JPH11256340A - Formation of dlc film and magnetic recording medium produced thereby - Google Patents

Formation of dlc film and magnetic recording medium produced thereby

Info

Publication number
JPH11256340A
JPH11256340A JP10076684A JP7668498A JPH11256340A JP H11256340 A JPH11256340 A JP H11256340A JP 10076684 A JP10076684 A JP 10076684A JP 7668498 A JP7668498 A JP 7668498A JP H11256340 A JPH11256340 A JP H11256340A
Authority
JP
Japan
Prior art keywords
dlc film
film
recording medium
magnetic recording
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10076684A
Other languages
Japanese (ja)
Inventor
Noboru Kawai
登 川合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP10076684A priority Critical patent/JPH11256340A/en
Publication of JPH11256340A publication Critical patent/JPH11256340A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method for efficiently removing a DLC film adhered to each place in a vacuum tank though, in the case a DLC film is formed on a supporting body in a vacuum tank, since a DLC film has been adhered to deposit to each place in the vacuum tank, which is peeled off and fallen to generate defects, there has been need of executing the cleaning of the attachments by frequently breaking a vacuum in the tank, and considerable labors and times have been required. SOLUTION: This method includes a stage in which, at the time of forming a DLC film 3 as a protective film on a supporting body 1 to be carried in a vacuum tank, only a DLC film in the vacuum tank is subjected to etching to remove by oxygen plasma per prescribed period in a forming stage of a DLC film, and the oxygen gas pressure at the time of generating the oxygen plasma is regulated to <=800 Torr. A magnetic recording medium has a DLC film formed by using this film forming method as a protective film.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はDLC膜の成膜方法
及びその方法により成膜されたDLC膜を保護膜として
有する磁気記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a DLC film and a magnetic recording medium having a DLC film formed by the method as a protective film.

【0002】[0002]

【従来の技術】近年、磁気記録媒体はその高密度化に伴
い、磁気ヘッドと磁気記録媒体との相対速度が大きくな
る傾向にある。磁気ヘッドと磁気記録媒体との相対速度
が大きくなると、必然的に摺動速度が大きくなることか
ら、磁気記録媒体の耐摩耗性が重要な問題となる。この
解決策として、保護膜の使用が提案、実用化され、特に
カーボン保護膜及びカーボンを主体とする保護膜が一般
的に使用されている。
2. Description of the Related Art In recent years, the relative speed between a magnetic head and a magnetic recording medium tends to increase as the density of the magnetic recording medium increases. When the relative speed between the magnetic head and the magnetic recording medium increases, the sliding speed inevitably increases, so that the wear resistance of the magnetic recording medium becomes an important issue. As a solution to this, use of a protective film has been proposed and put into practical use. In particular, a carbon protective film and a protective film mainly composed of carbon are generally used.

【0003】ビデオデッキ用磁気テープの場合、例え
ば、Hi−8用蒸着テープにはカーボン保護膜は必要で
はなかったが、DVフォーマット蒸着テープには、カー
ボン膜中に水素を混入させ、ダイヤモンド性を付与し
た、いわゆる、ダイヤモンド状カーボン(Diamom
d Like Carbon、以下、DLCと称する)
膜が保護膜として使用されている。
[0003] In the case of a magnetic tape for a video deck, for example, a carbon protective film was not necessary for a vapor deposition tape for Hi-8, but hydrogen was mixed in a carbon film for a DV format vapor deposition tape to reduce diamond properties. The so-called diamond-like carbon (Diamom)
d Like Carbon (hereinafter, referred to as DLC)
A film is used as a protective film.

【0004】DLC膜の成膜方法には、スパッタ法、C
VD(Chemical Vapor Deposit
ion)法などが使用されている。スパッタ法は真空槽
中にガスを導入し、電極間で放電させることによりプラ
ズマを発生させ、そのプラズマをターゲットに当てて、
スパッタ現象により飛散したターゲット粒子を被着させ
る方法である。このスパッタ法によりDLC膜を成膜す
る場合は、ターゲットとしてカーボン・ターゲットを使
用し、ガスとしてArガスに水素ガスもしくは炭化水素
ガスを混合したガスを用いることが一般的である。
The DLC film is formed by sputtering, C
VD (Chemical Vapor Deposit)
ion) method or the like is used. In the sputtering method, a gas is introduced into a vacuum chamber, plasma is generated by discharging between electrodes, and the plasma is applied to a target.
This is a method of depositing target particles scattered by a sputtering phenomenon. When a DLC film is formed by this sputtering method, a carbon target is generally used as a target, and a gas obtained by mixing a hydrogen gas or a hydrocarbon gas with an Ar gas is used as a gas.

【0005】一方、CVD法は、真空槽内にガスを導入
し、その真空槽内に様々な方法でプラズマを発生させ、
発生したプラズマのエネルギーにより真空槽内に導入し
たガスに化学反応を起こさせ、その化学反応により生じ
た生成物を被着させる方法である。このCVD法により
DLC膜を成膜する場合は、導入ガスとして炭化水素ガ
スを用いる場合が多く、場合によっては、キャリヤーガ
スとしてArガスを混合させることもある。プラズマを
発生させる方法は様々であり、例えば、電極間に直流あ
るいは高周波を印加してプラズマを発生させる方法や、
マイクロ波を用いてプラズマを発生させる方法などが主
として用いられている。
On the other hand, in the CVD method, a gas is introduced into a vacuum chamber, and plasma is generated in the vacuum chamber by various methods.
In this method, a gas introduced into the vacuum chamber is caused to undergo a chemical reaction by the energy of the generated plasma, and a product generated by the chemical reaction is deposited. When a DLC film is formed by this CVD method, a hydrocarbon gas is often used as an introduction gas, and in some cases, an Ar gas may be mixed as a carrier gas. There are various methods of generating plasma, for example, a method of generating plasma by applying a direct current or a high frequency between electrodes,
A method of generating plasma using a microwave is mainly used.

【0006】[0006]

【発明が解決しようとする課題】このように真空槽内で
磁気記録媒体にDLC膜を成膜する場合、磁気記録媒体
以外の真空槽の各所にDLC膜が被着堆積し、その被着
堆積したDLC膜が剥離して真空槽内が汚染されるとい
う問題がある。具体的には、DLC膜が粒子状に分離し
て、剥がれ落ちることも多く、その粒子が磁気記録媒体
に付着すると、磁気記録媒体の記録再生特性に悪影響を
及ぼす欠陥となる。
As described above, when a DLC film is formed on a magnetic recording medium in a vacuum chamber, the DLC film is deposited and deposited on various parts of the vacuum chamber other than the magnetic recording medium, and the deposition is performed. There is a problem that the DLC film peels off and the inside of the vacuum chamber is contaminated. Specifically, the DLC film often separates into particles and peels off, and if the particles adhere to the magnetic recording medium, it becomes a defect that adversely affects the recording / reproducing characteristics of the magnetic recording medium.

【0007】前述のスパッタ法の場合は、カーボン・タ
ーゲットから飛散する粒子を磁気記録媒体に被着させ、
DLC成膜を行うもので、やはり磁気記録媒体以外の部
分にもカーボン粒子が飛散する。しかし、その飛散粒子
には方向性があるため、磁気記録媒体以外の被着させた
くない部分に遮蔽板を設置することにより、上述したよ
うな問題をかなり防ぐことができる。そして、この遮蔽
板にも、DLC膜が被着堆積し、剥がれ落ちることもあ
るが、遮蔽板と磁気記録媒体との位置関係や遮蔽板の形
状を工夫することにより、磁気記録媒体に悪影響を及ぼ
す欠陥を少なくすることが可能である。このように、ス
パッタ法の場合、欠陥の少ない磁気記録媒体の作製には
有効であるが、その反面、スパッタ法は成膜レートが非
常に小さいため、磁気記録媒体を大量に製造する場合に
は、生産性の面で適当であるとは言い難い。
In the case of the aforementioned sputtering method, particles scattered from a carbon target are deposited on a magnetic recording medium,
The DLC film is formed, and the carbon particles are also scattered in portions other than the magnetic recording medium. However, since the scattered particles have directionality, the above-described problem can be considerably prevented by installing a shielding plate in a portion other than the magnetic recording medium that is not to be adhered. The DLC film may be deposited on the shielding plate and peeled off. However, by devising the positional relationship between the shielding plate and the magnetic recording medium and the shape of the shielding plate, the magnetic recording medium is adversely affected. The resulting defects can be reduced. As described above, the sputtering method is effective for producing a magnetic recording medium with few defects, but on the other hand, the sputtering method has a very low film formation rate, so that when a large number of magnetic recording media are manufactured, However, it is hard to say that it is appropriate in terms of productivity.

【0008】それに対して、CVD法は、スパッタ法に
比べて成膜レートが格段に大きく生産性の面では有利で
ある。しかしながら、CVD法によりDLC膜を成膜す
る場合は、原理上、反応ガスのプラズマに接した部分全
てにDLC膜が被着してしまう。プラズマはガス状で拡
散性があるため、遮蔽板を設置してもその効果は小さ
く、磁気記録媒体を除く真空槽内の各所にDLC膜が被
着してしまうことになる。したがって、CVD法により
DLC膜を成膜することにより磁気記録媒体を製造する
場合は、DLC膜が被着堆積し、剥がれ落ちてそれが磁
気記録媒体に付着して磁気記録媒体の特性に悪影響を及
ぼす欠陥が生じる前に、真空槽内のクリーニングを行う
必要がある。このクリーニングは、長尺の磁気記録媒体
の成膜工程中、何度も行う必要があり、さらにクリーニ
ングを行う際には、真空槽内の真空を破ることが必要で
ある。したがって、クリーニング終了後に中断されてい
た成膜工程を再開するために、再び真空排気を行うこと
になり、その操作に長時間を要する。さらに、真空槽内
のクリーニング自体にも時間と手間が掛かるため、生産
性が低下するなどの問題となっている。
On the other hand, the CVD method has a much higher film forming rate than the sputtering method and is advantageous in terms of productivity. However, when the DLC film is formed by the CVD method, in principle, the DLC film is deposited on all portions in contact with the plasma of the reaction gas. Since the plasma is gaseous and diffusive, even if a shielding plate is provided, its effect is small, and the DLC film will be deposited on various places in the vacuum chamber except for the magnetic recording medium. Therefore, when a magnetic recording medium is manufactured by forming a DLC film by the CVD method, the DLC film is deposited and peeled off and adheres to the magnetic recording medium to adversely affect the characteristics of the magnetic recording medium. It is necessary to clean the inside of the vacuum chamber before any defects occur. This cleaning needs to be performed many times during the process of forming a long magnetic recording medium, and it is necessary to break the vacuum in the vacuum chamber when performing the cleaning. Therefore, the vacuum evacuation is performed again in order to restart the film formation process that has been interrupted after the cleaning is completed, and the operation requires a long time. Further, since cleaning in the vacuum chamber itself takes time and effort, there is a problem that productivity is lowered.

【0009】[0009]

【課題を解決するための手段】本発明者は上記課題を解
決すべく種々検討を重ねた結果、真空槽内の各所に付着
したDLC膜を効率良く除去するためには、槽内の真空
を破ることなく成膜工程とクリーニング工程とを連続し
て交互に行えばよいとの着想を得た。そして、クリーニ
ング工程として、所定の酸素ガス圧でプラズマを発生さ
せて行うプラズマエッチングが極めて効果的であること
を確認した。
The present inventor has conducted various studies to solve the above-mentioned problems. As a result, in order to efficiently remove the DLC film adhered to various places in the vacuum chamber, the vacuum in the chamber was reduced. The idea was obtained that the film forming step and the cleaning step should be performed continuously and alternately without breaking. As a cleaning process, it was confirmed that plasma etching performed by generating plasma at a predetermined oxygen gas pressure was extremely effective.

【0010】すなわち、本発明によれば、真空槽内を搬
送される支持体上にDLC膜を成膜する際に、DLC膜
の成膜工程の所定期間毎に、酸素プラズマにより真空槽
内のDLC膜のみをエッチング除去する工程を含み、そ
の酸素プラズマを発生させる際の、酸素ガス圧が800
mTorr以下であるDLC膜の成膜方法が提供され
る。さらに、本発明によれば、上記の成膜方法を使用し
て成膜されたDLC膜を保護膜として有する、磁気記録
媒体も提供される。
In other words, according to the present invention, when a DLC film is formed on a support conveyed in a vacuum chamber, oxygen plasma is generated in the vacuum chamber by oxygen plasma every predetermined period of the DLC film forming process. The process includes a step of etching and removing only the DLC film, and the oxygen gas pressure for generating the oxygen plasma is 800
A method of forming a DLC film having a mTorr or less is provided. Further, according to the present invention, there is provided a magnetic recording medium having a DLC film formed using the above-described film forming method as a protective film.

【0011】[0011]

【発明の実施の形態】以下、本発明のDLC膜の成膜方
法を詳細に説明する。本発明はDLC膜の成膜方法であ
り、具体的には、DLC膜の成膜工程において真空槽内
の不要箇所に付着したDLC膜の除去方法である。本発
明において、このDLC膜の成膜工程自体は、真空槽内
で行われる、例えば、CVD法、スパッタ法などいずれ
の方法でもよいが、前述したように、スパッタ法は飛散
粒子に方向性があるため、遮蔽板などを使用して不要部
分への付着を防止しやすいので、どちらかと言えば、不
要部分への付着を防止することが困難なCVD法に適用
するとより有利である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method for forming a DLC film according to the present invention will be described in detail. The present invention relates to a method of forming a DLC film, and more specifically, to a method of removing a DLC film adhered to an unnecessary portion in a vacuum chamber in a process of forming a DLC film. In the present invention, the step of forming the DLC film itself may be performed in a vacuum chamber, for example, any method such as a CVD method and a sputtering method. Therefore, since it is easy to prevent adhesion to unnecessary portions by using a shielding plate or the like, it is more advantageous to apply to a CVD method in which it is difficult to prevent adhesion to unnecessary portions.

【0012】例えば、真空槽内を搬送される支持体上
に、CVD法によりDLC膜を成膜する工程において、
所定期間毎、具体的には、成膜の所定処理長毎に一旦成
膜を停止し、真空槽内に酸素プラズマを発生させて真空
槽内のDLC膜をエッチング除去する。このとき、酸素
プラズマを発生させる際の酸素ガス圧を800mTor
r以下とすることが必要である。酸素ガス圧が800m
Torrを超えると、DLC膜のエッチングレートが著
しく減少し、エッチング時間を長くしてもDLC膜を除
去することがほとんど不可能になってしまう。
For example, in a step of forming a DLC film by a CVD method on a support conveyed in a vacuum chamber,
The film formation is temporarily stopped for each predetermined period, specifically, for each predetermined processing length of the film formation, and oxygen plasma is generated in the vacuum chamber to etch away the DLC film in the vacuum chamber. At this time, the oxygen gas pressure when generating the oxygen plasma is set to 800 mTorr.
It is necessary to be less than or equal to r. Oxygen gas pressure 800m
If the pressure exceeds Torr, the etching rate of the DLC film is significantly reduced, and it becomes almost impossible to remove the DLC film even if the etching time is lengthened.

【0013】また、上記の工程において、真空槽内のク
リーニングを実施する間隔は、例えば、磁気記録媒体の
保護膜としてのDLC膜を成膜する場合について言え
ば、製造後の磁気記録媒体に所望の特性が得られるよう
に、あらかじめ、クリーニングを行う処理長、すなわ
ち、DLC成膜長を決定し、その成膜長毎にクリーニン
グ工程を実施することが望ましい。以上の成膜方法より
成膜されたDLC膜を保護膜として有する磁気記録媒体
は、全長にわたって欠陥のない高品質なものとなる。
In the above process, the interval at which the cleaning in the vacuum chamber is carried out may be, for example, in the case of forming a DLC film as a protective film of the magnetic recording medium, a desired time for the manufactured magnetic recording medium. In order to obtain the characteristics described above, it is desirable to determine in advance the processing length for cleaning, that is, the DLC film formation length, and to perform the cleaning step for each film formation length. A magnetic recording medium having a DLC film formed as a protective film formed by the above film forming method has high quality without defects over the entire length.

【0014】<実施例> (実施例1) [磁気記録媒体の製造]図1に示したような構成の磁気
記録媒体、つまり、蒸着磁気テープを製造した。すなわ
ち、厚さ6.4μm、幅300mm、長さ9000mの
ポリエチレンテレフタレート(PET)よりなるベース
フィルム1上に、厚さ150nmのCoO磁性層2を蒸
着し、その上に厚さ10nmのDLC保護膜3をCVD
法により成膜した。つづいて、ベースフィルム1の裏面
に厚さ0.5μmのバックコート層5を形成した後、D
LC保護膜3の上に液体潤滑膜4を塗布した。しかるの
ち、これを所定の幅及び長さにスリット分割し、目的と
する磁気テープを得た。
<Example> (Example 1) [Manufacture of magnetic recording medium] A magnetic recording medium having a structure as shown in Fig. 1, that is, a vapor-deposited magnetic tape was manufactured. That is, a CoO magnetic layer 2 having a thickness of 150 nm is deposited on a base film 1 made of polyethylene terephthalate (PET) having a thickness of 6.4 μm, a width of 300 mm and a length of 9000 m, and a DLC protective film having a thickness of 10 nm is formed thereon. 3 for CVD
The film was formed by the method. Subsequently, after forming a backcoat layer 5 having a thickness of 0.5 μm on the back surface of the base film 1,
A liquid lubricating film 4 was applied on the LC protective film 3. Thereafter, this was slit into a predetermined width and length to obtain a target magnetic tape.

【0015】上記の工程において、DLC保護膜3を成
膜するには、真空槽内に配設された一対の電極間をベー
スフィルム1を走行させながら、真空槽内にエチレンガ
スを導入し、電極に高周波を印加するプラズマCVD法
により成膜した。そして、全長9000mのベースフィ
ルム1にDLC膜を3000m成膜する毎に、ベースフ
ィルムの走行、及び、DLC膜の成膜を一端停止し、こ
の状態で真空槽内に酸素ガスを導入し、電極間の酸素ガ
ス圧を200mTorrとして、酸素プラズマを発生さ
せ、真空槽内に被着堆積したDLC膜を10分間エッチ
ングし、真空槽内をクリーニングした。このクリーニン
グ操作を2回、すなわち、3000m、及び、6000
m成膜した時点でそれぞれ実施し、最終的に9000m
までDLC成膜を行って、蒸着磁気テープを完成した。
In the above process, to form the DLC protective film 3, ethylene gas is introduced into the vacuum chamber while the base film 1 is running between a pair of electrodes provided in the vacuum chamber. The film was formed by a plasma CVD method in which a high frequency was applied to the electrode. Then, every time the DLC film is formed 3000 m on the base film 1 having a total length of 9000 m, the running of the base film and the formation of the DLC film are temporarily stopped, and in this state, oxygen gas is introduced into the vacuum chamber, The oxygen gas pressure was set to 200 mTorr, oxygen plasma was generated, the DLC film deposited and deposited in the vacuum chamber was etched for 10 minutes, and the inside of the vacuum chamber was cleaned. This cleaning operation is performed twice, that is, 3000 m and 6000 m.
m at the time of film formation, and finally 9000 m
DLC film formation was performed to complete a deposited magnetic tape.

【0016】[評価試験]上記により製造された磁気テ
ープについて、デジタル記録再生を行い、エラーレート
を測定した。エラーレートは磁気テープに欠陥があると
増加する。具体的には、PETベースフィルム1の最初
からの成膜長が100m、2900m、3100m、5
900m、6100m及び8900mの部分を抜き取
り、それらの各部分についてエラーレートを測定した。
[Evaluation Test] The magnetic tape manufactured as described above was digitally recorded and reproduced, and the error rate was measured. The error rate increases if the magnetic tape is defective. Specifically, the deposition length of the PET base film 1 from the beginning is 100 m, 2900 m, 3100 m, 5 m,
The 900 m, 6100 m and 8900 m portions were sampled and the error rates were measured for those portions.

【0017】(実施例2)真空槽内のクリーニング操作
において、電極間の酸素ガス圧を800mTorrと
し、また、エッチング時間を200分とした以外は、実
施例1と同様にして蒸着磁気テープを製造し、同様の評
価試験を行った。
(Example 2) In a cleaning operation in a vacuum chamber, a vapor-deposited magnetic tape was manufactured in the same manner as in Example 1 except that the oxygen gas pressure between the electrodes was 800 mTorr and the etching time was 200 minutes. Then, the same evaluation test was performed.

【0018】(実施例3) (比較例1)酸素プラズマによるクリーニングを全く行
わず、連続して9000mのDLC成膜を行った以外は
実施例1と同様にして蒸着磁気テープを製造し、同様の
評価試験を行った。
(Example 3) (Comparative Example 1) A vapor-deposited magnetic tape was manufactured in the same manner as in Example 1 except that the DLC film of 9000 m was continuously formed without performing any cleaning by oxygen plasma. Was evaluated.

【0019】真空槽内のクリーニング操作において、電
極間の酸素ガス圧を100mTorrとした以外は、実
施例1と同様にして蒸着磁気テープを製造し、同様の評
価試験を行った。
A vapor deposited magnetic tape was manufactured in the same manner as in Example 1 except that the oxygen gas pressure between the electrodes was changed to 100 mTorr in the cleaning operation in the vacuum chamber, and the same evaluation test was performed.

【0020】(比較例2)真空槽内のクリーニング操作
において、電極間の酸素ガス圧を1Torrとし、ま
た、エッチング時間を400分とした以外は、実施例1
と同様にして蒸着磁気テープを製造し、同様の評価試験
を行った。以上の評価結果を表1に示した。
Comparative Example 2 Example 1 was repeated except that the oxygen gas pressure between the electrodes was set to 1 Torr and the etching time was set to 400 minutes in the cleaning operation in the vacuum chamber.
A vapor-deposited magnetic tape was manufactured in the same manner as described above, and the same evaluation test was performed. Table 1 shows the above evaluation results.

【0021】[0021]

【表1】 測定部分 100m 2900m 3100m 5900m 6100m 8900m 実施例1 6.6E-10 2.8E-9 8.8E-10 5.3E-9 4.7E-10 1.3E-9 実施例2 4.1E-10 5.8E-9 7.7E-10 8.8E-9 9.8E-10 1.6E-8 実施例3 5.9E-10 4.8E-9 3.6E-10 4.0E-9 9.9E-11 3.5E-9 比較例1 2.2E-10 3.9E-9 1.8E-9 6.8E-7 9.3E-7 2.0E-4 比較例2 8.5E-11 9.3E-10 2.5E-9 8.2E-6 2.8E-7 4.4E-4[Table 1] Measurement part 100m 2900m 3100m 5900m 6100m 8900m Example 1 6.6E-10 2.8E-9 8.8E-10 5.3E-9 4.7E-10 1.3E-9 Example 2 4.1E-10 5.8E-9 7.7E-10 8.8E-9 9.8E-10 1.6E-8 Example 3 5.9E-10 4.8E-9 3.6E-10 4.0E-9 9.9E-11 3.5E-9 Comparative Example 1 2.2E-10 3.9E-9 1.8E-9 6.8E-7 9.3E-7 2.0E-4 Comparative Example 2 8.5E-11 9.3E-10 2.5E-9 8.2E-6 2.8E-7 4.4E-4

【0022】表1の結果からも明らかなように、酸素プ
ラズマによる真空槽内のクリーニングを行っていない比
較例1により得られた磁気テープは、DLC成膜長が長
くなるに従ってエラーレートが増大しており、磁気テー
プの欠陥が増加していることが確認された。それに対し
て、実施例1〜3は、DLC成膜の所定期間毎に酸素プ
ラズマにより真空槽内をクリーニングしているため、全
長にわたりエラーレートの増加はほとんど見られず、欠
陥の少ない磁気テープが得られたことが判る。また、実
施例1〜3を比較すると、酸素ガス圧の低い実施例1お
よび3の方が短時間のクリーニング処理で高い効果が得
られている。これは、酸素ガス圧が上昇するにつれて酸
素プラズマによるDLC膜のエッチングレートが低くな
り、エッチング時間を長くしても十分な効果が得られに
くいことを示している。
As is clear from the results shown in Table 1, the error rate of the magnetic tape obtained in Comparative Example 1 in which the vacuum chamber was not cleaned by oxygen plasma increased as the DLC film length increased. It was confirmed that the defects of the magnetic tape had increased. On the other hand, in Examples 1 to 3, since the inside of the vacuum chamber was cleaned with oxygen plasma every predetermined period of DLC film formation, the error rate hardly increased over the entire length, and a magnetic tape with few defects was used. It turns out that it was obtained. Further, when comparing Examples 1 to 3, Examples 1 and 3 having a lower oxygen gas pressure have higher effects obtained by a shorter cleaning process. This indicates that as the oxygen gas pressure increases, the etching rate of the DLC film by oxygen plasma decreases, and it is difficult to obtain a sufficient effect even if the etching time is lengthened.

【0023】一方で、酸素ガス圧が100mTorrと
低い実施例3により得られた磁気テープは、酸素プラズ
マによるDLC膜のエッチングレートが大きいため、ク
リーニング効果が大きく、エラーレートの増加もほとん
ど見られない。しかしながら、クリーニング処理後の真
空槽内を調べてみると、真空槽を構成している材料であ
るステンレスやアルミ、クロムメッキが酸素プラズマに
よりエッチングされ、著しい損傷を受けていることが判
明した。したがって、実施例3のような処理を続けると
真空槽に重大な損傷が発生し、使用が困難となる可能性
が高い。したがって、真空槽の構成部材の損傷を防止す
るために、各部材の構成材料を勘案する必要がある。さ
らに、酸素ガス圧が1Torrと高い比較例2により得
られた磁気テープは、酸素プラズマによるDLC膜のエ
ッチングレートが著しく低いため、処理時間を長くして
もエッチングがほとんど困難であり、クリーニング処理
の効果が無いに等しいことが確認された。
On the other hand, the magnetic tape obtained in Example 3 in which the oxygen gas pressure is as low as 100 mTorr has a large cleaning effect due to a large etching rate of the DLC film by the oxygen plasma, and hardly increases the error rate. . However, when the inside of the vacuum chamber after the cleaning process was examined, it was found that stainless steel, aluminum, and chromium plating, which are materials constituting the vacuum chamber, were etched by oxygen plasma and were significantly damaged. Therefore, if the processing as in the third embodiment is continued, serious damage occurs to the vacuum chamber, and it is highly possible that the vacuum chamber becomes difficult to use. Therefore, in order to prevent damage to the constituent members of the vacuum chamber, it is necessary to consider the constituent materials of each member. Further, in the magnetic tape obtained in Comparative Example 2 in which the oxygen gas pressure is as high as 1 Torr, the etching rate of the DLC film by oxygen plasma is extremely low, so that even if the processing time is prolonged, it is almost difficult to perform etching, and It was confirmed that there was no effect.

【0024】このように、本発明では、従来のように、
真空槽内の真空を破ることなく、酸素ガスを導入するの
みで簡単に真空槽内に付着堆積したDLC膜のクリーニ
ングを行うことが可能であり、欠陥の少ない長尺の磁気
テープを効率的に製造することが可能となる。なお、上
記のクリーニング工程において、真空槽内ではベースフ
ィルムの搬送は停止しているため、クリーニングの際に
ベースフィルム上に形成されたDLC膜もエッチングさ
れてしまうが、真空槽内のベースフィルム長は高々数十
mであり、ベースフィルムの全長からみればほとんど問
題にならない長さである。
Thus, according to the present invention, as in the prior art,
It is possible to easily clean the DLC film deposited and deposited in the vacuum chamber by introducing oxygen gas without breaking the vacuum in the vacuum chamber. It can be manufactured. In the above cleaning step, the transport of the base film is stopped in the vacuum chamber, so that the DLC film formed on the base film is also etched during cleaning. Is a few tens of meters at most, and is a length that poses almost no problem when viewed from the entire length of the base film.

【0025】[0025]

【発明の効果】以上詳細に説明したとおり、本発明のD
LC膜の成膜方法によれば、所定処理長毎に酸素プラズ
マエッチングによる真空槽内のクリーニングを実施した
ので、真空を破ることなく、効率的に成膜を行うことが
可能となる。また、このような成膜法により成膜された
DLC膜を保護膜として有する磁気記録媒体は、欠陥の
少ない高品質なものとなる。
As described in detail above, the D of the present invention
According to the method of forming the LC film, the inside of the vacuum chamber is cleaned by oxygen plasma etching for each predetermined processing length, so that the film can be formed efficiently without breaking the vacuum. A magnetic recording medium having a DLC film formed by such a film forming method as a protective film has high quality with few defects.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の実施例で製造された磁気テープの構
成を示す概念的縦断面図である。
FIG. 1 is a conceptual longitudinal sectional view showing a configuration of a magnetic tape manufactured in an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 支持体(PETベースフィルム) 2 磁性層(CoO) 3 保護膜(DLC膜) 4 液体潤滑膜 5 バックコート層 Reference Signs List 1 support (PET base film) 2 magnetic layer (CoO) 3 protective film (DLC film) 4 liquid lubricating film 5 back coat layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 真空槽内を搬送される支持体上にDLC
膜を成膜する方法において、前記DLC膜の成膜工程の
所定期間毎に、酸素プラズマにより前記真空槽内のDL
C膜のみをエッチング除去する工程を含み、この酸素プ
ラズマを発生させる際の、酸素ガス圧が800mTor
r以下であることを特徴とするDLC膜の成膜方法。
1. DLC on a support conveyed in a vacuum chamber
In the method for forming a film, the DL in the vacuum chamber is controlled by oxygen plasma every predetermined period of the DLC film forming process.
Including a step of etching and removing only the C film, the oxygen gas pressure when generating the oxygen plasma is 800 mTorr.
r or less, the method for forming a DLC film.
【請求項2】 請求項1記載の成膜方法を使用して成膜
されたDLC膜を保護膜として有する、磁気記録媒体。
2. A magnetic recording medium having a DLC film formed by using the film forming method according to claim 1 as a protective film.
JP10076684A 1998-03-10 1998-03-10 Formation of dlc film and magnetic recording medium produced thereby Withdrawn JPH11256340A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10076684A JPH11256340A (en) 1998-03-10 1998-03-10 Formation of dlc film and magnetic recording medium produced thereby

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10076684A JPH11256340A (en) 1998-03-10 1998-03-10 Formation of dlc film and magnetic recording medium produced thereby

Publications (1)

Publication Number Publication Date
JPH11256340A true JPH11256340A (en) 1999-09-21

Family

ID=13612280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10076684A Withdrawn JPH11256340A (en) 1998-03-10 1998-03-10 Formation of dlc film and magnetic recording medium produced thereby

Country Status (1)

Country Link
JP (1) JPH11256340A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001155325A (en) * 1999-11-26 2001-06-08 Fujitsu Ltd Magnetic disk device, magnetic disk and its manufacturing method
EP1189184A2 (en) 2000-08-25 2002-03-20 Fujitsu Limited Authentication method, authentication system, payment system, user apparatus and recording medium containing program for conducting authentication
WO2023286673A1 (en) * 2021-07-14 2023-01-19 東京エレクトロン株式会社 Film forming method and plasma processing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001155325A (en) * 1999-11-26 2001-06-08 Fujitsu Ltd Magnetic disk device, magnetic disk and its manufacturing method
EP1189184A2 (en) 2000-08-25 2002-03-20 Fujitsu Limited Authentication method, authentication system, payment system, user apparatus and recording medium containing program for conducting authentication
WO2023286673A1 (en) * 2021-07-14 2023-01-19 東京エレクトロン株式会社 Film forming method and plasma processing apparatus

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