JPH11251613A - Solar cell device - Google Patents
Solar cell deviceInfo
- Publication number
- JPH11251613A JPH11251613A JP10047025A JP4702598A JPH11251613A JP H11251613 A JPH11251613 A JP H11251613A JP 10047025 A JP10047025 A JP 10047025A JP 4702598 A JP4702598 A JP 4702598A JP H11251613 A JPH11251613 A JP H11251613A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- lead wire
- electrode
- solar cell
- surface electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は太陽電池装置に関
し、特に複数の太陽電池素子がリード線によって接続さ
れた太陽電池装置に関する。The present invention relates to a solar cell device, and more particularly to a solar cell device in which a plurality of solar cell elements are connected by lead wires.
【0002】[0002]
【従来の技術】従来の太陽電池装置を図4(a)(b)
に示す。図4(a)は断面図であり、図4(b)は平面
図である。図4(a)(b)中、11はシリコン基板、
15(15a)は表面電極、16(16a)は裏面電
極、18はリード線である。シリコン基板11内にはN
型領域12とP型領域13とが形成されている。N型領
域12の表面には表面電極15(15a)が設けられ、
P型領域13の表面には裏面電極16(16a)が設け
られている。この表面電極15はリード線接続用のバス
バー部15aと集電用のフィンガー部15bとから成
る。また、裏面電極16もバスバー部16aとフィンガ
ー部(不図示)とから成る。裏面電極16のバスバー部
16aには、抵抗損失を小さくするために銅箔17がハ
ンダ付されている。2. Description of the Related Art A conventional solar cell device is shown in FIGS.
Shown in FIG. 4A is a cross-sectional view, and FIG. 4B is a plan view. 4A and 4B, reference numeral 11 denotes a silicon substrate,
15 (15a) is a front surface electrode, 16 (16a) is a back surface electrode, and 18 is a lead wire. N in the silicon substrate 11
A mold region 12 and a P-type region 13 are formed. A surface electrode 15 (15a) is provided on the surface of the N-type region 12,
The back surface electrode 16 (16a) is provided on the surface of the P-type region 13. The surface electrode 15 includes a bus bar portion 15a for connecting lead wires and a finger portion 15b for collecting current. The back electrode 16 also includes a bus bar portion 16a and a finger portion (not shown). A copper foil 17 is soldered to the bus bar portion 16a of the back electrode 16 to reduce resistance loss.
【0003】複数の太陽電池素子を接続するためのリー
ド線18は平角状の銅箔などから成り、一方端が表面電
極15(15a)上の略全長にわたって配設され、その
複数箇所を表面電極15(15a)と接合することによ
って表面電極15のバスバー部15aに接続され、他方
端が銅箔17を介して裏面電極16のバスバー部16a
の端部にハンダ付けされて裏面電極16に接続される。A lead wire 18 for connecting a plurality of solar cell elements is made of a rectangular copper foil or the like, one end of which is provided over substantially the entire length of the surface electrode 15 (15a), and a plurality of portions are connected to the surface electrode 15 (15a). 15 (15a), the other end is connected to the bus bar portion 15a of the front electrode 15, and the other end is connected to the bus bar portion 16a of the back electrode 16 via the copper foil 17.
Is connected to the back surface electrode 16 by soldering.
【0004】[0004]
【発明が解決しようとする課題】この従来の太陽電池装
置では、太陽電池素子のセル面積の増大化に伴ない、発
生電流が増加したり、また表面電極15のバスバー部1
5aが長くなり、そのために抵抗損失が増大して変換効
率が低下するという問題があった。In this conventional solar cell device, as the cell area of the solar cell element increases, the generated current increases and the bus bar portion 1 of the surface electrode 15 increases.
5a becomes longer, which causes a problem that resistance loss increases and conversion efficiency decreases.
【0005】変換効率の低下を防止するためには、表面
電極15部分のリード線18や裏面電極16部分の銅箔
17の断面積を増加させればよいが、表面電極15部分
のリード線18は、受光面積を減少させないようにする
ために、その厚みを厚くして断面積を増加させなければ
ならない。In order to prevent the conversion efficiency from decreasing, the cross-sectional area of the lead wire 18 at the surface electrode 15 and the cross-sectional area of the copper foil 17 at the back electrode 16 may be increased. In order to prevent the light receiving area from decreasing, it is necessary to increase its thickness and increase its cross-sectional area.
【0006】ところが、リード線18が厚くなると、こ
のリード線18をホットエアーやハンダ鏝で表面電極1
5に溶着する際に、このホットエアーやハンダ鏝の熱が
表面電極15部分のハンダまで伝わりにくく、表面電極
15とリード線18の溶着に時間がかかり、リード線1
8の熱膨張による伸びが大きくなるという問題があっ
た。リード線18が伸びた状態で表面電極15に接合さ
れると、リード線18が縮む際に、シリコン基板11に
圧縮応力が印加されて、シリコン基板11に大きな反り
が発生し、セル割れや電極剥がれなどを誘発し、製造歩
留りが低下するという問題があった。However, when the lead wire 18 becomes thicker, the lead wire 18 is heated with hot air or a soldering iron.
When welding to the surface electrode 5, the hot air or the heat of the soldering iron is difficult to be transmitted to the solder on the surface electrode 15, so that it takes time to weld the surface electrode 15 and the lead wire 18, and the lead wire 1
No. 8 has a problem that elongation due to thermal expansion increases. If the lead wire 18 is joined to the surface electrode 15 in a stretched state, when the lead wire 18 contracts, a compressive stress is applied to the silicon substrate 11, causing a large warp in the silicon substrate 11, causing cell cracking and electrode cracking. There has been a problem that peeling is induced and the manufacturing yield is reduced.
【0007】本発明はこのような従来装置の問題点に鑑
みてなされたものであり、セル面積の増大にともなって
発生する抵抗損失の増大と、その対向策であるバスバー
部の銅箔を厚くすることによって発生するセルの反り、
セル割れ、或いは電極剥がれなどの問題を解消した太陽
電池装置を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the conventional device, and it has been proposed to increase the resistance loss caused by the increase in the cell area and to increase the thickness of the copper foil of the bus bar as a countermeasure. Cell warpage caused by
It is an object of the present invention to provide a solar cell device in which problems such as cell breakage or electrode peeling have been solved.
【0008】[0008]
【課題を解決するための手段】上記目的を達成するため
に、請求項1に係る発明では、半導体接合部を有する半
導体基板の一主面側にバスバー部とフィンガー部とから
成る表面電極を形成し、他の主面側に裏面電極を形成し
た複数の太陽電池素子を設け、この複数の太陽電池素子
の表面電極と裏面電極とをリード線で接続した太陽電池
装置において、前記リード線を縒り線で形成した。In order to achieve the above object, according to the first aspect of the present invention, a surface electrode comprising a bus bar portion and a finger portion is formed on one principal surface of a semiconductor substrate having a semiconductor junction. Then, a plurality of solar cell elements having a back electrode formed on the other main surface side are provided, and in a solar cell device in which the front electrodes and the back electrodes of the plurality of solar cell elements are connected by leads, the lead wire is twisted. Formed with lines.
【0009】上記発明では、前記リード線を前記表面電
極のバスバー部に複数箇所で接合することが望ましい。In the above invention, it is desirable that the lead wire is joined to the bus bar portion of the surface electrode at a plurality of locations.
【0010】[0010]
【発明の実施の形態】以下、請求項1および請求項2に
係る発明の実施形態を添付図面に基づき詳細に説明す
る。図1(a)は請求項1および請求項2に係る発明の
一実施形態を示す断面図、図1(b)は平面図であり、
1は半導体基板、5は表面電極、7は裏面電極、9はリ
ード線である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention according to claims 1 and 2 will be described in detail with reference to the accompanying drawings. FIG. 1A is a cross-sectional view showing one embodiment of the invention according to claims 1 and 2, and FIG. 1B is a plan view.
1 is a semiconductor substrate, 5 is a front electrode, 7 is a back electrode, and 9 is a lead wire.
【0011】半導体基板1は、厚み0.3mm程度の単
結晶シリコンや多結晶シリコンなどから成る。この半導
体基板1内には、N型領域2とP型領域3があり、N型
領域2とP型領域3との界面部分で半導体接合部4が形
成される。このN型領域2はP型のシリコン基板1を拡
散炉中に配置して、オキシ塩化リン(POCl3 )中で
加熱することによって、シリコン基板1の全体の表面部
にリン原子を拡散させ、その後に側面部と底面部の拡散
層を除去することにより、厚み0.3〜0.4μm程度
に形成する。なお、この半導体基板1は単結晶ガリウム
砒素などで形成してもよい。The semiconductor substrate 1 is made of single crystal silicon, polycrystal silicon, or the like having a thickness of about 0.3 mm. The semiconductor substrate 1 has an N-type region 2 and a P-type region 3, and a semiconductor junction 4 is formed at an interface between the N-type region 2 and the P-type region 3. The N-type region 2 has a P-type silicon substrate 1 placed in a diffusion furnace and heated in phosphorus oxychloride (POCl 3 ) to diffuse phosphorus atoms over the entire surface of the silicon substrate 1. After that, the diffusion layer on the side and bottom portions is removed to form a thickness of about 0.3 to 0.4 μm. The semiconductor substrate 1 may be formed of single crystal gallium arsenide or the like.
【0012】N型領域2の表面部分には、表面電極5が
形成されている。この表面電極5は、リード線9を接続
するためのバスバー部5aとこのバスバー部5aと交差
して分岐して形成された集電用のフィンガー部5bとか
ら成る。バスバー部5aは基板1の略全域にわたって二
本平行に形成されており、フィンガー部5bはバスバー
部5bに交差して多数本が基板1の略全長にわたって形
成されている。バスバー部5aは例えば2mm程度の幅
に形成され、フィンガー部5bは例えば0.2mm程度
の幅に形成される。このような表面電極5は、例えば銀
粉末、ガラスフリット、結合剤、および溶剤などから成
るペーストをスクリーン印刷して700〜800℃程度
の温度で焼き付け、全体をハンダ層で被覆することによ
り形成される。A surface electrode 5 is formed on the surface of the N-type region 2. The front surface electrode 5 includes a bus bar portion 5a for connecting the lead wire 9, and a current collecting finger portion 5b formed by crossing the bus bar portion 5a. Two busbar portions 5a are formed in parallel over substantially the entire area of the substrate 1, and a large number of finger portions 5b are formed across substantially the entire length of the substrate 1 intersecting with the busbar portions 5b. The bus bar portion 5a is formed to have a width of, for example, about 2 mm, and the finger portion 5b is formed to have a width of, for example, about 0.2 mm. Such a surface electrode 5 is formed by screen-printing a paste made of, for example, silver powder, glass frit, a binder, and a solvent, baking the paste at a temperature of about 700 to 800 ° C., and covering the whole with a solder layer. You.
【0013】基板1の表面側には、図示されていない
が、例えば窒化シリコン膜などから成る反射防止膜が形
成される。このような反射防止膜は例えばプラズマCV
D法などで形成される。Although not shown, an anti-reflection film made of, for example, a silicon nitride film is formed on the front surface of the substrate 1. Such an antireflection film is, for example, a plasma CV
It is formed by the D method or the like.
【0014】基板1の裏面側には裏面電極7が設けられ
ている。この裏面電極7も、リード線9を接続するため
のバスバー部7aとこのバスバー部7aと交差して分岐
して多数本形成されるフィンガー部(不図示)とから成
る。バスバー部7aは基板1の略全長にわたって二本平
行に形成されており、フィンガー部はバスバー部7aに
交差して多数本が基板1の略全域にわたって形成されて
いる。バスバー部7aは例えば5mm程度の幅に形成さ
れ、フィンガー部は例えば0.5mm程度の幅に形成さ
れる。基板1の裏面側は、受光面積の減少を考慮しなく
てもよいことから、表面電極5のバスバー部5aよりも
幅広に形成でき、裏面電極7側での抵抗損失を低減でき
る。このような裏面電極7は、例えば銀粉末、ガラスフ
リット、結合剤、および溶剤などから成るペーストをス
クリーン印刷して焼き付け、ハンダ層で被覆することに
より形成される。なお、裏面電極7は、バスバー部7a
とフィンガー部7bを交差して設ける場合に限らず、基
板1の裏面側の全面に設けてもよい。A back surface electrode 7 is provided on the back surface side of the substrate 1. The back electrode 7 also includes a bus bar portion 7a for connecting the lead wire 9, and a plurality of finger portions (not shown) which cross the bus bar portion 7a and are formed by branching. Two busbar portions 7a are formed substantially in parallel over substantially the entire length of the substrate 1, and a large number of finger portions are formed across substantially the entire region of the substrate 1 crossing the busbar portion 7a. The bus bar portion 7a is formed to have a width of, for example, about 5 mm, and the finger portion is formed to have a width of, for example, about 0.5 mm. Since it is not necessary to consider the reduction of the light receiving area on the back surface side of the substrate 1, the width can be formed wider than the bus bar portion 5a of the front surface electrode 5, and the resistance loss on the back surface electrode 7 side can be reduced. Such a back electrode 7 is formed, for example, by screen-printing and baking a paste made of silver powder, glass frit, a binder, a solvent, and the like, and covering the paste with a solder layer. The back electrode 7 is provided with a bus bar portion 7a.
The present invention is not limited to the case where the finger portions 7b are provided so as to intersect with each other.
【0015】この裏面電極7上には銅箔8が貼りつけら
れている。この銅箔8は、幅5mm程度、厚み0.1m
m程度に形成される。このような銅箔8を裏面電極7の
バスバー部7a上に例えば等間隔に5点で接合する。こ
のように裏面電極7のバスバー部7aと銅箔8を複数箇
所のみで接合すると、温度変化によって銅箔8の長さが
変化しても、銅箔8が切断したり、基板1に反りを生じ
ることがない。A copper foil 8 is adhered on the back electrode 7. This copper foil 8 has a width of about 5 mm and a thickness of 0.1 m.
m. Such a copper foil 8 is bonded on the bus bar portion 7a of the back electrode 7 at, for example, five points at equal intervals. When the bus bar portion 7a of the back electrode 7 and the copper foil 8 are joined at only a plurality of locations in this way, even if the length of the copper foil 8 changes due to a temperature change, the copper foil 8 is cut or the substrate 1 is warped. Will not occur.
【0016】表面電極5のバスバー部5aと裏面電極7
のバスバー部7aをリード線9で接続する。このリード
線9は、図2(a)(b)に示すように、直径0.05
〜0.1mm程度の銅の細線9aが90〜360本程度
同心円状に最密充填され、捩じることで縒り線とされて
いる。なお、図2(a)はリード線9の断面図であり、
図2(b)はリード線9の側面図である。The bus bar portion 5a of the front electrode 5 and the back electrode 7
Are connected by a lead wire 9. The lead wire 9 has a diameter of 0.05 as shown in FIGS.
Approximately 90 to 360 fine copper wires 9a of about 0.1 mm are closely packed in a concentric manner and twisted to form a stranded wire. FIG. 2A is a sectional view of the lead wire 9.
FIG. 2B is a side view of the lead wire 9.
【0017】このリード線9における表面電極5のバス
バー部5a側は、図3 に示すように、バスバー部5aの
長さ方向における両端部の二点で接合される。このよう
に、リード線9を縒り線で構成して、表面電極5のバス
バー部5aにホットエアー10などで接合する場合、リ
ード線9は縒りの方向xに、基板1とは所定の角度をも
って延びたり縮んだりするので、基板1の幅方向yでの
伸びや縮みは、従来の平角銅箔に比べてはるかに小さく
なる。したがって、基板1が150mm角程度に大型化
しても基板1の反りを極力小さくできる。As shown in FIG. 3, the surface of the lead wire 9 on the side of the bus bar portion 5a of the surface electrode 5 is joined at two points at both ends in the length direction of the bus bar portion 5a. As described above, when the lead wire 9 is formed of a twisted wire and is joined to the bus bar portion 5a of the surface electrode 5 by hot air 10 or the like, the lead wire 9 is formed in the twisting direction x at a predetermined angle with respect to the substrate 1. Since it expands and contracts, the expansion and contraction in the width direction y of the substrate 1 is much smaller than that of a conventional rectangular copper foil. Therefore, even if the size of the substrate 1 is increased to about 150 mm square, the warpage of the substrate 1 can be minimized.
【0018】[0018]
【発明の効果】以上のように、請求項1に係る発明によ
れば、複数の太陽電池素子の表面電極と裏面電極とを接
続するリード線を縒り線で構成したことから、リード線
を溶着するときの熱膨張による伸縮の影響が基板の幅方
向において小さくなり、もってセルの反りが小さくな
る。As described above, according to the first aspect of the present invention, the lead wires for connecting the front and rear electrodes of the plurality of solar cell elements are formed of twisted wires, so that the lead wires are welded. The influence of expansion and contraction due to thermal expansion during the process is reduced in the width direction of the substrate, thereby reducing the warpage of the cell.
【0019】また、請求項2に係る発明によれば、銅箔
を表面電極のバスバー部に複数箇所で接合することか
ら、基板の反りをより効果的に小さくすることができ
る。According to the second aspect of the present invention, since the copper foil is joined to the bus bar portion of the surface electrode at a plurality of locations, the warpage of the substrate can be reduced more effectively.
【図1】請求項1および請求項2に係る発明の太陽電池
装置に用いられる太陽電池素子を示す図であり、(a)
は断面図、(b)は平面図である。FIG. 1 is a diagram showing a solar cell element used for a solar cell device according to the first and second aspects of the present invention;
Is a sectional view, and (b) is a plan view.
【図2】請求項1および請求項2に係る発明の太陽電池
装置に用いられるリード線を示す図であり、(a)は断
面図、(b)は側面図である。FIGS. 2A and 2B are diagrams showing a lead wire used in the solar cell device according to the first and second aspects of the invention, wherein FIG. 2A is a cross-sectional view and FIG.
【図3】請求項1および請求項2に係る太陽電池装置に
おけるリード線の接続の接続方法を示す図である。FIG. 3 is a view showing a connection method of connection of lead wires in the solar cell device according to claim 1 and claim 2;
【図4】従来の太陽電池装置を示す図であり、(a)は
断面図、(b)は平面図である。4A and 4B are views showing a conventional solar cell device, wherein FIG. 4A is a cross-sectional view and FIG. 4B is a plan view.
1‥‥‥基板、5‥‥‥表面電極、6‥‥‥表面電極側
の銅箔、7‥‥‥裏面電極、8‥‥‥裏面電極側の銅
箔、9‥‥‥リード線1 ‥‥‥ substrate, 5 ‥‥‥ front electrode, 6 ‥‥‥ front electrode side copper foil, 7 ‥‥‥ back electrode, 8 ‥‥‥ rear electrode side copper foil, 9 ‥‥‥ lead wire
Claims (2)
面側にバスバー部とフィンガー部とから成る表面電極を
形成し、他の主面側に裏面電極を形成した複数の太陽電
池素子を設け、この複数の太陽電池素子の表面電極と裏
面電極とをリード線で接続した太陽電池装置において、
前記リード線を縒り線で形成したことを特徴とする太陽
電池装置。1. A plurality of solar cell elements having a front surface electrode comprising a bus bar portion and a finger portion formed on one main surface side of a semiconductor substrate having a semiconductor junction portion, and a back surface electrode formed on another main surface side. In a solar cell device in which a front electrode and a rear electrode of the plurality of solar cell elements are connected by lead wires,
A solar cell device, wherein the lead wire is formed by a twisted wire.
部に複数箇所で接合したことを特徴とする請求項1に記
載の太陽電池装置。2. The solar cell device according to claim 1, wherein the lead wire is joined to the bus bar portion of the surface electrode at a plurality of locations.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04702598A JP3683700B2 (en) | 1998-02-27 | 1998-02-27 | Solar cell device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04702598A JP3683700B2 (en) | 1998-02-27 | 1998-02-27 | Solar cell device |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005120233A Division JP2005217450A (en) | 2005-04-18 | 2005-04-18 | Solar cell equipment and its manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11251613A true JPH11251613A (en) | 1999-09-17 |
JP3683700B2 JP3683700B2 (en) | 2005-08-17 |
Family
ID=12763646
Family Applications (1)
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