成分のハロゲン含有
量が5重量%未満では、本発明のエポキシ樹脂組成物に
おいて十分な難燃性を付与できない。また、5重量%以
上では、どの濃度でも難燃性が付与可能となるが、40
重量%以上の濃度にしても難燃性の向上は認められない
ことから、ハロゲン含有量を5重量%から40重量%の
範囲に制御するのが実用的である。本発明において、ハ
ロゲン元素の種類はいずれのものでも良いが、商業生産
の観点からすると、市販されている臭素化物、塩素化
物、フッ素化物を利用するのが良い。
Next, the applicable concentration range of the halogen content in the total amount of the components (A) and (B) will be described.
The halogen may be contained in at least one of the phenoxy resin of the component (A) and the epoxy resin of the component (B), but the halogen content of the components (A) and (B) is less than 5% by weight. Then, sufficient flame retardancy cannot be imparted to the epoxy resin composition of the present invention. At 5% by weight or more, flame retardancy can be imparted at any concentration.
Since no improvement in flame retardancy is observed even at a concentration of more than 5% by weight, it is practical to control the halogen content in the range of 5% by weight to 40% by weight. In the present invention, any kind of halogen element may be used, but from the viewpoint of commercial production, commercially available bromide, chlorinated and fluorinated compounds are preferably used.

【0014】(A)成分のフェノキシ樹脂の製法は、二
価フェノールとエピクロルヒドリンの直接反応による方
法、二価フェノールのジグリシジルエーテルと二価フェ
ノールの付加重合反応による方法が知られているが、本
発明に用いられるフェノキシ樹脂はいずれの製法による
ものであっても良い。
As the method for producing the phenoxy resin as the component (A), a method by a direct reaction of dihydric phenol with epichlorohydrin and a method by an addition polymerization reaction of diglycidyl ether of dihydric phenol with dihydric phenol are known. The phenoxy resin used in the present invention may be based on any production method.

【0015】二価フェノールとエピクロルヒドリンの直
接反応の場合は、二価フェノールとして、9,9’−ビ
ス(4−ヒドロキシフェニル)フルオレン及び式化4で
表される、例えば、ビスフェノールA、ビスフェノール
F、臭素化ビスフェノールA、塩素化ビスフェノール
A、フッ素化ビスフェノールA等が挙げられるが、特に
これらに限定されるものではない。単独で使用されても
良いし、2種類以上を併用しても良い。この際、9,
9’−ビス(4−ヒドロキシフェニル)フルオレンは、
使用する全二価フェノールの8モル%以上含まれること
が必要である。8モル%未満では、フルオレン骨格導入
の効果が十分でなく、耐熱性のある硬化膜が得られない
ことがある。
In the case of a direct reaction between a dihydric phenol and epichlorohydrin, the dihydric phenol is 9,9'-bis (4-hydroxyphenyl) fluorene and represented by Formula 4, for example, bisphenol A, bisphenol F, Examples include brominated bisphenol A, chlorinated bisphenol A, and fluorinated bisphenol A, but are not particularly limited thereto. They may be used alone or in combination of two or more. At this time,
9′-bis (4-hydroxyphenyl) fluorene is
It must be contained in an amount of at least 8 mol% of all dihydric phenols used. If the amount is less than 8 mol%, the effect of introducing the fluorene skeleton is not sufficient, and a cured film having heat resistance may not be obtained.

【0016】[0016]

【化4】 Embedded image

【0017】式中、R1、R2は、水素原子、炭素数1〜
5のアルキル基、ハロゲン原子から選ばれるものであ
り、Yは−SO2−、−CH2−、−C(CH32−、ま
たは−O−のいずれかであり、mは0または1の値であ
る。R1、R2は同一であっても良いし、異なっていても
良い。
In the formula, R 1 and R 2 represent a hydrogen atom, a carbon number of 1 to
5 alkyl groups, those selected from halogen atoms, Y is -SO 2 -, - CH 2 - , - C (CH 3) 2 -, or -O- is either, m is 0 or 1 Is the value of R 1 and R 2 may be the same or different.

【0018】二価フェノールのジグリシジルエーテルと
二価フェノールの付加重合反応による方法の場合、式化
5で表される二価フェノールのジグリシジルエーテル及
び/または式化6で表される二価フェノールのジグリシ
ジルエーテルをアミン系、イミダゾール系、トリフェニ
ルフォスフィン、フォスフォニウム塩系等公知の触媒存
在下に、9,9’−ビス(4−ヒドロキシフェニル)フ
ルオレン及び/または式化4で表される二価フェノール
と、0.9:1〜1:1、好ましくは0.92:1〜
0.99:1、最も好ましくは0.95:1〜0.9
8:1のフェノール性ヒドロキシル:エポキシ比を与え
る量で反応させることにより製造される。この際、9,
9’−ビス(4−ヒドロキシフェニル)フルオレン及び
式化6で表される二価フェノールのジグリシジルエーテ
ルの全モル%は、使用する二価フェノール及び二価フェ
ノールのジグリシジルエーテルの8モル%以上であるこ
とが必要である。8モル%未満ではフルオレン骨格導入
の効果が十分でなく、耐熱性のある硬化膜が得られず好
ましくない。
In the case of a method based on an addition polymerization reaction of diglycidyl ether of dihydric phenol and dihydric phenol, diglycidyl ether of dihydric phenol represented by formula (5) and / or dihydric phenol represented by formula (6) The diglycidyl ether of the formula (1) is represented by 9,9′-bis (4-hydroxyphenyl) fluorene and / or formula 4 in the presence of a known catalyst such as an amine, imidazole, triphenylphosphine, and phosphonium salt. With the dihydric phenol used, 0.9: 1 to 1: 1, preferably 0.92: 1 to
0.99: 1, most preferably 0.95: 1 to 0.9
It is prepared by reacting in an amount to give a phenolic hydroxyl: epoxy ratio of 8: 1. At this time,
The total mol% of 9'-bis (4-hydroxyphenyl) fluorene and the diglycidyl ether of the dihydric phenol represented by Formula 6 is at least 8 mol% of the dihydric phenol used and the diglycidyl ether of the dihydric phenol. It is necessary to be. If it is less than 8 mol%, the effect of introducing a fluorene skeleton is not sufficient, and a cured film having heat resistance cannot be obtained, which is not preferable.

【0019】[0019]

【化5】 Embedded image

【0020】式中、R1、R2は、水素原子、炭素数1〜
5のアルキル基、またはハロゲン原子のいずれかであ
り、Yは−SO2−、−CH2−、−C(CH32−、ま
たは−O−のいずれかであり、mは0または1の値であ
り、lは0より大きい値である。R1、R2は同一であっ
ても良いし、異なっていても良い。
In the formula, R 1 and R 2 represent a hydrogen atom and a carbon number of 1 to
5 alkyl group or is any of halogen atom,, Y is -SO 2 -, - CH 2 - , - C (CH 3) 2 -, or -O- is either, m is 0 or 1 And l is a value greater than 0. R 1 and R 2 may be the same or different.

【0021】[0021]

【化6】 Embedded image

【0022】式中lは、0より大きい値である。Where l is a value greater than 0.

【0023】この様にして合成されたフェノキシ樹脂
((A)成分)は、耐熱性、可撓性、難燃性のある物質
であるが、それのみでは成型時の樹脂流れが小さく、回
路埋め込み性がやや不足する場合が多い。従って、回路
埋め込み性を持たす為に、さらに他のエポキシ樹脂を加
えて加熱硬化させることが必要である。
The phenoxy resin (component (A)) synthesized in this manner is a substance having heat resistance, flexibility and flame retardancy, but the resin alone during molding is small, and the circuit is embedded. In many cases, the sex is slightly insufficient. Therefore, it is necessary to add another epoxy resin and heat and cure it in order to have circuit embedding properties.

【0024】次に、エポキシ樹脂組成物の(A)成分と
(B)成分の配合比率について言及する。(A)成分と
(B)成分の総量中の(A)成分の割合が95重量%を
超える場合は、内層回路基板にラミネートした時の内層
回路埋め込み性が得られず好ましくない。また、一般に
工業的に利用されている40重量%〜70重量%の濃度
では、溶液粘度が高過ぎ、銅箔に塗布することが困難と
なる。銅箔に塗布可能な溶液粘度にするために好ましく
ない溶剤を多量に加えなければならず、不経済であり、
環境に対してもVOC(揮発性有機化合物)を可能なか
ぎり低減する方向にある現状では好ましいとは言い難
い。また5重量%未満の場合は、硬化した時の耐熱性が
不足し、且つ、接着剤付き銅箔の塗膜性能が悪化し、銅
箔カールや裁断時の粉落ちなどの現象を認められるよう
になる。こうしたことから、エポキシ樹脂組成物の
(A)と(B)成分の総量中の(A)成分の割合は、好
ましくは10重量%〜91重量%、より好ましくは40
重量%〜80重量%である。
Next, the mixing ratio of the components (A) and (B) of the epoxy resin composition will be described. When the proportion of the component (A) in the total amount of the components (A) and (B) exceeds 95% by weight, the inner layer circuit embedding property when laminated on the inner layer circuit board is not obtained, which is not preferable. At a concentration of 40% by weight to 70% by weight, which is generally used industrially, the solution viscosity is too high, and it is difficult to apply the solution to a copper foil. In order to obtain a solution viscosity that can be applied to copper foil, a large amount of an undesirable solvent must be added, which is uneconomical.
At present, it is difficult to say that it is preferable to the environment in which VOCs (volatile organic compounds) are reduced as much as possible. When the content is less than 5% by weight, heat resistance when cured is insufficient, and the coating performance of the copper foil with an adhesive is deteriorated, and phenomena such as copper foil curl and powder dropping during cutting are observed. become. Therefore, the proportion of the component (A) in the total amount of the components (A) and (B) in the epoxy resin composition is preferably from 10% by weight to 91% by weight, more preferably 40% by weight.
% To 80% by weight.

【0025】(B)成分であるエポキシ樹脂としては、
硬化後の可撓性、耐熱性等の物性を落とさず回路埋め込
み性を持たすために、芳香族系で且つエポキシ当量が1
00g/eqから4,500g/eqのものが良い。エ
ポキシ当量が4,500g/eqを超えると、十分な回
路埋め込み性を得られず、且つ、架橋密度が低くなり望
ましい耐熱性のある硬化膜が得られず好ましくない。ま
た、脂肪族系のエポキシ樹脂では、回路埋め込み性は得
られても耐熱性が低い。また、エポキシ当量が100g
/eq未満では硬化物の架橋密度が密となり、固くて脆
いものとなり、可撓性が無くなってしまう。このような
ことから、(B)成分のエポキシ当量は好ましくは、1
30g/eq〜3,000g/eq、より好ましくは1
50g/eq〜2,000g/eqである。本発明組成
物に適したエポキシ樹脂として、ビスフェノールA型エ
ポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフ
ェノールAとビスフェノールFとの共縮合型エポキシ樹
脂、ノボラック型エポキシ樹脂、ビフェニル型エポキシ
樹脂、ジシクロペンタジエン−フェノール系共縮合型エ
ポキシ樹脂、及びそれらのハロゲン置換体等が挙げられ
るが、特にこれらに限定されるわけではない。これらエ
ポキシ樹脂は単独で使用しても良いし、2種類以上を併
用しても良い。
The epoxy resin as the component (B) includes:
In order to have circuit embedding properties without deteriorating physical properties such as flexibility and heat resistance after curing, it is aromatic and has an epoxy equivalent of 1
It is preferably from 00 g / eq to 4,500 g / eq. If the epoxy equivalent exceeds 4,500 g / eq, sufficient circuit embedding properties cannot be obtained, and the crosslink density becomes low, so that a cured film having desirable heat resistance cannot be obtained. In addition, aliphatic epoxy resins have low heat resistance even though circuit embedding properties can be obtained. The epoxy equivalent is 100 g
If it is less than / eq, the crosslinked density of the cured product will be high, it will be hard and brittle, and the flexibility will be lost. For this reason, the epoxy equivalent of the component (B) is preferably 1
30 g / eq to 3,000 g / eq, more preferably 1 g / eq
It is 50 g / eq to 2,000 g / eq. Examples of epoxy resins suitable for the composition of the present invention include bisphenol A type epoxy resin, bisphenol F type epoxy resin, co-condensation type epoxy resin of bisphenol A and bisphenol F, novolak type epoxy resin, biphenyl type epoxy resin, dicyclopentadiene- Examples include phenolic co-condensation type epoxy resins and their halogen-substituted products, but are not particularly limited thereto. These epoxy resins may be used alone or in combination of two or more.

【0026】(C)成分の硬化剤として種々の物が使用
できる。例えば、ジシアンジアミド及びその誘導体、2
−メチルイミダゾール、2−エチル−4−メチルイミダ
ゾール等のイミダゾール類及びその誘導体、ビスフェノ
ールA、ビスフェノールF、臭素化ビスフェノールA、
ナフタレンジオール、ジヒドロキシビフェニル等の2価
のフェノール化合物、フェノール、クレゾール、ビスフ
ェノールA、ナフトール、ナフタレンジオール等フェノ
ール類とホルムアルデヒド等のアルデヒド類やケトン類
との縮合反応により得られるノボラック型フェノール樹
脂、フェノール、クレゾール、ビスフェノールA、ナフ
トール、ナフタレンジオール等フェノール類とキシリレ
ングリコールとの縮合反応等により得られるアラルキル
型フェノール樹脂等のフェノール系化合物類、無水フタ
ル酸、無水トリメリット酸、無水ピロメリット酸、無水
マレイン酸、ヘキサヒドロ無水フタル酸等酸無水物系化
合物類、ジアミノジフェニルメタン、トリエチレンテト
ラミン、イソホロンジアミン、ダイマー酸等の酸類とポ
リアミン類との縮合反応等により得られるポリアミドア
ミン等のアミン系化合物類、アジピン酸ジヒドラジド、
イソフタル酸ジヒドラジド等のヒドラジド類等通常使用
されるエポキシ樹脂用硬化剤等が、挙げられるが、特に
これらに限定されるわけではない。これらの硬化剤は単
独で使用しても良いし、2種類以上を併用しても良い。
Various substances can be used as the curing agent of the component (C). For example, dicyandiamide and its derivatives, 2
Imidazoles such as -methylimidazole, 2-ethyl-4-methylimidazole and derivatives thereof, bisphenol A, bisphenol F, brominated bisphenol A,
Naphthalene diols, dihydric phenol compounds such as dihydroxybiphenyl, phenol, cresol, bisphenol A, naphthol, novolak type phenol resin obtained by condensation reaction of phenols such as naphthalene diol and aldehydes and ketones such as formaldehyde, phenol, Cresol, bisphenol A, phenolic compounds such as aralkyl-type phenolic resin obtained by condensation reaction of phenols such as naphthol and naphthalene diol with xylylene glycol, phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, anhydride Acid anhydrides such as maleic acid, hexahydrophthalic anhydride, diaminodiphenylmethane, triethylenetetramine, isophoronediamine, dimer acid and other acids and polyamines Amine compounds such polyamide amine obtained by the reaction or the like, adipic acid dihydrazide,
Examples of a commonly used curing agent for an epoxy resin, such as hydrazides such as isophthalic acid dihydrazide, include, but are not particularly limited to, these. These curing agents may be used alone or in combination of two or more.

【0027】本発明に於けるエポキシ樹脂組成物には、
銅箔に塗布するときに適度の粘性を保つために溶剤を用
いても良い。粘度調整用の溶剤としては、100℃〜1
60℃で溶剤を乾燥する時にエポキシ樹脂組成物中に残
存しないものであり、具体的には、トルエン、キシレ
ン、メチルエチルケトン、メチルイソブチルケトン、ジ
オキサン、エタノール、イソプロピルアルコール、メチ
ルセロソルブ、エチルセロソルブ、シクロヘキサノン等
が挙げられるが、特にこれらに限定されるわけではな
い。これらの溶剤は単独で使用しても良いし、2種類以
上を併用しても良い。
The epoxy resin composition according to the present invention includes:
A solvent may be used in order to maintain an appropriate viscosity when applying to a copper foil. As the solvent for adjusting the viscosity, 100 ° C. to 1
It does not remain in the epoxy resin composition when the solvent is dried at 60 ° C., and specifically, toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, dioxane, ethanol, isopropyl alcohol, methyl cellosolve, ethyl cellosolve, cyclohexanone, etc. But are not particularly limited to these. These solvents may be used alone or in combination of two or more.

【0028】本発明のエポキシ樹脂組成物には、耐熱性
及び難燃性の付与、低線膨張率化等の為に、シリカ、炭
酸カルシウム、タルク、水酸化アルミニウム、アルミ
ナ、マイカ等を、また、接着力改善の為にエポキシシラ
ンカップリング剤や、ゴム成分等をエポキシ樹脂組成物
の硬化物物性を落とさない程度に加えても良い。
The epoxy resin composition of the present invention contains silica, calcium carbonate, talc, aluminum hydroxide, alumina, mica, etc. in order to impart heat resistance and flame retardancy and to reduce the coefficient of linear expansion. In order to improve the adhesive strength, an epoxy silane coupling agent or a rubber component may be added to such an extent that the physical properties of the cured epoxy resin composition are not deteriorated.

【0029】本発明のエポキシ樹脂組成物には、必要に
応じて硬化促進剤を用いても良い。例えば、アミン系、
イミダゾール系、トリフェニルフォスフィン、フォスフ
ォニウム塩系等公知の種々の硬化促進剤が使用できる
が、特にこれらに限定されるわけではない。硬化促進剤
を使用する場合は、エポキシ樹脂に対し0.01重量%
〜10重量%の範囲が好ましい。10重量%を超える
と、接着剤付き銅箔としての貯蔵安定性が悪化するとい
う問題であり、好ましくない。
The epoxy resin composition of the present invention may contain a curing accelerator if necessary. For example, amines,
Various known curing accelerators such as imidazole, triphenylphosphine, and phosphonium salt can be used, but are not particularly limited thereto. When using a curing accelerator, 0.01% by weight of epoxy resin
A range of from 10 to 10% by weight is preferred. If it exceeds 10% by weight, the storage stability of the copper foil with the adhesive is deteriorated, which is not preferable.

【0030】本発明のエポキシ樹脂組成物を前述した様
な溶剤で15,000cps以下望ましくは10,00
0cps以下の粘度に調整し、一定の硬化時間を持つよ
うに適量の硬化剤を加え、場合によっては硬化促進剤も
加えてワニス化し、銅箔に塗布し100℃〜160℃で
溶剤を揮発させ接着剤付き銅箔を得る。得られた接着剤
付き銅箔を、ドライラミネーター等により内層回路基板
にラミネートし加熱硬化させることにより、外層銅箔を
有する多層プリント配線板を作成することができる。
The epoxy resin composition of the present invention is dissolved in the above-mentioned solvent in a solvent of 15,000 cps or less, preferably 10,000 cps or less.
Adjust to a viscosity of 0 cps or less, add an appropriate amount of a curing agent so as to have a certain curing time, and optionally add a curing accelerator to form a varnish, apply it to copper foil, and volatilize the solvent at 100 ° C to 160 ° C. Obtain copper foil with adhesive. By laminating the obtained copper foil with adhesive on the inner layer circuit board with a dry laminator or the like and curing by heating, a multilayer printed wiring board having an outer layer copper foil can be produced.

【0031】[0031]

【発明の実施の形態】以下、発明の実施の形態に基づき
本発明を具体的に説明する。以下の合成例、実施例及び
比較例に於いて、「部」は「重量部」を示す。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be specifically described based on embodiments of the present invention. In the following Synthesis Examples, Examples and Comparative Examples, "parts" indicates "parts by weight".

【0032】[0032]

【合成例1】ビスフェノールA型エポキシ樹脂、具体的
にはYD−128(東都化成製、エポキシ当量186.
5g/eq)を56.9部、臭素化ビスフェノールA型
エポキシ樹脂、具体的にはYDB−400(東都化成
製、エポキシ当量398.4g/eq、軟化点70℃、
臭素含有量49.2%)を203.5部、9,9’−ビ
ス(4−ヒドロキシフェニル)フルオレン(アドケムコ
製、水酸基当量175.2g/eq)を140.2部、
シクロヘキサノンを171.7部、触媒として2エチル
4メチルイミダゾール(四国化成製、以下、2E4MZ
と略す)0.16部を、撹拌装置、温度計、冷却管、窒
素ガス導入装置を備えた4つ口のガラス製セパラブルフ
ラスコに仕込み、反応温度を145℃〜160℃に保ち
10時間撹拌した後、シクロヘキサノン68.7部、メ
チルエチルケトン360.5部を加えて、エポキシ当量
20,700g/eq、臭素含有量25.0%、固形分
濃度40.0%(以後NV.と略す)、溶液粘度2,6
00cps/25℃、重量平均分子量38,800のフ
ェノキシ樹脂のシクロヘキサノン・メチルエチルケトン
混合ワニスを991部得た。この樹脂を、合成樹脂ワニ
スIとした。
Synthesis Example 1 Bisphenol A type epoxy resin, specifically, YD-128 (manufactured by Toto Kasei, epoxy equivalent: 186.
56.9 parts of 5g / eq), a brominated bisphenol A type epoxy resin, specifically YDB-400 (manufactured by Toto Kasei, epoxy equivalent 398.4g / eq, softening point 70 ° C,
203.5 parts of bromine content (49.2%), 140.2 parts of 9,9′-bis (4-hydroxyphenyl) fluorene (manufactured by Adchemco, hydroxyl equivalent 175.2 g / eq),
171.7 parts of cyclohexanone, 2-ethyl 4-methylimidazole (Shikoku Chemicals, hereinafter 2E4MZ)
0.16 part) was charged into a four-necked glass separable flask equipped with a stirrer, thermometer, cooling tube, and nitrogen gas introducing device, and stirred for 10 hours while maintaining the reaction temperature at 145 ° C to 160 ° C. After that, 68.7 parts of cyclohexanone and 360.5 parts of methyl ethyl ketone were added, and the epoxy equivalent was 20,700 g / eq, the bromine content was 25.0%, the solid content concentration was 40.0% (hereinafter abbreviated as NV.), Viscosity 2,6
991 parts of a cyclohexanone / methyl ethyl ketone mixed varnish of a phenoxy resin having a weight average molecular weight of 38,800 at 00 cps / 25 ° C. was obtained. This resin was designated as synthetic resin varnish I.

【0033】[0033]

【合成例2】ビスフェノールA型エポキシ樹脂具体的に
はYD−128(前述)を226.3部、テトラブロム
ビスフェノールAを208.8部、ビスフェノールAを
14.4部、9,9’−ビス(4−ヒドロキシフェニ
ル)フルオレン(前述)を42.0部、メチルイソブチ
ルケトンを175.5部、触媒としてトリフェニルフォ
スフィン(北興化学製)0.29部を、撹拌装置、温度
計、冷却管、窒素ガス導入装置を備えた4つ口のガラス
製セパラブルフラスコに仕込み、反応温度を115℃〜
125℃に保ち10時間撹拌した後、メチルイソブチル
ケトン226.6部を加え、エポキシ当量6,058g
/eq、臭素含有量24.9%、NV.55.0%、溶
液粘度3,520cps/25℃、重量平均分子量1
7,800のフェノキシ樹脂のメチルイソブチルケトン
ワニスを885部得た。この樹脂を、合成樹脂ワニスI
Iとした。
Synthesis Example 2 Bisphenol A type epoxy resin Specifically, 226.3 parts of YD-128 (described above), 208.8 parts of tetrabromobisphenol A, 14.4 parts of bisphenol A, 9,9'-bis 42.0 parts of (4-hydroxyphenyl) fluorene (described above), 175.5 parts of methyl isobutyl ketone, 0.29 part of triphenylphosphine (manufactured by Hokuko Chemical) as a catalyst, a stirrer, a thermometer, and a cooling pipe , Into a four-necked glass separable flask equipped with a nitrogen gas introduction device, and set the reaction temperature to 115 ° C.
After stirring at 125 ° C. for 10 hours, 226.6 parts of methyl isobutyl ketone was added, and the epoxy equivalent was 6,058 g.
/ Eq, bromine content 24.9%, NV. 55.0%, solution viscosity 3,520 cps / 25 ° C., weight average molecular weight 1
885 parts of 7,800 phenoxy resin methyl isobutyl ketone varnish were obtained. This resin is converted into a synthetic resin varnish I
I.

【0034】[0034]

【合成例3】ビスフェノールA型エポキシ樹脂、具体的
にはYD−128(前述)を207.9部、9,9’−
ビス(4−ヒドロキシフェニル)フルオレン(前述)を
191.5部、シクロヘキサノンを239.6部、触媒
として2E4MZ(前述)0.16部を、撹拌装置、温
度計、冷却管、窒素ガス導入装置を備えた4つ口のガラ
ス製セパラブルフラスコに仕込み、反応温度を145℃
〜160℃に保ち8時間撹拌した後、メチルエチルケト
ンを359.5部を加えて、エポキシ当量13,516
g/eq、臭素含有量0%、NV.40.0%、溶液粘
度5,000cps/25℃、重量平均分子量29,5
00のフェノキシ樹脂のシクロヘキサノン・メチルエチ
ルケトン混合ワニスを988部得た。この樹脂を、合成
樹脂ワニスIIIとした。
Synthesis Example 3 Bisphenol A type epoxy resin, specifically 207.9 parts of YD-128 (described above), 9,9′-
191.5 parts of bis (4-hydroxyphenyl) fluorene (described above), 239.6 parts of cyclohexanone, 0.16 part of 2E4MZ (described above) as a catalyst, a stirrer, a thermometer, a cooling pipe, and a nitrogen gas introducing device were used. The reaction temperature was set to 145 ° C.
After stirring at 8 ° C. for 8 hours, 359.5 parts of methyl ethyl ketone was added, and the epoxy equivalent was 13,516 parts.
g / eq, bromine content 0%, NV. 40.0%, solution viscosity 5,000 cps / 25 ° C., weight average molecular weight 29.5
988 parts of a mixed varnish of cyclohexanone / methyl ethyl ketone of phenoxy resin No. 00 was obtained. This resin was used as synthetic resin varnish III.

【0035】[0035]

【実施例1】合成例1で得られた合成樹脂ワニスIを2
50.0部とエポキシ樹脂としてYD−128(前述)
10.00部、硬化剤としてジシアンジアミド(日本カ
ーバイト製、以後DICYと略す)0.56部、硬化促
進剤として2E4MZ(前述)0.1部、溶剤としてメ
チルセロソルブ、ジメチルホルムアミド、メチルエチル
ケトンを15.8部加え均一に撹拌混合し、エポキシ樹
脂組成物ワニスを得た。このワニスを厚さ35μmの銅
箔(三井金属鉱業製)のアンカー面に溶剤乾燥後の樹脂
厚みが60μmになるようにローラーコーターにて塗布
し、130℃〜150℃、5分〜15分間溶剤乾燥を行
って接着剤付き銅箔を得た。一方、模擬内層回路基板と
して、線間200μmピッチの銅黒化処理済みのガラス
エポキシ銅張両面板積層板を用いた。この模擬内層回路
基板の両面に前記の接着剤付き銅箔をドライラミネータ
ーでラミネートし、180℃、2時間加熱硬化させて、
外層絶縁層厚みが50μmの4層のプリント配線板を得
た。
EXAMPLE 1 The synthetic resin varnish I obtained in Synthesis Example 1 was
50.0 parts and YD-128 as epoxy resin (described above)
10.00 parts, 0.56 parts of dicyandiamide (manufactured by Nippon Carbide, hereinafter abbreviated as DICY) as a hardening agent, 0.1 part of 2E4MZ (described above) as a hardening accelerator, 15. Eight parts were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish. This varnish is applied to an anchor surface of a copper foil (manufactured by Mitsui Mining & Smelting) having a thickness of 35 μm using a roller coater so that the resin thickness after solvent drying is 60 μm, and the solvent is applied at 130 ° C. to 150 ° C. for 5 minutes to 15 minutes. Drying was performed to obtain a copper foil with an adhesive. On the other hand, a glass-epoxy-copper-clad double-sided laminated board having a copper blackening treatment with a pitch of 200 μm was used as a simulated inner-layer circuit board. The copper foil with the adhesive was laminated on both sides of this simulated inner layer circuit board with a dry laminator, and cured by heating at 180 ° C. for 2 hours.
A four-layer printed wiring board having an outer insulating layer thickness of 50 μm was obtained.

【0036】[0036]

【実施例2】合成例1で得られた合成樹脂ワニスIIを
250.0部とエポキシ樹脂としてYD−128(前
述)100.0部、硬化剤としてDICY(前述)5.
63部、硬化促進剤として2E4MZ(前述)0.3
部、溶剤としてメチルセロソルブ、ジメチルホルムアミ
ド、メチルエチルケトンを158.4部加え均一に撹拌
混合し、エポキシ樹脂組成物ワニスを得た以外は実施例
1と全く同様にプリント配線板を得た。
Example 2 250.0 parts of synthetic resin varnish II obtained in Synthesis Example 1, 100.0 parts of YD-128 (described above) as an epoxy resin, and DICY (described above) as a curing agent.
63 parts, 2E4MZ as curing accelerator (described above) 0.3
Parts, and 158.4 parts of methylcellosolve, dimethylformamide, and methylethylketone as solvents were added and uniformly stirred and mixed to obtain a printed wiring board in exactly the same manner as in Example 1 except that an epoxy resin composition varnish was obtained.

【0037】[0037]

【実施例3】合成例2で得られた合成樹脂ワニスIを2
50.0部とエポキシ樹脂としてYDB−400(前
述)100.0部及びYD−014(東都化成製、エポ
キシ当量954g/eq、軟化点98℃、ビスフェノー
ルA型エポキシ樹脂)800.0部、硬化剤としてDI
CY(前述)11.44部、硬化促進剤として2E4M
Z(前述)1.5部、溶剤としてメチルセロソルブ、ジ
メチルホルムアミド、メチルエチルケトンを1,36
8.1部加え均一に撹拌混合し、エポキシ樹脂組成物ワ
ニスを得た以外は実施例1と全く同様にプリント配線板
を得た。
Example 3 The synthetic resin varnish I obtained in Synthesis Example 2 was replaced with 2
50.0 parts, 100.0 parts of YDB-400 (described above) as an epoxy resin and 800.0 parts of YD-014 (manufactured by Toto Kasei, epoxy equivalent: 954 g / eq, softening point: 98 ° C., bisphenol A type epoxy resin), cured DI as an agent
11.44 parts of CY (described above), 2E4M as a curing accelerator
Z (as described above), 1.5 parts of methylcellosolve, dimethylformamide, and 1,36
A printed wiring board was obtained in exactly the same manner as in Example 1, except that 8.1 parts were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.

【0038】[0038]

【実施例4】合成例1で得られた合成樹脂ワニスIを2
50.0部とエポキシ樹脂としてYDCN−704(東
都化成製、エポキシ当量208g/eq、軟化点92
℃、オルソクレゾールノボラック型エポキシ樹脂)5
0.00部、硬化剤としてDICY(前述)2.50
部、硬化促進剤として2E4MZ(前述)0.2部、溶
剤としてメチルセロソルブ、ジメチルホルムアミド、メ
チルエチルケトンを78.8部加え均一に撹拌混合し、
エポキシ樹脂組成物ワニスを得た以外は実施例1と全く
同様にプリント配線板を得た。
Example 4 The synthetic resin varnish I obtained in Synthesis Example 1 was replaced with 2
50.0 parts and YDCN-704 as epoxy resin (manufactured by Toto Kasei, epoxy equivalent 208 g / eq, softening point 92
° C, ortho-cresol novolak epoxy resin) 5
0.005, DICY (described above) 2.50 as a curing agent
Parts, 2E4MZ (described above) as a curing accelerator, 0.2 part, and methylcellosolve, dimethylformamide, methylethylketone, 78.8 parts as a solvent, and uniformly stirred and mixed.
A printed wiring board was obtained in exactly the same manner as in Example 1 except that an epoxy resin composition varnish was obtained.

【0039】[0039]

【実施例5】合成例2で得られた合成樹脂ワニスIII
を181.8部とエポキシ樹脂としてYDCN−704
(前述)25.00部、硬化剤としてDICY(前述)
1.25部、硬化促進剤として2E4MZ(前述)0.
1部、溶剤としてメチルセロソルブ、ジメチルホルムア
ミド、メチルエチルケトンを26.3部加え均一に撹拌
混合し、エポキシ樹脂組成物ワニスを得た以外は実施例
1と全く同様にプリント配線板を得た。
Example 5 Synthetic resin varnish III obtained in Synthesis Example 2
181.8 parts and YDCN-704 as an epoxy resin
25.00 parts (as described above), DICY as a curing agent (as described above)
1.25 parts, 2E4MZ (described above) as a curing accelerator
A printed wiring board was obtained in exactly the same manner as in Example 1 except that 1 part of a solvent and 26.3 parts of methylcellosolve, dimethylformamide and methylethylketone as a solvent were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.

【0040】[0040]

【実施例6】合成例3で得られた合成樹脂ワニスIII
を250.0部とエポキシ樹脂としてYDB−400
(前述)25.00部、硬化剤としてDICY(前述)
0.66部、硬化促進剤として2E4MZ(前述)0.
1部、溶剤としてメチルセロソルブ、ジメチルホルムア
ミド、メチルエチルケトンを38.5部加え均一に撹拌
混合し、エポキシ樹脂組成物ワニスを得た以外は実施例
1と全く同様にプリント配線板を得た。
Example 6 Synthetic resin varnish III obtained in Synthesis Example 3
250.0 parts and YDB-400 as an epoxy resin.
25.00 parts (as described above), DICY as a curing agent (as described above)
0.66 parts, 2E4MZ (described above) as a curing accelerator
1 part, and 38.5 parts of methylcellosolve, dimethylformamide, and methylethylketone as solvents were added and uniformly stirred and mixed to obtain a printed wiring board in exactly the same manner as in Example 1 except that an epoxy resin composition varnish was obtained.

【0041】[0041]

【比較例1】合成例3で得られた合成樹脂ワニスIII
を250.0部とエポキシ樹脂としてYDB−400
(前述)10.00部、硬化剤としてDICY(前述)
0.26部、硬化促進剤として2E4MZ(前述)0.
1部、溶剤としてメチルセロソルブ、ジメチルホルムア
ミド、メチルエチルケトンを15.4部加え均一に撹拌
混合し、エポキシ樹脂組成物ワニスを得た以外は実施例
1と全く同様にプリント配線板を得た。
Comparative Example 1 Synthetic resin varnish III obtained in Synthesis Example 3
250.0 parts and YDB-400 as an epoxy resin.
(Described above) 10.00 parts, DICY as a curing agent (described above)
0.26 parts, 2E4MZ (described above) as a curing accelerator
1 part, and 15.4 parts of methylcellosolve, dimethylformamide, and methylethylketone as solvents were added and uniformly stirred and mixed to obtain a printed wiring board in exactly the same manner as in Example 1 except that an epoxy resin composition varnish was obtained.

【0042】[0042]

【比較例2】YPB−40AM40(東都化成製、エポ
キシ当量10,300g/eq、臭素含有量25.0
%、重量平均分子量30,300、シクロヘキサノン・
メチルエチルケトン混合ワニス、NV.40%、臭素化
フェノキシ樹脂)250.0部とエポキシ樹脂としてY
D−128(前述)40.00部、硬化剤としてDIC
Y(前述)2.25部、硬化促進剤として2E4MZ
(前述)0.2部、溶剤としてメチルセロソルブ、ジメ
チルホルムアミド、メチルエチルケトンを63.4部加
え均一に撹拌混合し、エポキシ樹脂組成物ワニスを得た
以外は実施例1と全く同様にプリント配線板を得た。
Comparative Example 2 YPB-40AM40 (manufactured by Toto Kasei, epoxy equivalent 10,300 g / eq, bromine content 25.0)
%, Weight average molecular weight 30,300, cyclohexanone
Methyl ethyl ketone mixed varnish, NV. (40%, brominated phenoxy resin) 250.0 parts and Y as epoxy resin
D-128 (described above) 40.00 parts, DIC as a curing agent
2.25 parts of Y (described above), 2E4MZ as a curing accelerator
A printed wiring board was prepared in exactly the same manner as in Example 1 except that 0.2 part of the above and 63.4 parts of methylcellosolve, dimethylformamide, and methylethylketone as solvents were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish. Obtained.

【0043】[0043]

【比較例3】合成例1で得られた合成樹脂ワニスIを2
50.0部とエポキシ樹脂としてYD−128(前述)
4.00部、硬化剤としてDICY(前述)0.23
部、硬化促進剤として2E4MZ(前述)0.1部、溶
剤としてメチルセロソルブ、ジメチルホルムアミド、メ
チルエチルケトンを6.3部加え均一に撹拌混合し、エ
ポキシ樹脂組成物ワニスを得た以外は実施例1と全く同
様にプリント配線板を得た。
Comparative Example 3 The synthetic resin varnish I obtained in Synthetic Example 1 was replaced with 2
50.0 parts and YD-128 as epoxy resin (described above)
4.00 parts, DICY (described above) 0.23 as a curing agent
Parts, 0.1 part of 2E4MZ (described above) as a curing accelerator, and 6.3 parts of methylcellosolve, dimethylformamide, and methylethylketone as solvents, and uniformly stirred and mixed to obtain an epoxy resin composition varnish. A printed wiring board was obtained in exactly the same manner.

【0044】[0044]

【比較例4】合成例1で得られた合成樹脂ワニスIを2
50.0部とエポキシ樹脂としてYD−020(東都化
成製、エポキシ当量4850g/eq、軟化点143
℃、ビスフェノールA型エポキシ樹脂)50.00部、
硬化剤としてDICY(前述)0.11部、硬化促進剤
として2E4MZ(前述)0.1部、溶剤としてメチル
セロソルブ、ジメチルホルムアミド、メチルエチルケト
ンを91.1部加え均一に撹拌混合し、エポキシ樹脂組
成物ワニスを得た以外は実施例1と全く同様にプリント
配線板を得た。
Comparative Example 4 The synthetic resin varnish I obtained in Synthetic Example 1 was replaced with 2
50.0 parts and YD-020 as an epoxy resin (manufactured by Toto Kasei, epoxy equivalent 4850 g / eq, softening point 143)
° C, bisphenol A type epoxy resin) 50.00 parts,
0.11 part of DICY (described above) as a curing agent, 0.1 part of 2E4MZ (described above) as a curing accelerator, and 91.1 parts of methylcellosolve, dimethylformamide, and methylethylketone as solvents, and uniformly stirred and mixed, and an epoxy resin composition was obtained. A printed wiring board was obtained in exactly the same manner as in Example 1 except that a varnish was obtained.

【0045】[0045]

【比較例5】合成例1で得られた合成樹脂ワニスIを2
50.0部とエポキシ樹脂としてYD−128(前述)
10.00部、硬化剤としてDICY(前述)0.56
部、硬化促進剤として2E4MZ(前述)0.1部、溶
剤としてメチルセルソルブ、ジメチルホルムアミド、メ
チルエチルケトンを181.0部を加え均一に撹拌混合
し、エポキシ樹脂組成物ワニスを得た。このワニスを厚
さ180μmのガラスクロス(日東紡績株式会社製)に
含浸させ、130〜150℃の温度で、5〜15分間溶
剤乾燥を行ってプリプレグを得た。一方、模擬内層回路
基板として、線間200μmピッチの銅黒化処理済みの
ガラスエポキシ銅張両面板積層板を用いた。この模擬内
層回路基板の両面に前記のプリプレグシート、銅箔(前
述)の順に重ねて、ドライラミネータでラミネートし、
180℃、2時間加熱硬化させて、外層絶縁層厚みが2
00μmの4層プリント配線板を得た。
Comparative Example 5 The synthetic resin varnish I obtained in Synthetic Example 1 was replaced with 2
50.0 parts and YD-128 as epoxy resin (described above)
10.00 parts, DICY (described above) 0.56 as a curing agent
Parts, 0.1 parts of 2E4MZ (described above) as a curing accelerator, and 181.0 parts of methylcellosolve, dimethylformamide, and methylethylketone as solvents were added and uniformly mixed with stirring to obtain an epoxy resin composition varnish. The varnish was impregnated into a glass cloth (manufactured by Nitto Boseki Co., Ltd.) having a thickness of 180 μm, and dried at a temperature of 130 to 150 ° C. for 5 to 15 minutes to obtain a prepreg. On the other hand, a glass-epoxy-copper-clad double-sided laminated board having a copper blackening treatment with a pitch of 200 μm was used as a simulated inner-layer circuit board. The prepreg sheet and the copper foil (described above) are stacked on both sides of the simulated inner layer circuit board in this order, and laminated with a dry laminator,
It is cured by heating at 180 ° C for 2 hours.
A 00 μm four-layer printed wiring board was obtained.

【0046】以上の様にして作成した多層プリント配線
板の特性値を表1に示した。尚、表1に於いて、
[(A)成分+(B)成分]中の(A)成分の割合は、
それぞれの固形分についての割合である。合成樹脂ワニ
スには溶剤が含まれるので、溶剤分を除いた固形分の割
合で示した値である。
Table 1 shows the characteristic values of the multilayer printed wiring board prepared as described above. In Table 1,
The ratio of the component (A) in [(A) component + (B) component] is as follows:
It is the ratio for each solid content. Since the synthetic resin varnish contains a solvent, the varnish is a value represented by a ratio of a solid content excluding a solvent component.

【0047】[0047]

【表1】 [Table 1]

【0048】(試験方法) ハンダ耐熱性試験:100℃、2時間煮沸後のサンプル
を、n=5で、260℃の半田浴に浸け、全て20秒以
上膨れや剥がれを生じなかったものを○とした。 回路
埋め込み性:外層銅箔を剥がした後の内層回路に、樹脂
が埋め込まれているものを○とした。 ガラス転移温度:接着剤付き銅箔をラミネートせずにそ
のまま加熱硬化させて、銅箔を剥がしたフィルムでTM
A測定を行った。比較例5の場合は、プリプレグシート
のまま加熱硬化させてTMAの測定を行った。
(Test Method) Solder heat resistance test: A sample after boiling at 100 ° C. for 2 hours was immersed in a solder bath at 260 ° C. at n = 5, and all samples which did not swell or peel for 20 seconds or more were evaluated as ○. And Circuit embedding property: The resin embedded in the inner layer circuit after the outer layer copper foil was peeled was evaluated as ○. Glass transition temperature: heat-cured without laminating copper foil with adhesive, and peeled copper foil for TM
A measurement was performed. In the case of Comparative Example 5, the prepreg sheet was cured by heating and TMA was measured.

【0049】比較例1に於いては、[(A)成分+
(B)成分]中の臭素含有量が4.4重量%と5重量%
よりも小さく、難燃性(UL−94)がV−1で、実施
例に比較し難燃性が充分でないことを示している。比較
例2に於いては、(A)成分中のフルオレン骨格含有率
がゼロで、ガラス転移点が115℃と低くなり、耐熱性
が低く半田耐熱性が悪くなっている。即ち、(A)成分
中のフルオレン骨格成分が、耐熱性、特に、半田耐熱性
に必要であることを示している。比較例3に於いては、
[(A)成分+(B)成分]中の(A)成分の割合が9
6.2重量%で95重量%を超えている。この場合は、
回路埋め込み性が悪くなっている。即ち、内層回路基板
にラミネートしたときの内層回路埋め込み性を確保する
には、[(A)成分+(B)成分]中の(A)成分の割
合をが95重量%を超えないようにする必要性があるこ
とを示している。比較例4に於いては、(B)成分とし
てエポキシ当量が4,850g/eqのものを使用して
いる。これは、エポキシ当量が4,500g/eqより
も高く、半田耐熱性、回路埋め込み性共に悪くなってい
る。(B)成分のエポキシ当量が4,500g/eqを
超えるものは、プリント配線板用樹脂としては適さない
ことを示している。また、比較例5に於いては、従来か
ら行われているガラスクロスを使用したものである。こ
の場合、得られたプリント配線板の厚みは200μmで
ある。これに対して、本発明で得られるプリント配線板
の厚みは、実施例1で示したように、50μm程度であ
って、本発明に於いては、プリント配線板の厚みを格段
に薄くするする事ができるのである。
In Comparative Example 1, [Component (A) +
(B) component] has a bromine content of 4.4% by weight and 5% by weight.
Smaller than that, and the flame retardancy (UL-94) is V-1, indicating that the flame retardancy is not sufficient as compared with the examples. In Comparative Example 2, the content of the fluorene skeleton in the component (A) was zero, the glass transition point was as low as 115 ° C., the heat resistance was low, and the solder heat resistance was poor. That is, it indicates that the fluorene skeleton component in the component (A) is necessary for heat resistance, particularly for solder heat resistance. In Comparative Example 3,
When the ratio of the component (A) in the component (component (A) + component (B)) is 9
It exceeds 95% by weight at 6.2% by weight. in this case,
The circuit embedding property is poor. That is, in order to ensure the embedding property of the inner layer circuit when laminated on the inner layer circuit board, the ratio of the component (A) in [(A) component + (B) component] should not exceed 95% by weight. Indicates that there is a need. In Comparative Example 4, the component (B) having an epoxy equivalent of 4,850 g / eq was used. This is because the epoxy equivalent is higher than 4,500 g / eq, and both the solder heat resistance and the circuit embedding property are poor. The epoxy equivalent of the component (B) exceeding 4,500 g / eq indicates that it is not suitable as a resin for printed wiring boards. In Comparative Example 5, a conventionally used glass cloth was used. In this case, the thickness of the obtained printed wiring board is 200 μm. On the other hand, the thickness of the printed wiring board obtained by the present invention is about 50 μm as shown in Embodiment 1, and in the present invention, the thickness of the printed wiring board is made much thinner. You can do things.

【0050】以上、実施例と比較例から明らかなように
本発明のエポキシ樹脂組成物を使用することにより、難
燃性を確保しながら、耐熱性、特に半田耐熱性に優れ、
内層回路基板にラミネートしたときの内層回路埋め込み
性に優れ、更に、プリント配線板の厚みを格段に薄くす
るする事ができるのである。
As is clear from the examples and comparative examples, the use of the epoxy resin composition of the present invention ensures excellent heat resistance, particularly solder heat resistance, while ensuring flame retardancy.
It is excellent in the embedding property of the inner layer circuit when laminated on the inner layer circuit board, and the thickness of the printed wiring board can be remarkably reduced.

【0051】[0051]

【発明の効果】本発明によるエポキシ樹脂組成物を用い
ると、ガラスクロスまたはガラス不織布を用いたプリプ
レグを作成せずに、単に接着剤付き銅箔をラミネートす
るだけで外層銅箔を有する耐熱性のある多層プリント配
線板を作成でき、製造工程の単純化が実現し、これに伴
ってプロセス経済性が改善される。更に、ガラスクロス
またはガラス不織布を用いない為、極薄でかつ軽量の多
層プリント配線板を作成することが可能となる。更に、
難燃性が付与される。
The use of the epoxy resin composition according to the present invention makes it possible to prepare a prepreg using a glass cloth or a glass non-woven fabric, and to laminate a copper foil with an adhesive simply by laminating a copper foil with an adhesive. Certain multilayer printed wiring boards can be made, which simplifies the manufacturing process and thus improves process economics. Further, since a glass cloth or a nonwoven fabric is not used, an extremely thin and lightweight multilayer printed wiring board can be produced. Furthermore,
Flame retardancy is provided.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】式化1で表され、分子量が10 ,000か
ら200,000のフェノキシ樹脂である(A)成分、
エポキシ樹脂である(B)成分、及び硬化剤である
(C)成分から構成される組成物であって、(A)成分
の割合が(A)成分と(B)成分の総重量に対して5重
量%から95重量%である、熱硬化型絶縁層形成能を有
するエポキシ樹脂組成物。 【化1】 式中、Xは式化2及び式化3で表される化合物であり、
Xが式化3である割合は全Xの8%以上であり、nは少
なくとも21以上の値である。 【化2】 式中、R1、R2は、水素原子、炭素数1〜5のアルキル
基、ハロゲン原子から選ばれるものであり、Yは−SO
2−、−CH2−、−C(CH32−、または−O−のい
ずれかであり、mは0または1の値である。 【化3】
A component (A) which is a phenoxy resin represented by Formula 1 and having a molecular weight of 10,000 to 200,000,
A composition comprising the component (B) which is an epoxy resin and the component (C) which is a curing agent, wherein the proportion of the component (A) is based on the total weight of the components (A) and (B). An epoxy resin composition having a thermosetting insulating layer forming ability of 5% by weight to 95% by weight. Embedded image In the formula, X is a compound represented by Formula 2 and Formula 3,
The proportion of X being Formula 3 is 8% or more of the total X, and n is a value of at least 21 or more. Embedded image In the formula, R 1 and R 2 are selected from a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a halogen atom, and Y is —SO
2 -, - CH 2 -, - C (CH 3) 2 -, or -O- is either, m is a value of 0 or 1. Embedded image
【請求項2】 (B)成分のエポキシ樹脂が100g/
eqから4,500g/eqのエポキシ当量範囲の芳香
族系エポキシ樹脂であり、(A)成分中のハロゲン含有
量と(B)成分中のハロゲン含有量の合計が、(A)成
分と(B)成分の総重量に対して5重量%から40重量
%であることを特徴とする、請求項1記載のエポキシ樹
脂組成物。
2. The amount of the epoxy resin (B) is 100 g /
It is an aromatic epoxy resin having an epoxy equivalent range of eq to 4,500 g / eq, wherein the sum of the halogen content in the component (A) and the halogen content in the component (B) is (A) and (B) 2. The epoxy resin composition according to claim 1, wherein the amount is from 5% by weight to 40% by weight based on the total weight of the component).
【請求項3】 請求項1または請求項2に記載のエポキ
シ樹脂組成物を銅箔に塗布してなることを特徴とする、
プリント配線板用接着剤付き銅箔。
3. An epoxy resin composition according to claim 1, which is applied to a copper foil.
Copper foil with adhesive for printed wiring boards.
JP9852398A 1998-03-25 1998-03-25 Epoxy resin composition Expired - Fee Related JP3809273B2 (en)

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JPH11279260A true JPH11279260A (en) 1999-10-12
JP3809273B2 JP3809273B2 (en) 2006-08-16

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ID=14222033

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Country Link
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EP1092739A1 (en) * 1999-10-13 2001-04-18 Ajinomoto Co., Inc. Epoxy resin composition and uses thereof
US6403221B1 (en) 1999-10-13 2002-06-11 Ajinomoto Co., Inc. Epoxy resin composition, and adhesive film and prepreg using the composition, and multilayer printed-wiring board using them, and process for manufacturing the same
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