JPH11265923A - Substrate processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To effectively prevent the occurrence of the excessive processing or the like of a substrate caused by stagnation by preventing the processed substrate from getting stagnant at the time of housing into a cassette. SOLUTION: A substrate processor 1 is composed of a load part 2a for dispensing an unprocessed substrate from a cassette 4 through a robot 3a, unload part 2b for housing the processed substrate through a robot 3b into the cassette 4, and plural processing parts such as washing units 10 arranged between these parts. The cassettes are set to the load part 2a and unload part 2b respectively two by two, the substrate is dispensed from the load part 2a while exchanging the cassette 4 with the dispensing or housing of the substrate and the processed substrate is housed in the unload part 2b. This operation is controlled by a main control part 101 and especially, the dispensation of the substrate from the load part 2a is controlled based on timing to set an empty cassette to the load part 2a.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for processing a glass substrate for a liquid crystal display, a glass substrate for a plasma display, a printed circuit board, a semiconductor wafer, and the like.

[0002]

2. Description of the Related Art Conventionally, in a manufacturing process for a semiconductor element or a liquid crystal display, a plurality of types of processing are performed on a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display while transporting the substrate in a predetermined transport order. That is being done.

A substrate processing apparatus for performing a plurality of processes as described above generally has a configuration in which apparatuses for performing each processing are connected in series. For example, in a substrate processing apparatus for performing a photolithography process, cleaning and dehydration are performed. Apparatuses for performing respective processes such as baking, resist coating, pre-baking, exposure, development, and post-baking are sequentially connected to form a processing line.

The configuration of the processing line as described above includes:
For example, a loading unit (substrate supply unit) and an unloading unit (substrate receiving unit) are provided side by side, and various processing units
The substrates are connected in a V-shape and are sequentially processed while taking out and supplying the substrates from the cassette set in the loading section, i.e., the cassette storing a plurality of unprocessed substrates, and the substrates are placed in the empty cassette set in the unloading section. The storage is performed. According to such a configuration of the processing line, the entire apparatus is compact as compared with a case where all apparatuses are connected in a straight line, and a place for loading / unloading a cassette with respect to the apparatus is located next to the apparatus. This is convenient when loading and unloading cassettes.

In the case of the above processing line, for example,
It is conceivable to pay out an unprocessed substrate or store a processed substrate in the following manner.

That is, two cassettes containing unprocessed substrates are set in the loading section, and the substrates are discharged from one of the cassettes. When the cassette is empty, the substrates are discharged from the other cassette. During this time, the empty cassette is moved to a standby section of the empty cassette by a transfer device or the like and stored, and the next cassette (a cassette containing unprocessed substrates) is set in the loading section. On the other hand, two empty cassettes are also set in the unload section, and while the substrates are stored in one cassette, when the cassette is full, the substrates are stored in the other cassette, During this time, the stored cassette is carried out to a device of the next process by a transport device or the like, and the next empty cassette is carried into the unloader unit from the standby portion of the empty cassette and set. This makes it possible to efficiently process substrates without setting a large number of cassettes in the loading and unloading sections.

[0007]

By the way, in this type of apparatus, one cassette is made into one lot, and usually, the substrates are set in the loading section in a state where the substrates are fully loaded in one cassette. In some cases, the substrates are not fully loaded in one cassette due to damage of the substrates during adjustment or processing, and therefore, the following inconvenience may occur in the apparatus that discharges the substrates as described above.

That is, if the next lot of substrates are immediately dispensed after dispensing substrates of an extremely small number of lots (n-th lot) compared to the full load, when the substrates are stored in the cassette in the unloading section, Although the storage of the substrate of the n-th lot has been completed, an actual situation occurs in which an empty cassette for storing the next lot has not yet been prepared in the unload section. That is, the storage of the substrate of the n-th lot is started immediately after the storage of the substrate of the (n-1) -th lot.
During the storage of the substrates of the lot, the unloading of the cassette of the (n-1) -th lot and the loading of the next empty cassette are performed. However, the storage of the substrates of the n-th lot is completed in a short time. There may be a case where the empty cassette for accommodating the next lot of substrates cannot be loaded in time.

In such a case, the substrates from the next lot onward are:
The apparatus is to remain in the apparatus until an empty cassette is carried in. For example, the substrate may be left in the apparatus, which may cause excessive processing or damage. .

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problem, and it is possible to prevent a stagnation of a processed substrate in a cassette and prevent an excessive processing of the substrate caused by the stagnation. It is an object of the present invention to provide a substrate processing apparatus capable of preventing the above problem.

[0011]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides a supply unit in which a container for storing an unprocessed substrate is arranged, and a container for storing a processed substrate. Receiving unit, a processing unit interposed between the supply unit and the receiving unit, and a discharging unit that discharges an unprocessed substrate from a container of the supply unit to the processing unit. In a substrate processing apparatus configured to store processed substrates in the container while sequentially supplying empty containers to the receiving unit while performing the processing while paying out the substrate, based on the supply timing of the empty container to the receiving unit, There is provided control means for controlling the timing of unloading of the unprocessed substrate to the processing section by the unloading means.

According to this apparatus, when the processed substrate reaches the receiving portion, the timing of discharging the substrate from the supply portion becomes empty so that the empty container for storing the substrate is always disposed in the receiving portion. By controlling based on the supply timing of the container, it is possible to effectively prevent a situation where the processed substrate stagnates in front of the receiving unit.

[0013] In such an apparatus, a plurality of containers are arranged in the supply unit, and the unprocessed substrate is sequentially discharged from each container by the discharging means. After the discharge of the unprocessed substrate from one container is started, The control means can be configured to prohibit unloading of unprocessed substrates from the next container for a predetermined time according to the supply timing of the empty container (claim 2).

In this case, the substrates can be continuously and efficiently discharged by sequentially discharging the substrates from the respective containers. In addition, the time from the first substrate of one container to the first substrate of the next container is not shorter than the predetermined time according to the supply timing of the empty container, so that the container is discharged from each container. By the time the first substrate reaches the receiving section, an empty container for storing the substrate can be arranged in the receiving section. In this case, it is desirable that the predetermined time is set to at least a time equal to or longer than the interval between the supply of the empty containers to the receiving unit (claim 3), so that the stagnation of the processed substrate in front of the receiving unit is prevented. It is possible to reliably prevent it.

In the case where the empty container is transported and supplied to the receiving section by the container transport means, the substrate dispensing timing is controlled based on the supply timing of the empty container to the receiving section by the container transport means. What is necessary is just to comprise the said control means (claim 4). According to this, in the substrate processing apparatus having the so-called automatic transfer system for containers, it is possible to obtain the above-described effects.

[0016]

Embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows an example of a substrate processing apparatus according to the present invention. The substrate processing apparatus 1 shown in FIG.
For example, an apparatus that performs a photolithography process in processing a glass substrate for a liquid crystal display, and is configured to sequentially perform steps from cleaning processing before resist application to resist application, exposure, and development.

As shown in FIG. 1, the substrate processing apparatus 1 includes an indexer 2, a cleaning unit 10 as a processing unit, a dehydration bake unit 20, a resist coating unit 30, a pre-bake unit 40, an exposure unit 60, a development unit 80, It has a post-bake unit 90 and a buffer 50 interposed between the pre-bake unit 40 and the exposure unit 60. The substrate is supplied to the indexer 2 again while sequentially processing the substrates supplied from the indexer 2. , The other processing units are connected to the indexer 2 in a U-shaped configuration.

Although not shown in detail, an unprocessed substrate standby section 5 for waiting for a cassette containing unprocessed substrates and a cassette standby section 6 for waiting for an empty cassette are provided on the sides of the indexer 2. A self-propelled transfer robot 7 for transferring a substrate between the standby units 5 and 6, the indexer 2, and another device (not shown) adjacent to the next process is provided. I have. The unprocessed substrate standby unit 5 is connected to another device (not shown) in the previous process.

The indexer 2 is provided with a load section 2a as a supply section for an unprocessed substrate and an unload section 2b as a section for receiving a processed substrate. The loading section 2a and the unloading section 2b are provided with a loading section for the cassette 4 and robots 3a and 3b for transferring substrates. In this apparatus, the loading section 2a stores unprocessed substrates. Cassettes 4 are set, and the unloading section 2
b, two empty cassettes 4 for storing processed substrates.
Is set. During the operation of the apparatus 1, the cassette 4 of the loading section 2a is operated by the robot 3a.
The unprocessed substrate is taken out of the cleaning unit 10 and discharged to the cleaning unit 10, while the substrate processed by the robot 3b is removed from the post-baking unit 90 to the cassette 4 of the unloading unit 2b.
It is designed to be stored in.

The cleaning unit 10 includes a loading unit 11
It has a V ozone cleaning unit 12, a water cleaning unit 13, a droplet removing unit 14, and a carry-out unit 15, and is configured to perform a cleaning process while transporting the substrate supplied from the indexer 2 in a horizontal posture, for example.

The dehydration bake unit 20 includes the loading unit 2
1, heating unit 22, adhesion strengthening processing unit 23, and cooling unit 24
The substrate that has been subjected to the cleaning process is first subjected to a heating process in a heating unit 22 to remove moisture, and then to an HMDS (hexamethyl) in an adhesion strengthening processing unit 23 in order to improve the adhesion of the resist solution. Disilazane). Finally, the cooling unit 24 is configured to perform a cooling process on the substrate.

The resist coating unit 30 has a carry-in section 31, a spin coater section 32, a reduced-pressure drying section 33, an edge rinse section 34 and a carry-out section 35. First, in the spin coater section 32, a uniform resist is formed on the surface of the substrate. After forming a film and baking it under reduced pressure in the reduced-pressure drying unit 33,
The edge rinse unit 34 is configured to remove unnecessary resist film on the periphery of the substrate.

The pre-bake unit 40 has two processing units 41 each having a heating unit and a cooling unit in multiple stages, and the processing unit 41 The substrate is taken in and out of the substrate. Then, first, the substrate is heated and baked, and then the substrate is cooled to a predetermined temperature.

The buffer 50 is composed of two storage sections 51 capable of storing a large number of substrates, and a robot 52 interposed between the storage sections 51. Is stored in each storage section 51 by the robot 52 and the substrate is temporarily put on standby.

The exposure unit 60 includes, for example, an exposure device such as a reduction projection exposure device, and an alignment mechanism for performing positioning for printing an exposure pattern by the exposure device. The exposure unit 60 exposes a substrate after prebaking. Is configured.

The developing unit 80 has a carry-in section 81, a developing section 82, a washing / drying section 83 and a carry-out section 84. In the developing section 82, for example, a developing process is performed while spraying a developing solution onto a substrate. Is configured to be applied.

The post-baking unit 90 has a carry-in section 91, a heating section 92, a cooling section 93, and a carry-out section 94. The remaining developing solution and cleaning solution are evaporated and removed, and then a cooling process is performed.

In FIG. 1, reference numerals 36 and 43 denote substrate placing tables for transferring the substrate between the resist coating unit 30 and the pre-bake unit 40, or between the pre-bake unit 40 and the buffer 50. The substrate is temporarily placed when the substrate is delivered at the time. Reference numeral 70 denotes a conveyor that conveys the exposed substrate to the developing unit 80.

The substrate processing apparatus 1 configured as described above is provided with a controller 100 having a computer as a component as shown in FIG. The controller 100 includes a process control unit 102 and a transport control unit 103
And the indexer 2 and the washing unit 10
Are electrically connected to the processing control unit 102, and the transfer robot 7 is electrically connected to the transfer control unit 103. The controller 100 is provided with a main control unit 101, and the processing control unit 102 and the transport control unit 103 are electrically connected to the main control unit 101.

During the operation of the apparatus 1, the operations of the processing units such as the indexer 2, the cleaning unit 10 and the transfer robot 7 are controlled by the main control unit 1 via the processing control unit 102 and the like.
01 is controlled collectively.

The control of the substrate processing operation by the main controller 101 will be described below. In the substrate processing apparatus 1, the substrate taken out of the cassette 4 by the robot 3a of the loading unit 2a is discharged from the indexer 2 to the cleaning unit 10, and is sequentially conveyed to the dehydration bake unit 20 and the resist coating unit 30. The substrate that has been processed by the resist coating unit 30 is placed on the mounting table 3.
6, is carried into the pre-bake unit 40 by the robot 42, and is set on the mounting table 43 when the processing in the pre-bake unit 40 is completed.
Then, the substrate is taken into the exposure unit 60 by the robot 52 of the buffer 50, and when the processing here is completed, the substrate is set on the mounting table 43 again by the robot 52. At this time, the substrates before and after the exposure are stored in the storage section 51 of the buffer 50 and are loaded into the exposure unit 60 or temporarily placed in the mounting table 43 while being temporarily stopped.
To be carried out.

The exposed substrate set on the mounting table 43 is moved by the robot 42 to the mounting table 36.
After being transferred to the developing unit 80 by the conveyer 70, and after being processed by the post-baking unit 90, it is collected by the robot 3 b of the unloading unit 2 b into the indexer 2 and stored in the cassette 4. In this way, a series of processing is performed on the substrate.

In such a series of processing operations, loading / unloading of cassettes by the transfer robot 7 and paying out / receiving of substrates from the indexer 2 are performed as follows.

FIG. 2 is a diagram showing an example of a basic operation relating to loading / unloading of the cassette into / from the indexer 2, paying out the substrate from the loading unit 2a, and storing the substrate in the unloading unit 2b. In this apparatus, processing is performed with one cassette as one lot for convenience of explanation, and the processing operation when all cassettes are full of substrates is shown. Also, in the figure,... Are identification codes for distinguishing cassettes, and in the following description, these codes will be used as necessary.

In the figure, at time t0, the load unit 2a
This shows a state in which the discharge of the substrate from one cassette 4 set in the unloading section 2b is completed, and the storage of the substrate in the one cassette 4 set in the unloading section 2b is completed.

That is, of the two cassette mounting portions (discharge position A and discharge position B) of the load portion 2a, an empty cassette immediately after the substrate discharge is completed is set at the discharge position A. The cassette in which unprocessed substrates are stored before the substrate is discharged is set at the discharge position B. Further, of the two cassette mounting portions (referred to as the receiving position a and the receiving position b) of the unloading portion 2b, the cassette immediately after storing the processed substrate is set at the receiving position a, An empty cassette before substrate storage is set at the receiving position b. Further, in the unprocessed substrate standby unit 5, a cassette (a cassette storing unprocessed substrates) to be next loaded into the loading unit 2a is prepared.
The cassette standby unit 6 is provided with an empty cassette to be carried next into the unloading unit 2b.

After the time t0, that is, when the unloading of the unprocessed substrates from the cassette is completed in the loading unit 2a as described above, the unloading of the processed substrates from the cassette is started. Part 2b
In, the storage of the processed substrate in the cassette is started. At the same time, the cassette of the unloading section 2b is carried out to an apparatus (not shown) in the next step (arrow P1), and an empty cassette is moved from the cassette standby section 6 to the receiving position a of the unloading section 2b. (Arrow P2), the empty cassette of the loading section 2a is unloaded to the cassette standby section 6 (arrow P3), and the next cassette is loaded from the unprocessed substrate standby section 5 to the payout position A of the loading section 2a. (Arrow P4).

Thus, in the loading section 2a, the next cassette is prepared at the dispensing position A while the substrate is being dispensed from the cassette, and in the unloading section 2b, the substrate is stored in the cassette. During the operation, the next cassette is prepared at the receiving position a (time t1).

When the loading of the substrate from the cassette in the loading section 2a is completed, the delivery of the substrate from the next cassette is started, and when the unloading section 2b completes the storage of the substrate in the cassette, the loading is continued. The storage of the substrates in the cassette is started (time t2).
In parallel with this, the receiving position b of the unloading section 2b
The cassette is exchanged with respect to the payout position B of the load section 2a.

Thus, in the loading section 2a, while the substrate is being dispensed from the cassette, the dispensing position B
Next, the next cassette is prepared, and while the substrate is being stored in the cassette in the unloading section 2b, the next cassette is prepared at the receiving position b (time t4).

Thereafter, in the same manner, the processing operation proceeds while the cassette 4 is replaced with respect to the loading unit 2a and the unloading unit 2b.

By the way, in the operation of the substrate processing apparatus 1 as described above, a prohibition time is set for the substrate payout from the load section 2a, and the substrate discharge within this time is prohibited. ing.

More specifically, even when the substrate is completely dispensed from the cassette 4, the time from the start of the substrate dispensation from the cassette 4 to the completion thereof has passed a certain time (prohibited time). If there is no cassette, unloading of substrates from the cassette 4 is stopped until the above-mentioned prohibition time has elapsed even if the next cassette 4 containing unprocessed substrates is set in the loading section 2a. ing. This prohibition time is, for example, when the cassette 4 containing the substrates processed in the unloading section 2b is carried out to the next process apparatus,
This is the time until the next empty cassette 4 is set in the unloading section 2b.

That is, in this apparatus, as described above, the substrates are normally set in the loading section 2a in a state in which the substrates are fully loaded in one cassette, but the substrates are stored in one cassette due to adjustment of the number of substrates, breakage of the substrates during processing, and the like. In some cases, the lots are not fully loaded. If the board of the next lot (the (n + 1) th lot) is to be delivered immediately after the board of such a lot (the n-th lot) is delivered, the lot (the ( After the processing of each substrate of (n + 1) lot), when the substrate is stored in the cassette 4, the substrate may be stagnated in the unloading unit 2b.

More specifically, as shown in FIG. 3A, when the substrates of the previous lot ((n-1) th lot) are completely stored in the cassette 4 on one side of the unloading section 2b. The substrate of the n-th lot starts to be stored in the other cassette 4 set in the unloading section 2b, during which the unloading of the cassette 4 storing the substrate of the (n-1) -th lot and the next empty cassette 4 Is carried in. However, since the number of substrates in the n-th lot is small as described above, the storage of the substrates ends early, and as shown in FIG. 3B, after the storage in the cassette 4 of the n-th lot, the next lot, that is, (N
+1) The cassette for storing the lot is still in the unload section 2
A situation occurs in which the substrate of the lot ((n + 1) th lot) arrives at the unloading position by the robot 3b in a state where the substrate is not set to b, and this causes the substrate to stagnate in the unloading unit 2b.

Therefore, the above-described prohibited time is provided, and when the dispensing of the substrate of the n-th lot is completed within this time, the next lot ((n +
1) The delivery of the substrate of the lot) is stopped. In this control, a timer built in the main control unit 101 measures an elapsed time from the payout start time of the n-th lot, and compares the measured time with the above-described prohibition time until the prohibition time elapses. This is done by prohibiting the dispensing of a lot of substrates and starting dispensing of the next lot of substrates when the prohibition time has elapsed.

In this way, for example, as shown in FIG. 4A, the first substrate of the next lot ((n + 1) th lot) is processed by the above-mentioned inhibition time with respect to the first substrate of the n-th lot. Is delayed, and even when the substrate of the n-th lot is stored in the cassette 4 as described above, the leading substrate of the next lot (the (n + 1) -th lot) does not reach the removal position by the robot 3b. (FIG. 4
(B)), after the empty cassette 4 is set in the unloading section 2b, the first substrate of the lot ((n + 1) th lot) reaches the take-out position by the robot 3b (FIG. 4 (c)). )). Therefore, the stagnation of the substrate as described above is effectively prevented.

According to the substrate processing apparatus 1 described above, two cassettes 4 are set in the loading section 2a, and the empty cassette is replaced with the next cassette while the substrates are sequentially discharged from each cassette. At the same time, in the unloading section 2b, two cassettes 4 are set, and the cassettes already stored are replaced with the next empty cassettes 4 while the substrates are sequentially stored in each cassette. The transfer of the substrates 4 is automatically performed by the transfer robot 7, so that the payout and storage of the substrates are continuously and efficiently performed. Therefore, the processing of the substrate is performed efficiently.

In addition, a certain prohibition time is provided for the operation of discharging the substrate from the unloading section 2b as described above, and when the first substrate of each lot reaches the unloading section 2b, the substrate is always stored. Since the empty cassette 4 is set in the unloading section 2b, even if the number of substrates accommodated in one cassette fluctuates due to adjustment of the number of substrates, breakage of the substrates during processing, etc. There is no stagnation of the processed substrate in the loading section 2b. For this reason, it is possible to effectively prevent a situation where the processed substrate is left in each unit such as the post-baking unit 90 and the substrate is excessively processed, thereby being damaged.

Therefore, according to the substrate processing apparatus 1,
The substrate can be processed efficiently, and the quality of the substrate can be more appropriately ensured as compared with a conventional apparatus of this type.

In the above embodiment, the loader 2a and the unloader 2b of the indexer 2
Although two cassettes 4 are set in each case, the number of cassettes 4 to be set is arbitrary, and may be appropriately selected so that processing is performed efficiently. However, according to the present invention, substrate stagnation can be prevented without increasing the number of cassettes 4 arranged in the unloading section 2b, that is, without increasing the size of the apparatus. Further, regardless of the layout configuration of each processing unit such as the cleaning unit 10 according to the above-described embodiment, for example,
The processing units such as the cleaning unit 10 may be connected in a straight line, and a layout configuration may be adopted in which the loading unit 2a and the unloading unit 2b are arranged at both ends.

Although the description is omitted in the above embodiment, the setting of the prohibition time may be performed, for example, by an operator inputting and setting the controller 100 and the like by a manual device. Transfer robot 7
The main control unit 101 may automatically obtain the value based on the control program or the like.

In the above embodiment, the case where the controller 100 of the substrate processing apparatus 1 also controls the transfer robot 7 has been described, but the transfer robot 7 may be controlled by another control device. In such a case, the controller 100 can be configured so that information on the supply timing of the empty cassette is input online from the other control device.

In the above embodiment, the loading unit 2a
In the above description, the case where the state in which the substrate is completely discharged from one cassette 4 and the state in which the substrate is completely stored in one cassette 4 in the unloading section 2b arrives at the same time (t0, t2). Since the arrival timing of the state changes depending on factors such as the processing time of each processing unit and the number of substrates existing in the processing unit, it does not always arrive at the same time. In the above embodiment, the indexer 2
Although two robots are arranged in the system, one or three or more robots can be provided depending on the operation speed of the robot.

In the above-described embodiment, an example has been described in which the timing of dispensing substrates from the cassette 4 placed on the indexer 2 is controlled. However, the control of the buffer unit provided in the middle of a series of substrate processing apparatuses has been described. The present invention can be applied to this. More specifically, for example, when a plurality of lots of substrates are stored in the storage unit 51 of the buffer 50 according to the present embodiment, the storage unit 51 reaches the unload unit 2b via the processing units downstream from the storage unit 51. In the line, by controlling the payout of the substrate from the storage unit 51 based on the supply timing of the empty container to the unloading unit 2b, it is possible to prevent stagnation when storing the processed substrate in the cassette.

Although the above embodiment is an example in which the present invention is applied to an apparatus that performs a photolithography step in processing a glass substrate for a liquid crystal display, the present invention is not limited to an apparatus that performs a photolithography step. Applicable to any type of device that performs processing in the processing unit while paying out substrates from the cassette set in the loading unit, and then stores processed substrates in the empty cassette set in the unloading unit. It is possible.

[0057]

As described above, according to the present invention, the processing unit processes the substrate while discharging the substrate from the supply unit, and supplies the processed substrate to the container while sequentially supplying empty containers to the receiving unit. In the substrate processing apparatus configured to store the substrate, the timing of dispensing the substrate to the processing unit by the dispensing unit is controlled based on the timing of supplying the empty container to the receiving unit, so that the processed substrate is in front of the receiving unit. It is possible to effectively prevent a stagnation situation from occurring. Therefore, it is possible to effectively prevent a situation in which the substrate is excessively processed due to the stagnation of the substrate and is thereby damaged. Therefore, the quality of the substrate can be more appropriately ensured as compared with a conventional device of this type.

In such an apparatus, in particular, a plurality of containers are arranged in the supply unit, and the substrate is sequentially discharged from each container by the discharging means. If the control means is configured to prohibit the dispensing of the substrate from the next container for a predetermined period of time, the substrate can be efficiently dispensed and the processing can be advanced, and the stagnation of the substrate as described above can be effectively performed. Can be prevented. In this case, the predetermined time is
If the time is set to be at least longer than the interval between the supply of the empty containers to the receiving section, the stagnation of the substrate can be prevented more reliably.

In the case where the empty container is transported and supplied to the receiving section by the container transport means, the control means controls the discharge timing of the substrate based on the supply timing of the empty container to the receiving section by the container transport means. May be configured. According to this, in the substrate processing apparatus having the so-called automatic transfer system of the container, the above-described effects can be obtained.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram showing a substrate processing apparatus according to the present invention.

FIG. 2 is a timing chart for explaining loading / unloading of a cassette into / from an indexer, unloading of unprocessed substrates, and storing of processed substrates.

FIG. 3 is a schematic diagram illustrating an operation in a case where a prohibition time is not provided for an unprocessed substrate payout operation.

FIG. 4 is a schematic diagram illustrating an operation when a prohibition time is provided for an unprocessed substrate payout operation.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Indexer 5 Unprocessed substrate standby part 6 Cassette standby part 7 Transfer robot 10 Cleaning unit 20 Dehydration bake unit 30 Resist coating unit 40 Prebake unit 50 Buffer 60 Exposure unit 80 Developing unit 90 Postbake unit 100 Controller 101 Main control Unit 102 Processing control unit 103 Transport control unit

Claims (4)

[Claims] 1. A supply section in which a container for storing an unprocessed substrate is disposed, a receiving section in which a container for storing a processed substrate is disposed, and an interposition between the supply section and the receiving section. Processing unit, and a dispensing unit that dispenses a substrate from the container of the supply unit toward the processing unit, and performs processing while dispensing an unprocessed substrate from the supply unit, and sequentially empty containers to the reception unit. In a substrate processing apparatus configured to store a processed substrate in the container while supplying, control for controlling the timing of dispensing the substrate to the processing unit by the dispensing unit based on the timing of supplying the empty container to the receiving unit. A substrate processing apparatus characterized by comprising means. 2. A method according to claim 1, further comprising disposing a plurality of containers in the supply unit, sequentially discharging the unprocessed substrates from each container by the discharging unit, and starting the supply of the unprocessed substrates from one container. 2. The substrate processing apparatus according to claim 1, wherein the control means is configured to prohibit unloading of the unprocessed substrate from the next container for a predetermined time according to the following. 3. The substrate processing apparatus according to claim 2, wherein the predetermined time is set to at least a time equal to or longer than a supply interval of empty containers to the receiving section. 4. The apparatus according to claim 1, further comprising a container transporting unit for transporting an empty container to the receiving unit, wherein the control unit controls a substrate dispensing timing based on a supply timing of the empty container to the receiving unit by the container transporting unit. The substrate processing apparatus according to claim 1, wherein: