JP2002003711A - Curable resin composition containing thermoplastic polyhydroxypolyether resin - Google Patents

Curable resin composition containing thermoplastic polyhydroxypolyether resin

Info

Publication number
JP2002003711A
JP2002003711A JP2000186285A JP2000186285A JP2002003711A JP 2002003711 A JP2002003711 A JP 2002003711A JP 2000186285 A JP2000186285 A JP 2000186285A JP 2000186285 A JP2000186285 A JP 2000186285A JP 2002003711 A JP2002003711 A JP 2002003711A
Authority
JP
Japan
Prior art keywords
formula
component
epoxy resin
weight
embedded image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000186285A
Other languages
Japanese (ja)
Other versions
JP4530187B2 (en
Inventor
Masao Gunji
雅男 軍司
Chiaki Asano
千明 浅野
Hiroshi Sato
洋 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tohto Kasei Co Ltd
Original Assignee
Tohto Kasei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohto Kasei Co Ltd filed Critical Tohto Kasei Co Ltd
Priority to JP2000186285A priority Critical patent/JP4530187B2/en
Publication of JP2002003711A publication Critical patent/JP2002003711A/en
Application granted granted Critical
Publication of JP4530187B2 publication Critical patent/JP4530187B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Polyethers (AREA)
  • Epoxy Resins (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Organic Insulating Materials (AREA)
  • Insulating Bodies (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a curable resin composition containing a thermoplastic polyhydroxypolyether resin having flame retardance, a copper foil with an adhesive for a printed wiring board, an insulating film, etc., formed from the composition. SOLUTION: This curable composition comprises a component (A) composed of a polyhydroxypolyether resin which is represented by general formula (1) (X is a phosphorus-containing aromatic group; Z is a hydrogen atom or a glycidyl group; n is a value of >=21), has 10,000 to 200,000 number-average molecular weight and has 1 wt.%-6 wt.% phosphorus content, a component (B) composed of an epoxy resin and a component (C) composed of a curing agent in the ratio of the component (A) to the components (A)+(B) of 5 wt.%-95 wt.% The copper foil with an adhesive for a printed wiring board, the insulating film and the resist material are formed from the curable resin composition.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電気用積層板、磁
気テープバインダー、絶縁ワニス等の電気・電子分野及
び接着剤、絶縁塗料、フィルム及びレジスト材等として
有用であり、特に多層プリント配線板用途に有用な、リ
ン原子を含有することによりハロゲン化物を使用しない
で難燃性を有す熱可塑性ポリヒドロキシポリエーテル樹
脂を含有する硬化性樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is useful in the electric and electronic fields, such as laminates for electrical use, magnetic tape binders, insulating varnishes, etc., and as adhesives, insulating paints, films and resist materials, and especially multilayer printed wiring boards The present invention relates to a curable resin composition containing a thermoplastic polyhydroxypolyether resin having flame retardancy without using a halide by containing a phosphorus atom, which is useful for applications.

【0002】[0002]

【従来技術】従来より熱可塑性ポリヒドロキシポリエー
テル樹脂は一般にフェノキシ樹脂として知られており、
可撓性、耐衝撃性、絶縁性、密着性、機械的性質等が優
れることから、電気・電子分野では、磁気テープバイン
ダー、モーター等の電気機械の絶縁ワニスや、回路基板
用の接着剤やフィルム等、広範囲の用途に使用されてお
り、なかでも火災の防止・遅延といった安全性を強く要
求される分野、例えば電気・電子部品ではハロゲン化さ
れたフェノキシ樹脂が使用されている。そのうち臭素化
されたものの使用例が多い。しかしながら、ハロゲン化
物を使用した材料は、高温で長期に渡って使用した場
合、ハロゲン化物の解離を起こし、ハロゲンおよびハロ
ゲン化水素を発生して配線の腐食を引き起こす事が知ら
れている。更に、使用済みの電子部品、電機機器からな
る廃棄物を燃焼する際には、熱分解・燃焼過程でハロゲ
ン・ハロゲン化物等の有害物質が発生することから、環
境安全性の観点からハロゲンの直接的、間接的利用が問
題視されるようになり、これに代わる材料による難燃性
の付与の研究がなされるようになって来ている。フェノ
キシ樹脂を使用した難燃性フィルムは、特開平5−93
041、特開平5−93042にその記述があり、接着
剤付き銅箔は、特開平11−279260にその記載が
されている。これらに使用されている難燃剤は、何れも
ハロゲン化物を基本材料としたものであり、リンを利用
した難燃化については何等記載されていない。本発明
は、ハロゲン化物を使用しないで新しい技術思想に基づ
いた難燃性の付与を提供するものである。
2. Description of the Related Art Conventionally, thermoplastic polyhydroxy polyether resins are generally known as phenoxy resins,
Because of its excellent flexibility, impact resistance, insulation, adhesion, and mechanical properties, in the electrical and electronic fields, magnetic tape binders, insulating varnishes for electric machines such as motors, adhesives for circuit boards, Halogenated phenoxy resins are used in a wide range of applications such as films, especially in fields requiring high safety such as fire prevention and delay, for example, in electric and electronic parts. Of these, brominated products are often used. However, it is known that when a material using a halide is used at a high temperature for a long period of time, the halide is dissociated, and halogen and hydrogen halide are generated to cause corrosion of the wiring. Furthermore, when combusting waste from used electronic components and electrical equipment, hazardous substances such as halogens and halides are generated during the pyrolysis and combustion processes. There has been a growing concern about direct and indirect use, and studies have been conducted on the use of alternative materials to impart flame retardancy. A flame-retardant film using a phenoxy resin is disclosed in JP-A-5-93.
041, JP-A-5-93042 and the copper foil with an adhesive is described in JP-A-11-279260. The flame retardants used in these are all based on halides, and there is no description of flame retardancy using phosphorus. The present invention provides the provision of flame retardancy based on a new technical concept without using a halide.

【0003】また、リン化合物を使用した難燃性化合物
としては、WANG C−S、SHIEH J−Y著
「Synthesis and properties
ofepoxy resins containin
g 2−(6−oxid−6H−dibenz <c,
e> <1,2>oxaphosphorin−6−y
l)1,4−benzenediol」Polymer
(GBR)VOL.39,NO,23,PAGE.58
19−5826 1998があるが、これはリン含有化
合物とベンゾキノンを付加反応させて得られる化合物
を、熱硬化性樹脂であるエポキシ樹脂の反応性難燃剤と
して用いるものであり、CHO C−S、CHEN L
−W、、CHIU Y−S著「Novel flame
retardant epoxy resins.
I.Synthesis、characterizat
ion,and properties of ary
l phosphinate epoxy ether
cured with diamine.」Poly
mer Bulletin VOL.41,NO.1,
PAGE.45−52 1998では、リン含有化合物
とベンゾキノン及びエピクロロヒドリンを用いた熱硬化
性樹脂としての新規エポキシ樹脂を得ているが、いづれ
も熱硬化性樹脂としてのエポキシ樹脂に難燃性を付与す
る反応性のリン含有難燃剤、および難燃性のリン含有エ
ポキシ樹脂を記載したものであり、熱可塑性ポリヒドロ
キシポリエーテル樹脂を含有する硬化性樹脂組成物を電
気・電子部品用に用いることや、難燃性絶縁性フィルム
として用いることについては記載されていない。
[0003] Examples of flame-retardant compounds using phosphorus compounds include those described in Synthesis and properties by WANG CS and SHIEH J-Y.
ofepoxy resins containingin
g 2- (6-oxid-6H-dibenz <c,
e><1,2> oxaphosphorin-6-y
l) 1,4-benzendiol "Polymer
(GBR) VOL. 39, NO, 23, PAGE. 58
No. 19-5826 1998, which uses a compound obtained by an addition reaction of a phosphorus-containing compound with benzoquinone as a reactive flame retardant for an epoxy resin which is a thermosetting resin, and includes CHO CS and CHEN. L
-W, CHIU Y-S, "Novel frame
retardant epoxy resins.
I. Synthesis, characterizat
ion, and properties of array
l phosphoepoxy epoxy ether
cured with diamine. "Poly
mer Bulletin VOL. 41, NO. 1,
PAGE. 45-52 1998, a novel epoxy resin is obtained as a thermosetting resin using a phosphorus-containing compound, benzoquinone and epichlorohydrin, but any of them imparts flame retardancy to the epoxy resin as a thermosetting resin. A reactive phosphorus-containing flame retardant, and a flame-retardant phosphorus-containing epoxy resin, wherein a curable resin composition containing a thermoplastic polyhydroxypolyether resin is used for electric / electronic parts, It does not disclose use as a flame-retardant insulating film.

【0004】また、従来の多層プリント配線板工業にお
いては回路形成された内層回路基板上に、ガラスクロス
またはガラス不織布にエポキシ樹脂を含浸させた後Bス
テージ化したプリプレグシートを重ね、さらにその上に
銅箔を重ね加圧加熱一体成型を行うという製造方法が主
として採用されている。しかし、この方法では通常、ま
ずガラスクロスまたはガラス不織布にエポキシ樹脂を含
浸させBステージ化してプリプレグを作成するが、これ
に必要な設備は高価であり、プリプレグの生産性が悪い
という問題点が指摘されており、さらに多層化する為に
銅箔を重ねて加圧加熱一体成形する諸設備も必要であ
り、最終製品を得るまでに相当の時間がかかり、プロセ
ス経済性の問題をかかえている。また、根本的な問題と
して、ガラスクロスまたはガラス不織布を用いる為に層
間厚さを極薄化するにはこれらの材料の形状・強度保持
の観点からその厚みに物理的限界があり、この限界厚さ
はかなりの大きな値であり、軽薄短小化する際の大きな
障害となっている。本発明はこの物理的限界値をいかに
小さくするかに対応するものであり、プロセス経済性の
改善に貢献するものである。
[0004] In the conventional multilayer printed wiring board industry, a prepreg sheet, which is obtained by impregnating glass cloth or nonwoven fabric with an epoxy resin and then B-staged, is overlaid on an inner-layer circuit board on which a circuit is formed, and further thereon. A manufacturing method of stacking copper foils and performing integral molding under pressure and heat is mainly employed. However, in this method, usually, first, a glass cloth or a glass nonwoven fabric is impregnated with an epoxy resin and B-staged to prepare a prepreg, but the equipment required for this is expensive, and the problem of poor prepreg productivity is pointed out. In order to further increase the number of layers, various facilities for stacking copper foils and integrally forming them under pressure and heat are required, and it takes a considerable amount of time to obtain a final product, which poses a problem of process economics. In addition, as a fundamental problem, there is a physical limit to the thickness of the interlayer from the viewpoint of maintaining the shape and strength of these materials in order to minimize the interlayer thickness due to the use of glass cloth or glass nonwoven fabric. This is a rather large value, which is a major obstacle to downsizing. The present invention addresses how to reduce this physical limit and contributes to improved process economy.

【0005】さらに、特開平7−202418には、高
分子エポキシ樹脂を使用した接着剤付き銅箔について記
載されているが、同発明で製造された多層プリント配線
板は従来技術で製造された多層プリント配線板に比べ、
耐熱性が劣るという欠点が見られる。本発明では、この
耐熱性の改善にも貢献するものである。
Further, Japanese Patent Application Laid-Open No. 7-202418 describes a copper foil with an adhesive using a high-molecular epoxy resin, but the multilayer printed wiring board manufactured according to the invention is a multilayer printed wiring board manufactured according to the prior art. Compared to printed wiring boards,
The disadvantage is that the heat resistance is poor. The present invention contributes to the improvement of the heat resistance.

【0006】[0006]

【発明が解決しようとする課題】本発明は従来の技術で
はなし得なかった、多層プリント配線板の低コスト化、
および極薄化が可能であり、高耐熱性かつ貯蔵安定性の
ある、ハロゲン化物を何等使用せずに、難燃性を有する
エポキシ樹脂組成物及び該エポキシ樹脂組成物を用いて
成形されるプリント配線板用接着剤付き銅箔、及び該エ
ポキシ樹脂組成物を用いて成形される絶縁性フィルム、
ソルダーレジストを始めとするレジスト材料等を提供す
ることを目的とするものである。
SUMMARY OF THE INVENTION The present invention provides a multi-layer printed wiring board with a low cost, which could not be achieved by the prior art.
And an epoxy resin composition which can be extremely thinned, has high heat resistance and storage stability, does not use any halide, has flame retardancy, and a print formed using the epoxy resin composition Copper foil with adhesive for wiring board, and an insulating film formed using the epoxy resin composition,
It is an object of the present invention to provide a resist material such as a solder resist.

【0007】[0007]

【課題を解決する為の手段及び作用】本発明は従来技術
の問題を解決する手段を提供するものであり、(A)成
分が下記一般式(1)で表され 、 平均分子量範囲が1
0,000〜200,000(ゲルパーミエーションク
ロマトグラフィー(GPC)にて、カラムとしてSho
dex AD−800P+TSKgel SuperHM
−H+SuperHM−H+SuperH2000を、
溶離液としてN,N−ジメチルホルムアミド(20mM
臭化リチウム含有品)を使用し、試料濃度0.5%で測
定した標準ポリエチレンオキサイド換算による重量平均
分子量である。以下、平均分子量というのはこの測定法
による重量平均分子量をいう)のフェノキシ樹脂であ
り、(B)成分がエポキシ当量100g/eqから4,
500g/eqのハロゲン置換基を持たない芳香族系エ
ポキシ樹脂および/またはリン原子を含有するエポキシ
樹脂であり、(C)成分が硬化剤から構成される組成物
であって、必要に応じて粘度調整のための有機溶剤と有
機、無機充填剤とを含有する熱硬化型絶縁層形成能を有
する硬化性樹脂組成物であり、(A)成分の割合が
(A)+(B)に対して5重量%から95重量%であ
り、(A)成分のリン含有量と(B)成分のリン含有量
の合計量が(A)+(B)総重量に対して1重量%から
5重量%である硬化性樹脂組成物、およびこの硬化性樹
脂組成物を銅箔に塗布してなるプリント配線板用接着剤
付き銅箔、およびこの硬化性樹脂組成物から成形された
絶縁性フィルムである。そしてこの接着剤付き銅箔、ま
たは絶縁性フィルムは、内層回路基板にラミネート後熱
硬化させることにより極薄の、ハロゲン化物を何等使用
せずに難燃性を必要とする多層プリント配線板に用いら
れる。
The present invention provides means for solving the problems of the prior art, wherein the component (A) is represented by the following general formula (1) and the average molecular weight range is 1
000-200,000 (Gel Permeation Chromatography (GPC) uses Sho
dex AD-800P + TSKgel SuperHM
-H + SuperHM-H + SuperH2000,
N, N-dimethylformamide (20 mM
(A product containing lithium bromide) and a weight average molecular weight in terms of standard polyethylene oxide measured at a sample concentration of 0.5%. Hereinafter, the average molecular weight is a phenoxy resin having a weight average molecular weight determined by this measurement method, and the component (B) has an epoxy equivalent of 100 g / eq to 4,
500 g / eq of an aromatic epoxy resin having no halogen substituent and / or an epoxy resin containing a phosphorus atom, wherein the component (C) is a composition comprising a curing agent, and optionally has a viscosity It is a curable resin composition having an ability to form a thermosetting insulating layer containing an organic solvent for adjustment and an organic or inorganic filler, wherein the proportion of the component (A) is based on (A) + (B) 5 to 95% by weight, and the total of the phosphorus content of the component (A) and the phosphorus content of the component (B) is 1 to 5% by weight based on the total weight of (A) + (B). And a copper foil with an adhesive for printed wiring boards obtained by applying the curable resin composition to a copper foil, and an insulating film formed from the curable resin composition. The copper foil with an adhesive or the insulating film is used for a multilayer printed wiring board that requires flame retardancy without using any ultra-thin halide by laminating the inner layer circuit board and then thermosetting. Can be

【0008】[0008]

【化10】 式中、Xは、一般式(2)、(3)、(6)、(7)か
ら選ばれるものであり、化合物の単独、または、それら
複数を組み合わせたものであっても良いが、一般式
(2)及び/または一般式(3)を必須成分とするもの
である。Zは、水素原子または式(9)のいずれかであ
り、nは21以上の値である。
Embedded image In the formula, X is selected from the general formulas (2), (3), (6), and (7), and may be a single compound or a combination of a plurality thereof. Formula (2) and / or formula (3) are essential components. Z is either a hydrogen atom or formula (9), and n is a value of 21 or more.

【0009】[0009]

【化11】 式中、Yは、一般式(4)、(5)から選ばれるもので
あり、R1〜R3は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R3のうちの2
個以上が同一であっても良い。
Embedded image In the formula, Y is selected from the general formulas (4) and (5), and R 1 to R 3 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group; 2 out of 1 to R 3
More than one may be the same.

【0010】[0010]

【化12】 式中、Yは、一般式(4)、(5)から選ばれるもので
あり、R1〜R4は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R4のうちの2
個以上が同一であっても良い。
Embedded image In the formula, Y is selected from the general formulas (4) and (5), and R 1 to R 4 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group; 2 out of 1 to R 4
More than one may be the same.

【0011】[0011]

【化13】 式中、R1〜R8は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R8のうちの2
個以上が同一であっても良い。
Embedded image In the formula, R 1 to R 8 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two of R 1 to R 8
More than one may be the same.

【0012】[0012]

【化14】 式中、R1〜R10は、水素原子、炭素数1〜4のアルキ
ル基、フェニル基のいずれかを表し、R1〜R10のうち
の2個以上が同一であっても良い。
Embedded image In the formula, R 1 to R 10 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two or more of R 1 to R 10 may be the same.

【0013】[0013]

【化15】 式中、R1〜R4は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R4のうちの2
個以上が同一であっても良い。
Embedded image In the formula, R 1 to R 4 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two of R 1 to R 4
More than one may be the same.

【0014】[0014]

【化16】 式中、Aは、不存在、または、−CH2−、−C(C
32−、−CHCH3−、−S−、−SO2−、−O
−、−CO−、一般式(8)のいずれの2価の基から選
ばれるものでありであり、R1〜R8は、水素原子、炭素
数1〜4のアルキル基、フェニル基のいずれかを表し、
1〜R8のうちの2個以上が同一であっても良い。
Embedded image In the formula, A is absent or represents —CH 2 —, —C (C
H 3) 2 -, - CHCH 3 -, - S -, - SO 2 -, - O
—, —CO—, or any divalent group of the general formula (8), wherein R 1 to R 8 are any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group. Or
Two or more of R 1 to R 8 may be the same.

【0015】[0015]

【化17】 式中、R1〜R8は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R8のうちの2
個以上が同一であっても良い。
Embedded image In the formula, R 1 to R 8 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two of R 1 to R 8
More than one may be the same.

【0016】[0016]

【化18】 Embedded image

【0017】本発明における熱硬化性樹脂組成物は当然
のことながら、従来技術で作製されるガラスエポキシ回
路基板と同等の耐熱性、難燃性、電気絶縁性等の様々な
特性を満足し、且つ、銅箔に塗布した場合は、溶剤揮発
後の銅箔カールや、裁断時の粉落ちがしないものである
ことと、内層回路基板にラミネートした場合、内層回路
埋め込み性を有しているものである。
Naturally, the thermosetting resin composition of the present invention satisfies various properties such as heat resistance, flame retardancy, and electrical insulation equivalent to those of a glass epoxy circuit board produced by a conventional technique. In addition, when applied to copper foil, the copper foil does not curl after solvent volatilization and does not fall off during cutting, and when laminated to an inner layer circuit board, has an inner layer circuit embedding property. It is.

【0018】本発明で使用する(A)成分の平均分子量
は10,000から200,000の範囲である。
(A)成分の平均分子量が10,000未満では、その
エポキシ樹脂組成物を銅箔に塗布し乾燥した後の接着剤
付き銅箔が、銅箔カールや裁断時の粉落ち等を起こし不
良品となり、好ましくない。また平均分子量が200,
000を超えると、溶剤で希釈溶解しても、一般に工業
的に利用されている溶媒濃度である70重量%から30
重量%では、溶液粘度が高過ぎ、銅箔に塗布することが
極めて困難となる。銅箔に塗布可能な溶液粘度にするた
めに余り好ましくない溶剤を多量に加えなければなら
ず、不経済であり、環境に対してもVOC(揮発性有機
化合物)を可能なかぎり低減する方向にある現状では好
ましいとは言い難い。こうしたことから、(A)成分の
平均分子量は、10,000から200,000の範囲
であり、好ましくは11,000〜100,000、よ
り好ましくは15,000〜65,000である。
The average molecular weight of the component (A) used in the present invention ranges from 10,000 to 200,000.
When the average molecular weight of the component (A) is less than 10,000, the copper foil with an adhesive after the epoxy resin composition is applied to a copper foil and dried, causes copper foil curl, powder dropping during cutting, and the like, resulting in a defective product. Is not preferred. The average molecular weight is 200,
If it exceeds 000, even if it is diluted and dissolved with a solvent, the concentration of the solvent is generally 70% by weight, which is the industrially used concentration of 70 to 30%.
If it is% by weight, the solution viscosity is too high and it is extremely difficult to apply it to a copper foil. In order to obtain a solution viscosity that can be applied to a copper foil, a very undesirable solvent must be added in a large amount, which is uneconomical and also reduces VOC (volatile organic compound) to the environment as much as possible. Under certain circumstances, it is hard to say that it is preferable. Therefore, the average molecular weight of the component (A) is in the range of 10,000 to 200,000, preferably 11,000 to 100,000, and more preferably 15,000 to 65,000.

【0019】(A)成分のフェノキシ樹脂は、一般式
(10)及び/または一般式(11)で表される二価フ
ェノール類を必須成分として、ポリヒドロキシポリエー
テル樹脂中のリン含有量が1重量%〜6重量%になる様
に、二価フェノール類を単独または2種類以上併用した
混合物と、二価フェノール類のジグリシジルエーテルを
単独または2種類以上併用した混合物とを、アミン系、
イミダゾール系、トリフェニルフォスフォニウム、フォ
スフォニウム塩系等公知の触媒の存在下に、場合によっ
ては、非反応性溶媒、例えばトルエン、キシレン、メチ
ルエチルケトン、メチルイソブチルケトン、ジオキサ
ン、イソプロピルアルコール、ブチルアルコール、メチ
ルセロソルブ、エチルセロソルブ、シクロヘキサノン等
の溶媒を、単独または2種以上を併用して使用し、0.
9:1〜1.1:1、好ましくは0.94:1〜1.0
6:1、最も好ましくは0.97:1〜1.03:1の
フェノール性ヒドロキシル基:エポキシ基比を与える量
で反応させることにより製造される。二価フェノール類
としては、例えば、ハイドロキノン、2,5−ジ−t−
ブチルハイドロキノン、ビスフェノールA、ビスフェノ
ールF、4,4’−ビスヒドロキシビフェニル、9,
9’−ビス(4−ヒドロキシフェニル)フルオレン、
1,4−ナフタレンジオール等が挙げられ、ビスフェノ
ールFの場合のより好ましくは二核体含有率96%以上
であるが、特にこれらに限定されるわけではない。二価
フェノール類のジグリシジルエーテル類としては、例え
ば、ビスフェノールA型ジグリシジルエーテル、ビスフ
ェノールF型ジグリシジルエーテル、ビスフェノールS
型ジグリシジルエーテル、ハイドロキノン型ジグリシジ
ルエーテル、2,5−ジ−t−ブチルハイドロキノン型
ジグリシジルエーテル、1,4−ナフタレンジオール型
ジグリシジルエーテル、4,4’−ビスヒドロキシビフ
ェニル型ジグリシジルエーテル、9,9’−ビス(4−
ヒドロキシフェニル)フルオレン型ジグリシジルエーテ
ル等が挙げられ、ビスフェノールA型ジグリシジルエー
テルの場合は、重合度(n)=0の二核体成分含有率を
96%以上に分子蒸留したものがより好ましく、ビスフ
ェノールF型ジグリシジルエーテルの場合は二核体含有
率96%以上のビスフェノールFから得られるものが好
ましく、重合度(n)=0の二核体成分含有率を96%
以上に分子蒸留したものが更に好ましいが、特にこれら
に限定されるわけではない。反応温度は60℃〜200
℃が好ましく、特に好ましくは90℃〜180℃であ
る。反応圧力は通常、常圧であり、反応熱の除去が必要
な場合は、使用する溶剤のフラッシュ蒸発・凝縮還流
法、間接冷却法、またはこれらの併用法により行われ
る。
The phenoxy resin of the component (A) contains a dihydric phenol represented by the general formula (10) and / or the general formula (11) as an essential component and has a phosphorus content of 1% in the polyhydroxy polyether resin. A mixture containing two or more dihydric phenols alone or in combination with two or more diglycidyl ethers of dihydric phenols in an amine-based,
In the presence of a known catalyst such as imidazole, triphenylphosphonium, and phosphonium salt, in some cases, a non-reactive solvent such as toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, dioxane, isopropyl alcohol, butyl alcohol , Methyl cellosolve, ethyl cellosolve, cyclohexanone, etc., alone or in combination of two or more.
9: 1 to 1.1: 1, preferably 0.94: 1 to 1.0
It is prepared by reacting in an amount that provides a phenolic hydroxyl: epoxy group ratio of 6: 1, most preferably 0.97: 1 to 1.03: 1. Examples of dihydric phenols include hydroquinone, 2,5-di-t-
Butyl hydroquinone, bisphenol A, bisphenol F, 4,4'-bishydroxybiphenyl, 9,
9'-bis (4-hydroxyphenyl) fluorene,
Examples thereof include 1,4-naphthalene diol and the like. In the case of bisphenol F, the binuclear substance content is more preferably 96% or more, but is not particularly limited thereto. Examples of diglycidyl ethers of dihydric phenols include bisphenol A type diglycidyl ether, bisphenol F type diglycidyl ether, and bisphenol S
Type diglycidyl ether, hydroquinone type diglycidyl ether, 2,5-di-t-butyl hydroquinone type diglycidyl ether, 1,4-naphthalenediol type diglycidyl ether, 4,4′-bishydroxybiphenyl type diglycidyl ether, 9,9'-bis (4-
(Hydroxyphenyl) fluorene-type diglycidyl ether; and in the case of bisphenol A-type diglycidyl ether, those obtained by molecular distillation of the binuclear component content having a polymerization degree (n) of 0 to 96% or more are more preferable. In the case of bisphenol F-type diglycidyl ether, those obtained from bisphenol F having a binuclear content of 96% or more are preferable, and the binuclear component content at a polymerization degree (n) of 0 is 96%.
As described above, those obtained by molecular distillation are more preferable, but are not particularly limited thereto. Reaction temperature is 60 ° C to 200
C is preferable, and particularly preferably 90C to 180C. The reaction pressure is usually normal pressure, and when it is necessary to remove the reaction heat, the reaction is carried out by flash evaporation / condensation reflux of the solvent used, indirect cooling, or a combination thereof.

【0020】[0020]

【化19】 式中、Yは、一般式(4)、(5)から選ばれるもので
あり、R1〜R3は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R3のうちの2
個以上が同一であっても良い。
Embedded image In the formula, Y is selected from the general formulas (4) and (5), and R 1 to R 3 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group; 2 out of 1 to R 3
More than one may be the same.

【0021】[0021]

【化20】 式中、Yは、一般式(4)、(5)から選ばれるもので
あり、R1〜R4は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R4のうちの2
個以上が同一であっても良い。
Embedded image In the formula, Y is selected from the general formulas (4) and (5), and R 1 to R 4 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group; 2 out of 1 to R 4
More than one may be the same.

【0022】[0022]

【化21】 式中、R1〜R8は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R8のうちの2
個以上が同一であっても良い。
Embedded image In the formula, R 1 to R 8 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two of R 1 to R 8
More than one may be the same.

【0023】[0023]

【化22】 式中、R1〜R10は、水素原子、炭素数1〜4のアルキ
ル基、フェニル基のいずれかを表し、R1〜R10のうち
の2個以上が同一であっても良い。
Embedded image In the formula, R 1 to R 10 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two or more of R 1 to R 10 may be the same.

【0024】一般式(10)のうち、Yが一般式(4)
の具体例としては、10−(2,5−ジヒドロキシフェ
ニル)−10H−9−オキサ−10−ホスファフェナン
トレン−10−オキサイドが挙げられ、Yが一般式
(5)の具体例としては、ジフェニルフォスフィニルハ
イドロキノンが挙げられるが、特にこれらに限定される
わけではない。
In the general formula (10), Y is the general formula (4)
As a specific example of 10- (2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide, a specific example of Y represented by the general formula (5) is diphenyl Examples include phosphinyl hydroquinone, but are not particularly limited thereto.

【0025】一般式(11)のうち、Yが一般式(4)
の具体例としては、1,4−ナフトキノンと9,10−
ジヒドロ−9−オキサ−10−ホスファフェナントレン
−10−オキサイドとの反応生成物が挙げられ、Yが一
般式(5)の具体例としては、ジフェニルホスフィニル
ナフトヒドロキノンが挙げられるが、特にこれらに限定
されるわけではない。
In the general formula (11), Y is the general formula (4)
Are 1,4-naphthoquinone and 9,10-
Examples of the reaction product with dihydro-9-oxa-10-phosphaphenanthrene-10-oxide include Y, and specific examples of the general formula (5) include diphenylphosphinylnaphthohydroquinone. It is not limited to.

【0026】この様にして合成されたフェノキシ樹脂
((A)成分)のリン含有量は1重量%〜6重量%、好
ましくは1.5重量%〜5重量%、より好ましくは2重
量%〜4重量%である。リン含有量が1重量%未満で
は、十分な何年生を付与できず、1重量%以上ではどの
濃度でも難燃性が付与されるが、6重量%以上の濃度に
しても濃度に応じた難燃性の向上は認められない。ま
た、(A)成分はそれのみで、成型時の樹脂流れが少な
く、可撓性、難燃性のある物質であるが、更に、回路埋
め込み性を付与する為に、エポキシ樹脂を加えて加熱硬
化させることが極めて有用となる。
The phenoxy resin (component (A)) thus synthesized has a phosphorus content of 1% by weight to 6% by weight, preferably 1.5% by weight to 5% by weight, more preferably 2% by weight. 4% by weight. If the phosphorus content is less than 1% by weight, sufficient years of life cannot be imparted. If the phosphorus content is 1% by weight or more, flame retardancy is imparted at any concentration. No improvement in flammability is observed. In addition, the component (A) alone is a substance having a low resin flow during molding and having flexibility and flame retardancy. However, in order to impart a circuit embedding property, an epoxy resin is added and heated. It becomes very useful to cure.

【0027】次に(A)+(B)成分のリン含有量の適
用濃度範囲について言及する。(A)成分のフェノキシ
樹脂にリンが含有されていることは必須であるが、
(B)成分のエポキシ樹脂にリンが含有されていても良
い。この場合、(A)+(B)成分のリン含有量が1重
量%未満では、本発明のエポキシ樹脂組成物において十
分な難燃性を付与できない。また、1重量%以上ではど
の濃度でも難燃性が付与可能となるが、5重量%以上の
濃度にしても添加濃度に応じた難燃性の向上は認められ
ないことから、リン含有量を1重量%から5重量%、好
ましくは1.5重量%〜4.5重量%、より好ましくは
2重量%〜4重量%の範囲に制御するのが実用的であ
る。
Next, the applicable concentration range of the phosphorus content of the components (A) and (B) will be described. It is essential that the phenoxy resin of the component (A) contains phosphorus,
The component (B) may contain phosphorus in the epoxy resin. In this case, if the phosphorus content of the component (A) + (B) is less than 1% by weight, sufficient flame retardancy cannot be imparted to the epoxy resin composition of the present invention. At 1% by weight or more, flame retardancy can be imparted at any concentration. However, even at a concentration of 5% by weight or more, no improvement in flame retardancy according to the added concentration is observed. It is practical to control the weight in the range of 1% to 5% by weight, preferably 1.5% to 4.5% by weight, more preferably 2% to 4% by weight.

【0028】次に本発明の硬化性樹脂組成物の(A)成
分と(B)成分の配合比率について言及する。(A)+
(B)成分中の(A)成分の割合が95重量%を越える
場合は、内層回路基板にラミネートした時の内層回路埋
め込み性が得られず、また一般に工業的に利用されてい
る溶媒濃度である70重量%〜30重量%では、溶液粘
度が高過ぎ、銅箔に塗布することが極めて困難となり、
銅箔に塗布可能な溶液粘度にするために溶剤を多量に加
えなければならず、不経済である。更に、環境に対して
もVOC(揮発性有機化合物)を可能なかぎり低減する
方向にある現状では(A)成分を95重量%を超えて用
いることは好ましいとは言い難い。また5重量%を下回
る場合は、接着剤付き銅箔の塗膜性能が悪化し、銅箔カ
ールや裁断時の粉落ちなどの現象を認められるようにな
り、好ましくない。こうしたことから、硬化性樹脂組成
物の(A)+(B)成分中の(A)成分の割合は、好ま
しくは10重量%〜91重量%、より好ましくは40重
量%〜80重量%である。
Next, the mixing ratio of the components (A) and (B) of the curable resin composition of the present invention will be described. (A) +
When the proportion of the component (A) in the component (B) exceeds 95% by weight, the embedding property of the inner layer circuit when laminated on the inner layer circuit board is not obtained, and the solvent concentration generally used industrially is used. At a certain 70% by weight to 30% by weight, the solution viscosity is too high, and it is extremely difficult to apply to the copper foil,
A large amount of solvent must be added in order to obtain a solution viscosity that can be applied to copper foil, which is uneconomical. Furthermore, it is difficult to say that it is preferable to use the component (A) in an amount exceeding 95% by weight under the current situation in which VOCs (volatile organic compounds) are reduced as much as possible with respect to the environment. If the amount is less than 5% by weight, the coating properties of the copper foil with an adhesive are deteriorated, and phenomena such as curling of the copper foil and powder dropping during cutting are unfavorably observed. For these reasons, the proportion of the component (A) in the component (A) + (B) of the curable resin composition is preferably from 10% by weight to 91% by weight, more preferably from 40% by weight to 80% by weight. .

【0029】(B)成分であるエポキシ樹脂は、硬化後
の可撓性、耐熱性、難燃性等の物性を落とさず回路埋め
込み性を確保・維持するために必須の成分であり、芳香
族系で且つエポキシ当量が100g/eqから4,50
0g/eqのものが良い。エポキシ当量が4,500g
/eqを越えると、十分な回路埋め込み性を得られず、
且つ、架橋密度が低くなり望ましい耐熱性のある硬化膜
が得られず好ましくない。また、脂肪族系のエポキシ樹
脂では回路埋め込み性は得られても難燃性が発現しな
い。また、エポキシ当量が100g/eq未満では硬化
物の架橋密度が密となり、固くて脆いものとなり、可撓
性の維持が困難である。このようなことから、(B)成
分のエポキシ当量は100g/eqから4,500g/
eq、好ましくは、130g/eq〜3,000g/e
q、より好ましくは150g/eq〜2,000g/e
qである。本発明組成物に適したエポキシ樹脂を例示す
ると、ビスフェノールA型エポキシ樹脂、ビスフェノー
ルF型エポキシ樹脂、ビスフェノールAとビスフェノー
ルFとの共縮合型エポキシ樹脂、ノボラック型エポキシ
樹脂、ビフェニル型エポキシ樹脂、ジシクロペンタジエ
ン−フェノール系共縮合型エポキシ樹脂が挙げられ、リ
ン原子を含有するエポキシ樹脂を例示すると、9,10
−ジヒドロ−9−オキサ−10−ホスファフェナントレ
ン−10−オキサイドとキノン化合物類との反応物にエ
ピクロルヒドリンまたはエポキシ樹脂を反応せしめたも
の、樹脂骨格中にリン原子を含有するエポキシ樹脂FX
−279BEK75(東都化成製、エポキシ当量306
g/eq、リン含有量2.0%、NV.75.0%、粘
度2,790mPa・s/25℃)等が挙げられるが、特にこれ
らに限定されるわけではない。これらエポキシ樹脂は単
独でも良いし、2種類以上を併用しても良い。
The epoxy resin as the component (B) is an essential component for securing and maintaining the circuit embedding property without deteriorating physical properties such as flexibility, heat resistance and flame retardancy after curing. System and the epoxy equivalent is from 100 g / eq to 4,50
A thing of 0 g / eq is good. Epoxy equivalent is 4,500g
/ Eq, sufficient circuit embedding property cannot be obtained.
In addition, the crosslink density is low, and a cured film having desirable heat resistance cannot be obtained, which is not preferable. Further, in the case of an aliphatic epoxy resin, even if circuit embedding properties can be obtained, flame retardancy does not appear. On the other hand, if the epoxy equivalent is less than 100 g / eq, the crosslinked density of the cured product becomes high, and the cured product becomes hard and brittle, and it is difficult to maintain flexibility. Thus, the epoxy equivalent of the component (B) is from 100 g / eq to 4,500 g /
eq, preferably 130 g / eq to 3,000 g / e
q, more preferably 150 g / eq to 2,000 g / e
q. Examples of the epoxy resin suitable for the composition of the present invention include bisphenol A type epoxy resin, bisphenol F type epoxy resin, co-condensation type epoxy resin of bisphenol A and bisphenol F, novolak type epoxy resin, biphenyl type epoxy resin, A pentadiene-phenol-based co-condensation type epoxy resin is exemplified, and an epoxy resin containing a phosphorus atom is exemplified by 9, 10
-Dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and quinone compounds reacted with epichlorohydrin or epoxy resin, epoxy resin FX containing phosphorus atom in resin skeleton
-279BEK75 (manufactured by Toto Kasei, epoxy equivalent 306)
g / eq, phosphorus content 2.0%, NV. 75.0%, viscosity 2,790 mPa · s / 25 ° C.) and the like, but are not particularly limited thereto. These epoxy resins may be used alone or in combination of two or more.

【0030】(C)成分の硬化剤として種々の物が使用
できる。例えばジシアンジアミド及びその誘導体。2−
メチルイミダゾール、2−エチル−4−メチルイミダゾ
ール等のイミダゾール類及びその誘導体。ビスフェノー
ルA、ビスフェノールF、臭素化ビスフェノールA、ナ
フタレンジオール、ジヒドロキシビフェニル等の2価の
フェノール化合物、フェノール、クレゾール、ビスフェ
ノールA、ナフトール、ナフタレンジオール等フェノー
ル類とホルムアルデヒド等のアルデヒド類やケトン類と
の縮合反応により得られるノボラック型フェノール樹
脂、また、フェノール、クレゾール、ビスフェノール
A、ナフトール、ナフタレンジオール等フェノール類と
キシリレングリコールとの縮合反応等により得られるア
ラルキル型フェノール樹脂等のフェノール系化合物類。
無水フタル酸、無水トリメリット酸、無水ピロメリット
酸、無水マレイン酸、ヘキサヒドロ無水フタル酸等酸無
水物系化合物類。ジアミノジフェニルメタン、トリエチ
レンテトラミン、イソホロンジアミン、ダイマー酸等の
酸類とポリアミン類との縮合反応等により得られるポリ
アミドアミン等のアミン系化合物類。アジピン酸ジヒド
ラジド、イソフタル酸ジヒドラジド等のヒドラジド類等
通常使用されるエポキシ樹脂用硬化剤が挙げられるが、
特にこれらに限定されるわけではない。これらの硬化剤
は単独でも良いし、2種類以上を併用しても良い。
Various substances can be used as the curing agent of the component (C). For example, dicyandiamide and its derivatives. 2-
Imidazoles such as methylimidazole and 2-ethyl-4-methylimidazole and derivatives thereof. Condensation of divalent phenol compounds such as bisphenol A, bisphenol F, brominated bisphenol A, naphthalene diol and dihydroxybiphenyl, phenols such as phenol, cresol, bisphenol A, naphthol and naphthalene diol with aldehydes and ketones such as formaldehyde Novolak type phenolic resins obtained by the reaction, and phenolic compounds such as aralkyl type phenolic resins obtained by a condensation reaction of phenols such as phenol, cresol, bisphenol A, naphthol and naphthalene diol with xylylene glycol.
Acid anhydride compounds such as phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride and hexahydrophthalic anhydride. Amine compounds such as polyamideamines obtained by a condensation reaction of acids such as diaminodiphenylmethane, triethylenetetramine, isophoronediamine, dimer acid and polyamines. Adipic acid dihydrazide, a curing agent for epoxy resins such as hydrazides such as isophthalic acid dihydrazide, which are commonly used,
It is not particularly limited to these. These curing agents may be used alone or in combination of two or more.

【0031】本発明に於ける硬化性樹脂組成物には、銅
箔に塗布するときに適度の粘性を保つために溶剤を用い
ても良い。粘度調整用の溶剤としては、100℃〜16
0℃の溶剤乾燥時に硬化性樹脂組成物中に残存しないも
のであり、具体的には、トルエン、キシレン、メチルエ
チルケトン、メチルイソブチルケトン、ジオキサン、エ
タノール、イソプロピルアルコール、メチルセロソル
ブ、エチルセロソルブ、シクロヘキサノン、N,N−ジ
メチルホルムアミド等が挙げられるが、特にこれらに限
定されるわけではない。これらの溶剤は単独でも良い
し、2種類以上を併用しても良い。
A solvent may be used in the curable resin composition of the present invention in order to maintain an appropriate viscosity when applied to a copper foil. As a solvent for adjusting viscosity, 100 ° C. to 16
It does not remain in the curable resin composition when the solvent is dried at 0 ° C. Specifically, toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, dioxane, ethanol, isopropyl alcohol, methyl cellosolve, ethyl cellosolve, cyclohexanone, N , N-dimethylformamide and the like, but are not particularly limited thereto. These solvents may be used alone or in combination of two or more.

【0032】本発明の硬化性樹脂組成物には、耐熱性、
難燃性の付与、低線膨張率化等の為に、シリカ、炭酸カ
ルシウム、タルク、水酸化アルミニウム、アルミナ、マ
イカ等を、また、接着力改善の為にエポキシシランカッ
プリング剤や、ゴム成分等を硬化性樹脂組成物の硬化物
物性を落とさない程度に加えても良い。
The curable resin composition of the present invention has heat resistance,
Silica, calcium carbonate, talc, aluminum hydroxide, alumina, mica, etc. for imparting flame retardancy and low coefficient of linear expansion, and epoxy silane coupling agent and rubber component for improving adhesive strength May be added to such an extent that the physical properties of the cured product of the curable resin composition are not deteriorated.

【0033】本発明の硬化性樹脂組成物には、必要に応
じて硬化促進剤を用いても良い。例えば、アミン系、イ
ミダゾール系、トリフェニルフォスフォニウム、フォス
フォニウム塩系等公知の種々の硬化促進剤が使用できる
が、特にこれらに限定されるわけではない。硬化促進剤
を使用する場合は、エポキシ樹脂に対し0.01重量%
〜10重量%の範囲が好ましい。10重量%以上だと、
接着剤付き銅箔としての貯蔵安定性が悪化するという問
題であり、好ましくない。
The curable resin composition of the present invention may optionally contain a curing accelerator. For example, various known curing accelerators such as amine-based, imidazole-based, triphenylphosphonium, and phosphonium salt-based compounds can be used, but are not particularly limited thereto. When using a curing accelerator, 0.01% by weight of epoxy resin
A range of from 10 to 10% by weight is preferred. If it is more than 10% by weight,
This is a problem that storage stability as a copper foil with an adhesive is deteriorated, which is not preferable.

【0034】本発明の硬化性樹脂組成物を前述した様な
溶剤で15,000mPa・s/25℃以下望ましくは1
0,000mPa・s/25℃以下の粘度に調整し、一定の
硬化時間を持つように適量の硬化剤を加え、場合によっ
ては硬化促進剤も加えてワニス化し、銅箔に塗布し10
0℃〜160℃で溶剤を揮発させ接着剤付き銅箔を得
る。得られた接着剤付き銅箔を、ドライラミネーター等
により内層回路基板にラミネートし加熱硬化させること
により、外層銅箔を有する多層プリント配線板を作成す
ることができる。
The curable resin composition of the present invention is dissolved in the above-mentioned solvent at 15,000 mPa · s / 25 ° C. or less,
It is adjusted to a viscosity of not more than 000 mPa · s / 25 ° C., and an appropriate amount of a curing agent is added so as to have a certain curing time.
The solvent is volatilized at 0 ° C to 160 ° C to obtain a copper foil with an adhesive. By laminating the obtained copper foil with adhesive on the inner layer circuit board with a dry laminator or the like and curing by heating, a multilayer printed wiring board having an outer layer copper foil can be produced.

【0035】[0035]

【実施例】以下、合成例、実施例及び比較例に基づき本
発明を具体的に説明する。以下の合成例、実施例及び比
較例に於いて、「部」は「重量部」を示す。
The present invention will be specifically described below based on Synthesis Examples, Examples and Comparative Examples. In the following Synthesis Examples, Examples and Comparative Examples, "parts" indicates "parts by weight".

【0036】合成例1 リン含有フェノール、HCA−HQ(三光化学製、10
−(2,5−ジヒドロキシフェニル)−10H−9−オ
キサ−10−ホスファフェナントレン−10−オキサイ
ド、水酸基当量162g/eq、リン含有量9.5%)
を162部、二官能エポキシ樹脂、YD−8125(東
都化成製:分子蒸留ビスフェノールA型エポキシ樹脂、
エポキシ当量171.6g/eq)を175部、シクロ
ヘキサノンを144部、触媒として2−エチル−4−メ
チルイミダゾール(四国化成工業製、以後2E4MZと
略す)0.13部を、攪拌装置、温度計、冷却管、窒素
ガス導入装置を備えた4つ口のガラス製セパラブルフラ
スコに仕込み、常圧、150℃〜170℃の温度で15
時間反応させた後、シクロヘキサノン156部、N,N
−ジメチルホルムアミド300部を加えて、エポキシ当
量17,200g/eq、リン含有率4.6%、固形分
濃度36%(以後NV.と略す)、溶液粘度5,900
mPa・s/25℃、重量平均分子量62,000のポリヒドロ
キシポリエーテル樹脂のシクロヘキサノン・N,N−ジ
メチルホルムアミド混合ワニスを937部得た。この樹
脂を合成樹脂ワニスIとした。
Synthesis Example 1 Phosphorus-containing phenol, HCA-HQ (10
-(2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide, hydroxyl equivalent 162 g / eq, phosphorus content 9.5%)
162 parts, bifunctional epoxy resin, YD-8125 (manufactured by Toto Kasei: molecular distilled bisphenol A type epoxy resin,
175 parts of epoxy equivalent (171.6 g / eq), 144 parts of cyclohexanone, and 0.13 part of 2-ethyl-4-methylimidazole (manufactured by Shikoku Chemicals, hereinafter abbreviated as 2E4MZ) as a catalyst, a stirrer, a thermometer, A four-necked glass separable flask equipped with a cooling pipe and a nitrogen gas introducing device was charged into a separable flask having a temperature of 150 ° C. to 170 ° C. under normal pressure.
After reacting for an hour, 156 parts of cyclohexanone, N, N
Dimethylformamide (300 parts), epoxy equivalent 17,200 g / eq, phosphorus content 4.6%, solid content 36% (hereinafter abbreviated as NV), solution viscosity 5,900.
937 parts of a mixed varnish of cyclohexanone / N, N-dimethylformamide as a polyhydroxy polyether resin having a mPa · s / 25 ° C and a weight average molecular weight of 62,000 was obtained. This resin was designated as synthetic resin varnish I.

【0037】合成例2 リン含有フェノール、HCA−HQ(前述)を126
部、ビスフェノールA(水酸基当量114g/eq)を
52部、二官能エポキシ樹脂、YD−8125(前述)
を218部、シクロヘキサノンを171部、触媒として
2E4MZ 0.16部を、攪拌装置、温度計、冷却
管、窒素ガス導入装置を備えた4つ口のガラス製セパラ
ブルフラスコに仕込み、常圧、150℃〜170℃の温
度で18時間反応させた後、シクロヘキサノン225
部、メチルエチルケトン198部を加えて、エポキシ当
量13,300g/eq、リン含有率3.0%、NV.
40%、溶液粘度5,200mPa・s/25℃、重量平均分子
量38,000のポリヒドロキシポリエーテル樹脂のシ
クロヘキサノン・メチルエチルケトン混合ワニスを99
0部得た。この樹脂を合成樹脂ワニスIIとした。
Synthesis Example 2 Phosphorus-containing phenol, HCA-HQ (described above)
Parts, bisphenol A (hydroxyl equivalent 114 g / eq) 52 parts, bifunctional epoxy resin, YD-8125 (described above)
218 parts, 171 parts of cyclohexanone, and 0.16 part of 2E4MZ as a catalyst were charged into a four-necked glass separable flask equipped with a stirrer, a thermometer, a cooling pipe, and a nitrogen gas introducing device, and then subjected to normal pressure, 150 After reacting for 18 hours at a temperature of
And 198 parts of methyl ethyl ketone, and an epoxy equivalent of 13,300 g / eq, a phosphorus content of 3.0%, and an NV.
A cyclohexanone / methyl ethyl ketone mixed varnish of 40%, a solution viscosity of 5,200 mPa · s / 25 ° C. and a weight average molecular weight of 38,000 was mixed with 99.
0 parts were obtained. This resin was designated as synthetic resin varnish II.

【0038】合成例3 リン含有フェノール、HCA−NQ(9,10−ジヒド
ロ−9−オキサ−10−ホスファフェナントレン−10
−オキサイドと1,4−ナフトキノンとの反応物、水酸
基当量187g/eq、リン含有量8.2%)を62
部、ビスフェノールフルオレン(新日鐵化学製、水酸基
当量175.2g/eq)115部、二官能エポキシ樹
脂、YDF−8170(東都化成製:分子蒸留ビスフェ
ノールF型エポキシ樹脂、エポキシ当量157.5g/
eq)を162部、シクロヘキサノンを146部、触媒
として2E4MZ0.14部を、攪拌装置、温度計、冷
却管、窒素ガス導入装置を備えた4つ口のガラス製セパ
ラブルフラスコに仕込み、常圧、150℃〜170℃の
温度で16時間反応させた後、シクロヘキサノン193
部、メチルエチルケトン169部を加えて、エポキシ当
量12,500g/eq、リン含有率1.5%、NV.
40%、溶液粘度7,800mPa・s/25℃、重量平均分子
量33,000のポリヒドロキシポリエーテル樹脂のシ
クロヘキサノン・メチルエチルケトン混合ワニスを84
7部得た。この樹脂を合成樹脂ワニスIIIとした。
Synthesis Example 3 Phosphorus-containing phenol, HCA-NQ (9,10-dihydro-9-oxa-10-phosphaphenanthrene-10
A reaction product of -oxide and 1,4-naphthoquinone, hydroxyl equivalent 187 g / eq, phosphorus content 8.2%)
Parts, bisphenol fluorene (manufactured by Nippon Steel Chemical Co., Ltd., hydroxyl equivalent: 175.2 g / eq) 115 parts, bifunctional epoxy resin, YDF-8170 (manufactured by Toto Kasei: molecular distilled bisphenol F type epoxy resin, epoxy equivalent: 157.5 g /
eq), 162 parts of cyclohexanone, and 0.14 part of 2E4MZ as a catalyst were charged into a four-necked glass separable flask equipped with a stirrer, a thermometer, a cooling pipe, and a nitrogen gas introducing device. After reacting at a temperature of 150 ° C. to 170 ° C. for 16 hours, cyclohexanone 193 was added.
Parts, 169 parts of methyl ethyl ketone, and an epoxy equivalent of 12,500 g / eq, a phosphorus content of 1.5%, NV.
A mixed varnish of cyclohexanone / methyl ethyl ketone of a polyhydroxy polyether resin having a weight of 33,000 and a solution viscosity of 40%, a solution viscosity of 7,800 mPa · s / 25 ° C. and 84
7 parts were obtained. This resin was designated as synthetic resin varnish III.

【0039】合成例4 リン含有フェノール、ジフェニルフォスフィニルハイド
ロキノン(水酸基当量155g/eq、リン含有量1
0.0%)を195部、二官能エポキシ樹脂、YDF−
8170(前述)を215部、シクロヘキサノンを17
6部、触媒としてトリフェニルフォスフィン(北興化学
製)0.41部を、攪拌装置、温度計、冷却管、窒素ガ
ス導入装置を備えた4つ口のガラス製セパラブルフラス
コに仕込み、常圧、150℃〜170℃の温度で8時間
反応させた後、シクロヘキサノンを29部、メチルエチ
ルケトン205部を加えて、エポキシ当量4,600g
/eq、リン含有率4.8%、NV.50%、溶液粘度
5,000mPa・s/25℃、重量平均分子量20,000の
ポリヒドロキシポリエーテル樹脂のシクロヘキサノン・
メチルエチルケトン混合ワニスを820部得た。この樹
脂を合成樹脂ワニスIVとした。
Synthesis Example 4 Phosphorus-containing phenol, diphenylphosphinylhydroquinone (hydroxyl equivalent 155 g / eq, phosphorus content 1
0.0%), 195 parts, bifunctional epoxy resin, YDF-
215 parts of 8170 (described above) and 17 parts of cyclohexanone
6 parts and 0.41 part of triphenylphosphine (manufactured by Hokuko Chemical) as a catalyst were charged into a four-necked glass separable flask equipped with a stirrer, a thermometer, a cooling pipe, and a nitrogen gas introducing device, and then subjected to normal pressure. After reacting at a temperature of 150 ° C. to 170 ° C. for 8 hours, 29 parts of cyclohexanone and 205 parts of methyl ethyl ketone were added, and the epoxy equivalent was 4,600 g.
/ Eq, phosphorus content 4.8%, NV. 50%, solution viscosity 5,000 mPa · s / 25 ° C, weight average molecular weight 20,000
820 parts of a methyl ethyl ketone mixed varnish was obtained. This resin was designated as synthetic resin varnish IV.

【0040】実施例1 合成例1で得られた合成樹脂ワニスI277.8部とエ
ポキシ樹脂としてYDF−170(東都化成製、エポキ
シ当量169g/eq、粘度3,300mPa・s/25℃、ビ
スフェノールF型エポキシ樹脂)10.0部、硬化剤と
してジシアンジアミド(日本カーバイト製、以後DIC
Yと略す)0.62部、硬化促進剤として2E4MZ
(前述)0.1部、溶剤としてメチルセロソルブ、N,
N−ジメチルホルムアミドを26部加え均一に攪拌混合
し、エポキシ樹脂組成物ワニスを得た。このワニスを厚
さ35μmの銅箔(三井金属鉱業製)のアンカー面に溶
剤乾燥後の樹脂厚みが60μmになるようにローラーコ
ーターにて塗布し、130℃〜150℃、5分〜15分
間溶剤乾燥を行って接着剤付き銅箔を得た。一方、模擬
内層回路基板として、線間200μmピッチの銅黒化処
理済みの銅張両面積層板(CCL−HL830、三菱瓦
斯化学製、UL−94V−0、0.8mm板)を用いた。
この模擬内層回路基板の両面に前記の接着剤付き銅箔を
ドライラミネーターでラミネートし、180℃、2時間
加熱硬化させて、外層絶縁層厚みが50μmの4層プリ
ント配線板を得た。
Example 1 277.8 parts of synthetic resin varnish I obtained in Synthesis Example 1 and YDF-170 as epoxy resin (manufactured by Toto Kasei, epoxy equivalent 169 g / eq, viscosity 3,300 mPa · s / 25 ° C., bisphenol F) Epoxy resin) 10.0 parts, dicyandiamide (manufactured by Nippon Carbide, hereinafter DIC)
0.62 parts, 2E4MZ as a curing accelerator
(Described above) 0.1 part, methyl cellosolve as a solvent, N,
N-dimethylformamide (26 parts) was added and uniformly stirred and mixed to obtain an epoxy resin composition varnish. This varnish is applied to an anchor surface of a copper foil (manufactured by Mitsui Mining & Smelting) having a thickness of 35 μm using a roller coater so that the resin thickness after solvent drying is 60 μm, and the solvent is applied at 130 ° C. to 150 ° C. for 5 minutes to 15 minutes. Drying was performed to obtain a copper foil with an adhesive. On the other hand, a copper-clad double-sided laminated board (CCL-HL830, manufactured by Mitsubishi Gas Chemical, UL-94V-0, 0.8 mm board) with a 200 μm pitch between lines was used as a simulated inner layer circuit board.
The copper foil with the adhesive was laminated on both sides of the simulated inner layer circuit board with a dry laminator and cured by heating at 180 ° C. for 2 hours to obtain a four-layer printed wiring board having an outer insulating layer thickness of 50 μm.

【0041】実施例2 合成例1で得られた合成樹脂ワニスI277.8部とエ
ポキシ樹脂としてYDF−170(前述)100.0
部、硬化剤としてDICY(前述)6.21部、硬化促
進剤として2E4MZ(前述)0.2部、溶剤としてメ
チルセロソルブ、N,N−ジメチルホルムアミドを11
6部加え均一に攪拌混合し、エポキシ樹脂組成物ワニス
を得た以外は実施例1と全く同様にプリント配線板を得
た。
Example 2 277.8 parts of synthetic resin varnish I obtained in Synthesis Example 1 and YDF-170 (described above) as an epoxy resin, 100.0%
Parts, 6.21 parts of DICY (described above) as a curing agent, 0.2 parts of 2E4MZ (described above) as a curing accelerator, 11 parts of methyl cellosolve and N, N-dimethylformamide as a solvent.
A printed wiring board was obtained in exactly the same manner as in Example 1, except that 6 parts were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.

【0042】実施例3 合成例1で得られた合成樹脂ワニスIを277.8部と
エポキシ樹脂としてFX−279BEK75(東都化成
製、エポキシ当量306g/eq、リン含有量2.0
%、NV.75.0%、粘度2,790mPa・s/25℃、リ
ン含有エポキシ樹脂)480.0部及びYDF−200
4(東都化成製、エポキシ当量969g/eq、軟化点
85℃、ビスフェノールF型エポキシ樹脂)540.0
部、硬化剤としてDICY(前述)18.20部、硬化
促進剤として2E4MZ(前述)1.0部、溶剤として
メチルセロソルブ、N,N−ジメチルホルムアミドを1
18.3部加え均一に攪拌混合し、エポキシ樹脂組成物
ワニスを得た以外は実施例1と全く同様にプリント配線
板を得た。
Example 3 277.8 parts of the synthetic resin varnish I obtained in Synthesis Example 1 and FX-279BEK75 (manufactured by Toto Kasei, epoxy equivalent 306 g / eq, phosphorus content 2.0) were used as epoxy resin.
%, NV. 75.0%, viscosity 2,790 mPa · s / 25 ° C., phosphorus-containing epoxy resin) 480.0 parts and YDF-200
4 (manufactured by Toto Kasei, epoxy equivalent 969 g / eq, softening point 85 ° C, bisphenol F type epoxy resin) 540.0
Parts, 18.20 parts of DICY (described above) as a curing agent, 1.0 part of 2E4MZ (described above) as a curing accelerator, and 1 part of methylcellosolve and N, N-dimethylformamide as a solvent.
A printed wiring board was obtained in exactly the same manner as in Example 1 except that 18.3 parts were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.

【0043】実施例4 合成例1で得られた合成樹脂ワニスIを277.8部と
エポキシ樹脂としてYDPN−638(東都化成製、エ
ポキシ当量177g/eq、フェノールノボラック型エ
ポキシ樹脂)50.0部、硬化剤としてDICY(前
述)2.97部、硬化促進剤として2E4MZ(前述)
0.1部、溶剤としてメチルセロソルブ、N,N−ジメ
チルホルムアミドを44部加え均一に攪拌混合し、エポ
キシ樹脂組成物ワニスを得た以外は実施例1と全く同様
にプリント配線板を得た。
Example 4 277.8 parts of synthetic resin varnish I obtained in Synthesis Example 1 and 50.0 parts of YDPN-638 (produced by Toto Kasei, epoxy equivalent 177 g / eq, phenol novolak type epoxy resin) as an epoxy resin 2.97 parts of DICY (described above) as a curing agent and 2E4MZ (described above) as a curing accelerator
A printed wiring board was obtained in exactly the same manner as in Example 1, except that 0.1 part of methyl cellosolve and 44 parts of N, N-dimethylformamide as a solvent were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.

【0044】実施例5 合成例2で得られた合成樹脂ワニスIIを250.0部と
エポキシ樹脂としてYDPN−638(前述)25.0
部、硬化剤としてDICY(前述)1.48部、硬化促
進剤として2E4MZ(前述)0.1部、溶剤としてメ
チルセロソルブ、N,N−ジメチルホルムアミドを36
部加え均一に攪拌混合し、エポキシ樹脂組成物ワニスを
得た以外は実施例1と全く同様にプリント配線板を得
た。
Example 5 250.0 parts of the synthetic resin varnish II obtained in Synthesis Example 2 and YDPN-638 (described above) 25.0 as an epoxy resin.
Parts, 1.48 parts of DICY (described above) as a curing agent, 0.1 part of 2E4MZ (described above) as a curing accelerator, and 36 parts of methylcellosolve and N, N-dimethylformamide as a solvent.
In addition, a printed wiring board was obtained in exactly the same manner as in Example 1 except that an epoxy resin composition varnish was obtained.

【0045】実施例6 合成例3で得られた合成樹脂ワニスIII250.0部と
エポキシ樹脂としてYDPN−638(前述)25.0
部、硬化剤としてDICY(前述)1.48部、硬化促
進剤として2E4MZ(前述)0.1部、溶剤としてメ
チルセロソルブ、N,N−ジメチルホルムアミドを36
部加え均一に攪拌混合し、エポキシ樹脂組成物ワニスを
得た以外は実施例1と全く同様にプリント配線板を得
た。
Example 6 250.0 parts of the synthetic resin varnish III obtained in Synthesis Example 3 and YDPN-638 (described above) 25.0 as an epoxy resin.
Parts, 1.48 parts of DICY (described above) as a curing agent, 0.1 part of 2E4MZ (described above) as a curing accelerator, and 36 parts of methylcellosolve and N, N-dimethylformamide as a solvent.
In addition, a printed wiring board was obtained in exactly the same manner as in Example 1 except that an epoxy resin composition varnish was obtained.

【0046】実施例7 合成例4で得られた合成樹脂ワニスIVを200.0部と
エポキシ樹脂としてYDPN−638(前述)50.0
部、硬化剤としてDICY(前述)2.97部、硬化促
進剤として2E4MZ(前述)0.1部、溶剤としてメ
チルセロソルブ、N,N−ジメチルホルムアミドを50
部加え均一に攪拌混合し、エポキシ樹脂組成物ワニスを
得た。このワニスを離型フィルム(PET)に溶剤乾燥
後の樹脂厚みが60μmになる様にローラーコーターに
て塗布し、140℃〜160℃、15分間溶剤乾燥を行
い絶縁性フィルムを得た。模擬内層回路基板(前述)の
両面に絶縁性フィルム、銅箔(前述)の順に重ね、ドラ
イラミネーターでラミネートし、180℃、2時間加熱
硬化させて、外層絶縁層厚みが50μmの4層プリント
配線板を得た。
Example 7 200.0 parts of the synthetic resin varnish IV obtained in Synthesis Example 4 and YDPN-638 (described above) as an epoxy resin were used.
Parts, 2.97 parts of DICY (described above) as a curing agent, 0.1 part of 2E4MZ (described above) as a curing accelerator, and 50 parts of methylcellosolve and N, N-dimethylformamide as a solvent.
The resulting mixture was uniformly stirred and mixed to obtain an epoxy resin composition varnish. This varnish was applied to a release film (PET) using a roller coater so that the resin thickness after solvent drying was 60 μm, and the solvent was dried at 140 ° C. to 160 ° C. for 15 minutes to obtain an insulating film. An insulating film and a copper foil (described above) are laminated in this order on both sides of the simulated inner-layer circuit board (described above), laminated with a dry laminator, and heat-cured at 180 ° C. for 2 hours to form a 4-layer printed wiring having an outer insulating layer thickness of 50 μm. I got a board.

【0047】比較例1 合成例3で得られた合成樹脂ワニスIII250.0部と
エポキシ樹脂としてYDPN−638(前述)100.
0部、硬化剤としてDICY(前述)5.93部、硬化
促進剤として2E4MZ(前述)0.2部、溶剤として
メチルセロソルブ、N,N−ジメチルホルムアミドを1
44部加え均一に攪拌混合し、エポキシ樹脂組成物ワニ
スを得た以外は実施例1と全く同様にプリント配線板を
得た。
Comparative Example 1 250.0 parts of the synthetic resin varnish III obtained in Synthesis Example 3 and YDPN-638 (described above) as an epoxy resin.
0 parts, 5.93 parts of DICY (described above) as a curing agent, 0.2 parts of 2E4MZ (described above) as a curing accelerator, 1 part of methylcellosolve and N, N-dimethylformamide as a solvent
A printed wiring board was obtained in exactly the same manner as in Example 1, except that 44 parts were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.

【0048】比較例2 YP−50EK35(東都化成製、エポキシ当量10,
300g/eq、重量平均分子量60,000、メチル
エチルケトンワニス、NV.35%、フェノキシ樹脂)
285.7部とエポキシ樹脂としてFX−279BEK
75(前述)200.0部、硬化剤としてDICY(前
述)5.15部、硬化促進剤として2E4MZ(前述)
0.2部、溶剤としてメチルセロソルブ、N,N−ジメ
チルホルムアミドを134部加え均一に攪拌混合し、エ
ポキシ樹脂組成物ワニスを得た以外は実施例1と全く同
様にプリント配線板を得た。
Comparative Example 2 YP-50EK35 (manufactured by Toto Kasei, epoxy equivalent: 10,
300 g / eq, weight average molecular weight 60,000, methyl ethyl ketone varnish, NV. 35%, phenoxy resin)
285.7 parts and FX-279BEK as epoxy resin
75 (as described above) 200.0 parts, DICY (as described above) 5.15 parts as a curing agent, 2E4MZ (as described above) as a curing accelerator
A printed wiring board was obtained in exactly the same manner as in Example 1, except that 0.2 part of methylcellosolve and 134 parts of N, N-dimethylformamide as a solvent were added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.

【0049】比較例3 合成例1で得られた合成樹脂ワニスI277.8部とエ
ポキシ樹脂としてYDF−170(前述)4.0部、硬
化剤としてDICY(前述)0.25部、硬化促進剤と
して2E4MZ(前述)0.1部、溶剤としてメチルセ
ロソルブ、N,N−ジメチルホルムアミドを15部加え
均一に攪拌混合し、エポキシ樹脂組成物ワニスを得た以
外は実施例1と全く同様にプリント配線板を得た。
Comparative Example 3 277.8 parts of synthetic resin varnish I obtained in Synthesis Example 1, 4.0 parts of YDF-170 (described above) as epoxy resin, 0.25 part of DICY (described above) as curing agent, curing accelerator 0.1E of 2E4MZ (described above) and 15 parts of methylcellosolve and N, N-dimethylformamide as solvents were added and uniformly mixed with stirring to obtain an epoxy resin composition varnish. I got a board.

【0050】比較例4 合成例1で得られた合成樹脂ワニスI277.8部とエ
ポキシ樹脂としてYD−020(東都化成製、エポキシ
当量4,850g/eq、軟化点143℃、ビスフェノ
ールA型エポキシ樹脂)50.0部、硬化剤としてDI
CY(前述)0.11部、硬化促進剤として2E4MZ
(前述)0.1部、溶剤としてメチルセロソルブ、N,
N−ジメチルホルムアミドを100部加え均一に攪拌混
合し、エポキシ樹脂組成物ワニスを得た以外は実施例1
と全く同様にプリント配線板を得た。
Comparative Example 4 277.8 parts of the synthetic resin varnish I obtained in Synthesis Example 1 and YD-020 (manufactured by Toto Kasei Co., Ltd., epoxy equivalent 4,850 g / eq, softening point 143 ° C., bisphenol A type epoxy resin) ) 50.0 parts, DI as curing agent
0.11 part of CY (described above), 2E4MZ as a curing accelerator
(Described above) 0.1 part, methyl cellosolve as a solvent, N,
Example 1 except that 100 parts of N-dimethylformamide was added and uniformly stirred and mixed to obtain an epoxy resin composition varnish.
A printed wiring board was obtained in exactly the same manner as described above.

【0051】比較例5 合成例1で得られた合成樹脂ワニスI277.8部とエ
ポキシ樹脂としてYDF−170(前述)10.0部、
硬化剤としてDICY(前述)0.62部、硬化促進剤
として2E4MZ(前述)0.1部、溶剤としてメチル
セロソルブ、N,N−ジメチルホルムアミドを79部加
え均一に攪拌混合し、エポキシ樹脂組成物ワニスを得
た。このワニスを厚さ180μmのガラスクロス(日東
紡績製)に含侵させ、130℃〜150℃、5分〜15
分間溶剤乾燥を行ってプリプレグシートを得た。一方、
模擬内層回路基板として、線間200μmピッチの銅黒
化処理済みの銅張両面板積層板(前述)を用いた。この
模擬内層回路基板の両面に前記のプリプレグシート、銅
箔(前述)の順に重ねて、ドライラミネーターでラミネ
ートし、180℃、2時間加熱硬化させて、外層絶縁層
厚みが200μmの4層プリント配線板を得た。
Comparative Example 5 277.8 parts of synthetic resin varnish I obtained in Synthesis Example 1 and 10.0 parts of YDF-170 (described above) as an epoxy resin,
0.62 parts of DICY (described above) as a curing agent, 0.1 part of 2E4MZ (described above) as a curing accelerator, 79 parts of methylcellosolve and N, N-dimethylformamide as solvents, and uniformly stirred and mixed. I got a varnish. This varnish is impregnated into a glass cloth (manufactured by Nitto Boseki) having a thickness of 180 µm, and is heated at 130 ° C to 150 ° C for 5 minutes to 15 minutes.
The solvent was dried for 5 minutes to obtain a prepreg sheet. on the other hand,
As the simulated inner-layer circuit board, a copper-clad double-sided laminated board (described above) having a 200 μm pitch between lines and having been subjected to copper blackening treatment was used. The prepreg sheet and the copper foil (described above) are stacked on both sides of the simulated inner circuit board in this order, laminated with a dry laminator, and heat-cured at 180 ° C. for 2 hours to form a 4-layer printed wiring having an outer insulating layer thickness of 200 μm. I got a board.

【0052】以上の様にして作成した多層プリント配線
板の特性値を表1に示した。なお、表1において、
[(A)成分+(B)成分]中の(A)成分の割合は、
それぞれの固形分についての割合である。
Table 1 shows the characteristic values of the multilayer printed wiring board prepared as described above. In Table 1,
The ratio of the component (A) in [(A) component + (B) component] is as follows:
It is the ratio for each solid content.

【0053】[0053]

【表1】 [Table 1]

【0054】(試験方法) ハンダ耐熱性試験:100℃、2時間煮沸後のサンプル
を、n=5で、260℃の半田浴に浸け、全て20秒以
上膨れや剥がれを生じなかったものを○とした。 回路埋め込み性:外層銅箔を剥がした後の内層回路に、
樹脂が埋め込まれているものを○とした。 ガラス転移温度:接着剤付き銅箔をラミネートせずにそ
のまま加熱硬化させて、銅箔を剥がしたフィルムでTM
A測定を行った。実施例7の場合は、絶縁性フィルムの
まま加熱硬化させてTMA測定を行った。比較例5の場
合は、プリプレグシートのまま加熱硬化させてTMA測
定を行った。
(Test Method) Solder heat resistance test: A sample after boiling at 100 ° C. for 2 hours was immersed in a solder bath at 260 ° C. at n = 5, and all samples which did not swell or peel for 20 seconds or more were evaluated as ○. And Circuit embedding: In the inner layer circuit after peeling the outer layer copper foil,
The one in which the resin was embedded was evaluated as ○. Glass transition temperature: heat-cured without laminating copper foil with adhesive, and peeled copper foil for TM
A measurement was performed. In the case of Example 7, the insulating film was cured by heating and the TMA measurement was performed. In the case of Comparative Example 5, the prepreg sheet was cured by heating and TMA measurement was performed.

【0055】比較例1に於いては、[(A)成分+
(B)成分]中のリン含有量が0.8重量%と1重量%
よりも小さく、難燃性(UL−94)がV−1で、実施
例に比較し難燃性が充分でないことを示している。比較
例2に於いては、(A)成分として本発明のフェノキシ
樹脂を使用せず、(A)成分中のリン含有率がゼロで、
難燃性(UL−94)がV−1で、実施例に比較し難燃
性が充分でないことを示している。さらに、ガラス転移
点が103℃と低く、耐熱性が低く半田耐熱性も悪くな
っている。即ち、(A)成分中にリンを含有することが
難燃性や半田耐熱性に極めて有用であることを示してい
る。比較例3に於いては、[(A)成分+(B)成分]
中の(A)成分の割合が96.2重量%で95重量%を
超えている。この場合は、回路埋め込み性が悪くなって
いる。即ち、内層回路基板にラミネートしたときの内層
回路埋め込み性を確保するには、[(A)成分+(B)
成分]中の(A)成分の割合をが95重量%を超えない
ようにする必要性があることを示している。比較例4に
於いては、(B)成分としてエポキシ当量が4,850
g/eqのものを使用している。これは、エポキシ当量
が4,500g/eqよりも高く、半田耐熱性、回路埋
め込み性共に悪くなっている。(B)成分のエポキシ当
量が4,500g/eqを超えるものは、プリント配線
板用樹脂としては適さないことを示している。また、比
較例5に於いては、従来から行われているガラスクロス
を使用したものである。この場合、得られたプリント配
線板の厚みは200μmである。これに対して、本発明
で得られるプリント配線板の厚みは、実施例1で示した
ように、50μm程度であって、本発明に於いては、プ
リント配線板の厚みを格段に薄くするする事ができるの
である。
In Comparative Example 1, [(A) component +
(B) component has a phosphorus content of 0.8% by weight and 1% by weight
Smaller than that, and the flame retardancy (UL-94) is V-1, indicating that the flame retardancy is not sufficient as compared with the examples. In Comparative Example 2, the phenoxy resin of the present invention was not used as the component (A), and the phosphorus content in the component (A) was zero.
The flame retardancy (UL-94) is V-1, indicating that the flame retardancy is not sufficient as compared with the examples. Further, the glass transition point is as low as 103 ° C., the heat resistance is low, and the solder heat resistance is poor. That is, it is shown that the inclusion of phosphorus in the component (A) is extremely useful for flame retardancy and solder heat resistance. In Comparative Example 3, [(A) component + (B) component]
The ratio of the component (A) therein is 96.2% by weight, which exceeds 95% by weight. In this case, the circuit embedding property is poor. That is, to ensure the embedding property of the inner layer circuit when laminated on the inner layer circuit board, it is necessary to use [(A) component + (B)
It is necessary that the proportion of the component (A) in the component] does not exceed 95% by weight. In Comparative Example 4, the epoxy equivalent was 4,850 as the component (B).
g / eq is used. This is because the epoxy equivalent is higher than 4,500 g / eq, and both the solder heat resistance and the circuit embedding property are poor. The epoxy equivalent of the component (B) exceeding 4,500 g / eq indicates that it is not suitable as a resin for printed wiring boards. In Comparative Example 5, a conventionally used glass cloth was used. In this case, the thickness of the obtained printed wiring board is 200 μm. On the other hand, the thickness of the printed wiring board obtained by the present invention is about 50 μm as shown in Embodiment 1, and in the present invention, the thickness of the printed wiring board is made much thinner. You can do things.

【0056】以上、実施例と比較例から明らかなよう
に、本発明の硬化性樹脂組成物を使用することにより、
難燃性を確保しながら、耐熱性、特に半田耐熱性に優
れ、内層回路基板にラミネートしたときの内層回路埋め
込み性に優れ、更に、プリント配線板の厚みを格段に薄
くするする事ができるのである。
As is clear from the examples and comparative examples, by using the curable resin composition of the present invention,
While ensuring flame retardancy, it has excellent heat resistance, especially solder heat resistance, excellent embedding of the inner layer circuit when laminated to the inner layer circuit board, and can further reduce the thickness of the printed wiring board. is there.

【0057】[0057]

【発明の効果】本発明による硬化性樹脂組成物を用いる
と、ガラスクロスまたはガラス不織布を用いたプリプレ
グを作成せずに、単に接着剤付き銅箔をラミネートする
だけで外層銅箔を有するハロゲン化物を含有しない難燃
性多層板および難燃性多層プリント配線板の作成が可能
となり、併せて製造工程が単純化される、これに伴って
プロセス経済性が改善される。更に、ガラスクロスまた
はガラス不織布を用いない為これらの材料に基づく物理
的制限を受けずに、極薄でかつ軽量の多層プリント配線
板を作成することが可能となる。
By using the curable resin composition according to the present invention, a halide having an outer copper foil can be obtained simply by laminating a copper foil with an adhesive without preparing a prepreg using a glass cloth or a glass nonwoven fabric. And a flame-retardant multilayer printed wiring board containing no. Can be produced, the manufacturing process is simplified, and the process economy is improved accordingly. Further, since a glass cloth or a nonwoven fabric is not used, it is possible to produce an extremely thin and lightweight multilayer printed wiring board without physical limitations based on these materials.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01B 3/40 H01B 3/40 C 5G305 P 5G333 3/42 3/42 G 17/56 17/56 A H05K 3/46 H05K 3/46 T (72)発明者 佐藤 洋 東京都江戸川区東葛西3−17−14 東都化 成株式会社研究所内 Fターム(参考) 4F071 AA42 AA51 AC12 AE02 AH12 AH13 BB02 BC01 BC02 4J002 CC03Y CC27Y CD00X CD03X CD04X CD05X CD06X CD15X CH08W CL04Y EJ036 EJ056 EL136 EL146 EN036 EN046 EN076 EQ026 ER026 EU116 FD14Y FD146 FD150 GH01 GJ01 GP03 GQ01 GS01 4J005 AA24 BA00 4J036 AD07 AD08 AE07 AF06 CC02 DB05 DB07 DB20 DB21 DB22 DC03 DC04 DC06 DC09 DC10 DC31 DC35 DC40 FB07 FB08 FB12 FB13 JA01 JA05 JA06 JA08 JA09 5E346 AA06 AA12 AA16 AA22 CC08 CC09 CC41 CC43 DD03 EE12 EE13 GG19 GG28 HH24 HH31 5G305 AA06 AA07 AA11 AB25 AB36 BA09 BA18 BA26 CA13 CA15 CD08 5G333 AA03 AB13 AB21 CB13 DA04 DA11 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification code FI Theme coat ゛ (Reference) H01B 3/40 H01B 3/40 C 5G305 P 5G333 3/42 3/42 G 17/56 17/56 A H05K 3/46 H05K 3/46 T (72) Inventor Hiroshi Sato 3-17-14 Higashikasai, Edogawa-ku, Tokyo F-term (reference) 4F071 AA42 AA51 AC12 AE02 AH12 AH13 BB02 BC01 BC02 4J002 CC03Y CC27Y CD00X CD03X CD04X CD05X CD06X CD15X CH08W CL04Y EJ036 EJ056 EL136 EL146 EN036 EN046 EN076 EQ026 ER026 EU116 FD14Y FD146 FD150 GH01 GJ01 GP03 GQ01 GS01 4J005 AA24 BA00 4J030 DC07 DB07 DC07 DC07 DC07 FB08 FB12 FB13 JA01 JA05 JA06 JA08 JA09 5E346 AA06 AA12 AA16 AA22 CC08 CC09 CC41 CC43 DD03 EE12 EE13 GG19 GG28 HH24 HH31 5G305 AA06 AA07 AA11 AB25 AB36 BA09 BA18 BA26 CA13 CA15 CD08 5G333 AA03 AB13 AB21 CB13 DA04 DA11

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 (A)成分が下記一般式(1)で表さ
れ、平均分子量が10,000から200,000の範
囲であって、リン含有量が1重量%〜6重量%であるポ
リヒドロキシポリエーテル樹脂であり、(B)成分がエ
ポキシ樹脂であり、(C)成分が硬化剤、から構成され
る組成物であって、(A)成分の割合が(A)+(B)
に対して5重量%から95重量%である熱硬化型絶縁層
形成能を有する硬化性樹脂組成物。 【化1】 式中、Xは、一般式(2)、(3)、(6)、(7)か
ら選ばれるものであり、化合物の単独、または、それら
複数を組み合わせたものであっても良いが、一般式
(2)及び/または一般式(3)を必須成分とするもの
である。Zは、水素原子または式(9)のいずれかであ
り、nは21以上の値である。 【化2】 式中、Yは、一般式(4)、(5)から選ばれるもので
あり、R1〜R3は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R3のうちの2
個以上が同一であっても良い。 【化3】 式中、Yは、一般式(4)、(5)から選ばれるもので
あり、R1〜R4は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R4のうちの2
個以上が同一であっても良い。 【化4】 式中、R1〜R8は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R8のうちの2
個以上が同一であっても良い。 【化5】 式中、R1〜R10は、水素原子、炭素数1〜4のアルキ
ル基、フェニル基のいずれかを表し、R1〜R10のうち
の2個以上が同一であっても良い。 【化6】 式中、R1〜R4は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R4のうちの2
個以上が同一であっても良い。 【化7】 式中、Aは、不存在、または、−CH2−、−C(C
32−、−CHCH3−、−S−、−SO2−、−O
−、−CO−、一般式(8)のいずれの2価の基から選
ばれるものでありであり、R1〜R8は、水素原子、炭素
数1〜4のアルキル基、フェニル基のいずれかを表し、
1〜R8のうちの2個以上が同一であっても良い。 【化8】 式中、R1〜R8は、水素原子、炭素数1〜4のアルキル
基、フェニル基のいずれかを表し、R1〜R8のうちの2
個以上が同一であっても良い。 【化9】
1. A polyolefin wherein the component (A) is represented by the following general formula (1), has an average molecular weight in the range of 10,000 to 200,000, and has a phosphorus content of 1% by weight to 6% by weight. A composition comprising a hydroxypolyether resin, a component (B) being an epoxy resin, and a component (C) comprising a curing agent, wherein the proportion of the component (A) is (A) + (B)
Curable resin composition having a thermosetting insulating layer forming ability of 5% by weight to 95% by weight with respect to Embedded image In the formula, X is selected from the general formulas (2), (3), (6), and (7), and may be a single compound or a combination of a plurality of compounds. Formula (2) and / or formula (3) are essential components. Z is either a hydrogen atom or formula (9), and n is a value of 21 or more. Embedded image In the formula, Y is selected from the general formulas (4) and (5), and R 1 to R 3 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group; 2 out of 1 to R 3
More than one may be the same. Embedded image In the formula, Y is selected from the general formulas (4) and (5), and R 1 to R 4 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group; 2 out of 1 to R 4
More than one may be the same. Embedded image In the formula, R 1 to R 8 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two of R 1 to R 8
More than one may be the same. Embedded image In the formula, R 1 to R 10 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two or more of R 1 to R 10 may be the same. Embedded image In the formula, R 1 to R 4 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two of R 1 to R 4
More than one may be the same. Embedded image In the formula, A is absent or represents —CH 2 —, —C (C
H 3) 2 -, - CHCH 3 -, - S -, - SO 2 -, - O
—, —CO— or any divalent group of the general formula (8), wherein R 1 to R 8 are any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group Or
Two or more of R 1 to R 8 may be the same. Embedded image In the formula, R 1 to R 8 represent any of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, and a phenyl group, and two of R 1 to R 8
More than one may be the same. Embedded image
【請求項2】 請求項第1項記載の(B)成分のエポキ
シ樹脂が100g/eqから4,500g/eqのエポ
キシ当量範囲の、ハロゲン置換基を持たない芳香族系エ
ポキシ樹脂および/またはリン原子を含有するエポキシ
樹脂であり、請求項第1項記載の(A)成分のリン含有
量と(B)成分のリン含有量の合計が、(A)+(B)
総重量に対して1重量%から5重量%であることを特徴
とする請求項第1項記載のエポキシ樹脂組成物。
2. An aromatic epoxy resin having no halogen substituent and / or phosphorus, wherein the epoxy resin as the component (B) according to claim 1 has an epoxy equivalent range of 100 g / eq to 4,500 g / eq. An epoxy resin containing atoms, wherein the total of the phosphorus content of the component (A) and the phosphorus content of the component (B) according to claim 1 is (A) + (B)
2. The epoxy resin composition according to claim 1, wherein the amount is from 1% by weight to 5% by weight based on the total weight.
【請求項3】 請求項第1項または第2項に記載のエポ
キシ樹脂組成物を銅箔に塗布してなることを特徴とする
プリント配線板用接着剤付き銅箔。
3. A copper foil with an adhesive for printed wiring boards, wherein the epoxy resin composition according to claim 1 or 2 is applied to the copper foil.
【請求項4】 請求項第1項または第2項に記載のエポ
キシ樹脂組成物から成形された絶縁性フィルム。
4. An insulating film formed from the epoxy resin composition according to claim 1.
JP2000186285A 2000-06-21 2000-06-21 Curable resin composition containing thermoplastic polyhydroxypolyether resin Expired - Fee Related JP4530187B2 (en)

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JP2002047334A (en) * 2000-08-02 2002-02-12 Dainippon Ink & Chem Inc Epoxy resin composition and electric laminated board
JP2002201364A (en) * 2001-01-05 2002-07-19 Fujitsu Ltd Flame-retardant resin composition and build-up substrate using the same
WO2005003208A1 (en) * 2003-07-03 2005-01-13 Nec Corporation Epoxy resin composition
JP2007177054A (en) * 2005-12-27 2007-07-12 Toto Kasei Co Ltd New thermoplastic polyhydroxy-polyether resin and resin composition mixed with the same
JP2007277333A (en) * 2006-04-04 2007-10-25 Dainippon Ink & Chem Inc Resin composition, phenoxy resin, coating material composition, adhesive agent composition, adhesive film, prepreg, multilayer printed wiring board and resin-clad copper foil
JP2008101062A (en) * 2006-10-17 2008-05-01 Sumitomo Bakelite Co Ltd Resin composition, prepreg, laminated plate and semiconductor device
WO2008105563A1 (en) * 2007-02-28 2008-09-04 Nippon Steel Chemical Co., Ltd. Flame-retardant adhesive resin composition and flexible printed board material using the same
JP2008208315A (en) * 2007-02-28 2008-09-11 Toto Kasei Co Ltd Non-halogen flame retardant adhesive and material for flexible printed wiring board using the same
JP2009161629A (en) * 2007-12-28 2009-07-23 Toto Kasei Co Ltd Novel phosphorus-containing flame retardant resin, epoxy resin composition containing the same and cured product thereof
JP2009163900A (en) * 2007-12-28 2009-07-23 Du Pont Mitsui Polychem Co Ltd Laminate for flat cable
US7806016B2 (en) 2004-04-22 2010-10-05 Honda Motor Co., Ltd. Worm gear mechanism having worm, torque-transmitting worm wheel and auxiliary worm wheel and electric power steering apparatus including the same
WO2013094606A1 (en) * 2011-12-22 2013-06-27 太陽インキ製造株式会社 Dry film, printed wiring board using same, method for producing printed wiring board, and flip chip mounting substrate
JP2013129170A (en) * 2011-12-22 2013-07-04 Taiyo Ink Mfg Ltd Dry film and printed wiring board using the same
JP2014152309A (en) * 2013-02-13 2014-08-25 Ajinomoto Co Inc Resin composition for thin film, thin film, laminated sheet, and multilayer printed wiring board
KR20190103039A (en) 2018-02-26 2019-09-04 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 Phosphorus-containing phenoxy resin, resin composition thereof, and cured product thereof
JP2020158565A (en) * 2019-03-25 2020-10-01 日鉄ケミカル&マテリアル株式会社 Phosphorus-containing epoxy resin, epoxy resin composition, and its cured product

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JP2002201364A (en) * 2001-01-05 2002-07-19 Fujitsu Ltd Flame-retardant resin composition and build-up substrate using the same
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JP2007277333A (en) * 2006-04-04 2007-10-25 Dainippon Ink & Chem Inc Resin composition, phenoxy resin, coating material composition, adhesive agent composition, adhesive film, prepreg, multilayer printed wiring board and resin-clad copper foil
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JP2009161629A (en) * 2007-12-28 2009-07-23 Toto Kasei Co Ltd Novel phosphorus-containing flame retardant resin, epoxy resin composition containing the same and cured product thereof
JP2009163900A (en) * 2007-12-28 2009-07-23 Du Pont Mitsui Polychem Co Ltd Laminate for flat cable
WO2013094606A1 (en) * 2011-12-22 2013-06-27 太陽インキ製造株式会社 Dry film, printed wiring board using same, method for producing printed wiring board, and flip chip mounting substrate
JP2013129170A (en) * 2011-12-22 2013-07-04 Taiyo Ink Mfg Ltd Dry film and printed wiring board using the same
US20150016072A1 (en) * 2011-12-22 2015-01-15 Taiyo Ink Mfg. Co., Ltd. Dry film, printed wiring board using same, method for producing printed wiring board, and flip chip mounting substrate
US9596754B2 (en) 2011-12-22 2017-03-14 Taiyo Ink Mfg. Co., Ltd. Dry film, printed wiring board using same, method for producing printed wiring board, and flip chip mounting substrate
JP2014152309A (en) * 2013-02-13 2014-08-25 Ajinomoto Co Inc Resin composition for thin film, thin film, laminated sheet, and multilayer printed wiring board
KR20190103039A (en) 2018-02-26 2019-09-04 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 Phosphorus-containing phenoxy resin, resin composition thereof, and cured product thereof
JP2020158565A (en) * 2019-03-25 2020-10-01 日鉄ケミカル&マテリアル株式会社 Phosphorus-containing epoxy resin, epoxy resin composition, and its cured product
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